JP6340212B2 - 樹脂組成物、先供給型半導体封止剤、半導体封止用フィルムおよび半導体装置 - Google Patents
樹脂組成物、先供給型半導体封止剤、半導体封止用フィルムおよび半導体装置 Download PDFInfo
- Publication number
- JP6340212B2 JP6340212B2 JP2014041988A JP2014041988A JP6340212B2 JP 6340212 B2 JP6340212 B2 JP 6340212B2 JP 2014041988 A JP2014041988 A JP 2014041988A JP 2014041988 A JP2014041988 A JP 2014041988A JP 6340212 B2 JP6340212 B2 JP 6340212B2
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- formula
- semiconductor
- substrate
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims description 51
- 239000011342 resin composition Substances 0.000 title claims description 44
- 238000007789 sealing Methods 0.000 title claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 39
- 239000003795 chemical substances by application Substances 0.000 claims description 14
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 9
- 150000001451 organic peroxides Chemical class 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000000945 filler Substances 0.000 claims description 4
- 239000005062 Polybutadiene Substances 0.000 claims description 3
- 230000001588 bifunctional effect Effects 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 229920002857 polybutadiene Polymers 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000008393 encapsulating agent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 37
- 238000000034 method Methods 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 16
- 230000002950 deficient Effects 0.000 description 14
- 238000005259 measurement Methods 0.000 description 10
- 239000010949 copper Substances 0.000 description 8
- 229910000679 solder Inorganic materials 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- -1 amino, vinyl Chemical group 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000032798 delamination Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 2
- 239000006254 rheological additive Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical class O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- VIYWVRIBDZTTMH-UHFFFAOYSA-N 2-[4-[2-[4-[2-(2-methylprop-2-enoyloxy)ethoxy]phenyl]propan-2-yl]phenoxy]ethyl 2-methylprop-2-enoate Chemical compound C1=CC(OCCOC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCCOC(=O)C(C)=C)C=C1 VIYWVRIBDZTTMH-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical class C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000004643 cyanate ester Chemical class 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- OTRIMLCPYJAPPD-UHFFFAOYSA-N methanol prop-2-enoic acid Chemical compound OC.OC.OC(=O)C=C.OC(=O)C=C OTRIMLCPYJAPPD-UHFFFAOYSA-N 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
Landscapes
- Graft Or Block Polymers (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Wire Bonding (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
Description
表1および2は、実施例1〜8および比較例1〜7の樹脂組成物の組成、および後述する評価の結果を示す。表1および2において、樹脂組成物の組成は質量部で表されている。
実施例1〜8および比較例1〜7に対し、実装試験を行った。試験に用いた試料は、所定の形状の半導体チップを所定の形状の基板に実装することにより作製した。基板としては、電極材料としてCu用い、Cu電極をNiでめっきし、さらにAuでめっきしたもの(以下Ni/Au基板という)、およびCuを用い表面をOSP(Organic Solderability Preservative)処理したもの(以下Cu/OSP基板という)の2種類を採用した。図2は、試料の作成に用いた基板および半導体チップの概形を示している。実装には、パナソニックファクトリーソリューションズ株式会社製のフリップチップボンダーFCB3を用いた。実装の条件は以下のとおりである。まず、基板を125℃で30分、ベークした。ベーク後、基板をステージ上に載せ、ディスペンサーで基板上に樹脂組成物を塗布した。樹脂組成物の塗布後、基板を温度70℃のステージに移し、半導体チップを基板に載せると同時に図3の温度プロファイルに従って樹脂組成物の硬化および半導体チップと基板の接合を行った。荷重は15Nであった。接合後、後硬化として、165℃で60分熱処理した。
実施例1〜8および比較例1〜7に対し、吸湿リフロー試験を行った。実装性の評価に用いた試料のうち5つ(半導体チップを研磨していないもの)の試料を、温度30℃、相対湿度60%の恒温恒湿槽に入れ、192時間、吸湿させた。吸湿後、最高温度260℃のリフロー炉に、試料を3回繰り返して通過させた後で、超音波画像観察を行った。超音波画像観察においてデラミネーション(樹脂組成物の剥がれ)が起きていたものを不良品と判断した。また、超音波画像観察に加え、抵抗値測定を行った。抵抗値測定においては、実装性の評価における抵抗値測定と同様、28〜32Ωの抵抗値を示したものを良品と判断し、この範囲外の抵抗値を示したものを不良品と判断した。
実施例1〜8および比較例1〜7に対し、ヒートサイクル試験を行った。吸湿リフロー試験に使用した試料を、気槽ヒートサイクル試験機において試験した。試験条件は、高温125℃、低温−55℃に各30分さらすものであった。500サイクル毎に試料を取り出し、超音波画像観察および抵抗値測定を行った。超音波画像観察においてデラミネーションが起きていたものを不良品と判断した。また、抵抗値測定においては、28〜32Ωの抵抗値を示したものを良品と判断し、この範囲外の抵抗値を示したものを不良品と判断した。
Claims (6)
- (A)2官能以上の(メタ)アクリレートと、
(B)無水マレイン酸変性したポリブタジエンと、
(C)有機過酸化物と、
(D)シリカフィラーと、
(E)シランカップリング剤と、
(F)フラックス剤として式(1)の化合物f1および式(2)の化合物f2と
前記(A)〜(F)の合計に対し前記(F)が0.2〜2.2質量%含まれ、
前記f1と前記f2とのモル比が、1:0.3〜1:3.1である
ことを特徴とする樹脂組成物。 - 前記(E)が、式(3)および式(4)の化合物の少なくとも1つを含む
- 前記(A)が、式(5)および式(6)の化合物の少なくとも1つを含む(ただし、m+n=2.3〜4.0であり、R1およびR2は、それぞれ水素原子またはメチル基である)
- 請求項1ないし3のいずれか一項に記載の樹脂組成物を含む先供給型半導体封止剤。
- 請求項1ないし3のいずれか一項に記載の樹脂組成物を含む半導体封止用フィルム。
- 請求項4に記載の先供給型半導体封止剤または請求項5に記載の半導体封止用フィルムを用いて封止された半導体素子を有する半導体装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014041988A JP6340212B2 (ja) | 2014-03-04 | 2014-03-04 | 樹脂組成物、先供給型半導体封止剤、半導体封止用フィルムおよび半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014041988A JP6340212B2 (ja) | 2014-03-04 | 2014-03-04 | 樹脂組成物、先供給型半導体封止剤、半導体封止用フィルムおよび半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015168691A JP2015168691A (ja) | 2015-09-28 |
JP6340212B2 true JP6340212B2 (ja) | 2018-06-06 |
Family
ID=54201745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014041988A Active JP6340212B2 (ja) | 2014-03-04 | 2014-03-04 | 樹脂組成物、先供給型半導体封止剤、半導体封止用フィルムおよび半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6340212B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102319292B1 (ko) * | 2014-10-10 | 2021-11-01 | 나믹스 가부시끼가이샤 | 열경화성 수지 조성물 및 그의 제조 방법 |
JP6656050B2 (ja) * | 2016-03-30 | 2020-03-04 | ナミックス株式会社 | フィルム状半導体封止剤 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10176036A (ja) * | 1996-12-19 | 1998-06-30 | Shin Etsu Chem Co Ltd | エポキシ樹脂組成物及び半導体装置 |
JP2002363218A (ja) * | 2001-06-07 | 2002-12-18 | Hitachi Chem Co Ltd | 樹脂ペースト組成物及びこれを用いた半導体装置 |
JP5387874B2 (ja) * | 2007-10-17 | 2014-01-15 | 日立化成株式会社 | 液状封止樹脂組成物を用いた半導体装置の製造方法 |
JP5396914B2 (ja) * | 2009-02-27 | 2014-01-22 | 住友ベークライト株式会社 | 樹脂組成物、および樹脂組成物を用いて作製した半導体装置 |
JP5880450B2 (ja) * | 2011-01-31 | 2016-03-09 | 住友ベークライト株式会社 | 樹脂組成物および半導体装置 |
JP2012236873A (ja) * | 2011-05-10 | 2012-12-06 | Hitachi Chemical Co Ltd | 樹脂ペースト組成物及び半導体装置 |
WO2014010258A1 (ja) * | 2012-07-13 | 2014-01-16 | パナソニック株式会社 | 半導体封止用アクリル樹脂組成物とそれを用いた半導体装置およびその製造方法 |
-
2014
- 2014-03-04 JP JP2014041988A patent/JP6340212B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2015168691A (ja) | 2015-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5598343B2 (ja) | 半導体封止用液状エポキシ樹脂組成物及び半導体装置 | |
JP6200732B2 (ja) | 樹脂組成物、先供給型半導体封止剤および半導体装置 | |
JP5958529B2 (ja) | 半導体装置及びその製造方法 | |
TWI674633B (zh) | 倒裝晶片安裝體的製造方法、倒裝晶片安裝體及先供給型底部填充劑用樹脂組成物 | |
JP5915727B2 (ja) | 半導体装置及びその製造方法 | |
JP5449603B1 (ja) | 先供給型半導体封止剤および半導体装置 | |
JP6476517B2 (ja) | フィルム状接着剤、それを用いた半導体装置 | |
JP6336788B2 (ja) | 樹脂組成物、先供給型半導体封止剤、半導体封止用フィルム、および半導体装置 | |
JP6340212B2 (ja) | 樹脂組成物、先供給型半導体封止剤、半導体封止用フィルムおよび半導体装置 | |
JP2007162001A (ja) | 液状エポキシ樹脂組成物 | |
JP2015078303A (ja) | 樹脂組成物、先供給型半導体封止剤および半導体装置 | |
TW202410369A (zh) | 半導體用膜狀接著劑、半導體裝置的製造方法及半導體裝置 | |
JP6267980B2 (ja) | 樹脂組成物、先供給型半導体封止剤および半導体装置 | |
JP5411774B2 (ja) | 先供給型液状半導体封止樹脂組成物 | |
JP6207348B2 (ja) | 樹脂組成物、先供給型半導体封止剤および半導体装置 | |
JP6799934B2 (ja) | 樹脂組成物、および半導体装置 | |
JP6569225B2 (ja) | 半導体用接着剤、半導体装置の製造方法及び半導体装置 | |
JP6844685B2 (ja) | 先供給型アンダーフィル材及びその硬化物、並びに電子部品装置及びその製造方法 | |
JP7351437B2 (ja) | ダイアタッチ材用導電性樹脂組成物、高熱伝導性材料および半導体装置 | |
JP6126834B2 (ja) | 先供給型半導体封止用液状樹脂組成物および半導体装置 | |
JP6573882B2 (ja) | カプセル化用のデュアルサイド補強フラックス | |
JP2013253183A (ja) | 先供給型液状半導体封止樹脂組成物 | |
JP7093998B2 (ja) | ディップ用先供給型半導体封止材、それを用いた半導体装置 | |
JP5723665B2 (ja) | 先供給型液状半導体封止樹脂組成物 | |
JP6482016B2 (ja) | 封止材組成物、それを用いた半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170206 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20171127 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171205 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180122 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180424 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180514 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6340212 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |