JP6495894B2 - 透明な拡散性oled基材及び当該基材の製造方法 - Google Patents
透明な拡散性oled基材及び当該基材の製造方法 Download PDFInfo
- Publication number
- JP6495894B2 JP6495894B2 JP2016513270A JP2016513270A JP6495894B2 JP 6495894 B2 JP6495894 B2 JP 6495894B2 JP 2016513270 A JP2016513270 A JP 2016513270A JP 2016513270 A JP2016513270 A JP 2016513270A JP 6495894 B2 JP6495894 B2 JP 6495894B2
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- inorganic
- layer
- substrate
- inorganic particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 60
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000010954 inorganic particle Substances 0.000 claims description 56
- 239000011230 binding agent Substances 0.000 claims description 42
- 239000011521 glass Substances 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 26
- 239000002245 particle Substances 0.000 claims description 21
- 210000003298 dental enamel Anatomy 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 16
- 230000003746 surface roughness Effects 0.000 claims description 12
- -1 titanium alkoxide Chemical class 0.000 claims description 11
- 239000002243 precursor Substances 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 8
- 239000011324 bead Substances 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000006185 dispersion Substances 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 239000004111 Potassium silicate Substances 0.000 claims description 3
- 239000004115 Sodium Silicate Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 claims description 3
- 229910052912 lithium silicate Inorganic materials 0.000 claims description 3
- 229910052913 potassium silicate Inorganic materials 0.000 claims description 3
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 claims description 3
- 235000019353 potassium silicate Nutrition 0.000 claims description 3
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical group [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 70
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000000605 extraction Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- 238000000149 argon plasma sintering Methods 0.000 description 3
- 238000001354 calcination Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 239000012798 spherical particle Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- YTTFFPATQICAQN-UHFFFAOYSA-N 2-methoxypropan-1-ol Chemical compound COC(C)CO YTTFFPATQICAQN-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910021488 crystalline silicon dioxide Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
- C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
- C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0226—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
- G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Optical Elements Other Than Lenses (AREA)
Description
(a)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材、
(b)無機粒子を含む粗い低屈折率層であって、該無機粒子はゾル−ゲル無機結合剤で基材の片面に付着していて、無機結合剤の表面近くの、又は表面の、又は表面から突出した無機粒子が0.15μmと3μmの間に含まれる算術平均偏差Raで特徴付けられる表面粗さを作り出していて、当該無機粒子と無機結合剤の両方が1.45と1.65の間の屈折率を有している、粗い低屈折率層、
(c)前記粗い低屈折率層(b)を覆っている、屈折率が1.8と2.1の間に含まれるエナメル製の高屈折率層、
を含む透明な拡散性OLED基材である。
(1)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材を用意する工程、
(2)屈折率が1.45と1.65の間の無機粒子を、屈折率が1.45と1.65の間の無機結合剤の少なくとも1種の前駆物質のゾルに分散させる工程、
(3)得られた分散液を前記基材の片面に塗布する工程、
(4)得られた層を加熱により乾燥及び焼成して、無機粒子と無機結合剤とを含む透明な粗い低屈折率層を得る工程、
(5)この粗い低屈折率層に屈折率が1.8と2.1の間の高屈折率ガラスフリットの層を適用する工程、
(6)前記粗い低屈折率層を覆う屈折率が1.8と2.1の間に含まれる高屈折率エナメル層が得られるように、前記ガラスフリットを乾燥及び溶融させる工程、
を含む。
Bi2O3: 55〜75wt%
BaO: 0〜20wt%
ZnO: 0〜20wt%
Al2O3: 1〜7wt%
SiO2: 5〜15wt%
B2O3: 5〜20wt%
Na2O: 0.1〜1wt%
CeO2: 0〜0.1wt%
の組成を有する。
本発明の代表的な態様としては、以下を挙げることができる:
《態様1》
次の連続した構成要素又は層、すなわち、
(a)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材(1)、
(b)無機粒子を含む粗い低屈折率層であって、当該無機粒子はゾル−ゲル無機結合剤で前記基材の片面に付着していて、当該無機結合剤の表面近くの、又は表面の、又は表面から突出した無機粒子が0.15μmと3μmの間に含まれる算術平均偏差R a で特徴付けられる表面粗さを作り出していて、当該無機粒子と無機結合剤の両方が1.45と1.65の間の屈折率を有している、粗い低屈折率層、
(c)前記粗い低屈折率層を覆っている、屈折率が1.8と2.1の間に含まれるエナメル製の高屈折率層、
を含む透明な拡散性OLED基材。
《態様2》
前記無機粒子が0.3μmと10μmの間、好ましくは0.5μmと8μmの間、より好ましくは0.8μmと7μmの間の平均相当球径を有する、態様1記載の基材。
《態様3》
前記無機粒子が中実のビーズである、態様1又は2記載の基材。
《態様4》
前記無機粒子が、相当球径が15μmより大きい、好ましくは12μmより大きい粒子を本質的に含まない、態様1〜3のいずれかに記載の基材。
《態様5》
前記基材、無機結合剤及び無機粒子の屈折率が1.50と1.60の間に含まれる、態様1〜4のいずれかに記載の基材。
《態様6》
前記高屈折率層の厚さが3μmと20μmの間、好ましくは4μmと15μmの間、より好ましくは5μmと12μmの間に含まれる、態様1〜5のいずれかに記載の基材。
《態様7》
前記高屈折率層の表面粗さが3nm未満、より好ましくは2nm未満、最も好ましくは1nm未満の算術平均偏差Raを有する、態様1〜6のいずれかに記載の基材。
《態様8》
前記高屈折率層が、それに分散した拡散性構成要素を本質的に含まず、特にそれに分散した拡散性の中実粒子を含まない、態様1〜7のいずれかに記載の基材。
《態様9》
前記無機粒子がシリカ粒子から選ばれている、態様1〜8のいずれかに記載の基材。
《態様10》
前記高屈折率のエナメル層の上に透明な導電性層を更に含む、態様1〜9のいずれかに記載の基材。
《態様11》
前記無機粒子の前記無機結合剤に対する体積比が0.3と3の間、好ましくは0.5と2の間、より好ましくは0.7と1.5の間に含まれる、態様1〜10のいずれかに記載の基材。
《態様12》
次の一連の工程、すなわち、
(1)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材を用意する工程、
(2)屈折率が1.45と1.65の間の無機粒子を、屈折率が1.45と1.65の間の無機結合剤の少なくとも1種の前駆物質のゾルに分散させる工程、
(3)得られた分散液を前記基材の片面に塗布する工程、
(4)得られた層を加熱により乾燥及び焼成して、無機粒子と無機結合剤とを含む透明な粗い低屈折率層を得る工程、
(5)この粗い低屈折率層に屈折率が1.8と2.1の間の高屈折率ガラスフリットの層を適用する工程、
(6)前記粗い低屈折率層を覆う屈折率が1.8と2.1の間に含まれる高屈折率エナメル層が得られるように、前記ガラスフリットを乾燥及び溶融させる工程、
を含む、態様1〜11のいずれかに記載の透明な拡散性基材の作製方法。
《態様13》
無機結合剤の前記少なくとも1種の前駆物質を、ケイ酸ナトリウム、ケイ酸カリウム、ケイ酸リチウム、テトラアルコキシシラン、チタンアルコキシド、アルミニウムアルコキシド、ジルコニウムアルコキシドからなる群より選ぶ、態様12記載の方法。
《態様14》
工程(4)における乾燥及び焼成を、少なくとも100℃、好ましくは100℃〜300℃、より好ましくは110〜200℃の温度での加熱により行う、態様12記載の方法。
《態様15》
前記無機粒子が0.3μmと10μmの間、好ましくは0.5μmと8μmの間、より好ましくは0.8μmと7μmの間の平均相当球径を有する、態様12〜14のいずれかに記載の方法。
Claims (16)
- 次の連続した構成要素又は層、すなわち、
(a)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材(1)、
(b)無機粒子を含む粗い低屈折率層であって、当該無機粒子はゾル−ゲル無機結合剤で前記基材の片面に付着していて、当該無機結合剤の表面近くの、又は表面の、又は表面から突出した無機粒子が0.15μmと3μmの間に含まれる算術平均偏差Raで特徴付けられる表面粗さを作り出していて、当該無機粒子と無機結合剤の両方が1.45と1.65の間の屈折率を有している、粗い低屈折率層、
(c)前記粗い低屈折率層を覆っている、屈折率が1.8と2.1の間に含まれるエナメル製の高屈折率層、
を含む透明な拡散性OLED基材。 - 前記無機粒子が0.3μmと10μmの間の平均相当球径を有する、請求項1記載の基材。
- 前記無機粒子が中実のビーズである、請求項1又は2記載の基材。
- 前記無機粒子が、相当球径が15μmより大きい粒子を含まない、請求項1〜3のいずれかに記載の基材。
- 前記基材、無機結合剤及び無機粒子の屈折率が1.50と1.60の間に含まれる、請求項1〜4のいずれかに記載の基材。
- 前記高屈折率層の厚さが3μmと20μmの間に含まれる、請求項1〜5のいずれかに記載の基材。
- 前記高屈折率層の表面粗さが3nm未満の算術平均偏差Raを有する、請求項1〜6のいずれかに記載の基材。
- 前記高屈折率層がそれに分散した拡散性構成要素を含まない、請求項1〜7のいずれかに記載の基材。
- 前記高屈折率層がそれに分散した拡散性の中実粒子を含まない、請求項1〜7のいずれかに記載の基材。
- 前記無機粒子がシリカ粒子から選ばれている、請求項1〜9のいずれかに記載の基材。
- 前記高屈折率のエナメル層の上に透明な導電性層を更に含む、請求項1〜10のいずれかに記載の基材。
- 前記無機粒子の前記無機結合剤に対する体積比が0.3と3の間に含まれる、請求項1〜11のいずれかに記載の基材。
- 次の一連の工程、すなわち、
(1)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材を用意する工程、
(2)屈折率が1.45と1.65の間の無機粒子を、屈折率が1.45と1.65の間の無機結合剤の少なくとも1種の前駆物質のゾルに分散させる工程、
(3)得られた分散液を前記基材の片面に塗布する工程、
(4)得られた層を加熱により乾燥及び焼成して、無機粒子と無機結合剤とを含む透明な粗い低屈折率層を得る工程、
(5)この粗い低屈折率層に屈折率が1.8と2.1の間の高屈折率ガラスフリットの層を適用する工程、
(6)前記粗い低屈折率層を覆う屈折率が1.8と2.1の間に含まれる高屈折率エナメル層が得られるように、前記ガラスフリットを乾燥及び溶融させる工程、
を含む、請求項1〜12のいずれかに記載の透明な拡散性基材の作製方法。 - 無機結合剤の前記少なくとも1種の前駆物質を、ケイ酸ナトリウム、ケイ酸カリウム、ケイ酸リチウム、テトラアルコキシシラン、チタンアルコキシド、アルミニウムアルコキシド、ジルコニウムアルコキシドからなる群より選ぶ、請求項13記載の方法。
- 工程(4)における乾燥及び焼成を、少なくとも100℃での加熱により行う、請求項13記載の方法。
- 前記無機粒子が0.3μmと10μmの間の平均相当球径を有する、請求項13〜15のいずれかに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP13168341.9A EP2803644B1 (en) | 2013-05-17 | 2013-05-17 | Transparent diffusive oled substrate and method for producing such a substrate |
EP13168341.9 | 2013-05-17 | ||
PCT/EP2014/058738 WO2014183993A1 (en) | 2013-05-17 | 2014-04-29 | Transparent diffusive oled substrate and method for producing such a substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016524788A JP2016524788A (ja) | 2016-08-18 |
JP6495894B2 true JP6495894B2 (ja) | 2019-04-03 |
Family
ID=48482931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016513270A Expired - Fee Related JP6495894B2 (ja) | 2013-05-17 | 2014-04-29 | 透明な拡散性oled基材及び当該基材の製造方法 |
Country Status (10)
Country | Link |
---|---|
US (1) | US10147894B2 (ja) |
EP (2) | EP2803644B1 (ja) |
JP (1) | JP6495894B2 (ja) |
KR (1) | KR102142437B1 (ja) |
CN (1) | CN105189383B (ja) |
ES (1) | ES2695052T3 (ja) |
MY (1) | MY175975A (ja) |
RU (1) | RU2656264C2 (ja) |
TW (1) | TWI622562B (ja) |
WO (1) | WO2014183993A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2564141T3 (es) | 2013-06-14 | 2016-03-18 | Saint-Gobain Glass France | Substrato de OLED difusor transparente y método para producir tal substrato |
KR20170132257A (ko) * | 2015-03-31 | 2017-12-01 | 코닝 인코포레이티드 | 광 산란 표면을 포함하는 도파관 및 이를 포함하는 디스플레이 장치 |
TW201721923A (zh) * | 2015-09-23 | 2017-06-16 | 康寧公司 | 使用奈米結構化塗層的有機發光二極體的光萃取 |
US11327205B2 (en) | 2019-07-29 | 2022-05-10 | Viavi Solutions Inc. | Encapsulated diffuser |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5674625A (en) * | 1993-11-10 | 1997-10-07 | Central Glass Company, Limited | Multilayered water-repellent film and method of forming same on glass substrate |
US6777871B2 (en) * | 2000-03-31 | 2004-08-17 | General Electric Company | Organic electroluminescent devices with enhanced light extraction |
WO2002075373A1 (fr) * | 2001-03-21 | 2002-09-26 | Fuji Photo Film Co., Ltd. | Couche mince antireflet et dispositif d'affichage d'images |
CN100463578C (zh) * | 2003-03-12 | 2009-02-18 | 三菱化学株式会社 | 电致发光元件 |
US8125128B2 (en) | 2005-03-11 | 2012-02-28 | Mitsubishi Chemical Corporation | Electroluminescence element and lighting apparatus |
JP5066814B2 (ja) | 2005-03-11 | 2012-11-07 | 三菱化学株式会社 | エレクトロルミネッセンス素子及び照明装置 |
JP5023737B2 (ja) * | 2007-02-27 | 2012-09-12 | 凸版印刷株式会社 | 有機エレクトロルミネセンスデバイス |
EP2178343B2 (en) | 2007-07-27 | 2020-04-08 | AGC Inc. | Translucent substrate, method for manufacturing the translucent substrate and organic led element |
JP5010556B2 (ja) * | 2007-08-27 | 2012-08-29 | パナソニック株式会社 | 有機el発光素子 |
FR2924274B1 (fr) | 2007-11-22 | 2012-11-30 | Saint Gobain | Substrat porteur d'une electrode, dispositif electroluminescent organique l'incorporant, et sa fabrication |
CN101978781A (zh) | 2008-03-18 | 2011-02-16 | 旭硝子株式会社 | 电子器件用基板、有机led元件用层叠体及其制造方法、有机led元件及其制造方法 |
DE102009036134A1 (de) * | 2009-08-05 | 2011-02-10 | Schott Ag | Substratglas für Lumineszenzdioden mit einer Streupartikel enthaltenden Schicht und Verfahren zu dessen Herstellung |
JPWO2011046190A1 (ja) * | 2009-10-15 | 2013-03-07 | 旭硝子株式会社 | 有機led素子、有機led素子の散乱層用のガラスフリット及び有機led素子の散乱層の製造方法 |
FR2955575B1 (fr) | 2010-01-22 | 2012-02-24 | Saint Gobain | Substrat verrier revetu d'une couche haut indice sous un revetement electrode et dispositif electroluminescent organique comportant un tel substrat. |
TW201228069A (en) * | 2010-07-16 | 2012-07-01 | Agc Glass Europe | Translucent conductive substrate for organic light emitting devices |
FR2963705B1 (fr) * | 2010-08-06 | 2012-08-17 | Saint Gobain | Support a couche diffusante pour dispositif a diode electroluminescente organique, dispositif electroluminescent organique comportant un tel support |
CN103098223A (zh) * | 2010-08-31 | 2013-05-08 | 康宁股份有限公司 | 散射覆材的颗粒掺杂方法 |
US9224983B2 (en) * | 2010-12-20 | 2015-12-29 | Samsung Electronics Co., Ltd. | Substrate for surface light emitting device and method of manufacturing the substrate, surface light emitting device, lighting apparatus, and backlight including the same |
EP2693839A4 (en) * | 2011-03-31 | 2014-11-26 | Asahi Glass Co Ltd | ORGANIC LED ELEMENT, TRANSLUCENT SUBSTRATE AND METHOD FOR PRODUCING THE LIGHT TRACEABLE SUBSTRATE |
KR101589343B1 (ko) * | 2012-03-30 | 2016-01-28 | 주식회사 엘지화학 | 유기전자소자용 기판 |
KR101715112B1 (ko) * | 2012-06-14 | 2017-03-10 | 쌩-고벵 글래스 프랑스 | Oled 소자용 적층체, 그 제조방법 및 이를 구비한 oled 소자 |
EP2712851B1 (en) | 2012-09-28 | 2015-09-09 | Saint-Gobain Glass France | Method of producing a transparent diffusive oled substrate |
ES2693105T3 (es) * | 2013-05-17 | 2018-12-07 | Saint-Gobain Glass France | Sustrato OLED difusivo transparente y método para producir semejante sustrato |
ES2564141T3 (es) * | 2013-06-14 | 2016-03-18 | Saint-Gobain Glass France | Substrato de OLED difusor transparente y método para producir tal substrato |
KR101642120B1 (ko) * | 2014-12-24 | 2016-07-22 | 코닝정밀소재 주식회사 | 유기발광소자용 광추출 기판 제조방법, 유기발광소자용 광추출 기판 및 이를 포함하는 유기발광소자 |
US10401539B2 (en) * | 2016-04-21 | 2019-09-03 | Corning Incorporated | Coated articles with light-altering features and methods for the production thereof |
-
2013
- 2013-05-17 EP EP13168341.9A patent/EP2803644B1/en not_active Not-in-force
- 2013-05-17 ES ES13168341.9T patent/ES2695052T3/es active Active
-
2014
- 2014-04-29 EP EP14722153.5A patent/EP2996995A1/en not_active Withdrawn
- 2014-04-29 JP JP2016513270A patent/JP6495894B2/ja not_active Expired - Fee Related
- 2014-04-29 US US14/891,577 patent/US10147894B2/en not_active Expired - Fee Related
- 2014-04-29 MY MYPI2015704082A patent/MY175975A/en unknown
- 2014-04-29 WO PCT/EP2014/058738 patent/WO2014183993A1/en active Application Filing
- 2014-04-29 KR KR1020157032404A patent/KR102142437B1/ko active IP Right Grant
- 2014-04-29 RU RU2015153822A patent/RU2656264C2/ru active
- 2014-04-29 CN CN201480028425.1A patent/CN105189383B/zh not_active Expired - Fee Related
- 2014-05-07 TW TW103116232A patent/TWI622562B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP2803644B1 (en) | 2018-08-08 |
ES2695052T3 (es) | 2018-12-28 |
EP2803644A1 (en) | 2014-11-19 |
RU2015153822A3 (ja) | 2018-04-02 |
KR102142437B1 (ko) | 2020-08-07 |
TW201505988A (zh) | 2015-02-16 |
TWI622562B (zh) | 2018-05-01 |
WO2014183993A1 (en) | 2014-11-20 |
RU2015153822A (ru) | 2017-06-22 |
KR20160009029A (ko) | 2016-01-25 |
EP2996995A1 (en) | 2016-03-23 |
JP2016524788A (ja) | 2016-08-18 |
US10147894B2 (en) | 2018-12-04 |
RU2656264C2 (ru) | 2018-06-04 |
US20160072083A1 (en) | 2016-03-10 |
CN105189383A (zh) | 2015-12-23 |
MY175975A (en) | 2020-07-19 |
CN105189383B (zh) | 2018-08-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101318374B1 (ko) | 유기 전계 발광소자 및 그 제조 방법 | |
JP2012523073A (ja) | 有機発光ダイオード装置を対象とする、テクスチャ外面を備える構造体を製造する方法、およびテクスチャ外面を備える構造体 | |
JP6495894B2 (ja) | 透明な拡散性oled基材及び当該基材の製造方法 | |
CN107076876B (zh) | 低反射涂层、玻璃板、玻璃基板、以及光电转换装置 | |
JP2012523071A (ja) | 有機発光ダイオード装置のためのテクスチャ表面を備える構造体の製造方法、およびテクスチャ表面を備える構造体 | |
JP6117995B2 (ja) | 透明散乱性oled基材及び当該基材の作製方法 | |
JP6495893B2 (ja) | 透明な拡散性oled基材及び当該基材の製造方法 | |
CN106488893B (zh) | 透明扩散性oled基板和制造这样的基板的方法 | |
JP2013521631A (ja) | 単分子層を用いた光散乱無機基板 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170327 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180220 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180221 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180518 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180816 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190205 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20190307 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6495894 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |