JP6407728B2 - Manufacturing method of mechanical seal - Google Patents
Manufacturing method of mechanical seal Download PDFInfo
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- JP6407728B2 JP6407728B2 JP2014560827A JP2014560827A JP6407728B2 JP 6407728 B2 JP6407728 B2 JP 6407728B2 JP 2014560827 A JP2014560827 A JP 2014560827A JP 2014560827 A JP2014560827 A JP 2014560827A JP 6407728 B2 JP6407728 B2 JP 6407728B2
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
- C09K3/1003—Pure inorganic mixtures
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J15/00—Sealings
- F16J15/16—Sealings between relatively-moving surfaces
- F16J15/34—Sealings between relatively-moving surfaces with slip-ring pressed against a more or less radial face on one member
- F16J15/3496—Sealings between relatively-moving surfaces with slip-ring pressed against a more or less radial face on one member use of special materials
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Description
本発明は、メカニカルシールおよびその製造方法に関し、詳細には、摺動面がダイヤモンド被膜で構成されているメカニカルシールおよびその製造方法に関する。 The present invention relates to a mechanical seal and a method for manufacturing the same, and more particularly to a mechanical seal having a sliding surface made of a diamond coating and a method for manufacturing the same.
ポンプ、送風機、攪拌機等の産業用回転機器では、回転軸周りがメカニカルシールで封止されている。このようなメカニカルシールとしては、摺動材としてＳｉC、ＷＣ、焼結カーボン等が使用されている。高面圧、高周速といった過酷な条件下で使用されるメカニカルシールでは、摺動面に、硬度、耐摩耗性に優れた多結晶ダイヤモンドの被膜が設けられた、例えば、特許文献１に記載されているようなメカニカルシールが提案されている。 In industrial rotary equipment such as pumps, blowers, and stirrers, the periphery of the rotary shaft is sealed with a mechanical seal. As such a mechanical seal, SiC, WC, sintered carbon or the like is used as a sliding material. In mechanical seals used under severe conditions such as high surface pressure and high peripheral speed, a sliding surface is provided with a coating of polycrystalline diamond having excellent hardness and wear resistance. Such mechanical seals have been proposed.
一方、多結晶ダイヤモンド同士の摺動面として、特許文献２に記載されたものが知られている。 On the other hand, what was described in patent document 2 is known as a sliding surface of polycrystalline diamond.
高硬度のダイヤモンド被膜は、メカニカルシールに要求される高い漏洩防止性能を有する平滑な面を得ることが困難であるため、引用文献１に記載されているメカニカルシールでは、一方のダイヤモンド被膜の表面に硬質炭素材の被膜を形成し、ダイヤモンド被膜の凹凸を硬質炭素材で埋めることにより、平滑な面を得ている。したがって、他方側の表面を構成するダイヤモンド被膜が、一方側の硬質炭素材の表面を研磨することになるので、耐久性が低くなる。また、成膜工程が２工程となるため、製造コストが高くなるという問題もあった。 Since it is difficult to obtain a smooth surface having a high leakage prevention performance required for a mechanical seal, a high hardness diamond coating is difficult to obtain on the surface of one of the diamond coatings. A smooth surface is obtained by forming a hard carbon material film and filling the unevenness of the diamond film with the hard carbon material. Therefore, the diamond coating constituting the surface on the other side polishes the surface of the hard carbon material on the one side, so that the durability is lowered. In addition, since the film forming process is performed in two steps, there is a problem that the manufacturing cost increases.
引用文献２に記載された発明では、ダイヤモンドの被膜面同士を共摺りすることによって、平滑な摺動面を得ている。しかしながら、得られた摺動面には、うねりや微細な傷が残存しており、メカニカルシールに要求される漏洩防止性能は満たされなかった。 In the invention described in the cited document 2, a smooth sliding surface is obtained by co-sliding the coated surfaces of diamond. However, swells and fine scratches remained on the obtained sliding surface, and the leakage prevention performance required for the mechanical seal was not satisfied.
本発明は、このような問題点を解決するためになされたものであり、メカニカルシールに要求される漏洩防止性能を満たしながら、優れた耐久性を有するダイヤモンド被膜面を有するメカニカルシールを提供することを目的とする。 The present invention has been made to solve such problems, and provides a mechanical seal having a diamond coated surface having excellent durability while satisfying the leakage prevention performance required for the mechanical seal. With the goal.
また、本発明は、メカニカルシールに要求される性能を満たしながら、優れた耐久性を有するダイヤモンド被膜面を有するメカニカルシールの製造方法を提供することも目的とする。 Another object of the present invention is to provide a method for producing a mechanical seal having a diamond coated surface having excellent durability while satisfying the performance required for the mechanical seal.
本発明によれば、
相対回転する第１および第２の環状摺動面を有するメカニカルシールであって、
前記第１および第２の環状摺動面は、表面が多結晶ダイヤモンドで構成され、平面度が３μｍ以下であり、且つ面粗さＲａが０．０１乃至１μｍである、
ことを特徴とするメカニカルシールが提供される。According to the present invention,
A mechanical seal having first and second annular sliding surfaces that rotate relative to each other;
The first and second annular sliding surfaces are made of polycrystalline diamond, have a flatness of 3 μm or less, and a surface roughness Ra of 0.01 to 1 μm.
A mechanical seal is provided.
このような構成によれば、摺動面の平面度及び面粗さが、メカニカルシールに要求される漏洩防止性能と適度な潤滑性能を達成可能なレベルであり、且つ摺動面の表面が多結晶ダイヤモンドで構成されているので、優れた耐久性を有する。 According to such a configuration, the flatness and surface roughness of the sliding surface are at a level that can achieve the leakage prevention performance and appropriate lubrication performance required for the mechanical seal, and there are many sliding surfaces. Since it is composed of crystalline diamond, it has excellent durability.
本発明の他の好ましい態様によれば、
前記平面度が０．１乃至１．０μｍである。According to another preferred embodiment of the invention,
The flatness is 0.1 to 1.0 μm.
本発明の他の好ましい態様によれば、
前記第１および第２の環状摺動面間における、静的および動的シール性能が、水に対して３ｍｌ／ｈ以下の漏れ量である。According to another preferred embodiment of the invention,
The static and dynamic sealing performance between the first and second annular sliding surfaces is a leakage amount of 3 ml / h or less with respect to water.
本発明の他の好ましい態様によれば、
前記第１および第２の環状摺動面間における、静的および動的シール性能が、気体に対して５０Ｎｍｌ／ｍｉｎ以下の漏れ量である。According to another preferred embodiment of the invention,
The static and dynamic sealing performance between the first and second annular sliding surfaces is a leakage amount of 50 Nml / min or less with respect to the gas.
本発明の他の態様によれば、
多結晶ダイヤモンドで被膜された一対の環状摺動面を有するメカニカルシールの製造方法であって、
多結晶ダイヤモンド被膜が堆積された第１および第２の環状摺動面を、無潤滑環境下で、偏心運動させながら相対回転させる第１共摺り工程と、
前記第１共摺り工程が終了した第１および第２の環状摺動面を、液体潤滑環境下で相対回転させる第２共摺り工程と、を備えている、
ことを特徴とするメカニカルシールの製造方法が提供される。According to another aspect of the invention,
A method of manufacturing a mechanical seal having a pair of annular sliding surfaces coated with polycrystalline diamond,
A first co-sliding step in which the first and second annular sliding surfaces on which the polycrystalline diamond film is deposited are rotated relative to each other while being eccentrically moved in an unlubricated environment;
A second co-sliding step of relatively rotating the first and second annular sliding surfaces after the first co-sliding step in a liquid lubrication environment,
A method for manufacturing a mechanical seal is provided.
本発明の他の好ましい態様によれば、
前記第１共摺り工程における偏心量が、前記環状摺動面の幅の５乃至５０％の大きさである。According to another preferred embodiment of the invention,
The amount of eccentricity in the first co-sliding step is 5 to 50% of the width of the annular sliding surface.
本発明の他の好ましい態様によれば、
前記第１共摺り工程における前記第１および第２の環状摺動面間の面圧が、０．００１乃至０．４ＭＰａである。According to another preferred embodiment of the invention,
The surface pressure between the first and second annular sliding surfaces in the first co-sliding step is 0.001 to 0.4 MPa.
本発明の他の好ましい態様によれば、
前記第２共摺り工程における前記第１および第２の環状摺動面間の面圧が、０．１乃至５ＭＰａである。According to another preferred embodiment of the invention,
The surface pressure between the first and second annular sliding surfaces in the second co-sliding step is 0.1 to 5 MPa.
本発明の他の態様によれば、
対応するメカニカルシール部材の摺動面と相対回転することになるメカニカルシール用の環状摺動面を有するメカニカルシール部材であって、
前記環状摺動面は、表面が多結晶ダイヤモンドで構成され、平面度が３μｍ以下であり、且つ面粗さＲａが０．０１乃至１μｍである、
ことを特徴とするメカニカルシール部材が提供される。According to another aspect of the invention,
A mechanical seal member having an annular sliding surface for a mechanical seal that rotates relative to the sliding surface of the corresponding mechanical seal member,
The annular sliding surface has a surface made of polycrystalline diamond, a flatness of 3 μm or less, and a surface roughness Ra of 0.01 to 1 μm.
A mechanical seal member is provided.
本発明によれば、メカニカルシールに要求される性能を満たしながら、優れた耐久性を有するダイヤモンド被膜面を有するメカニカルシールが提供される。 ADVANTAGE OF THE INVENTION According to this invention, the mechanical seal which has the diamond coating surface which has the outstanding durability, satisfy | filling the performance requested | required of a mechanical seal is provided.
また、本発明によれば、メカニカルシールに要求される漏洩防止性能を満たしながら、優れた耐久性を有するダイヤモンド被膜面を有するメカニカルシールの製造方法も提供される。 Moreover, according to this invention, the manufacturing method of the mechanical seal which has the diamond coating surface which has the outstanding durability, satisfy | filling the leakage prevention performance requested | required of a mechanical seal is also provided.
以下、図面を参照して、本発明の実施形態のメカニカルシールの構成について説明する。
本実施形態のメカニカルシール１は、ポンプ、送風機、攪拌機等の産業用回転機器において回転軸周りをシールするために使用されるメカニカルシールである。しかしながら、他の用途にも使用可能である。Hereinafter, with reference to drawings, the structure of the mechanical seal of embodiment of this invention is demonstrated.
The mechanical seal 1 of this embodiment is a mechanical seal used for sealing around a rotation axis in industrial rotary equipment such as a pump, a blower, and a stirrer. However, it can be used for other purposes.
図１は、メカニカルシール１の要部の分解斜視図である。
メカニカルシール１は、シリコンカーバイト、窒化シリコン、またはタングステンカーバイト等の焼結材料によって構成された、略同一形状の第１および第２の基材２、４を備えている。第１および第２の基材２、４の一端面には、第１および第２の環状摺動面６、８がそれぞれ形成されている。なお、基材の材料は、上記材料に限定されるものではなく、例えば、チタンやタンタル等の金属でもよい。FIG. 1 is an exploded perspective view of a main part of the mechanical seal 1.
The mechanical seal 1 includes first and second substrates 2 and 4 having substantially the same shape and made of a sintered material such as silicon carbide, silicon nitride, or tungsten carbide. First and second annular sliding surfaces 6 and 8 are formed on one end surfaces of the first and second substrates 2 and 4, respectively. The material of the base material is not limited to the above material, and may be a metal such as titanium or tantalum, for example.
第１および第２の環状摺動面６、８は、表面が多結晶ダイヤモンドで構成され、平面度が３．０μｍ以下であり、且つ面粗さＲａが０．０１乃至１μｍである。第１および第２の環状摺動面６、８の平面度は、０．１乃至１．０μｍであるのが好ましい。 The first and second annular sliding surfaces 6 and 8 have a surface made of polycrystalline diamond, a flatness of 3.0 μm or less, and a surface roughness Ra of 0.01 to 1 μm. The flatness of the first and second annular sliding surfaces 6 and 8 is preferably 0.1 to 1.0 μm.
第１および第２の環状摺動面６、８を構成する多結晶ダイヤモンド被膜の厚さは、１乃至３０μｍ程度が好ましい。 The thickness of the polycrystalline diamond film constituting the first and second annular sliding surfaces 6 and 8 is preferably about 1 to 30 μm.
そして、第１および第２の環状摺動面６、８間における、静的および動的シール性能は、水に対する漏れ量が３ｍｌ／ｈ以下であり、気体に対する漏れ量が５０Ｎｍｌ／ｍｉｎ以下である。 The static and dynamic sealing performance between the first and second annular sliding surfaces 6 and 8 is such that the amount of leakage with respect to water is 3 ml / h or less and the amount of leakage with respect to gas is 50 Nml / min or less. .
次に、本実施形態のメカニカルシール１の製造方法について説明する。
まず、タングステンカーバイト等の材料によって構成された円環（リング）状の第１および第２の基材２、４の一方の環状面すなわち環状摺動面６、８となる面に、公知のＨＦ（Hot-Filament : 熱フィラメント）−ＣＶＤ法で多結晶ダイヤモンドの被膜を形成する。Next, the manufacturing method of the mechanical seal 1 of this embodiment is demonstrated.
First, the ring-shaped first and second bases 2 and 4 made of a material such as tungsten carbide have one annular surface, that is, a surface that becomes the annular sliding surfaces 6 and 8. A polycrystalline diamond film is formed by HF (Hot-Filament) -CVD method.
なお、熱フィラメント化学蒸着（ＣＶＤ）法、マイクロ波プラズマＣＶＤ法、ＰＶＤ法等の他の方法で多結晶ダイヤモンド被膜を形成しても良い。 The polycrystalline diamond film may be formed by other methods such as a hot filament chemical vapor deposition (CVD) method, a microwave plasma CVD method, and a PVD method.
多結晶ダイヤモンドは被膜の厚さは、５乃至３０μｍ程度が好ましい。より好ましくは厚さが５μｍ乃至１５μｍである。その理由は、被膜の厚さが５μｍより小さいと、貫通型ピンホール欠陥密度が増え、良好な耐摩耗性が得られないからである。一方、１５μｍより大きい場合、多結晶ダイヤモンド表面を平滑化する研磨加工時間が長くなり、経済的でない。また、膜厚を厚くするほど、多結晶ダイヤモンド膜自体の内部応力値が大きくなり、膜が基板から剥離することもあるからである。
また、この多結晶ダイヤモンド被膜は、Ｘ線回折によれば、ダイヤモンド結晶が１１１面に優先配向していることを特徴としている。Polycrystalline diamond preferably has a coating thickness of about 5 to 30 μm. More preferably, the thickness is 5 μm to 15 μm. The reason is that if the thickness of the coating is smaller than 5 μm, the penetration type pinhole defect density is increased and good wear resistance cannot be obtained. On the other hand, if it is larger than 15 μm, the polishing time for smoothing the surface of the polycrystalline diamond becomes long, which is not economical. Further, as the film thickness is increased, the internal stress value of the polycrystalline diamond film itself is increased, and the film may be peeled off from the substrate.
In addition, this polycrystalline diamond film is characterized in that diamond crystals are preferentially oriented in the 111 plane according to X-ray diffraction.
次いで、第１および第２の基材２、４の環状面に形成された多結晶ダイヤモンド被膜を共摺りによって研磨し、メカニカルシールに要求される上記条件を満たす状態に仕上げる。 Next, the polycrystalline diamond film formed on the annular surfaces of the first and second substrates 2 and 4 is polished by co-sliding to finish the condition satisfying the above requirements for the mechanical seal.
本実施形態では、共摺りは２段階に分けて行われる。
まず、第１共摺り工程を行う。図２に示されているように、第１の基材２を、多結晶ダイヤモンド被膜が形成された環状面を上方に向けた状態で固定用下側部材１０に固定し、この固定用下側部材１０を、ＸＹＺ方向への移動可能なＮＣ機械の部品固定治具（図示せず）に取付ける。この結果、第１の基材２は、ＸＹＺ方向への移動が可能な状態で、固定されることになる。In this embodiment, co-sliding is performed in two stages.
First, the first co-grinding process is performed. As shown in FIG. 2, the first base material 2 is fixed to the fixing lower member 10 with the annular surface on which the polycrystalline diamond film is formed facing upward, and this fixing lower side The member 10 is attached to a component fixing jig (not shown) of an NC machine that can move in the XYZ directions. As a result, the first base material 2 is fixed in a state where it can move in the XYZ directions.
また、第２の基材４を、多結晶ダイヤモンド膜が形成された環状面を下方に向けた状態で、固定用上側部材１２に固定し、この固定用上側部材を回転軸１４に取付ける。この結果、第２の基材４は、回転軸１４の回転によって上下方向に延びる中心軸線Ｘを中心に自転可能な状態とされる。 Further, the second base material 4 is fixed to the fixing upper member 12 with the annular surface on which the polycrystalline diamond film is formed facing downward, and the fixing upper member is attached to the rotating shaft 14. As a result, the second base material 4 is allowed to rotate about the central axis X extending in the vertical direction by the rotation of the rotary shaft 14.
