JP6882257B2 - コーティング装置 - Google Patents
コーティング装置 Download PDFInfo
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- JP6882257B2 JP6882257B2 JP2018504242A JP2018504242A JP6882257B2 JP 6882257 B2 JP6882257 B2 JP 6882257B2 JP 2018504242 A JP2018504242 A JP 2018504242A JP 2018504242 A JP2018504242 A JP 2018504242A JP 6882257 B2 JP6882257 B2 JP 6882257B2
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- 238000000576 coating method Methods 0.000 title claims description 89
- 239000011248 coating agent Substances 0.000 title claims description 80
- 238000002347 injection Methods 0.000 claims description 31
- 239000007924 injection Substances 0.000 claims description 31
- 239000011521 glass Substances 0.000 claims description 24
- 238000010438 heat treatment Methods 0.000 claims description 17
- 239000003380 propellant Substances 0.000 claims description 9
- 238000011144 upstream manufacturing Methods 0.000 claims description 8
- 230000032258 transport Effects 0.000 claims description 4
- 238000005485 electric heating Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 23
- 239000002243 precursor Substances 0.000 description 21
- 239000012159 carrier gas Substances 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000003570 air Substances 0.000 description 10
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- 239000000376 reactant Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- OPARTXXEFXPWJL-UHFFFAOYSA-N [acetyloxy-bis[(2-methylpropan-2-yl)oxy]silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)(C)C)OC(C)(C)C OPARTXXEFXPWJL-UHFFFAOYSA-N 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000012080 ambient air Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000012707 chemical precursor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 235000014214 soft drink Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/005—Coating the outside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
Description
頂部、第1の側壁、及び第2の側壁を有するトンネル部であり、物品がトンネル部に入る上流側端部から物品がトンネル部を出る下流側端部までコンベヤーベルトが物品を輸送するようにコンベヤーベルトに配置するのに好適な、トンネル部を備え、
ガス噴射物を送達するように少なくとも1つの側壁に配置された直線配列のノズルであって、噴射物は、トンネル部を通って運ばれる物品の経路を横断する、直線配列のノズル;
側壁に配置された少なくとも1つの排気開口部であって、直線配列のノズルよりも下流側端部の近くに位置している、排気開口部;及び
排気開口部に負の圧力を印加する手段
を特徴とする。
DBDAS送達量:15〜20cc/分
エバポレーター温度:200℃
エバポレーターのキャリアガス:窒素、25slm
希釈ガス(キャリアガス流に添加):窒素、40slm
排出圧力(排気開口部16に印加)−100Pa
TTIP送達量:15〜32cc/分
エバポレーター温度:165〜200℃
エバポレーターのキャリアガス:窒素、25及び30slm
希釈ガス(キャリアガス流に添加):窒素、40及び70slm
排出圧力−100Pa
TTIP送達量:35cc/分
エバポレーター温度:180℃
エバポレーターのキャリアガス:窒素、30slm
希釈ガス(キャリアガス流に添加):窒素、70slm
排出圧力−100Pa
Claims (12)
- 頂部、第1の側壁、及び第2の側壁を有するトンネル部であり、物品が前記トンネル部に入る上流側端部から物品が前記トンネル部を出る下流側端部までコンベヤーベルトが前記物品を輸送するように前記コンベヤーベルトに配置するのに好適な、トンネル部
を備える、三次元ガラス物品をコーティングするための装置において、
ガス噴射物を送達するように少なくとも1つの側壁に配置された直線配列のノズルであって、噴射物は、前記トンネル部を通って運ばれる物品の経路を横断する、直線配列のノズル;
