JP6506226B2 - ディスクロール用基材及びその製造方法並びにディスクロール及びその製造方法 - Google Patents
ディスクロール用基材及びその製造方法並びにディスクロール及びその製造方法 Download PDFInfo
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- JP6506226B2 JP6506226B2 JP2016164664A JP2016164664A JP6506226B2 JP 6506226 B2 JP6506226 B2 JP 6506226B2 JP 2016164664 A JP2016164664 A JP 2016164664A JP 2016164664 A JP2016164664 A JP 2016164664A JP 6506226 B2 JP6506226 B2 JP 6506226B2
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- 239000000463 material Substances 0.000 title claims description 94
- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 239000011229 interlayer Substances 0.000 claims description 65
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 56
- 239000011707 mineral Substances 0.000 claims description 56
- 239000000758 substrate Substances 0.000 claims description 45
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 29
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- 235000019354 vermiculite Nutrition 0.000 claims description 19
- 239000002002 slurry Substances 0.000 claims description 18
- 229910052902 vermiculite Inorganic materials 0.000 claims description 18
- 239000010455 vermiculite Substances 0.000 claims description 18
- 229910021647 smectite Inorganic materials 0.000 claims description 13
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical group OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 claims description 8
- 150000004760 silicates Chemical class 0.000 claims description 7
- 229910000269 smectite group Inorganic materials 0.000 claims description 7
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- 238000005299 abrasion Methods 0.000 description 25
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
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- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 5
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- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 3
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- HPTYUNKZVDYXLP-UHFFFAOYSA-N aluminum;trihydroxy(trihydroxysilyloxy)silane;hydrate Chemical group O.[Al].[Al].O[Si](O)(O)O[Si](O)(O)O HPTYUNKZVDYXLP-UHFFFAOYSA-N 0.000 description 1
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- 229910000271 hectorite Inorganic materials 0.000 description 1
- KWLMIXQRALPRBC-UHFFFAOYSA-L hectorite Chemical compound [Li+].[OH-].[OH-].[Na+].[Mg+2].O1[Si]2([O-])O[Si]1([O-])O[Si]([O-])(O1)O[Si]1([O-])O2 KWLMIXQRALPRBC-UHFFFAOYSA-L 0.000 description 1
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- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
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- 230000003746 surface roughness Effects 0.000 description 1
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Images
Classifications
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- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
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- C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
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- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
- C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
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- C—CHEMISTRY; METALLURGY
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- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
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- Materials Engineering (AREA)
- Organic Chemistry (AREA)
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- Dispersion Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Thermal Sciences (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Rolls And Other Rotary Bodies (AREA)
- Producing Shaped Articles From Materials (AREA)