第１共摺り工程では、回転軸１４を回転させることにより、第２の基材４を、周速が毎分１８０乃至６５０ｍとなる速度で回転（自転）させながら、第１の基材２の環状面に形成された多結晶ダイヤモンド被膜と第２の基材４の環状面に形成された多結晶ダイヤモンド被膜とを接触させる。すなわち、第２の基材４は、自転しながら所定面圧で第１の基材２に接触させられる。
このとき面圧が低すぎると加工が進まず、高すぎると異常摩耗・剥離が生じる。したがって、面圧を、多結晶ダイヤモンド被膜の状態によって変更することが好ましい。具体的には、面圧は、０．００１乃至０．４ＭＰａ程度が好ましく、０．００５乃至０．３ＭＰａ程度がより好ましい。また、周速と面圧の関係が、５乃至１７０ｍ／ｍｉｎ・ＭＰａ程度となることが好ましい。In the first co-grinding step, by rotating the rotating shaft 14, the second base material 4 is rotated (spinned) at a speed at which the peripheral speed is 180 to 650 m / min. The polycrystalline diamond film formed on the annular surface and the polycrystalline diamond film formed on the annular surface of the second substrate 4 are brought into contact with each other. That is, the second substrate 4 is brought into contact with the first substrate 2 at a predetermined surface pressure while rotating.
At this time, if the surface pressure is too low, the processing does not proceed, and if it is too high, abnormal wear and peeling occur. Therefore, it is preferable to change the surface pressure depending on the state of the polycrystalline diamond coating. Specifically, the surface pressure is preferably about 0.001 to 0.4 MPa, and more preferably about 0.005 to 0.3 MPa. The relationship between the peripheral speed and the surface pressure is preferably about 5 to 170 m / min · MPa.
第１の基材２に形成された多結晶ダイヤモンド被膜と第２の基材４に形成された多結晶ダイヤモンド被膜とが相対回転しながら所定の面圧で接触すると、第１の基材２が取付けられているＮＣ機械を作動させ、第１の基材２が取付けられている固定用下側部材１０を、第２の基材４の中心軸Ｙを中心とした円軌道上に沿って移動させる。すなわち固定用下側部材１０およびこれに取付けられている第１の基材２を、図３乃至図６の平面図、および図４の側面図である図７に示されているように、第２の基材４の中心軸Ｙを中心に公転させる。すなわち、図３の配置から、図４、図５そして図６の位置に移動させる。なお、このとき、第１の基材２は、自転していない。 When the polycrystalline diamond coating formed on the first substrate 2 and the polycrystalline diamond coating formed on the second substrate 4 come into contact with each other at a predetermined surface pressure while relatively rotating, the first substrate 2 is The attached NC machine is operated to move the fixing lower member 10 to which the first base material 2 is attached along a circular orbit about the central axis Y of the second base material 4. Let That is, the lower member 10 for fixing and the first base member 2 attached to the lower member 10 are fixed as shown in FIG. 7 which is a plan view of FIGS. 3 to 6 and a side view of FIG. 2 is revolved around the central axis Y of the base material 4. That is, it is moved from the arrangement of FIG. 3 to the positions of FIG. 4, FIG. 5 and FIG. At this time, the first base material 2 does not rotate.
このように、自転している第２の基材４の中心に対して、自転していない第１の基材２を公転（偏心運動）させることによって第１の共摺りが行われる。 In this way, the first co-sliding is performed by causing the first base material 2 that does not rotate to revolve (eccentric motion) to the center of the second base material 4 that rotates.
この偏心運動の偏心量Ｅは、環状摺動面６、８の幅の５０％以下であり、５乃至５０％が好ましく、１０％乃至２０％がより好ましく、本実施形態では１６．６％とされている。これは、偏心量が少なすぎる場合には、加工粉の排出性が低く、加工表面の面粗さを悪化させ、偏心量が多すぎる場合には、加工面に対して片荷重が生じ、高い平面度が得られなくなるためである。 The eccentric amount E of this eccentric motion is 50% or less of the width of the annular sliding surfaces 6 and 8, preferably 5 to 50%, more preferably 10% to 20%, and 16.6% in this embodiment. Has been. This is because if the amount of eccentricity is too small, the dischargeability of the processing powder is low and the surface roughness of the processed surface is deteriorated. This is because flatness cannot be obtained.
また、偏心移動速度は、毎分１００乃至２００ｍｍが好ましい。
この偏心移動速度は、ＮＣ機械の部品固定治具（テーブル）が移動する円弧移動速度である。The eccentric moving speed is preferably 100 to 200 mm per minute.
The eccentric moving speed is an arc moving speed at which the component fixing jig (table) of the NC machine moves.
例えば、偏心量が０．５ｍｍの場合には、円弧移動距離は３．１４ｍｍであり、毎分１００ｍｍの場合、１分間に約３２回偏心することになる。 For example, when the amount of eccentricity is 0.5 mm, the arc moving distance is 3.14 mm, and when the amount is 100 mm per minute, the eccentricity is about 32 times per minute.
このような第１の共摺り工程は、多結晶ダイヤモンド被膜の異常粒成長した先端部が摩耗させられるまで継続される。例えば、３乃至１５分程度が経過し表面のざらつきが無くなると、第１の共摺りを終了する。 Such a first co-grinding process is continued until the tip of the polycrystalline diamond film where abnormal grains have grown is worn. For example, when about 3 to 15 minutes have passed and the surface roughness is eliminated, the first co-sliding is finished.
