JP6219830B2 - 銀層の熱処理方法 - Google Patents
銀層の熱処理方法 Download PDFInfo
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- JP6219830B2 JP6219830B2 JP2014536314A JP2014536314A JP6219830B2 JP 6219830 B2 JP6219830 B2 JP 6219830B2 JP 2014536314 A JP2014536314 A JP 2014536314A JP 2014536314 A JP2014536314 A JP 2014536314A JP 6219830 B2 JP6219830 B2 JP 6219830B2
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- layer
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- heat treatment
- silver
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/816—Multilayers, e.g. transparent multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12896—Ag-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Electroluminescent Light Sources (AREA)
- Electroplating Methods And Accessories (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
− 下部発光デバイス、すなわち(半)透明の下部電極と反射性の上部電極を有するデバイス;
− 上部発光デバイス、すなわち(半)透明の上部電極と反射性の下部電極を有するデバイス;
− 上下発光デバイス、すなわち(半)透明の下部電極と(半)透明の上部電極の両方を有するデバイス。
積層体2:Si3N4/SnZnOx/ZnO/Ag/Ti/ZnO/SnZnOx/ZnO/Ag/Ti/ITO
積層体4:TiO2/ZnO/Ag/ZnO/(TiO2)/Si3N4/ZnSn
積層体5:(Si3N4)/TiO2/(NiCr)/Ag/NiCr/(ZnO)/SnO2
積層体6:SiNx/ZnO/Ag/NiCr/ZnO/Si3N4
積層体7:Si3N4/ZnO/Ag/Ti/ZnO/Si3N4/ZnO/Ag/Ti/ZnO/Si3N4
積層体8:Si3N4/ZnO/Ag/Ti/ZnO/Si3N4/ZnO/Ag/Ti//ZnO/Si3N4/ZnO/Ag/Ti/ZnO/Si3N4
− ΔAと表示され%で表現された光吸収の低下;これは絶対的変動である;
− ΔRと表示され%で表現されたシート抵抗の低下;ここでは、これは相対的変動である。
− ℃/sで表現された温度上昇速度V、
− ℃で表現された水平域温度T、
− tと表示され秒で表現された、水平域温度での水平域時間、
− ΔTと表示され%で表現された(絶対的表現での)光透過率の上昇、
− ΔRと表示され%で表現されたシート抵抗の低下;ここでは、これは相対的変動である。
本発明の実施態様としては、以下の態様を挙げることができる:
《態様1》
基材を含む材料を得るための方法であって、
前記基材は、少なくとも1つの面の少なくとも一部分が、少なくとも1つの銀層を含む薄い層の積層体でコーティングされており、
前記方法は、前記積層体を堆積させるステップと、その後の熱処理ステップとを含み、
前記熱処理を、0.1ミリ秒から100秒までの範囲内の照射時間で、少なくとも1つの非コヒーレント光源を用いて、前記積層体の表面の少なくとも一部分を照射することによって行い、こうして前記積層体のシート抵抗及び/又は放射率を、相対的に少なくとも5%低下させ、
前記銀層又は前記銀層のそれぞれが、前記処理の終了時点で、連続した状態を維持している、
方法。
《態様2》
前記熱処理を、少なくとも1cm、特に少なくとも5cmの長さの最短辺を有する前記積層体の表面の一部分を、同時に照射することによって行う、態様1の方法。
《態様3》
前記熱処理を、前記積層体の表面全体を同時に照射することにより行う、態様1又は2に記載の方法。
《態様4》
前記基材が、ガラス又はポリマー有機材料製である、態様1〜3のいずれか一項に記載の方法。
《態様5》
前記光源又は前記光源のそれぞれが、少なくとも1つの閃光ランプを含み、照射時間を0.1〜20ミリ秒、特に0.5〜5ミリ秒の範囲内にする、態様1〜4のいずれか一項に記載の方法。
《態様6》
前記光源又は前記光源のそれぞれが、少なくとも1つのハロゲン白熱ランプを含み、照射時間を0.1〜100秒、特に1〜30秒とする、態様1〜4のいずれか一項に記載の方法。
《態様7》
前記基材上へのコーティングの堆積を、スパッタリングにより行う、態様1〜6のいずれか一項に記載の方法。
《態様8》
薄層の前記積層体が、前記基材から出発して、少なくとも1つの第1の誘電体層を含む第1のコーティング、少なくとも1つの銀層、随意のオーバーブロッカー層、そして少なくとも1つの第2の層を含む第2のコーティングを含む、態様1〜7のいずれか一項に記載の方法。
《態様9》
態様1〜8のいずれか一項に記載の方法により得ることができる材料。
《態様10》
態様9に記載の少なくとも1つの材料を含む、グレージングユニット又はOLEDデバイス。
Claims (7)
- 基材を含む材料を得るための方法であって、
前記基材は、少なくとも1つの面の少なくとも一部分が、少なくとも1つの銀層を含む薄い層の積層体でコーティングされており、
前記方法は、前記積層体を堆積させるステップと、その後の熱処理ステップとを含み、
前記熱処理を、0.1秒から100秒までの範囲内の照射時間で、少なくとも1つの非コヒーレント光源を用いて、前記積層体の表面の少なくとも一部分を照射することによって行い、こうして前記積層体のシート抵抗及び/又は放射率を、相対的に少なくとも5%低下させ、前記非コヒーレント光源は、200nm〜3μmの範囲内の波長を有し、かつハロゲン白熱ランプから選択され
前記銀層又は前記銀層のそれぞれが、前記処理の終了時点で、連続した状態を維持している、
方法。 - 前記熱処理を、少なくとも1cmの長さの最短辺を有する前記積層体の表面の一部分を、同時に照射することによって行う、請求項1の方法。
- 前記熱処理を、前記積層体の表面全体を同時に照射することにより行う、請求項1に記載の方法。
- 前記基材が、ガラス又はポリマー有機材料製である、請求項1〜3のいずれか一項に記載の方法。
- 前記基材上へのコーティングの堆積を、スパッタリングにより行う、請求項1〜4のいずれか一項に記載の方法。
- 前記薄い層の積層体が、前記基材から出発して、少なくとも1つの第1の誘電体層を含む第1のコーティング、少なくとも1つの銀層、随意のオーバーブロッカー層、そして少なくとも1つの第2の誘電体層を含む第2のコーティングを含む、請求項1〜5のいずれか一項に記載の方法。
- 請求項6に記載の方法によって得られた少なくとも1つの材料を含む、グレージングユニット又はOLEDデバイスの製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1159389 | 2011-10-18 | ||
FR1159389A FR2981346B1 (fr) | 2011-10-18 | 2011-10-18 | Procede de traitement thermique de couches d'argent |
PCT/FR2012/052368 WO2013057428A1 (fr) | 2011-10-18 | 2012-10-18 | Procede de traitement thermique de couches d'argent |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017145528A Division JP6526118B2 (ja) | 2011-10-18 | 2017-07-27 | 銀層の熱処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015505790A JP2015505790A (ja) | 2015-02-26 |
JP6219830B2 true JP6219830B2 (ja) | 2017-10-25 |
Family
ID=47221452
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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JP2014536314A Expired - Fee Related JP6219830B2 (ja) | 2011-10-18 | 2012-10-18 | 銀層の熱処理方法 |
JP2017145528A Expired - Fee Related JP6526118B2 (ja) | 2011-10-18 | 2017-07-27 | 銀層の熱処理方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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JP2017145528A Expired - Fee Related JP6526118B2 (ja) | 2011-10-18 | 2017-07-27 | 銀層の熱処理方法 |
Country Status (14)
Country | Link |
---|---|
US (1) | US20140272465A1 (ja) |
EP (1) | EP2768785B1 (ja) |
JP (2) | JP6219830B2 (ja) |
KR (1) | KR20140088520A (ja) |
CN (2) | CN108285279A (ja) |
BR (1) | BR112014007659A2 (ja) |
CA (1) | CA2849422A1 (ja) |
DE (1) | DE202012013088U1 (ja) |
EA (1) | EA033169B1 (ja) |
FR (1) | FR2981346B1 (ja) |
IN (1) | IN2014CN02556A (ja) |
MX (1) | MX360956B (ja) |
PL (1) | PL2768785T3 (ja) |
WO (1) | WO2013057428A1 (ja) |
Families Citing this family (21)
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WO2008138127A1 (en) | 2007-05-11 | 2008-11-20 | Paratek Microwave, Inc. | Systems and methods for a thin film capacitor having a composite high-k thin film stack |
US10000411B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductivity and low emissivity coating technology |
US10000965B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductive coating technology |
US10060180B2 (en) | 2010-01-16 | 2018-08-28 | Cardinal Cg Company | Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology |
DE102011089884B4 (de) * | 2011-08-19 | 2016-03-10 | Von Ardenne Gmbh | Niedrigemittierende Beschichtung und Verfahren zur Herstellung eines niedrigemittierenden Schichtsystems |
DE102014105300A1 (de) * | 2014-03-12 | 2015-09-17 | Von Ardenne Gmbh | Prozessieranordnung und Verfahren zum Betreiben einer Prozessieranordnung |
FR3021967B1 (fr) | 2014-06-06 | 2021-04-23 | Saint Gobain | Procede d'obtention d'un substrat revetu d'une couche fonctionnelle |
US10115527B2 (en) | 2015-03-09 | 2018-10-30 | Blackberry Limited | Thin film dielectric stack |
DE102015103577A1 (de) * | 2015-03-11 | 2016-09-15 | Von Ardenne Gmbh | Prozessieranordnung und Verfahren zum Kurzzeittempern einer Beschichtung auf einem lichtdurchlässigen Substrat |
US10011524B2 (en) | 2015-06-19 | 2018-07-03 | Guardian Glass, LLC | Coated article with sequentially activated low-E coating, and/or method of making the same |
US10297658B2 (en) | 2016-06-16 | 2019-05-21 | Blackberry Limited | Method and apparatus for a thin film dielectric stack |
JP6783984B2 (ja) * | 2016-07-19 | 2020-11-11 | 豊田合成株式会社 | 発光素子 |
FR3056579B1 (fr) * | 2016-09-26 | 2021-02-12 | Saint Gobain | Substrat revetu d'un revetement bas-emissif |
FR3056580B1 (fr) * | 2016-09-26 | 2021-02-12 | Saint Gobain | Substrat revetu d'un revetement bas-emissif |
US12032124B2 (en) | 2017-08-04 | 2024-07-09 | Vitro Flat Glass Llc | Flash annealing of transparent conductive oxide and semiconductor coatings |
US11220455B2 (en) * | 2017-08-04 | 2022-01-11 | Vitro Flat Glass Llc | Flash annealing of silver coatings |
EP3746832A4 (en) * | 2018-01-29 | 2021-10-13 | Applied Materials, Inc. | ANCHOR LAYERS FOR OPTICAL DEVICE IMPROVEMENT |
US11028012B2 (en) | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
CN111362590A (zh) * | 2020-03-25 | 2020-07-03 | 四川猛犸半导体科技有限公司 | 一种薄膜器件 |
FR3109776B1 (fr) * | 2020-04-30 | 2023-03-24 | Saint Gobain | Materiau comportant un empilement a sous-couche dielectrique fine d’oxide a base de zinc et procede de depot de ce materiau |
RU2757458C1 (ru) * | 2021-01-26 | 2021-10-18 | Акционерное Общество "Центр Прикладной Физики Мгту Им. Н.Э. Баумана" | Способ управления холодной плазмой посредством микрорельефа на твёрдом диэлектрике |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
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DE4412318C2 (de) * | 1994-04-11 | 1998-08-13 | Ver Glaswerke Gmbh | Wärmebehandlung einer mit einer teilreflektierenden Silberschicht versehenen Glasscheibe |
JP4029613B2 (ja) * | 2001-12-25 | 2008-01-09 | ウシオ電機株式会社 | 閃光放射装置および光加熱装置 |
JP4140279B2 (ja) * | 2002-05-22 | 2008-08-27 | ウシオ電機株式会社 | フラッシュランプ装置および閃光放射装置 |
EP1375445A1 (fr) * | 2002-06-17 | 2004-01-02 | Glaverbel | Procédé de fabrication d'un vitrage pourvu d'un revêtement multicouche |
FR2858975B1 (fr) * | 2003-08-20 | 2006-01-27 | Saint Gobain | Substrat transparent revetu d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
FR2911130B1 (fr) * | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
JP5465373B2 (ja) * | 2007-09-12 | 2014-04-09 | 大日本スクリーン製造株式会社 | 熱処理装置 |
JP5236405B2 (ja) * | 2008-09-12 | 2013-07-17 | 住友化学株式会社 | 透明電極膜の改質方法及び透明電極膜付基板の製造方法 |
CN101531471A (zh) * | 2009-03-10 | 2009-09-16 | 上海耀华皮尔金顿玻璃股份有限公司 | 双银复合结构可钢化低辐射镀膜玻璃及其工艺 |
FR2946639B1 (fr) * | 2009-06-12 | 2011-07-15 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
US20120156827A1 (en) * | 2010-12-17 | 2012-06-21 | General Electric Company | Method for forming cadmium tin oxide layer and a photovoltaic device |
FR2969391B1 (fr) * | 2010-12-17 | 2013-07-05 | Saint Gobain | Procédé de fabrication d'un dispositif oled |
-
2011
- 2011-10-18 FR FR1159389A patent/FR2981346B1/fr not_active Expired - Fee Related
-
2012
- 2012-10-18 JP JP2014536314A patent/JP6219830B2/ja not_active Expired - Fee Related
- 2012-10-18 PL PL12790591T patent/PL2768785T3/pl unknown
- 2012-10-18 DE DE202012013088.9U patent/DE202012013088U1/de not_active Expired - Lifetime
- 2012-10-18 CN CN201810153629.8A patent/CN108285279A/zh active Pending
- 2012-10-18 WO PCT/FR2012/052368 patent/WO2013057428A1/fr active Application Filing
- 2012-10-18 US US14/352,903 patent/US20140272465A1/en not_active Abandoned
- 2012-10-18 IN IN2556CHN2014 patent/IN2014CN02556A/en unknown
- 2012-10-18 EP EP12790591.7A patent/EP2768785B1/fr not_active Not-in-force
- 2012-10-18 CA CA2849422A patent/CA2849422A1/fr not_active Abandoned
- 2012-10-18 BR BR112014007659A patent/BR112014007659A2/pt not_active Application Discontinuation
- 2012-10-18 MX MX2014004552A patent/MX360956B/es active IP Right Grant
- 2012-10-18 KR KR1020147009929A patent/KR20140088520A/ko not_active Application Discontinuation
- 2012-10-18 EA EA201490810A patent/EA033169B1/ru not_active IP Right Cessation
- 2012-10-18 CN CN201280050807.5A patent/CN103874667A/zh active Pending
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Also Published As
Publication number | Publication date |
---|---|
FR2981346A1 (fr) | 2013-04-19 |
JP2018012639A (ja) | 2018-01-25 |
FR2981346B1 (fr) | 2014-01-24 |
BR112014007659A2 (pt) | 2017-04-11 |
PL2768785T3 (pl) | 2020-01-31 |
KR20140088520A (ko) | 2014-07-10 |
MX360956B (es) | 2018-11-23 |
EP2768785B1 (fr) | 2019-07-10 |
EA201490810A1 (ru) | 2014-07-30 |
EA033169B1 (ru) | 2019-09-30 |
JP6526118B2 (ja) | 2019-06-05 |
CA2849422A1 (fr) | 2013-04-25 |
CN103874667A (zh) | 2014-06-18 |
IN2014CN02556A (ja) | 2015-08-07 |
WO2013057428A1 (fr) | 2013-04-25 |
US20140272465A1 (en) | 2014-09-18 |
DE202012013088U1 (de) | 2014-10-27 |
EP2768785A1 (fr) | 2014-08-27 |
MX2014004552A (es) | 2014-08-01 |
AU2012324666A1 (en) | 2014-06-05 |
JP2015505790A (ja) | 2015-02-26 |
CN108285279A (zh) | 2018-07-17 |
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