JP6034080B2

JP6034080B2 - Substrate holding device

Info

Publication number: JP6034080B2
Application number: JP2012157023A
Authority: JP
Inventors: 智美村田; 橋詰　彰夫; 彰夫橋詰; 加藤　洋; 洋加藤
Original assignee: Screen Holdings Co Ltd
Current assignee: Screen Holdings Co Ltd
Priority date: 2012-07-13
Filing date: 2012-07-13
Publication date: 2016-11-30
Anticipated expiration: 2032-07-13
Also published as: JP2014022419A

Description

この発明は、半導体基板、液晶表示装置用ガラス基板、プラズマディスプレイ用ガラス基板、フォトマスク用ガラス基板、光ディスク用基板等（以下、単に「基板」と称する）を保持する技術に関する。 The present invention relates to a technique for holding a semiconductor substrate, a glass substrate for a liquid crystal display device, a glass substrate for a plasma display, a glass substrate for a photomask, a substrate for an optical disk, etc. (hereinafter simply referred to as “substrate”).

基板に対して各種の処理を施す基板処理装置の一種として、基板を回転させつつ、当該基板に処理液（具体的には、純水などの洗浄液）を供給し、また、ブラシなどの物理力により洗浄処理を行う、回転式の基板処理装置が知られている。 As a type of substrate processing apparatus that performs various types of processing on a substrate, while rotating the substrate, a processing liquid (specifically, a cleaning liquid such as pure water) is supplied to the substrate, and a physical force such as a brush There is known a rotary substrate processing apparatus that performs a cleaning process by the above.

回転式の基板処理装置においては、回転台上に基板を保持しつつ、当該回転台を回転させて、基板上に処理液を供給する。すると、回転に伴う遠心力で基板の上面全体に処理液が均一に行き渡って、基板に対する処理が実行されていく。その後、処理液の供給が停止された状態で、回転台がさらに回転される。すると、基板上の処理液が、遠心力で基板外に振り切られ、これによって、基板が乾燥される（振り切り乾燥）。 In a rotary substrate processing apparatus, a processing liquid is supplied onto a substrate by rotating the rotating table while holding the substrate on the rotating table. Then, the processing liquid uniformly spreads over the entire upper surface of the substrate due to the centrifugal force accompanying the rotation, and the processing on the substrate is executed. Thereafter, the turntable is further rotated in a state where the supply of the processing liquid is stopped. Then, the processing liquid on the substrate is shaken off by the centrifugal force, and thereby the substrate is dried (shake-off drying).

ところで、回転台上に基板を保持する技術として、例えば特許文献１には、保持対象となる基板の外周縁に沿って配列された複数のチャックピンで、基板のエッジ部裏面とエッジ部側面とを保持する構成が開示されている。 By the way, as a technique for holding a substrate on a turntable, for example, in Patent Document 1, a plurality of chuck pins arranged along the outer peripheral edge of a substrate to be held, a back surface of the edge portion of the substrate, a side surface of the edge portion, and A configuration for holding the is disclosed.

複数のチャックピンで基板を保持する構成においては、振り切り乾燥において、チャックピンと基板との当接部分において、液滴が残ってしまうことが問題となっている。パーティクル等を含んだ液滴が基板に付着したまま残ってしまうと、基板の汚染につながってしまう。 In the configuration in which the substrate is held by a plurality of chuck pins, there is a problem in that droplets remain at the contact portion between the chuck pins and the substrate during the swing-off drying. If droplets containing particles or the like remain attached to the substrate, the substrate is contaminated.

そこで、例えば特許文献１では、基板とチャックピンとの間の液残りを低減するべく、チャックピンに、水抜き用の透孔を形成している。この透孔は、具体的には、その下面が基板の上面と面一になるように形成されており、基板の上面を伝って流れる液滴を、チャックピンの外側に逃がすことができるようになっている。 Therefore, in Patent Document 1, for example, a drain hole is formed in the chuck pin in order to reduce the liquid remaining between the substrate and the chuck pin. Specifically, the through hole is formed so that the lower surface thereof is flush with the upper surface of the substrate, so that liquid droplets flowing along the upper surface of the substrate can escape to the outside of the chuck pins. It has become.

特開平７−１１５０８１号公報JP-A-7-115081

特許文献１に開示の技術を適用すると、基板の上面側の液滴については、その少なくとも一部を、透孔を介して、チャックピンの裏側に排出することができる。しかしながら、特許文献１の構成においては、基板とチャックピンとの間に、基板の下方と側方との両方が塞がった隙間が存在する。したがって、チャックピンなどを伝って、基板の下面側に回り込んでしまった液滴は、チャックピンと基板との間のこの隙間に閉じこめられてしまって排出されないおそれがある。その結果、液残りが発生し、基板の汚染が十分に回避できないおそれがある。 When the technique disclosed in Patent Document 1 is applied, at least a part of the droplet on the upper surface side of the substrate can be discharged to the back side of the chuck pin through the through hole. However, in the configuration of Patent Document 1, there is a gap between the substrate and the chuck pin where both the lower side and the side of the substrate are closed. Therefore, the liquid droplets that have traveled around the chuck pins and the like and have come to the lower surface side of the substrate may be trapped in this gap between the chuck pins and the substrate and not discharged. As a result, liquid residue is generated, and there is a possibility that contamination of the substrate cannot be avoided sufficiently.

この発明は、上記課題に鑑みてなされたものであり、振り切り乾燥において、基板とこれを保持する部材との間の液残りを低減できる技術を提供することを目的とする。 This invention is made | formed in view of the said subject, and it aims at providing the technique which can reduce the liquid residue between a board | substrate and the member holding this in shake-off drying.

第１の態様は、基板保持装置であって、回転軸を中心に水平面内で回転する回転台と、前記回転台上に基板を保持する保持部と、を備え、前記保持部が、前記回転台の上面に配置された基体部と、前記基体部に配設された当接部材群と、前記基体部を駆動して、前記当接部材群を、前記回転台上の基板の周縁と近接離間する方向に移動させる駆動部と、を備え、前記当接部材群が、前記基板に下方から当接する下方当接部材と、前記基板の回転中心から見て、前記下方当接部材と重ならないように間隔をあけて設けられ、前記基板に側方から当接する側方当接部材と、前記側方当接部材における前記基板に当接する当接面と、前記当接面と逆側の面とを連通する連通部と、を備え、前記下方当接部材の上側の面が、前記回転軸に向かって延在する頂辺を中心として、その両側が下方に傾斜した屈折面である。 A 1st aspect is a board | substrate holding | maintenance apparatus, Comprising: The rotary base rotated in a horizontal surface centering on a rotating shaft, The holding part holding a board | substrate on the said rotary base, The said holding part is the said rotation. A base portion disposed on the upper surface of the base, a contact member group disposed on the base portion, and driving the base portion so that the contact member group is brought close to the periphery of the substrate on the turntable And a drive unit that moves in a separating direction, and the contact member group does not overlap the lower contact member when viewed from the rotation center of the substrate and a lower contact member that contacts the substrate from below. A side contact member that contacts the substrate from the side, a contact surface that contacts the substrate in the side contact member, and a surface opposite to the contact surface. and a communication portion for communicating the bets, the upper surface of the lower contact member, extends toward the rotational axis That top section around the a refracting surface whose sides are inclined downward.

第２の態様は、基板保持装置であって、回転軸を中心に水平面内で回転する回転台と、前記回転台上に基板を保持する保持部と、を備え、前記保持部が、前記回転台の上面に配置された基体部と、前記基体部に配設された当接部材群と、前記基体部を駆動して、前記当接部材群を、前記回転台上の基板の周縁と近接離間する方向に移動させる駆動部と、を備え、前記当接部材群が、前記基板に下方から当接する下方当接部材と、前記基板の回転中心から見て、前記下方当接部材と重ならないように間隔をあけて設けられ、前記基板に側方から当接する側方当接部材と、前記側方当接部材における前記基板に当接する当接面と、前記当接面と逆側の面とを連通する連通部と、を備え、前記連通部が、前記回転軸から離れるにつれて断面積が大きくなる形状とされる。 A 2nd aspect is a board | substrate holding | maintenance apparatus, Comprising: The rotating stand rotated in a horizontal surface centering on a rotating shaft, The holding part holding a board | substrate on the said rotating table, The said holding part is the said rotation. A base portion disposed on the upper surface of the base, a contact member group disposed on the base portion, and driving the base portion so that the contact member group is brought close to the periphery of the substrate on the turntable And a drive unit that moves in a separating direction, and the contact member group does not overlap the lower contact member when viewed from the rotation center of the substrate and a lower contact member that contacts the substrate from below. A side contact member that contacts the substrate from the side, a contact surface that contacts the substrate in the side contact member, and a surface opposite to the contact surface. A communication portion that communicates with each other, and the cross-sectional area increases as the communication portion moves away from the rotating shaft. It is to become shape.

第３の態様は、第２の態様に係る基板保持装置であって、前記下方当接部材の上側の面が、前記回転軸に近づくにつれて、下方に傾斜する傾斜面である。 A 3rd aspect is a board | substrate holding | maintenance apparatus which concerns on a 2nd aspect, Comprising: The upper surface of the said lower contact member is an inclined surface which inclines below as it approaches the said rotating shaft.

第４の態様は、第２の態様に係る基板保持装置であって、前記下方当接部材の上端部が、先細りの形状である。 A 4th aspect is a board | substrate holding | maintenance apparatus which concerns on a 2nd aspect, Comprising: The upper end part of the said lower contact member is a tapered shape.

第５の態様は、第１から第４のいずれかの態様に係る基板保持装置であって、前記連通部が、前記側方当接部材の上面に開口している。 A fifth aspect is a substrate holding apparatus according to any one of the first to fourth aspects, wherein the communication portion opens on an upper surface of the side contact member.

第６の態様は、第１から第５のいずれかの態様に係る基板保持装置であって、前記側方当接部材に、前記連通部が複数個形成される。 A sixth aspect is a substrate holding apparatus according to any one of the first to fifth aspects, wherein a plurality of the communication portions are formed on the side contact member.

第７の態様は、第１から第６のいずれかの態様に係る基板保持装置であって、前記連通部の底面が、前記回転台上に保持される基板の下面以下の高さ位置とされる。 A seventh aspect is a substrate holding apparatus according to any one of the first to sixth aspects, wherein a bottom surface of the communication portion is a height position equal to or lower than a lower surface of the substrate held on the turntable. The

第８の態様は、第１から第７のいずれかの態様に係る基板保持装置であって、前記当接部材群が、前記側方当接部材を１個備えるとともに、前記下方当接部材を２個備え、前記２個の下方当接部材の間に、前記側方当接部材が配置されている。 An eighth aspect is the substrate holding apparatus according to any one of the first to seventh aspects, wherein the contact member group includes one side contact member and the lower contact member. Two side contact members are arranged between the two lower contact members.

