JP6322197B2 - ナノワイヤサイズの光電構造及びその選択された部分を改質させる方法。 - Google Patents
ナノワイヤサイズの光電構造及びその選択された部分を改質させる方法。 Download PDFInfo
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
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Description
<実施例>
実施例1.斜方成膜による誘電体絶縁層の形成
絶縁層を設けるために、ナノワイヤLED構造をAl2O3で選択的に被覆した。電子ビーム蒸着物理気相成長を使用し、角度αを28°に設定した。ナノワイヤの側壁で〜100nmの厚さを実現するように、成膜を制御した。図7Aに示されるように、半隔離されたナノワイヤ、すなわちごく近接する隣接ナノワイヤを持たないナノワイヤは、側壁に沿ってAl2O3成膜を示した。p面における成膜は102.3nmと測定された。図7Bは、密な構造、すなわち他のナノワイヤにより取り囲まれた内側ナノワイヤにおける成膜を示す。この場合、ナノワイヤの先端部にAl2O3が成膜され、ナノワイヤの側壁の下半分にはAl2O3の成膜は見られなかった。
実施例2.側壁被覆に対する成膜角度の鋭角度の影響
角度αを15°に設定することを除き、実施例1と同様の条件を使用した。図8に示されるように、密な構造(内側ナノワイヤ)では、Al2O3被膜は、先端部の角部から下方へ200nm未満の長さだけ延設され、これはナノワイヤ側壁の半分より相当に上の位置である。
実施例3.pGaNへの2H+注入及び導電率に対する効果
サファイア基板の上面にp型GaN膜を備える平坦なウェハの2つの異なる場所にITOコンタクトを形成し、コンタクトに電圧を印加して、電流を測定した。ITOコンタクトの前にpGaNにH2 +を注入した同様のウェハを形成し、1つのケースでは、注入条件を2.5e14/cm2の量で30keVの2H+とし、別のケースでは、注入条件を5e14/cm2の量で120keVの2H+とした。2H+を注入したウェハにおいて、pGaNの導電率は、注入なしの対照用ウェハと比較して6桁を超える低下を示した。
Claims (15)
- 平坦な支持体の上のナノワイヤのアレイを備えるLED構造を物質によって処理する方法であって、物質源で前記物質を生成し、前記物質を線に沿って前記アレイまで移動させることを含み、
(i)前記物質がたどる前記線と前記支持体の平面とが成す角度は、前記支持体の中心から測定した場合に90°未満であり、且つ
(ii)前記物質は、前記物質により処理される前と比較して前記ナノワイヤの部分を非導電性にさせるか又は前記部分の導電率を低下させることが可能であることを特徴とする方法。 - 前記物質は絶縁体であり、前記ナノワイヤの前記部分を被覆することにより、前記部分を非導電性にさせるか又は前記部分の導電率を低下させるか、
前記物質はSiO2、Al2O3、SiN、TiO2、HfO2又はそれらの組み合わせ又は合金を含むか、
前記物質はSiO2、SiCOH、SiN又はTiO2を含むか、又は
前記物質はH+原子又はH2 +分子を含むことを特徴とする請求項1に記載の方法。 - 前記ナノワイヤの前記部分を非導電性にさせるか又は前記部分の導電率を低下させるために、前記物質は前記部分と反応することを特徴とする請求項1に記載の方法。
- 前記物質はHe+、N+、N2 +又はAr+を含むことを特徴とする請求項2に記載の方法。
- 前記角度は45°未満であることを特徴とする請求項1に記載の方法。
- 前記物質は、物理気相成長(PVD)により形成され且つ前記ナノワイヤまで移動されることを特徴とする請求項1に記載の方法。
- 前記ナノワイヤは先端部及び側壁を備え、前記アレイは縁部ナノワイヤ及び中央部ナノワイヤを備え、前記角度は、前記中央部ナノワイヤが前記先端部で非導電性にされ且つ前記側壁の全体ではなく一部に沿って非導電性にされるような角度であることを特徴とする請求項1に記載の方法。
- 前記方法は、Al2O3又は他の何らかの誘電体の成膜を含み、前記ナノワイヤの先端部におけるAl2O3の深さは50〜200nmの間であることを特徴とする請求項7に記載の方法。
- 前記ナノワイヤは、第1の導電型のナノワイヤコアと、第2の導電型のナノワイヤシェルとを備え、
動作中に光を発生する活性領域を構成するpn接合又はpin接合を形成するために、前記第1の導電型の半導体ナノワイヤコアは、前記第2の導電型の半導体シェルにより取り囲まれるか、又は、
前記支持体の層は反射層を更に備えることを特徴とする請求項1に記載の方法。 - n−GaNバッファ層及び非導電性基板層を備える支持体と、前記支持体上のナノワイヤのアレイとを備え、前記ナノワイヤがp−GaNシェルにより取り囲まれたn−GaNコアを備えるLED構造であって、
(i)前記n−GaNバッファ層と電気的に接触する金属コンタクトを備えるn電極領域と、
(ii)p電極領域と
を備え、前記p電極領域は、
(a)ナノワイヤの先端部及び第1グループのナノワイヤの垂直の側壁の第1の部分を含むが、前記第1グループのナノワイヤの前記垂直の側壁の第2の部分を含まない非導電層と、
(b)前記第1グループのナノワイヤの前記側壁の前記第2の部分と電気的に接触する導電層と、
(c)前記導電層と電気的に接触する金属コンタクトと
を備えることを特徴とするLED構造。 - n−GaNバッファ層及び非導電性基板層を備える支持体と、前記支持体上のナノワイヤのアレイとを備え、前記ナノワイヤがp−GaNシェルにより取り囲まれたn−GaNコアを備えるLED構造であって、
(i)前記n−GaNバッファ層と電気的に接触する金属コンタクトを備えるn電極領域と、
(ii)p電極領域と
を備え、前記p電極領域は、
(a)ナノワイヤの先端部及び第1グループのナノワイヤの側壁の第1の部分を含むが、前記第1グループのナノワイヤの前記側壁の第2の部分を含まない非導電層と、
(b)前記第1グループのナノワイヤの前記側壁の前記第2の部分と電気的に接触する導電層と、
(c)前記導電層と電気的に接触する金属コンタクトと
を備え、
前記非導電層は、第2グループのナノワイヤのすべての側壁を含み、前記第1グループのナノワイヤは前記ナノワイヤのアレイの内側にあり且つ前記第2グループのナノワイヤは前記ナノワイヤのアレイの外側縁部にあることを特徴とするLED構造。 - 前記非導電層は、前記先端部の最上部及び前記垂直の側壁の各部の絶縁材料層を含むことを特徴とする請求項10に記載のLED構造。
- 前記非導電層は、導電率を低下させるか又は零にするために改質されたp−GaNシェルの改質部分を含むことを特徴とする請求項10に記載のLED構造。
- 前記金属コンタクトは、Alの層、Tiの層及びAuの層を含むことを特徴とする請求項10に記載のLED構造。
- 前記Alの層は、前記n電極では前記n−GaNバッファ層と直接接触し、前記p電極では前記導電層と直接接触していることを特徴とする請求項14に記載のLED構造。
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