JP6473933B2 - Electrode manufacturing equipment and electrode manufacturing method - Google Patents

Electrode manufacturing equipment and electrode manufacturing method Download PDF

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JP6473933B2
JP6473933B2 JP2015107595A JP2015107595A JP6473933B2 JP 6473933 B2 JP6473933 B2 JP 6473933B2 JP 2015107595 A JP2015107595 A JP 2015107595A JP 2015107595 A JP2015107595 A JP 2015107595A JP 6473933 B2 JP6473933 B2 JP 6473933B2
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film thickness
electrode material
electrode
adjustment
coating
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JP2016225034A (en
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通裕 花井
通裕 花井
純 下泉
純 下泉
嘉典 西尾
嘉典 西尾
鈴木　繁
繁 鈴木
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
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Description

本発明は、電池に使用される電極の電極製造設備及び電極製造方法に関するものである。   The present invention relates to an electrode manufacturing facility and an electrode manufacturing method for electrodes used in batteries.

リチウムイオン二次電池等の電池は、電気自動車や電子機器等の駆動用電源として広く用いられる。このような電池に使用される電極の電極製造設備は、例えば、特許文献１及び２に記載されている。   Batteries such as lithium ion secondary batteries are widely used as driving power sources for electric vehicles and electronic devices. An electrode manufacturing facility for electrodes used in such a battery is described in, for example, Patent Documents 1 and 2.

特許文献１に記載の電極製造設備は、スラリ化した電極材をバックアップローラに支持された電極箔にポンプの圧力で塗工する塗工装置と、電極箔に塗工された電極材を乾燥する乾燥装置と、乾燥した電極材の膜厚を非接触で測定する測定装置とを備える。この電極製造設備では、測定装置で測定した電極材の膜厚に基づいて、塗工後の電極材の膜厚が一定の範囲内となるように、ポンプの圧力を制御している。   The electrode manufacturing facility described in Patent Document 1 dries the electrode material applied to the electrode foil, and a coating apparatus that applies the slurryed electrode material to the electrode foil supported by the backup roller with the pressure of the pump. A drying device and a measurement device that measures the film thickness of the dried electrode material in a non-contact manner are provided. In this electrode manufacturing facility, the pressure of the pump is controlled based on the film thickness of the electrode material measured by the measuring device so that the film thickness of the electrode material after coating falls within a certain range.

特許文献２に記載の電極製造設備は、電極材が塗工された電極箔を一対のプレスローラ間に通してプレスし電極材の膜厚を調整する膜厚調整装置を備える。この電極製造設備では、プレス後に外部で測定した電極材の膜厚に基づいて、プレス後の電極材の膜厚が一定の範囲内となるように、一対のプレスローラ間のクリアランスを制御している。   The electrode manufacturing facility described in Patent Document 2 includes a film thickness adjusting device that adjusts the film thickness of the electrode material by pressing the electrode foil coated with the electrode material through a pair of press rollers. In this electrode manufacturing facility, the clearance between the pair of press rollers is controlled based on the thickness of the electrode material measured externally after pressing so that the thickness of the electrode material after pressing is within a certain range. Yes.

特開２００９−１９３９０６号公報JP 2009-193906 A 特開２００８−２２６５０２号公報JP 2008-226502 A

一般的に、プレス後の電極材が塗工された電極箔は、所定の既知の処理を施された後、巻回されて電池ケースに収容される。このため、プレス後の電極材の膜厚が大きくばらつくと、巻回した電極箔の大きさにも大きなばらつきが生じ、巻回した電極箔を電池ケースに収容できなくなるおそれがある。よって、プレス後の電極材の膜厚は、一定の範囲内となるように安定させる必要がある。   Generally, an electrode foil coated with an electrode material after pressing is subjected to a predetermined known treatment, and then wound and accommodated in a battery case. For this reason, when the film thickness of the electrode material after pressing varies greatly, the size of the wound electrode foil may vary greatly, and the wound electrode foil may not be accommodated in the battery case. Therefore, it is necessary to stabilize the thickness of the electrode material after pressing so as to be within a certain range.

特許文献２に記載の電極製造設備では、プレス後の電極材の膜厚を外部で測定しているため、数十メートルの電極材を有する電極箔を試作して廃却処分する必要がある。プレス後の電極材の膜厚が、インラインで測定可能であれば、品質測定用に数メートルの電極材を有する電極箔を試作して廃却処分するのみで足りる。プレス後の電極材の膜厚のインラインでの測定は、特許文献１に記載の電極製造設備の測定装置を特許文献２に記載の電極製造設備に適用することで可能である。   In the electrode manufacturing facility described in Patent Document 2, since the film thickness of the electrode material after pressing is measured externally, it is necessary to prototype and discard the electrode foil having an electrode material of several tens of meters. If the thickness of the electrode material after pressing can be measured in-line, it is only necessary to make a prototype of an electrode foil having several meters of electrode material for quality measurement and dispose of it. The in-line measurement of the film thickness of the electrode material after pressing can be performed by applying the electrode manufacturing facility measuring apparatus described in Patent Document 1 to the electrode manufacturing facility described in Patent Document 2.

しかし、一般的に、塗工装置のバックアップローラには、組付け等における芯ずれによる振れが発生するため、スラリ化した電極材をバックアップローラに支持された電極箔に塗工する際にむらが生じて電極材の膜厚のばらつきが大きくなる。このため、特許文献１，２を組み合わせた電極製造設備のように、単にプレス後の電極材の測定膜厚に基づいて一対のプレスローラ間のクリアランスを制御しても、プレス後の電極材の膜厚を一定の範囲内となるように安定させることは困難である。   However, in general, the back-up roller of the coating apparatus is subject to runout due to misalignment in assembling or the like. Therefore, unevenness occurs when the slurryed electrode material is applied to the electrode foil supported by the back-up roller. As a result, the variation in the film thickness of the electrode material increases. For this reason, even if the clearance between a pair of press rollers is simply controlled based on the measured film thickness of the electrode material after pressing, as in the electrode manufacturing equipment combining Patent Documents 1 and 2, the electrode material after pressing It is difficult to stabilize the film thickness within a certain range.

本発明は、このような事情に鑑みてなされたものであり、プレス後の電極材の膜厚を一定の範囲内となるように安定させることができる電極製造設備及び電極製造方法を提供することを目的とする。   This invention is made | formed in view of such a situation, and provides the electrode manufacturing equipment and electrode manufacturing method which can stabilize the film thickness of the electrode material after a press so that it may become in a fixed range. With the goal.

（電極製造設備）
本発明の電極製造設備は、バックアップローラに支持され搬送される電極箔の面に電極材を塗工する塗工装置と、前記電極材が塗工され搬送される電極箔をプレスローラでプレスして前記塗工された電極材の膜厚を調整する膜厚調整装置と、前記塗工された電極材の膜厚を測定する膜厚測定装置と、前記膜厚測定装置で測定される前記塗工された電極材の膜厚のうち、前記塗工装置による塗工において前記バックアップローラが１周回転するときの回転時間である第一膜厚変動周期と、前記膜厚調整装置による調整において前記プレスローラが１周回転するときの回転時間である第二膜厚変動周期と、の最小公倍数の時間として第三膜厚変動周期を算出し、前記第三膜厚変動周期の整数倍であるサンプリング時間中に得られる膜厚データ群から特定膜厚を求め、前記特定膜厚に基づいて前記膜厚調整装置の調整動作を制御する制御装置と、を備える。 (Electrode manufacturing equipment)
The electrode manufacturing equipment of the present invention comprises: a coating device that coats an electrode material on the surface of an electrode foil that is supported and transported by a backup roller; and the electrode foil that is coated and transported by the electrode material is pressed by a press roller. A film thickness adjusting device for adjusting the film thickness of the coated electrode material, a film thickness measuring device for measuring the film thickness of the coated electrode material, and the coating material measured by the film thickness measuring device. Among the film thicknesses of the processed electrode material, the first film thickness variation period which is the rotation time when the backup roller rotates once in the coating by the coating apparatus, and the adjustment by the film thickness adjusting apparatus The third film thickness fluctuation cycle is calculated as the least common multiple of the second film thickness fluctuation period, which is the rotation time when the press roller rotates once, and sampling is an integral multiple of the third film thickness fluctuation period. Is it a group of film thickness data obtained over time? Seeking a specific thickness, and a control unit for controlling an adjustment operation of the film thickness adjusting device based on the specific thickness.