第１の共摺り工程中、回転速度、偏心速度、面圧等は一定に維持される。また、第１の共摺り工程中、固定用下側部材１０に形成された冷媒循環経路内に冷媒を流すことによって、第１の基材２と第２の基材４の温度を、所定温度、例えば摂氏２０乃至２５度に維持するように構成してもよい。 During the first co-sliding step, the rotation speed, eccentric speed, surface pressure, and the like are maintained constant. Further, during the first co-sliding step, the temperature of the first base material 2 and the second base material 4 is set to a predetermined temperature by flowing the coolant in the coolant circulation path formed in the lower member 10 for fixing. For example, the temperature may be maintained at 20 to 25 degrees Celsius.
次いで、第１の共摺り工程が終了した第１の基材２と第２の基材４に対して、第２の共摺り工程を行う。第２の共摺り工程は、第１の共摺り工程が終了した第１の基材２と第２の基材４のダイヤモンド被膜が形成されている環状面同士を整列状態で当接させ、第１の基材２と第２の基材４を相対回転（自転）させることによって、行われる。即ち、第２の共摺り工程では、第１及び第２の基材２、４は、中心軸を整列させた状態で、一方が中心軸を中心として回転（自転）させられる。 Next, a second co-sliding step is performed on the first base material 2 and the second base material 4 for which the first co-sliding step has been completed. In the second co-grinding step, the annular surfaces on which the diamond coatings of the first base material 2 and the second base material 4 on which the first co-grinding step is completed are brought into contact with each other in an aligned state. This is performed by relatively rotating (spinning) the first base material 2 and the second base material 4. That is, in the second co-sliding step, one of the first and second substrates 2 and 4 is rotated (spinned) around the central axis while the central axes are aligned.
具体的には、第１の共摺り工程が終了した第１及び第２の基材２、４を、メカニカルシールと同様の組み立て状態とし、第１及び第２の基材２、４の一方をモータに回転駆動可能に連結する。この際、第１及び第２の基材２、４の一方とモータとの間にトルク計が配置される。 Specifically, the first and second base materials 2 and 4 that have completed the first co-sliding step are set in the same assembly state as the mechanical seal, and one of the first and second base materials 2 and 4 is set. It is connected to the motor so that it can be rotated. At this time, a torque meter is disposed between one of the first and second substrates 2 and 4 and the motor.
この状態で、第１の基材２と第２の基材４のダイヤモンド被膜が形成されている環状面同士を同軸状態に配置して、例えば、０．１乃至５ＭＰａの面圧で当接させ、モータによって、第１及び第２の基材２、４の一方を、図８に矢印Ａで示すように回転駆動させ、第２の共摺り工程を行う。 In this state, the annular surfaces on which the diamond coatings of the first base material 2 and the second base material 4 are formed are arranged coaxially and brought into contact with, for example, a surface pressure of 0.1 to 5 MPa. Then, one of the first and second substrates 2 and 4 is rotated by a motor as shown by an arrow A in FIG. 8 to perform a second co-sliding step.
第２の共摺りでは、第１及び第２の基材２、４の相対回転速度は、周速が、例えば毎分６００乃至９００ｍ程度となるように設定されるのが好ましい。 In the second co-grinding, the relative rotational speeds of the first and second substrates 2 and 4 are preferably set so that the peripheral speed is, for example, about 600 to 900 m / min.
このとき、第１の基材２と第２の基材４のダイヤモンド被膜が形成されている環状面間には、所定温度、例えば摂氏２０乃至２５度に調整された水などの液体Ｌが、液体供給装置２０から供給される（図８）。 At this time, a liquid L such as water adjusted to a predetermined temperature, for example, 20 to 25 degrees Celsius, is formed between the annular surfaces on which the diamond coatings of the first substrate 2 and the second substrate 4 are formed. It is supplied from the liquid supply device 20 (FIG. 8).
第２の共摺りは、第１の基材２と第２の基材４を相対回転させる際にトルクを計測しながら行われる。第２の共摺りは、トルクの異常値が発生する状態、例えば、トルクの急激な増減が所定時間にわたって継続するというような状態となった時点で、終了される。即ち、トルクの異常値が発生することが、第２の共摺り終了の判断基準となる。 The second co-grinding is performed while measuring the torque when the first base material 2 and the second base material 4 are relatively rotated. The second co-sliding is terminated when an abnormal torque value occurs, for example, when a rapid increase or decrease in torque continues for a predetermined time. That is, the occurrence of an abnormal torque value is the second criterion for determining the end of the second sliding.
上記例では、トルク変動を第２の共摺り終了の判断基準としたが、摺動面近傍の温度が、所定温度以上となったことを判断基準としてもよい。 In the above example, the torque fluctuation is used as the determination criterion for the end of the second co-sliding, but the determination criterion may be that the temperature near the sliding surface is equal to or higher than a predetermined temperature.
なお、第１および第２の共摺り工程のいずれにおいても、第１および第２の基材２、４は、スプリング等を有する従動機構によって、相手方の基材の軸線方向の移動に追従できるようにされる。 In both the first and second co-sliding steps, the first and second base materials 2 and 4 can follow the movement of the counterpart base material in the axial direction by a driven mechanism having a spring or the like. To be.
このような第１および第２の共摺り工程によって、上述した特性の環状摺動面６、８を有する基材２、４を備えたメカニカルシール１が提供される。 By such first and second co-sliding processes, the mechanical seal 1 including the base materials 2 and 4 having the annular sliding surfaces 6 and 8 having the above-described characteristics is provided.
本発明の前記実施形態に限定されることなく、特許請求の範囲に記載された技術的思想の範囲内で種々の変更、変形が可能である。 Without being limited to the above-described embodiment of the present invention, various changes and modifications can be made within the scope of the technical idea described in the claims.
