JP6637631B2 - Decontamination method using chlorine dioxide gas - Google Patents
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Description
本発明は、二酸化塩素の気相付与による閉鎖空間の除染方法に関する。 The present invention relates to a method for decontaminating a closed space by applying a gas phase of chlorine dioxide.
ホルマリンによる除染方法は、ホルムアルデヒドの優れた浸透力から医薬品製造施設等における除染方法の主流として活用されてきた。しかし、発がん性の懸念から各国においてホルマリンの使用規制が強化されたため、除染作業における過酸化水素や過酢酸等のホルマリン代替薬品の検討が進んでいる。 The decontamination method using formalin has been utilized as a main decontamination method in pharmaceutical manufacturing facilities and the like due to the excellent penetrability of formaldehyde. However, regulations on the use of formalin have been tightened in various countries due to concerns about carcinogenicity, and studies on formalin substitutes such as hydrogen peroxide and peracetic acid in decontamination work are in progress.
過酸化水素は、凝縮による生産装置や内装建材の腐食が懸念されること、また残留ガスの除去に時間がかかることから、特に異物の混入が厳しく制限される無菌室の除染においては使用が困難となる場合がある。また、過酢酸製剤は通常霧状で使用されることから、気中拡散性に劣り、広い空間の除染には適していないという問題がある。 Hydrogen peroxide is not recommended for use in decontamination of sterile rooms, where contamination of production equipment and interior building materials is likely to be corroded due to condensation and removal of residual gas takes time. It can be difficult. In addition, since the peracetic acid preparation is usually used in the form of a mist, it has poor air diffusibility and is not suitable for decontamination of a wide space.
二酸化塩素ガスは、アメリカ環境保護局（Environmental Protection Agency，EPA）において燻蒸の滅菌剤として１９８８年より認可されている。また、環境消毒や無菌操作が求められるバイオセイフティキャビネット内を二酸化塩素ガスで滅菌する方法は、米国国家規格協会（ＡＮＳＩ）によって規格化されている。 Chlorine dioxide gas has been approved by the United States Environmental Protection Agency (EPA) since 1988 as a fumigation sterilant. A method of sterilizing a biosafety cabinet, which requires environmental disinfection and aseptic operation, with chlorine dioxide gas is standardized by the American National Standards Institute (ANSI).
特許文献１には、閉鎖空間に環境制御下で所定のＣＴ値の二酸化塩素ガスを導入することによる除染方法が開示されている。 Patent Document 1 discloses a decontamination method by introducing chlorine dioxide gas having a predetermined CT value into an enclosed space under environmental control.
本発明は、防菌、防カビ対策が必要な施設を対象として、除染を必要とする空間内の内容物を腐食することなく、従来に比べ安全かつ短時間に大空間の除染が可能な除染方法を提供するものである。 The present invention enables safe and short-time decontamination of large spaces in facilities that require antibacterial and antifungal measures without corroding the contents in the space that requires decontamination, compared to conventional methods. It provides a simple decontamination method.
本発明者らは、上記課題解決のため鋭意検討した結果、閉鎖空間に、所定の水蒸気量以下の環境下、二酸化塩素ガスを導入することにより、空間内の内容物を腐食することなく、従来に比べ安全かつ短時間に除染を実施できることを見出し、本発明を完成させた。 The present inventors have conducted intensive studies to solve the above problems, and as a result, by introducing chlorine dioxide gas into an enclosed space under an environment of a predetermined amount of water vapor or less, the contents in the space are not corroded, The present inventors have found that decontamination can be performed safely and in a short time as compared with the present invention, and have completed the present invention.
すなわち、本発明は、
〔１〕閉鎖空間内での二酸化塩素の気相付与によって汚染物質を除去し、かつ前記閉鎖空間内にある内容物の化学腐食を低減する方法であって：
水蒸気量１０ｇ／ｍ3以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度１０〜２３０ｐｐｍ、かつＣＴ値５０〜２０００ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む方法、
That is, the present invention
[1] A method for removing contaminants by vapor phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in the enclosed space, comprising:
In the enclosed space under an environment having a water vapor amount of 10 g / m 3 or less;
Generating chlorine dioxide gas;
Introducing a chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 10 to 230 ppm, and a CT value of 50 to 2000 ppm · hour,
〔２〕閉鎖空間内での二酸化塩素の気相付与によって汚染物質を除去し、かつ前記閉鎖空間内にある内容物の化学腐食を低減する方法であって：
水蒸気量１０ｇ／ｍ3以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度２０〜２３０ｐｐｍ、かつＣＴ値６０〜２０００ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む、〔１〕記載の方法、
[2] A method for removing contaminants by vapor phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in the enclosed space, comprising:
In the enclosed space under an environment having a water vapor amount of 10 g / m 3 or less;
Generating chlorine dioxide gas;
Introducing a chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 20 to 230 ppm and a CT value of 60 to 2000 ppm · hour,
〔３〕汚染物質を３ｌｏｇ低減するのに有効な二酸化塩素ガス濃度１０〜１００ｐｐｍ、かつＣＴ値５０〜２００ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [3] a step of introducing chlorine dioxide gas into an enclosed space at a chlorine dioxide gas concentration of 10 to 100 ppm effective to reduce pollutants by 3 logs and a CT value of 50 to 200 ppm · hour, [1] or [2] The method described,
〔４〕汚染物質を３ｌｏｇ低減するのに有効な二酸化塩素ガス濃度２０〜１００ｐｐｍ、かつＣＴ値６０〜１５０ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [4] including a step of introducing chlorine dioxide gas into an enclosed space at a chlorine dioxide gas concentration of 20 to 100 ppm effective to reduce pollutants by 3 logs and a CT value of 60 to 150 ppm · hour, [1] or [2]. The method described,
〔５〕汚染物質を４ｌｏｇ低減するのに有効な二酸化塩素ガス濃度２０〜１５０ｐｐｍ、かつＣＴ値１００〜３３０ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [5] including a step of introducing chlorine dioxide gas into an enclosed space at a chlorine dioxide gas concentration of 20 to 150 ppm effective to reduce contaminants by 4 logs and a CT value of 100 to 330 ppm. [1] or [2] The method described,
〔６〕汚染物質を４ｌｏｇ低減するのに有効な二酸化塩素ガス濃度５０〜１５０ｐｐｍ、かつＣＴ値１５０〜３３０ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [6] a step of introducing chlorine dioxide gas into an enclosed space at a concentration of 50 to 150 ppm of chlorine dioxide gas effective to reduce contaminants by 4 logs and a CT value of 150 to 330 ppm · hour, [1] or [2] The method described,
〔７〕汚染物質を５ｌｏｇ低減するのに有効な二酸化塩素ガス濃度４０〜２００ｐｐｍ、かつＣＴ値１３０〜６００ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [7] including a step of introducing chlorine dioxide gas into an enclosed space at a chlorine dioxide gas concentration of 40 to 200 ppm effective to reduce pollutants by 5 logs and a CT value of 130 to 600 ppm · hour, [1] or [2]. The method described,
〔８〕汚染物質を５ｌｏｇ低減するのに有効な二酸化塩素ガス濃度８０〜２００ｐｐｍ、かつＣＴ値３００〜６００ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [8] including a step of introducing chlorine dioxide gas into an enclosed space at a chlorine dioxide gas concentration of 80 to 200 ppm effective for reducing pollutants by 5 logs and a CT value of 300 to 600 ppm · hour, [1] or [2]. The method described,
〔９〕汚染物質を６ｌｏｇ低減するのに有効な二酸化塩素ガス濃度５０〜２３０ｐｐｍ、かつＣＴ値４００〜２０００ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [9] a step of introducing chlorine dioxide gas into an enclosed space at a chlorine dioxide gas concentration of 50 to 230 ppm effective to reduce contaminants by 6 logs and a CT value of 400 to 2000 ppm. [1] or [2] The method described,
〔１０〕汚染物質を６ｌｏｇ低減するのに有効な二酸化塩素ガス濃度１００〜２３０ｐｐｍ、かつＣＴ値５００〜２０００ｐｐｍ・時で二酸化塩素ガスを閉鎖空間へ導入する工程を含む、〔１〕または〔２〕記載の方法、 [10] a step of introducing chlorine dioxide gas into an enclosed space at a chlorine dioxide gas concentration of 100 to 230 ppm effective for reducing contaminants by 6 logs and a CT value of 500 to 2000 ppm. [1] or [2] The method described,
〔１１〕閉鎖空間内の相対湿度が６０％以下である、〔１〕〜〔１０〕のいずれかに記載の方法、 [11] The method according to any one of [1] to [10], wherein the relative humidity in the enclosed space is 60% or less.
〔１２〕閉鎖空間内の相対湿度が４５％以下である、〔１〕〜〔１０〕のいずれかに記載の方法、 [12] The method according to any one of [1] to [10], wherein the relative humidity in the enclosed space is 45% or less.
〔１３〕汚染物質が、細菌、真菌、およびウイルスからなる群から選ばれる１種以上である、〔１〕〜〔１２〕のいずれかに記載の方法、 [13] The method according to any one of [1] to [12], wherein the contaminant is one or more selected from the group consisting of bacteria, fungi, and viruses.
〔１４〕汚染物質が、芽胞形成菌である、〔１〕〜〔１２〕のいずれかに記載の方法、に関する。 [14] The method according to any one of [1] to [12], wherein the contaminant is a spore-forming bacterium.
本発明によれば、防菌、防カビ対策が必要な施設を対象として、除染を必要とする空間内の内容物を腐食することなく、従来に比べ安全で短時間に大空間の除染を行うことができる。したがって、本発明は、特に異物の混入が厳しく制限される医薬品工場や食品工場等における除染の際に非常に有用な手法となり得る。 According to the present invention, for facilities requiring antibacterial and antifungal measures, the decontamination of large spaces can be performed more safely and in a shorter time than before without corroding the contents in the spaces that require decontamination. It can be performed. Therefore, the present invention can be a very useful technique particularly in the case of decontamination in a pharmaceutical factory, a food factory, or the like in which contamination of foreign substances is severely restricted.
以下、本発明の構成について詳述する。 Hereinafter, the configuration of the present invention will be described in detail.
＜二酸化塩素ガスの特徴＞
二酸化塩素ガスは、解放系では揮散しやすいという特徴を有し、汚染物質の除去に有効な濃度まで迅速に濃度を上昇させることができる。また、狭隘な空間にも進入しやすいことから、狭隘な空間に存在する汚染物質に対しても十分に除去効果を発揮することができる。
<Characteristics of chlorine dioxide gas>
Chlorine dioxide gas has a characteristic that it is easy to volatilize in an open system, and can rapidly increase the concentration to a concentration effective for removing pollutants. Further, since it is easy to enter a narrow space, a sufficient effect of removing contaminants existing in the narrow space can be exerted.
二酸化塩素は、殺菌力が非常に優れており、殺菌消毒液として一般に使用されている無水エタノールの約５０万倍、グルコン酸クロルヘキシジンの約１００倍、塩化ベンザルコニウムの約１００倍、次亜塩素酸ナトリウムの約１０倍の殺菌力を有している。また、二酸化塩素は、塩素のようにｐＨ値の上昇による殺菌力の低下が見られず、広範囲なｐＨ領域での有効性が認められている。 Chlorine dioxide has a very good bactericidal activity, about 500,000 times that of anhydrous ethanol, about 100 times that of chlorhexidine gluconate, about 100 times that of benzalkonium chloride, and hypochlorite, which are generally used as a disinfectant. It has about 10 times the sterilizing power of sodium acid. Further, chlorine dioxide does not show a decrease in bactericidal activity due to an increase in pH value unlike chlorine, and its effectiveness in a wide pH range has been recognized.
二酸化塩素は、抗菌スペクトルが幅広く、細菌、真菌、ウイルス等の汚染物質に対し優れた滅菌および殺菌効果を示す。例えば、大腸菌やサルモネラ菌の他、レジオネラ菌、緑膿菌、腸炎ビブリオ、乳酸球菌、乳酸桿菌、セレウス菌、クロストリジウム、カンピロバクター、クラドスポリウム、フザリウム、クモノスカビ、青カビ、白癬菌等に対する殺菌試験でその効果が確認されている。また、インフルエンザウイルス、ノロウイルス、ＨＩＶ、Ｂ型肝炎ウイルス、ロタウイルス、イヌパルボウイルス等のウイルスに対する不活化も確認されている。 Chlorine dioxide has a broad antibacterial spectrum and exhibits excellent sterilization and bactericidal effects on contaminants such as bacteria, fungi, and viruses. For example, in addition to Escherichia coli and Salmonella, Legionella, Pseudomonas aeruginosa, Vibrio parahaemolyticus, Lactococcus, Lactobacillus, Bacillus cereus, Clostridium, Campylobacter, Cladosporium, Fusarium, Lactobacillus, Blue mold, Trichophyton, etc. Has been confirmed. Inactivation against viruses such as influenza virus, norovirus, HIV, hepatitis B virus, rotavirus and canine parvovirus has also been confirmed.
二酸化塩素は化学構造的に安定であり、発がん性物質を生成せず、かつ人体に対する毒性も少なく安全性が高い等の利点もある。 Chlorine dioxide has advantages in that it is chemically stable, does not generate carcinogenic substances, has low toxicity to the human body, and has high safety.
二酸化塩素ガスは、比較的短時間で分解される。そのため、除染処理後の後処理の手間や労力が省かれる。 Chlorine dioxide gas is decomposed in a relatively short time. Therefore, labor and labor for post-processing after the decontamination processing are omitted.
＜汚染物質の除去について＞
本実施形態に係る除染方法によれば、閉鎖空間内での二酸化塩素の気相付与によって汚染物質を短時間で効果的に除去することができる。
<Removal of pollutants>
According to the decontamination method according to the present embodiment, contaminants can be effectively removed in a short time by applying the gas phase of chlorine dioxide in the closed space.
本実施形態において「閉鎖空間」とは、完全に密閉された空間である必要はなく、二酸化塩素ガスが空間内において充満されるような空間であればよい。このような空間であれば、本発明の効果を十分に得ることができる。「閉鎖空間」は特に制限されないが、異物の混入が厳しく制限される、医薬品工場、食品工場、病院、研究所等の施設おける製造ライン、作業室、実験室、手術室等において好適に実施され、これらは密閉された空間であることがより好ましい。 In the present embodiment, the “closed space” does not need to be a completely closed space, but may be any space in which chlorine dioxide gas is filled in the space. In such a space, the effects of the present invention can be sufficiently obtained. The `` closed space '' is not particularly limited, but is preferably implemented in a production line, a working room, a laboratory, an operating room, and the like in facilities such as a pharmaceutical factory, a food factory, a hospital, and a laboratory in which contamination of foreign substances is severely restricted. It is more preferable that these are closed spaces.
「閉鎖空間」には、金属製物体、非金属製物体、およびそれらの組み合わせからなる群から選択される内容物を含むことができる。閉鎖空間内の金属製物体は、鋼、アルミニウム、鉄、銅、クロム、鉛、およびそれらの組み合わせからなる群から選択される金属から形成されることができる。非金属製物体は、木材、れんが、石材、シンダーコンクリート、セラミックタイル、天井タイル、カーペット、織物、およびそれらの組み合わせからなる群から選択される材料から形成されることができる。内容物の具体例としては、例えば、生産装置、製造機械、空調機、除湿機、計測器、分析機器、電子機器（例えば、電話機器、コンピューター、コピー機および他の電子オフィス機器）、照明機器、音響機器、内部建材および配管、実験器具、手術用具、工具、その他の備品等が挙げられる。 "Enclosed space" can include a content selected from the group consisting of metal objects, non-metal objects, and combinations thereof. The metallic object in the enclosed space can be formed from a metal selected from the group consisting of steel, aluminum, iron, copper, chromium, lead, and combinations thereof. The non-metallic object can be formed from a material selected from the group consisting of wood, brick, stone, cinder concrete, ceramic tile, ceiling tile, carpet, fabric, and combinations thereof. Specific examples of contents include, for example, production equipment, manufacturing machinery, air conditioners, dehumidifiers, measuring instruments, analytical instruments, electronic equipment (eg, telephone equipment, computers, copiers and other electronic office equipment), lighting equipment. , Audio equipment, internal building materials and piping, laboratory instruments, surgical tools, tools, and other fixtures.
本実施形態における「汚染物質」としては、例えば、細菌、真菌、ウイルス等が挙げられる。また、本実施形態における「汚染物質の除去方法」とは、前記汚染物質を、消毒、殺菌および／または滅菌する方法を意味する。 Examples of the “contaminant” in the present embodiment include bacteria, fungi, viruses, and the like. The “contaminant removal method” in the present embodiment means a method of disinfecting, sterilizing, and / or sterilizing the contaminant.
「細菌」とは、ウイルスよりも大きく、硬い細胞壁を持つ単細胞の微生物である。細菌としては、例えば、ボツリヌス菌、ウェルシュ菌、セレウス菌、枯草菌、破傷風菌、炭疽菌等の芽胞形成菌や、ブドウ球菌、大腸菌、サルモネラ菌、レジオネラ菌、緑膿菌、コレラ菌、結核菌、レンサ球菌、腸炎ビブリオ等が挙げられる。本実施形態においては、乾燥、高温、薬品等に強い抵抗性を示し除去が困難とされる、前記に例示される芽胞形成菌に対しても高い除去効果を発揮する。芽胞形成菌としては、例えば、バシラス属（Bacillus）、クロストリジウム属（Clostridium）等が挙げられる。 "Bacteria" are unicellular microorganisms that are larger than viruses and have a hard cell wall. As bacteria, for example, spore-forming bacteria such as Clostridium botulinum, C. perfringens, Bacillus cereus, Bacillus subtilis, tetanus, anthrax, Staphylococcus, Escherichia coli, Salmonella, Legionella, Pseudomonas aeruginosa, Cholera, Mycobacterium tuberculosis, Streptococci, Vibrio parahaemolyticus and the like. In the present embodiment, a high elimination effect is also exerted on the spore-forming bacteria exemplified above, which exhibit high resistance to drying, high temperature, chemicals and the like and are difficult to remove. Examples of the spore-forming bacteria include the genus Bacillus and the genus Clostridium.
「真菌」とは、菌類のうち、細菌および変形菌（粘菌）を除くものの総称であって、カビ類、キノコ類、酵母類等が含まれる。 “Fungus” is a generic term for fungi excluding bacteria and deformed bacteria (slime molds), and includes molds, mushrooms, yeasts, and the like.
「ウイルス」とは、中心の核酸（ＤＮＡもしくはＲＮＡのいずれか）がカプシドと呼ばれる殻に包まれた単純な構造を有している構造体のことをいう。ウイルスとしては、例えば、エボラウイルス、ノロウイルス、ロタウイルス、インフルエンザウイルス、アデノウイルス、コロナウイルス、麻疹ウイルス、風疹ウイルス、肝炎ウイルス、ヘルペスウイルス、ＨＩＶ等が挙げられる。 "Virus" refers to a structure having a simple structure in which a central nucleic acid (either DNA or RNA) is wrapped in a shell called a capsid. Examples of the virus include Ebola virus, Norovirus, rotavirus, influenza virus, adenovirus, coronavirus, measles virus, rubella virus, hepatitis virus, herpes virus, HIV and the like.
本実施形態において、３ｌｏｇ低減、４ｌｏｇ低減、５ｌｏｇ低減、６ｌｏｇ低減とは、それぞれ、バイオロジカルインジケーター（ＢＩ）に担持された初期菌数に対して、殺菌操作により残存した菌数がどの位のオーダーまで低減したかを表す指標である。具体的には、例えば、初期菌数が2.8×106 c.f.u.の場合、３ｌｏｇ低減は菌数が2.8×103 c.f.u.以下、４ｌｏｇ低減は菌数が2.8×102 c.f.u.以下、５ｌｏｇ低減は菌数が2.8×10 c.f.u.以下、６ｌｏｇ低減は菌数が2.8c.f.u.以下となることを示す。 In the present embodiment, 3 log reduction, 4 log reduction, 5 log reduction, and 6 log reduction respectively mean the order of the number of bacteria remaining by the sterilization operation with respect to the initial number of bacteria carried on the biological indicator (BI). It is an index that indicates whether it has been reduced. Specifically, for example, when the initial number of bacteria is 2.8 × 10 6 cfu, 3 log reduction means that the number of bacteria is 2.8 × 10 3 cfu or less; 4 log reduction means that the number of bacteria is 2.8 × 10 2 cfu or less; Is 2.8 × 10 cfu or less, and a 6 log reduction indicates that the number of bacteria is 2.8 cfu or less.
本実施形態において「消毒する」とは、閉鎖空間および閉鎖空間の内容物を清浄化するプロセスを指し、一般的には、生菌の３ｌｏｇ低減、すなわち９９．９％以上の減少を指す。 In this embodiment, "disinfect" refers to the process of cleaning the enclosed space and the contents of the enclosed space, and generally refers to a 3 log reduction of viable bacteria, ie, a reduction of 99.9% or more.
本実施形態において「殺菌する」とは、閉鎖空間および閉鎖空間の内容物上にある病原体を除去するまたはこれらを不活性化させるプロセス、例えば、病原菌および／または細菌を殺作用するまたは無害化するプロセスを指し、一般的には、生菌の４ｌｏｇ低減、すなわち９９．９９％以上の減少を指す。 In this embodiment, "disinfect" refers to the process of removing or inactivating pathogens on the enclosed space and the contents of the enclosed space, for example, killing or detoxifying pathogens and / or bacteria. Refers to the process and generally refers to a 4 log reduction of viable bacteria, ie a reduction of 99.99% or more.
本実施形態において「滅菌する」とは、微生物の生存能力を完全に除去するプロセス、例えば、非病原性および病原性の胞子、真菌、細菌、およびウイルスを全て殺作用することを指し、一般的には、生菌の６ｌｏｇ低減、すなわち９９．９９９９％以上の減少を指す。これは、統計学的には、微生物およびそれらの胞子を全て破壊すること、すなわち生菌生存率が０であるものと当業者に理解される。 "Sterilize" in this embodiment refers to a process that completely eliminates the viability of microorganisms, for example, killing all non-pathogenic and pathogenic spores, fungi, bacteria, and viruses, and Refers to a 6 log reduction of viable bacteria, ie a reduction of 99.9999% or more. This is statistically understood by those skilled in the art as destroying all microorganisms and their spores, ie, a viable cell viability of zero.
＜環境条件の設定＞
本実施形態では、除染される閉鎖空間内の水蒸気量が１０ｇ／ｍ3以下に調整されることを特徴とする。閉鎖空間内の相対湿度が低い場合であっても、水蒸気量が１０ｇ／ｍ3以上となった場合、特に表面処理が施されていない鉄、アルミニウム、銅などは腐食の発生リスクが高くなり、従来から除染時に実施されている相対湿度による室内管理（例えば、特許文献１）では、内容物の腐食を防止するのに不十分であった。また、閉鎖空間内の水蒸気量を１０ｇ／ｍ3以下とすることにより、二酸化塩素ガスの拡散がより良好となる利点がある。閉鎖空間内の水蒸気量が、二酸化塩素発生時から除染終了時まで１０ｇ／ｍ3以下に維持されていれば、本発明の効果を十分に得ることができる。好ましくは９．５ｇ／ｍ3以下であり、より好ましくは９．０ｇ／ｍ3以下であり、さらに好ましくは８．５ｇ／ｍ3以下であり、特に好ましくは８．０ｇ／ｍ3以下である。閉鎖空間内の水蒸気量の下限値は特に制限されないが、例えば、０．１ｇ／ｍ3以上、０．５ｇ／ｍ3以上、１．０ｇ／ｍ3以上、２．０ｇ／ｍ3以上、３．０ｇ／ｍ3以上、４．０ｇ／ｍ3以上とすることができる。
<Setting environmental conditions>
This embodiment is characterized in that the amount of water vapor in the enclosed space to be decontaminated is adjusted to 10 g / m 3 or less. Even when the relative humidity in the enclosed space is low, when the amount of water vapor is 10 g / m 3 or more, particularly, iron, aluminum, copper, etc., which have not been subjected to surface treatment, increase the risk of corrosion, Conventionally, indoor management based on relative humidity at the time of decontamination (for example, Patent Document 1) has been insufficient to prevent corrosion of contents. Further, by setting the amount of water vapor in the closed space to 10 g / m 3 or less, there is an advantage that the diffusion of chlorine dioxide gas becomes better. If the amount of water vapor in the closed space is maintained at 10 g / m 3 or less from the generation of chlorine dioxide to the end of decontamination, the effect of the present invention can be sufficiently obtained. Preferably at 9.5 g / m 3 or less, more preferably 9.0 g / m 3 or less, more preferably 8.5 g / m 3 or less, particularly preferably at 8.0 g / m 3 or less . Although the lower limit of the amount of water vapor in the enclosed space is not particularly limited, for example, 0.1 g / m 3 or more, 0.5 g / m 3 or more, 1.0 g / m 3 or more, 2.0 g / m 3 or more, .0g / m 3 or more, it may be 4.0 g / m 3 or more.
閉鎖空間内の温度（乾球温度）は、３１℃以下に調整されることが好ましい。この範囲内であれば、相対湿度が３１％以下において常に水蒸気量が１０ｇ／ｍ3以下となる（図５参照）。閉鎖空間内の室温は、好ましくは５〜３１℃であり、より好ましくは１６〜３０℃であり、さらに好ましくは１８〜２８℃であり、特に好ましくは２０〜２６℃である。 It is preferable that the temperature in the closed space (dry bulb temperature) is adjusted to 31 ° C. or lower. Within this range, the water vapor amount is always 10 g / m 3 or less when the relative humidity is 31% or less (see FIG. 5). The room temperature in the closed space is preferably 5 to 31 ° C, more preferably 16 to 30 ° C, further preferably 18 to 28 ° C, and particularly preferably 20 to 26 ° C.
閉鎖空間内の相対湿度は、好ましくは６０％以下であり、より好ましくは４５％以下であり、より好ましくは３７％以下であり、より好ましくは３１％以下であり、さらに好ましくは３０％以下であり、特に好ましくは２８％以下である。閉鎖空間内の相対湿度の下限値は特に制限されないが、例えば、０．１％以上、０．５％以上、１．０％以上、５．０％以上、１０％以上、１５％以上、２０％以上とすることができる。 The relative humidity in the enclosed space is preferably at most 60%, more preferably at most 45%, more preferably at most 37%, more preferably at most 31%, even more preferably at most 30%. And particularly preferably at most 28%. Although the lower limit of the relative humidity in the enclosed space is not particularly limited, for example, 0.1% or more, 0.5% or more, 1.0% or more, 5.0% or more, 10% or more, 15% or more, 20% or more % Or more.
水蒸気量（ｇ／ｍ3）は、気体の状態方程式に水蒸気分圧（ｈＰａ）および乾球温度（℃）を代入することにより求めることができる。水蒸気分圧（ｈＰａ）は、飽和水蒸気圧（ｈＰａ）に相対湿度（％）を掛けることにより求めることができる。飽和水蒸気圧（ｈＰａ）は、Ｔｅｌｅｎｓ（１９３０）の式に乾球温度（℃）を代入することにより求めることができる。図５に、相対湿度（％）と乾球温度（℃）より求めた水蒸気量換算表を示す。 The amount of water vapor (g / m 3 ) can be determined by substituting the partial pressure of water vapor (hPa) and the dry-bulb temperature (° C.) into the equation of state of the gas. The water vapor partial pressure (hPa) can be determined by multiplying the saturated water vapor pressure (hPa) by the relative humidity (%). The saturated water vapor pressure (hPa) can be determined by substituting the dry bulb temperature (° C.) into the equation of Telens (1930). FIG. 5 shows a water vapor amount conversion table obtained from the relative humidity (%) and the dry bulb temperature (° C.).
なお、本実施形態では、閉鎖空間内の水蒸気量が１０ｇ／ｍ3以下であることが管理されていれば、除染中において空調機および／または除湿機を稼働することを必ずしも要しない。 In the present embodiment, it is not always necessary to operate the air conditioner and / or the dehumidifier during the decontamination as long as the amount of water vapor in the closed space is controlled to be 10 g / m 3 or less.
＜二酸化塩素の発生＞
二酸化塩素ガスを発生させる発生源としては特に限定されないが、例えば、二酸化塩素が溶存された二酸化塩素水が挙げられる。このような二酸化塩素水からは、溶存された二酸化塩素ガスが遊離される。二酸化塩素水に溶存される二酸化塩素の濃度としては特に限定されず、衛生管理すべき空間の容積や、目的とする二酸化塩素ガス濃度に応じて適宜調整される。二酸化塩素は、例えば０．０１〜０．８質量％となるように溶存されていればよい。本実施形態では、二酸化塩素水に対して、溶液中に空気を送り込む方法（エアレーション）、減圧する方法、送風する方法等を採用して、二酸化塩素ガスの遊離が促されてもよい。これらの中でも、二酸化塩素水に対してエアレーションを行うことにより、二酸化塩素ガスの遊離が促されやすく、除染される閉鎖空間の二酸化塩素ガス濃度は高められやすい。その結果、除染の所要時間は短縮化されやすい。
<Generation of chlorine dioxide>
The source for generating the chlorine dioxide gas is not particularly limited, and includes, for example, chlorine dioxide water in which chlorine dioxide is dissolved. From such chlorine dioxide water, dissolved chlorine dioxide gas is released. The concentration of chlorine dioxide dissolved in the chlorine dioxide water is not particularly limited, and is appropriately adjusted according to the volume of the space to be sanitized and the intended concentration of chlorine dioxide gas. The chlorine dioxide may be dissolved, for example, in an amount of 0.01 to 0.8% by mass. In the present embodiment, liberation of chlorine dioxide gas may be promoted by employing a method of sending air (aeration), a method of reducing pressure, a method of blowing air, or the like to the chlorine dioxide water. Among these, by performing aeration on chlorine dioxide water, release of chlorine dioxide gas is easily promoted, and the concentration of chlorine dioxide gas in a closed space to be decontaminated is easily increased. As a result, the time required for decontamination is likely to be reduced.
上記の他に、二酸化塩素ガスを発生させる発生源としては、例えば、亜塩素酸ナトリウム水溶液と、塩素、無機酸または有機酸とを製剤化した製剤が挙げられる。無機酸としては、塩酸、硫酸等が例示される。有機酸としては、クエン酸、乳酸、ピルビン酸、リンゴ酸、酒石酸、グルコン酸、グリコール酸、フマル酸、マロン酸、マレイン酸、シュウ酸、コハク酸、アクリル酸等が例示される。亜塩素酸ナトリウム水溶液と、これら塩素、無機酸または有機酸との反応により、二酸化塩素ガスが簡便に生成される。また、これら簡便な反応系は、わずか２種類の原料を適切に混合するだけであるため、製剤化されやすく、かつ、利用者が利用しやすい。製剤としては、亜塩素酸ナトリウムと、塩素、無機酸または有機酸とが適宜反応し得るように調整されたスプレー剤、くん煙剤、ゲル剤、シート剤、スティック剤等が例示される。 In addition to the above, as a source for generating chlorine dioxide gas, for example, a formulation in which an aqueous solution of sodium chlorite and chlorine, an inorganic acid, or an organic acid are formulated may be mentioned. Examples of the inorganic acid include hydrochloric acid and sulfuric acid. Examples of the organic acid include citric acid, lactic acid, pyruvic acid, malic acid, tartaric acid, gluconic acid, glycolic acid, fumaric acid, malonic acid, maleic acid, oxalic acid, succinic acid, and acrylic acid. Chlorine dioxide gas is easily generated by the reaction between the aqueous solution of sodium chlorite and the chlorine, inorganic acid or organic acid. In addition, since these simple reaction systems simply mix only two types of raw materials appropriately, they are easy to formulate and are easy for users to use. Examples of the preparation include a spray, a smoker, a gel, a sheet, a stick and the like prepared so that sodium chlorite and chlorine, an inorganic acid or an organic acid can react appropriately.
亜塩素酸ナトリウム水溶液と、塩素、無機酸または有機酸とを反応させる際の配合割合としては特に限定されず、使用する原料の種類により適宜選択される。例えば、亜塩素酸ナトリウム水溶液と塩酸とが選択される場合には、亜塩素酸ナトリウム１〜２５質量％に対して、塩酸が０．３〜１５質量％配合されればよい。この場合において、亜塩素酸ナトリウム５〜２５質量％に対して塩酸が１．５〜１２質量％配合されることが好ましく、亜塩素酸ナトリウム１０〜２５質量％に対して塩酸が３〜１２質量％配合されることがより好ましい。亜塩素酸ナトリウムの配合量が１質量％未満の場合、必要とされる亜塩素酸ナトリウム水溶液の量が増え、利便性が低下する傾向がある。一方、亜塩素酸ナトリウムの配合量が２５質量％を超える場合、毒物劇物取締法に規定される劇物に該当し、取扱いが制限され、製剤化が困難となる傾向がある。 The mixing ratio when reacting the aqueous solution of sodium chlorite with chlorine, an inorganic acid or an organic acid is not particularly limited, and is appropriately selected depending on the type of raw materials used. For example, when an aqueous sodium chlorite solution and hydrochloric acid are selected, 0.3 to 15% by mass of hydrochloric acid may be blended with respect to 1 to 25% by mass of sodium chlorite. In this case, it is preferable to add 1.5 to 12% by mass of hydrochloric acid to 5 to 25% by mass of sodium chlorite, and 3 to 12% by mass of hydrochloric acid to 10 to 25% by mass of sodium chlorite. % Is more preferable. When the amount of sodium chlorite is less than 1% by mass, the required amount of the aqueous solution of sodium chlorite increases, and the convenience tends to decrease. On the other hand, when the blending amount of sodium chlorite exceeds 25% by mass, it corresponds to a deleterious substance specified by the Toxic and Deleterious Substances Control Law, handling is restricted, and formulation tends to be difficult.
＜二酸化塩素の導入＞
閉鎖空間に導入する二酸化塩素ガス濃度は、汚染物質を除去する効果を高める観点から、１０ｐｐｍ以上となるように使用されることが好ましく、１５ｐｐｍ以上がより好ましく、２０ｐｐｍ以上がさらに好ましい。また、二酸化塩素の気相付与による内容物の腐食を防止する観点から、２３０ｐｐｍ以下であることが好ましい。
<Introduction of chlorine dioxide>
The concentration of chlorine dioxide gas introduced into the enclosed space is preferably 10 ppm or more, more preferably 15 ppm or more, and still more preferably 20 ppm or more, from the viewpoint of enhancing the effect of removing pollutants. Further, from the viewpoint of preventing corrosion of contents caused by the gas phase application of chlorine dioxide, the content is preferably 230 ppm or less.