これによれば、制御装置は、塗工装置による電極材の塗工状態に応じて、膜厚調整装置による電極材の膜厚調整を安定させるのに最適な特定膜厚を適宜選択できる。このとき、バックアップローラに発生する芯ずれによる振れの影響に重畳されるプレスローラに発生する芯ずれによる振れの影響を抑制できるので、プレスされる電極材の膜厚を安定させることができる。 According to this, the control device can appropriately select the specific film thickness that is optimal for stabilizing the film thickness adjustment of the electrode material by the film thickness adjusting device, according to the application state of the electrode material by the coating device. At this time, since the influence of the shake due to the misalignment generated in the press roller superimposed on the influence of the shake due to the misalignment generated in the backup roller can be suppressed, the film thickness of the pressed electrode material can be stabilized.

（電極製造方法）
本発明の電極製造方法は、バックアップローラに支持され搬送される電極箔の面に電極材を塗工する塗工工程と、前記電極材が塗工され搬送される電極箔をプレスローラでプレスして前記塗工された電極材の膜厚を調整する膜厚調整工程と、前記塗工された電極材の膜厚を測定する膜厚測定工程と、前記膜厚測定工程で測定される前記塗工された電極材の膜厚のうち、前記塗工工程において前記バックアップローラが１周回転するときの回転時間である第一膜厚変動周期と、前記膜厚調整工程において前記プレスローラが１周回転するときの回転時間である第二膜厚変動周期と、の最小公倍数の時間として第三膜厚変動周期を算出し、前記第三膜厚変動周期の整数倍であるサンプリング時間中に得られる膜厚データ群から特定膜厚を求め、前記特定膜厚に基づいて前記膜厚の調整を制御する制御工程と、を備える。これによれば、本発明の電極製造設備と同様の効果を得ることができる。 (Electrode manufacturing method)
The electrode manufacturing method of the present invention comprises a coating step of coating an electrode material on the surface of an electrode foil supported and transported by a backup roller, and pressing the electrode foil coated and transported with the electrode material with a press roller. The film thickness adjusting step for adjusting the film thickness of the coated electrode material, the film thickness measuring step for measuring the film thickness of the coated electrode material, and the coating film measured in the film thickness measuring step. of thickness of engineering has been electrode material, a first film thickness variation period is the rotation time at which the backup roller have contact to the coating step is rotated one revolution, the press roller in the film thickness adjustment step The third film thickness fluctuation period is calculated as the time of the least common multiple of the second film thickness fluctuation period that is the rotation time when rotating once, and during the sampling time that is an integral multiple of the third film thickness fluctuation period Obtain the specific film thickness from the obtained film thickness data group, And a control step of controlling the adjustment of the film thickness based on a specific film thickness. According to this, the same effect as the electrode manufacturing equipment of the present invention can be obtained.

本発明の実施形態の電極製造設備の概略構成を示す図である。It is a figure which shows schematic structure of the electrode manufacturing equipment of embodiment of this invention. 図１の電極製造設備の動作を説明するためのフローチャートである。It is a flowchart for demonstrating operation | movement of the electrode manufacturing equipment of FIG. 電極材を塗工した後の電極箔の搬送時間と電極材の膜厚との関係を示す図である。It is a figure which shows the relationship between the conveyance time of the electrode foil after apply | coating an electrode material, and the film thickness of an electrode material. 電極材の膜厚を調整した後の電極箔の搬送時間と電極材の膜厚との関係を示す図である。It is a figure which shows the relationship between the conveyance time of the electrode foil after adjusting the film thickness of an electrode material, and the film thickness of an electrode material.

（電極製造設備の概略構成）
電極製造設備は、電極材と溶媒とを混練してスラリ化し、スラリ化した電極材を電極箔の面に塗工して乾燥し、塗工・乾燥された電極材の膜厚を調整することにより電池に使用される電極を製造する設備である。 (Schematic configuration of electrode manufacturing equipment)
The electrode manufacturing equipment is to knead the electrode material and solvent into a slurry, apply the slurryed electrode material to the surface of the electrode foil and dry it, and adjust the film thickness of the coated and dried electrode material Is an facility for manufacturing electrodes used in batteries.

ここで、例えば、リチウムイオン二次電池の正負極の電極箔としては、アルミニウム箔や銅箔等が用いられる。そして、リチウムイオン二次電池の正極の電極材としては、マンガン酸リチウム及びアセチレンブラック等が用いられ、負極の電極材としては、グラファイト及びアセチレンブラック等が用いられる。また、正負極の溶媒としては、炭酸エチレン等が用いられる。   Here, for example, an aluminum foil or a copper foil is used as the positive and negative electrode foil of the lithium ion secondary battery. And as a positive electrode material of a lithium ion secondary battery, lithium manganate, acetylene black, etc. are used, and a graphite, acetylene black, etc. are used as a negative electrode material. Moreover, ethylene carbonate etc. are used as a solvent of a positive / negative electrode.

以下、本実施形態の電極製造設備の概略構成を図１を参照して説明する。なお、図１においては、電極製造設備の主要装置のみを示す。図１に示すように、電極製造設備１は、塗工装置１０と、膜厚調整装置２０と、膜厚測定装置３０と、制御装置４０等とを備える。電極箔Ｍは、ロール状に巻回され、この電極箔ＭのロールＲが、図略の電極箔供給装置に回転可能に支持される。電極材Ｐは、溶媒と混練されてスラリ化され、この電極材ＰのスラリＳが、タンク１４内に貯留される。   Hereinafter, a schematic configuration of the electrode manufacturing facility of the present embodiment will be described with reference to FIG. In FIG. 1, only the main apparatus of the electrode manufacturing facility is shown. As shown in FIG. 1, the electrode manufacturing facility 1 includes a coating device 10, a film thickness adjusting device 20, a film thickness measuring device 30, a control device 40, and the like. The electrode foil M is wound in a roll shape, and the roll R of the electrode foil M is rotatably supported by an electrode foil supply device (not shown). The electrode material P is kneaded with a solvent to be slurried, and the slurry S of the electrode material P is stored in the tank 14.

塗工装置１０は、電極箔ＭのロールＲから引き出され搬送される電極箔Ｍの片面に、電極材ＰのスラリＳを塗工する装置である。この塗工装置１０は、バックアップローラ１１と、ダイコータ１２と、ポンプ１３と、タンク１４と、ダイコータ１２とポンプ１３とタンク１４とを繋ぐ配管１５等とを備える。   The coating apparatus 10 is an apparatus that coats the slurry S of the electrode material P on one surface of the electrode foil M that is drawn out from the roll R of the electrode foil M and conveyed. The coating apparatus 10 includes a backup roller 11, a die coater 12, a pump 13, a tank 14, a pipe 15 that connects the die coater 12, the pump 13, and the tank 14.

バックアップローラ１１は、図略の支持装置にローラ軸１１ａ回りに回転可能に支持される。そして、バックアップローラ１１は、電極箔ＭのロールＲから引き出され搬送ローラ１６，１７を介して搬送される電極箔Ｍを、ローラ周面１１ｂに半周程度巻き付けて搬送支持する。   The backup roller 11 is supported by a support device (not shown) so as to be rotatable around the roller shaft 11a. The backup roller 11 conveys and supports the electrode foil M drawn out from the roll R of the electrode foil M and conveyed via the conveying rollers 16 and 17 by winding the electrode foil M around the roller peripheral surface 11b about a half circumference.

