JP6092143B2 - 光結合装置 - Google Patents
光結合装置 Download PDFInfo
- Publication number
- JP6092143B2 JP6092143B2 JP2014052579A JP2014052579A JP6092143B2 JP 6092143 B2 JP6092143 B2 JP 6092143B2 JP 2014052579 A JP2014052579 A JP 2014052579A JP 2014052579 A JP2014052579 A JP 2014052579A JP 6092143 B2 JP6092143 B2 JP 6092143B2
- Authority
- JP
- Japan
- Prior art keywords
- resin layer
- optical coupling
- coupling device
- inorganic filler
- inner resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims description 43
- 230000008878 coupling Effects 0.000 title claims description 42
- 238000010168 coupling process Methods 0.000 title claims description 42
- 238000005859 coupling reaction Methods 0.000 title claims description 42
- 229920005989 resin Polymers 0.000 claims description 102
- 239000011347 resin Substances 0.000 claims description 102
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 239000011256 inorganic filler Substances 0.000 claims description 12
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 12
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 150000008065 acid anhydrides Chemical class 0.000 claims description 6
- 125000004018 acid anhydride group Chemical group 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims description 5
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 229920003986 novolac Polymers 0.000 claims description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 claims description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims 3
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 claims 1
- OEMSKMUAMXLNKL-UHFFFAOYSA-N 5-methyl-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)=CCC2C(=O)OC(=O)C12 OEMSKMUAMXLNKL-UHFFFAOYSA-N 0.000 claims 1
- 238000013329 compounding Methods 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 9
- 239000000945 filler Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 125000004429 atom Chemical group 0.000 description 7
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 6
- 235000014113 dietary fatty acids Nutrition 0.000 description 6
- 239000000194 fatty acid Substances 0.000 description 6
- 229930195729 fatty acid Natural products 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- -1 fatty acid ester Chemical class 0.000 description 5
- 150000004665 fatty acids Chemical class 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000002845 discoloration Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000005011 time of flight secondary ion mass spectroscopy Methods 0.000 description 4
- 238000002042 time-of-flight secondary ion mass spectrometry Methods 0.000 description 4
- 235000021355 Stearic acid Nutrition 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 3
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 3
- VKOBVWXKNCXXDE-UHFFFAOYSA-N icosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCC(O)=O VKOBVWXKNCXXDE-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 3
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 3
- 238000004382 potting Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000008117 stearic acid Substances 0.000 description 3
- 235000021357 Behenic acid Nutrition 0.000 description 2
- 235000021314 Palmitic acid Nutrition 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229940116226 behenic acid Drugs 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
- H01L31/16—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources
- H01L31/167—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3135—Double encapsulation or coating and encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
- H01L25/162—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits the devices being mounted on two or more different substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
- H01L25/165—Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
- H01L25/167—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85909—Post-treatment of the connector or wire bonding area
- H01L2224/8592—Applying permanent coating, e.g. protective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Led Device Packages (AREA)
Description
図1は、第1の実施形態にかかる光結合装置の模式断面図である。
光結合装置は、第1のリード12に接着された発光素子20と、第2のリード10に接着された受光素子30と、が互いに対向している。また、発光素子20は、エンキャップのためポッティング樹脂22で覆われている。
図2(a)に表すように、光結合装置は、第1のリード112に接着された発光素子120と、第2のリード110に接着された受光素子130と、が互いに対向している。また、発光素子120は、エンキャップのためポッティング樹脂122で覆われている。比較例において、インナ樹脂140の表面は、プラズマ処理による表面改質がされていない。
150℃の雰囲気で2000時間経過した後の変動率は、プラス10%とマイナス10%との間であり比較例よりも大幅に改善されている。また、インナ樹脂層40とアウタ樹脂層50との間に剥離を生じず、かつ変色も生じなかった。
第1のリードフレームに発光素子20をマウントし、ワイヤボンディングを行う(S100)。このあと、発光素子20をポッティング樹脂22で覆ってもよい。
複数のマガジン90の側面にスリット形状の開口部90a、上下にも開口部90b、90cを設ける。たとえば、高周波プラズマ装置のグランド電極94にも開口部94aを設け、マガジンの開口部90cとグランド電極94の開口部94aとを一致させる。処理室内のガス流量を低く設定すると電子の平均自由工程が長くなり、放電が均一となる。このため、処理室内での反応を均一にできる。プラズマ処理工程の生産性を高めることができる。
縦軸は原子濃度(%)、横軸はスパッタ時間(分)、である。横軸に表すスパッタ時間は、表面からの深さに対応する。たとえば、SiO2の場合、スパッタレートは、略6nm/分などとなる。このように、X線光電子分光分析法(XPS:X-ray Photoelectron Spectroscopy)を用いて、樹脂層の深さ方向の組成を分析することができる。
比較例では、プラズマ処理を行わない。インナ樹脂層140の表面において、C元素濃度は略90%と高く、表面からの距離が大きくなるに従って、C原子濃度は70%以下に低下する。また、O(酸素)の原子濃度は、表面で略ゼロであり、表面からの距離が大きくなるに従って、略18%に上昇する。
縦軸は規格化2次イオン強度、横軸は2次イオン種、である。TOF−SIMS(Timeof Flight Secondary Ion Mass Spectrometry)飛行時間型2次イオン質量分析法)は、3次元イメージや任意箇所の2次元イメージを抽出することができる。破線はプラズマ処理前、実線はプラズマ処理後、を表す。
Claims (6)
- 入力電気信号で駆動される発光素子と、
前記発光素子の放出光を電気信号に変換して出力する受光素子と、
エポキシ基を有するイソシアヌル酸を含む主剤と、酸無水物基を有する酸無水物を含む硬化剤と、を含み、前記発光素子と前記受光素子とを覆うインナ樹脂層であって、第1無機充填剤が配合された、インナ樹脂層と、
前記インナ樹脂層を包み、前記放出光を遮光するアウタ樹脂層と、
を備え、
前記インナ樹脂層と前記アウタ樹脂層との界面から前記インナ樹脂層の深さ方向の距離が大きくなるに従い、炭素原子濃度が増大しかつ酸素原子濃度が低下する領域を有し、
前記界面において前記第1無機充填剤は前記インナ樹脂層の表面に露出しかつ前記アウタ樹脂層と接合された、光結合装置。 - 前記第1無機充填剤は、シリコンを含む請求項1記載の光結合装置。
- 前記アウタ樹脂層には、第2無機充填剤が配合された請求項1記載の光結合装置。
- 前記アウタ樹脂は、オルソクレゾールノボラックを含む主剤と、フェノールノボラックを含む硬化剤と、を含み、
前記第1無機充填剤は、シリコンを含み、
前記第2無機充填剤は、シリコンを含む請求項3記載の光結合装置。 - 前記第1無機充填剤は、60重量%以上、かつ85重量%以下の第1の配合比であり、
前記第2無機充填剤は、60重量%以上、かつ85重量%以下の第2の配合比であり、
前記第1の配合比と前記第2の配合比との差が5重量%以上、かつ12重量%以下である請求項3または4に記載の光結合装置。 - 前記イソシアヌル酸は、1,3,5-トリス(2,3-エポキシプロピル)イソシアヌル酸を含み、
前記酸無水物は、イソメチルテトラヒドロ無水フタル酸を含む請求項1〜5のいずれか1つに記載の光結合装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014052579A JP6092143B2 (ja) | 2014-03-14 | 2014-03-14 | 光結合装置 |
US14/461,755 US9171829B2 (en) | 2014-03-14 | 2014-08-18 | Photocoupler |
CN201410421467.3A CN104916628B (zh) | 2014-03-14 | 2014-08-25 | 光耦合装置 |
US14/858,173 US9355925B2 (en) | 2014-03-14 | 2015-09-18 | Photocoupler |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014052579A JP6092143B2 (ja) | 2014-03-14 | 2014-03-14 | 光結合装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015177044A JP2015177044A (ja) | 2015-10-05 |
JP6092143B2 true JP6092143B2 (ja) | 2017-03-08 |
Family
ID=54069728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014052579A Active JP6092143B2 (ja) | 2014-03-14 | 2014-03-14 | 光結合装置 |
Country Status (3)
Country | Link |
---|---|
US (2) | US9171829B2 (ja) |
JP (1) | JP6092143B2 (ja) |
CN (1) | CN104916628B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019012735A (ja) * | 2017-06-29 | 2019-01-24 | 株式会社東芝 | 光結合装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4645551A (en) * | 1984-08-31 | 1987-02-24 | Motorola, Inc. | Method of making an octocoupler |
JP2600616B2 (ja) * | 1994-09-08 | 1997-04-16 | 日本電気株式会社 | 光結合装置 |
JPH08125216A (ja) * | 1994-10-24 | 1996-05-17 | Sharp Corp | 光結合装置の製造方法 |
MY143286A (en) * | 1996-05-21 | 2011-04-15 | Panasonic Corp | Thin film, method and apparatus for forming the same, and electronic component incorporating the same |
JP3595433B2 (ja) | 1997-05-23 | 2004-12-02 | 株式会社サムコインターナショナル研究所 | プラズマドライクリーナー |
JP2001002758A (ja) * | 1999-06-17 | 2001-01-09 | Nippon Kayaku Co Ltd | 光半導体封止用エポキシ樹脂組成物 |
JP2002141325A (ja) | 2000-11-01 | 2002-05-17 | Mori Engineering:Kk | マガジン電極方式の減圧プラズマ装置 |
JP2003209212A (ja) | 2002-01-16 | 2003-07-25 | Mori Engineering:Kk | マガジン方式プラズマクリーニングシステム |
JP2004241757A (ja) * | 2003-01-17 | 2004-08-26 | Sharp Corp | 光結合半導体装置とその製造方法 |
WO2009104407A1 (ja) * | 2008-02-20 | 2009-08-27 | ダイキョーニシカワ株式会社 | 樹脂成形体 |
JP2012041403A (ja) | 2010-08-16 | 2012-03-01 | Shin-Etsu Chemical Co Ltd | 熱硬化性エポキシ樹脂組成物及び半導体装置 |
JP2012169511A (ja) * | 2011-02-16 | 2012-09-06 | Renesas Electronics Corp | 光結合型半導体素子、その製造方法 |
US20130181232A1 (en) * | 2012-01-17 | 2013-07-18 | Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. | Optocoupler with Surface Functional Coating Layer |
JP5624091B2 (ja) * | 2012-08-06 | 2014-11-12 | パナソニック株式会社 | フォトカプラ装置の製造方法 |
-
2014
- 2014-03-14 JP JP2014052579A patent/JP6092143B2/ja active Active
- 2014-08-18 US US14/461,755 patent/US9171829B2/en active Active
- 2014-08-25 CN CN201410421467.3A patent/CN104916628B/zh active Active
-
2015
- 2015-09-18 US US14/858,173 patent/US9355925B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US9355925B2 (en) | 2016-05-31 |
US9171829B2 (en) | 2015-10-27 |
US20150262982A1 (en) | 2015-09-17 |
CN104916628A (zh) | 2015-09-16 |
CN104916628B (zh) | 2018-02-16 |
JP2015177044A (ja) | 2015-10-05 |
US20160013113A1 (en) | 2016-01-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9564566B2 (en) | Optoelectronic component and method for the production thereof | |
US20150103856A1 (en) | Nitride semiconductor light emitting device | |
US20170148966A1 (en) | Surface-Mountable Semiconductor Component and Method for Producing Same | |
CN108028159B (zh) | X射线管、x射线管装置、以及x射线管装置的制造方法 | |
EP2530751A1 (en) | Led-packaging resin body, led device, and method for manufacturing led device | |
US10622523B2 (en) | Light-emitting diode and method of producing a light-emitting diode | |
JP2021530113A (ja) | 半導体レーザ | |
JP2008251573A (ja) | 半導体発光装置 | |
JP6092143B2 (ja) | 光結合装置 | |
US20150262986A1 (en) | Optical coupling device | |
US10468395B2 (en) | Device including at least one optoelectronic semiconductor component | |
KR20200031135A (ko) | 봉지 광학 반도체 장치의 제조 방법 | |
TW201301571A (zh) | 發光二極體封裝結構及封裝方法 | |
JP5453707B2 (ja) | ジルコニア含有エポキシ樹脂組成物とこれを含有する透明複合体および発光素子並びに光半導体装置 | |
US10411174B2 (en) | Semiconductor light-emitting device and optical-semiconductor-mounting substrate | |
JP2014531714A (ja) | 回路基板取付器具を備えた照明デバイス | |
US20160260862A1 (en) | Signal coupling device | |
JP3275308B2 (ja) | 半導体発光装置及びその製法 | |
WO2018008197A1 (ja) | 反射層および蛍光体層付光半導体素子 | |
WO2020022080A1 (ja) | Ledデバイス、ledデバイスの製造方法および積層体 | |
JP2015054965A (ja) | 封止用樹脂、半導体装置、および光結合装置 | |
JP6416800B2 (ja) | 半導体装置 | |
WO2017203795A1 (ja) | 気密パッケージ及び気密パッケージの製造方法 | |
US9613936B2 (en) | LED module including an LED | |
JP2016128250A (ja) | 複合体の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160229 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161107 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20161109 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170104 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170110 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170208 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 6092143 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |