JP6518206B2 - Inner surface polishing machine - Google Patents
Inner surface polishing machine Download PDFInfo
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- JP6518206B2 JP6518206B2 JP2016047408A JP2016047408A JP6518206B2 JP 6518206 B2 JP6518206 B2 JP 6518206B2 JP 2016047408 A JP2016047408 A JP 2016047408A JP 2016047408 A JP2016047408 A JP 2016047408A JP 6518206 B2 JP6518206 B2 JP 6518206B2
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- polishing
- tape
- transfer
- roll
- polishing tape
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- 238000005498 polishing Methods 0.000 title claims description 264
- 230000007246 mechanism Effects 0.000 claims description 132
- 230000002093 peripheral effect Effects 0.000 claims description 43
- 238000004804 winding Methods 0.000 claims description 17
- 230000033001 locomotion Effects 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 6
- 229920003002 synthetic resin Polymers 0.000 claims description 5
- 239000000057 synthetic resin Substances 0.000 claims description 5
- 239000013013 elastic material Substances 0.000 claims description 4
- 239000002245 particle Substances 0.000 description 4
- 230000007723 transport mechanism Effects 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 206010040007 Sense of oppression Diseases 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
本発明は、例えば各種の自動車部品の孔部内周面の研磨加工に用いられる内周面研磨装置に関するものである。 The present invention relates to, for example, an inner circumferential surface polishing apparatus used for polishing an inner circumferential surface of a hole portion of various automobile parts.
この種の研磨装置として、例えば、加工すべき円筒状部材を保持して回転させる保持回転機構と、円筒状部材の内周面を研磨する研磨機構とからなり、上記研磨機構は、実巻リールから巻取リールへと研磨テープを間欠的又は連続的に移送させるテープ移送機構と、研磨テープを行戻移送案内する行案内部及び戻案内部を有すると共に行戻移送案内される研磨テープの折返部分を側方に迂回案内可能な迂回案内部を有し、迂回案内部には上記研磨テープの行側部分及び戻側部分のうちの行側部分を行案内部から側方に折返すと共に戻側部分を側方から戻案内部に折返す二つの折返面部及び両折返面部により側方に折り返された研磨テープを迂回案内すると共に研磨圧力を受ける受圧部材を設け、受圧部材により側方に迂回案内された研磨テープの側方迂回部分を上記円筒状部材の内周面を研磨可能な迂回研磨部とするテープ研磨機構と、迂回研磨部を円筒状部材の内周面に圧接可能な圧接移動機構と、テープ研磨機構を迂回研磨部での研磨テープの移送方向と交差する方向に揺振運動させるテープ揺振機構とを備えてなり、上記テープ移送機構には上記研磨テープの上記迂回研磨部からの戻側部分を強制的に移送させる送り機構及び上記研磨テープの上記迂回研磨部に至る行側部分に研磨テープの移送方向とは逆方向の張力を付与するバックテンション機構が設けられてなる構造のものが知られている。 This type of polishing apparatus includes, for example, a holding and rotating mechanism for holding and rotating a cylindrical member to be processed and a polishing mechanism for polishing the inner peripheral surface of the cylindrical member, and the above-mentioned polishing mechanism is a real wound reel. Tape transfer mechanism for transferring the polishing tape intermittently or continuously from the winding reel to the take-up reel, and a row guide portion and a return guide portion for guiding the row back of the polishing tape together with the return guide of the polishing tape The part has a detour guide portion capable of detouring guide sideways, and the detour guide portion is configured to return the row side portion of the row side portion and the return side portion of the polishing tape from the row guide portion to the side and return the row side portion. A pressure receiving member is provided for detour guiding the polishing tape folded sideways by two folded back face portions and side folded back side portions from both sides and a pressure receiving member receiving polishing pressure, and detoured laterally by the pressure receiving member Abrasive guided A tape polishing mechanism having a side detour portion as a detour polishing portion capable of polishing the inner peripheral surface of the cylindrical member, a press-contacting movement mechanism capable of pressing the detour polishing portion against the inner peripheral surface of the cylindrical member, tape polishing And a tape swinging mechanism for swinging the mechanism in a direction crossing the transfer direction of the polishing tape in the bypass polishing portion, and the tape transfer mechanism includes a portion on the return side of the polishing tape from the bypass polishing portion. And a back tensioning mechanism for applying a tension in the direction opposite to the transporting direction of the polishing tape to the row side portion of the polishing tape leading to the detour polishing portion of the polishing tape. It is done.
しかしながら上記従来構造の場合、上記研磨テープの上記迂回研磨部に至る行側部分に研磨テープの移送方向とは逆方向の張力を付与するバックテンション機構として、上記実巻リールを繰出回転させる繰出モータを設け、実巻リールを繰出回転させる繰出モータの繰出回転制御により研磨テープに移送方向とは逆方向の張力を付与する構造が採用されており、このため、受圧部材により側方に迂回案内された研磨テープの側方迂回部分を上記円筒状部材の内周面を研磨可能な迂回研磨部、迂回研磨部を円筒状部材の内周面に圧接可能な圧接移動機構及びテープ研磨機構を迂回研磨部での研磨テープの移送方向と交差する方向に揺振運動させるテープ揺振機構の各構造の複合動作の存在により上記迂回研磨部に至る研磨テープの行側部分に移送方向とは逆方向の適正な張力を付与することが困難なことがあり、これにより研磨テープの弛み現象を確実に阻止することができず、円筒状部材の内周面と研磨テープとの圧接密着状態が不適となり、良好な研磨加工を行うことができないことがあるという不都合を有している。 However, in the case of the above-described conventional structure, a feeding motor for feeding and rotating the actual winding reel as a back tension mechanism that applies tension in the direction opposite to the transfer direction of the polishing tape to the row side portion of the polishing tape reaching the bypass polishing portion. the provided, the transfer direction to the polishing tape by the feeding rotation control of the feeding motor for feeding rotating the actual winding Li Lumpur and structure to impart reverse tension is employed, Thus, diverted to side by the pressure receiving member Detour polishing portion capable of polishing the inner peripheral surface of the cylindrical member by the side detour portion of the guided polishing tape, pressure contact moving mechanism and tape polishing mechanism capable of pressing the detour polishing portion against the inner peripheral surface of the cylindrical member Transfer to the row side portion of the polishing tape leading to the above-mentioned bypass polishing portion due to the combined operation of each structure of the tape swinging mechanism in which the shaking motion is performed in the direction crossing the transfer direction of the polishing tape in the bypass polishing portion. It may be difficult to apply an appropriate tension in the direction opposite to the direction, which makes it impossible to reliably prevent the slack phenomenon of the polishing tape, and the pressure contact between the inner peripheral surface of the cylindrical member and the polishing tape There is a disadvantage that the close contact state is not suitable and good polishing may not be performed.
