JP6552234B2 - 半導体発光素子 - Google Patents
半導体発光素子 Download PDFInfo
- Publication number
- JP6552234B2 JP6552234B2 JP2015059265A JP2015059265A JP6552234B2 JP 6552234 B2 JP6552234 B2 JP 6552234B2 JP 2015059265 A JP2015059265 A JP 2015059265A JP 2015059265 A JP2015059265 A JP 2015059265A JP 6552234 B2 JP6552234 B2 JP 6552234B2
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- Prior art keywords
- layer
- light emitting
- quantum well
- composition
- semiconductor
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- 239000004065 semiconductor Substances 0.000 title claims description 132
- 239000010410 layer Substances 0.000 claims description 447
- 239000000203 mixture Substances 0.000 claims description 72
- 230000004888 barrier function Effects 0.000 claims description 28
- 229910002704 AlGaN Inorganic materials 0.000 claims description 25
- 239000002346 layers by function Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 description 23
- 230000004048 modification Effects 0.000 description 14
- 238000012986 modification Methods 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 10
- 238000009877 rendering Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052594 sapphire Inorganic materials 0.000 description 4
- 239000010980 sapphire Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- ORFSSYGWXNGVFB-UHFFFAOYSA-N sodium 4-amino-6-[[4-[4-[(8-amino-1-hydroxy-5,7-disulfonaphthalen-2-yl)diazenyl]-3-methoxyphenyl]-2-methoxyphenyl]diazenyl]-5-hydroxynaphthalene-1,3-disulfonic acid Chemical group COC1=C(C=CC(=C1)C2=CC(=C(C=C2)N=NC3=C(C4=C(C=C3)C(=CC(=C4N)S(=O)(=O)O)S(=O)(=O)O)O)OC)N=NC5=C(C6=C(C=C5)C(=CC(=C6N)S(=O)(=O)O)S(=O)(=O)O)O.[Na+] ORFSSYGWXNGVFB-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 230000005428 wave function Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/002—Devices characterised by their operation having heterojunctions or graded gap
- H01L33/0025—Devices characterised by their operation having heterojunctions or graded gap comprising only AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Description
12 n型半導体層(第1の半導体層)
13、13A、33、33A 発光機能層(発光層)
WA、WAA 量子井戸層
WA1、WA2 井戸層
14 電子ブロック層
15 p型半導体層(第2の半導体層)
BL、BLA ベース層
BL1 第1の副ベース層
BL2 第2の副ベース層
BS ベースセグメント
GR 溝
Claims (5)
- GaNの組成を有しかつ第1の導電型を有する第1の半導体層と、前記第1の半導体層上に形成された発光層を含む発光機能層と、前記発光機能層上に形成され、前記第1の半導体層とは反対の導電型を有する第2の半導体層とを有する半導体発光素子であって、
前記発光層は、前記第1の半導体層から応力歪を受けるAlGaNの組成を有してランダムな網目状に形成された溝を有し、前記溝によって区画されかつ各々が上面に平坦部を有する複数のベースセグメントを有するベース層と、前記ベース層上に形成された少なくとも1つの量子井戸層及び少なくとも1つの障壁層からなる量子井戸構造層と、を有し、
前記少なくとも1つの量子井戸層は、InGaNの組成を有し、前記第2の半導体層に向かってIn組成が増加しかつ前記ベース層における前記平坦部上の領域と前記溝上の領域との間でIn組成が異なるように構成されていることを特徴とする半導体発光素子。 - 前記少なくとも1つの量子井戸層は、前記第2の半導体層に向かってIn組成が連続的に増加するように構成されていることを特徴とする請求項1に記載の半導体発光素子。
- 前記少なくとも1つの量子井戸層は、前記第2の半導体層に向かってIn組成が段階的に増加するように構成されていることを特徴とする請求項1に記載の半導体発光素子。
- 前記ベース層は、AlGaNの組成を有する第1の副ベース層と、前記第1の副ベース層よりも前記第2の半導体層側に形成され、前記第1の副ベース層よりも大きなAl組成を有するAlGaNからなる第2の副ベース層と、を有することを特徴とする請求項1乃至3のいずれか1つに記載の半導体発光素子。
- 前記発光機能層は、前記発光層と前記第1の半導体層との間か、又は前記発光層と前記第2の半導体層との間に、前記発光層よりも短波長で発光する量子井戸層を有することを特徴とする請求項1乃至4のいずれか1つに記載の半導体発光素子。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015059265A JP6552234B2 (ja) | 2015-03-23 | 2015-03-23 | 半導体発光素子 |
PCT/JP2016/056740 WO2016152453A1 (ja) | 2015-03-23 | 2016-03-04 | 半導体発光素子 |
US15/561,030 US10186634B2 (en) | 2015-03-23 | 2016-03-04 | Semiconductor light-emitting element |
EP16768356.4A EP3276675A4 (en) | 2015-03-23 | 2016-03-04 | Semiconductor light-emitting element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015059265A JP6552234B2 (ja) | 2015-03-23 | 2015-03-23 | 半導体発光素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016178269A JP2016178269A (ja) | 2016-10-06 |
JP6552234B2 true JP6552234B2 (ja) | 2019-07-31 |
Family
ID=56977226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015059265A Active JP6552234B2 (ja) | 2015-03-23 | 2015-03-23 | 半導体発光素子 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10186634B2 (ja) |
EP (1) | EP3276675A4 (ja) |
JP (1) | JP6552234B2 (ja) |
WO (1) | WO2016152453A1 (ja) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005093682A (ja) * | 2003-09-17 | 2005-04-07 | Toyoda Gosei Co Ltd | GaN系半導体発光素子及びその製造方法 |
JP2005150631A (ja) * | 2003-11-19 | 2005-06-09 | Sumitomo Electric Ind Ltd | 発光ダイオード及びその製造方法 |
JP2008071805A (ja) | 2006-09-12 | 2008-03-27 | Institute Of National Colleges Of Technology Japan | 複数種の蛍光体を2種類以上の半導体発光素子上に塗布した多波長発光装置。 |
JP2011513953A (ja) * | 2008-02-25 | 2011-04-28 | ライトウェーブ フォトニクス インク. | 電流注入/トンネル発光デバイス及び方法 |
JP2011249460A (ja) | 2010-05-25 | 2011-12-08 | Meijo University | 白色発光ダイオード |
JP5197686B2 (ja) * | 2010-07-16 | 2013-05-15 | 株式会社東芝 | 半導体発光素子の製造方法 |
JP5865827B2 (ja) * | 2012-12-19 | 2016-02-17 | 株式会社東芝 | 半導体発光素子 |
-
2015
- 2015-03-23 JP JP2015059265A patent/JP6552234B2/ja active Active
-
2016
- 2016-03-04 US US15/561,030 patent/US10186634B2/en active Active
- 2016-03-04 EP EP16768356.4A patent/EP3276675A4/en not_active Withdrawn
- 2016-03-04 WO PCT/JP2016/056740 patent/WO2016152453A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP2016178269A (ja) | 2016-10-06 |
US20180062035A1 (en) | 2018-03-01 |
EP3276675A1 (en) | 2018-01-31 |
WO2016152453A1 (ja) | 2016-09-29 |
EP3276675A4 (en) | 2018-09-26 |
US10186634B2 (en) | 2019-01-22 |
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