JP6836699B2 - Glass plate - Google Patents
Glass plate Download PDFInfo
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- JP6836699B2 JP6836699B2 JP2017178952A JP2017178952A JP6836699B2 JP 6836699 B2 JP6836699 B2 JP 6836699B2 JP 2017178952 A JP2017178952 A JP 2017178952A JP 2017178952 A JP2017178952 A JP 2017178952A JP 6836699 B2 JP6836699 B2 JP 6836699B2
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- peeling rate
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- 239000011521 glass Substances 0.000 title claims description 144
- 239000006063 cullet Substances 0.000 claims description 91
- 230000003746 surface roughness Effects 0.000 claims description 23
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 21
- 229910052731 fluorine Inorganic materials 0.000 claims description 21
- 239000011737 fluorine Substances 0.000 claims description 21
- 239000007789 gas Substances 0.000 description 24
- 230000032258 transport Effects 0.000 description 21
- 239000012495 reaction gas Substances 0.000 description 17
- 238000005259 measurement Methods 0.000 description 15
- 238000007788 roughening Methods 0.000 description 10
- 239000002994 raw material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 239000005354 aluminosilicate glass Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000012159 carrier gas Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 230000000717 retained effect Effects 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
本発明は、フラットパネルディスプレイ等に使用されるガラス板に関する。 The present invention relates to a glass plate used for a flat panel display or the like.
フラットパネルディスプレイ等の製造プロセスにおいて、ガラス板を真空吸着でステージ（台座）に保持して回路等を実装し、ステージからガラス板を外す際に剥離帯電が起こりガラス板に亀裂や割れが発生するため、剥離帯電防止のため、吸着面を粗面化することが知られている（特許文献１参照）。 In the manufacturing process of flat panel displays, etc., the glass plate is held on the stage (pedestal) by vacuum adsorption to mount a circuit, etc., and when the glass plate is removed from the stage, peeling charge occurs and the glass plate cracks or cracks. Therefore, it is known that the suction surface is roughened to prevent peeling antistatic (see Patent Document 1).
特許文献１は、半導体素子またはカラーフィルムが形成される表面である第１表面と、第１表面と反対側の第２表面とを備え、第２表面は、−１．５より大きく、かつ、−０．５より小さいＲｓｋを有し、ＳｉＯ２、Ａｌ２Ｏ３およびＢ２Ｏ３を含む組成を有するポロアルミノシリケートガラスを用いた基板であるガラス板であって、ガラス板を載置するテーブル（ステージ）表面と接触する第２表面の面積が表面処理によって低減され、ガラス基板の帯電がより効果的に抑制されることを開示している。 Patent Document 1 includes a first surface which is a surface on which a semiconductor element or a color film is formed, and a second surface opposite to the first surface, and the second surface is larger than −1.5 and is larger than −1.5. A glass plate that is a substrate using polo-aluminosilicate glass having an Rsk smaller than −0.5 and having a composition containing SiO 2 , Al 2 O 3 and B 2 O 3, on which a glass plate is placed. It is disclosed that the area of the second surface in contact with the table (stage) surface is reduced by the surface treatment, and the charging of the glass substrate is suppressed more effectively.
特許文献１では、第２表面の剥離帯電を防止して割れを低減させているが、ガラス板をパレットに詰める際の向き等を判別させて作業性を向上させることが困難であるという課題がある。 In Patent Document 1, peeling charge of the second surface is prevented to reduce cracking, but there is a problem that it is difficult to improve workability by determining the orientation when the glass plate is packed in the pallet. is there.
本発明は、吸着面となる面は粗くしつつ、かつガラス板の向き判別性を向上させたガラス板を提供する。 The present invention provides a glass plate having a rough surface to be a suction surface and improved orientation discrimination of the glass plate.
本発明のガラス板は、第１主面と、前記第１主面と対向する第２主面と、前記第１主面と前記第２主面とを繋ぐ端面と、を有し、前記端面は、第１端面を備え、前記第１主面の第１表面粗さが、前記第２主面の第２表面粗さよりも小さく、前記第１端面の第１カレット剥離率は、他の端面のカレット剥離率とは異なる。 The glass plate of the present invention has a first main surface, a second main surface facing the first main surface, and an end surface connecting the first main surface and the second main surface, and the end surface. Is provided with a first end face, the first surface roughness of the first main surface is smaller than the second surface roughness of the second main surface, and the first cullet peeling rate of the first end face is the other end face. It is different from the cullet peeling rate of.
本発明によれば、反応ガスにより第２主面を粗面化して、ステージに吸着させてステージから剥離する際の剥離帯電を防止し、同時に第１端面の第１カレット剥離率を他の端面のカレット剥離率と異ならせることで方向性を容易に判別可能としたガラス板を提供できる。 According to the present invention, the second main surface is roughened by the reaction gas to prevent peeling charge when the second main surface is adsorbed on the stage and peeled from the stage, and at the same time, the first cullet peeling rate of the first end face is set to another end face. It is possible to provide a glass plate in which the directionality can be easily discriminated by making it different from the cullet peeling rate of.
以下、図面を用いて、本発明に係るガラス板の具体的な実施の形態について詳述する。 Hereinafter, specific embodiments of the glass plate according to the present invention will be described in detail with reference to the drawings.
図１（ａ）〜（ｂ）は、本発明に係るガラス板の一例を示し、図１（ａ）は正面斜視図、図１（ｂ）は搬送装置内の搬送状態の概念図である。図２（ａ）〜（ｃ）は、本発明に係るガラス板の一例を示し、図２（ａ）は正面図、図２（ｂ）は右側面図、図２（ｃ）は底面図である。ガラス板の図１（ａ）〜図２（ｃ）を用いてガラス板の一例を詳述する。 1 (a) to 1 (b) show an example of a glass plate according to the present invention, FIG. 1 (a) is a front perspective view, and FIG. 1 (b) is a conceptual diagram of a transport state in a transport device. 2 (a) to 2 (c) show an example of the glass plate according to the present invention, FIG. 2 (a) is a front view, FIG. 2 (b) is a right side view, and FIG. 2 (c) is a bottom view. is there. An example of the glass plate will be described in detail with reference to FIGS. 1 (a) to 2 (c) of the glass plate.
本実施形態のガラス板１は、略矩形状をなし、第１主面１０と、第１主面１０と対向する第２主面２０と、第１主面１０と第２主面２０とを繋ぐ４つの端面を備え、４つの端面は、第１端面３０と、第１端面３０と対向する第２端面４０と、第１端面３０の一端と第２端面４０の一端とを繋ぐ第３端面５０と、第１端面３０の他端と第２端面４０の他端とを繋ぎ、第３端面５０に対向する第４端面６０とを有する。 The glass plate 1 of the present embodiment has a substantially rectangular shape, and has a first main surface 10, a second main surface 20 facing the first main surface 10, and a first main surface 10 and a second main surface 20. It has four end faces to be connected, and the four end faces are a first end face 30, a second end face 40 facing the first end face 30, and a third end face connecting one end of the first end face 30 and one end of the second end face 40. It has a fourth end face 60 that connects the other end of the first end face 30 and the other end of the second end face 40 and faces the third end face 50.
ガラス板１を搬送する搬送装置１００において、上面が第１主面１０であり、回転ローラ１０１と接触し反応ガスであるフッ化水素ガス（ＨＦ）でエッチングされる面が第２主面２０であり、搬送方向（図中矢印方向参照）の先端面が第１端面３０であり、第１端面３０と反対側の端面が第２端面４０であり、ガラス板１の第１主面１０側から見て、右側が第３端面５０、左側が第４端面６０である。 In the transport device 100 for transporting the glass plate 1, the upper surface is the first main surface 10, and the surface that comes into contact with the rotating roller 101 and is etched by hydrogen fluoride gas (HF), which is a reaction gas, is the second main surface 20. Yes, the tip surface in the transport direction (see the arrow direction in the figure) is the first end surface 30, the end surface opposite to the first end surface 30 is the second end surface 40, and the glass plate 1 is viewed from the first main surface 10 side. Looking at it, the right side is the third end surface 50, and the left side is the fourth end surface 60.