側壁に配置された少なくとも1つの排気開口部であって、前記直線配列のノズルよりも下流側端部の近くに位置している、排気開口部;及び
前記排気開口部に負の圧力を印加する手段
を備え、
排気開口部の有効サイズを変化させるよう動かすことのできるダンパープレートをさらに備えることを特徴とする、装置。 - 前記トンネル部の互いに実質的に対向している各側壁に1配列があるように配置された、一対の配列の注入ノズルを備える、請求項1に記載の装置。
- 前記トンネル部の互いに実質的に対向している各側壁に1つの開口部があるように配置された、一対の排気開口部を備える、請求項2に記載の装置。
- 前記一対の配列の注入ノズルと前記一対の排気開口部との間の距離が、500から1000mmの間である、請求項3に記載の装置。
- 載せられている前記ガラス物品から放射されている熱を直線配列のノズルに向けるよう配置された、少なくとも1つの反射プレートをさらに備える、請求項1〜4のいずれか1項に記載の装置。
- 前記排気開口部が、壁及びバフルプレートを含む実質的に垂直な導管によって画定されており、前記バフルプレートは、前記トンネル部から延び、前記下流側端部から離れて前記導管の壁へと延びている、請求項1〜5のいずれか1項に記載の装置。
- 前記トンネル部の断面積が、排気開口部の断面積よりも1.5から2.5倍大きい、請求項1〜6のいずれか1項に記載の装置。
- 前記ノズルを出るガスの速度が、前記トンネル部を通って運ばれる物品の全体的な方向と実質的に平行な成分を含むように、少なくとも1つの配列のノズルが配置されている、請求項1〜7のいずれか1項に記載の装置。
- 前記トンネル部の端部から第1の距離に位置する少なくとも1つの配列のノズルと、前記トンネル部の端部から第2の距離に位置する少なくとも1つの配列のノズルと、を備える、請求項1〜8のいずれか1項に記載の装置。
- 少なくとも1つの配列のノズルを加熱する手段をさらに備える、請求項1〜9のいずれか1項に記載の装置。
- 少なくとも1つの配列のノズルを加熱する前記手段が、前記配列が位置する筐体と、前記筐体の内部を加熱する手段と、を備える、請求項10に記載の装置。
- 前記筐体の内部を加熱する前記手段が、電気加熱素子を備える、請求項11に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1513339.0 | 2015-07-29 | ||
GBGB1513339.0A GB201513339D0 (en) | 2015-07-29 | 2015-07-29 | Coating apparatus |
PCT/GB2016/052359 WO2017017478A1 (en) | 2015-07-29 | 2016-07-29 | Coating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018521227A JP2018521227A (ja) | 2018-08-02 |
JP6882257B2 true JP6882257B2 (ja) | 2021-06-02 |
Family
ID=54106779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018504242A Active JP6882257B2 (ja) | 2015-07-29 | 2016-07-29 | コーティング装置 |
Country Status (13)
Country | Link |
---|---|
US (2) | US20180216231A1 (ja) |
EP (1) | EP3329033B1 (ja) |
JP (1) | JP6882257B2 (ja) |
CN (1) | CN108026641B (ja) |
AU (1) | AU2016299411B2 (ja) |
BR (1) | BR112018001828B1 (ja) |
CA (1) | CA2993411C (ja) |
ES (1) | ES2886108T3 (ja) |
GB (1) | GB201513339D0 (ja) |
MX (1) | MX2018001088A (ja) |
PL (1) | PL3329033T3 (ja) |
PT (1) | PT3329033T (ja) |
WO (1) | WO2017017478A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB201513339D0 (en) * | 2015-07-29 | 2015-09-09 | Pilkington Group Ltd | Coating apparatus |
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AU2016299411B2 (en) | 2022-05-12 |
EP3329033B1 (en) | 2021-05-05 |
CA2993411A1 (en) | 2017-02-02 |
BR112018001828B1 (pt) | 2022-05-31 |
US20180216231A1 (en) | 2018-08-02 |
GB201513339D0 (en) | 2015-09-09 |
ES2886108T3 (es) | 2021-12-16 |
AU2016299411A1 (en) | 2018-02-15 |
US20230167556A1 (en) | 2023-06-01 |
BR112018001828A2 (pt) | 2018-09-18 |
EP3329033A1 (en) | 2018-06-06 |
CA2993411C (en) | 2023-09-05 |
PT3329033T (pt) | 2021-08-06 |
CN108026641B (zh) | 2021-07-16 |
CN108026641A (zh) | 2018-05-11 |
WO2017017478A1 (en) | 2017-02-02 |
MX2018001088A (es) | 2018-09-05 |
PL3329033T3 (pl) | 2021-11-15 |
JP2018521227A (ja) | 2018-08-02 |
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