JP6375387B2 - 真空処理システム、及び処理システムを取り付けるための方法 - Google Patents
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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Description
Claims (15)
- フレキシブル基板(160)のための真空処理システム(100、200、400)であって、
前記フレキシブル基板を供給するための供給ロール及び前記フレキシブル基板(160)を収めるための巻き取りロールのうちの1つを収容するように適合された第1のチャンバ(110、310、410)、
前記フレキシブル基板を供給するための前記供給ロール及び前記フレキシブル基板(160)を収めるための前記巻き取りロールのうちの1つを収容するように適合された第2のチャンバ(120、320、420)、
前記第1のチャンバ(110、310、410)と前記第2のチャンバ(120、320、420)の間に位置し、かつ前記第1のチャンバ及び前記第2のチャンバから分離した、メンテナンスゾーン(130、330、430)、
前記フレキシブル基板上に材料を堆積するための第1の処理チャンバ(140、340、440)であって、前記第2のチャンバ(120、320、420)が、前記メンテナンスゾーン(130、330、430)と前記第1の処理チャンバ(140、340、440)の間に設けられる、第1の処理チャンバ(140、340、440)を備え、
前記メンテナンスゾーン(130、330、430)が、前記第1のチャンバ(110、310、410)及び前記第2のチャンバ(120、320、420)のうちの少なくとも1つへのメンテナンスアクセス、又は前記第1のチャンバ(110、310、410)及び前記第2のチャンバ(120、320、420)のうちの少なくとも1つのメンテナンスアクセスを可能にする、真空処理システム(100、200、400)。 - 前記処理システム(100、200、400)が、前記メンテナンスゾーン(130、330、430)を介して、前記第1及び/又は前記第2のチャンバ(120、320、420)へのアクセス、前記第1のチャンバ(110、310、410)及び/又は前記第2のチャンバ(120、320、420)を制御するための制御オプション、制御要素、並びに前記第1のチャンバ(110、310、410)及び/又は前記第2のチャンバ(120、320、420)の点検のうちの少なくとも1つを提供するように適合される、請求項1に記載の真空処理システム。
- 前記第1のチャンバ(110、310、410)及び前記第2のチャンバ(120、320、420)のうちの少なくとも1つが、それぞれ前記第1のチャンバ(110、310、410)の径方向から及び前記第2のチャンバ(120、320、420)の径方向からアクセス可能であるように、前記メンテナンスゾーン(130、330、430)が設けられる、請求項1又は2に記載の真空処理システム。
- 前記真空処理システム(100、200、400)が、前記基板を供給し、前記第1のチャンバ(110、310、410)及び前記第2のチャンバ(120、320、420)のうちの少なくとも1つから前記フレキシブル基板を取り除くためのローディング及びアンローディングシステムを更に備える、請求項1から3のいずれか一項に記載の真空処理システム。
- 第2の処理チャンバ(240、350、450)を更に備え、前記第2の処理チャンバは、前記第1のチャンバ(110、310、410)が前記メンテナンスゾーン(130、330、430)と前記第2の処理チャンバ(240、350、450)の間に設けられるように位置付けされる、請求項1から4のいずれか一項に記載の真空処理システム。
- 前記第1の処理チャンバ(140、340、440)、前記第2の処理チャンバ(240、350、450)、前記第1のチャンバ(110、310、410)、及び前記第2のチャンバ(120、320、420)が別々のチャンバである、請求項1から5のいずれか一項に記載の真空処理システム。
- 前記第1の処理チャンバ(140、340、440)、前記第2の処理チャンバ(240、350、450)、前記第1のチャンバ(110、310、410)、及び前記第2のチャンバ(120、320、420)が、真空処理のために適合され、且つ個別に排気可能である、請求項1から6のいずれか一項に記載の真空処理システム。
- 前記第1の処理チャンバ(140、340、440)を前記第1のチャンバ(110、310、410)又は前記第2の処理チャンバ(240、350、450)に接続する通路(150)を更に備え、前記通路(150)が、前記メンテナンスゾーン(130、330、430)の上方又は下方に設けられ、前記通路、前記第1のチャンバ(110、310、410)、及び前記第2のチャンバ(120、320、420)が、前記メンテナンスゾーン(130、330、430)を取り囲む、請求項1から7のいずれか一項に記載の真空処理システム。
- 前記通路(150)が、前記メンテナンスゾーンの上方で延在する上側蓋又は前記メンテナンスゾーン(130、330、430)の下方で延在する底部側トンネルによって設けられる、請求項8に記載の真空処理システム。
- 前記第1のチャンバ(410)及び前記第2のチャンバ(420)の延長部分(411、421)によって形成されている通路を更に備える、請求項1から7のいずれか一項に記載の真空処理システム。
- 前記第1の処理チャンバ(140、340、440)及び前記第2の処理チャンバ(240、350、450)のうちの少なくとも1つが、回転軸(143)及び1つ又は複数の堆積源(141)を有する処理ドラムを備え、前記堆積源が、それぞれの処理チャンバの水平中央線の高さ又はその下方に、前記処理ドラムの前記回転軸(143)の高さ又はその下方に配置される、請求項1から10のいずれか一項に記載の真空処理システム。
- 前記第1の処理チャンバ(140、340、440)及び前記第2の処理チャンバ(240、350、450)のうちの少なくとも1つが、1つ又は複数の堆積源を設ける第1の部分(146、346)、及び前記真空処理システムの通路(150)との連通を可能にする第2の部分(147、347)を備え、前記第1の部分(146、346)及び前記第2の部分(147、347)が、垂直方向に対して傾斜した線に沿って接続される、請求項1から11のいずれか一項に記載の真空処理システム。
- 前記第1の処理チャンバ(140、340、440)及び前記第2の処理チャンバ(240、350、450)のうちの少なくとも1つが、処理ドラムを備え、前記処理ドラムの周りのフレキシブル基板の巻き付け角度が、処理中に180度未満である、請求項1から12のいずれか一項に記載の真空処理システム。
- 真空処理システム(100、200、400)を取り付けるための方法であって、
請求項1から4及び6から12のいずれか一項に記載の真空処理システム(100、200、400)を設けることと、
第2の処理チャンバ(240、350、450)を前記真空処理システムに取り付けることであって、前記真空処理システムの第1のチャンバ(110、310、410)が、前記第2の処理チャンバ(240、350、450)とメンテナンスゾーン(130、330、430)の間に設けられる、取り付けることと
を含む方法。 - 通路(150)によって前記第1の処理チャンバ(140、340、440)と前記第2の処理チャンバ(240、350、450)を接続することを更に含み、前記通路(150)が、前記メンテナンスゾーン(130、330、430)の上方で延在する上側蓋又は前記メンテナンスゾーン(130、330、430)の下方で延在する底部側トンネルによって設けられる、請求項14に記載の方法。
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US20210087690A1 (en) * | 2018-03-30 | 2021-03-25 | Jfe Steel Corporation | Method for producing grain-oriented electrical sheet and continuous film-forming device |
US20220186360A1 (en) * | 2019-03-05 | 2022-06-16 | Xefco Pty Ltd | Improved vapour deposition system, method and moisture control device |
EP4088826A4 (en) * | 2020-01-06 | 2023-07-05 | Nihon Spindle Manufacturing Co., Ltd. | COATING DEVICE, SEPARATION ELEMENT AND COATING PROCESS |
WO2021185444A1 (en) * | 2020-03-18 | 2021-09-23 | Applied Materials, Inc. | Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system |
KR20230018518A (ko) * | 2020-06-04 | 2023-02-07 | 어플라이드 머티어리얼스, 인코포레이티드 | 진공 챔버에서 기판을 코팅하기 위한 기상 증착 장치 및 방법 |
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JP2024514679A (ja) * | 2021-04-21 | 2024-04-02 | アプライド マテリアルズ インコーポレイテッド | 材料堆積装置、基板上に材料を堆積する方法、および材料堆積システム |
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JP2012136724A (ja) * | 2010-12-24 | 2012-07-19 | Kobe Steel Ltd | 巻取り式連続成膜装置 |
JP2013196848A (ja) | 2012-03-16 | 2013-09-30 | Nitto Denko Corp | 有機el素子の製造方法及び製造装置 |
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2014
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- 2014-04-02 JP JP2016559546A patent/JP6375387B2/ja active Active
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TW201606110A (zh) | 2016-02-16 |
JP2017509797A (ja) | 2017-04-06 |
US10648072B2 (en) | 2020-05-12 |
WO2015149849A1 (en) | 2015-10-08 |
CN106164330B (zh) | 2021-01-26 |
US20170152593A1 (en) | 2017-06-01 |
EP3126541A1 (en) | 2017-02-08 |
CN106164330A (zh) | 2016-11-23 |
KR102196407B1 (ko) | 2020-12-29 |
TWI727921B (zh) | 2021-05-21 |
KR20160142363A (ko) | 2016-12-12 |
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