ダイコータ１２は、バックアップローラ１１のローラ周面１１ａにおいて巻き付けられる電極箔Ｍに対し、ダイコータ１２の吐出口１２ａが所定の間隔をあけて対向するように配置される。そして、ダイコータ１２は、ポンプ１３の駆動によりタンク１４から配管１５を通して送液される電極材ＰのスラリＳを、吐出口１２ａから吐出してバックアップローラ１１のローラ周面１１ａに巻き付けられ搬送される電極箔Ｍの表面に塗工する。   The die coater 12 is disposed such that the discharge port 12a of the die coater 12 faces the electrode foil M wound around the roller peripheral surface 11a of the backup roller 11 with a predetermined interval. The die coater 12 discharges the slurry S of the electrode material P fed from the tank 14 through the pipe 15 by driving the pump 13 from the discharge port 12a and is wound around the roller peripheral surface 11a of the backup roller 11 and conveyed. Coating is performed on the surface of the electrode foil M.

膜厚調整装置２０は、電極材ＰのスラリＳが塗工・乾燥されて搬送される電極箔Ｍをプレスし、電極箔Ｍに塗工された電極材Ｐの膜厚を調整する装置である。この膜厚調整装置２０は、平行且つ上下に並べて配置されるローラ軸２１ａ，２２ａをそれぞれ有する同一径の一対のプレスローラ２１，２２等を備える。   The film thickness adjusting device 20 is an apparatus that presses the electrode foil M that is transported after the slurry S of the electrode material P is applied and dried, and adjusts the film thickness of the electrode material P applied to the electrode foil M. . The film thickness adjusting device 20 includes a pair of press rollers 21 and 22 having the same diameter and having roller shafts 21a and 22a arranged in parallel and vertically.

プレスローラ２１は、図１の反時計回りに回転可能に、プレスローラ２２は、図１の時計回りに回転可能に、図略の支持装置に支持される。さらに、プレスローラ２１，２２は、図略のクリアランス調整装置によりローラ間のクリアランスの調整が可能なように、支持装置に支持される。そして、プレスローラ２１，２２は、ローラ間のクリアランスを所定値に設定された状態で、ローラ間を通る電極材Ｐが塗工された電極箔Ｍを厚さ方向にプレスして当該電極材Ｐの膜厚を調整する。   The press roller 21 is supported by a support device (not shown) such that the press roller 21 can rotate counterclockwise in FIG. 1 and the press roller 22 can rotate clockwise in FIG. Furthermore, the press rollers 21 and 22 are supported by a support device so that the clearance between the rollers can be adjusted by a clearance adjusting device (not shown). The press rollers 21 and 22 press the electrode foil M coated with the electrode material P passing between the rollers in the thickness direction in a state where the clearance between the rollers is set to a predetermined value. Adjust the film thickness.

膜厚測定装置３０は、電極箔Ｍに塗工された電極材Ｐの膜厚を例えば偏光を用いて非接触で測定する装置である。この膜厚測定装置３０は、膜厚調整装置２０に対し上流側に配置される調整前測定装置３１と、膜厚調整装置２０に対し下流側に配置される調整後測定装置３２等とを備える。調整前測定装置３１は、膜厚調整装置２０で電極箔Ｍに塗工された電極材Ｐの膜厚が調整される前、すなわち塗工装置１０で電極箔Ｍに塗工され乾燥された状態の電極材Ｐの膜厚を測定する。調整後測定装置３２は、膜厚調整装置２０で電極箔Ｍに塗工された電極材Ｐの膜厚が調整された後の膜厚を測定する。   The film thickness measuring device 30 is a device that measures the film thickness of the electrode material P applied to the electrode foil M in a non-contact manner using, for example, polarized light. The film thickness measuring device 30 includes a pre-adjustment measuring device 31 disposed on the upstream side with respect to the film thickness adjusting device 20, a post-adjustment measuring device 32 disposed on the downstream side with respect to the film thickness adjusting device 20, and the like. . The pre-adjustment measuring device 31 is applied to the electrode foil M by the coating device 10 and dried before the film thickness of the electrode material P applied to the electrode foil M by the film thickness adjusting device 20 is adjusted. The film thickness of the electrode material P is measured. The post-adjustment measuring device 32 measures the film thickness after the film thickness of the electrode material P applied to the electrode foil M is adjusted by the film thickness adjusting device 20.

制御装置４０は、膜厚測定装置３０から入力した電極箔Ｍに塗工された電極材Ｐの膜厚の膜厚測定値に基づいて、膜厚調整装置２０のプレスローラ２１，２２間のクリアランスを調整制御する。また、制御装置４０は、塗工装置１０のポンプ１３を駆動制御し、膜厚調整装置２０のプレスローラ２１，２２の回転を駆動制御する。   Based on the film thickness measurement value of the film thickness of the electrode material P applied to the electrode foil M input from the film thickness measuring device 30, the control device 40 clears the clearance between the press rollers 21 and 22 of the film thickness adjusting device 20. Adjust the control. Further, the control device 40 drives and controls the pump 13 of the coating device 10 and drives and controls the rotation of the press rollers 21 and 22 of the film thickness adjusting device 20.

（電極材の膜厚について）
ここで、背景技術でも述べたように、塗工装置１０のバックアップローラ１１には、組付け等における芯ずれによる振れが発生するため、スラリ化した電極材Ｐをバックアップローラ１１に支持された電極箔Ｍに塗布する際にむらが生じて電極材Ｐの膜厚のばらつきが大きくなる。 (About film thickness of electrode material)
Here, as described in the background art, the back-up roller 11 of the coating apparatus 10 is shaken due to misalignment during assembling or the like, and therefore the electrode material P that is slurried is supported by the back-up roller 11. Unevenness occurs when applying to the foil M, and the variation in the film thickness of the electrode material P increases.

具体的には、図３に示すように、電極材Ｐを塗工した後の電極箔Ｍの搬送長さを表す搬送時間Ｔを横軸に、電極箔Ｍに塗工される電極材Ｐの膜厚ｄを縦軸にとる。そして、調整前測定装置３１で膜厚調整前の電極材Ｐの膜厚ｄを測定して膜厚測定値をプロットすると、電極材Ｐの膜厚ｄは、バックアップローラ１１が１周回転するときの回転時間ｔを１周期（以下、「第一膜厚変動周期」という）とする正弦曲線で変動することが判明した。そして、その電極材Ｐの膜厚ｄの変動範囲Δｄは、非常に大きいもので電極材Ｐの膜厚ｄの許容範囲Ｄを越えるものであった。   Specifically, as shown in FIG. 3, the electrode material P applied to the electrode foil M is plotted on the horizontal axis with the conveyance time T representing the conveyance length of the electrode foil M after the electrode material P is applied. The film thickness d is taken on the vertical axis. And when the film thickness d of the electrode material P before film thickness adjustment is measured by the measurement apparatus 31 before adjustment and the measured film thickness value is plotted, the film thickness d of the electrode material P is obtained when the backup roller 11 rotates once. It was found that the rotation time t fluctuates in a sinusoidal curve having one period (hereinafter referred to as “first film thickness fluctuation period”). The fluctuation range Δd of the film thickness d of the electrode material P is very large and exceeds the allowable range D of the film thickness d of the electrode material P.

そこで、制御装置３０は、膜厚測定装置３０で測定される塗工された電極材Ｐの膜厚のうち、塗工装置１０による第一膜厚変動周期に合わせたサンプリング時間中に得られる膜厚データ群から特定膜厚として平均膜厚を算出し、算出した平均膜厚に基づいて膜厚調整装置２０の調整動作を制御する。この塗工装置１０におけるサンプリング時間は、本例では第一膜厚変動周期の１倍を用いた場合で説明するが、第一膜厚変動周期の整数倍であれば本例と同様に用いることができる。   Therefore, the control device 30 obtains the film obtained during the sampling time according to the first film thickness variation period by the coating device 10 among the film thickness of the coated electrode material P measured by the film thickness measuring device 30. The average film thickness is calculated as the specific film thickness from the thickness data group, and the adjustment operation of the film thickness adjusting device 20 is controlled based on the calculated average film thickness. In this example, the sampling time in the coating apparatus 10 will be described in the case where one time of the first film thickness fluctuation period is used. However, if the sampling time is an integral multiple of the first film thickness fluctuation period, it is used in the same manner as in this example. Can do.

具体的には、制御装置３０は、バックアップローラ１１が１周回転するときの回転時間ｔを第１膜厚変動周期として電極材Ｐの平均膜厚ｄａを算出し、算出した電極材Ｐの平均膜厚ｄａが所定の初期膜厚となるように膜厚調整装置２０のプレスローラ２１，２２間のクリアランスの初期調整動作を制御する。このとき、制御装置３０は、予め測定された電極材Ｐの膜厚ｄと膜厚調整装置２０の調整量との関係を記憶しておき、その関係に基づいて膜厚調整装置２０の初期調整動作を制御する。なお、電極材Ｐの平均膜厚ｄａは、塗工装置１０による第一膜厚変動周期、すなわちバックアップローラ１１が１周回転するときの回転時間ｔの整数倍であるサンプリング時間で算出するようにしてもよい。   Specifically, the control device 30 calculates the average film thickness da of the electrode material P using the rotation time t when the backup roller 11 rotates once as a first film thickness fluctuation period, and calculates the average of the calculated electrode material P The initial adjustment operation of the clearance between the press rollers 21 and 22 of the film thickness adjusting device 20 is controlled so that the film thickness da becomes a predetermined initial film thickness. At this time, the control device 30 stores the relationship between the film thickness d of the electrode material P measured in advance and the adjustment amount of the film thickness adjustment device 20, and the initial adjustment of the film thickness adjustment device 20 based on the relationship. Control the behavior. The average film thickness da of the electrode material P is calculated by the first film thickness fluctuation period by the coating apparatus 10, that is, the sampling time which is an integral multiple of the rotation time t when the backup roller 11 rotates once. May be.

また、膜厚調整装置２０のプレスローラ２１，２２にも、組付け等における芯ずれによる振れが発生するため、バックアップローラ１１と同様に膜厚調整装置２０による第二膜厚変動周期について検討した。図４に示すように、電極材Ｐの膜厚を調整した後の電極箔Ｍの搬送長さを表す搬送時間ＴＴを横軸に、電極材Ｐの膜厚を調整した後の電極材Ｐの膜厚ｄｄを縦軸にとる。そして、調整後測定装置３２で膜厚調整後の電極材Ｐの膜厚ｄｄを測定して膜厚測定値をプロットすると、図３と同様に電極材Ｐの膜厚ｄｄは、プレスローラ２１（２２）が１周回転するときの回転時間ｔｔを１周期（以下、「第二膜厚変動周期」という）とする正弦曲線で変動することが判明した。しかし、その電極材Ｐの膜厚ｄｄの変動範囲Δｄｄは、図３と異なり、非常に小さいもので電極材Ｐの膜厚ｄｄの許容範囲ＤＤ内のものであった。   Further, since the press rollers 21 and 22 of the film thickness adjusting device 20 are also shaken due to misalignment in assembling or the like, the second film thickness fluctuation period by the film thickness adjusting device 20 was examined in the same manner as the backup roller 11. . As shown in FIG. 4, the electrode material P after the adjustment of the film thickness of the electrode material P is shown with the conveyance time TT representing the conveyance length of the electrode foil M after adjusting the film thickness of the electrode material P as the horizontal axis. The film thickness dd is taken on the vertical axis. And when the film thickness dd of the electrode material P after film thickness adjustment is measured by the post-adjustment measuring device 32 and the measured film thickness value is plotted, the film thickness dd of the electrode material P is determined by the press roller 21 ( It was found that 22) fluctuates in a sinusoidal curve having a rotation time tt for one rotation (hereinafter referred to as “second film thickness fluctuation period”). However, unlike FIG. 3, the fluctuation range Δdd of the film thickness dd of the electrode material P is very small and within the allowable range DD of the film thickness dd of the electrode material P.

ところが、電極材Ｐの膜厚ｄｄの許容範囲ＤＤを越える突発的な膜厚変動（このときの膜厚を変動膜厚ｄｄ´という）が、一定の周期で発生していることも判明した。この変動膜厚ｄｄ´の発生周期は、塗工装置１０による第一膜厚変動周期と膜厚調整装置２０による第二膜厚変動周期との最小公倍数の時間である第三膜厚変動周期、具体的にはバックアップローラ１１が１周回転するときの回転時間ｔとプレスローラ２１（２２）が１周回転するときの回転時間ｔｔとの最小公倍数の回転時間ｔｓであった。   However, it has also been found that sudden film thickness fluctuations exceeding the allowable range DD of the film thickness dd of the electrode material P (the film thickness at this time is referred to as a variable film thickness dd ′) occur at a constant period. The generation period of the variable film thickness dd ′ is a third film thickness fluctuation period which is a time of the least common multiple of the first film thickness fluctuation period by the coating apparatus 10 and the second film thickness fluctuation period by the film thickness adjustment apparatus 20. Specifically, the rotation time ts is the least common multiple of the rotation time t when the backup roller 11 rotates once and the rotation time tt when the press roller 21 (22) rotates once.

そこで、制御装置３０は、バックアップローラ１１が１周回転するときの回転時間ｔとプレスローラ２１（２２）が１周回転するときの回転時間ｔｔとの最小公倍数の回転時間ｔｓを第三膜厚変動周期として電極材Ｐの平均膜厚ｄｄａを算出し、算出した電極材Ｐの平均膜厚ｄｄａが所定の膜厚となるように膜厚調整装置２０のプレスローラ２１，２２間のクリアランスを調整動作をフィードバック制御する。このとき、制御装置３０は、算出した電極材Ｐの平均膜厚ｄｄａと予め設定された電極材Ｐの設定膜厚との差に基づいて膜厚調整装置２０の調整動作をフィードバック制御する。なお、電極材Ｐの平均膜厚ｄｄａは、第三膜厚変動周期、すなわちバックアップローラ１１が１周回転するときの回転時間ｔとプレスローラ２１（２２）が１周回転するときの回転時間ｔｔとの最小公倍数の回転時間ｔｓの整数倍であるサンプリング時間で算出するようにしてもよい。   Therefore, the control device 30 determines the rotation time ts of the least common multiple of the rotation time t when the backup roller 11 rotates once and the rotation time tt when the press roller 21 (22) rotates once as the third film thickness. The average film thickness dda of the electrode material P is calculated as the fluctuation period, and the clearance between the press rollers 21 and 22 of the film thickness adjusting device 20 is adjusted so that the calculated average film thickness dda of the electrode material P becomes a predetermined film thickness. Feedback control of operation. At this time, the control device 30 feedback-controls the adjustment operation of the film thickness adjusting device 20 based on the difference between the calculated average film thickness dda of the electrode material P and a preset film thickness of the electrode material P. The average film thickness dda of the electrode material P is the third film thickness variation period, that is, the rotation time t when the backup roller 11 rotates once and the rotation time tt when the press roller 21 (22) rotates once. It is also possible to calculate with a sampling time which is an integral multiple of the rotation time ts of the least common multiple.

この設定膜厚は、電極の製造ロット数に基づいて設定される。膜厚調整装置２０のプレスローラ２１，２２は、電極の製造ロット数の増加に従って発熱により膨張する傾向にあり、プレスローラ２１，２２間のクリアランスが小さくなって電極材Ｐの膜厚ｄｄが薄くなり、更に、ある製造ロット数に達した後は膨張の程度が徐々に小さくなって電極材Ｐの膜厚ｄｄが徐々に薄くなるからである。なお、設定膜厚は、電極材Ｐと溶媒の液固比や製造現場の気温・湿度等の変動等に基づいて設定するようにしてもよい。   This set film thickness is set based on the number of electrode production lots. The press rollers 21 and 22 of the film thickness adjusting device 20 tend to expand due to heat generation as the number of electrode production lots increases, and the clearance between the press rollers 21 and 22 decreases, and the film thickness dd of the electrode material P decreases. Further, after reaching a certain number of production lots, the degree of expansion gradually decreases and the film thickness dd of the electrode material P gradually decreases. The set film thickness may be set based on the liquid-solid ratio of the electrode material P and the solvent, the temperature / humidity variation at the manufacturing site, or the like.

（電極製造設備の動作）
次に、電極製造設備１の動作について図２のフローチャートを参照して説明する。ここで、電極箔Ｍは、ロールＲから引き出され搬送ローラ１６，１７を介してバックアップローラ１１に巻回され、さらにプレスローラ２１，２２間を通されて電極箔Ｍの先端が図略の巻取装置に接続されているものとする。また、電極材ＰのスラリＳは、タンク１４内に貯留されているものとする。 (Operation of electrode manufacturing equipment)
Next, operation | movement of the electrode manufacturing equipment 1 is demonstrated with reference to the flowchart of FIG. Here, the electrode foil M is pulled out from the roll R and wound around the backup roller 11 via the conveying rollers 16 and 17, and further passed between the press rollers 21 and 22, and the tip of the electrode foil M is unillustrated. It is assumed that it is connected to a capture device. Further, it is assumed that the slurry S of the electrode material P is stored in the tank 14.

制御装置３０は、巻取装置を駆動してロールＲから電極箔Ｍを引き出して電極箔Ｍを搬送するとともに、ポンプＰを駆動してタンクＴから電極材ＰのスラリＳを配管１５を通してダイコータ１２に供給し、バックアップローラ１１に支持された電極箔Ｍの片面に電極材ＰのスラリＳを塗工する（図２のステップＳ１）。このとき、電極箔Ｍは、バックアップローラ１１上を一定速度で搬送され、電極材ＰのスラリＳは、ダイコータ１２から一定量で吐出されるので、電極箔Ｍの片面に電極材ＰのスラリＳを略均一に塗工できる。   The control device 30 drives the winding device to pull out the electrode foil M from the roll R and conveys the electrode foil M, and also drives the pump P to drive the slurry S of the electrode material P from the tank T through the pipe 15 to the die coater 12. The slurry S of the electrode material P is applied to one side of the electrode foil M supported by the backup roller 11 (step S1 in FIG. 2). At this time, the electrode foil M is transported on the backup roller 11 at a constant speed, and the slurry S of the electrode material P is discharged from the die coater 12 at a constant amount, so that the slurry S of the electrode material P is applied to one surface of the electrode foil M. Can be applied almost uniformly.

次に、制御装置３０は、バックアップローラ１１の１周の時間内において、調整前測定装置３１から電極材Ｐの膜厚測定値を所定回数取得し（図２のステップＳ２，Ｓ３）、取得した電極材Ｐの膜厚測定値の和を所定回数で除算して電極材Ｐの平均膜厚を算出する（図２のステップＳ４）。そして、制御装置３０は、予め記憶している電極箔Ｍに塗工される電極材Ｐの膜厚と膜厚調整装置２０の調整量との関係を参照し、算出した電極材Ｐの平均膜厚に対応する膜厚調整装置２０の調整量を取得する（図２のステップＳ５）。そして、制御装置３０は、取得した膜厚調整装置２０の調整量に基づいて膜厚調整装置２０のプレスローラ２１，２２間のクリアランスを調整制御する（図２のステップＳ６）。   Next, the control device 30 acquires the film thickness measurement value of the electrode material P from the pre-adjustment measurement device 31 within a time of one round of the backup roller 11 (steps S2 and S3 in FIG. 2) and acquires the measured value. The average film thickness of the electrode material P is calculated by dividing the sum of the film thickness measurement values of the electrode material P by a predetermined number of times (step S4 in FIG. 2). And the control apparatus 30 refers to the relationship between the film thickness of the electrode material P applied to the electrode foil M memorize | stored beforehand, and the adjustment amount of the film thickness adjustment apparatus 20, and calculated the average film | membrane of the electrode material P The adjustment amount of the film thickness adjusting device 20 corresponding to the thickness is acquired (step S5 in FIG. 2). And the control apparatus 30 adjusts and controls the clearance between the press rollers 21 and 22 of the film thickness adjusting apparatus 20 based on the acquired adjustment amount of the film thickness adjusting apparatus 20 (step S6 of FIG. 2).

次に、制御装置３０は、バックアップローラ１１の１周の時間とプレスローラ２１，２２の１周の時間との最小公倍数の時間内において、調整後測定装置３２から電極材Ｐの膜厚測定値を所定回数取得し（図２のステップＳ７，Ｓ８）、取得した電極材Ｐの膜厚測定値の和を所定回数で除算して電極材Ｐの平均膜厚を算出する（図２のステップＳ９）。そして、制御装置３０は、算出した電極材Ｐの平均膜厚と予め記憶している電極材Ｐの設定膜厚との差を算出し（図２のステップＳ１０）、算出した膜厚差に基づいて膜厚調整装置２０のプレスローラ２１，２２間のクリアランスを調整制御する（図２のステップＳ１１）。   Next, the control device 30 measures the film thickness measurement value of the electrode material P from the post-adjustment measuring device 32 within the time of the least common multiple of the time of one rotation of the backup roller 11 and the time of one rotation of the press rollers 21 and 22. Is obtained a predetermined number of times (steps S7 and S8 in FIG. 2), and the average film thickness of the electrode material P is calculated by dividing the sum of the obtained film thickness measurement values of the electrode material P by the predetermined number of times (step S9 in FIG. 2). ). Then, the control device 30 calculates a difference between the calculated average film thickness of the electrode material P and the preset film thickness of the electrode material P stored in advance (step S10 in FIG. 2), and based on the calculated film thickness difference. Then, the clearance between the press rollers 21 and 22 of the film thickness adjusting device 20 is adjusted and controlled (step S11 in FIG. 2).

そして、制御装置３０は、１製造ロットが完了したか否かを判断し（図２のステップＳ１２）、１製造ロットが完了していない場合はステップＳ７に戻って上述の処理を繰り返し、１製造ロットが完了したら処理を終了する。   Then, the control device 30 determines whether or not one manufacturing lot has been completed (step S12 in FIG. 2). If one manufacturing lot has not been completed, the control device 30 returns to step S7 and repeats the above-described processing. When the lot is completed, the process ends.

（効果）
本実施形態の電極製造設備１は、搬送される電極箔Ｍの面に電極材Ｐを塗工する塗工装置１０と、電極材Ｐが塗工され搬送される電極箔Ｍをプレスして塗工された電極材Ｐの膜厚を調整する膜厚調整装置２０と、塗工された電極材Ｐの膜厚を測定する膜厚測定装置３０と、膜厚測定装置３０で測定される塗工された電極材Ｐの膜厚のうち、塗工装置１０による第一膜厚変動周期の整数倍であるサンプリング時間中に得られる膜厚データ群から特定膜厚を求め、特定膜厚に基づいて膜厚調整装置２０の調整動作を制御する制御装置４０と、を備える。これによれば、制御装置４０は、塗工装置１０による電極材Ｐの塗工状態に応じて、膜厚調整装置２０による電極材Ｐの膜厚調整を安定させるのに最適な特定膜厚を適宜選択できる。 (effect)
The electrode manufacturing equipment 1 of the present embodiment presses and applies the coating apparatus 10 that coats the electrode material P on the surface of the electrode foil M to be conveyed and the electrode foil M to which the electrode material P is coated and conveyed. The film thickness adjusting device 20 for adjusting the film thickness of the worked electrode material P, the film thickness measuring device 30 for measuring the film thickness of the coated electrode material P, and the coating measured by the film thickness measuring device 30 Among the film thicknesses of the electrode material P thus obtained, a specific film thickness is obtained from a film thickness data group obtained during a sampling time that is an integral multiple of the first film thickness variation period by the coating apparatus 10, and based on the specific film thickness And a control device 40 that controls the adjusting operation of the film thickness adjusting device 20. According to this, the control device 40 has an optimum specific film thickness for stabilizing the film thickness adjustment of the electrode material P by the film thickness adjustment device 20 according to the coating state of the electrode material P by the coating device 10. It can be selected as appropriate.