第１の態様によると、回転台上に基板を保持する保持部において、基板に下方から当接する部材と基板に側方から当接する部材とが、基板の回転中心から見て互いに重ならないように間隔をあけて設けられる。この構成によると、振り切り乾燥において、下方当接部材に当接される部分付近に付着した液滴は、側方当接部材に邪魔されることなく、回転に伴う遠心力によって基板から振り切られる。また、基板における側方当接部材に当接される部分付近に付着した液滴は、下方当接部材に邪魔されることなく、当該液滴の一部は重力によって下方に落下し、残りは遠心力によって連通部を介して振り切られる。したがって、振り切り乾燥において、基板と保持部との間の液残りを低減できる。また、下方当接部材は、屈折面の頂辺において、基板と接触する。したがって、下方当接部材と基板との接触領域が略線状の領域となる。この構成によると、振り切り乾燥において、基板と下方当接部材との間の液滴が、基板外に排出されやすい。特に、頂辺が、回転台の回転軸に向かって延在するので、回転に伴う遠心力を受けて回転軸から離れる方向に流れてくる液滴の流れが、下方当接部材との接触部分によって妨げられにくく、基板に付着している液滴が、特に速やかに、基板外に排出される。 According to the first aspect, in the holding unit that holds the substrate on the turntable, the member that contacts the substrate from below and the member that contacts the substrate from the side do not overlap each other when viewed from the rotation center of the substrate. Provided at intervals. According to this configuration, in the shake-off drying, the liquid droplets adhering to the vicinity of the portion in contact with the lower contact member are shaken off from the substrate by the centrifugal force accompanying the rotation without being disturbed by the side contact member. In addition, the droplets adhering to the vicinity of the portion of the substrate that is in contact with the side contact member do not interfere with the lower contact member, and a part of the droplet falls down due to gravity, and the rest It is shaken off through the communicating part by centrifugal force. Therefore, the liquid residue between the substrate and the holding unit can be reduced in the shake-off drying. The lower abutting member contacts the substrate at the top side of the refractive surface. Accordingly, the contact area between the lower contact member and the substrate is a substantially linear area. According to this configuration, droplets between the substrate and the lower contact member are easily discharged out of the substrate in the swing-off drying. In particular, since the top side extends toward the rotating shaft of the turntable, the flow of liquid droplets flowing in the direction away from the rotating shaft due to the centrifugal force accompanying the rotation is the contact portion with the lower contact member. The droplets that are not easily disturbed and adhered to the substrate are discharged out of the substrate particularly quickly.

第２の態様によると、回転台上に基板を保持する保持部において、基板に下方から当接する部材と基板に側方から当接する部材とが、基板の回転中心から見て互いに重ならないように間隔をあけて設けられる。この構成によると、振り切り乾燥において、下方当接部材に当接される部分付近に付着した液滴は、側方当接部材に邪魔されることなく、回転に伴う遠心力によって基板から振り切られる。また、基板における側方当接部材に当接される部分付近に付着した液滴は、下方当接部材に邪魔されることなく、当該液滴の一部は重力によって下方に落下し、残りは遠心力によって連通部を介して振り切られる。したがって、振り切り乾燥において、基板と保持部との間の液残りを低減できる。また、連通部が、回転軸から離れるにつれて断面積が大きくなる形状とされるので、振り切り乾燥において、連通部内に流入した液滴を、特に速やかに、排出することができる。 According to the second aspect, in the holding unit that holds the substrate on the turntable, the member that contacts the substrate from below and the member that contacts the substrate from the side do not overlap each other when viewed from the rotation center of the substrate. Provided at intervals. According to this configuration, in the shake-off drying, the liquid droplets adhering to the vicinity of the portion in contact with the lower contact member are shaken off from the substrate by the centrifugal force accompanying the rotation without being disturbed by the side contact member. In addition, the droplets adhering to the vicinity of the portion of the substrate that is in contact with the side contact member do not interfere with the lower contact member, and a part of the droplet falls down due to gravity, and the rest It is shaken off through the communicating part by centrifugal force. Therefore, the liquid residue between the substrate and the holding unit can be reduced in the shake-off drying. In addition, since the communication portion has a shape in which the cross-sectional area increases as the distance from the rotation axis increases, it is possible to discharge the droplets that have flowed into the communication portion particularly quickly during shake-off drying.

第３の態様によると、下方当接部材の上側の面が、回転軸に近づくにつれて、下方に傾斜する傾斜面である。したがって、下方当接部材と基板との接触領域が略線状の領域となる。この構成によると、振り切り乾燥において、基板と下方当接部材との間の液滴が、基板外に排出されやすい。 According to the third aspect, the upper surface of the lower contact member is an inclined surface that is inclined downward as it approaches the rotation axis. Accordingly, the contact area between the lower contact member and the substrate is a substantially linear area. According to this configuration, droplets between the substrate and the lower contact member are easily discharged out of the substrate in the swing-off drying.

第４の態様によると、下方当接部材の上端部が、先細りの形状とされることによって、下方当接部材と基板との接触領域が小さく抑えられる。この構成によると、振り切り乾燥において、基板と下方当接部材との間の液滴が、基板外に排出されやすい。また、回転に伴う遠心力を受けて回転軸から離れる方向に流れてくる液滴の流れが、下方当接部材との接触部分によって妨げられにくく、基板に付着している液滴が、特に速やかに、基板外に排出される。 According to the 4th aspect, the contact area of a lower contact member and a board | substrate is restrained small by making the upper end part of a lower contact member into a tapered shape. According to this configuration, droplets between the substrate and the lower contact member are easily discharged out of the substrate in the swing-off drying. In addition, the flow of the liquid droplets flowing in the direction away from the rotation axis due to the centrifugal force accompanying the rotation is not easily hindered by the contact portion with the lower contact member, and the liquid droplets adhering to the substrate are particularly quick. Then, it is discharged out of the substrate.

第５の態様によると、連通部が側方支持部材の上面に開口しているので、振り切り乾燥において、連通部内に流入した液滴を、速やかに排出することができる。 According to the fifth aspect, since the communicating portion is opened on the upper surface of the side support member, the droplets that have flowed into the communicating portion can be quickly discharged during the swing-off drying.

第６の態様によると、連通部が複数個設けられるので、振り切り乾燥において、遠心力を受けて回転軸から離れる方向に流れてくる液滴を、いずれかの連通部を介して効果的に基板外に排出することができる。 According to the sixth aspect, since a plurality of communicating portions are provided, in the shake-off drying, the liquid droplets flowing in the direction away from the rotating shaft by receiving the centrifugal force are effectively transferred through any of the communicating portions. Can be discharged outside.

第７の態様によると、振り切り乾燥において、側方当接部材と基板との間の液残りを、さらに低減できる。 According to the 7th aspect, the liquid residue between a side contact member and a board | substrate can further be reduced in shake-off drying.

第８の態様によると、基体部に配設される当接部材群が、２個の下方当接部材と、これらの間に配置された側方当接部材とを備える。この構成によると、基板を安定して保持することができる。
According to the 8th aspect, the contact member group arrange | positioned at a base | substrate part is provided with two downward contact members and the side contact member arrange | positioned among these. According to this configuration, the substrate can be stably held.

カップが上昇されている状態の基板保持装置の断面図である。It is sectional drawing of the board | substrate holding | maintenance apparatus of the state in which the cup is raised. カップが下降されている状態の基板保持装置の断面図である。It is sectional drawing of the board | substrate holding | maintenance apparatus in the state in which the cup is lowered | hung. 回転台の平面図である。It is a top view of a turntable. 可動保持部材の側面図である。It is a side view of a movable holding member. 可動保持部材の平面図である。It is a top view of a movable holding member. カップが上昇された状態の様子を模式的に示す説明図である。It is explanatory drawing which shows typically the mode of the state where the cup was raised. カップが下降された状態の様子を模式的に示す説明図である。It is explanatory drawing which shows typically the mode of the state by which the cup was lowered | hung. 当接部材群の構成を模式的に示す斜視図である。It is a perspective view which shows the structure of a contact member group typically. 振り切り乾燥の際の下方当接部材付近の様子を示す説明図である。It is explanatory drawing which shows the mode of the downward contact member vicinity in the case of shaking off drying. 振り切り乾燥の際の側方当接部材の様子を示す説明図である。It is explanatory drawing which shows the mode of the side contact member in the case of shaking off drying. 第２の構成例に係る下方当接部材と第１の構成例に係る側方当接部材とを含む当接部材群を示す斜視図である。It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 2nd structural example, and the side contact member which concerns on a 1st structural example. 第３の構成例に係る下方当接部材と第１の構成例に係る側方当接部材とを含む当接部材群を示す斜視図である。It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 3rd structural example, and the side contact member which concerns on a 1st structural example. 第１の構成例に係る下方当接部材と第２の構成例に係る側方当接部材とを含む当接部材群を示す斜視図である。It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 1st structural example, and the side contact member which concerns on a 2nd structural example. 第１の構成例に係る下方当接部材と第３の構成例に係る側方当接部材とを含む当接部材群を示す斜視図である。It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 1st structural example, and the side contact member which concerns on a 3rd structural example.

以下、添付の図面を参照しながら、本発明の実施形態について説明する。以下の実施形態は、本発明を具体化した一例であって、本発明の技術的範囲を限定するものではない。 Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The following embodiment is an example embodying the present invention, and does not limit the technical scope of the present invention.

＜１．全体構成＞
基板保持装置１００の全体構成について、図１〜図３を参照しながら説明する。図１、図２は、回転式の基板処理装置に用いられる基板保持装置１００を模式的に示す断面図である。図３は、基板保持装置１００の回転台１の平面図である。なお、図１、図２においては、図をわかりやすくするために、一部の保持部材４の図示を省略している。 <1. Overall configuration>
The overall configuration of the substrate holding apparatus 100 will be described with reference to FIGS. 1 and 2 are cross-sectional views schematically showing a substrate holding device 100 used in a rotary substrate processing apparatus. FIG. 3 is a plan view of the turntable 1 of the substrate holding device 100. In FIGS. 1 and 2, some of the holding members 4 are not shown for easy understanding of the drawings.

基板保持装置１００は、回転台１の上方にて基板Ｗを保持するものであり、この基板保持装置１００を用いる基板処理装置は、例えば、回転台１を回転させながら、処理対象となる基板Ｗの上面に処理液として純水などの洗浄液を供給しつつ、当該基板Ｗの上面にブラシ洗浄を施す装置である。なお、基板処理装置は、必ずしもブラシ洗浄を行うものである必要はなく、処理対象となる基板Ｗに所定の処理液（例えば、洗浄液、リンス液、現像液など）を供給することによって基板Ｗに対して所定の処理を実行するものであってもよい。なお、ここでは、処理対象となる基板Ｗは、略円形状であるとする。 The substrate holding device 100 holds the substrate W above the turntable 1, and the substrate processing apparatus using the substrate holding device 100, for example, rotates the turntable 1 while rotating the substrate W to be processed. The apparatus performs brush cleaning on the upper surface of the substrate W while supplying a cleaning liquid such as pure water to the upper surface of the substrate. The substrate processing apparatus does not necessarily perform brush cleaning, and supplies a predetermined processing liquid (for example, a cleaning liquid, a rinsing liquid, a developer, etc.) to the substrate W to be processed. Alternatively, a predetermined process may be executed. Here, it is assumed that the substrate W to be processed has a substantially circular shape.

基板保持装置１００は、回転台１、および、回転台１の側方周囲を覆うカップ２を備える。回転台１は、モータ１１の駆動を受けて、回転台１の中心Ａ１０を通り鉛直に延在する軸（回転軸）Ａ１を中心として水平面内で回転される。また、基板保持装置１００は、回転台１上に基板Ｗを保持する保持部３を備える。 The substrate holding device 100 includes a turntable 1 and a cup 2 that covers a side periphery of the turntable 1. The turntable 1 is driven in the horizontal plane about an axis (rotation axis) A1 extending vertically through the center A10 of the turntable 1 under the drive of the motor 11. Further, the substrate holding device 100 includes a holding unit 3 that holds the substrate W on the turntable 1.

保持部３は、略円形の基板Ｗを、回転台１と略同心の位置に規制しつつ、略水平姿勢で保持する機能部であり、回転台１の上面に設けられた複数（好ましくは３個以上であり、図示の例では、６個）の保持部材４を備える。これら複数の保持部材４は、保持対象となる基板Ｗと略同一サイズの仮想円の円周上に配列される。つまり、複数の保持部材４は、回転台１上の基板Ｗの周縁にほぼ沿うように、同一円周上に配列される。 The holding unit 3 is a functional unit that holds the substantially circular substrate W in a substantially horizontal posture while restricting the substantially circular substrate W to a position substantially concentric with the turntable 1. There are six or more holding members 4 in the illustrated example. The plurality of holding members 4 are arranged on the circumference of a virtual circle having substantially the same size as the substrate W to be held. That is, the plurality of holding members 4 are arranged on the same circumference so as to substantially follow the periphery of the substrate W on the turntable 1.

回転台１上に設けられる複数の保持部材４のそれぞれは、回転台１上に配置された基体部４０の上面に、当接部材群４００（具体的には、２個の下方当接部材４１，４１、および、１個の側方当接部材４２）を配設した構成となっている。 Each of the plurality of holding members 4 provided on the turntable 1 has a contact member group 400 (specifically, two lower contact members 41 on the upper surface of the base portion 40 disposed on the turntable 1. , 41 and one side contact member 42).

回転台１上に設けられる複数の保持部材４のうちの少なくとも１個の保持部材４は、その基体部４０が例えば長尺平板形状に形成されており、当該基体部４０が回転台１に対して回動可能に設けられる。また、残りの保持部材４は、その基体部４０が例えば円柱形状に形成されており、当該基体部４０が回転台１に対して固定配置される。以下において、両者を区別する場合は、前者を「可動保持部材４ａ」ともいい、後者を「固定保持部材４ｂ」ともいう。図示されるように、可動保持部材４ａは、固定保持部材４ｂとほぼ対向する位置に配置される。なお、図示の例では、回転台１上には６個の保持部材４が設けられ、当該６個の保持部材４のうちの２個が可動保持部材４ａとされ、残りの４個が固定保持部材４ｂとされているが、保持部材４の総数と、可動保持部材４ａおよび固定保持部材４ｂの各個数とは、必ずしも図示されるものに限らない。また、保持部材４の位置も、必ずしも図示されるものに限らない。 The at least one holding member 4 among the plurality of holding members 4 provided on the turntable 1 has a base portion 40 formed in, for example, a long flat plate shape. And can be pivoted. Further, the base member 40 of the remaining holding member 4 is formed in a columnar shape, for example, and the base member 40 is fixedly arranged with respect to the turntable 1. In the following, when the two are distinguished, the former is also referred to as “movable holding member 4a”, and the latter is also referred to as “fixed holding member 4b”. As shown in the drawing, the movable holding member 4a is disposed at a position substantially opposite to the fixed holding member 4b. In the illustrated example, six holding members 4 are provided on the turntable 1, two of the six holding members 4 are movable holding members 4a, and the remaining four are fixedly held. Although the member 4b is provided, the total number of the holding members 4 and the number of the movable holding members 4a and the fixed holding members 4b are not necessarily illustrated. Further, the position of the holding member 4 is not necessarily limited to that illustrated.

可動保持部材４ａの基体部４０は、後述する駆動部８の駆動を受けて、回転台１の回転軸Ａ１に平行な軸である回動軸Ａ２を中心に、回動可能とされている。ただし、可動保持部材４ａの基体部４０においては、回動軸Ａ２から偏心した位置に、当接部材群４００が設けられる。したがって、基体部４０が回動軸Ａ２を中心に回動されると、当接部材群４００が、回転台１の回転軸Ａ１から、遠ざかったり近づいたりすることになる。すなわち、当該当接部材群４００が、回転台１上の基板Ｗの周縁と近接離間する方向に移動されることになる。 The base portion 40 of the movable holding member 4a is rotatable about a rotation axis A2 that is an axis parallel to the rotation axis A1 of the turntable 1 under the driving of the drive unit 8 described later. However, in the base portion 40 of the movable holding member 4a, the contact member group 400 is provided at a position eccentric from the rotation axis A2. Therefore, when the base portion 40 is rotated about the rotation axis A2, the contact member group 400 moves away from or approaches the rotation axis A1 of the turntable 1. That is, the contact member group 400 is moved in the direction of approaching and separating from the peripheral edge of the substrate W on the turntable 1.

可動保持部材４ａの当接部材群４００が、回転台１上の基板Ｗの周縁に近づく方向に移動されると（図１、および、図３の実線で示される状態）、基板Ｗの周縁に沿って配置された複数（図示の例では、１２個）の下方当接部材４１が、当該基板Ｗに下方から当接した状態となるとともに、同じく基板Ｗの周縁に沿って配置された複数（図示の例では、６個）の側方当接部材４２が、当該基板Ｗに側方から当接した状態となる。ただし、上述したとおり、固定保持部材４ｂは、可動保持部材４ａとほぼ対向するような位置に固定されているため、各可動保持部材４ａの側方当接部材４２が基板Ｗに側方から当接した状態において、基板Ｗは、当該側方当接部材４２と、これと対向配置されている固定保持部材４ｂの側方当接部材４２とに挟まれた状態となる。つまり、可動保持部材４ａの当接部材群４００が、基板Ｗの周縁に当接された状態とされることによって、当該基板Ｗは、複数の下方当接部材４１によって回転台１上に略水平姿勢で支持されるとともに、複数の側方当接部材４２によって挟まれて水平方向について規制された状態（保持状態）となる。一方、可動保持部材４ａの当接部材群４００が、基板Ｗの周縁から遠ざかる方向に移動されると（図２、および、図３の仮想線で示される状態）、基板Ｗの保持状態が解除され、基板Ｗは開放される。このように、基板保持装置１００においては、可動保持部材４ａの当接部材群４００が、回転台１上の基板Ｗの周縁に対して近接離間する方向に移動されることによって、一群の保持部材４による基板Ｗの保持と開放とが行われる。 When the contact member group 400 of the movable holding member 4a is moved in a direction approaching the periphery of the substrate W on the turntable 1 (a state indicated by a solid line in FIGS. 1 and 3), the contact member group 400 is moved to the periphery of the substrate W. A plurality (twelve in the illustrated example) of the lower contact members 41 are in contact with the substrate W from below and are also disposed along the periphery of the substrate W. In the illustrated example, six side contact members 42 are in contact with the substrate W from the side. However, as described above, since the fixed holding member 4b is fixed at a position substantially opposite to the movable holding member 4a, the side contact member 42 of each movable holding member 4a contacts the substrate W from the side. In the contacted state, the substrate W is sandwiched between the side contact member 42 and the side contact member 42 of the fixing holding member 4b disposed to face the substrate W. That is, when the contact member group 400 of the movable holding member 4 a is in contact with the peripheral edge of the substrate W, the substrate W is substantially horizontal on the turntable 1 by the plurality of lower contact members 41. In addition to being supported in a posture, it is in a state (held state) that is sandwiched between the plurality of side contact members 42 and restricted in the horizontal direction. On the other hand, when the contact member group 400 of the movable holding member 4a is moved in a direction away from the peripheral edge of the substrate W (the state indicated by the phantom lines in FIGS. 2 and 3), the holding state of the substrate W is released. Then, the substrate W is released. As described above, in the substrate holding apparatus 100, the contact member group 400 of the movable holding member 4 a is moved in the direction of approaching and separating from the peripheral edge of the substrate W on the turntable 1. The holding and releasing of the substrate W by 4 are performed.

＜２．駆動部８＞
次に、可動保持部材４ａの基体部４０を回動させる機構である駆動部８について、図１〜図３に加え、図４、図５を参照しながら説明する。図４は、可動保持部材４ａの構成を模式的に示す側面図である。図５は、可動保持部材４ａの構成を模式的に示す平面図である。 <2. Drive unit 8>
Next, the drive unit 8 that is a mechanism for rotating the base unit 40 of the movable holding member 4a will be described with reference to FIGS. 4 and 5 in addition to FIGS. FIG. 4 is a side view schematically showing the configuration of the movable holding member 4a. FIG. 5 is a plan view schematically showing the configuration of the movable holding member 4a.

可動保持部材４ａの基体部４０の下部には、鉛直に延在する回動軸体８１の上端が連結されている。また、回動軸体８１の下端には、回動軸体８１と同軸に配置された磁石保持部材８２が連結されている。磁石保持部材８２には、回動用磁石８２１が固定されている。 The upper end of the rotating shaft 81 extending vertically is connected to the lower portion of the base portion 40 of the movable holding member 4a. In addition, a magnet holding member 82 disposed coaxially with the rotation shaft 81 is connected to the lower end of the rotation shaft 81. A rotating magnet 821 is fixed to the magnet holding member 82.

回動軸体８１は、回転台１を上下に貫通し、回転台１に対して回動可能に配設される。つまり、基体部４０および磁石保持部材８２は、回転台１の上側と下側のそれぞれにおいて、回動軸体８１の軸心と一致する回動軸Ａ２を中心にして、同期して回動可能に配設されている。ただし、回動軸Ａ２は、回転台１の回転軸Ａ１と平行な軸となっている。また、上述したとおり、可動保持部材４ａの基体部４０に設けられた当接部材群４００は、回動軸Ａ２から偏心した位置に設けられる。具体的には、当接部材群４００は、例えば、基体部４０の上面の幾何学中心を挟んで、回動軸Ａ２と反対側に配置される。 The rotating shaft 81 penetrates the turntable 1 up and down and is arranged to be rotatable with respect to the turntable 1. That is, the base portion 40 and the magnet holding member 82 can be rotated synchronously around the rotation axis A2 that coincides with the axis of the rotation shaft 81 on each of the upper side and the lower side of the turntable 1. It is arranged. However, the rotation axis A2 is an axis parallel to the rotation axis A1 of the turntable 1. Further, as described above, the contact member group 400 provided on the base portion 40 of the movable holding member 4a is provided at a position eccentric from the rotation axis A2. Specifically, the contact member group 400 is disposed, for example, on the opposite side of the rotation axis A2 across the geometric center of the upper surface of the base body 40.

一方、図１、図２に示されるように、回転台１の下方には、円板８３が取り付けられている。円板８３の内部には、リング状磁石８３１が設けられている。リング状磁石８３１は、図１に示されるように、カップ２が上昇された状態において、可動保持部材４ａと連結されている回動用磁石８２１と略同一の水平面内に配置されるようになっている。 On the other hand, as shown in FIGS. 1 and 2, a disk 83 is attached below the turntable 1. Inside the circular plate 83, a ring-shaped magnet 831 is provided. As shown in FIG. 1, the ring-shaped magnet 831 is arranged in substantially the same horizontal plane as the rotating magnet 821 connected to the movable holding member 4 a when the cup 2 is raised. Yes.

また、回転台１の側方周囲を覆うカップ２の上部には、磁石保持部８４が取り付けられている。磁石保持部８４の内部には、可動保持部材４ａと同数個の補助磁石８４１が設けられている。各補助磁石８４１は、図３に模式的に示されるように、各可動保持部材４ａと対応付けて設けられている。また、回転台１は、各可動保持部材４ａと連結されている回動用磁石８２１が、対応する補助磁石８４１の側方に位置するような回転位置に停止するようになっている。さらに、各補助磁石８４１は、図２に示されるように、カップ２が下降された状態において、対応する可動保持部材４ａと連結されている回動用磁石８２１と略同一の水平面内に配置されるようになっている。 A magnet holding portion 84 is attached to the upper portion of the cup 2 that covers the side periphery of the turntable 1. Inside the magnet holding part 84, the same number of auxiliary magnets 841 as the movable holding member 4a are provided. Each auxiliary magnet 841 is provided in association with each movable holding member 4a as schematically shown in FIG. Further, the turntable 1 is stopped at a rotation position such that the turning magnet 821 connected to each movable holding member 4a is located to the side of the corresponding auxiliary magnet 841. Further, as shown in FIG. 2, each auxiliary magnet 841 is disposed in substantially the same horizontal plane as the rotating magnet 821 connected to the corresponding movable holding member 4a when the cup 2 is lowered. It is like that.

上記の構成を有する駆動部８は、回動用磁石８２１に外部から磁力を作用させることによって、磁石保持部材８２を回動させ、これによって、回動軸体８１を介して磁石保持部材８２と連結された基体部４０を回動させる。この態様について、図１〜図５に加え、図６、図７を参照しながら説明する。図６は、カップ２が上昇された状態における可動保持部材４ａ付近の様子を模式的に示す説明図である。図７は、カップ２が下降された状態における可動保持部材４ａ付近の様子を模式的に示す説明図である。 The drive unit 8 having the above configuration rotates the magnet holding member 82 by applying a magnetic force to the rotating magnet 821 from the outside, and is thereby connected to the magnet holding member 82 via the rotating shaft 81. The base portion 40 thus made is rotated. This aspect will be described with reference to FIGS. 6 and 7 in addition to FIGS. FIG. 6 is an explanatory view schematically showing the state of the vicinity of the movable holding member 4a when the cup 2 is raised. FIG. 7 is an explanatory view schematically showing a state in the vicinity of the movable holding member 4a when the cup 2 is lowered.

すなわち、カップ２がエアシリンダ２１の駆動を受けて上昇されると、リング状磁石８３１が、回動用磁石８２１の側方に位置する（図１、図６に示される状態）。この状態において、回動用磁石８２１は、リング状磁石８３１から大きな磁力の作用を受ける。いま、可動保持部材４ａにおいて、例えば、当接部材群４００が回転台１上の基板Ｗの周縁に当接された状態において、回動用磁石８２１のＳ極が回転台１の回転軸Ａ１に最も近づくような角度で、回動用磁石８２１が磁石保持部材８２に対して取り付けられているとする。また、リング状磁石８３１が、外周側にＮ極、内周側にＳ極をもつものであるとする。この例において、カップ２が上昇されると、回動用磁石８２１の付近には、回転台１の回転軸Ａ１から遠ざかる磁力線にて表される磁界が形成される（図６の矢印ＡＲ１）。これに応じて、回動用磁石８２１は、そのＳ極が、回転台１の回転軸Ａ１の側に引き寄せられ、これによって、可動保持部材４ａが、回動軸Ａ２を中心に回動する。上述したとおり、可動保持部材４ａにおいては当接部材群４００が、回動軸Ａ２に対して偏心配置されており、可動保持部材４ａが回動軸Ａ２を中心に回動することによって、当接部材群４００が、回転台１の回転軸Ａ１に近づくように移動される（図３の実線で示される状態）。 That is, when the cup 2 is lifted by the drive of the air cylinder 21, the ring-shaped magnet 831 is positioned on the side of the rotating magnet 821 (the state shown in FIGS. 1 and 6). In this state, the rotating magnet 821 receives a large magnetic force from the ring magnet 831. Now, in the movable holding member 4 a, for example, when the contact member group 400 is in contact with the peripheral edge of the substrate W on the turntable 1, the S pole of the turning magnet 821 is the most on the rotation axis A1 of the turntable 1. It is assumed that the rotating magnet 821 is attached to the magnet holding member 82 at such an angle as to approach. Further, it is assumed that the ring-shaped magnet 831 has an N pole on the outer peripheral side and an S pole on the inner peripheral side. In this example, when the cup 2 is raised, a magnetic field represented by a magnetic field line moving away from the rotation axis A1 of the turntable 1 is formed in the vicinity of the turning magnet 821 (arrow AR1 in FIG. 6). Accordingly, the south pole of the rotating magnet 821 is drawn toward the rotating shaft A1 side of the turntable 1, whereby the movable holding member 4a rotates around the rotating shaft A2. As described above, in the movable holding member 4a, the contact member group 400 is arranged eccentrically with respect to the rotation axis A2, and the movable holding member 4a rotates around the rotation axis A2, thereby contacting the movable holding member 4a. The member group 400 is moved so as to approach the rotation axis A1 of the turntable 1 (state shown by the solid line in FIG. 3).

一方、カップ２がエアシリンダ２１の駆動を受けて下降されると、リング状磁石８３１が、回動用磁石８２１の下方に位置するとともに、補助磁石８４１が回動用磁石８２１の側方に位置する（図２、図７に示される状態）。すると、回動用磁石８２１の付近に配置される磁界の方向が逆になる。すなわち、この状態においては、リング状磁石８３１からの磁力線は、Ｎ極からカップ２に向かって進んだ後、向きを変えて、回動用磁石８２１の位置では、ほぼカップ２から回転台１の回転軸Ａ１に向かって進むこととなる（図７の矢印ＡＲ２）。これに応じて、回動用磁石８２１は、そのＳ極が、回転台１の回転軸Ａ１から離れる方向を向こうとし、これによって、可動保持部材４ａが、回動軸Ａ２を中心に、カップ上昇時とは逆の方向に回動する。可動保持部材４ａが当該方向に回動することによって、可動保持部材４ａの当接部材群４００が、回転台１の回転軸Ａ１から遠ざかるように移動される（図３の一点鎖線で示される状態）。 On the other hand, when the cup 2 is lowered by the driving of the air cylinder 21, the ring-shaped magnet 831 is positioned below the rotating magnet 821, and the auxiliary magnet 841 is positioned on the side of the rotating magnet 821 ( (The state shown in FIGS. 2 and 7). Then, the direction of the magnetic field arranged in the vicinity of the rotating magnet 821 is reversed. That is, in this state, the magnetic field lines from the ring-shaped magnet 831 travel from the N pole toward the cup 2 and then change the direction so that the rotation of the turntable 1 from the cup 2 is substantially performed at the position of the rotating magnet 821. It will proceed toward the axis A1 (arrow AR2 in FIG. 7). In response to this, the rotating magnet 821 tends to move its south pole away from the rotation axis A1 of the turntable 1, so that the movable holding member 4a is centered on the rotation axis A2 when the cup is raised. It rotates in the opposite direction. When the movable holding member 4a rotates in this direction, the contact member group 400 of the movable holding member 4a is moved away from the rotation axis A1 of the turntable 1 (a state indicated by a one-dot chain line in FIG. 3). ).

また、この例では、補助磁石８４１が、回転台１の中心側にＮ極を向けて配置されているとする。したがって、カップ２が下降した状態において、回動用磁石８２１の付近において、補助磁石８４１からの磁力線は、カップ２から回転台１の回転軸Ａ１に向かって進むこととなる（図７の矢印ＡＲ３）。つまり、回動用磁石８２１は、そのＳ極を回転台１の回転軸Ａ１から離れる方向に向かわせる力を、補助磁石８４１が形成する磁界からも受けることとなる。これによって、可動保持部材４ａは、確実に、回転台１の回転軸Ａ１から遠ざかる方向に移動されることになる。 In this example, it is assumed that the auxiliary magnet 841 is arranged with the N pole facing the center side of the turntable 1. Therefore, in the state where the cup 2 is lowered, the magnetic lines of force from the auxiliary magnet 841 travel from the cup 2 toward the rotation axis A1 of the turntable 1 in the vicinity of the turning magnet 821 (arrow AR3 in FIG. 7). . In other words, the rotating magnet 821 receives a force from the magnetic field formed by the auxiliary magnet 841 to direct the S pole in a direction away from the rotation axis A1 of the turntable 1. Thereby, the movable holding member 4a is reliably moved in the direction away from the rotation axis A1 of the turntable 1.

＜３．当接部材群４００＞
次に、各保持部材４が備える当接部材群４００について、図１〜図７に加え、図８を参照しながら具体的に説明する。図８は、当接部材群４００の構成を模式的に示す斜視図である。なお、上述したとおり、保持部３が備える複数の保持部材４の一部は可動保持部材４ａとされ、残りは固定保持部材４ｂとされているが、各保持部材４ａ，４ｂが備える当接部材群４００の構成は同じである。 <3. Contact member group 400>
Next, the contact member group 400 included in each holding member 4 will be specifically described with reference to FIG. 8 in addition to FIGS. FIG. 8 is a perspective view schematically showing the configuration of the contact member group 400. As described above, a part of the plurality of holding members 4 provided in the holding unit 3 is the movable holding member 4a, and the rest is the fixed holding member 4b, but the abutting members provided in the holding members 4a and 4b are provided. The configuration of the group 400 is the same.