図２および図３は、それぞれ、８０ｐｐｍ以上の高濃度曝露試験および８０ｐｐｍ未満の低濃度曝露試験における二酸化塩素ガス濃度の経時変化を表す概略的なグラフである。縦軸は二酸化塩素ガス濃度（ｐｐｍ）を示し、横軸は時間（時）を示している。すなわち、例えば二酸化塩素ガスを発生する発生源から放出される場合には、時間の経過とともに徐々に空間内の濃度が高められる。その後、二酸化塩素ガスの濃度は、発生量よりも分解量が上回ることにより、最大濃度を示した後に減少する。本実施形態では、二酸化塩素ガスは、除染の過程において最大濃度が所定の濃度（例えば１０ｐｐｍ）以上となるように使用されることにより、除染効果を好適に発揮する。なお、本実施形態によれば、２種類の反応液（亜塩素酸ナトリウム水および塩酸）の反応量を薬液ポンプ吐出量で自動調整させ、必要な二酸化塩素ガスを閉鎖空間へ供給することにより、所定の二酸化塩素目標濃度まで高め、以降はほぼ一定の二酸化塩素ガス濃度となるように自動制御することができる。 FIGS. 2 and 3 are schematic graphs showing the time-dependent changes in the concentration of chlorine dioxide gas in the high concentration exposure test at 80 ppm or more and the low concentration exposure test at less than 80 ppm, respectively. The vertical axis indicates chlorine dioxide gas concentration (ppm), and the horizontal axis indicates time (hour). That is, for example, when the chlorine dioxide gas is emitted from a generation source, the concentration in the space is gradually increased with the passage of time. After that, the concentration of chlorine dioxide gas decreases after showing the maximum concentration because the decomposition amount exceeds the generation amount. In the present embodiment, the chlorine dioxide gas exhibits a decontamination effect suitably by being used so that the maximum concentration becomes a predetermined concentration (for example, 10 ppm) or more in the decontamination process. According to the present embodiment, the reaction amounts of the two kinds of reaction liquids (aqueous sodium chlorite and hydrochloric acid) are automatically adjusted by the discharge amount of the chemical pump, and the necessary chlorine dioxide gas is supplied to the closed space. The concentration can be automatically controlled so as to increase the concentration to a predetermined target concentration of chlorine dioxide and thereafter to keep the concentration of chlorine dioxide gas substantially constant.
本実施形態において「ＣＴ値」とは、「二酸化塩素ガスの濃度（ｐｐｍ）」と「時間（時）」との積分値である。例えば、図２および図３において、ＣＴ値は、横軸とグラフとにより画定される領域の面積として表される。濃度積算値と表現されることもある。 In the present embodiment, the “CT value” is an integrated value of “concentration (ppm) of chlorine dioxide gas” and “time (hour)”. For example, in FIGS. 2 and 3, the CT value is represented as the area of a region defined by the horizontal axis and a graph. It may be expressed as a concentration integrated value.
３ｌｏｇないし４ｌｏｇ低減のためには、二酸化塩素ガスが８０ｐｐｍ未満の低濃度曝露では少なくとも５０ｐｐｍ・時、８０ｐｐｍ以上の高濃度曝露では少なくとも１４０ｐｐｍ・時のＣＴ値を要する。高濃度曝露は、必要とする薬液が多くなること、また閉鎖空間内の内容物の腐食リスクを最小限にするため、３ｌｏｇないし４ｌｏｇ低減のためには、８０ｐｐｍ未満の低濃度曝露が好ましい。一方、５ｌｏｇないし６ｌｏｇ低減のためには、低濃度曝露では除染に長時間を要し非効率であり、高濃度曝露の方が効率的に菌数を低減できる。図６に、実施例１〜７の二酸化塩素ガスＣＴ値と残存菌数との関係を表すグラフを示す。低濃度曝露の条件で３ｌｏｇと４ｌｏｇを達成しているＣＴ値は、高濃度曝露の条件で３ｌｏｇと４ｌｏｇを達成しているＣＴ値よりも低い傾向であること、また高濃度曝露の条件で５ｌｏｇと６ｌｏｇを達成しているＣＴ値は、低濃度曝露の条件で５ｌｏｇと６ｌｏｇを達成しているＣＴ値よりも低い傾向であることがわかる。 In order to reduce 3 log to 4 log, a CT value of at least 50 ppm · hr is required at a low concentration exposure of chlorine dioxide gas of less than 80 ppm and at least 140 ppm · hr at a high concentration exposure of 80 ppm or more. A high concentration exposure is preferably less than 80 ppm to increase the required chemical solution and to minimize the risk of corrosion of the contents in the enclosed space by 3 to 4 logs. On the other hand, in order to reduce 5 logs to 6 logs, decontamination requires a long time for low concentration exposure and is inefficient, and high concentration exposure can reduce the number of bacteria more efficiently. FIG. 6 is a graph showing the relationship between the CT value of chlorine dioxide gas and the number of remaining bacteria in Examples 1 to 7. CT values achieving 3 log and 4 log under low exposure conditions tend to be lower than CT values achieving 3 log and 4 log under high exposure conditions, and 5 log values under high exposure conditions. It can be seen that the CT values achieving 6log and 6log tend to be lower than the CT values achieving 5log and 6log under the condition of low concentration exposure.
より具体的には、３ｌｏｇ低減のためには、二酸化塩素ガス濃度は１０〜１００ｐｐｍが好ましく；１５〜１００ｐｐｍがより好ましく；２０〜１００ｐｐｍがより好ましく；３０〜８０ｐｐｍがさらに好ましく；３０〜６０ｐｐｍが特に好ましい。ＣＴ値は、５０〜１５０ｐｐｍ・時が好ましく；５５〜１５０ｐｐｍ・時がより好ましく；６０〜１５０ｐｐｍ・時がより好ましく；９０〜１２０ｐｐｍ・時がさらに好ましく；１００〜１１０ｐｐｍ・時が特に好ましい。 More specifically, for reduction of 3 logs, the concentration of chlorine dioxide gas is preferably from 10 to 100 ppm; more preferably from 15 to 100 ppm; more preferably from 20 to 100 ppm; still more preferably from 30 to 80 ppm; preferable. The CT value is preferably from 50 to 150 ppm-hour; more preferably from 55 to 150 ppm-hour; more preferably from 60 to 150 ppm-hour; even more preferably from 90 to 120 ppm-hour; and particularly preferably from 100 to 110 ppm-hour.
４ｌｏｇ低減のためには、二酸化塩素ガス濃度は２０〜１５０ｐｐｍが好ましく；２５〜１５０ｐｐｍがより好ましく；５０〜１５０ｐｐｍがより好ましく；５０〜１００ｐｐｍがさらに好ましく；５０〜８０ｐｐｍが特に好ましい。ＣＴ値は、１００〜３３０ｐｐｍ・時が好ましく；１１０〜３３０ｐｐｍ・時がより好ましく；１５０〜３３０ｐｐｍ・時がより好ましく；１８０〜２５０ｐｐｍ・時がさらに好ましく；１９０〜２４０ｐｐｍ・時が特に好ましい。 For a 4 log reduction, the chlorine dioxide gas concentration is preferably from 20 to 150 ppm; more preferably from 25 to 150 ppm; more preferably from 50 to 150 ppm; still more preferably from 50 to 100 ppm; and particularly preferably from 50 to 80 ppm. The CT value is preferably from 100 to 330 ppm-hour; more preferably from 110 to 330 ppm-hour; more preferably from 150 to 330 ppm-hour; even more preferably from 180 to 250 ppm-hour; and particularly preferably from 190 to 240 ppm-hour.
５ｌｏｇ低減のためには、二酸化塩素ガス濃度は４０〜２００ｐｐｍが好ましく；６０〜２００ｐｐｍがより好ましく；８０〜２００ｐｐｍがより好ましく；８０〜１８０ｐｐｍがさらに好ましく；１００〜１５０ｐｐｍが特に好ましい。ＣＴ値は、１３０〜６００ｐｐｍ・時が好ましく；２００〜６００ｐｐｍ・時がより好ましく；３００〜６００ｐｐｍ・時がより好ましく；３３０〜４００ｐｐｍ・時がさらに好ましく；３５０〜３８０ｐｐｍ・時が特に好ましい。 For a 5 log reduction, the chlorine dioxide gas concentration is preferably from 40 to 200 ppm; more preferably from 60 to 200 ppm; more preferably from 80 to 200 ppm; still more preferably from 80 to 180 ppm; and particularly preferably from 100 to 150 ppm. The CT value is preferably from 130 to 600 ppm-hour; more preferably from 200 to 600 ppm-hour; more preferably from 300 to 600 ppm-hour; even more preferably from 330 to 400 ppm-hour; and particularly preferably from 350 to 380 ppm-hour.
６ｌｏｇ低減のためには、二酸化塩素ガス濃度は５０〜２３０ｐｐｍが好ましく；７０〜２３０ｐｐｍがより好ましく；１００〜２３０ｐｐｍがより好ましく；１３０〜２００ｐｐｍがさらに好ましく；１６０〜１９０ｐｐｍが特に好ましい。ＣＴ値は、４００〜２０００ｐｐｍ・時が好ましく；４５０〜２０００ｐｐｍ・時がより好ましく；５００〜２０００ｐｐｍ・時がより好ましく；５５０〜１５００ｐｐｍ・時がさらに好ましく；５８０〜１０００ｐｐｍ・時が特に好ましい。 For a 6 log reduction, the concentration of chlorine dioxide gas is preferably 50 to 230 ppm; more preferably 70 to 230 ppm; more preferably 100 to 230 ppm; still more preferably 130 to 200 ppm; and particularly preferably 160 to 190 ppm. The CT value is preferably from 400 to 2000 ppm-hour; more preferably from 450 to 2000 ppm-hour; more preferably from 500 to 2000 ppm-hour; even more preferably from 550 to 1500 ppm-hour; and particularly preferably from 580 to 1000 ppm-hour.
本実施形態では、所定のＣＴ値は、二酸化塩素ガスの使用開始時から二酸化塩素ガスが分解されるまでの時間において達成されればよい。所定のＣＴ値は、二酸化塩素ガスの使用開始時から４時間以内に達成されることが好ましく、３時間以内に達成されることがより好ましく、２時間以内に達成されることがさらに好ましく、１．５時間以内に達成されることが特に好ましい。所定のＣＴ値が短時間で達成されることにより、除染の所要時間が短縮されることから、種々の施設（例えば製薬工場）において、除染のために休止されていたライン（例えば医薬品の生産ライン）を早期に再開することができ、業務効率の低下が抑えられる。 In the present embodiment, the predetermined CT value may be achieved in a period from the start of use of the chlorine dioxide gas to the decomposition of the chlorine dioxide gas. The predetermined CT value is preferably achieved within 4 hours from the start of using chlorine dioxide gas, more preferably within 3 hours, still more preferably within 2 hours. It is particularly preferred that this is achieved within .5 hours. Since the time required for decontamination is shortened by achieving the predetermined CT value in a short time, lines (for example, pharmaceutical products) that have been suspended for decontamination in various facilities (for example, pharmaceutical factories). Production line) can be restarted at an early stage, and a decrease in work efficiency can be suppressed.
また、本実施形態において、所定の空間における二酸化塩素ガスの最大濃度は、二酸化塩素ガスの使用開始時から６０分以内に達成されることが好ましく、４０分以内に達成されることがより好ましく、３０分以内に達成されることがさらに好ましい。短時間で最大濃度に到達すると除染効率が高くなり、また濃度上昇速度に対して分解による濃度低下速度によるロスが少なくなる。また、空間内の二酸化塩素ガスの濃度は、最大濃度を示した後に低下する（例えば、図３参照）。そのため、６０分という早い段階で最大濃度を示すことにより、例えばヒトが立ち入ることができる濃度である０．１ｐｐｍ未満までの所要時間は、短縮化される。その結果、種々の施設（例えば製薬工場）において、除染のために休止されていたライン（例えば医薬品の生産ライン）が早期に再開され、業務効率の低下が抑えられる。 In the present embodiment, the maximum concentration of chlorine dioxide gas in the predetermined space is preferably achieved within 60 minutes from the start of use of the chlorine dioxide gas, more preferably within 40 minutes, More preferably, it is achieved within 30 minutes. When the maximum concentration is reached in a short time, the decontamination efficiency increases, and the loss due to the concentration decrease rate due to decomposition is reduced with respect to the concentration increase rate. Further, the concentration of chlorine dioxide gas in the space decreases after indicating the maximum concentration (for example, see FIG. 3). Therefore, by indicating the maximum concentration as early as 60 minutes, the time required to reach, for example, less than 0.1 ppm, which is a concentration at which humans can enter, is shortened. As a result, in various facilities (for example, a pharmaceutical factory), a line (for example, a pharmaceutical production line) that has been suspended for decontamination is restarted at an early stage, and a decrease in work efficiency is suppressed.
本発明を実施例に基づいて説明するが、本発明は、実施例にのみ限定されるものではない。 The present invention will be described based on examples, but the present invention is not limited to the examples.
＜殺菌試験＞
図１に示される除染システムを用いて、除染効果を確認した。閉鎖空間１２（無菌対応室：空間容積約３３ｍ3）内にバイオロジカルインジケーター７（MesaLabs社製Mesa Strip,SPORE STRIP BIOLOGICAL INDICATOR(BI)、品番ACD/6、二酸化塩素ガス用、菌種 Bacillus atrophaeus、初期菌数 2.5〜2.8×106 c.f.u.）を時間毎に必要枚数だけをサンプリングできるよう吊り下げた。除湿機５、空調機１３、および温度湿度指示計１４（ＶＡＩＳＡＬＡ社製）により室内の温度および湿度制御を行い、空間の水蒸気量１０ｇ／ｍ3以下とした。
<Disinfection test>
The decontamination effect was confirmed using the decontamination system shown in FIG. Closed space 12: biological indicator 7 (sterile corresponding chamber space volume approximately 33m 3) in (MesaLabs Co. Mesa Strip, SPORE STRIP BIOLOGICAL INDICATOR ( BI), No. ACD / 6, for chlorine dioxide gas, species Bacillus atrophaeus, The initial bacterial count of 2.5 to 2.8 × 10 6 cfu) was suspended so that only the required number of samples could be sampled every hour. The temperature and humidity in the room were controlled by the dehumidifier 5, the air conditioner 13, and the temperature / humidity indicator 14 (manufactured by VAISALA), and the water vapor amount in the space was set to 10 g / m 3 or less.
室内の二酸化塩素ガス濃度を計測するため、二酸化塩素ガス濃度計測器３（アース製薬（株）製ＣＤＭ−５）の吸引装置に接続したテフロン（登録商標）チューブ１１（外径φ６ｍｍ×長さ２０ｍ）を室内の所定場所に固定させた。二酸化塩素ガス発生機１（アース製薬（株）製ＣＤ−７００）および二酸化塩素ガス濃度計測器２並びに３を、空間外部の機械設置室にセットし、ガス供給配管９を通じて無菌対応室へ所定量の二酸化塩素ガスを供給した。空間で希釈された二酸化塩素ガスは、室内空気を還元する配管１０を通じてガス発生機に戻す循環式とした。 In order to measure the indoor chlorine dioxide gas concentration, a Teflon (registered trademark) tube 11 (outside diameter φ6 mm × length 20 m) connected to a suction device of a chlorine dioxide gas concentration measuring device 3 (CDM-5 manufactured by Earth Pharmaceutical Co., Ltd.) ) Was fixed at a predetermined place in the room. The chlorine dioxide gas generator 1 (CD-700 manufactured by Earth Pharmaceutical Co., Ltd.) and the chlorine dioxide concentration measuring instruments 2 and 3 are set in a machine installation room outside the space, and a predetermined amount is supplied to a sterile room through a gas supply pipe 9. Was supplied. The chlorine dioxide gas diluted in the space was returned to a gas generator through a pipe 10 for reducing indoor air, and was used as a circulation type.
二酸化塩素ガス目標濃度に対して２種類の反応液８ａおよび８ｂ（２５％亜塩素酸ナトリウム水および９％塩酸）の反応量を薬液ポンプ吐出量で自動調整させ、必要な二酸化塩素ガスを無菌対応室へ供給した。室内濃度の計測間隔は２分間に１回とした。約３０分間かけて目標濃度まで高め、以降はほぼ一定の二酸化塩素ガス濃度となるよう自動制御した。二酸化塩素ガス濃度を経時的に測定し、ＣＴ値を算出した。 Automatically adjust the reaction amount of two kinds of reaction liquids 8a and 8b (25% sodium chlorite aqueous solution and 9% hydrochloric acid) to the target concentration of chlorine dioxide gas by the discharge amount of chemical liquid pump, and sterile chlorine dioxide gas required It was supplied to the room. The measurement interval of the indoor concentration was set to once every two minutes. The concentration was increased to the target concentration in about 30 minutes, and thereafter, the concentration was automatically controlled so that the concentration of chlorine dioxide gas became almost constant. The chlorine dioxide gas concentration was measured over time, and the CT value was calculated.
曝露終了後、不要となった空間中の二酸化塩素ガスを除去するため、活性炭吸着型二酸化塩素ガス回収機４を作動させた。ガスの拡散を補助するため、常時サーキュレーター６を作動させた。 After the exposure was completed, the activated carbon adsorption type chlorine dioxide gas recovery machine 4 was operated in order to remove unnecessary chlorine dioxide gas from the space. To assist gas diffusion, the circulator 6 was constantly operated.
閉鎖空間内に設置したバイオロジカルインジケーター７を時間経過毎にサンプリングし、クリーンベンチ内で包装紙から滅菌ピンセットを用いて取り出し、生理食塩水２ｍＬ中に浸漬してガラスビーズ３個を加えた後、ボルテクスミキサーで２０〜３０分ＢＩを粉砕した。得られた粉砕液全量をＳＣＤＬＰ寒天培地に混釈し、約３７℃、約２日間インキュベーターで培養し発生したコロニー数を計測した。 The biological indicator 7 installed in the closed space is sampled every time, and taken out of the wrapping paper using sterile tweezers in a clean bench, immersed in 2 mL of physiological saline, and three glass beads are added. The BI was ground with a vortex mixer for 20-30 minutes. The whole amount of the obtained pulverized liquid was mixed with SCDLP agar medium, cultured at about 37 ° C. for about 2 days in an incubator, and the number of generated colonies was counted.
なお、二酸化塩素ガスの標準濃度計測器として、ＡＴｉ社製二酸化塩素ガス濃度計測器を使用することもできる。アース製薬（株）製二酸化塩素ガス濃度計測器ＣＤＭ−５との濃度校正方法は以下のとおりである。 It should be noted that a chlorine dioxide gas concentration measuring device manufactured by ATi can be used as the standard concentration measuring device for chlorine dioxide gas. The method for calibrating the concentration with the chlorine dioxide gas concentration meter CDM-5 manufactured by Earth Pharmaceutical Co., Ltd. is as follows.
テドラーバッグ（登録商標）を用いて、二酸化塩素ガス発生機１から二酸化塩素ガスを捕集し、アルミホイルで遮光したシリンジに二酸化塩素ガスを１０ｍＬ採取した。５０ｐｐｍエチレンジアミン水溶液２ｍＬを入れた別の容器に、採取した二酸化塩素ガスをシリンジで注入し、二酸化塩素ガスがエチレンジアミン水溶液に溶け込むよう、入念に振りながら混合させた。混合液を試料溶液とし、イオンクロマトグラフィーによりエチレンジアミンと二酸化塩素との反応生成物を定量分析し、得られた定量結果から、反応した二酸化塩素ガス量を算出した。ＡＴｉ社製二酸化塩素ガス濃度計測器の表示値と二酸化塩素ガスの定量結果から検量線を作成した。ＡＴｉ社製二酸化塩素ガス濃度計測器を基準として、計測器のモニターに表示される濃度が真の二酸化塩素ガス濃度と同等となるよう、補正係数を計測器のプログラムに予め入力した。 Using a Tedlar bag (registered trademark), chlorine dioxide gas was collected from the chlorine dioxide gas generator 1, and 10 mL of chlorine dioxide gas was collected in a syringe shielded from light with aluminum foil. The collected chlorine dioxide gas was injected into another container containing 2 mL of a 50 ppm aqueous solution of ethylenediamine with a syringe, and the mixture was carefully shaken and mixed so that the chlorine dioxide gas was dissolved in the aqueous ethylenediamine solution. Using the mixed solution as a sample solution, the reaction product of ethylenediamine and chlorine dioxide was quantitatively analyzed by ion chromatography, and the amount of reacted chlorine dioxide gas was calculated from the obtained quantitative results. A calibration curve was created from the display value of the chlorine dioxide gas concentration meter manufactured by ATi and the quantitative result of chlorine dioxide gas. A correction coefficient was previously input to a program of the measuring instrument such that the concentration displayed on the monitor of the measuring instrument was equivalent to the true chlorine dioxide gas concentration based on the chlorine dioxide gas measuring instrument manufactured by ATi.
（高濃度曝露試験）
８０ｐｐｍ以上の高濃度の二酸化塩素ガスを閉鎖空間１２に曝露した。閉鎖空間内は、空調機１３および除湿機５により、温度を１９〜２６℃、水蒸気量を５〜１０ｇ／ｍ3、相対湿度を２５〜４２％に調整した。所定の曝露時間ごとにバイオロジカルインジケーター７を５個ずつ回収し、それぞれの残存菌数を評価した（表１）。
(High concentration exposure test)
A high concentration of chlorine dioxide gas of 80 ppm or more was exposed to the closed space 12. In the closed space, the temperature was adjusted to 19 to 26 ° C., the amount of water vapor was adjusted to 5 to 10 g / m 3 , and the relative humidity was adjusted to 25 to 42% by the air conditioner 13 and the dehumidifier 5. Five biological indicators 7 were collected every predetermined exposure time, and the number of remaining bacteria was evaluated (Table 1).
（低濃度曝露試験）
８０ｐｐｍ未満の低濃度の二酸化塩素ガスを閉鎖空間１２に曝露した。閉鎖空間内は、空調機１３および除湿機５により、温度を１９〜２６℃、水蒸気量を５〜１０ｇ／ｍ3、相対湿度を２５〜４２％に調整した。所定の曝露時間ごとにバイオロジカルインジケーター７を５個ずつ回収し、それぞれの残存菌数を評価した（表２）。
(Low concentration exposure test)
The enclosed space 12 was exposed to a low concentration of chlorine dioxide gas of less than 80 ppm. In the closed space, the temperature was adjusted to 19 to 26 ° C., the amount of water vapor was adjusted to 5 to 10 g / m 3 , and the relative humidity was adjusted to 25 to 42% by the air conditioner 13 and the dehumidifier 5. Five biological indicators 7 were collected every predetermined exposure time, and the number of remaining bacteria was evaluated for each (Table 2).
（３ｌｏｇ低減試験）
３ｌｏｇ低減を達成した実施例８〜１３−２の結果を表３に示す。
(3 log reduction test)
Table 3 shows the results of Examples 8 to 13-2 in which a reduction of 3 logs was achieved.
（４ｌｏｇ低減試験）
４ｌｏｇ低減を達成した実施例１４〜１９−２の結果を表４に示す。
(4 log reduction test)
Table 4 shows the results of Examples 14 to 19-2 in which a 4 log reduction was achieved.
（５ｌｏｇ低減試験）
５ｌｏｇ低減を達成した実施例２０〜２５−２の結果を表５に示す。
(5 log reduction test)
Table 5 shows the results of Examples 20 to 25-2 in which a reduction of 5 logs was achieved.
（６ｌｏｇ低減試験）
６ｌｏｇ低減を達成した実施例２６〜３１−２の結果を表６に示す。
(6 log reduction test)
Table 6 shows the results of Examples 26 to 31-2 that achieved a 6 log reduction.
＜二酸化塩素ガスの分解性（残留性）＞
（実施例３２）
図１に示される除染システムを用いて、二酸化塩素ガスの使用開始時（０分）から１１．５時間、二酸化塩素ガス濃度を経時的に測定し、二酸化塩素ガスの分解性（残留性）について評価した。閉鎖空間内の二酸化塩素ガス濃度の経時変化を表７および図４に示す。
<Decomposability of chlorine dioxide gas (persistence)>
(Example 32)
Using the decontamination system shown in FIG. 1, the chlorine dioxide gas concentration was measured over time for 11.5 hours from the start of use of the chlorine dioxide gas (0 minutes), and the chlorine dioxide gas was decomposed (persistence). Was evaluated. Table 7 and FIG. 4 show changes over time in the concentration of chlorine dioxide gas in the enclosed space.
閉鎖空間１２（無菌対応室：空間容積約３３ｍ3）に対し、２５％亜塩素酸ナトリウム水溶液約１７０ｍＬと９％塩酸約１７０ｍＬとを１７ｍＬ／分でそれぞれ吐出して反応させた。約１８分後の空間内の二酸化塩素ガス濃度は２００ｐｐｍまで到達し、濃度はほぼ安定した。以降、空間内の二酸化塩素ガス濃度が安定するように、所定量の反応液を供給および停止しながら濃度制御を行い、約１０時間曝露させた。空間内は、空調機１３および除湿機５により、温度を１９〜２６℃、水蒸気量を５〜１０ｇ／ｍ3、相対湿度を２５〜４２％に調整した。除染終了後、不要となった空間中の二酸化塩素ガスを、活性炭吸着型二酸化塩素ガス回収機４を作動させて回収した。約４３分後には閉鎖空間１２の二酸化塩素濃度が０ｐｐｍとなり、二酸化塩素ガスの回収が終了した。 About 170 mL of a 25% aqueous sodium chlorite solution and about 170 mL of 9% hydrochloric acid were discharged and reacted at a flow rate of 17 mL / min into the closed space 12 (sterile-compatible room: space volume of about 33 m 3 ). After about 18 minutes, the concentration of chlorine dioxide gas in the space reached 200 ppm, and the concentration was almost stable. Thereafter, the concentration was controlled while supplying and stopping a predetermined amount of the reaction solution so as to stabilize the concentration of chlorine dioxide gas in the space, and exposure was performed for about 10 hours. In the space, the temperature was adjusted to 19 to 26 ° C., the amount of water vapor was adjusted to 5 to 10 g / m 3 , and the relative humidity was adjusted to 25 to 42% by the air conditioner 13 and the dehumidifier 5. After the completion of the decontamination, the unnecessary chlorine dioxide gas in the space was recovered by operating the activated carbon adsorption type chlorine dioxide gas recovery device 4. After about 43 minutes, the chlorine dioxide concentration in the closed space 12 became 0 ppm, and the recovery of the chlorine dioxide gas was completed.
二酸化塩素ガスの空間供給の立上げ速度および拡散性は、過酸化水素などとは異なり迅速に行えること；また、二酸化塩素ガスの回収は、ホルマリンとは異なり、材料への吸着や吸着による再蒸散がほとんどなく、短時間で空間のガス濃度が０ｐｐｍとなり、除染終了後、作業者が安全に閉鎖空間に入室可能であることが確認された。 The startup rate and diffusivity of the space supply of chlorine dioxide gas can be performed rapidly, unlike hydrogen peroxide, etc .; and, unlike formalin, the recovery of chlorine dioxide gas is re-evaporation by adsorption or adsorption to the material. The gas concentration in the space was reduced to 0 ppm in a short time, and it was confirmed that the worker could safely enter the closed space after the decontamination was completed.
＜内容物の腐食試験＞
図１に示される除染システム（除染対象空間は約３３ｍ3）において、ポンプ軸受、コンプレッサー軸受、造粒機、打錠機、充填機に使用された鉄製ベアリングを除染終了後に観察した。
<Content corrosion test>
In the decontamination system shown in FIG. 1 (the space to be decontaminated is about 33 m 3 ), the iron bearings used for the pump bearing, the compressor bearing, the granulator, the tableting machine, and the filling machine were observed after the completion of the decontamination.
（実施例３３）
以下の条件で二酸化塩素ガスを２回曝露した。２回の総ＣＴ値は２２８０ｐｐｍ・時であった。二酸化塩素ガス導入中の室内の平均温度、平均相対湿度、および平均水蒸気量は以下のとおりである。
１回目 平均温度：２０℃、平均相対湿度：４１％、平均水蒸気量：７．１０ｇ／ｍ3
２回目 平均温度：２２℃、平均相対湿度：４１％、平均水蒸気量：７．９７ｇ／ｍ3
２回曝露後の鉄製ベアリングに錆は確認されず、軸回転にも影響がないことが確認された。
(Example 33)
The chlorine dioxide gas was exposed twice under the following conditions. The total CT value of the two runs was 2280 ppm · hr. The average temperature, average relative humidity, and average water vapor amount in the room during the introduction of chlorine dioxide gas are as follows.
First time Average temperature: 20 ° C., average relative humidity: 41%, average water vapor amount: 7.10 g / m 3
Second time Average temperature: 22 ° C., average relative humidity: 41%, average water vapor amount: 7.97 g / m 3
No rust was found on the iron bearing after two exposures, and it was confirmed that there was no effect on shaft rotation.
（比較例１）
平均温度２９℃、平均相対湿度３９．４％の条件下で二酸化塩素ガスを曝露した。水蒸気量換算表（図５）より、平均水蒸気量は約１１．４ｇ／ｍ3と推定される。ＣＴ値は１９６ｐｐｍ・時であった。曝露後の鉄製ベアリングには錆が確認された。
(Comparative Example 1)
The chlorine dioxide gas was exposed under the conditions of an average temperature of 29 ° C. and an average relative humidity of 39.4%. From the water vapor amount conversion table (FIG. 5), the average water vapor amount is estimated to be about 11.4 g / m 3 . The CT value was 196 ppm · h. Rust was observed on the iron bearing after the exposure.
本発明によれば、防菌、防カビ対策が必要な施設を対象として、除染を必要とする空間内の内容物を腐食することなく、従来に比べ安全かつ短時間に大空間の除染を行うことができる。したがって、本発明は、特に異物の混入が厳しく制限される医薬品工場や食品工場等における除染の際に非常に有用な手法となり得る。 ADVANTAGE OF THE INVENTION According to the present invention, it is possible to decontaminate a large space safely and in a short time as compared with the related art without corroding contents in a space requiring decontamination for a facility requiring antibacterial and antifungal measures. It can be performed. Therefore, the present invention can be a very useful technique particularly in the case of decontamination in a pharmaceutical factory, a food factory, or the like in which contamination of foreign substances is severely restricted.
１：二酸化塩素ガス発生機
２：二酸化塩素ガス濃度計測器（計測部）
３：二酸化塩素ガス濃度計測器（吸引部）
４：二酸化塩素ガス回収機
５：除湿機
６：サーキュレーター
７：バイオロジカルインジケーター（ＢＩ）
８ａ、８ｂ：反応液２種類（亜塩素酸ナトリウム水および塩酸）
９：ガス供給配管
１０：ガス吸入配管
１１：ガス吸引用テフロン（登録商標）チューブ
１２：閉鎖空間
１３：空調機
１４：温度湿度指示計
1: Chlorine dioxide gas generator 2: Chlorine dioxide gas concentration measuring instrument (measuring unit)
3: Chlorine dioxide gas concentration measuring instrument (suction unit)
4: Chlorine dioxide gas recovery unit 5: Dehumidifier 6: Circulator 7: Biological indicator (BI)
8a, 8b: Two kinds of reaction liquids (aqueous sodium chlorite and hydrochloric acid)
9: Gas supply pipe 10: Gas suction pipe 11: Teflon (registered trademark) tube for gas suction 12: Closed space 13: Air conditioner 14: Temperature / humidity indicator
Claims (11)
汚染物質が細菌、真菌、またはウイルスであり；
水蒸気量１０ｇ／ｍ3以下、かつ相対湿度３１％以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度２３０ｐｐｍ以下、かつＣＴ値５０〜２０００ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む方法。 A method for removing contaminants by gas phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in said enclosed space, comprising:
The contaminant is a bacterium, fungus, or virus;
In the closed space, where the amount of water vapor is 10 g / m 3 or less and the relative humidity is 31% or less;
Generating chlorine dioxide gas;
Introducing chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 230 ppm or less and a CT value of 50 to 2000 ppm · hour.
汚染物質が細菌、真菌、またはウイルスであり；
水蒸気量１０ｇ／ｍ3以下、かつ相対湿度３１％以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度２３０ｐｐｍ以下、かつＣＴ値５０〜２０００ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む、請求項１記載の方法。 A method for reducing contaminants by 3 logs by vapor phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in said enclosed space, comprising:
The contaminant is a bacterium, fungus, or virus;
In the closed space, where the amount of water vapor is 10 g / m 3 or less and the relative humidity is 31% or less;
Generating chlorine dioxide gas;
Introducing chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 230 ppm or less and a CT value of 50 to 2000 ppm · hour.
汚染物質が細菌、真菌、またはウイルスであり；
水蒸気量１０ｇ／ｍ3以下、かつ相対湿度３１％以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度２３０ｐｐｍ以下、かつＣＴ値１００〜２０００ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む、請求項２記載の方法。 A method for reducing contaminants by 4 logs by vapor phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in said enclosed space:
The contaminant is a bacterium, fungus, or virus;
In the closed space, where the amount of water vapor is 10 g / m 3 or less and the relative humidity is 31% or less;
Generating chlorine dioxide gas;
Introducing chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 230 ppm or less and a CT value of 100 to 2000 ppm · hour.
汚染物質が細菌、真菌、またはウイルスであり；
水蒸気量１０ｇ／ｍ3以下、かつ相対湿度３１％以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度２３０ｐｐｍ以下、かつＣＴ値１３０〜２０００ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む、請求項２または３記載の方法。 A method for reducing contaminants by 5 logs by vapor phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in said enclosed space:
The contaminant is a bacterium, fungus, or virus;
In the closed space, where the amount of water vapor is 10 g / m 3 or less and the relative humidity is 31% or less;
Generating chlorine dioxide gas;
Introducing a chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 230 ppm or less and a CT value of 130 to 2000 ppm · hour.
汚染物質が細菌、真菌、またはウイルスであり；
水蒸気量１０ｇ／ｍ3以下、かつ相対湿度３１％以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度２３０ｐｐｍ以下、かつＣＴ値４００〜２０００ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む、請求項２〜４のいずれか一項に記載の方法。 A method for reducing contaminants by 6 logs by vapor phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in said enclosed space:
The contaminant is a bacterium, fungus, or virus;
In the closed space, where the amount of water vapor is 10 g / m 3 or less and the relative humidity is 31% or less;
Generating chlorine dioxide gas;
Introducing a chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 230 ppm or less and a CT value of 400 to 2000 ppm · hour.
汚染物質が細菌、真菌、またはウイルスであり；
水蒸気量１０ｇ／ｍ3以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガスを、二酸化塩素ガス濃度１０〜２３０ｐｐｍ、曝露時間６．０時間以内、かつＣＴ値５０〜１０００ｐｐｍ・時で前記閉鎖空間へ導入する工程とを含む方法。 A method for removing contaminants by gas phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in said enclosed space, comprising:
The contaminant is a bacterium, fungus, or virus;
In the enclosed space under an environment having a water vapor amount of 10 g / m 3 or less;
Generating chlorine dioxide gas;
Introducing chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 10 to 230 ppm, an exposure time of 6.0 hours or less, and a CT value of 50 to 1000 ppm · hour.
汚染物質が細菌、真菌、またはウイルスであり；
水蒸気量１０ｇ／ｍ3以下の環境下とした前記閉鎖空間において；
二酸化塩素ガスを発生させる工程と；
二酸化塩素ガス濃度２３０ｐｐｍ以下、かつＣＴ値５０〜１４９ｐｐｍ・時で二酸化塩素ガスを前記閉鎖空間へ導入する工程とを含む方法。 A method for removing contaminants by gas phase application of chlorine dioxide in an enclosed space and reducing chemical corrosion of contents in said enclosed space, comprising:
The contaminant is a bacterium, fungus, or virus;
In the enclosed space under an environment having a water vapor amount of 10 g / m 3 or less;
Generating chlorine dioxide gas;
Introducing chlorine dioxide gas into the enclosed space at a chlorine dioxide gas concentration of 230 ppm or less and a CT value of 50 to 149 ppm · hour.
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