JP6408502B2 - ガスサンプリング容器 - Google Patents
ガスサンプリング容器 Download PDFInfo
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- JP6408502B2 JP6408502B2 JP2016044772A JP2016044772A JP6408502B2 JP 6408502 B2 JP6408502 B2 JP 6408502B2 JP 2016044772 A JP2016044772 A JP 2016044772A JP 2016044772 A JP2016044772 A JP 2016044772A JP 6408502 B2 JP6408502 B2 JP 6408502B2
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- valve
- gas
- container
- gas sampling
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Description
Claims (3)
- 筒状容器の一端に入口弁を、他端に出口弁を有するガスサンプリング容器において、前記入口弁の下流側に、焼結金属フィルタを設けたことを特徴とするガスサンプリング容器。
- 前記入口弁は、パージ弁と導入弁とを一体化した2連3方弁であることを特徴とする請求項1記載のガスサンプリング容器。
- 前記焼結金属フィルタは、前記入口弁に一体的に設けられていることを特徴とする請求項1又は2記載のガスサンプリング容器。
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JP2016044772A JP6408502B2 (ja) | 2016-03-08 | 2016-03-08 | ガスサンプリング容器 |
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JP2016044772A JP6408502B2 (ja) | 2016-03-08 | 2016-03-08 | ガスサンプリング容器 |
Publications (2)
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JP2017161312A JP2017161312A (ja) | 2017-09-14 |
JP6408502B2 true JP6408502B2 (ja) | 2018-10-17 |
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Family Applications (1)
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JP2016044772A Active JP6408502B2 (ja) | 2016-03-08 | 2016-03-08 | ガスサンプリング容器 |
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JP (1) | JP6408502B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10613006B1 (en) * | 2018-09-24 | 2020-04-07 | Mustang Sampling, LLC. | Liquid vaporization device and method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2533709Y2 (ja) * | 1988-02-05 | 1997-04-23 | 東京瓦斯 株式会社 | 低温液化ガス用ガス化サンプリング装置 |
CA1320849C (en) * | 1988-06-02 | 1993-08-03 | Jose M. Dieguez | Cryogenic liquid sampling |
JP2709676B2 (ja) * | 1991-08-20 | 1998-02-04 | 大陽東洋酸素株式会社 | 低温液化ガスの水分低減方法 |
JP3360148B2 (ja) * | 1993-06-21 | 2002-12-24 | 日本酸素株式会社 | 低温液化ガスのサンプリング装置 |
JP3685913B2 (ja) * | 1997-10-17 | 2005-08-24 | 昭和電工株式会社 | 非共沸混合冷媒の分析方法 |
JP2000171362A (ja) * | 1998-12-03 | 2000-06-23 | Nippon Sanso Corp | 高純度ガス用サンプラー |
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- 2016-03-08 JP JP2016044772A patent/JP6408502B2/ja active Active
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JP2017161312A (ja) | 2017-09-14 |
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