当接部材群４００には、２個の下方当接部材４１，４１と１個の側方当接部材４２とが含まれる。これら各部材４１，４１，４２は、図３、図８などに示されるように、下方当接部材４１、側方当接部材４２、下方当接部材４１という順番で（すなわち、２個の下方当接部材４１，４１の間に、側方当接部材４２が配置されるように）、回転台１上の基板Ｗの周縁にほぼ沿うように、配列される。この配列態様によると、基板Ｗを安定して保持することができる。 The contact member group 400 includes two lower contact members 41 and 41 and one side contact member 42. As shown in FIGS. 3 and 8, the members 41, 41, and 42 are arranged in the order of a lower contact member 41, a side contact member 42, and a lower contact member 41 (that is, two lower members). The side abutting members 42 are arranged between the abutting members 41, 41) and are arranged so as to be substantially along the periphery of the substrate W on the turntable 1. According to this arrangement mode, the substrate W can be stably held.

側方当接部材４２と、その両側にそれぞれ配置されている各下方当接部材４１とは、回転台１上の基板Ｗの周縁方向について、間隔をあけて設けられる（ただし、ここでいう「周縁方向」とは、回転台１上の基板Ｗの周縁のうち、着目している当接部材群４００が当接される周縁部分の、延在方向である）。つまり、側方当接部材４２と各下方当接部材４１とは、基板Ｗの回転中心Ａ１０（回転台１上に保持されて回転される基板Ｗの回転中心）から見て、重ならないように、間隔をあけて設けられる。したがって、基板Ｗの回転中心Ａ１０から見て、側方当接部材４２と各下方当接部材４１との間には、隙間ｇが形成されることになる。 The side abutting members 42 and the respective lower abutting members 41 arranged on both sides of the side abutting members 42 are provided at intervals in the peripheral direction of the substrate W on the turntable 1 (here, “ The “peripheral direction” is the extending direction of the peripheral portion of the peripheral edge of the substrate W on the turntable 1 where the contact member group 400 of interest is in contact with. That is, the side contact member 42 and each lower contact member 41 do not overlap each other when viewed from the rotation center A10 of the substrate W (the rotation center of the substrate W that is held and rotated on the turntable 1). , Provided at intervals. Therefore, when viewed from the rotation center A10 of the substrate W, a gap g is formed between the side contact member 42 and each lower contact member 41.

下方当接部材４１は、基板Ｗに、下方から当接する部材である。ただし、下方当接部材４１は、下方のみから基板Ｗに当接し、基板Ｗの側方および上方からは当接しない。具体的には、例えば、下方当接部材４１は、基板Ｗのエッジの下側部分のみに当接し、当該エッジの側面部分および上側部分には当接しない（図９参照）。すなわち、下方当接部材４１は、基板Ｗの側方および上方を塞がない。 The lower contact member 41 is a member that contacts the substrate W from below. However, the lower abutting member 41 abuts on the substrate W only from below, and does not abut from the side and above the substrate W. Specifically, for example, the lower contact member 41 contacts only the lower part of the edge of the substrate W and does not contact the side surface part and the upper part of the edge (see FIG. 9). That is, the lower contact member 41 does not block the side and upper side of the substrate W.

下方当接部材４１は、具体的には、例えば、基体部４０の上面に略垂直に立設された平面視矩形状の柱状部材であり、その上側の面が、回転台１の回転軸Ａ１に近づくにつれて（すなわち、回転台１上の基板Ｗの中心に近づくにつれて）、下方に傾斜する傾斜面４１１とされる。この傾斜面４１１は、具体的には、例えば、その一対の辺が、回転台１上の基板Ｗの周縁方向とほぼ平行となるように配設され、当該一対の辺のうち、回転軸Ａ１に近い側の辺が、他方の辺より低い高さ位置におかれる。 Specifically, the lower abutting member 41 is, for example, a columnar member having a rectangular shape in a plan view that is erected substantially perpendicularly to the upper surface of the base portion 40, and the upper surface thereof is the rotation axis A <b> 1 of the turntable 1. (Ie, as it approaches the center of the substrate W on the turntable 1), the inclined surface 411 is inclined downward. Specifically, the inclined surface 411 is disposed such that, for example, a pair of sides thereof is substantially parallel to the peripheral direction of the substrate W on the turntable 1, and the rotation axis A1 is included in the pair of sides. The side closer to is placed at a lower height than the other side.

この下方当接部材４１は、傾斜面４１１内の一部領域において基板Ｗと当接し、下方当接部材４１と基板Ｗとの接触領域が略線状の領域となる。この構成によると、例えば、基板Ｗと面状の領域で接触する場合と比べて、後述する振り切り乾燥において、基板Ｗと下方当接部材４１との間の液滴が、基板Ｗ外に排出されやすい。また、基板Ｗと点状の領域で接触する場合と比べて、摩耗しにくい。さらに、下方当接部材４１はその傾斜面４１１の各部分において、異なる高さ位置で基板Ｗと当接可能であるので、回転台１上に設けられる各下方当接部材４１同士の高さ位置を合わせる調整作業において、許容される誤差範囲が比較的大きくなる。したがって、当該調整作業が簡易化される。 The lower contact member 41 is in contact with the substrate W in a partial region within the inclined surface 411, and the contact region between the lower contact member 41 and the substrate W is a substantially linear region. According to this configuration, for example, droplets between the substrate W and the lower abutting member 41 are discharged out of the substrate W in the swing-off drying described later, as compared with the case where the substrate W is in contact with the planar region. Cheap. In addition, it is less likely to wear compared to the case where the substrate W is contacted in a dotted area. Furthermore, since the lower contact member 41 can contact the substrate W at different height positions in each portion of the inclined surface 411, the height positions of the lower contact members 41 provided on the turntable 1 are in contact with each other. In the adjustment operation for adjusting the above, the allowable error range becomes relatively large. Therefore, the adjustment work is simplified.

なお、図示されている下方当接部材４１においては、基体部４０の上面に略垂直に立設された平面視矩形状の柱状部材の上端面が傾斜面４１１となっている（つまり、直方体の形状部分の上に、直角三角柱（底面が直角三角形の三角柱）を横向きにした形状部分が重ねられた形となっている）が、この直方体の形状部分は必ずしも設けなくともよい。すなわち、下方当接部材４１は、直角三角柱を横向きにした形状の部材を、基体部４０に直接に配置したものであってもよい。 In the illustrated lower abutting member 41, the upper end surface of the columnar member in a plan view that is erected substantially perpendicularly to the upper surface of the base portion 40 is an inclined surface 411 (that is, a rectangular parallelepiped). A rectangular triangular prism (a triangular prism whose bottom surface is a right triangular triangle) is horizontally placed on the shape portion), but the rectangular shape shape portion is not necessarily provided. In other words, the lower abutting member 41 may be a member in which a member having a right triangular prism arranged sideways is arranged directly on the base portion 40.

側方当接部材４２は、基板Ｗに、側方から当接する部材である。ただし、側方当接部材４２は、側方のみから基板Ｗに当接し、基板Ｗの下方および上方からは当接しない。具体的には、例えば、側方当接部材４２は、基板Ｗのエッジの側面部分のみに当接し、当該エッジの下側部分および上側部分には当接しない（図１０参照）。すなわち、側方当接部材４２は、基板Ｗの下方および上方を塞がない。 The side contact member 42 is a member that contacts the substrate W from the side. However, the side contact member 42 contacts the substrate W only from the side, and does not contact from below or above the substrate W. Specifically, for example, the side contact member 42 contacts only the side surface portion of the edge of the substrate W, and does not contact the lower portion and the upper portion of the edge (see FIG. 10). That is, the side contact member 42 does not block the lower and upper sides of the substrate W.

側方当接部材４２は、具体的には、例えば、基体部４０の上面に略垂直に立設された、平面視半円形状の柱状部材であり、基体部４０に対して略垂直に延在する平坦な側壁面４２１を、回転台１の回転軸Ａ１側に向けるとともに、当該側壁面４２１が、回転台１上の基板Ｗの周縁方向とほぼ平行に延在するように配設される。側方当接部材４２は、この側壁面４２１内の一部領域において、基板Ｗに、側方から当接することになる。以下、当該側壁面４２１を「当接面４２１」ともいう。 Specifically, the side abutting member 42 is, for example, a columnar member having a semicircular shape in a plan view and standing substantially vertically on the upper surface of the base portion 40, and extends substantially perpendicular to the base portion 40. An existing flat side wall surface 421 is directed to the rotation axis A1 side of the turntable 1, and the side wall surface 421 is disposed so as to extend substantially parallel to the peripheral direction of the substrate W on the turntable 1. . The side contact member 42 contacts the substrate W from the side in a partial region in the side wall surface 421. Hereinafter, the side wall surface 421 is also referred to as a “contact surface 421”.

側方当接部材４２には、さらに、当接面４２１と、これと逆側の面（円弧状に湾曲した面であり、以下「湾曲面」ともいう）４２２とを連通するとともに、側方当接部材４２の上面にも開口した、溝状の連通部４３が形成されている。連通部４３は、例えば、対向する一対の内側壁が平行に延在するストレート形状とされる。連通部４３は、好ましくは、回転台１上の基板Ｗの周縁方向に沿う方向を幅方向として、側方当接部材４２の幅方向の中央付近に形成される。 The side abutting member 42 further communicates with the abutting surface 421 and a surface opposite to the abutting surface 421 (which is a surface curved in an arc shape, hereinafter also referred to as “curved surface”) 422, A groove-shaped communication portion 43 that is also opened on the upper surface of the contact member 42 is formed. For example, the communication portion 43 has a straight shape in which a pair of opposing inner walls extend in parallel. The communication portion 43 is preferably formed in the vicinity of the center in the width direction of the side contact member 42 with the direction along the peripheral direction of the substrate W on the turntable 1 being the width direction.

連通部４３が形成されることによって、後述する振り切り乾燥において、基板Ｗに付着している液滴を、連通部４３を介して、基板Ｗの外部に排出することができる。特に、連通部４３の形状を、側方当接部材４２の上面にも開口した溝状とすることによって、連通部４３内に流入した液滴を、速やかに排出することができる。ひいては、基板Ｗに付着している液滴を、速やかに、基板Ｗの外部に排出することができる。 By forming the communication part 43, droplets adhering to the substrate W can be discharged to the outside of the substrate W through the communication part 43 in shake-off drying described later. In particular, when the shape of the communication portion 43 is a groove shape that is also opened on the upper surface of the side contact member 42, the liquid droplets that have flowed into the communication portion 43 can be quickly discharged. As a result, the droplets adhering to the substrate W can be quickly discharged out of the substrate W.

なお、図示の例では、連通部４３の底面は基体部４０の上面まで到達しているが、連通部４３の底面は、必ずしも基体部４０の上面まで到達している必要はなく、回転台１上の基板Ｗの下面Ｈ（図４参照）以下の高さ位置（すなわち、当該下面Ｈと同一か、これよりも下側の任意の高さ位置）とすることができる。当該底面を、基板Ｗの下面Ｈ以下の高さ位置としておけば、後述する振り切り乾燥において、基板Ｗと側方当接部材４２との間の液残りをさらに低減することができる。また、連通部４３の底面は、当接面４２１から湾曲面４２２に向かうにつれて（すなわち、回転台１の回転軸Ａ１から遠ざかるにつれて）、下方に傾斜した傾斜面とされてもよい。この構成によると、連通部４３内に流入して当接面４２１側から湾曲面４２２側に向けて流れる液滴の流速が速まり、当該液滴の排出を速やかに行うことができる。また、連通部４３の内側面には、当該液滴の排出を速やかに行うための各種の処理（例えば、平滑度を向上させるための表面処理など）が、施されていることも好ましい。 In the illustrated example, the bottom surface of the communication portion 43 reaches the top surface of the base portion 40, but the bottom surface of the communication portion 43 does not necessarily reach the top surface of the base portion 40, and the turntable 1 It can be set to a height position below the lower surface H (see FIG. 4) of the upper substrate W (that is, an arbitrary height position that is the same as or lower than the lower surface H). If the bottom surface is set to a height position equal to or lower than the lower surface H of the substrate W, the remaining liquid between the substrate W and the side contact member 42 can be further reduced in swing-off drying described later. Further, the bottom surface of the communication portion 43 may be an inclined surface that is inclined downward as it goes from the contact surface 421 toward the curved surface 422 (that is, away from the rotation axis A1 of the turntable 1). According to this configuration, the flow velocity of the liquid that flows into the communication portion 43 and flows from the contact surface 421 side toward the curved surface 422 is increased, and the liquid droplets can be discharged quickly. Moreover, it is also preferable that various treatments (for example, surface treatment for improving smoothness) for quickly discharging the droplets are performed on the inner surface of the communication portion 43.

＜４．動作＞
次に、基板保持装置１００を用いる基板処理装置の動作について、図１〜図３等を参照しながら説明する。 <4. Operation>
Next, the operation of the substrate processing apparatus using the substrate holding apparatus 100 will be described with reference to FIGS.

カップ２が下方に配置され、各可動保持部材４ａの当接部材群４００が回転台１の回転軸Ａ１から遠ざかった位置に配置されている状態において、図示しない搬送装置によって基板処理装置に基板Ｗが搬入されると、当該搬入された基板Ｗは、複数の固定保持部材４ｂの各下方当接部材４１によって、回転台１上に支持された状態とされる（図２に示される状態）。 In a state where the cup 2 is disposed below and the contact member group 400 of each movable holding member 4a is disposed at a position away from the rotation axis A1 of the turntable 1, the substrate W is placed on the substrate processing apparatus by a transport device (not shown). When the substrate W is loaded, the loaded substrate W is supported on the turntable 1 by the lower contact members 41 of the plurality of fixed holding members 4b (the state shown in FIG. 2).

続いて、カップ２が、エアシリンダ２１の駆動を受けて上昇される。すると、各可動保持部材４ａが回動されて、可動保持部材４ａの当接部材群４００が回転台１の回転軸Ａ１に近づくように移動され、各可動保持部材４ａの当接部材群４００が、基板Ｗに当接した状態となる。これによって、複数の下方当接部材４１の全てが、当該基板Ｗに下方から当接した状態となるとともに、複数の側方当接部材４２の全てが、当該基板Ｗに側方から当接した状態となり、当該基板Ｗは、回転台１上に略水平姿勢で支持されるとともに、水平方向について規制された保持状態となる（図１に示される状態）。 Subsequently, the cup 2 is raised by the driving of the air cylinder 21. Then, each movable holding member 4a is rotated, and the contact member group 400 of the movable holding member 4a is moved so as to approach the rotation axis A1 of the turntable 1, so that the contact member group 400 of each movable holding member 4a is moved. Then, it comes into contact with the substrate W. As a result, all of the plurality of lower contact members 41 are in contact with the substrate W from below, and all of the plurality of side contact members 42 are in contact with the substrate W from the side. The substrate W is supported in a substantially horizontal posture on the turntable 1 and is in a holding state regulated in the horizontal direction (the state shown in FIG. 1).

基板Ｗが保持されると、モータ１１の駆動によって、回転台１が、回転軸Ａ１を中心に回転されるとともに、基板Ｗ上にブラシ（図示省略）が回転しつつ当接される。これによって、基板Ｗの上面に洗浄処理が施される。このとき、基板Ｗの面内におけるブラシが接触する部分には、処理液（具体的には、例えば、純水）が供給されており、ブラシによって除去されたパーティクルなどが当該処理液によって基板Ｗの外周方向に押し流される。所定時間が経過すると、ブラシが基板Ｗから離間された上で、回転台１がさらに所定時間回転される。すると、基板Ｗ上の処理液が、回転に伴う遠心力で振り切られ、これによって、基板Ｗが乾燥される（振り切り乾燥）。 When the substrate W is held, the turntable 1 is rotated about the rotation axis A1 by the drive of the motor 11, and a brush (not shown) is brought into contact with the substrate W while rotating. As a result, a cleaning process is performed on the upper surface of the substrate W. At this time, a processing liquid (specifically, for example, pure water) is supplied to a portion of the substrate W in contact with the brush, and particles removed by the brush are transferred to the substrate W by the processing liquid. It is pushed away in the outer circumferential direction. When the predetermined time elapses, the turntable 1 is further rotated for a predetermined time after the brush is separated from the substrate W. Then, the processing liquid on the substrate W is shaken off by the centrifugal force accompanying the rotation, and thereby the substrate W is dried (shake-off drying).

上述したとおり、基板保持装置１００においては、複数の保持部材４が回転台１上に基板Ｗを保持するところ、各保持部材４において、基板Ｗに下方から当接する部材（下方当接部材４１）と基板Ｗに側方から当接する部材（側方当接部材４２）とが、別部材で構成される。そして、側方当接部材４２と下方当接部材４１とが、基板Ｗの回転中心Ａ１０から見て、重ならないように、間隔をあけて設けられる。この構成によると、振り切り乾燥において、基板Ｗと各保持部材４との間の液残りを低減できる。すなわち、回転される基板Ｗにおける下方当接部材４１に当接される部分付近に付着した液滴は、図９（図５の矢印Ｋ１方向から見た断面図）に模式的に示されるように、側方当接部材４２に邪魔されることなく、回転に伴う遠心力によって、回転径方向に振り飛ばされて、基板Ｗから振り切られる。また、回転される基板Ｗにおける側方当接部材４２に当接される部分付近に付着した液滴は、図１０（図５の矢印Ｋ２方向から見た断面図）に示されるように、下方当接部材４１に邪魔されることなく、当該液滴の一部は重力によって下方に落下し、残りは遠心力によって連通部４３を介して振り切られる。つまり、下方当接部材４１と基板Ｗとの間には液滴が残りにくく、側方当接部材４２と基板Ｗとの間にも液滴が残りにくい。例えば、基板Ｗと、これを保持する部材との間に、基板Ｗの下方側と側方側との両方が塞がっている隙間が存在する場合、当該隙間に流入した液滴は、回転に伴う遠心力と重力とのいずれの力を受けても基板Ｗ外に排出されにくいために、液残りとなりやすいところ、この実施の形態に係る基板保持装置１００には、このような隙間が存在しないために、液残りが生じにくい。 As described above, in the substrate holding apparatus 100, the plurality of holding members 4 hold the substrate W on the turntable 1. In each holding member 4, the member that contacts the substrate W from below (the lower contact member 41). And the member that abuts the substrate W from the side (side abutting member 42) are configured as separate members. The side abutting member 42 and the lower abutting member 41 are provided at an interval so as not to overlap each other when viewed from the rotation center A10 of the substrate W. According to this configuration, the remaining liquid between the substrate W and each holding member 4 can be reduced in the swing-off drying. That is, as shown schematically in FIG. 9 (a cross-sectional view seen from the direction of arrow K1 in FIG. 5), the droplets adhering to the vicinity of the portion of the rotating substrate W that is in contact with the lower contact member 41 are schematically shown. Without being obstructed by the side contact member 42, it is shaken off from the substrate W by being swung off in the radial direction by the centrifugal force accompanying the rotation. Further, the droplets adhering to the vicinity of the portion of the rotating substrate W that is in contact with the side contact member 42, as shown in FIG. 10 (sectional view viewed from the direction of the arrow K2 in FIG. 5), Without being disturbed by the contact member 41, a part of the liquid droplet falls downward due to gravity, and the rest is shaken off through the communication part 43 by centrifugal force. That is, it is difficult for droplets to remain between the lower contact member 41 and the substrate W, and it is difficult for droplets to remain between the side contact member 42 and the substrate W. For example, when there is a gap between the substrate W and a member that holds the substrate, both the lower side and the side of the substrate W are closed, the droplets that flow into the gap are accompanied by rotation. Even if it receives any force of centrifugal force and gravity, it is difficult to be discharged out of the substrate W, so that it is likely that liquid remains. However, there is no such gap in the substrate holding device 100 according to this embodiment. In addition, liquid residue is unlikely to occur.

ただし、基板保持装置１００においては、下方当接部材４１と側方当接部材４２とは、共通の基体部４０に配設されつつ、互いに離間して配置されている。例えば、これらの両部材を、共通の基体部上に設けずに完全にバラバラに配設した場合、各部材を基板Ｗの周縁から近接離間する方向に移動させる機構を個別に設ける必要が出てくるところ、この実施の形態に係る基板保持装置１００では、下方当接部材４１と側方当接部材４２とを共通の基体部４０に配設することによって、これら両部材４１，４２を基板Ｗの周縁から近接離間する方向に移動させる機構を簡素化することができる。 However, in the substrate holding device 100, the lower contact member 41 and the side contact member 42 are disposed apart from each other while being disposed on the common base portion 40. For example, when these two members are disposed completely apart from each other without being provided on a common base portion, it is necessary to individually provide a mechanism for moving each member in the direction of approaching and separating from the periphery of the substrate W. In the substrate holding device 100 according to the present embodiment, the lower contact member 41 and the side contact member 42 are disposed on the common base portion 40, so that both the members 41 and 42 are mounted on the substrate W. It is possible to simplify the mechanism for moving in the direction of approaching and separating from the peripheral edge.

振り切り乾燥が完了すると、カップ２が、エアシリンダ２１の駆動を受けて下降される。すると、各可動保持部材４ａが先の回動とは逆向きに回動され、各可動保持部材４ａの当接部材群４００が回転台１の回転軸Ａ１から遠ざかるように移動される。すると、各可動保持部材４ａの当接部材群４００が、基板Ｗの外縁部から離間する。これによって、基板Ｗが開放された状態となる。基板Ｗが開放されると、図示しない搬送装置が、当該基板Ｗを基板処理装置から搬出する。 When the swing-off drying is completed, the cup 2 is lowered under the drive of the air cylinder 21. Then, each movable holding member 4a is rotated in the opposite direction to the previous rotation, and the contact member group 400 of each movable holding member 4a is moved away from the rotation axis A1 of the turntable 1. Then, the contact member group 400 of each movable holding member 4 a is separated from the outer edge portion of the substrate W. As a result, the substrate W is opened. When the substrate W is opened, a transfer device (not shown) carries the substrate W out of the substrate processing apparatus.

＜５．下方当接部材の別の構成例＞
下方当接部材４１の構成は、必ずしも上述したものに限らない。以下において、下方当接部材４１の別の構成例について説明する。 <5. Another configuration example of the lower contact member>
The configuration of the lower contact member 41 is not necessarily limited to that described above. Hereinafter, another configuration example of the lower contact member 41 will be described.

＜i．下方当接部材４１ａ＞
図１１には、第２の構成例に係る下方当接部材４１ａを含む当接部材群が例示されている。第２の構成例に係る下方当接部材４１ａは、基体部４０の上面に略垂直に立設された平面視矩形状の柱状部材であり、その上側の面は、回転台１の回転軸Ａ１に向かって延在する（すなわち、回転台１上の基板Ｗの周縁方向とほぼ直交する方向に延在する）頂辺４１２を中心として、その両側が下方に傾斜した形状の屈折面４１３とされる。 <I. Lower contact member 41a>
FIG. 11 illustrates a contact member group including a lower contact member 41a according to the second configuration example. The lower abutting member 41a according to the second configuration example is a columnar member having a rectangular shape in a plan view and standing substantially vertically on the upper surface of the base portion 40, and the upper surface thereof is the rotation axis A1 of the turntable 1. A refracting surface 413 having a shape in which both sides thereof are inclined downward with respect to the top side 412 extending in the direction (that is, extending in a direction substantially orthogonal to the peripheral direction of the substrate W on the turntable 1). The

この下方当接部材４１ａは、屈折面４１３の頂辺４１２において、基板Ｗに下方から当接する。したがって、下方当接部材４１ａと基板Ｗとの接触領域は、略線状の領域となる。この構成によると、基板Ｗと面状の領域で接触する場合と比べて、振り切り乾燥において基板Ｗと下方当接部材４１ａとの間の液滴が、基板外に排出されやすい。特に、頂辺４１２が、回転台１の回転軸Ａ１に向かって延在するので、回転に伴う遠心力を受けて回転軸Ａ１から離れる方向に流れてくる液滴の流れが、下方当接部材４１ａとの接触部分によって妨げられにくく、基板Ｗに付着している液滴が、特に速やかに、基板外に排出される。また、基板Ｗと点状の領域で接触する場合と比べて、摩耗しにくいという利点もある。 The lower contact member 41 a contacts the substrate W from below at the top side 412 of the refractive surface 413. Therefore, the contact area between the lower contact member 41a and the substrate W is a substantially linear area. According to this configuration, compared to the case where the substrate W is brought into contact with the planar area, droplets between the substrate W and the lower contact member 41a are easily discharged out of the substrate in the swing-off drying. In particular, since the apex 412 extends toward the rotation axis A1 of the turntable 1, the flow of liquid droplets flowing in the direction away from the rotation axis A1 due to the centrifugal force associated with the rotation is the lower abutting member. The liquid droplets that are not easily disturbed by the contact portion with 41a and adhere to the substrate W are discharged out of the substrate particularly quickly. In addition, there is an advantage that the substrate W is less likely to be worn as compared with the case where the substrate W is in contact with the dotted region.

なお、図示されている下方当接部材４１ａにおいては、基体部４０の上面に略垂直に立設された平面視矩形状の柱状部材の上端面が屈折面４１３となっている（つまり、直方体の形状部分の上に、三角柱を横向きにした形状部分が重ねられた形となっている）が、この直方体の形状部分は必ずしも設けなくともよい。すなわち、下方当接部材４１ａは、三角柱を横向きにした形状の部材を、基体部４０に直接に配置したものであってもよい。 In the illustrated lower abutting member 41a, the upper end surface of a columnar member having a rectangular shape in plan view standing upright substantially on the upper surface of the base portion 40 is a refracting surface 413 (that is, a rectangular parallelepiped). The shape portion is formed by superimposing the shape portion of the triangular prism on the shape portion), but the shape portion of the rectangular parallelepiped is not necessarily provided. That is, the lower abutting member 41a may be a member in which a member having a triangular prism formed sideways is arranged directly on the base body portion 40.

＜ii．下方当接部材４１ｂ＞
図１２には、第３の構成例に係る下方当接部材４１ｂを含む当接部材群が例示されている。第３の構成例に係る下方当接部材４１ｂは、先細りの形状（テーパー形状）の上端部４１４を備える。具体的には、例えば、下方当接部材４１ｂは、基体部４０の上面に対して略垂直に立設された、円錐形状の部材により構成される。 <Ii. Lower contact member 41b>
FIG. 12 illustrates a contact member group including a lower contact member 41b according to the third configuration example. The lower contact member 41b according to the third configuration example includes an upper end portion 414 having a tapered shape (tapered shape). Specifically, for example, the lower contact member 41 b is configured by a conical member that is erected substantially perpendicular to the upper surface of the base body portion 40.

この下方当接部材４１ｂは、先細りの形状とされる上端部４１４の頂部において、基板Ｗに、下方から当接する。したがって、下方当接部材４１ｂと基板Ｗとの接触領域が小さく抑えられる。特に、下方当接部材４１ｂの上端部４１４が錐体とされている場合、当該接触領域は、略点状の領域となる。この構成によると、基板Ｗと面状、あるいは、略線状の領域で接触する場合と比べて、振り切り乾燥において基板Ｗと下方当接部材４１ｂとの間の液滴が、特に基板外に排出されやすい。また、回転に伴う遠心力を受けて回転軸Ａ１から離れる方向に流れてくる液滴の流れが、下方当接部材４１ｂとの接触部分によって妨げられにくく、基板Ｗに付着している液滴が、特に速やかに、基板外に排出される。 The lower contact member 41b comes into contact with the substrate W from below at the top of the upper end portion 414 having a tapered shape. Therefore, the contact area between the lower contact member 41b and the substrate W can be kept small. In particular, when the upper end portion 414 of the lower contact member 41b is a cone, the contact area is a substantially dot-shaped area. According to this configuration, compared with the case where the substrate W is in contact with the planar or substantially linear region, the droplets between the substrate W and the lower contact member 41b are discharged to the outside of the substrate in the swing-off drying. Easy to be. Further, the flow of the liquid droplets flowing in the direction away from the rotation axis A1 due to the centrifugal force accompanying the rotation is not easily disturbed by the contact portion with the lower contact member 41b, and the liquid droplets adhering to the substrate W In particular, it is discharged quickly from the substrate.

なお、下方当接部材４１ｂは、必ずしも円錐形状である必要はなく、各種の錐体（四角錐、三角錐、楕円錐など）により構成されてもよい。また、下方当接部材４１ｂは、必ずしも全体が錐体形状である必要はなく、少なくとも上端部が、先細りの形状であればよい。例えば、下方当接部材４１ｂは、基体部４０の上面に略垂直に立設された柱状部材の上端面に、錐体状の突起部分が形成されたものであってもよい。 Note that the lower abutting member 41b does not necessarily have a conical shape, and may be formed of various types of cones (such as a quadrangular pyramid, a triangular pyramid, and an elliptical cone). Further, the lower contact member 41b does not necessarily have a cone shape as a whole, and at least the upper end portion only needs to be a tapered shape. For example, the lower abutting member 41 b may be a member in which a cone-shaped protrusion is formed on the upper end surface of a columnar member that is erected substantially perpendicularly to the upper surface of the base portion 40.

＜６．側方当接部材の別の構成例＞
側方当接部材４２の構成は、必ずしも上述したものに限らない。以下において、側方当接部材４２の別の構成例について説明する。 <6. Another configuration example of the side contact member>
The configuration of the side contact member 42 is not necessarily limited to that described above. In the following, another configuration example of the side contact member 42 will be described.

＜i．側方当接部材４２ａ＞
図１３には、第２の構成例に係る側方当接部材４２ａを含む当接部材群が例示されている。第２の構成例に係る側方当接部材４２ａにも、上記の実施の形態に係る側方当接部材４２と同様、当接面４２１ａと湾曲面４２２ａとを連通するとともに、側方当接部材４２ａの上面にも開口した、溝状の連通部４３ａが形成される。ただし、回転台１上の基板Ｗの周縁方向に沿う方向を幅方向として、この連通部４３ａは、その幅方向の寸法が、当接面４２１ａから湾曲面４２２ａに向かうにつれて大きくなる形状とされる。つまり、連通部４３ａは、当接面４２１ａから湾曲面４２２ａに向かうにつれて（すなわち、回転台１の回転軸Ａ１から離れるにつれて）、断面積が大きくなる形状（所謂、拡開形状）とされる。 <I. Side contact member 42a>
FIG. 13 illustrates a contact member group including a side contact member 42a according to the second configuration example. Similarly to the side contact member 42 according to the above-described embodiment, the side contact member 42a according to the second configuration example communicates with the contact surface 421a and the curved surface 422a, and also the side contact member 42a. A groove-shaped communication portion 43a that is also opened on the upper surface of the member 42a is formed. However, assuming that the direction along the peripheral direction of the substrate W on the turntable 1 is the width direction, the communication portion 43a has a shape in which the dimension in the width direction increases as it goes from the contact surface 421a to the curved surface 422a. . That is, the communication portion 43a has a shape in which the cross-sectional area increases (so-called an expanded shape) as it goes from the contact surface 421a toward the curved surface 422a (that is, as the distance from the rotation axis A1 of the turntable 1).

この側方当接部材４２ａによると、振り切り乾燥において、連通部４３ａ内に流入して当接面４２１ａ側から湾曲面４２２ａ側に向けて流れる液滴を、特に速やかに排出することができる。ひいては、基板Ｗに付着している液滴を、特に速やかに、基板Ｗの外部に排出することができる。 According to the side abutting member 42a, in the swing-off drying, the droplets that flow into the communication portion 43a and flow from the abutting surface 421a side toward the curved surface 422a side can be discharged particularly quickly. As a result, the droplets adhering to the substrate W can be discharged to the outside of the substrate W particularly quickly.

なお、この側方当接部材４２ａは、図１３に示されるように、第１の構成例に係る下方当接部材４１と組み合わされて、当接部材群を構成してもよい。また、側方当接部材４２ａは、第２の構成例に係る下方当接部材４１ａと組み合わされて、当接部材群を構成してもよい。また、側方当接部材４２ａは、第３の構成例に係る下方当接部材４１ｂと組み合わされて、当接部材群を構成してもよい。 As shown in FIG. 13, the side contact member 42a may be combined with the lower contact member 41 according to the first configuration example to form a contact member group. Further, the side contact member 42a may be combined with the lower contact member 41a according to the second configuration example to form a contact member group. Further, the side contact member 42a may be combined with the lower contact member 41b according to the third configuration example to form a contact member group.

＜ii．側方当接部材４２ｂ＞
図１４には、第３の構成例に係る側方当接部材４２ｂを含む当接部材群が例示されている。第３の構成例に係る側方当接部材４２ｂには、複数個（図示の例では、２個）の連通部４３ｂ，４３ｂが、側方当接部材４２ｂの幅方向について間隔をあけて形成される。各連通部４３ｂは、例えば、上記の実施の形態に係る連通部４３と同様、当接面４２１と湾曲面４２２とを連通するとともに、側方当接部材４２ｂの上面にも開口した溝形状とされる。なお、複数の連通部４３ｂ，４３ｂの少なくとも１個が、第２の構成例に係る側方当接部材４２ａが備える連通部４３ａのように、湾曲面４２２に向かうにつれて拡開した形状とされてもよい。 <Ii. Side contact member 42b>
FIG. 14 illustrates a contact member group including the side contact member 42b according to the third configuration example. In the side contact member 42b according to the third configuration example, a plurality of (two in the illustrated example) communication portions 43b and 43b are formed at intervals in the width direction of the side contact member 42b. Is done. Each communication portion 43b has, for example, a groove shape that communicates between the contact surface 421 and the curved surface 422 and also opens on the upper surface of the side contact member 42b, similarly to the communication portion 43 according to the above-described embodiment. Is done. In addition, at least one of the plurality of communication portions 43b and 43b has a shape that expands toward the curved surface 422 as the communication portion 43a included in the side contact member 42a according to the second configuration example. Also good.

この側方当接部材４２ｂによると、振り切り乾燥において、遠心力を受けて回転台１の回転軸Ａ１から離れる方向に流れてくる液滴を、いずれかの連通部４３ｂ，４３ｂを介して、効果的に基板Ｗ外に排出することができる。 According to the side abutting member 42b, in the swing-off drying, the liquid droplets flowing in the direction away from the rotation axis A1 of the turntable 1 due to centrifugal force are effective through any one of the communication portions 43b and 43b. Thus, it can be discharged out of the substrate W.

なお、この側方当接部材４２ｂは、図１４に示されるように、第１の構成例に係る下方当接部材４１と組み合わされて、当接部材群を構成してもよい。また、側方当接部材４２ｂは、第２の構成例に係る下方当接部材４１ａと組み合わされて、当接部材群を構成してもよい。また、側方当接部材４２ｂは、第３の構成例に係る下方当接部材４１ｂと組み合わされて、当接部材群を構成してもよい。 As shown in FIG. 14, the side contact member 42 b may be combined with the lower contact member 41 according to the first configuration example to form a contact member group. Further, the side contact member 42b may be combined with the lower contact member 41a according to the second configuration example to form a contact member group. Further, the side contact member 42b may be combined with the lower contact member 41b according to the third configuration example to form a contact member group.

＜７．変形例＞
下方当接部材４１の構成は、必ずしも上述したものに限らない。例えば、下方当接部材は、上側の面が平坦な、直方体形状の部材によって形成されてもよい。 <7. Modification>
The configuration of the lower contact member 41 is not necessarily limited to that described above. For example, the lower contact member may be formed of a rectangular parallelepiped member having a flat upper surface.

また、側方当接部材４２およびそこに形成される連通部４３の各構成も、必ずしも上述したものに限らない。例えば、側方当接部材は、その当接面が、回転台１の回転軸Ａ１の側に膨らんだ円弧状の湾曲面とされてもよい。また例えば、側方当接部材は、平面視矩形状の柱状部材であってもよいし、平面視円形状の柱状部材であってもよい。また例えば、側方当接部材に形成される連通部は、当接面４２１と湾曲面４２２とを連通し、側方当接部材の上面には開口しない、管状であってもよい。 Further, the configurations of the side contact member 42 and the communication portion 43 formed there are not necessarily limited to those described above. For example, the abutting surface of the side abutting member may be an arcuate curved surface that swells toward the rotation axis A <b> 1 of the turntable 1. Further, for example, the side contact member may be a columnar member having a rectangular shape in plan view, or may be a columnar member having a circular shape in plan view. Further, for example, the communication portion formed in the side contact member may have a tubular shape that connects the contact surface 421 and the curved surface 422 and does not open on the upper surface of the side contact member.

また、上記の実施の形態において、固定保持部材４ｂは、基体部４０を設けない構成であってもよい。すなわち、固定保持部材４ｂが備える当接部材群４００は、基体部４０を介さずに直接に、回転台１上に配設されてもよい。 Further, in the above-described embodiment, the fixing holding member 4b may have a configuration in which the base portion 40 is not provided. That is, the contact member group 400 included in the fixed holding member 4b may be directly disposed on the turntable 1 without the base portion 40 interposed therebetween.

また、上記の実施の形態において、可動保持部材４ａの基体部４０を回動させる駆動部８の態様は、磁石を用いるものに限らない。例えば、回転モータ等を用いて基体部４０を回動させてもよい。 Moreover, in said embodiment, the aspect of the drive part 8 which rotates the base | substrate part 40 of the movable holding member 4a is not restricted to what uses a magnet. For example, the base portion 40 may be rotated using a rotary motor or the like.

１回転台
２カップ
３保持部
４保持部材
４ａ可動保持部材
４ｂ固定保持部材
４１，４１ａ，４１ｂ下方当接部材
４２，４２ａ，４２ｂ側方当接部材
４３，４３ａ，４３ｂ連通部
８駆動部
Ａ１回転軸
Ａ１０回転中心
Ａ２回動軸
Ｗ基板 DESCRIPTION OF SYMBOLS 1 Turntable 2 Cup 3 Holding part 4 Holding member 4a Movable holding member 4b Fixed holding member 41, 41a, 41b Lower contact member 42, 42a, 42b Side contact member 43, 43a, 43b Communication part 8 Drive part A1 Rotation Axis A10 Center of rotation A2 Rotation axis W Substrate

Claims

基板保持装置であって、
回転軸を中心に水平面内で回転する回転台と、
前記回転台上に基板を保持する保持部と、
を備え、
前記保持部が、
前記回転台の上面に配置された基体部と、
前記基体部に配設された当接部材群と、
前記基体部を駆動して、前記当接部材群を、前記回転台上の基板の周縁と近接離間する方向に移動させる駆動部と、
を備え、
前記当接部材群が、
前記基板に下方から当接する下方当接部材と、
前記基板の回転中心から見て、前記下方当接部材と重ならないように間隔をあけて設けられ、前記基板に側方から当接する側方当接部材と、
前記側方当接部材における前記基板に当接する当接面と、前記当接面と逆側の面とを連通する連通部と、
を備え、
前記下方当接部材の上側の面が、前記回転軸に向かって延在する頂辺を中心として、その両側が下方に傾斜した屈折面である、基板保持装置。 A substrate holding device,
A turntable that rotates in a horizontal plane around a rotation axis;
A holding unit for holding the substrate on the turntable;
With
The holding part is
A base portion disposed on an upper surface of the turntable;
A contact member group disposed on the base portion;
A driving unit that drives the base unit to move the contact member group in a direction of approaching and separating from a peripheral edge of the substrate on the turntable;
With
The contact member group includes:
A lower contact member that contacts the substrate from below;
A side contact member that is provided at an interval so as not to overlap the lower contact member when viewed from the center of rotation of the substrate;
A contact portion that contacts the substrate in the side contact member, and a communication portion that connects the surface opposite to the contact surface;
Equipped with a,
The substrate holding apparatus , wherein the upper surface of the lower abutting member is a refracting surface whose both sides are inclined downward with the apex extending toward the rotation axis as a center .

基板保持装置であって、
回転軸を中心に水平面内で回転する回転台と、
前記回転台上に基板を保持する保持部と、
を備え、
前記保持部が、
前記回転台の上面に配置された基体部と、
前記基体部に配設された当接部材群と、
前記基体部を駆動して、前記当接部材群を、前記回転台上の基板の周縁と近接離間する方向に移動させる駆動部と、
を備え、
前記当接部材群が、
前記基板に下方から当接する下方当接部材と、
前記基板の回転中心から見て、前記下方当接部材と重ならないように間隔をあけて設けられ、前記基板に側方から当接する側方当接部材と、
前記側方当接部材における前記基板に当接する当接面と、前記当接面と逆側の面とを連通する連通部と、
を備え、
前記連通部が、前記回転軸から離れるにつれて断面積が大きくなる形状とされる、
基板保持装置。 A substrate holding device,
A turntable that rotates in a horizontal plane around a rotation axis;
A holding unit for holding the substrate on the turntable;
With
The holding part is
A base portion disposed on an upper surface of the turntable;
A contact member group disposed on the base portion;
A driving unit that drives the base unit to move the contact member group in a direction of approaching and separating from a peripheral edge of the substrate on the turntable;
With
The contact member group includes:
A lower contact member that contacts the substrate from below;
A side contact member that is provided at an interval so as not to overlap the lower contact member when viewed from the center of rotation of the substrate;
A contact portion that contacts the substrate in the side contact member, and a communication portion that connects the surface opposite to the contact surface;
With
The communication portion has a shape in which a cross-sectional area increases as the distance from the rotation shaft increases.
Substrate holding device.

請求項２に記載の基板保持装置であって、
前記下方当接部材の上側の面が、前記回転軸に近づくにつれて、下方に傾斜する傾斜面である、
基板保持装置。 The substrate holding apparatus according to claim 2 ,
The upper surface of the lower contact member is an inclined surface that is inclined downward as it approaches the rotation axis.
Substrate holding device.

請求項２に記載の基板保持装置であって、
前記下方当接部材の上端部が、先細りの形状である、
基板保持装置。 The substrate holding apparatus according to claim 2 ,
The upper end portion of the lower contact member has a tapered shape.
Substrate holding device.

請求項１から４のいずれかに記載の基板保持装置であって、
前記連通部が、前記側方当接部材の上面に開口している、
基板保持装置。 The substrate holding apparatus according to any one of claims 1 to 4,
The communication portion is open on the upper surface of the side contact member.
Substrate holding device.

請求項１から５のいずれかに記載の基板保持装置であって、
前記側方当接部材に、前記連通部が複数個形成される、
基板保持装置。 A substrate holding apparatus according to any one of claims 1 to 5,
A plurality of the communication portions are formed on the side contact member.
Substrate holding device.

請求項１から６のいずれかに記載の基板保持装置であって、
前記連通部の底面が、前記回転台上に保持される基板の下面以下の高さ位置とされる、
基板保持装置。 The substrate holding apparatus according to any one of claims 1 to 6,
The bottom surface of the communication portion is a height position below the lower surface of the substrate held on the turntable,
Substrate holding device.

請求項１から７のいずれかに記載の基板保持装置であって、
前記当接部材群が、
前記側方当接部材を１個備えるとともに、前記下方当接部材を２個備え、
前記２個の下方当接部材の間に、前記側方当接部材が配置されている、
基板保持装置。 A substrate holding apparatus according to any one of claims 1 to 7,
The contact member group includes:
With one side abutting member and two lower abutting members,
The side contact member is disposed between the two lower contact members.
Substrate holding device.