また、特定膜厚は、膜厚データ群の平均膜厚である。これによれば、制御装置４０は、サンプリング時間を最適化して電極材Ｐの膜厚の平均膜厚を算出し膜厚調整しているので、膜厚の変動波の立ち上がり部分で上方向に突出する波形の乱れである変動膜厚のオーバーシュートや、膜厚の変動波の立ち下がり部分で下方向に突出する波形の乱れである変動膜厚のアンダーシュートが発生しても、平均膜厚には大きな誤差が生じ難く、安定した膜厚の電極を製造でき、電極の歩留まりが向上する。   The specific film thickness is an average film thickness of the film thickness data group. According to this, the control device 40 optimizes the sampling time, calculates the average film thickness of the electrode material P, and adjusts the film thickness, so that it protrudes upward at the rising portion of the film thickness fluctuation wave. Even if a fluctuation film thickness overshoot, which is a turbulent waveform fluctuation, or a fluctuation film thickness undershoot, which is a turbulent waveform fluctuation projecting downward at the falling edge of the film thickness fluctuation wave, occurs in the average film thickness. Is less likely to cause a large error, and an electrode having a stable film thickness can be manufactured, and the yield of the electrode is improved.

また、サンプリング時間は、塗工装置１０による第一膜厚変動周期と膜厚調整装置２０による第二膜厚変動周期との最小公倍数の時間である第三膜厚変動周期の整数倍であってもよい。これにより、バックアップローラ１１及びプレスローラ２１，２２に発生する芯ずれによる振れの影響を抑制できるので、プレスされる電極材Ｐの膜厚を安定させることができる。   The sampling time is an integral multiple of the third film thickness fluctuation period, which is the least common multiple of the first film thickness fluctuation period by the coating apparatus 10 and the second film thickness fluctuation period by the film thickness adjustment apparatus 20. Also good. Thereby, since the influence of the shake | fluctuation by the misalignment which generate | occur | produces in the backup roller 11 and the press rollers 21 and 22 can be suppressed, the film thickness of the electrode material P to be pressed can be stabilized.

また、塗工装置１０は、電極箔Ｍを支持するバックアップローラ１１を備え、第一膜厚変動周期は、バックアップローラ１１が１周回転するときの回転時間である。これにより、バックアップローラ１１に発生する芯ずれによる振れの影響を抑制できるので、塗工される電極材Ｐの膜厚を安定させることができる。   The coating apparatus 10 includes a backup roller 11 that supports the electrode foil M, and the first film thickness variation period is a rotation time when the backup roller 11 rotates once. Thereby, since the influence of the shake due to misalignment occurring in the backup roller 11 can be suppressed, the film thickness of the electrode material P to be coated can be stabilized.

また、膜厚調整装置２０は、電極箔Ｍをプレスするプレスローラ２１，２２を備え、第二膜厚変動周期は、プレスローラ２１，２２が１周回転するときの回転時間である。これにより、バックアップローラ１１に発生する芯ずれによる振れの影響に重畳されるプレスローラ２１，２２に発生する芯ずれによる振れの影響を抑制できるので、塗工される電極材Ｐの膜厚を安定させることができる。   The film thickness adjusting device 20 includes press rollers 21 and 22 for pressing the electrode foil M, and the second film thickness variation period is a rotation time when the press rollers 21 and 22 rotate once. Thereby, since the influence of the shake due to the misalignment generated in the press rollers 21 and 22 superimposed on the influence of the shake due to the misalignment generated in the backup roller 11 can be suppressed, the film thickness of the electrode material P to be coated can be stabilized. Can be made.

また、膜厚測定装置３０は、膜厚調整装置２０に対し上流側に配置される調整前測定装置３１を備え、制御装置４０は、調整前測定装置３１による測定結果に関係付けられた膜厚調整装置２０の調整量に基づいて膜厚調整装置２０の調整動作を制御する。これにより、塗工される電極材Ｐの膜厚が多少変動しても膜厚調整を安定して行うことができる。   Further, the film thickness measuring device 30 includes a pre-adjustment measuring device 31 arranged on the upstream side with respect to the film thickness adjusting device 20, and the control device 40 is a film thickness related to a measurement result by the pre-adjustment measuring device 31. The adjustment operation of the film thickness adjusting device 20 is controlled based on the adjustment amount of the adjusting device 20. Thereby, even if the film thickness of the electrode material P to be applied varies slightly, the film thickness can be adjusted stably.

また、プレス前の電極材Ｐの膜厚、膜厚調整装置２０の調整量、プレス後の電極材Ｐの膜厚の関係を事前に実験から求めておいて、当該関係をメモリや記憶装置等の情報格納部に保存しておく。そして、測定、算出したプレス前の電極材Ｐの膜厚と、プレス後の電極材Ｐの膜厚に対応する膜厚調整装置２０の調整量を情報格納部から読み出し、膜厚調整装置２０の制御に反映させるように構成してしてもよい。   Further, the relationship between the film thickness of the electrode material P before pressing, the adjustment amount of the film thickness adjusting device 20, and the film thickness of the electrode material P after pressing is obtained in advance from an experiment, and the relationship is stored in a memory, a storage device, or the like. Is stored in the information storage unit. Then, the measured and calculated thickness of the electrode material P before pressing and the adjustment amount of the film thickness adjusting device 20 corresponding to the thickness of the electrode material P after pressing are read from the information storage unit, and the film thickness adjusting device 20 You may comprise so that it may reflect in control.

また、膜厚調整装置２０の調整量は、上述のように事前の実験から求めた関係から決定する場合だけでなく、プレス前の電極材Ｐの膜厚、膜厚調整装置２０の調整量、プレス後の電極材Ｐの膜厚を演算パラメータとして含む理論式に基づいて必要な膜厚調整装置２０の調整量を決定するように構成してもよい。   Moreover, the adjustment amount of the film thickness adjusting device 20 is not only determined from the relationship obtained from the previous experiment as described above, but also the film thickness of the electrode material P before pressing, the adjustment amount of the film thickness adjusting device 20, You may comprise so that the adjustment amount of the required film thickness adjusting apparatus 20 may be determined based on the theoretical formula containing the film thickness of the electrode material P after a press as a calculation parameter.

また、膜厚測定装置３０は、膜厚調整装置２０に対し下流側に配置される調整後測定装置３２を備え、制御装置４０は、調整後測定装置３２による測定結果と予め設定された設定膜厚との差に基づいて膜厚調整装置２０の調整動作を制御する。例えば、設定膜厚よりプレス後の測定膜厚が大きければプレスローラ２１，２２間のクリアランスをより小さくする方向に制御し、逆に設定膜厚よりプレス後の測定膜厚が小さければプレスローラ２１，２２間のクリアランスをより大きくする方向に制御する。   Further, the film thickness measuring device 30 includes a post-adjustment measuring device 32 disposed on the downstream side with respect to the film thickness adjusting device 20, and the control device 40 includes a measurement result obtained by the post-adjustment measuring device 32 and a preset setting film. The adjustment operation of the film thickness adjusting device 20 is controlled based on the difference from the thickness. For example, if the measured film thickness after pressing is larger than the set film thickness, the clearance between the press rollers 21 and 22 is controlled to be smaller. Conversely, if the measured film thickness after pressing is smaller than the set film thickness, the press roller 21 is controlled. , 22 is controlled so as to increase the clearance between them.

また、設定膜厚とプレス後の測定膜厚との差の上下限閾値を決めておいて、当該閾値を超える差が発生したときに膜厚調整装置２０の調整動作を制御する。また、設定膜厚と測定した平均膜厚との差に限らず、設定膜厚と算出した膜厚との比等を用いてもよい。これにより、プレスローラ２１，２２に発生する熱膨張等に起因してプレスローラ２１，２２間のクリアランス量が変動して想定するクリアランス量からずれが生じ、プレス後の電極材Ｐの膜厚が設定膜厚からずれてしまう等の影響を抑制できるので、プレスされる電極材Ｐの膜厚を安定させることができる。また、電極材Ｐの膜厚は、インラインで測定可能となるので、ライン外作業工数が少なくなり製造効率を向上できるとともに、稼働率が向上してコストダウンに繋がる。   Further, the upper and lower thresholds of the difference between the set film thickness and the measured film thickness after pressing are determined, and the adjustment operation of the film thickness adjusting device 20 is controlled when a difference exceeding the threshold occurs. Further, not only the difference between the set film thickness and the measured average film thickness, but also the ratio between the set film thickness and the calculated film thickness may be used. As a result, the clearance amount between the press rollers 21 and 22 is fluctuated due to thermal expansion or the like generated in the press rollers 21 and 22, resulting in a deviation from the assumed clearance amount. Since the influence of deviating from the set film thickness can be suppressed, the film thickness of the pressed electrode material P can be stabilized. Moreover, since the film thickness of the electrode material P can be measured in-line, the man-hours outside the line can be reduced, the production efficiency can be improved, and the operating rate is improved, leading to cost reduction.

また、設定膜厚は、電極の製造ロット数に基づいて設定される。膜厚調整装置２０のプレスローラ２１，２２は、電極の製造ロット数の増加に従って発熱により膨張する傾向にあり、プレスローラ２１，２２間のクリアランスが小さくなって電極材Ｐの膜厚ｄｄが薄くなり、更に、ある製造ロット数に達した後は膨張の程度が徐々に小さくなって電極材Ｐの膜厚ｄｄが徐々に薄くなるからである。   The set film thickness is set based on the number of electrode production lots. The press rollers 21 and 22 of the film thickness adjusting device 20 tend to expand due to heat generation as the number of electrode production lots increases, and the clearance between the press rollers 21 and 22 decreases, and the film thickness dd of the electrode material P decreases. Further, after reaching a certain number of production lots, the degree of expansion gradually decreases and the film thickness dd of the electrode material P gradually decreases.

つまり初期ロット等の特定ロットのみを前提に設定膜厚を最適化すると、特定ロットとしては良好な範囲に電極材Ｐの膜厚が収まっても、他のロットでは適切な範囲から外れてしまうおそれがあり、ロット全体としては品質不良が発生し易くなるおそれがある。ロット全体として電極材Ｐの膜厚のばらつきが良好な範囲に収まるように電極材Ｐの膜厚を設定する。   In other words, if the set film thickness is optimized on the assumption of only a specific lot such as the initial lot, even if the film thickness of the electrode material P is within a good range for the specific lot, the other lots may fall out of the appropriate range. There is a risk that quality defects are likely to occur as a whole lot. The film thickness of the electrode material P is set so that the variation in the film thickness of the electrode material P is within a favorable range for the entire lot.

本実施形態の電極製造方法は、搬送される電極箔Ｍの面に電極材Ｐを塗工する塗工工程と、電極材Ｐが塗工され搬送される電極箔Ｍをプレスして塗工された電極材Ｐの膜厚を調整する膜厚調整工程と、塗工された電極材Ｐの膜厚を測定する膜厚測定工程と、膜厚測定工程で測定される塗工された電極材Ｐの膜厚のうち、塗工工程における第一膜厚変動周期の整数倍であるサンプリング時間中に得られる膜厚データ群から特定膜厚を求め、特定膜厚に基づいて膜厚の調整を制御する制御工程と、を備える。これによれば、本実施形態の電極製造設備１と同様の効果を得ることができる。また、設備担当者の技能・熟練度に因らずに膜厚の調整量（膜厚調整装置２０のプレスローラ２１，２２の調整量）を設定できるので、使い易さが向上する。   In the electrode manufacturing method of the present embodiment, the coating process for coating the electrode material P on the surface of the electrode foil M to be conveyed, and the electrode foil M to which the electrode material P is coated and conveyed are pressed and coated. The film thickness adjusting step for adjusting the film thickness of the electrode material P, the film thickness measuring step for measuring the film thickness of the coated electrode material P, and the coated electrode material P measured in the film thickness measuring step The specific film thickness is obtained from the film thickness data group obtained during the sampling time that is an integral multiple of the first film thickness fluctuation period in the coating process, and the adjustment of the film thickness is controlled based on the specific film thickness. And a control process. According to this, the effect similar to the electrode manufacturing equipment 1 of this embodiment can be acquired. Further, since the adjustment amount of the film thickness (adjustment amounts of the press rollers 21 and 22 of the film thickness adjusting device 20) can be set regardless of the skill and skill level of the person in charge of the equipment, the ease of use is improved.

（その他）
なお、上述の実施形態では、第１膜厚変動周期として、塗工装置１０のバックアップローラ１１が１周回転するときの回転時間（バックアップローラ１１の１周分の距離の電極材Ｐを移動送りさせる時間）の整数倍を事例として説明したが、バックアップローラ１１以外の送り機構を用いる場合も含む。この場合は、送り機構に起因する変動周期をもとに平均膜厚を算出するサンプリング時間を設定していれば、送り機構はどのような機構も用いることができる。 (Other)
In the above-described embodiment, as the first film thickness variation period, the rotation time when the backup roller 11 of the coating apparatus 10 rotates once (the electrode material P having a distance corresponding to one rotation of the backup roller 11 is moved and fed). In the above description, an integral multiple of (time to be performed) has been described as an example. In this case, any mechanism can be used as the feed mechanism as long as the sampling time for calculating the average film thickness is set based on the fluctuation period caused by the feed mechanism.

また、上述の実施形態では、第２膜厚変動周期として、膜厚調整装置２０のプレスローラ２１，２２が１周回転するときの回転時間（プレスローラ２１，２２の１周分の距離の電極材Ｐを移動送りさせる時間）を事例として説明したが、プレスローラ２１，２２以外の送り機構を用いる場合も含む。この場合は、送り機構に起因する変動周期をもとに平均膜厚を算出するサンプリング時間を設定していれば、送り機構はどのような機構も用いることができる。   In the above-described embodiment, as the second film thickness variation period, the rotation time when the press rollers 21 and 22 of the film thickness adjusting device 20 rotate once (the electrode having a distance corresponding to one rotation of the press rollers 21 and 22). Although the case where the material P is moved and fed) has been described as an example, the case where a feeding mechanism other than the press rollers 21 and 22 is used is also included. In this case, any mechanism can be used as the feed mechanism as long as the sampling time for calculating the average film thickness is set based on the fluctuation period caused by the feed mechanism.

また、上述の実施形態では、第一膜厚変動周期の整数倍であるサンプリング時間中に得られる膜厚データ群から特定膜厚として平均膜厚を制御装置４０にて求める構成としたが、当該膜厚データ群から求めた指標であれば、平均膜厚以外を制御装置４０にて求める構成としてもよい。   Further, in the above-described embodiment, the control device 40 obtains the average film thickness as the specific film thickness from the film thickness data group obtained during the sampling time that is an integral multiple of the first film thickness fluctuation period. As long as it is an index obtained from the film thickness data group, a configuration other than the average film thickness may be obtained by the control device 40.

例えば、サンプリング時間中に得られる最大膜厚、最小膜厚、最大膜厚と最小膜厚との膜厚差、最大膜厚と最小膜厚との中間膜厚、出現頻度の高い膜厚、などであってもよい。
また、最大膜厚や最小膜厚など膜厚データ群の一部だけを取り出したり、膜厚データ群全体を平均化したりする場合、データを取扱い易いという反面、演算過程やデータ抽出過程で全体情報の一部が欠落する影響もある。そこで、膜厚データ群全体そのものや、データ加工を加えた上での膜厚データ群全体（例えば、膜厚データ群全体を平均膜厚や設定膜厚などを元にオフセット調整する、など）を特定膜厚として用いてもよい。 For example, the maximum film thickness, the minimum film thickness obtained during the sampling time, the film thickness difference between the maximum film thickness and the minimum film thickness, the intermediate film thickness between the maximum film thickness and the minimum film thickness, the film thickness that appears frequently, etc. It may be.
Also, when extracting only a part of the film thickness data group such as the maximum film thickness and minimum film thickness or averaging the entire film thickness data group, it is easy to handle the data, but overall information is obtained in the calculation process and data extraction process. There is also an effect that a part of is missing. Therefore, the entire film thickness data group itself, or the entire film thickness data group after data processing (for example, offset adjustment of the entire film thickness data group based on the average film thickness, the set film thickness, etc.) You may use as a specific film thickness.