本発明はこのような課題を解決することを目的とするもので、本発明のうちで、請求項１記載の発明は、円筒状部材を保持して回転させる保持回転機構と、該円筒状部材の内周面を研磨する研磨機構とからなり、上記研磨機構は、研磨テープを実巻リールから巻取リールへと間欠的又は連続的に移送させるテープ移送機構と、該研磨テープを行戻移送案内する行案内部及び戻案内部を有すると共に行戻移送案内される研磨テープの折返部分を側方に迂回案内可能な迂回案内部を有し、該迂回案内部には上記研磨テープの行側部分及び戻側部分のうちの行側部分を行案内部から側方に折返すと共に戻側部分を側方から戻案内部に折返す二つの折返面部及び該両折返面部により側方に折り返された研磨テープを迂回案内すると共に研磨圧力を受ける受圧部材を設け、該受圧部材により側方に迂回案内された研磨テープの側方迂回部分を上記円筒状部材の内周面を研磨可能な迂回研磨部とするテープ研磨機構と、該迂回研磨部を該円筒状部材の内周面に圧接可能な圧接移動機構と、該テープ研磨機構を該迂回研磨部での研磨テープの移送方向と交差する方向に揺振運動させるテープ揺振機構とを備えてなり、上記テープ移送機構には上記研磨テープの上記迂回研磨部からの戻側部分を強制的に移送させる送り機構及び上記研磨テープの上記迂回研磨部に至る行側部分に研磨テープの移送方向とは逆方向の張力を付与するバックテンション機構が設けられ、該送り機構は研磨テープの上記迂回研磨部からの戻側部分を強制的に移送させる移送ロール、該研磨テープを該移送ロールの外周面に弾圧可能な遊転ロール、該移送ロールに掛けられた研磨テープを該遊転ロールにより移送ロールの外周面に弾圧する弾圧用バネ、該移送ロールを研磨テープの移送方向に回転させる移送用モータ、及び移送用モータの主軸と上記巻取リールの支持軸との間に介装されたベルト伝動機構からなり、該バックテンション機構は研磨テープの行側部分を移送案内する繰出ロール、該研磨テープを繰出ロールの外周面に弾圧可能な遊転ロール、該繰出ロールに掛けられた研磨テープを該遊転ロールにより繰出ロールの外周面に弾圧する弾圧用バネ、及び該繰出ロールを研磨テープの移送方向とは逆方向に回転させるテンション用モータからなり、該研磨テープを該繰出ロールと該遊転ロールとにより挟装して該テンション用モータの回転制御により研磨テープに移送方向とは逆方向の張力を付与する構造を備えてなり、かつ、上記受圧部材は回転ロール状に形成されて外周面部はゴム又は合成樹脂の弾性材或いは硬質材からなり、更に、上記テープ揺振機構は片持状態に突設された偏心軸、該偏心軸の先端部に配置された偏心輪、該揺振用モータ及び、該揺振用モータの主軸と該偏心軸の中程部との間に介装されたベルト伝動機構からなり、更に、上記研磨テープからなる上記迂回研磨部による研磨構造は乾式研磨構造又は湿式研磨構造であることを特徴とする内周面研磨装置にある。 The present invention is intended to solve such problems. Among the present inventions, the invention according to claim 1 is a holding and rotating mechanism for holding and rotating a cylindrical member, and the cylindrical member A polishing mechanism for polishing the inner peripheral surface of the tape, wherein the polishing mechanism is a tape transfer mechanism for transferring the polishing tape intermittently or continuously from the actual winding reel to the winding reel , and the polishing tape is returned It has a row guide portion and a return guide portion for guiding and has a detour guide portion capable of detouring the folded portion of the polishing tape guided by the row return guide laterally, and the detour guide portion has the row side of the polishing tape. Of the part and the return side part, the two fold surface sections that fold back the row side section from the row guide section to the side, and fold the return side section from the side to the return guide section, and are folded laterally by the both folded surface sections Guide the abrasive tape and receive the polishing pressure A tape polishing mechanism including a pressure receiving member, and using a side detour portion of the polishing tape detour-guided sideways by the pressure receiving member as a detour polishing portion capable of polishing the inner peripheral surface of the cylindrical member; A pressing and moving mechanism capable of pressing against the inner peripheral surface of the cylindrical member, and a tape swinging mechanism for swingingly moving the tape polishing mechanism in a direction intersecting the transfer direction of the polishing tape in the bypass polishing portion. A feeding mechanism for forcibly transferring the return side portion of the polishing tape from the detour polishing portion to the tape transfer mechanism, and a transfer direction of the polishing tape to a row side portion of the polishing tape leading to the detour polishing portion A back tension mechanism for applying tension in the opposite direction to the transfer roll, the feed mechanism forcibly transferring the return side portion of the polishing tape from the detour polishing portion, the outer periphery of the transfer roll of the polishing tape On the face A compressible idler roll, a resilient spring for pressing an abrasive tape applied to the transfer roll against the outer peripheral surface of the transfer roll by the idler roll, a transfer motor for rotating the transfer roll in the direction of transfer of the polishing tape, And a belt transmission mechanism interposed between the main shaft of the transfer motor and the support shaft of the take-up reel, and the back tension mechanism transfers and guides the row side portion of the polishing tape, the polishing tape A resilient roll capable of resiliently pressing on the outer peripheral surface of the feed roll, a resilient spring for pressing an abrasive tape wound on the feed roll against the outer peripheral surface of the feed roll by the idler roll, and a direction of transport of the feed roll on the abrasive tape Consists of a tensioning motor that rotates in the opposite direction, and the polishing tape is sandwiched between the feeding roll and the idler roll and polishing is performed by controlling the rotation of the tensioning motor The tape has a structure for applying tension in the direction opposite to the transfer direction, and the pressure receiving member is formed in the shape of a rotating roll, and the outer peripheral surface portion is made of an elastic material or a hard material of rubber or synthetic resin. The above-mentioned tape rocking mechanism includes an eccentric shaft protruding in a cantilevered state, an eccentric ring disposed at the tip of the eccentric shaft, the rocking motor, the main shaft of the rocking motor, and the eccentric shaft. An inner peripheral surface polishing apparatus comprising: a belt transmission mechanism interposed between the inner and outer parts; and further, the polishing structure by the detour polishing part comprising the polishing tape is a dry polishing structure or a wet polishing structure. It is in.
本発明は上述の如く、請求項１記載の発明にあっては、人為的又は自動的に保持回転機構に円筒状部材を装着して回転させ、研磨機構のテープ移送機構により研磨テープを実巻リールから巻取リールへと間欠的又は連続的に移送させ、テープ研磨機構の行案内部及び戻案内部により研磨テープを行戻移送案内すると共に行戻移送案内される研磨テープの折返部分を迂回案内部により側方に迂回案内し、迂回案内部には上記研磨テープの行側部分及び戻側部分のうちの行側部分を行案内部から側方に折返すと共に戻側部分を側方から戻案内部に折返す二つの折返面部及び両折返面部により側方に折り返された研磨テープを迂回案内すると共に研磨圧力を受ける受圧部材が設けられ、受圧部材により側方に迂回案内された研磨テープの側方迂回部分は上記円筒状部材の内周面を研磨可能な上記テープ研磨機構の迂回研磨部とされ、迂回研磨部を圧接移動機構により円筒状部材の内周面に適宜研磨圧力をもって圧接し、かつ、テープ揺振機構によりテープ研磨機構を迂回研磨部での研磨テープの移送方向と交差する方向に揺振運動させ、上記テープ揺振機構は片持状態に突設された偏心軸、偏心軸の先端部に配置された偏心輪、揺振用モータ及び、揺振用モータの主軸と偏心軸の中程部との間に介装されたベルト伝動機構からなり、しかして、円筒状部材の回転、研磨テープの移送と揺振動作及び研磨テープの圧接動作の複合動作により円筒状部材の内周面を研磨テープの迂回研磨部により研磨加工することができ、この際、上記テープ移送機構には上記研磨テープの上記迂回研磨部からの戻側部分を強制的に移送させる送り機構及び上記研磨テープの上記迂回研磨部に至る行側部分に研磨テープの移送方向とは逆方向の張力を付与するバックテンション機構が設けられ、送り機構は研磨テープの上記迂回研磨部からの戻側部分を強制的に移送させる移送ロール、研磨テープを移送ロールの外周面に弾圧可能な遊転ロール、移送ロールに掛けられた研磨テープを遊転ロールにより移送ロールの外周面に弾圧する弾圧用バネ、移送ロールを研磨テープの移送方向に回転させる移送用モータ、及び移送用モータの主軸と上記巻取リールの支持軸との間に介装されたベルト伝動機構からなり、バックテンション機構は研磨テープの行側部分を移送案内する繰出ロール、研磨テープを繰出ロールの外周面に弾圧可能な遊転ロール、繰出ロールに掛けられた研磨テープを遊転ロールにより繰出ロールの外周面に弾圧する弾圧用バネ及び繰出ロールを研磨テープの移送方向とは逆方向に回転させるテンション用モータからなり、研磨テープを繰出ロールと遊転ロールとにより挟装してテンション用モータの回転制御により研磨テープに移送方向とは逆方向の張力を付与する構造を備えてなるから、上記迂回研磨部からの研磨テープの戻側部分は研磨テープの上記迂回研磨部からの戻側部分を強制的に移送させる移送ロール、研磨テープを移送ロールの外周面に弾圧可能な遊転ロール、移送ロールに掛けられた研磨テープを遊転ロールにより移送ロールの外周面に弾圧する弾圧用バネ、移送ロールを研磨テープの移送方向に回転させる移送用モータ、及び移送用モータの主軸と上記巻取リールの支持軸との間に介装されたベルト伝動機構からなる送り機構により巻取リールへと強制的に移送されると共に上記バックテンション機構により上記研磨テープの上記迂回研磨部に至る行側部分に研磨テープの移送方向とは逆方向の張力を付与され、研磨テープの揺振動作及び研磨テープの圧接動作に伴う上記迂回研磨部に至る行側部分での研磨テープのたるみ現象を阻止することができ、研磨テープの円滑な移送及び揺振を良好に行うことができ、かつ、上記研磨テープは繰出ロールと遊転ロールとにより弾圧用バネのバネ圧で弾圧挟装され、テンション用モータの回転制御により繰出ロールを介して研磨テープに移送方向とは逆方向の張力を付与することができ、逆方向の張力制御を良好に行うことができ、それだけ、円筒状部材の内周面の研磨加工を良好に行うことができ、加工作業性を向上することができ、かつ、上記受圧部材は回転ロール状に形成されて外周面部はゴム又は合成樹脂の弾性材或いは硬質材からなるので、研磨圧力を良好に受けることができ、更に、上記研磨テープからなる上記迂回研磨部による研磨構造は乾式研磨構造又は湿式研磨構造とすることにより、円筒状部材の材質や研磨条件等の仕様に対応することができる。 As described above, according to the present invention, in the invention according to claim 1, the cylindrical member is artificially or automatically attached to the holding and rotating mechanism and rotated, and the polishing tape is actually wound by the tape transfer mechanism of the polishing mechanism. The reel tape is intermittently or continuously transferred from the reel to the take-up reel, and the line guide portion and the return guide portion of the tape polishing mechanism guides the polishing tape back and forth and diverts the folded portion of the polishing tape guided back and forth. The guide portion detours the side direction, and the detour guide portion folds the row side portion of the row side portion and the return side portion of the polishing tape from the row guide portion to the side, and the return side portion from the side A pressure receiving member is provided for detour guiding the polishing tape which is folded back sideways by two folded surface portions which are folded back to the return guide and both folded surface portions and receiving the polishing pressure, and the polishing tape which is detoured laterally by the pressure receiving member. Side detour Is a detour polishing portion of the tape polishing mechanism capable of polishing the inner peripheral surface of the cylindrical member, and the detour polishing portion is pressed against the inner peripheral surface of the cylindrical member by a pressing movement mechanism with appropriate polishing pressure; The swinging mechanism shakes the tape polishing mechanism in the direction crossing the transfer direction of the polishing tape at the detour polishing unit, and the above-mentioned tape swinging mechanism has an eccentric shaft protruding in a cantilever state, and a tip of the eccentric shaft And a belt transmission mechanism interposed between the main shaft of the rocking motor and the middle portion of the eccentric shaft, whereby rotation and polishing of the cylindrical member are performed. The inner peripheral surface of the cylindrical member can be polished by the detour polishing portion of the polishing tape by a combined operation of tape transfer, shaking operation and pressure welding operation of the polishing tape, and in this case, the above tape transfer mechanism From the above detour polishing section of the tape The transfer direction of the polishing tape on the line side portion leading to the bypass polishing section of the feeding mechanism and the polishing tape to forcibly transfer the Modogawa portion back tension mechanism for applying a reverse tension is provided, feed mechanism A transfer roll that forcibly transfers the return side portion of the polishing tape from the bypass polishing portion, an idle roll that can press the polishing tape against the outer peripheral surface of the transfer roll, and an idle roll that holds the polishing tape hung on the transfer roll A resilient spring for pressing against the outer peripheral surface of the transfer roll, a transfer motor for rotating the transfer roll in the transfer direction of the polishing tape, and a belt interposed between the main shaft of the transfer motor and the support shaft of the winding reel. It consists of a transmission mechanism, and the back tensioning mechanism is a delivery roll that transfers and guides the row side portion of the polishing tape, an idle roll that can press the polishing tape against the outer peripheral surface of the delivery roll, a delivery roll The spring consists of a spring for pressing an abrasive tape hung on the roll by the idler roll against the outer peripheral surface of the delivery roll and a tension motor for rotating the delivery roll in the direction opposite to the transfer direction of the abrasive tape. And the idler roll to provide tension to the polishing tape in the direction opposite to the transfer direction by controlling the rotation of the tension motor, so that the return side portion of the polishing tape from the bypass polishing portion A transfer roll for forcibly transferring the return side portion of the polishing tape from the detour polishing portion, an idle roll capable of pressing the polishing tape against the outer peripheral surface of the transfer roll, an idle roll for the polishing tape hung on the transfer roll A spring for resiliently pressing the outer peripheral surface of the transfer roll, a transfer motor for rotating the transfer roll in the transfer direction of the polishing tape, and a main shaft of the transfer motor and the winding Row-side leading to the bypass polishing section of the polishing tape by the back tension mechanism with is forcibly transferred to the take-up reel by the feed mechanism consisting interposed a belt transmission mechanism between the supporting shaft of Lumpur A tension in the direction opposite to the direction of transport of the abrasive tape is applied to the part to prevent the sag phenomenon of the abrasive tape in the row-side part leading to the above-mentioned detouring part accompanying the rocking operation of the abrasive tape and the pressing operation of the abrasive tape. Smooth transfer and shaking of the polishing tape can be favorably performed, and the above-mentioned polishing tape is elastically clamped by the spring pressure of the elastic spring by the feeding roll and the idler roll, and the tensioning motor The tension control in the direction opposite to the transfer direction can be applied to the abrasive tape through the delivery roll by rotation control of the above, and tension control in the reverse direction can be favorably performed. The inner peripheral surface can be polished well, processing workability can be improved, and the pressure receiving member is formed in a rotating roll shape, and the outer peripheral surface portion is an elastic or hard material of rubber or synthetic resin. The polishing structure can be well received by the polishing pressure, and the polishing structure by the above-mentioned detour polishing portion made of the above-mentioned polishing tape has a dry polishing structure or a wet polishing structure. Can meet the specifications of
図１乃至図１４は本発明の実施の形態例を示し、大別して、加工すべき円筒状部材Ｗを保持して回転Ｑさせる保持回転機構Ａと、円筒状部材Ｗの内周面Ｗ１を研磨する研磨機構Ｂとからなり、上記研磨機構Ｂは、実巻リールＲＦから巻取リールＲＥへと研磨テープＴを間欠的又は連続的に移送Ｓさせるテープ移送機構Ｃと、研磨テープＴを行戻移送案内する行案内部Ｄ１及び戻案内部Ｄ２を有すると共に行戻移送案内される研磨テープＴの折返部分を側方に迂回案内可能な迂回案内部Ｄ３を有し、迂回案内部Ｄ３には上記研磨テープＴの行側部分Ｔ１及び戻側部分Ｔ２のうちの行側部分Ｔ１を行案内部Ｄ１から側方に折返すと共に戻側部分Ｔ２を側方から戻案内部Ｄ２に折返す二つの折返面部Ｄ４・Ｄ４及び両折返面部Ｄ４・Ｄ４により側方に折り返された研磨テープＴを迂回案内すると共に研磨圧力を受ける受圧部材Ｄ５を設け、受圧部材Ｄ５により側方に迂回案内された研磨テープＴの側方迂回部分Ｔ３を上記円筒状部材Ｗの内周面Ｗ１を研磨可能な迂回研磨部Ｄ６とするテープ研磨機構Ｄと、該テープ移送機構Ｃを円筒状部材Ｗに向けて移動させる移動機構Ｅと、迂回研磨部Ｄ６を円筒状部材Ｗの内周面Ｗ１に圧接Ｖ可能な圧接移動機構Ｆと、テープ研磨機構Ｄを迂回研磨部Ｄ６での研磨テープＴの移送方向と交差する方向に揺振運動Ｐさせるテープ揺振機構Ｇとを備えてなり、上記テープ移送機構Ｃには上記研磨テープＴの上記迂回研磨部Ｄ６からの戻側部分Ｔ２を強制的に移送Ｓさせる送り機構Ｃ１及び上記研磨テープＴの上記迂回研磨部Ｄ６に至る行側部分Ｔ１に研磨テープＴの移送方向とは逆方向の張力Ｙを付与するバックテンション機構Ｃ２が設けられ、バックテンション機構Ｃ２は研磨テープＴの行側部分Ｔ１を移送案内する繰出ロールＫ、研磨テープＴを繰出ロールＫの外周面に弾圧可能な遊転ロールＨ及び繰出ロールＫを研磨テープＴの移送方向とは逆方向に回転Ｌさせるテンション用モータＭからなり、研磨テープＴを繰出ロールＫと遊転ロールＨとにより挟装してテンション用モータＭの回転制御により研磨テープＴに移送方向とは逆方向の張力Ｙを付与する構造を備えて構成している。 1 to 14 show an embodiment of the present invention, and roughly classified, a holding and rotating mechanism A for holding and rotating Q a cylindrical member W to be processed, and an inner circumferential surface W 1 of the cylindrical member W consists of a polishing mechanism B for polishing, the polishing mechanism B includes a tape transport mechanism C for intermittently or continuously transferred S the the abrasive tape T to the real take-reel R F from the take-up reel R E, the abrasive tape T the has a line guide portion D 1 and return the guide portion abrasive tape T detour guiding portion D 3 a turnup portion laterally possible detour guidance that are rows returned movement guide which has a D 2 to Gyomodo movement guide, detour side the Modogawa portion T 2 together with the folding of the guide portion D 3 line portion T 1 of the one row portion T 1 and Modogawa portion T 2 of the said abrasive tape T from the line guide portion D 1 laterally two fold surface D folded into the guide portion D 2 back from the side 4 · D 4 and Ryoorikae surface D 4 · D By the provided pressure receiving member D 5 for receiving a polishing pressure with bypassing guide the abrasive tape T is folded laterally, the lateral bypass portion T 3 of the abrasive tape T which has been diverted guided laterally by the pressure receiving member D 5 A tape polishing mechanism D which makes the inner peripheral surface W 1 of the cylindrical member W a detourable polishing portion D 6 capable of polishing, a moving mechanism E which moves the tape transfer mechanism C toward the cylindrical member W, a detour polishing portion A pressure displacement moving mechanism F capable of pressure contact V 6 with the inner circumferential surface W 1 of the cylindrical member W, and a tape polishing mechanism D shaking motion in a direction intersecting the transfer direction of the polishing tape T at the detour polishing portion D 6 A feeding mechanism C 1 for forcibly transferring the return side portion T 2 of the polishing tape T from the bypass polishing portion D 6 to the tape transport mechanism C. Leading to the detour polishing portion D 6 of the polishing tape T Back tension mechanism C 2 is provided with the transfer direction of the polishing tape T in the row portion T 1 for imparting a reverse tension Y, back tension mechanism C 2 will transfer guides the line side portion T 1 of the polishing tape T A feeding roll K, a tensioning motor M for rotating the feeding roll K in a direction opposite to the transfer direction of the polishing tape T, comprising a rolling roll H capable of resiliently pressing the polishing tape T onto the outer peripheral surface of the feeding roll K T is sandwiched between the delivery roll K and the idle roll H so as to apply a tension Y in the direction opposite to the transfer direction to the polishing tape T by controlling the rotation of the tension motor M.
この場合、上記保持回転機構Ａにあっては、図１、図２の如く、機台１の下部に回転盤２を回転縦軸３により水平回転自在に配置し、回転盤２を回転させる回転用モータ４を設け、回転盤２に加工すべき円筒状部材Ｗを保持可能なチャック機構５を設け、加工すべき円筒状部材Ｗを保持して回転させるように構成している。 In this case, in the holding and rotating mechanism A, as shown in FIG. 1 and FIG. 2, the rotary disc 2 is disposed horizontally rotatably at the lower part of the machine base 1 by the rotary longitudinal axis 3 and the rotary disc 2 is rotated. A motor 4 is provided, a chuck mechanism 5 capable of holding the cylindrical member W to be machined is provided on the rotary disc 2, and the cylindrical member W to be machined is held and rotated.
又、この場合、上記移動機構Ｅにあっては、図１、図３の如く、機台１に取付台６を摺動部６ａ及び上下案内レール１ａにより上下摺動自在に設け、取付台６をねじ軸１ｂ、ナット部材６ｂ及び上下動用モータ１ｃからなるボールねじ機構１ｄにより上下動自在に設け、テープ研磨機構Ｄを取付台６に配置し、テープ移送機構Ｃを円筒状部材Ｗに向けて上下進退移動させるように構成している。 Further, in this case, in the moving mechanism E, as shown in FIGS. 1 and 3, the mounting base 6 is provided on the machine base 1 so as to be vertically slidable by the sliding portion 6a and the upper and lower guide rails 1a. By a ball screw mechanism 1d consisting of a screw shaft 1b, a nut member 6b and a motor for vertical movement 1c so that the tape polishing mechanism D is disposed on the mount 6 and the tape transfer mechanism C is directed to the cylindrical member W. It is configured to move up and down.
又、この場合、上記テープ移送機構Ｃにあっては、上記取付台６に上記研磨テープＴを巻回してなる実巻リールＲＦを支持軸８により回転自在に配置すると共に空状態の巻取リールＲＥを支持軸７により回転自在に配置し、実巻リールＲＦから巻取リールＲＥへと研磨テープＴを間欠的又は連続的に移送させるように構成している。 Further, in this case, the In the tape transport mechanism C, the winding of the empty state with the actual winding reel R F formed by winding the abrasive tape T to the mounting base 6 rotatably disposed by the support shaft 8 the reel R E rotatably disposed by the support shaft 7, is configured so as to intermittently or continuously transferring the abrasive tape T and the winding reel R E from the real winding reel R F.
ここに、研磨テープＴは、例えば、ポリエステルフィルム、メタル、クロス、発泡体フィルム、植毛布等の基材に酸化アルミニウム、酸化クロム、シリコンカーバイド、ダイヤモンド等の所定粒度の固定砥粒をコーティング又は結合してなるものが用いられている。尚、このような基材に固定砥粒を固着した構造の研磨テープを用いて潤滑剤を用いない乾式研磨構造や基材に固定砥粒を固着した構造の研磨テープを用いて潤滑剤を供給しつつ研磨する湿式研磨構造、或いは、固定砥粒を固着していない織布、不織布、発泡体フィルム、植毛布を研磨テープとして用いて遊離砥粒を含む研磨剤を供給する湿式研磨構造を採用することがあり、よって、ここでいう研磨テープＴは、固定砥粒を固着した構造の研磨テープや固定砥粒を固着していない構造の研磨テープをも含むものである。 Here, the polishing tape T is formed by coating or bonding fixed abrasive particles of a predetermined particle size such as aluminum oxide, chromium oxide, silicon carbide, diamond, etc. on a substrate such as polyester film, metal, cloth, foam film, planted blanket etc. The following are used. In addition, a lubricant is supplied using a polishing tape having a structure in which fixed abrasives are fixed to such a base using a dry polishing structure without using a lubricant or an abrasive tape having a structure in which fixed abrasives are fixed to a base A wet polishing structure that polishes while using a wet polishing structure, or a wet polishing structure that supplies a polishing agent containing loose abrasive particles using a woven fabric, a non-woven fabric, a foam film, or a planted blanket that does not adhere fixed abrasive particles as a polishing tape Thus, the polishing tape T referred to herein includes a polishing tape having a structure in which the fixed abrasive is fixed and a polishing tape having a structure in which the fixed abrasive is not fixed.
この場合、上記テープ研磨機構Ｄにあっては、上記取付台６に上記テープ揺振機構Ｇ及び圧接移動機構Ｆを介して案内部材９を配置し、案内部材９に研磨テープＴを行戻移送案内する行案内部Ｄ１及び戻案内部Ｄ２を形成すると共に行戻移送案内される研磨テープＴの折返部分を側方に迂回案内可能な迂回案内部Ｄ３を形成し、迂回案内部Ｄ３には上記研磨テープＴの行側部分Ｔ１及び戻側部分Ｔ２のうちの行側部分Ｔ１を行案内部Ｄ１から側方に折返すと共に戻側部分Ｔ２を側方から戻案内部Ｄ２に折返す二つの折返面部Ｄ４・Ｄ４を形成し、かつ、両折返面部Ｄ４・Ｄ４により側方に折り返された研磨テープＴを迂回案内すると共に研磨圧力を受ける受圧部材Ｄ５を設け、受圧部材Ｄ５により側方に迂回案内された研磨テープＴの側方迂回部分Ｔ３を上記円筒状部材Ｗの内周面Ｗ１を研磨可能な迂回研磨部Ｄ６として構成している。 In this case, in the tape polishing mechanism D, the guide member 9 is disposed on the mount 6 via the tape swinging mechanism G and the press-contact moving mechanism F, and the polishing tape T is transported back to the guide member 9 the line return turnup portion of the abrasive tape T is transported guided together to form a row guide portions D 1 and return guide section D 2 which guides forming a detour guidable detour guiding portion D 3 laterally bypass guide portion D the 3 back from the side of Modogawa portion T 2 together with the folded laterally line portion T 1 of the one row portion T 1 and Modogawa portion T 2 of the said abrasive tape T from the line guide portion D 1 folding the guide portion D 2 form two turnup face D 4 · D 4, and subjected to polishing pressure with bypassing guide the abrasive tape T is folded laterally by Ryoorikae surface D 4 · D 4 pressure the member D 5 is provided, the abrasive tape which has been diverted guided laterally by the pressure receiving member D 5 Lateral bypass portion T 3 of the T constitutes the inner circumferential surface W 1 of the cylindrical member W as polishable detour polishing section D 6.
又、この場合、上記テープ揺振機構Ｇ及び圧接移動機構Ｆとして、上記取付台６に揺振台１０を摺動部１１及び案内レール１２により上下揺振摺動自在に設け、揺振台１０の上部に揺振部材１３を取付け、揺振部材１３に嵌合凹部１４を形成し、上記取付台６に偏心軸１５を軸受６ｃにより回転自在に突設し、偏心軸１５の先端部に偏心軸１５の回転軸線Ｏに対して偏心量εの軸線Ｏ１を有する偏心部１５ａを形成し、偏心部１５ａに嵌合凹部１４の上下の接触面１４ａ・１４ａに接触する偏心輪１６を回転自在に取付け、取付台６に揺振用モータ１７を配置し、揺振用モータ１７の主軸と偏心軸１５との間にベルト伝動機構１８を介装し、揺振用モータ１７の回転により偏心部１５ａと偏心輪１６との偏心輪作用により上記揺振部材１３及び揺振台１０を上下揺振運動自在に設け、すなわち、上記テープ揺振機構Ｇは片持状態に突設された偏心軸１５、偏心軸１５の先端部に配置された偏心輪１６、揺振用モータ１７及び、揺振用モータ１７の主軸と偏心軸１５の中程部との間に介装されたベルト伝動機構１８からなり、これにより、上記テープ研磨機構Ｄを上記案内部材９に形成された研磨テープＴの側方迂回部分Ｔ３からなる迂回研磨部Ｄ６での研磨テープＴの移送方向と交差する方向に揺振運動Ｐさせるように構成し、かつ、揺振台１０の下部に水平圧接台１９を摺動部２０及び案内レール２１により水平摺動自在に設け、揺振台１０に圧接用シリンダ２２を取付け、圧接用シリンダ２２のシリンダロッド２２ａと水平圧接台１９とを連結し、水平圧接台１９に上記案内部材９を取付け、上記案内部材９に形成された研磨テープＴの側方迂回部分Ｔ３からなる迂回研磨部Ｄ６を上記円筒状部材Ｗの内周面Ｗ１に圧接して研磨可能に構成している。 Further, in this case, as the tape swing mechanism G and the press-contact moving mechanism F, the swing table 10 is provided on the mount 6 so as to be vertically slidable by the sliding portion 11 and the guide rail 12. Mount the rocking member 13 on the upper part, form the fitting recess 14 in the rocking member 13, project the eccentric shaft 15 rotatably on the mount 6 by the bearing 6c, and eccentrically at the tip of the eccentric shaft 15 the eccentric portion 15a having an axis O 1 of the eccentricity ε with respect to the rotation axis O of the shaft 15 is formed, rotatable eccentric 16 in contact with the upper and lower contact surfaces 14a · 14a of the fitting recess 14 to the eccentric portion 15a The rocking motor 17 is mounted on the mounting base 6, and the belt transmission mechanism 18 is interposed between the main shaft of the rocking motor 17 and the eccentric shaft 15, and the eccentric portion is formed by the rotation of the rocking motor 17. The swinging member 13 and the eccentric member 16 and the eccentric ring 16 function as an eccentric wheel. The shaking table 10 is provided so as to freely swing up and down, that is, the above-mentioned tape swinging mechanism G is provided with an eccentric shaft 15 projecting in a cantilevered state, an eccentric ring 16 disposed at the tip of the eccentric shaft 15, Motor 17 and a belt transmission mechanism 18 interposed between the main shaft of the rocking motor 17 and the middle portion of the eccentric shaft 15, whereby the tape polishing mechanism D is formed on the guide member 9. have been configured so as to Yurafu movement P in a direction intersecting the transport direction of the polishing tape T at the detour polishing section D 6 consisting of side bypass portion T 3 of the polishing tape T, and the lower portion of the rocking vibration base 10 The horizontal press-fit table 19 is provided horizontally slideable by the slide part 20 and the guide rail 21 and the press-fit cylinder 22 is attached to the swing table 10 and the cylinder rod 22a of the press-fit cylinder 22 and the horizontal press-fit stand 19 are connected. And the above-mentioned guide part Install the timber 9, the polishing can be configured to bypass polishing section D 6 consisting of side bypass portion T 3 of the abrasive tape T which is formed in the guide member 9 is pressed against the inner circumferential surface W 1 of the cylindrical member W doing.
又、この場合、上記送り機構Ｃ１及び上記バックテンション機構Ｃ２にあっては、図１、図４の如く、上記取付台６に移送用モータ２３を取付け、移送用モータ２３の主軸と上記巻取リールＲ Ｅ の支持軸７との間にベルト伝動機構２４を介装し、移送用モータ２３の主軸に移送ロール２５を取付け、取付台６に揺動アーム２６をピン軸２７を中心として揺動自在に設け、揺動アーム２６に移送ロール２５に掛けられた研磨テープＴを移送ロール２５の外周面に弾圧用バネ２８により弾圧可能な遊転ロール２９を設け、研磨テープＴの上記迂回研磨部Ｄ６からの戻側部分Ｔ２を強制的に移送させるように構成され、さらに、図１、図３の如く、上記取付台６に上記テンション用モータＭを取付け、テンション用モータＭの主軸に繰出ロールＫを取付け、取付台６に揺動アーム３０をピン軸３１を中心として揺動自在に設け、揺動アーム３０に繰出ロールＫに掛けられた研磨テープＴを繰出ロールＫの外周面に弾圧用バネ３２により弾圧可能な遊転ロールＨを設け、研磨テープＴを繰出ロールＫと遊転ロールＨとにより弾圧用バネ３２のバネ圧で挟装してテンション用モータＭの回転制御により上記研磨テープＴの上記迂回研磨部Ｄ６に至る行側部分Ｔ１に研磨テープＴの移送方向とは逆方向の張力を付与するように構成している。 Further, in this case, in the above feeding mechanism C 1 and the back tension mechanism C 2, FIG. 1, as shown in FIG. 4, fitted with a transfer motor 23 to the mounting base 6, the main shaft and the transport motor 23 interposed belt transmission mechanism 24 between the support shaft 7 of the take-up reel R E, attached to the main shaft to transfer roll 25 of the transfer motor 23, the swing arm 26 a pin axis 27 as the center to mount 6 A swing roller 26 is provided, and an idle roll 29 is provided on the outer peripheral surface of the transfer roll 25 so that the polishing tape T hung on the transfer roll 25 can be resiliently pressed by the resilient spring 28. is configured to forcibly transfer the back side portion T 2 of the from the polishing section D 6, further 1, as shown in FIG. 3, the mounting of the motor M for the tension to the mount 6, the motor M tension Feed roll to spindle The rocking arm 30 is provided on the mounting base 6 so as to be able to rock about the pin shaft 31, and the polishing tape T hung on the drawing roll K on the rocking arm 30 is applied to the outer peripheral surface of the feeding roll K 32 is provided with an idler roll H capable of being resiliently pressed, and the polishing tape T is sandwiched between the feeding roll K and the idler roll H by the spring pressure of the resilient spring 32 to control the rotation of the tension motor M to control the polishing tape T. of the transfer direction of the polishing tape T in the row portion T 1 leading to the bypass polishing section D 6 is configured so as to impart a backward tension.
又、この場合、上記受圧部材Ｄ５は回転ロール状に形成され、かつ、外周面部はゴム又は合成樹脂等の弾性材或いは硬質材により形成され、さらに、この場合、上記の如く、上記研磨テープＴからなる上記迂回研磨部Ｄ６による研磨構造は乾式研磨構造又は湿式研磨構造を採用することができる。 Further, in this case, the pressure receiving member D 5 is formed in a shape rotating roll and the outer peripheral surface portion is formed of an elastic material or a rigid material such as rubber or synthetic resin, furthermore, in this case, as described above, the polishing tape The polishing structure by the detour polishing portion D 6 made of T can adopt a dry polishing structure or a wet polishing structure.
この実施の形態例は上記構成であるから、人為的又は自動的に保持回転機構Ａに円筒状部材Ｗを装着して回転させ、研磨機構Ｂのテープ移送機構Ｃにより実巻リールＲＦから巻取リールＲＥへと研磨テープＴを間欠的又は連続的に移送させ、この場合、上記移動機構Ｅのボールねじ機構１ｄによりテープ研磨機構Ｄを円筒状部材Ｗに向けて下降し、テープ研磨機構Ｄの案内部材９の行案内部Ｄ１及び戻案内部Ｄ２により研磨テープＴを行戻移送案内すると共に行戻移送案内される研磨テープＴの折返部分を案内部材９の迂回案内部Ｄ３により側方に迂回案内し、迂回案内部Ｄ３には上記研磨テープＴの行側部分Ｔ１及び戻側部分Ｔ２のうちの行側部分Ｔ１を行案内部Ｄ１から側方に折返すと共に戻側部分Ｔ２を側方から戻案内部Ｄ２に折返す二つの折返面部Ｄ４・Ｄ４及び両折返面部Ｄ４・Ｄ４により側方に折り返された研磨テープＴを迂回案内すると共に研磨圧力を受ける受圧部材Ｄ５が設けられ、受圧部材Ｄ５により側方に迂回案内された研磨テープＴの側方迂回部分Ｔ３は上記円筒状部材Ｗの内周面Ｗ１を研磨可能な上記テープ研磨機構Ｄの迂回研磨部Ｄ６とされ、迂回研磨部Ｄ６を圧接移動機構Ｆにより円筒状部材Ｗの内周面Ｗ１に適宜研磨圧力をもって圧接Ｖし、かつ、テープ揺振機構Ｇによりテープ研磨機構Ｄを迂回研磨部Ｄ６での研磨テープＴの移送方向と交差する方向に揺振運動Ｐさせ、上記テープ揺振機構Ｇは片持状態に突設された偏心軸１５、偏心軸１５の先端部に配置された偏心輪１６、揺振用モータ１７及び、揺振用モータ１７の主軸と偏心軸１５の中程部との間に介装されたベルト伝動機構１８からなり、しかして、円筒状部材Ｗの回転Ｑ、研磨テープＴの移送Ｓと揺振動作Ｐ及び研磨テープＴの圧接動作Ｖの複合動作により円筒状部材Ｗの内周面Ｗ１を研磨テープＴの迂回研磨部Ｄ６により研磨加工することができ、加工条件に応じて乾式状態又は加工部位に研磨液を供給する湿式状態の雰囲気において、研磨加工が行われることになる。 Since this embodiment has the above-described configuration, the cylindrical member W is artificially or automatically attached to the holding and rotating mechanism A and rotated, and the tape transfer mechanism C of the polishing mechanism B winds from the actual winding reel RF. The polishing tape T is intermittently or continuously transferred to the take-up reel E. In this case, the tape polishing mechanism D is lowered toward the cylindrical member W by the ball screw mechanism 1d of the moving mechanism E, and the tape polishing mechanism detour guiding portion D 3 of the guide turnup portion of the abrasive tape T to be the line back movement guide member 9 while Gyomodo movement guide the polishing tape T by the line guide portions D 1 and return the guide portion D 2 of the guide member 9 in D bypassing guided laterally by folding the lateral line portion T 1 from the row guide portion D 1 of the one row portion T 1 and Modogawa portion T 2 of the said abrasive tape T is in the bypass guide portion D 3 guide portions D 2 returns the Modogawa portion T 2 from the side with return Pressure receiving member D 5 for receiving a polishing pressure with bypassing guide the abrasive tape T is folded laterally by two fold surface D 4 · D 4 and Ryoorikae surface D 4 · D 4 provided folded, the pressure receiving member D side bypass portion T 3 of the abrasive tape T which has been diverted guided laterally by 5 is a detour polishing section D 6 of the cylindrical member W inner circumferential surface W 1 polishable a said tape polishing mechanism D of detour polishing the polishing section D 6 pressed V with an appropriate polishing pressure on the inner peripheral surface W 1 of the cylindrical member W by pressing the moving mechanism F, and a tape polishing mechanism D with detour polishing section D 6 by the tape Yurafu mechanism G The swing motion P is performed in a direction intersecting the transfer direction of the tape T, and the tape swing mechanism G includes an eccentric shaft 15 protruding in a cantilever state, an eccentric ring 16 disposed at the tip of the eccentric shaft 15, a swing Vibration motor 17 and the spindle of the vibration motor 17 and The belt transmission mechanism 18 is interposed between the center portion of the center shaft 15 and the rotation Q of the cylindrical member W, the transfer S of the polishing tape T, the shaking operation P, and the pressure contact of the polishing tape T. the inner circumferential surface W 1 of the cylindrical member W can be polished by the detour polishing section D 6 of the abrasive tape T by the combined operation of the operation V, supplying a polishing liquid to the dry state or processing site in response to machining conditions Polishing will be performed in a wet atmosphere.
この際、上記テープ移送機構Ｃには上記研磨テープＴの上記迂回研磨部Ｄ６からの戻側部分Ｔ２を強制的に移送させる送り機構Ｃ１及び上記研磨テープＴの上記迂回研磨部Ｄ６に至る行側部分Ｔ１に研磨テープＴの移送方向とは逆方向の張力を付与するバックテンション機構Ｃ２が設けられ、バックテンション機構Ｃ２は研磨テープＴの行側部分Ｔ１を移送案内する繰出ロールＫ、研磨テープＴを繰出ロールＫの外周面に弾圧可能な遊転ロールＨ、繰出ロールＫに掛けられた研磨テープＴを遊転ロールＨにより繰出ロールＫの外周面に弾圧する弾圧用バネ３２及び繰出ロールＫを研磨テープＴの移送方向とは逆方向に回転させるテンション用モータＭからなり、研磨テープＴを繰出ロールＫと遊転ロールＨとにより挟装してテンション用モータＭの回転制御により研磨テープＴに移送方向とは逆方向の張力を付与する構造を備えてなるから、上記迂回研磨部Ｄ６からの研磨テープＴの戻側部分Ｔ２は研磨テープＴの上記迂回研磨部Ｄ ６ からの戻側部分Ｔ ２ を強制的に移送させる移送ロール２５、研磨テープＴを移送ロール２５の外周面に弾圧可能な遊転ロール２９、移送ロール２５に掛けられた研磨テープＴを遊転ロール２９により移送ロール２５の外周面に弾圧する弾圧用バネ２８、移送ロール２５を研磨テープＴの移送方向Ｓに回転させる移送用モータ２３、及び移送用モータ２３の主軸と上記巻取リールＲ Ｅ の支持軸７との間に介装されたベルト伝動機構２４からなる送り機構Ｃ１により巻取リールＲＥへと強制的に移送されると共に上記バックテンション機構Ｃ２により上記実巻リールＲＦからの上記研磨テープＴの上記迂回研磨部Ｄ６に至る行側部分Ｔ１に研磨テープＴの移送方向とは逆方向の張力Ｙを付与され、研磨テープＴの揺振動作及び研磨テープＴの圧接動作に伴う上記迂回研磨部Ｄ６に至る行側部分Ｔ１での研磨テープＴのたるみ現象を阻止することができ、研磨テープＴの円滑な移送及び揺振を良好に行うことができ、かつ、上記研磨テープＴは繰出ロールＫと遊転ロールＨとにより弾圧用バネ３２のバネ圧で弾圧挟装され、テンション用モータＭの回転制御により繰出ロールＫを介して研磨テープＴに移送方向とは逆方向の張力を付与することができ、逆方向の張力制御を良好に行うことができ、それだけ、円筒状部材Ｗの内周面Ｗ１の研磨加工を良好に行うことができ、加工作業性を向上することができる。 At this time, the tape feeding mechanism to transfer mechanism C forcibly transferring back portion T 2 of the from the bypass polishing section D 6 of the abrasive tape T C 1 and the bypass polishing section D 6 of the abrasive tape T back tension mechanism C 2 to impart reverse tension is provided to the transport direction of the polishing tape T in the row portion T 1 leading to a back tension mechanism C 2 will transfer guide line portion T 1 of the polishing tape T The rolling roll K, the grinding tape T can be pressed against the outer circumferential surface of the feeding roll K, the rolling roll H can be pressed against the outer circumference of the feeding roll K The tensioning motor M rotates the spring 32 and the feeding roll K in the direction opposite to the transfer direction of the polishing tape T, and the polishing tape T is sandwiched by the feeding roll K and the idler roll H for tensioning. Since consisting comprises a structure to impart reverse tension the transfer direction to the polishing tape T by the rotation control of the motor M, back portion T 2 of the polishing tape T from the bypass polishing section D 6 is the abrasive tape T the bypass polishing section D back side portion T 2 forcibly transfer roll 25 for transferring the from 6, the polishing tape T transport repression possible idling roll 29 on the outer peripheral surface of the roll 25, polishing was applied to the transfer roll 25 A resilient spring 28 that presses the tape T against the outer peripheral surface of the transfer roll 25 by the idle roll 29, a transfer motor 23 that rotates the transfer roll 25 in the transfer direction S of the polishing tape T, and a main shaft of the transfer motor 23 the back tension mechanism C together is forcibly transferred to the take-up reel R E by the feed mechanism C 1 consisting interposed a belt transmission mechanism 24 between the support shaft 7 of the take-up reel R E By the transfer direction of the polishing tape T of the bypass polishing section D 6 to reach the line side portion T 1 in abrasive tape T from the actual winding reel R F is imparted a backward tension Y, rocking of the abrasive tape T it is possible to prevent a sagging phenomenon of the abrasive tape T in the row portion T 1 leading to the bypass polishing section D 6 due to the pressure contact operation of the oscillation operation and the polishing tape T, a smooth transfer and Yurafu abrasive tape T The polishing tape T can be favorably carried out by the feeding roll K and the idler roll H, and is held by the spring pressure of the spring 32 for elastic pressure, and the rotation control of the tension motor M is performed via the feeding roll K. Tension in the direction opposite to the transfer direction can be applied to the polishing tape T, tension control in the reverse direction can be favorably performed, and accordingly, polishing of the inner peripheral surface W 1 of the cylindrical member W is good Can be done, processing It is possible to improve the sex.
又、この場合、上記受圧部材Ｄ５は回転ロール状に形成され、かつ、外周面部はゴム又は合成樹脂等の弾性材或いは硬質材からなるので、研磨圧力を良好に受けることができ、又、この場合、上記研磨テープＴからなる上記迂回研磨部Ｄ６による研磨構造は乾式研磨構造又は湿式研磨構造とすることにより、円筒状部材Ｗの材質や研磨条件等の仕様に対応することができる。 Further, in this case, the pressure receiving member D 5 is formed in a shape rotating roll and the outer peripheral surface so made of an elastic material or a rigid material such as rubber or synthetic resin, it can be subjected to polishing pressure well, also, in this case, the polishing structure of the bypass polishing section D 6 composed of the abrasive tape T may be by a dry abrasive structures or wet abrasive structures, it corresponds to the specifications such material and polishing conditions of the cylindrical member W.
又、この場合、テープ移送機構Ｃを円筒状部材Ｗに向けて移動させる移動機構Ｅを設けているから、円筒状部材Ｗに対するテープ移送機構Ｃの作業姿勢及び非作業姿勢を容易に位置変更することができ、作業性を向上することができる。 Further, in this case, since the moving mechanism E for moving the tape transfer mechanism C toward the cylindrical member W is provided, the working posture and the non-work posture of the tape transfer mechanism C with respect to the cylindrical member W can be easily changed. Can improve the workability.
尚、本発明は上記実施の形態例に限られるものではなく、上記保持回転機構Ａ、研磨機構Ｂ、テープ移送機構Ｃ、テープ研磨機構Ｄ、圧接移動機構Ｆ、テープ揺振機構Ｇの構造等は適宜変更して設計されるものである。 The present invention is not limited to the above embodiment, and the structure of the holding and rotating mechanism A, the polishing mechanism B, the tape transfer mechanism C, the tape polishing mechanism D, the press moving mechanism F, the tape swinging mechanism G, etc. Is designed to be changed as appropriate.
以上、所期の目的を充分達成することができる。 As described above, the intended purpose can be sufficiently achieved.
Ｗ 円筒状部材
Ｗ１ 内周面
Ｔ 研磨テープ
Ｔ１ 行側部分
Ｔ２ 戻側部分
Ｔ３ 側方迂回部分
Ａ 保持回転機構
Ｂ 研磨機構
Ｃ テープ移送機構
Ｃ１ 送り機構
Ｃ２ バックテンション機構
Ｄ テープ研磨機構
Ｄ１ 行案内部
Ｄ２ 戻案内部
Ｄ３ 迂回案内部
Ｄ４ 折返面部
Ｄ５ 受圧部材
Ｄ６ 迂回研磨部
Ｆ 圧接移動機構
Ｇ テープ揺振機構
Ｈ 遊転ロール
Ｋ 繰出ロール
Ｒ Ｆ 実巻リール
Ｒ Ｅ 巻取リール
Ｍ テンション用モータ
Ｓ 移送
Ｖ 圧接
Ｐ 揺振運動
Ｙ 張力
７ 支持軸
１６ 偏心輪
１７ 揺振用モータ
１８ ベルト伝動機構
２３ 移送用モータ
２４ ベルト伝動機構
２５ 移送ロール
２８ 弾圧用バネ
２９ 遊転ロール
３２ 弾圧用バネ
W cylindrical member W 1 inner circumferential surface T abrasive tape T 1 line portion T 2 Modogawa portion T 3 side detour A holding and rotating mechanism B abrasive mechanism C tape transport mechanism C 1 feeding mechanism C 2 back tension mechanism D Tape Polishing mechanism D 1 line guiding portion D 2 return guiding portion D 3 bypass guiding portion D 4 folded surface D 5 pressure receiving member D 6 bypass grinding portion F press-contacting moving mechanism G tape swinging mechanism H idle roll K feeding roll
R F actual winding reel
R E Take- up reel M tensioning motor S transfer V pressure contact P swinging motion Y tension
7 Support shaft 16 Eccentric wheel 17 Vibration motor 18 Belt transmission mechanism
23 transfer motor
24 belt drive mechanism
25 transfer rolls
28 spring for spring
29 idler roll 32 oppression for spring
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| JP2016047408A JP6518206B2 (en) | 2016-03-10 | 2016-03-10 | Inner surface polishing machine |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2016047408A JP6518206B2 (en) | 2016-03-10 | 2016-03-10 | Inner surface polishing machine |
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| JP2017159414A JP2017159414A (en) | 2017-09-14 |
| JP6518206B2 true JP6518206B2 (en) | 2019-05-22 |
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| CN113681367A (en) * | 2021-09-28 | 2021-11-23 | 上海电机学院 | Pipeline grinding device for machining |
| CN117140285B (en) * | 2023-10-31 | 2023-12-26 | 南通成科精密铸件有限公司 | Finish machining polisher for automobile aluminum alloy fittings |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5214308Y2 (en) * | 1972-07-26 | 1977-03-31 | ||
| US4603510A (en) * | 1984-08-27 | 1986-08-05 | Rasmussen Aaron P | Multiple position belt grinder |
| JP3764979B2 (en) * | 1996-04-15 | 2006-04-12 | 株式会社サンシン | Polishing method and apparatus |
| JPH11203668A (en) * | 1998-01-06 | 1999-07-30 | Hirata Corp | Texture processing device of hard disk |
| JP2002126981A (en) * | 2000-10-25 | 2002-05-08 | Sanshin:Kk | Disc member peripheral portion grinding device |
| JP2003266294A (en) * | 2002-03-13 | 2003-09-24 | Sanshin Co Ltd | Platelike member polishing device |
| JP5274993B2 (en) * | 2007-12-03 | 2013-08-28 | 株式会社荏原製作所 | Polishing equipment |
| JP5464497B2 (en) * | 2010-08-19 | 2014-04-09 | 株式会社サンシン | Substrate polishing method and apparatus |
| JP5678382B2 (en) * | 2011-10-31 | 2015-03-04 | 株式会社サンシン | Tape polishing equipment |
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