次に、本発明の実施例の説明をする。
まず、基材の材料として、外径４４ｍｍ、内径３７ｍｍ、高さ５ｍｍの炭化珪素製のリング状のメカニカルシール用摺動材料（リング）を複数個用意し、熱フィラメントＣＶＤ装置を用いたＨＦ−ＣＶＤ法により、両環状面に、厚さ５乃至１５μｍのダイヤモンド被膜を形成した。この際の成膜条件は、雰囲気：９５乃至９８％Ｈ2・２乃至５％%ＣＨ4、圧力５ｋＰａ、基材温度：摂氏６００乃至９００度であった。Next, examples of the present invention will be described.
First, as a base material, a plurality of ring-shaped mechanical seal sliding materials (rings) made of silicon carbide having an outer diameter of 44 mm, an inner diameter of 37 mm, and a height of 5 mm are prepared, and HF- using a hot filament CVD apparatus. A diamond film having a thickness of 5 to 15 μm was formed on both annular surfaces by CVD. Film forming conditions in this case, Atmosphere: 95 to 98% H 2 · 2 to 5 %% CH 4, the pressure 5 kPa, substrate temperature: was 600 to 900 degrees Celsius.
この熱フィラメントＣＶＤ装置は、ステンレス製の真空蒸着装置で、排気機構は油回転ポンプのみで構成されている。また、励起源のフィラメントとしては、線状に張られたφ０．１５ｍｍのタンタル線を用いた。基板温度は、基板ホルダーをアルメルークロメル熱電対により測定することによって測定した。 This hot filament CVD apparatus is a stainless steel vacuum vapor deposition apparatus, and the exhaust mechanism is composed only of an oil rotary pump. As the excitation source filament, a tantalum wire of φ0.15 mm stretched linearly was used. The substrate temperature was measured by measuring the substrate holder with an Alumel-Chromel thermocouple.
核生成密度を増加させるために、ワークであるメカニカルシール用摺動材料（リング）に傷つけ前処理を行った。傷つけ前処理としては、ダイヤモンド被膜が形成されるワークの両端面に、ダイヤモンドペースト（ダイヤモンド粒径：１乃至９μm）でスクラッチ処理を施し、その後、ワークをエタノール中で数分間超音波洗浄した。 In order to increase the nucleation density, the mechanical seal sliding material (ring) as a workpiece was damaged and pretreated. As a pretreatment for scratching, the both ends of the workpiece on which the diamond film is formed were scratched with diamond paste (diamond particle size: 1 to 9 μm), and then the workpiece was ultrasonically cleaned in ethanol for several minutes.
ダイヤモンドの成長条件は、図９の表に示す条件で行った。高純度水素にメタンを混合した原料ガスを、フィラメント線の上方より熱フィラメントCVD装置に導入した。各々のガス流量は流量計で調節し，装置内の圧力はピラニー真空計および隔膜真空計により測定した。また、フィラメントの温度は放射温度計で測定した。 The diamond growth conditions were as shown in the table of FIG. A source gas in which methane is mixed with high purity hydrogen was introduced into the hot filament CVD apparatus from above the filament wire. Each gas flow rate was adjusted with a flow meter, and the pressure in the apparatus was measured with a Pirani vacuum gauge and a diaphragm vacuum gauge. The filament temperature was measured with a radiation thermometer.
このようにして熱フィラメントＣＶＤ法で作製した多結晶ダイヤモンド被膜層を、走査型電子顕微鏡（ＳＥＭ）およびX線回折で評価した。作製した多結晶ダイヤモンド膜の表面をＳＥＭで観察した結果およびＸ線回折で測定した結果を、それぞれ図１０及び図１１に示す。ＳＥＭ観察結果から典型的な多結晶ダイヤモンドの表面性状である自形が明確に認められた。さらに、図１１のグラフから、作製した膜は、ダイヤモンド結晶が（１１１）面に優先配向した膜であることが認められる。 The polycrystalline diamond coating layer thus produced by the hot filament CVD method was evaluated by a scanning electron microscope (SEM) and X-ray diffraction. The result of observing the surface of the produced polycrystalline diamond film with SEM and the result of measuring with X-ray diffraction are shown in FIGS. 10 and 11, respectively. From the SEM observation result, the self-form which is the surface property of typical polycrystalline diamond was clearly recognized. Furthermore, it can be seen from the graph of FIG. 11 that the produced film is a film in which diamond crystals are preferentially oriented in the (111) plane.
次に、本発明の方法に従った第１の共摺りを行う。成膜が終わった一方のリングを、冷却液循環用ジャケットを有する下側部品に取付け、この下側部品を、稼動軸が３軸以上あるＮＣ機械（Numerical Control Machining数値制御）の部品固定治具（例えば旋盤などに使われる３爪以上チャックが望ましい）に取付ける。一方、成膜が終わった他方のリングを、スプリングによる従動機能と回転工具への連結機構を有する上部部品に取付け、上部部品を回転機械の回転軸に取付ける。 Next, the first co-grinding according to the method of the present invention is performed. One ring after film formation is attached to the lower part that has a jacket for circulating coolant, and this lower part is attached to the NC machine (Numerical Control Machining numerical control) NC fixture with three or more operating axes. (For example, a chuck with 3 or more pawls used for a lathe is desirable). On the other hand, the other ring after film formation is attached to an upper part having a follower function by a spring and a connecting mechanism to a rotary tool, and the upper part is attached to a rotating shaft of a rotating machine.
回転機械を、毎分１５００回転で回転させながら一方のリングと他方のリングとを整列させた状態で、一方のリングのダイヤモンド被膜と他方のリングのダイヤモンド被膜とを接触させる。接触後、摺動面に０．０１乃至０．３ＭＰａの面圧を加える。 The diamond coating on one ring and the diamond coating on the other ring are brought into contact with each other in a state where the one ring and the other ring are aligned while rotating the rotating machine at 1500 revolutions per minute. After the contact, a surface pressure of 0.01 to 0.3 MPa is applied to the sliding surface.
この状態で、上側部品の回転軸を中心として下側部品を公転させる偏心運動を行う。このとき、偏心量をリング（メカニカルシール用摺動材質）の環状摺動面の幅の５乃至３０％に設定し、偏心移動速度を１００ｍｍ/ｍｉｎに設定する。この条件で、約３分にわたり、第１の共摺りを実施する。 In this state, an eccentric motion for revolving the lower part around the rotation axis of the upper part is performed. At this time, the amount of eccentricity is set to 5 to 30% of the width of the annular sliding surface of the ring (sliding material for mechanical seal), and the eccentric moving speed is set to 100 mm / min. Under this condition, the first co-sliding is performed for about 3 minutes.
第１の共摺りが終わった時点での各リングの仕上り状態を、各流体の圧力０．２ＭＰａＧ時の漏れとともに図１２の表に示す。平面度に大幅な改善が見られるが、これは異常粒成長したダイヤモンドが除去されたことによるものである。これに伴い、面粗さＲａは改善されている。 The finished state of each ring at the time when the first co-sliding is finished is shown in the table of FIG. 12 together with the leakage of each fluid at a pressure of 0.2 MPaG. There is a significant improvement in flatness due to the removal of abnormally grown diamond. Accordingly, the surface roughness Ra is improved.
実施例の組合せ例２以外の０．２ＭＰａＧにおける漏れ量（液体）は、許容値以内となり合格値である。
しかしながら、０．２ＭＰａＧでもっとも漏れ量の少ない組合せ例Ｎｏ.１を用いて流体圧力を１ＭＰａＧまで変化させた漏れ量試験の結果を示す図１３から明らかなように、組合せ例Ｎｏ.１においては、液体は０．４ＭＰａＧで、気体は０．６ＭＰａＧで、漏れ量が許容値（この場合、３ｍＬ／ｈ）以上となる。したがって、いずれの組み合わせ例においても、第１段階の共擦り終了時点での仕上がり具合は実用的でないことが分かる。The leakage amount (liquid) at 0.2 MPaG other than the combination example 2 of the embodiment is within an allowable value and is a pass value.
However, as is apparent from FIG. 13 showing the result of the leakage amount test in which the fluid pressure was changed to 1 MPaG using the combination example No. 1 having the smallest leakage amount at 0.2 MPaG, in the combination example No. 1, The liquid is 0.4 MPaG, the gas is 0.6 MPaG, and the leakage amount is equal to or greater than an allowable value (3 mL / h in this case). Therefore, in any combination example, it can be seen that the finished condition at the end of the first stage of rubbing is not practical.
第１の共摺りが終わった一方のリングおよび他方のリングは、第２の共摺りとしてメカニカルシールと同様の形態に組み立てられ、モータとメカニカルシールの間にトルク計が設けられた回転機器に取付けられる。 One ring and the other ring that have finished the first co-sliding are assembled in the same form as the mechanical seal as the second co-sliding, and are attached to a rotating device provided with a torque meter between the motor and the mechanical seal. It is done.
第１の共摺りが終わった一方のリングおよび他方のリングのダイヤモンド被膜面を接触させ、０．４５ＭＰａの面圧をかけながら、リング外周速度が５００ｍ／ｍｉｎ以上になるように、一方のリングまたは他方のリングのうち一つを自転（回転）させる。この際、２０乃至２５℃に設定された水を、ダイヤモンド被膜面間に供給する。 One ring or the ring-coated outer ring speed is set to 500 m / min or more while applying the surface pressure of 0.45 MPa while bringing the diamond coating surface of one ring and the other ring that have finished the first co-grinding into contact. Rotate (rotate) one of the other rings. At this time, water set at 20 to 25 ° C. is supplied between the diamond coating surfaces.
水の圧力０．４５乃至５ＭＰａG以内において、トルク計測定値に異常値、例えば急激な変動がみられたら第２の共摺りを終了する。 Within the water pressure of 0.45 to 5 MPaG, if the torque meter measurement value shows an abnormal value, for example, a sudden change, the second co-sliding is terminated.
異常値が検出されたタイミングで水の圧力を０ＭＰａＧにし、回転を停止し、第２の共摺りを終了する。 At the timing when the abnormal value is detected, the water pressure is set to 0 MPaG, the rotation is stopped, and the second co-sliding is finished.
第２の共摺りが終わった時点での各リングの仕上りを、各流体の圧力０．２ＭＰａＧの時の漏れ量、トルクの異常値が検出された圧力と合わせて図１４の表に示す。 The finish of each ring at the time when the second co-sliding is finished is shown in the table of FIG. 14 together with the leakage amount and the pressure at which the abnormal value of the torque is detected when the pressure of each fluid is 0.2 MPaG.
更に、組合せ例Ｎｏ.１の流体圧力を１ＭＰａＧまで流体漏れ量の測定結果を図１５に示す。
平面度は多少悪化している傾向であるが、面粗さＲａはすべてにおいて改善が見られる。これは結晶成長した多結晶ダイヤモンドが研磨され、平滑な面が増加した事を示す。Furthermore, the measurement result of the fluid leakage amount is shown in FIG. 15 until the fluid pressure of the combination example No. 1 is 1 MPaG.
Although the flatness tends to be somewhat deteriorated, the surface roughness Ra is improved in all cases. This indicates that the crystal-grown polycrystalline diamond was polished and the smooth surface increased.
図１６は、上記実施例のメカニカルシール製造方法によってメカニカルシールを製造する各工程終了時の摺動面の性能を示すグラフである。具体的には、複数個のリングを上記製造方法に従って加工していく各段階（第１の共摺り前、第１の共摺り後および第２の共摺り後）での、各リングの摺動面の面粗さＲａと０．５ＭＰａ静圧時の水の漏れ量との関係を示している。
第１の共摺り前を菱形、第１の共摺り後を三角、第２の共摺り後を四角でプロットしている。FIG. 16 is a graph showing the performance of the sliding surface at the end of each step of manufacturing a mechanical seal by the mechanical seal manufacturing method of the above embodiment. Specifically, sliding of each ring at each stage (before the first co-sliding, after the first co-sliding and after the second co-sliding) in which a plurality of rings are processed according to the above manufacturing method. The relationship between the surface roughness Ra and the amount of water leakage at 0.5 MPa static pressure is shown.
A rhombus is plotted before the first co-sliding, a triangle is plotted after the first co-sliding, and a square is plotted after the second co-sliding.
図１６によれば、工程が進むに従って、摺動面の面粗さＲａ（μｍ）が小さくなって漏れ量が減少すること、摺動面の面粗さＲａ（μｍ）が小さい方が、漏れ量も少ないことが解る。 According to FIG. 16, as the process proceeds, the surface roughness Ra (μm) of the sliding surface decreases and the amount of leakage decreases, and the surface roughness Ra (μm) of the sliding surface decreases. It can be seen that the amount is small.
図１７は、上記実施例のメカニカルシール製造方法によってメカニカルシールを製造する各工程終了時の摺動面の性能を示す他のグラフである。具体的には、複数個のリングを上記製造方法に従って加工していく各段階（第１の共摺り前、第１の共摺り後および第２の共摺り後）での、各リングの摺動面の平面度（μｍ）と０．５ＭＰａ静圧時の漏れ量との関係を示している。
第１の共摺り前を菱形、第１の共摺り後を三角、第２の共摺り後を四角でプロットしている。FIG. 17 is another graph showing the performance of the sliding surface at the end of each step of manufacturing a mechanical seal by the mechanical seal manufacturing method of the above embodiment. Specifically, sliding of each ring at each stage (before the first co-sliding, after the first co-sliding and after the second co-sliding) in which a plurality of rings are processed according to the above manufacturing method. The relationship between the flatness (μm) of the surface and the amount of leakage at 0.5 MPa static pressure is shown.
A rhombus is plotted before the first co-sliding, a triangle is plotted after the first co-sliding, and a square is plotted after the second co-sliding.
図１７によれば、工程が進むに従って、摺動面の平面度（μｍ）の精度が高くなって漏れ量が減少すること、摺動面の平面度（μｍ）の精度が高い方が、漏れ量が少ないことがわかる。 According to FIG. 17, as the process proceeds, the accuracy of the flatness (μm) of the sliding surface increases and the amount of leakage decreases, and the higher the accuracy of the flatness (μm) of the sliding surface, You can see that the amount is small.
１：メカニカルシール
２：第１の基材
４：第２の基材
６：第１の環状摺動面
８：第２の環状摺動面1: Mechanical seal 2: First base material 4: Second base material 6: First annular sliding surface 8: Second annular sliding surface
Claims (4)
多結晶ダイヤモンド被膜が堆積された第１および第２の環状摺動面を、無潤滑環境下で、偏心運動させながら相対回転させる第１共摺り工程と、
前記第１共摺り工程が終了した第１および第２の環状摺動面を、液体潤滑環境下で相対回転させる第２共摺り工程と、を備えている、
ことを特徴とするメカニカルシールの製造方法。 A method of manufacturing a mechanical seal having a pair of annular sliding surfaces coated with polycrystalline diamond,
A first co-sliding step in which the first and second annular sliding surfaces on which the polycrystalline diamond film is deposited are rotated relative to each other while being eccentrically moved in an unlubricated environment;
A second co-sliding step of relatively rotating the first and second annular sliding surfaces after the first co-sliding step in a liquid lubrication environment,
A method of manufacturing a mechanical seal, characterized by that.
請求項１に記載のメカニカルシールの製造方法。 The amount of eccentricity in the first co-sliding step is 5 to 50% of the width of the annular sliding surface.
The method for manufacturing a mechanical seal according to claim 1 .
請求項１または２に記載のメカニカルシールの製造方法。 The surface pressure between the first and second annular sliding surfaces in the first co-sliding step is 0.001 to 0.4 MPa.
The manufacturing method of the mechanical seal of Claim 1 or 2 .
請求項１乃至３のいずれか１項に記載のメカニカルシールの製造方法。 The surface pressure between the first and second annular sliding surfaces in the second co-sliding step is 0.1 to 5 MPa.
The manufacturing method of the mechanical seal of any one of Claims 1 thru | or 3 .
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| JP2013021929 | 2013-02-07 | ||
| JP2013021929 | 2013-02-07 | ||
| PCT/JP2014/052958 WO2014123233A1 (en) | 2013-02-07 | 2014-02-07 | Mechanical seal and manufacturing method thereof |
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| JP2001240968A (en) * | 2000-02-29 | 2001-09-04 | Sumitomo Electric Ind Ltd | Sliding part and its manufacturing method |
| JP4034560B2 (en) * | 2001-12-14 | 2008-01-16 | 株式会社ディスコ | Polishing method of semiconductor wafer |
| JP4205910B2 (en) * | 2002-04-02 | 2009-01-07 | イーグル工業株式会社 | Sliding parts |
| JP4638181B2 (en) * | 2004-06-28 | 2011-02-23 | 京セラ株式会社 | Sliding member, disc valve and mixing plug using the same |
| JP4959275B2 (en) * | 2006-10-02 | 2012-06-20 | キヤノンマシナリー株式会社 | Sliding surface structure |
| US20100061676A1 (en) * | 2007-04-20 | 2010-03-11 | Ebara Corporation | bearing system or a sealing system using a carbon based sliding member |
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