JP6529956B2 - 半導体装置の製造方法、基板処理装置およびプログラム - Google Patents
半導体装置の製造方法、基板処理装置およびプログラム Download PDFInfo
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- JP6529956B2 JP6529956B2 JP2016255033A JP2016255033A JP6529956B2 JP 6529956 B2 JP6529956 B2 JP 6529956B2 JP 2016255033 A JP2016255033 A JP 2016255033A JP 2016255033 A JP2016255033 A JP 2016255033A JP 6529956 B2 JP6529956 B2 JP 6529956B2
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- substrate
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- containing gas
- etching resistant
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- 239000004065 semiconductor Substances 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000007789 gas Substances 0.000 claims description 131
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 48
- 229910052799 carbon Inorganic materials 0.000 claims description 48
- 238000005530 etching Methods 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 19
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 17
- 239000001301 oxygen Substances 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 238000004891 communication Methods 0.000 claims description 5
- 238000005256 carbonitriding Methods 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
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- 239000012535 impurity Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
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- 229910052782 aluminium Inorganic materials 0.000 description 1
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- 229910021529 ammonia Inorganic materials 0.000 description 1
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- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
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- 239000010937 tungsten Substances 0.000 description 1
Classifications
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
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- H01L21/28132—Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects conducting part of electrode is difined by a sidewall spacer or a similar technique, e.g. oxidation under mask, plating
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- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Description
以下に本発明の第一の実施形態について説明する。
最初に図1を用いて本実施形態で処理する基板100の状態について説明する。基板100上には、ゲート電極101が形成されている。ゲート電極101は、窒化チタン(TiN)膜やタングステン(W)膜で構成される。ゲート電極の周囲には、側壁として構成される絶縁膜102が形成されている。絶縁膜102は、窒素含有シリコン層であり、例えばシリコン窒化(SiN)膜で構成されている。
基板処理装置200を構成するチャンバ202は、横断面が円形であり扁平な密閉容器として構成されている。また、チャンバ202は、例えばアルミニウム(Al)やステンレス(SUS)などの金属材料により構成されている。チャンバ202内には、基板としてのシリコンウエハ等の基板100を処理する処理空間201と、基板100を処理空間201に搬送する際に基板100が通過する搬送空間203とが形成されている。チャンバ202は、上部容器202aと下部容器202bで構成される。上部容器202aと下部容器202bの間には仕切り板204が設けられる。
シャワーヘッド230の蓋231に設けられたガス導入孔231aには、第一分散機構241が装入される。第一分散機構241には、共通ガス供給管242が接続されている。第一分散機構241にはフランジが設けられ、ねじ等によって、蓋231や共通ガス供給管242のフランジに固定される。
第一ガス供給管243aには、上流方向から順に、第一ガス供給源243b、流量制御器(流量制御部)であるマスフローコントローラ(MFC)243c、及び開閉弁であるバルブ243dが設けられている。
チャンバ202の雰囲気を排気する排気系は、チャンバ202に接続された複数の排気管を有する。具体的には、搬送空間203と連通する排気管261と、処理空間201と連通される排気管262とを有する。また、各排気管の下流側には、排気管264が接続される。
次に、図5を用いてコントローラ280の詳細を説明する。基板処理装置10は、基板処理装置10の各部の動作を制御するコントローラ280を有している。
続いて図6を用いて、基板処理装置に搬入された基板100の絶縁膜102上に、耐エッチング膜103を形成する方法について説明する。なお、搬入された基板100は図1の状態である。
基板処理装置200では基板載置台212を基板100の搬送位置(搬送ポジション)まで下降させる。続いて、ゲートバルブ205を開いて搬送空間203を移載室(図示せず)と連通させる。そして、この移載室からウエハ移載機(図示せず)を用いて基板100を搬送空間203に搬入し、基板載置台212上に基板100を移載する。
続いて炭素含有ガス供給工程S104を行う。
炭素含有ガス供給工程S104では第一ガス供給系からチャンバ202に、炭素含有ガスであるプロピレンを供給する。プロピレンはプラズマ生成部243eを介して供給されるため、基板100にはプラズマ状態のプロピレンが供給される。
炭素含有ガス供給工程S104が終了したら、基板搬出工程S106を実施する。基板搬出工程S106では、基板搬入・載置工程S102と逆の手順を行い、基板100を搬出する。
続いて図7、図8を用いて第2の実施形態を説明する。
図7は第2の実施形態におけるガス供給部を示し、図8は第2の実施形態における基板処理フローを示す。第一の実施形態と相違する点は、第二ガス供給系と第三ガス供給系を有する点、窒素含有ガス供給工程を有する点である。
第二ガス供給系は、第二ガス供給部と呼ぶ。
第二ガス供給管244aには、上流方向から順に、第二ガス供給源244b、マスフローコントローラ(MFC)244c、及びバルブ244dが設けられている。
第三ガス供給系は、第三ガス供給部と呼ぶ。
第三ガス供給管245aには、上流方向から順に、第三ガス供給源245b、流量制御器(流量制御部)であるマスフローコントローラ(MFC)245c、及び開閉弁であるバルブ245dが設けられている。
続いて、窒素含有ガス供給工程S105を説明する。窒素含有ガス供給工程S105は第1の実施形態における炭素含有ガス供給工程S104の後に行う。
続いて第3の実施形態を説明する。
第3の実施形態は、図3に記載の基板処理装置200の構造において、主に処理空間201に直接プラズマを生成可能な構造が追加された点で異なる。具体的には、図9に記載の基板処理装置200’に記載のように、プラズマ生成部250と、基板載置台212に接続されるアース等の構成が追加された。
以上の実施形態に伴う主な効果を以下に記す。
(a)電極周囲のシリコン窒化膜表面に炭素含有シリコン窒化膜を形成することが可能であるので、リーク電流抑制と耐エッチング性能の向上を同時に達成することが可能となる。
(b)炭素含有シリコン窒化膜を形成した後、窒化処理を行うので、より窒素密度を高くし、エッチング耐性を向上させることができる。
101・・・ゲート電極
102・・・絶縁膜
103・・・耐エッチング膜
200・・・基板処理装置
201・・・処理空間
202・・・チャンバ
Claims (6)
- ゲート電極と、前記ゲート電極の側面に、側壁の一部として構成される絶縁膜を有する基板をチャンバ内に構成された処理空間に搬入する工程と、
前記処理空間に炭素含有ガスを供給し、前記絶縁膜の表面に、炭窒成分を含む耐エッチング膜を形成する工程と、
前記耐エッチング膜を形成する工程の後に、前記処理空間に窒素含有ガスを供給して前記耐エッチング膜に含まれる酸素成分を窒素成分に置換する工程と、
を有する半導体装置の製造方法。 - 前記耐エッチング膜の炭素含有率は、前記絶縁膜よりも高くなるよう構成される請求項1に記載の半導体装置の製造方法。
- 前記耐エッチング膜を形成する工程では、
前記炭素含有ガスをプラズマ状態として、前記絶縁膜表面に前記炭素含有ガスの炭素成分を供給する
請求項1または請求項2のうち、いずれか一項に記載の半導体装置の製造方法。 - 前記炭素含有ガスをプラズマ状態とする際は、前記処理空間でプラズマ状態とされる請求項3に記載の半導体装置の製造方法。
- ゲート電極と、前記ゲート電極の側面に、側壁の一部として構成される絶縁膜とを有する基板を処理するチャンバと、
前記チャンバに連通し、前記絶縁膜の表面に、耐エッチング膜を形成するよう、前記チャンバ内に構成された処理空間に少なくとも炭素含有ガスを供給し、その後前記耐エッチング膜に含まれる酸素成分を窒素成分に置換するよう前記処理空間に窒素含有ガスを供給するガス供給部と、
を有する基板処理装置。 - ゲート電極と、前記ゲート電極の側面に、側壁の一部として構成される絶縁膜を有する基板をチャンバ内に構成された処理空間に搬入する処理と、
前記処理空間に炭素含有ガスを供給し、前記絶縁膜の表面に、耐エッチング膜を形成する処理と、
前記耐エッチング膜を形成する処理の後に、前記処理空間に窒素含有ガスを供給して前記耐エッチング膜に含まれる酸素成分を窒素成分に置換する処理と、
をコンピュータによって基板処理装置に実行させるプログラム。
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