また、平均膜厚や膜厚データ群全体を特定膜厚とする場合、異常値を取り除いてもよい。例えば、異常値として排除する閾値を設定しておいて、膜厚測定装置３０の測定ミスや電気ノイズ、塗工装置１０の誤動作や機械振動などによる一部の異常値を膜厚データ群全体の中から取り除いた上で、残りの全体データそのものや、残りの全体データから求めた平均膜厚などを特定膜厚として用いてもよい。   Further, when the average film thickness or the entire film thickness data group is set to the specific film thickness, the abnormal value may be removed. For example, by setting a threshold value to be excluded as an abnormal value, some abnormal values due to measurement errors and electrical noise of the film thickness measuring device 30, malfunctions of the coating device 10, mechanical vibrations, etc. After removing from the inside, the remaining total data itself or the average film thickness obtained from the remaining total data may be used as the specific film thickness.

また、上述の実施形態では、非接触型の膜厚測定装置３０を用いる構成としたが、接触型の膜厚測定装置を用いる構成としてもよい。また、電極製造装置１は、電極箔Ｍの片面に電極材Ｐを塗工する装置としたが、電極箔Ｍの両面に電極材Ｐを塗工する装置にも本発明を適用可能である。また、本発明は、リチウムイオン二次電池の電極の製造に限定されるものではなく、例えばキャパシタ等の製造にも適用可能である。   In the above-described embodiment, the non-contact type film thickness measuring device 30 is used. However, the contact type film thickness measuring device may be used. Moreover, although the electrode manufacturing apparatus 1 was used as the apparatus which coats the electrode material P on one side of the electrode foil M, this invention is applicable also to the apparatus which coats the electrode material P on both surfaces of the electrode foil M. Further, the present invention is not limited to the production of an electrode of a lithium ion secondary battery, and can be applied to the production of, for example, a capacitor.

１：電極製造設備、 １０：塗工装置、 １１：バックアップローラ、 ２０：膜厚調整装置、 ２１，２２：プレスローラ、 ３０：膜厚測定装置、 ３１：調整前測定装置、 ３２：調整後測定装置、 ４０：制御装置、 Ｐ：電極材、 Ｍ：金属箔、 Ｒ：ロール、 Ｓ：スラリ   DESCRIPTION OF SYMBOLS 1: Electrode manufacturing equipment, 10: Coating apparatus, 11: Backup roller, 20: Film thickness adjustment apparatus, 21, 22: Press roller, 30: Film thickness measurement apparatus, 31: Measurement apparatus before adjustment, 32: Measurement after adjustment Device, 40: control device, P: electrode material, M: metal foil, R: roll, S: slurry

Claims (6)

バックアップローラに支持され搬送される電極箔の面に電極材を塗工する塗工装置と、
前記電極材が塗工され搬送される電極箔をプレスローラでプレスして前記塗工された電極材の膜厚を調整する膜厚調整装置と、
前記塗工された電極材の膜厚を測定する膜厚測定装置と、
前記膜厚測定装置で測定される前記塗工された電極材の膜厚のうち、前記塗工装置による塗工において前記バックアップローラが１周回転するときの回転時間である第一膜厚変動周期と、前記膜厚調整装置による調整において前記プレスローラが１周回転するときの回転時間である第二膜厚変動周期と、の最小公倍数の時間として第三膜厚変動周期を算出し、前記第三膜厚変動周期の整数倍であるサンプリング時間中に得られる膜厚データ群から特定膜厚を求め、前記特定膜厚に基づいて前記膜厚調整装置の調整動作を制御する制御装置と、
を備える、電極製造設備。 A coating device for coating the electrode material on the surface of the electrode foil supported and conveyed by the backup roller ;
A film thickness adjusting device for adjusting the film thickness of the coated electrode material by pressing the electrode foil on which the electrode material is coated and conveyed with a press roller ;
A film thickness measuring device for measuring the film thickness of the coated electrode material;
Of the film thickness of the coated electrode material measured by the film thickness measuring device, the first film thickness variation period which is a rotation time when the backup roller rotates once in the coating by the coating device. A third film thickness fluctuation period as a time of a least common multiple of the second film thickness fluctuation period, which is a rotation time when the press roller rotates once in the adjustment by the film thickness adjusting device, A control device that obtains a specific film thickness from a film thickness data group obtained during a sampling time that is an integral multiple of three film thickness fluctuation cycles , and controls the adjustment operation of the film thickness adjustment device based on the specific film thickness;
An electrode manufacturing facility comprising: 前記特定膜厚は、前記膜厚データ群の平均膜厚である、請求項１に記載の電極製造設備。   The electrode manufacturing facility according to claim 1, wherein the specific film thickness is an average film thickness of the film thickness data group. 前記膜厚測定装置は、前記膜厚調整装置に対し上流側に配置される調整前測定装置を備え、
前記制御装置は、前記調整前測定装置による測定結果に関係付けられた前記膜厚調整装置の調整量に基づいて前記膜厚調整装置の調整動作を制御する、請求項１又は２に記載の電極製造設備。 The film thickness measuring device includes a pre-adjustment measuring device disposed upstream of the film thickness adjusting device,
Wherein the control device controls the adjustment operation of the adjustment before measurement apparatus according to the adjustment amount the film thickness adjusting device based on the film thickness adjusting apparatus associated with the measurement result, the electrode according to claim 1 or 2 production equipment. 前記膜厚測定装置は、前記膜厚調整装置に対し下流側に配置される調整後測定装置を備え、
前記制御装置は、前記調整後測定装置による測定結果及び予め設定された設定膜厚に基づいて前記膜厚調整装置の調整動作を制御する、請求項１又は２に記載の電極製造設備。 The film thickness measuring device includes a post-adjustment measuring device disposed downstream of the film thickness adjusting device,
The control device, the control the adjustment operation of the film thickness adjusting apparatus based measurement result by the adjusted measuring device and setting the film thickness that is set in advance, the electrode manufacturing facility according to claim 1 or 2. 前記設定膜厚は、前記電極の製造ロット数に基づいて設定される、請求項４に記載の電極製造設備。 The electrode manufacturing equipment according to claim 4 , wherein the set film thickness is set based on the number of manufacturing lots of the electrode. バックアップローラに支持され搬送される電極箔の面に電極材を塗工する塗工工程と、
前記電極材が塗工され搬送される電極箔をプレスローラでプレスして前記塗工された電極材の膜厚を調整する膜厚調整工程と、
前記塗工された電極材の膜厚を測定する膜厚測定工程と、
前記膜厚測定工程で測定される前記塗工された電極材の膜厚のうち、前記塗工工程において前記バックアップローラが１周回転するときの回転時間である第一膜厚変動周期と、前記膜厚調整工程において前記プレスローラが１周回転するときの回転時間である第二膜厚変動周期と、の最小公倍数の時間として第三膜厚変動周期を算出し、前記第三膜厚変動周期の整数倍であるサンプリング時間中に得られる膜厚データ群から特定膜厚を求め、前記特定膜厚に基づいて前記膜厚の調整を制御する制御工程と、
を備える、電極製造方法。 A coating process for coating an electrode material on the surface of the electrode foil supported and conveyed by the backup roller ;
A film thickness adjusting step for adjusting the film thickness of the coated electrode material by pressing the electrode foil on which the electrode material is coated and conveyed with a press roller ;
A film thickness measuring step for measuring the film thickness of the coated electrode material;
Of thickness of the coated been electrode material is measured by the thickness measuring step, the first film thickness variation period is the rotation time at which the backup roller have contact to the coating step is one rotation The third film thickness fluctuation period is calculated as the least common multiple of the second film thickness fluctuation period, which is the rotation time when the press roller rotates once in the film thickness adjusting step, and the third film thickness fluctuation period is calculated. A control step of obtaining a specific film thickness from a film thickness data group obtained during a sampling time that is an integral multiple of the fluctuation period , and controlling the adjustment of the film thickness based on the specific film thickness;
An electrode manufacturing method comprising:
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