- Heat Treatments In General, Especially Conveying And Cooling (AREA)
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Description
2d・sinθ=λ
d:層間距離
θ:回折角
λ:測定X線波長
このようにして測定した層間距離を、その層状珪酸塩の層間距離として用いることもできる。
表1に示す配合(質量%)のように、バーミキュライト32質量%、スメクタイト(具体的にはモンモリロナイト)10質量%、無機繊維(アルミナ70質量%以上、シリカ30質量%以下のムライト繊維)40質量%、木節粘土10質量%、パルプ6質量%及び澱粉2質量%を含む水性スラリーを調製し、吸引脱水成形法により乾燥後の寸法が200mm×200mm×6mmのディスクロール用基材(ミルボード)を成形した。
得られたディスクロール用基材について、触針式表面粗さ測定機(JIS B 0651)を使用して、JIS B 0601−1994で規定された方法により測定し、算術平均粗さRa、最大高さRy、十点平均粗さRzを測定した。
ディスクロール用基材を外径60mm内径20mmのリング状に打ち抜き、リング状ディスクロール用基材を作製した。これを直径20mmのステンレス鋼製軸部(シャフト)に挿通し、長さ100mm、充填密度1.35g/cm3になるようにロールビルドし、試験用ディスクロールを作製した。この試験用ディスクロールを900℃の炉の中に投入し、3時間保持後、炉から取り出した。取り出した直後にステンレス製(350g)の衝撃用治具を所定高さ(50〜300mm)から落下させた。落下後の外観を観察した。クラックが入ったときの高さを衝撃強さとした。
ディスクロール用基材を外径70mm内径20mmのリング状に打ち抜き、リング状ディスクロール用基材を作製した。これを直径20mmのステンレス鋼製軸部(シャフト)に挿通し、長さ100mm、充填密度1.35g/cm3になるようにロールビルドし、ディスクロールを作製した。このようにして作製したディスクロールを、図3(a)の試験用ディスクロール310として図示した。この試験用ディスクロール310を900℃で3時間加熱したあと、このディスクロール310のディスク部表面に、1mm間隔で幅1mmの溝加工を10本施した直径12mmのアルミナ製の軸(磨耗材322)を接触させた。磨耗材322には錘324により荷重をかけた。磨耗材322をディスクロール310のディスク部に接触させた状態で15分間回転させ、ディスクロール310のディスク部表面に出来た溝の深さを測定した。図3(b)は図3(a)の点線部を横から見て拡大した概略図である。磨耗材322には実際には上記のように溝が10本加工されている。
上記のようにして得られたディスクロール用基材から、図4(a)に示すような形状の測定用試料423を作製した。図4(a)に示す接触部の外径が65mm、接触部の長さが30mmの試料とした。測定用試料423には、軸部に通すための貫通孔が形成されている。この測定用試料423を図4(b)に示したように、軸部411に測定用試料423を挿通し、フランジ414を介してナット415で固定した。この状態で図4(b)に示すように測定用試料423を上部圧縮子432と下部圧縮子434とで挟み、上部圧縮子を上方向から圧縮し、破壊したときの線荷重を算出した。また、所定荷重をかけた際の沈み込み変形量(ストローク)を測定した。
表1に示すように、層状珪酸塩の量を変えた他は、実施例1と同様にしてディスクロール用基材とディスクロールを製造して評価した。結果を表1に示す。
表1に示すように、層状珪酸塩としてマイカ(層間距離10オングストローム以下)とスメクタイト(具体的にはモンモリロナイト)を用いた他は、実施例1と同様にしてディスクロール用基材とディスクロールを製造して評価した。結果を表1に示す。
表1に示すように、層状珪酸塩としてスメクタイト(具体的にはモンモリロナイト)のみを用いた他は、実施例1と同様にしてディスクロール用基材とディスクロールを製造して評価した。結果を表1に示す。
11…軸部(金属製シャフト)、
12…ディスクロール用基材(リング状のディスクロール用基材)、
13…ディスク部、
14…フランジ、
15…ナット、
100…板ガラス製造装置、
101…溶融炉、
102…スリット、
110…帯状ガラス溶融物、
310…試験用ディスクロール、
322…磨耗材、
324…錘、
411…軸部、
414…フランジ、
415…ナット、
423…測定用試料、
432…上部圧縮子、
434…下部圧縮子。
Claims (12)
- 層状珪酸塩を含むディスクロール用基材であって、
該層状珪酸塩として、層間距離が10オングストロームを超える鉱物を2種類以上含有するものであり、
前記層間距離が10オングストロームを超える鉱物として、バーミキュライト及びスメクタイトを含み、前記ディスクロール用基材の質量に対する含有割合が、バーミキュライトが10質量%以上40質量%以下、スメクタイトが2質量%以上20質量%以下であることを特徴とするディスクロール用基材。 - 前記層間距離が10オングストロームを超える鉱物は、層間距離が100オングストローム以下のものであることを特徴とする請求項1に記載のディスクロール用基材。
- 前記バーミキュライト及び前記スメクタイトの他に前記ディスクロール用基材に含まれる前記層間距離が10オングストロームを超える鉱物が、スメクタイト族、バーミキュライト族、緑泥石族に含まれる鉱物から選択されるものであることを特徴とする請求項1又は請求項2に記載のディスクロール用基材。
- 前記層状珪酸塩として、層間距離が10オングストロームを超える鉱物を3種類以上含有するものであることを特徴とする請求項1から請求項3のいずれか1項に記載のディスクロール用基材。
- 前記層間距離が10オングストロームを超える鉱物の前記ディスクロール用基材の質量に対する質量比が12乃至60質量%であることを特徴とする請求項1から請求項4のいずれか1項に記載のディスクロール用基材。
- 請求項1から請求項5のいずれか1項に記載のディスクロール用基材であって、
該ディスクロール用基材は無機繊維と、粘土とを含み、該ディスクロール用基材の質量に対する含有割合が、
前記無機繊維は20乃至55質量%であり、
前記粘土は5乃至50質量%である
ことを特徴とするディスクロール用基材。 - 前記ディスクロール用基材の質量に対する含有割合が、
前記無機繊維は30乃至45質量%であり、
前記粘土は20乃至45質量%である
ことを特徴とする請求項6に記載のディスクロール用基材。 - 請求項1から請求項7のいずれか1項に記載のディスクロール用基材において、
前記層間距離が10オングストロームを超える鉱物間の質量比として、いずれの1種類の層間距離が10オングストロームを超える鉱物を除いた時においても、残りの種類の層間距離が10オングストロームを超える鉱物で10%質量以上あることを特徴とするディスクロール用基材。 - 筒状のディスク部と、該ディスク部が挿通される軸部とを備えるディスクロールであって、
前記ディスク部が、請求項8に記載のディスクロール用基材を含み、
前記ディスク部が溶融ガラスに接触するものであり、ガラスの搬送に用いるものであることを特徴とするディスクロール。 - 請求項9に記載のディスクロールを用いて溶融ガラスを搬送する搬送工程を備えることを特徴とするガラスの製造方法。
- 請求項8に記載のディスクロール用基材を軸部に挿通する挿通工程を備え、該ディスクロール用基材を含む筒状のディスク部と、該ディスク部が挿通された軸部とを備えるディスクロールを製造することを特徴とするディスクロールの製造方法。
- 層状珪酸塩を含むスラリーを準備する工程と、
該スラリーを成形してディスクロール用基材を製造する工程と
を有するディスクロール用基材の製造方法であって、
前記スラリーとして、層間距離が10オングストロームを超える層状珪酸塩を2種類以上含有するスラリーを準備し、これを成形してディスクロール用基材を製造し、
前記層間距離が10オングストロームを超える層状珪酸塩として、バーミキュライト及びスメクタイトを含み、前記ディスクロール用基材の質量に対する含有割合が、バーミキュライトが10質量%以上40質量%以下、スメクタイトが2質量%以上20質量%以下であるディスクロール用基材を製造することを特徴とするディスクロール用基材の製造方法。
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