JP6662998B2 - プラズマ処理装置 - Google Patents
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Description
反応容器内に配設した電極板と、
前記反応容器内に前記電極板に対向させて平行に配設した対向電極と、
前記電極板の前記対向電極に対向しない非対向側から接続され、前記電極板に周波電力を供給する伝送路と、
ガス供給機能を果たすと共に、前記電極板に貫通接続して該電極板に電気供給機能を果たす金属管と、よりなり、
前記電極板は、主電極板とその下方に複数の小孔を有する第1拡散板と、第2拡散板と、シャワー板と、から構成され、
しかも前記電極板は、主電極板、第1拡散板、第2拡散板及びシャワー板の4枚の板状の部材を面平行に順次に並設し、かつ、前記主電極板と第1拡散板の間隔D1、第1拡散板と第2拡散板の間隔D2、第2拡散板とシャワー板の間隔D3の間には「D1>D2≒D3」の関係が成立し、
前記主電極板と第1拡散板の間の空間に、前記金属管の第1空間露出部分を周方向に露出した複数のガス噴出口を設け、
さらに、前記第1拡散板の複数の小孔の径R1、第2拡散板の複数の小孔の径R2、シャワー板15の複数の小孔の径R3の間には「R1>R2>R3」の関係が成立するとともに、
第1拡散板の複数の小孔による開口率H1、第2拡散板の複数の小孔による開口率H2、シャワー板の複数の小孔による開口率H3の間には「H1<H2<H3」の関係が成立するよう構成したことを特徴とするプラズマ処理装置である。
前記電極板は、主電極板とその下方に複数の小孔を有する第1拡散板と、第2拡散板と、シャワー板と、から構成され、
しかも前記電極板は、主電極板、第1拡散板、第2拡散板及びシャワー板の4枚の板状の部材を面平行に順次に並設し、かつ、前記主電極板と第1拡散板の間隔D1、第1拡散板と第2拡散板の間隔D2、第2拡散板とシャワー板の間隔D3の間には「D1>D2≒D3」の関係を有する。
ガス供給口から供給されるプロセスガスは、前記金属管内のガス供給路を通って、前記ガス噴出口から反応容器内のプラズマ処理空間へ供給される。
噴出したプロセスガスは、第1空間から複数の小孔を通って第2空間、第3空間へ流入し、それぞれ拡散板に沿って面方向に拡散され、ガス分布の一様性が向上する。
このため、周波電力電源の周波数に合わせて、分配伝送板の枝板長さ、及び電極板の連 結部の位置(設置距離)を決定することにより、プラズマ処理空間に発生する定在波の抑制 が可能であり、グロー放電の一様性を容易に向上することができる。
また、分岐数を増やすことにより、電極板と伝送路との連結部の数を適宜に増減変更可 能であり、周波電力が高周波化した場合及び/又は成膜面積の増大に対応するべく電極板 の面積を更に大面積化した場合等においても、電極板において均一なグロー放電を実現可 能となる。
図1は、プラズマ処理装置の全体的な構成を示す斜視図、図2は、プラズマ処理装置の断面構成を説明する図、図3は、図2の要部を拡大して示した図、図4は、図3の要部を更に拡大して示した図、図5は、電極板を構成する各板の複数の小孔のサイズ及び位置関係を説明する図である。
Claims (5)
- 反応容器内に配設した電極板と、
前記反応容器内に前記電極板に対向させて平行に配設した対向電極と、
前記電極板の前記対向電極に対向しない非対向側から接続され、前記電極板に周波電力を供給する伝送路と、
ガス供給機能を果たすと共に、前記電極板に貫通接続して該電極板に電気供給機能を果たす金属管と、よりなり、
前記電極板は、主電極板とその下方に複数の小孔を有する第1拡散板と、第2拡散板と、シャワー板と、から構成され、
しかも前記電極板は、主電極板、第1拡散板、第2拡散板及びシャワー板の4枚の板状の部材を面平行に順次に並設し、かつ、前記主電極板と第1拡散板の間隔D1、第1拡散板と第2拡散板の間隔D2、第2拡散板とシャワー板の間隔D3の間には「D1>D2≒D3」の関係が成立し、
前記主電極板と第1拡散板の間の空間に、前記金属管の第1空間露出部分を周方向に露出した複数のガス噴出口を設け、
さらに、前記第1拡散板の複数の小孔の径R1、第2拡散板の複数の小孔の径R2、シャワー板15の複数の小孔の径R3の間には「R1>R2>R3」の関係が成立するとともに、
第1拡散板の複数の小孔による開口率H1、第2拡散板の複数の小孔による開口率H2、シャワー板の複数の小孔による開口率H3の間には「H1<H2<H3」の関係が成立するよう構成したことを特徴とするプラズマ処理装置。 - 前記第1拡散板、第2拡散板及びシャワー板に形成される複数の小孔の形成位置は、上下方向を通して互いに重なり合わないよう万遍なく配設したことを特徴とする請求項1に記載のプラズマ処理装置。
- 前記電極板に周波電力を供給する伝送路は、1の周波電力発生器と、
前記周波電力発生器と反応容器内のプラズマ空間とのインピーダンスの整合をとる1の整合器と、
前記整合器の出力を伝送する伝送路と、
前記伝送路からの周波電力を分配する長さ、抵抗値、を略同等に揃えた複数枚の略直交する羽根状の枝板から構成した分配伝送板と、よりなり、
各分配伝送板はそれぞれ前記金属管に接続して前記電極板に前記周波電力を供給することを特徴とする請求項1に記載のプラズマ処理装置。 - 前記電極板に貫通接続して該電極板に電気供給機能を果たす金属管は、当該貫通接続部において、前記電極板を構成する主電極板と、第1拡散板、第2拡散板及びシャワー板のそれぞれに電気的に接続され、当該貫通接続部から周波電力を、主電極板、第1拡散板、第2拡散板及びシャワー板に供給するよう構成したことを特徴とする請求項1に記載のプラズマ処理装置。
- ガス供給機能を果たすと共に、前記電極板に貫通接続して該電極板に電気供給機能を果たす金属管は、絶縁性連通路の内部に設けられ、ガス供給路を通すと共に、前記電極板と電気的に接続されて、ガスと電気の貫通接続部を形成し、当該貫通接続部から前記複数のガス噴出口へのガスの供給と、前記電極板への周波電力の供給とを行うよう構成したことを特徴とする請求項1に記載のプラズマ処理装置。
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