また、ガラス板１の第１主面１０は、図２（ａ）に示す通り、第１、第２、第３、第４端面３０、４０、５０、６０のいずれかからガラス板１の中央側に所定の幅（例えば約２０ｍｍ）を占める縁領域１１と、縁領域１１よりも中央側を占める中央領域１２とを備えている。 Further, as shown in FIG. 2A, the first main surface 10 of the glass plate 1 is the center of the glass plate 1 from any of the first, second, third, and fourth end faces 30, 40, 50, and 60. An edge region 11 that occupies a predetermined width (for example, about 20 mm) on the side and a central region 12 that occupies the center side of the edge region 11 are provided.
ガラス板１の第１端面３０は、図２（ｂ）に示す通り、第１主面１０側を占める第１領域３１と第２主面２０側を占める第２領域３２とを備えている。そして、本実施形態では、第１領域３１と第２領域３２の境界は、ガラス板１が撓むため波形形状となっている場合がある。 As shown in FIG. 2B, the first end surface 30 of the glass plate 1 includes a first region 31 occupying the first main surface 10 side and a second region 32 occupying the second main surface 20 side. Then, in the present embodiment, the boundary between the first region 31 and the second region 32 may have a corrugated shape because the glass plate 1 bends.
ガラス板の第３端面５０は、図２（ｃ）に示す通り、第１端面３０側の第３領域５１と、第２端面４０側の第４領域５２とを備える。即ち、第３領域５１は、ガラス板１の搬送方向に対して上流側にある。 As shown in FIG. 2C, the third end surface 50 of the glass plate includes a third region 51 on the first end surface 30 side and a fourth region 52 on the second end surface 40 side. That is, the third region 51 is on the upstream side with respect to the transport direction of the glass plate 1.
本実施形態のガラス板１は、例えば液晶ディスプレイおよび有機ＥＬディスプレイ等のフラットパネルディスプレイ（ＦＰＤ）の製造に用いられる。ガラス板１は、例えば、板厚約０.２ｍｍ〜０.８ｍｍ、縦横約６００ｍｍ〜３０００ｍｍの矩形状である。なお、ガラス板のことをガラス基板とも表現する。 The glass plate 1 of the present embodiment is used for manufacturing a flat panel display (FPD) such as a liquid crystal display and an organic EL display. The glass plate 1 has, for example, a rectangular shape having a plate thickness of about 0.2 mm to 0.8 mm and a length and width of about 600 mm to 3000 mm. The glass plate is also referred to as a glass substrate.
ガラス板１の第１主面１０は、ＦＰＤの製造工程において、ＴＦＴ等の半導体素子、カラーフィルタ、および、ブラックマトリックス（ＢＭ）等を含む複数層の薄膜が形成される面である。 The first main surface 10 of the glass plate 1 is a surface on which a multi-layer thin film including a semiconductor element such as a TFT, a color filter, a black matrix (BM), and the like is formed in the manufacturing process of the FPD.
ガラス板１は、ケイ酸塩ガラスであれば組成は特に限定されないが、例えばＦＰＤ用のガラス基板の場合、ＳｉＯ２とＡｌ２Ｏ３とＢ２Ｏ３およびアルカリ土類金属の酸化物を含む組成を有するアルミノケイ酸ガラスが好ましい。また、形成される素子の密着性及び不具合を抑制する観点から、アルミノケイ酸ガラスの中でも、アルカリ金属成分を実質的に含まない、いわゆる無アルカリガラスがより好ましい。なお、アルカリ金属成分を実質的に含まないとは、アルカリ金属成分を全く含まないことの他に、製造上の不可避成分の含有を許容するものである。具体的には、ガラス組成におけるアルカリ金属酸化物の含有量が、０．１質量％以下であることが好ましい。 The composition of the glass plate 1 is not particularly limited as long as it is silicate glass. For example, in the case of a glass substrate for FPD, the glass plate 1 contains SiO 2 , Al 2 O 3 , B 2 O 3, and an oxide of an alkaline earth metal. Aluminosilicate glass having a composition is preferable. Further, from the viewpoint of suppressing the adhesion and defects of the formed element, the so-called non-alkali glass, which substantially does not contain an alkali metal component, is more preferable among the aluminosilicate glasses. In addition, the fact that the alkali metal component is substantially not contained means that the alkali metal component is not contained at all and the inclusion of an unavoidable component in production is permitted. Specifically, the content of the alkali metal oxide in the glass composition is preferably 0.1% by mass or less.
図３は、本実施形態のガラス板１の搬送状態を示す概念図である。図３を用いて、本発明の目的を詳述する。 FIG. 3 is a conceptual diagram showing a transport state of the glass plate 1 of the present embodiment. The object of the present invention will be described in detail with reference to FIG.
搬送装置１００は、ガラス板１を製造する工程内において、所定の寸法に切断済みのガラス板を１枚１枚連続して所定の方向に搬送するもので、図示しない駆動装置等で回転する複数の回転ローラ１０１と、回転ローラ１０１の下方に設置されたノズル１０２と、を備えている。 The transport device 100 continuously transports glass plates cut to a predetermined size one by one in a predetermined direction in a process of manufacturing the glass plate 1, and a plurality of glass plates rotated by a drive device (not shown) or the like. The rotary roller 101 and the nozzle 102 installed below the rotary roller 101 are provided.
ノズル１０２は、搬送装置１００によって搬送されるガラス板１に対し、ガラス板１の搬送方向に対して略垂直方向でガラス板１の下側から反応ガスを吹き付ける。これにより、ガラス板１の第２主面２０をエッチング（粗面化）する。また、ノズル１０２は、反応ガスを供給するガス供給路１０３と、反応ガスを吸引するガス吸引路１０４とを有している。 The nozzle 102 blows the reaction gas onto the glass plate 1 transported by the transport device 100 from the lower side of the glass plate 1 in a direction substantially perpendicular to the transport direction of the glass plate 1. As a result, the second main surface 20 of the glass plate 1 is etched (roughened). Further, the nozzle 102 has a gas supply path 103 for supplying the reaction gas and a gas suction path 104 for sucking the reaction gas.
ガス供給路１０３は、外部に設けられた、例えば図示しない原料ガスを供給する原料ガス供給装置と接続される。原料ガスは、例えば、フッ素系原料ガスと、キャリアガスとを含む。 The gas supply path 103 is connected to an externally provided raw material gas supply device that supplies, for example, a raw material gas (not shown). The raw material gas includes, for example, a fluorine-based raw material gas and a carrier gas.
フッ素系原料ガスは、ガラス板１の表面と反応するフッ素系反応成分を生成するために用いられる。フッ素系反応成分は、フッ素系原料ガスをプラズマ化（分解、冷気、活性化、イオン化等を含む）することにより生成できる。キャリアガスは、フッ素系原料ガスの搬送および希釈や、プラズマ放電を行うために用いられる。本実施形態では、フッ素系原料ガスとしてＣＦ４が、キャリアガスとしてアルゴンが用いられる。 The fluorine-based raw material gas is used to generate a fluorine-based reaction component that reacts with the surface of the glass plate 1. The fluorine-based reaction component can be generated by converting the fluorine-based raw material gas into plasma (including decomposition, cold air, activation, ionization, etc.). The carrier gas is used for transporting and diluting the fluorine-based raw material gas and for performing plasma discharge. In this embodiment, CF 4 is used as the fluorine-based raw material gas, and argon is used as the carrier gas.
なお、フッ素系原料ガスはこれに限られず、Ｃ２Ｆ６、Ｃ３Ｆ８といったその他のパーフルオロカーボン、ＣＨＦ３、ＣＨ２Ｆ２、ＣＨ３Ｆといったハイドロフルオロカーボン、ＳＦ６、ＮＦ３、ＸｅＦ２といったその他のフッ素含有化合物を用いてもよい。また、キャリアガスはこれに限られず、Ｎ２、ヘリウム、ネオン、キセノンといったその他の不活性ガスを用いてもよい。 Incidentally, the fluorine-based material gas is not limited to this, C 2 F 6, C 3 F 8 other perfluorocarbons such, CHF 3, CH 2 F 2 , CH 3 F , such as hydrofluorocarbons, SF 6, NF 3, XeF 2 Other fluorine-containing compounds such as may be used. The carrier gas is not limited thereto, N 2, helium, neon, and may be other inert gases such as xenon.
本実施形態では、ガラス板１を１枚１枚、反応ガス中に突入させて第２主面２０をエッチングしているが、搬送装置１００内に滞留したガスＧを利用して第１端面３０側もエッチングしている。第１端面３０側を粗面化することによりガラス板１の向き（方向）を判別することが可能となる。滞留ガスＧをあえて存在させて利用するため、搬送されてくるガラス板１毎に反応ガスを除去したり、フローを止めたりする必要がなくなる。本実施形態においては、ガス吸引路１０４を通して反応ガスを搬送装置１００内から吸引している。本実施形態では、搬送方向に対して先端側に位置する端面である第１端面３０も同時に粗面化するためにあえて反応ガスを搬送装置１００内に滞留させてよい。滞留ガスＧの量は粗面化の程度を考慮して制御することが可能である。また、ガラス板１の搬送方向後ろ側に向かうにつれて、反応ガスの密度・濃度が小さくなるように、あえてコントロールしてもよい。
このようにすることで、第２主面２０及び縁領域１１のうち、第１端面３０に沿った領域がガスによって処理される。
In the present embodiment, the second main surface 20 is etched by plunging the glass plates 1 one by one into the reaction gas, but the first end surface 30 is utilized by using the gas G staying in the transport device 100. The side is also etched. By roughening the first end surface 30 side, it is possible to determine the direction (direction) of the glass plate 1. Since the stagnant gas G is intentionally present and used, it is not necessary to remove the reaction gas or stop the flow for each glass plate 1 to be conveyed. In the present embodiment, the reaction gas is sucked from the inside of the transport device 100 through the gas suction path 104. In the present embodiment, the reaction gas may be intentionally retained in the transport device 100 in order to simultaneously roughen the first end face 30, which is the end face located on the tip side with respect to the transport direction. The amount of stagnant gas G can be controlled in consideration of the degree of roughening. Further, the density and concentration of the reaction gas may be intentionally controlled so as to decrease toward the rear side in the transport direction of the glass plate 1.
By doing so, of the second main surface 20 and the edge region 11, the region along the first end surface 30 is treated by the gas.
反応ガスは第２主面２０をエッチングするために用いられ、ガラス板１の第１主面１０の特に中央領域１２は粗面化しないことが好ましい。第１主面１０の第１表面粗さが、第２主面２０の第２表面粗さよりも小さい。ここで、第１表面粗さとは、中央領域１２内から無作為に６点抽出して測定した値の平均であり、第２表面粗さとは、後述する図４（ａ）の（１）〜（６）に対応する第２主面２０上の位置における測定値の平均とする。第１主面が半導体素子等の形成に適した面となる。 The reaction gas is used for etching the second main surface 20, and it is preferable that the central region 12 of the first main surface 10 of the glass plate 1 is not roughened. The first surface roughness of the first main surface 10 is smaller than the second surface roughness of the second main surface 20. Here, the first surface roughness is the average of the values measured by randomly extracting 6 points from the central region 12, and the second surface roughness is (1) to (1) to FIG. 4 (a) described later. It is the average of the measured values at the position on the second main surface 20 corresponding to (6). The first main surface is a surface suitable for forming a semiconductor element or the like.
製造ラインを完了したガラス板１を工場内でパレットに詰める際の向きや、納品先工程での搬送上で確認したいガラス板１の向きを、判別する作業が必要な場合があり、ガラス板１の向きが容易に分かると作業効率の向上を図ることができる。また、例えばガラス板１を５度程度傾斜させて立たせた状態で、搬送することがあるが、この際、下側のコンベアと接触する辺の表面粗さが小さすぎると、コンベアとの摩擦が小さすぎて、ガラス板１が滑ってしまう場合がある。 It may be necessary to determine the orientation of the glass plate 1 that has completed the production line when it is packed in a pallet in the factory, or the orientation of the glass plate 1 that you want to check during transportation in the delivery destination process. Work efficiency can be improved if the orientation of the glass is easily known. Further, for example, the glass plate 1 may be transported in a state of being tilted by about 5 degrees and standing, but at this time, if the surface roughness of the side in contact with the lower conveyor is too small, friction with the conveyor may occur. If it is too small, the glass plate 1 may slip.
本実施形態では、あえて粗らした端面（第１端面３０）を１つ作ることで、ガラス板１の向きが容易に判別できる。また、当該端面を下にしてガラス板１を配置すれば、載置面（コンベア）に対して滑る問題を容易に解消することができる。 In the present embodiment, the orientation of the glass plate 1 can be easily determined by intentionally making one roughened end face (first end face 30). Further, if the glass plate 1 is arranged with the end surface facing down, the problem of slipping on the mounting surface (conveyor) can be easily solved.
図４（ａ）〜（ｂ）は、第１主面１０のフッ素量とＡｌ／Ｓｉ比とを測定した結果を示し、図４（ａ）は測定ポイントの正面図、図４（ｂ）はフッ素量の測定結果とＡｌ／Ｓｉ測定結果の表である。尚、フッ素は簡易的な洗浄を追加で実施すると検出がほとんどなくなるので、洗浄前の値を図４（ｂ）に示しているが、Ａｌ／Ｓｉの値は、洗浄しても変わらないため洗浄前のどちらの値も有効である。 4 (a) to 4 (b) show the results of measuring the amount of fluorine and the Al / Si ratio of the first main surface 10, FIG. 4 (a) is a front view of the measurement point, and FIG. 4 (b) is. It is a table of the measurement result of the amount of fluorine and the measurement result of Al / Si. Since the detection of fluorine is almost eliminated when a simple cleaning is additionally performed, the value before cleaning is shown in FIG. 4 (b), but the value of Al / Si does not change even after cleaning, so cleaning is performed. Both previous values are valid.
尚、Ａｌ／Ｓｉ比は、Ｘ線光電子分光法を用いて測定したガラス板１の表面（第１主面１０）のＡｌ濃度およびＳｉ濃度の比、すなわち、Ａｌのａｔｍ％およびＳｉのａｔｍ％の比である。測定装置には、アルバツク・ファイ社製のＥＳＣＡ５５００を使用し、Ｓｉ（２ｐ）およびＡｌ（２ｐ）のピークを用い、パスエネルギー１１７．４ｅＶ、エネルギーステップ０．５ｅＶ／ｓｔｅｐ、取り出し角（試料表面と検出器のなす角度）１５０の条件で測定を行った。スペク卜ルの解析には、解析ソフトＭｕｌｔｉ Ｐａｋ Ｖｅｒ．８．２を使用した。フッ素量（フッ素の含有量）も同じ方法にて測定した。 The Al / Si ratio is the ratio of the Al concentration and the Si concentration on the surface (first main surface 10) of the glass plate 1 measured by X-ray photoelectron spectroscopy, that is, atm% of Al and atm% of Si. Is the ratio of. ESCA5500 manufactured by Albac Phi is used as the measuring device, and the peaks of Si (2p) and Al (2p) are used, the path energy is 117.4 eV, the energy step is 0.5 eV / step, and the extraction angle (with the sample surface). The measurement was performed under the condition of (angle formed by the detector) 150. For the analysis of the spectrum, the analysis software MultiPak Ver. 8.2 was used. The amount of fluorine (fluorine content) was also measured by the same method.
測定ポイントは６つでガラス板１の第１主面１０上で（１）〜（６）で示してある（図４（ａ）参照）。（１）は第１端面３０と第４端面６０に近い第１主面１０の角側近傍、（２）は第１端面３０と第３端面５０に近い第１主面１０の角側近傍、（３）は第２端面４０と第３端面５０に近い第１主面１０の角側近傍、（４）は第２端面４０と第４端面６０に近い第１主面１０の角側近傍、（５）は第１主面１０の中央近傍、（６）は第１端面３０近傍で（１）と（２）の中間である。また、測定ポイント（１）〜（４）および（６）は、第１主面１０の縁領域１１にある。 There are six measurement points, which are shown by (1) to (6) on the first main surface 10 of the glass plate 1 (see FIG. 4 (a)). (1) is near the corner side of the first main surface 10 near the first end surface 30 and the fourth end surface 60, and (2) is near the corner side of the first main surface 10 near the first end surface 30 and the third end surface 50. (3) is near the corner side of the first main surface 10 near the second end surface 40 and the third end surface 50, and (4) is near the corner side of the first main surface 10 near the second end surface 40 and the fourth end surface 60. (5) is near the center of the first main surface 10, and (6) is near the first end surface 30 and is between (1) and (2). Further, the measurement points (1) to (4) and (6) are located in the edge region 11 of the first main surface 10.
第１主面１０のフッ素量（ａｔｍ％）測定結果（図４（ｂ）参照）によると、第１端面３０に近い測定ポイント（１）、（２）、（６）において、他の測定ポイント（３）、（４）、（５）と比較してフッ素量が多く、反応ガスであるフッ化水素ガスの影響がでていることが理解される。表から第２主面２０又は縁領域１１は、フッ素の含有量が、０．３５ａｔｍ％以上の領域を有することが言える。また、好ましくは最大値が０．５０ａｔｍ％以上であり、さらに好ましくは０．７０ａｔｍ％以上である。 According to the fluorine content (atm%) measurement result of the first main surface 10 (see FIG. 4B), at the measurement points (1), (2), and (6) close to the first end surface 30, other measurement points. It is understood that the amount of fluorine is larger than that of (3), (4) and (5), and the influence of hydrogen fluoride gas, which is a reaction gas, is exerted. From the table, it can be said that the second main surface 20 or the edge region 11 has a region having a fluorine content of 0.35 atm% or more. Further, the maximum value is preferably 0.50 atm% or more, and more preferably 0.70 atm% or more.
このような値範囲とすることで、第１端面３０が充分に粗れてガラス板１の向きの判別がし易くなり、第２主面２０が充分に粗れてステージへのガラス板１の吸着、ステージからのガラス板１の剥離がし易くなる。 With such a value range, the first end surface 30 is sufficiently roughened to facilitate the determination of the orientation of the glass plate 1, and the second main surface 20 is sufficiently roughened to allow the glass plate 1 to be placed on the stage. Adsorption and peeling of the glass plate 1 from the stage become easy.
第１主面１０のＡｌ／Ｓｉ比の測定結果（図４（ｂ）参照）によると、第１端面３０に近い測定ポイント（１）、（２）、（６）において、他の測定ポイント（３）、（４）、（５）と比較してＡｌ／Ｓｉ比が低くなっており、反応ガスであるフッ化水素ガスでＡｌがリーチングされており、反応ガスの影響がでていることが理解される。本実施形態において、ガラス板１は化学強化ガラスの一種であるアルミノシリケートガラス（アルミノケイ酸ガラス）であり、反応ガスであるフッ化水素ガスに暴露された部分はＡｌがリーチングされるためＡｌ／Ｓｉの値が小さくなっている。なお、本実施形態で用いたガラスの組成は、Ａｌ／Ｓｉの値が約０．３のものである。なお、本実施形態において、ガラス成分からＡｌがリーチングされ、Ｆに置換される場合が考えられる。 According to the measurement result of the Al / Si ratio of the first main surface 10 (see FIG. 4 (b)), at the measurement points (1), (2), and (6) close to the first end surface 30, other measurement points (see FIG. 4 (b)). Compared with 3), (4), and (5), the Al / Si ratio is lower, and Al is reached by hydrogen fluoride gas, which is the reaction gas, and the influence of the reaction gas appears. Understood. In the present embodiment, the glass plate 1 is an aluminosilicate glass (aluminosilicate glass) which is a kind of chemically strengthened glass, and Al / Si is reached in a portion exposed to hydrogen fluoride gas which is a reaction gas. The value of is getting smaller. The composition of the glass used in this embodiment has an Al / Si value of about 0.3. In this embodiment, it is conceivable that Al is reached from the glass component and replaced with F.
また、表から第２主面２０又は縁領域１１は、Ａｌ／Ｓｉが、０．１７以下の領域を有することが好ましいと言える。そして、より好ましくは０．１５以下であり、さらに好ましくは０．１３以下である。また、特に限定されないが、例えば第２主面２０又は縁領域１１のいずれの領域においても、Ａｌ／Ｓｉが０．０１以上でよい。
また、第２主面２０又は縁領域１１は、好ましくはＡｌ／Ｓｉの平均値が０．２０未満であり、さらに好ましくは０．１８未満の領域を有する。また、特に限定されないが、下限値としては例えば０．０１以上である。
Further, from the table, it can be said that the second main surface 20 or the edge region 11 preferably has a region in which Al / Si is 0.17 or less. And it is more preferably 0.15 or less, and further preferably 0.13 or less. Further, although not particularly limited, Al / Si may be 0.01 or more in any region of, for example, the second main surface 20 or the edge region 11.
Further, the second main surface 20 or the edge region 11 preferably has an average value of Al / Si of less than 0.20, and more preferably a region of less than 0.18. Further, although not particularly limited, the lower limit value is, for example, 0.01 or more.
ガラス板１の向きの判別がし易くなり、ステージへのガラス板１の吸着、ステージからのガラス板１の剥離がし易くなる。 The orientation of the glass plate 1 can be easily determined, the glass plate 1 can be easily adsorbed to the stage, and the glass plate 1 can be easily peeled off from the stage.
本実施形態によって、第２主面２０を十分に粗らしつつ、第１端面３０も粗面化したガラス板１を提供できる。 According to the present embodiment, it is possible to provide the glass plate 1 in which the first end surface 30 is also roughened while the second main surface 20 is sufficiently roughened.
図５（ａ）〜図８を用いて、第２主面２０および第１端面３０の粗面化が行われている状態を、粗さを示す幾つかの測定値に基づいて詳述する。 With reference to FIGS. 5A to 8, the state in which the second main surface 20 and the first end surface 30 are roughened will be described in detail based on some measured values indicating the roughness.
図５（ａ）〜（ｂ）は、第１端面３０、第２端面４０、第３端面５０、第４端面６０に於けるカレット剥離率を測定した表で、図５（ａ）は第１サンプル、図５（ｂ）は第２サンプルである。カレットとは、ガラス板１から剥がれ落ちる微少なガラスの粒を指す。また、カレット剥離率（単位：％）は、テープ試験によってテープの粘着面に貼りついたカレットの専有面積の割合（カレット占有率）として求めた。テープ試験とは、ガラス板１の端面にテープを貼り付けた後、テープを引き剥がし、「どれだけガラス板１の端面からカレットが剥がれてテープの粘着面に付着しているか」を顕微鏡で測定する試験である。顕微鏡の測定では、テープの粘着面内から無作為に抽出した１２５μｍ×１２５μｍの面積内に存在するカレットが占める面積を二値化処理により抽出し、１２５μｍ×１２５μｍの面積内における存在率を示した。このようにして単位面積当たりのカレット占有面積を求め、パーセント表記したものをカレット剥離率（カレット占有率）とした。
尚、テープ試験で用いるテープは、例えば、ＪＩＳ Ｚ ０２３７：２００９で規定される１８０°引き剥がし粘着力が、１０Ｎ／２５ｍｍのものでよく、引き剥がし方法はＪＩＳ Ｚ ０２３７：２００９に準じたものでよい。
5 (a) to 5 (b) are tables in which the cullet peeling rate at the first end face 30, the second end face 40, the third end face 50, and the fourth end face 60 was measured, and FIG. 5 (a) is the first. The sample, FIG. 5B, is the second sample. The cullet refers to a minute glass grain that peels off from the glass plate 1. The cullet peeling rate (unit:%) was determined as the ratio of the occupied area of the cullet attached to the adhesive surface of the tape (cullet occupancy rate) by the tape test. In the tape test, after attaching the tape to the end face of the glass plate 1, the tape is peeled off, and "how much the cullet is peeled off from the end face of the glass plate 1 and adheres to the adhesive surface of the tape" is measured with a microscope. It is a test to do. In the microscopic measurement, the area occupied by the cullet present in the area of 125 μm × 125 μm randomly extracted from the adhesive surface of the tape was extracted by the binarization treatment, and the abundance rate in the area of 125 μm × 125 μm was shown. .. In this way, the cullet occupancy area per unit area was obtained, and the percentage notation was used as the cullet peeling rate (cullet occupancy rate).
The tape used in the tape test may have, for example, a tape having a 180 ° peeling adhesive strength of 10 N / 25 mm defined by JIS Z 0237: 2009, and the peeling method conforms to JIS Z 0237: 2009. Good.
また、以下、第１端面３０のカレット剥離率を第１カレット剥離率、第２端面４０のカレット剥離率を第２カレット剥離率、第３端面５０のカレット剥離率を第３カレット剥離率、第４端面６０のカレット剥離率を第４カレット剥離率、と述べる。 Further, hereinafter, the cullet peeling rate of the first end face 30 is the first cullet peeling rate, the cullet peeling rate of the second end face 40 is the second cullet peeling rate, and the cullet peeling rate of the third end face 50 is the third cullet peeling rate. The cullet peeling rate of the four end faces 60 is referred to as the fourth cullet peeling rate.
図５（ａ）〜（ｂ）の表から、第１端面３０の第１カレット剥離率は、第２端面の第２カレット剥離率よりも大きく、第３端面５０の第３カレット剥離率よりも大きく、第４端面６０の第４カレット剥離率よりも大きいことがそれぞれ好ましいと言える。即ち、第１端面３０は、全ての端面４０、５０、６０のうちで、カレット剥離率が最も高いことが好ましいと言える。従って、ガラス板１の向き（方向）の判別性がさらに高まる。 From the tables of FIGS. 5A to 5B, the first cullet peeling rate of the first end face 30 is larger than the second cullet peeling rate of the second end face, and is larger than the third cullet peeling rate of the third end face 50. It can be said that it is preferable that the size is large and larger than the fourth cullet peeling rate of the fourth end surface 60. That is, it can be said that the first end face 30 preferably has the highest cullet peeling rate among all the end faces 40, 50, and 60. Therefore, the discriminability of the orientation (direction) of the glass plate 1 is further enhanced.
また、図５（ａ）〜（ｂ）の表から、第２カレット剥離率と、第３カレット剥離率と、第４カレット剥離率とが、第２カレット剥離率と、第３カレット剥離率と、第４カレット剥離率との平均値の０．５倍以上１．５倍以下であることが好ましいと言える。このことから、第２端面４０と第３端面５０と第４端面６０には明確な傾向が表れておらず、それぞれに対してあまり差がなく、第１端面３０だけが大きいと理解できる。従って、ガラス板１の向き（方向）の判別性がさらに高まる。 Further, from the tables of FIGS. 5A to 5B, the second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are the second cullet peeling rate and the third cullet peeling rate. It can be said that it is preferable that the average value with the fourth cullet peeling rate is 0.5 times or more and 1.5 times or less. From this, it can be understood that there is no clear tendency in the second end face 40, the third end face 50, and the fourth end face 60, and there is not much difference between them, and only the first end face 30 is large. Therefore, the discriminability of the orientation (direction) of the glass plate 1 is further enhanced.
さらに、図５（ａ）の（第１端面３０のカレット剥離率）／（第２端面のカレット剥離率）≒３．７８、図５（ｂ）の（第１端面３０のカレット剥離率）／（第２端面のカレット剥離率）≒５．２４から、第１カレット剥離率は、第２カレット剥離率の３倍以上であることが好ましいと言える。即ち、第１端面３０だけ他の端面４０、５０、６０と比べて飛び抜けて大きいことが理解できる。従って、第１端面３０の粗面化が目立つことで、ガラス板１の向き（方向）の判別性がさらに高まる。また上限値は特に限定されないが、例えば２０倍以下である。
また、テープ試験において、第１サンプルでは長径６μｍ以上のカレットは発生しなかった。また第２サンプルでは長径９μｍ以上のカレットは発生しなかった。また第２サンプルはガラス基板として十分な強度を有し、第１サンプルは第２サンプルよりも強度が高かった。これより、第１端面３０から剥離するカレットの大きさが好ましくは長径１０μｍ以下、より好ましくは長径９μｍ未満、さらに好ましくは長径６μｍ未満であることが言える。即ち、第１端面３０はカレットが剥離し易いが、大きすぎるカレットは剥離していないことが理解できる。上記範囲であることで、滞留ガスＧの濃度を制御することで第１端面３０を粗らしつつ、かつ第１端面３０の端面強度の低下を抑制することができる。また、下限値は特に限定されないが、例えば長径０．１μｍ以上である。
Further, (Cullet peeling rate of the first end face 30) / (Cullet peeling rate of the second end face) ≈3.78 in FIG. 5 (a), (Cullet peeling rate of the first end face 30) in FIG. 5 (b) /. From (Cullet peeling rate of the second end face) ≈5.24, it can be said that the first cullet peeling rate is preferably 3 times or more of the second cullet peeling rate. That is, it can be understood that only the first end face 30 is by far larger than the other end faces 40, 50, 60. Therefore, the roughening of the first end surface 30 is conspicuous, and the discriminability of the orientation (direction) of the glass plate 1 is further enhanced. The upper limit is not particularly limited, but is, for example, 20 times or less.
Further, in the tape test, no cullet having a major axis of 6 μm or more was generated in the first sample. In the second sample, no cullet having a major axis of 9 μm or more was generated. Further, the second sample had sufficient strength as a glass substrate, and the first sample had higher strength than the second sample. From this, it can be said that the size of the cullet peeled from the first end surface 30 is preferably 10 μm or less in major axis, more preferably less than 9 μm in major axis, and further preferably less than 6 μm in major axis. That is, it can be understood that the cullet is easily peeled off from the first end surface 30, but the cullet that is too large is not peeled off. Within the above range, it is possible to roughen the first end face 30 and suppress a decrease in the end face strength of the first end face 30 by controlling the concentration of the retained gas G. The lower limit is not particularly limited, but is, for example, a major axis of 0.1 μm or more.
また、第１端面３０のうち第２主面側が、エッチングされやすいため、第１カレット剥離率は、第１領域３１よりも第２領域３２の方が大きいことも言える。そして、第１領域３１と第２領域３２の境界は、ガラス板が撓む場合があるため波形形状である場合があることを上述した。従って、ガラス板１の向きを確認する作業において、容易にガラス板１の向き（方向）を判別できる。 Further, since the second main surface side of the first end surface 30 is easily etched, it can be said that the first cullet peeling rate is larger in the second region 32 than in the first region 31. As described above, the boundary between the first region 31 and the second region 32 may have a corrugated shape because the glass plate may bend. Therefore, in the work of confirming the orientation of the glass plate 1, the orientation (direction) of the glass plate 1 can be easily determined.
第３端面５０の第３カレット剥離率では、第４領域５２よりも第３領域５１の方が大きいと言える。即ち、第３端面５０の側辺のうち、滞留ガスＧに触れやすい搬送方向上流の方が、カレット剥離率が高くなり、ガラス板１の向き（方向）の判別性がさらに高まる。 It can be said that the third region 51 is larger than the fourth region 52 in the third cullet peeling rate of the third end surface 50. That is, among the side sides of the third end surface 50, the cullet peeling rate is higher in the upstream side in the transport direction where the stagnant gas G is easily touched, and the direction (direction) of the glass plate 1 is further improved.
図６（ａ）〜（ｂ）は、カレットの電子顕微鏡による写真で、図６（ａ）は第１端面３０、図６（ｂ）は第２端面４０である。黒い部分がカレットで、他の部分はテープである。第２端面４０に比較して第１端面３０のカレットが多いことが理解できる。 6 (a) to 6 (b) are photographs of Caret with an electron microscope, FIG. 6 (a) is a first end face 30, and FIG. 6 (b) is a second end face 40. The black part is the cullet and the other part is the tape. It can be understood that there are more cullets on the first end surface 30 than on the second end surface 40.
図７は、第１端面３０、第２端面４０、第３端面５０、第４端面６０に於ける粗さを測定した表である。表中の各粗さを示す指標（ＲａおよびＲδｃ）は以下の定義である。なお、これらの値はＪＩＳ Ｂ ０６０１：２０１３に規定される。尚、これらの値は各端面において無作為に５点測定して、その値を平均したものである。
Ｒａ：「算術平均粗さ」であり、基準長さにおいて、Ｚ（ｘ）（１つの曲線の集合体）の絶対値の平均を表す値である。
Ｒδｃ：「粗さ曲線の切断レベル差」であり、二つの負荷長さ率に一致する高さ方向の切断レベルｃの差を表す値である。
FIG. 7 is a table in which the roughness of the first end face 30, the second end face 40, the third end face 50, and the fourth end face 60 is measured. The indexes (Ra and Rδc) indicating each roughness in the table are defined as follows. These values are specified in JIS B 0601: 2013. These values are randomly measured at 5 points on each end face and averaged.
Ra: "Arithmetic mean roughness", which is a value representing the average of the absolute values of Z (x) (a collection of one curve) at a reference length.
Rδc: “Difference in cutting level of roughness curve”, which is a value representing the difference in cutting level c in the height direction corresponding to the two load length ratios.
図７の表から、第１端面３０のＲａおよびＲδｃの値は、他の端面４０、５０、６０の値よりも大きいことが理解できる。即ち、第１端面３０の表面粗さは、第２端面４０の表面粗さよりも大きいことが好ましいと言える。 From the table of FIG. 7, it can be understood that the values of Ra and Rδc of the first end face 30 are larger than the values of the other end faces 40, 50 and 60. That is, it can be said that the surface roughness of the first end surface 30 is preferably larger than the surface roughness of the second end surface 40.
そして、図５（ａ）〜（ｂ）および図７の表から、第１主面１０の第１表面粗さが、第２主面２０の第２表面粗さよりも小さく、第１端面３０の第１カレット剥離率は、第２端面４０の第２カレット剥離率よりも大きいと理解できる。 Then, from the tables of FIGS. 5 (a) to 5 (b) and FIG. 7, the first surface roughness of the first main surface 10 is smaller than the second surface roughness of the second main surface 20, and the first end surface 30 It can be understood that the first cullet peeling rate is larger than the second cullet peeling rate of the second end face 40.
従って、ステージに吸着して剥離する側の第２主面２０の粗面化により剥離帯電が防止でき、真空吸着からガラス板１が外し易くなり、第１端面３０の粗面化によりガラス板１の方向性が容易に理解され、例えば納品先での搬送時に載置する側の判別作業の効率向上を図ることができる。 Therefore, peeling charging can be prevented by roughening the second main surface 20 on the side that is attracted to the stage and peeled off, the glass plate 1 can be easily removed from vacuum suction, and the glass plate 1 is roughened by roughening the first end surface 30. The direction of the above can be easily understood, and for example, it is possible to improve the efficiency of the determination work on the mounting side at the time of transportation at the delivery destination.
また、縁領域１１は、中央領域１２よりも表面粗さが大きい領域を有することが好ましい。図４（ａ）〜（ｂ）において、反応ガスの影響を第１主面の縁領域１１の搬送方向下流側については確認できるため、第１主面の縁領域１１も第２主面２０と同様の表面特性であると考えられる。縁領域１１に中央領域１２よりも表面粗さが大きい領域を備えれば、その部位から空気が入りやすいため、ガラス板１を積層させる際の合紙を剥がし易くなる。即ち、ガラス板１の周縁の一部が粗れているため、合紙をめくりやすいと言える。なお、縁領域１１は、半導体素子の形成に適さなければ、後の工程で切り落としてよく、中央領域１２のみを半導体素子の形成に用いればよい。 Further, the edge region 11 preferably has a region having a larger surface roughness than the central region 12. In FIGS. 4A to 4B, since the influence of the reaction gas can be confirmed on the downstream side of the edge region 11 of the first main surface in the transport direction, the edge region 11 of the first main surface is also referred to as the second main surface 20. It is considered that they have similar surface characteristics. If the edge region 11 is provided with a region having a surface roughness larger than that of the central region 12, air can easily enter from that region, so that the interleaving paper when laminating the glass plates 1 can be easily peeled off. That is, it can be said that it is easy to turn the interleaving paper because a part of the peripheral edge of the glass plate 1 is rough. If the edge region 11 is not suitable for forming the semiconductor element, it may be cut off in a later step, and only the central region 12 may be used for forming the semiconductor element.
搬送装置１００内で搬送されるガラス板１の最初に突入する第１端面３０は、反応ガスにより他の端面４０、５０、６０に比べ粗くなり、カレット剥離率が大きくなるため、第１端面３０が判別できる。この結果、ガラス板１の向き（方向）の判別性を付与することができ、ガラス板１の向きを容易に判別できる。 The first end surface 30 that first rushes into the glass plate 1 conveyed in the transfer device 100 becomes coarser than the other end surfaces 40, 50, 60 due to the reaction gas, and the cullet peeling rate increases, so that the first end surface 30 Can be determined. As a result, the orientation (direction) of the glass plate 1 can be discriminated, and the orientation of the glass plate 1 can be easily discriminated.
図８は、第２主面２０を種々の粗さを示す指標で測定した値を示す表であり、サンプル数Ｎは５個（Ｎ＝５）である。 FIG. 8 is a table showing values obtained by measuring the second main surface 20 with indexes showing various roughness, and the number of samples N is 5 (N = 5).
表中の各粗さを示す指標（Ｒｋｕ、Ｒｓｋ、等）は以下の定義である。なお、これらの指標はＪＩＳ Ｂ ０６０１：２０１３に規定される。 The indexes (Rku, Rsk, etc.) indicating each roughness in the table are defined as follows. These indicators are defined in JIS B 0601: 2013.
Ｒｋｕ：「粗さ曲線のクルトシス」であり、二乗平均平方根高さＲｑの四乗によって無次元した基準長さにおいて、Ｚ（ｘ）の四乗平均を表す値である。 Rku: "Curtosis of roughness curve", which is a value representing the mean square of Z (x) at a reference length dimensionless by the square of the root mean square height Rq.
Ｒｓｋ：「粗さ曲線のスキューネス」であり、二乗平均平方根高さＲｑの三乗によって無次元化した基準長さにおいて、Ｚ（ｘ）の三乗平均を表す。歪度を意味し、平均線を中心としたときの山部と谷部の対称性を表す値である。また、原子間力顕微鏡により測定される表面の凹凸形状を表すパラメータの一種でもある。 Rsk: "Skewness of roughness curve", which represents the cube root average of Z (x) at a reference length made non-dimensional by the cube root mean square root height Rq cubed. It means the degree of skewness, and is a value that represents the symmetry of the peaks and valleys around the average line. It is also a kind of parameter representing the uneven shape of the surface measured by an atomic force microscope.
Ｒｓｍ：「粗さ曲線要素の平均長さ」であり、基準長さにおいて、輪郭曲線要素の長さＸｓの平均を表す値である。
Ｒｖ：「粗さ曲線の最大谷深さ」であり、基準長さにおいて、輪郭曲線の谷深さＺｖの最大値である。
Ｒｚ：「最大高さ粗さ」であり、基準長さにおいて、輪郭曲線の山高さＺｐの最大値Ｒｐと谷深さＺｖの最大値Ｒｖの和を表す値である（Ｒｚ＝Ｒｐ＋Ｒｖ）。
Rsm: “Average length of roughness curve element”, which is a value representing the average of the length Xs of the contour curve element at the reference length.
Rv: “Maximum valley depth of roughness curve”, which is the maximum value of valley depth Zv of the contour curve at the reference length.
Rz: “Maximum height roughness”, which is a value representing the sum of the maximum value Rp of the peak height Zp of the contour curve and the maximum value Rv of the valley depth Zv at the reference length (Rz = Rp + Rv).
比表面積率の増加分とは、基準平面の表面積を１とした際の、第１主面１０又は第２主面２０の比表面積を測定し、それらの値と基準平面の表面積との差分（すなわち第１主面１０又は第２主面２０の比表面積の値から１を引いた値）を示す（単位は％）。 The increase in the specific surface area ratio is the difference between the value and the surface area of the reference plane when the specific surface area of the first main surface 10 or the second main surface 20 is measured when the surface area of the reference plane is 1. That is, the value obtained by subtracting 1 from the value of the specific surface area of the first main surface 10 or the second main surface 20) is shown (unit is%).
図８の表において、第２主面２０又は第１主面１０の縁領域１１が所望の粗面化をしていることを示す事実としてＲｓｋの値が正であることと、比表面積率の増加分の値が高いことが重要である。 In the table of FIG. 8, the fact that the edge region 11 of the second main surface 20 or the first main surface 10 has the desired roughening is that the Rsk value is positive and that the specific surface area ratio is It is important that the value of the increase is high.
当該表から、第２主面２０又は第１主面１０の縁領域１１は、Ｒｓｋ（粗さ曲線のスキューネス）が正の領域を含むと言える。そして、Ｒｓｋの最大値が好ましくは０．２以上であり、より好ましくは０．４以上、さらに好ましくは０．６以上である。また、Ｒｓｋの最小値が好ましくは０．１以下であり、より好ましくは０．０５以下である。さらに、第２主面２０全体ではＲｓｋが正でもよく、その場合、第２主面２０全体的に、好ましくは０．００５以上であり、より好ましくは０．００８以上、さらに好ましくは０．０１０以上である。 From the table, it can be said that the edge region 11 of the second main surface 20 or the first main surface 10 includes a region where Rsk (skewness of the roughness curve) is positive. The maximum value of Rsk is preferably 0.2 or more, more preferably 0.4 or more, and further preferably 0.6 or more. The minimum value of Rsk is preferably 0.1 or less, and more preferably 0.05 or less. Further, the Rsk may be positive on the entire second main surface 20, in which case the overall second main surface 20 is preferably 0.005 or more, more preferably 0.008 or more, still more preferably 0.010. That is all.
粗面化することで剥離帯電が抑制され、ステージへのガラス板１の吸着、ステージからのガラス板１の剥離がしやすくなり、ガラス板１の方向性も容易に判別することができる。 By roughening the surface, peeling charge is suppressed, the glass plate 1 is easily adsorbed to the stage, the glass plate 1 is easily peeled from the stage, and the directionality of the glass plate 1 can be easily determined.
また、図８の表から第２主面２０又は第１主面１０の縁領域１１は、比表面積率の増加分が好ましくは０．０１％以上の領域を備えると言える。そして、比表面積率の増加分が、より好ましくは０．０２％以上であり、さらに好ましくは０．０３％以上である。また、比表面積率の増加分の最大値は好ましくは０．０５％以上であり、より好ましくは０．０７％以上、さらに好ましくは０．１０％以上である。 Further, from the table of FIG. 8, it can be said that the edge region 11 of the second main surface 20 or the first main surface 10 includes a region in which the increase in the specific surface area ratio is preferably 0.01% or more. The increase in the specific surface area ratio is more preferably 0.02% or more, still more preferably 0.03% or more. The maximum value of the increase in the specific surface area ratio is preferably 0.05% or more, more preferably 0.07% or more, and further preferably 0.10% or more.
粗面化することで剥離帯電が抑制され、ステージへのガラス板１の吸着、ステージからのガラス板１の剥離がしやすくなり、ガラス板１の方向性も容易に判別することができる。 By roughening the surface, peeling charge is suppressed, the glass plate 1 is easily adsorbed to the stage, the glass plate 1 is easily peeled from the stage, and the directionality of the glass plate 1 can be easily determined.
本実施形態の説明において第１、第２等を使用したが、特に位置や方向性を限定する用語ではない。また、第１端面３０の粗面化を説明したが、製造ラインによっては第３端面５０や第４端面６０を粗面化する方が有利な場合もあり、方向性の判別は一端面の粗面化であればよく、特に限定されない。 Although the first, second, etc. are used in the description of the present embodiment, they are not terms that particularly limit the position and directionality. Further, although the roughening of the first end surface 30 has been described, it may be advantageous to roughen the third end surface 50 and the fourth end surface 60 depending on the production line, and the directionality can be determined by roughening the one end surface. It may be a surface, and is not particularly limited.
尚、本発明は、上述した実施形態に限定されるものではなく、適宜、変形、改良、等が可能である。その他、上述した実施形態における各構成要素の材質、形状、寸法、数値、形態、数、配置箇所、等は本発明を達成できるものであれば任意であり、限定されない。 The present invention is not limited to the above-described embodiment, and can be appropriately modified, improved, and the like. In addition, the material, shape, size, numerical value, form, number, arrangement location, etc. of each component in the above-described embodiment are arbitrary and are not limited as long as the present invention can be achieved.
特に、本実施形態では略矩形状のガラス板と表現したが、コーナーカットと呼ばれる、矩形のガラス板の角を切り落としたガラス板であってもよい。 In particular, although it is expressed as a substantially rectangular glass plate in the present embodiment, it may be a glass plate in which the corners of the rectangular glass plate are cut off, which is called a corner cut.
以上の事項より、本明細書は以下の内容を開示する。
［１］
第１主面と、前記第１主面と対向する第２主面と、前記第１主面と前記第２主面とを繋ぐ端面と、を有し、前記端面は、第１端面を備え、前記第１主面の第１表面粗さが、前記第２主面の第２表面粗さよりも小さく、前記第１端面の第１カレット剥離率は、他の端面のカレット剥離率とは異なることを特徴とするガラス板。
［２］
前記端面は、前記第１端面と対向する第２端面、を備え、前記第１端面の前記第１カレット剥離率は、前記第２端面の第２カレット剥離率よりもおおきい［１］に記載のガラス板。
［３］
前記端面は、前記第１端面の一端と前記第２端面の一端とを繋ぐ第３端面と、前記第１端面の他端と前記第２端面の他端とを繋ぎ、前記第３端面に対向する第４端面と、を備え、 前記第１カレット剥離率は、前記第３端面の第３カレット剥離率よりも大きく、前記第１カレット剥離率は、前記第４端面の第４カレット剥離率よりも大きい、［１］または［２］に記載のガラス板。
［４］
前記第２カレット剥離率と、前記第３カレット剥離率と、前記第４カレット剥離率とが、 前記第２カレット剥離率と、前記第３カレット剥離率と、前記第４カレット剥離率との平均値の０．５倍以上１．５倍以下である、［３］に記載のガラス板。
［５］
前記第１カレット剥離率は、前記第２カレット剥離率の３倍以上である、［２］から［４］のいずれか１項に記載のガラス板。
［６］
前記第１端面から剥離するカレットの大きさが長径１０μｍ以下である、［１］から［５］のいずれか１項に記載のガラス板。
［７］
前記第１端面の表面粗さは、前記第２端面の表面粗さよりも大きい、［２］に記載のガラス板。
［８］
前記第１端面は、前記第１主面側を占める第１領域と、前記２主面側を占める第２領域と、を備え、前記第１カレット剥離率は、前記第１領域よりも前記第２領域の方が大きい、［１］から［７］のいずれか１項に記載のガラス板。
［９］
前記第１領域と前記第２領域の境界は、波形形状である、［８］に記載のガラス板。
［１０］
前記第３端面は、前記第１端面側の第３領域と、第２端面側の第４領域とを備え、前記第３カレット剥離率は、前記第４領域よりも前記第３領域の方が大きい、［３］に記載のガラス板。
［１１］
前記第１主面は、前記第１、第２、第３、第４端面のいずれかから前記ガラス板の中央側に所定の幅占める縁領域と、前記縁領域よりも中央側を占める中央領域と、を備え、前記縁領域は、前記中央領域よりも表面粗さが大きい領域を有する、［３］に記載のガラス板。
［１２］
前記第２主面又は前記縁領域は、粗さ曲線のスキューネス（Ｒｓｋ）が正の領域を有する、［１１］に記載のガラス板。
［１３］
前記第２主面又は前記縁領域は、比表面積率の増加分が０．０１％以上の領域を有する、［１１］に記載のガラス板。
［１４］
前記第２主面又は前記縁領域は、フッ素含有量が、０．３５ａｔｍ％以上の領域を有する、［１１］に記載のガラス板。
［１５］
前記第２主面又は前記縁領域は、Ａｌ／Ｓｉが０．１７以下である領域を有する、［１１］に記載のガラス板。
［１６］
前記縁領域は、前記第１端面から前記ガラス板の中央側に所定の幅占める領域である、［１１］に記載のガラス板。
Based on the above matters, the present specification discloses the following contents.
[1]
It has a first main surface, a second main surface facing the first main surface, and an end surface connecting the first main surface and the second main surface, and the end surface includes a first end surface. The first surface roughness of the first main surface is smaller than the second surface roughness of the second main surface, and the first cullet peeling rate of the first end face is different from the cullet peeling rate of other end faces. A glass plate characterized by that.
[2]
The end face includes a second end face facing the first end face, and the first cullet peeling rate of the first end face is larger than the second cullet peeling rate of the second end face [1]. Glass plate.
[3]
The end face connects a third end face that connects one end of the first end face and one end of the second end face, the other end of the first end face, and the other end of the second end face, and faces the third end face. The first cullet peeling rate is larger than the third cullet peeling rate of the third end face, and the first cullet peeling rate is higher than the fourth cullet peeling rate of the fourth end face. The glass plate according to [1] or [2], which is also large.
[4]
The second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are the average of the second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate. The glass plate according to [3], which is 0.5 times or more and 1.5 times or less the value.
[5]
The glass plate according to any one of [2] to [4], wherein the first cullet peeling rate is three times or more the second cullet peeling rate.
[6]
The glass plate according to any one of [1] to [5], wherein the size of the cullet peeled from the first end surface is 10 μm or less in major axis.
[7]
The glass plate according to [2], wherein the surface roughness of the first end surface is larger than the surface roughness of the second end surface.
[8]
The first end surface includes a first region occupying the first main surface side and a second region occupying the second main surface side, and the first cullet peeling rate is higher than that of the first region. The glass plate according to any one of [1] to [7], wherein the two regions are larger.
[9]
The glass plate according to [8], wherein the boundary between the first region and the second region has a corrugated shape.
[10]
The third end face includes a third region on the first end face side and a fourth region on the second end face side, and the third cullet peeling rate is higher in the third region than in the fourth region. The large glass plate according to [3].
[11]
The first main surface includes an edge region that occupies a predetermined width from any of the first, second, third, and fourth end faces to the center side of the glass plate, and a central region that occupies the center side of the edge region. The glass plate according to [3], wherein the edge region has a region having a surface roughness larger than that of the central region.
[12]
The glass plate according to [11], wherein the second main surface or the edge region has a region in which the skewness (Rsk) of the roughness curve is positive.
[13]
The glass plate according to [11], wherein the second main surface or the edge region has a region in which the increase in specific surface area ratio is 0.01% or more.
[14]
The glass plate according to [11], wherein the second main surface or the edge region has a region having a fluorine content of 0.35 atm% or more.
[15]
The glass plate according to [11], wherein the second main surface or the edge region has a region in which Al / Si is 0.17 or less.
[16]
The glass plate according to [11], wherein the edge region occupies a predetermined width from the first end surface to the center side of the glass plate.
本発明のガラス板は、ステージと接触する面の剥離帯電を防止し、端面側の方向判別を必要とするガラス板に好適に用いられる。 The glass plate of the present invention is suitably used for a glass plate that prevents peeling and charging of the surface in contact with the stage and requires direction determination on the end surface side.
本発明を詳細にまた特定の実施態様を参照して説明したが、本発明の精神と範囲を逸脱することなく様々な変更や修正を加えることができることは、当業者にとって明らかである。 Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention.
１ ガラス板（ガラス基板）
１０ 第１主面
１１ 縁領域
１２ 中央領域
２０ 第２主面
３０ 第１端面
３１ 第１領域
３２ 第２領域
４０ 第２端面
５０ 第３端面
５１ 第３領域
５２ 第４領域
６０ 第４端面
１００ 搬送装置
１０１ 回転ローラ
１０２ ノズル
Ｇ 滞留ガス
1 Glass plate (glass substrate)
10 1st main surface 11 Edge area 12 Central area 20 2nd main surface 30 1st end surface 31 1st area 32 2nd area 40 2nd end surface 50 3rd end surface 51 3rd area 52 4th area 60 4th end surface 100 Transport Equipment 101 Rotating roller 102 Nozzle G Retained gas
Claims (13)
前記第１主面と対向する第２主面と、
前記第１主面と前記第２主面とを繋ぐ端面と、を有し、
前記端面は、第１端面と、前記第１端面と対向する第２端面と、前記第１端面の一端と前記第２端面の一端とを繋ぐ第３端面と、前記第１端面の他端と前記第２端面の他端とを繋ぎ、前記第３端面に対向する第４端面と、を備えるガラス板であって、
前記第１主面の第１表面粗さが、前記第２主面の第２表面粗さよりも小さく、
前記第１端面の第１カレット剥離率は、他の端面のカレット剥離率とは異なり、
前記第１主面は、前記第１、第２、第３、第４端面のいずれかから前記ガラス板の中央側に所定の幅を占める縁領域と、前記縁領域よりも中央側を占める中央領域と、を備え、
前記縁領域は、前記中央領域よりも表面粗さが大きい領域を有することを特徴とするガラス板。 The first main surface and
The second main surface facing the first main surface and
It has an end surface that connects the first main surface and the second main surface.
The end face includes a first end face, a second end face facing the first end face, a third end face connecting one end of the first end face and one end of the second end face, and the other end of the first end face. wherein connecting the other end of the second end surface, and a fourth end face opposing the third end face, a glass plate Ru provided with,
The first surface roughness of the first main surface is smaller than the second surface roughness of the second main surface.
The first cullet peeling rate of the first end face is different from the cullet peeling rate of other end faces.
The first main surface includes an edge region occupying a predetermined width from any of the first, second, third, and fourth end faces to the center side of the glass plate, and a center occupying the center side of the edge region. With area,
The edge region is a glass plate having a region having a surface roughness larger than that of the central region.
前記第１カレット剥離率は、前記第４端面の第４カレット剥離率よりも大きい、請求項１又は２に記載のガラス板。 The first cullet peeling rate is larger than the third cullet peeling rate of the third end face.
The glass plate according to claim 1 or 2, wherein the first cullet peeling rate is larger than the fourth cullet peeling rate of the fourth end face.
前記第２カレット剥離率と、前記第３カレット剥離率と、前記第４カレット剥離率との平均値の０．５倍以上１．５倍以下である、請求項３に記載のガラス板。 The second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are
The glass plate according to claim 3, wherein the second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are 0.5 times or more and 1.5 times or less the average value.
前記第１主面側を占める第１領域と、前記２主面側を占める第２領域と、を備え、
前記第１カレット剥離率は、前記第１領域よりも前記第２領域の方が大きい、請求項１から７のいずれか１項に記載のガラス板。 The first end face is
A first region occupying the first main surface side and a second region occupying the second main surface side are provided.
The glass plate according to any one of claims 1 to 7, wherein the first cullet peeling rate is larger in the second region than in the first region.
前記第１端面側の第３領域と、第２端面側の第４領域とを備え、
前記第３端面の第３カレット剥離率は、前記第４領域よりも前記第３領域の方が大きい、請求項１から９のいずれか１項に記載のガラス板。 The third end face is
A third region on the first end face side and a fourth region on the second end face side are provided.
The glass plate according to any one of claims 1 to 9, wherein the third cullet peeling rate of the third end surface is larger in the third region than in the fourth region.
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