JP5966853B2 - Application state inspection apparatus and method - Google Patents

Application state inspection apparatus and method Download PDF

Info

Publication number
JP5966853B2
JP5966853B2 JP2012236806A JP2012236806A JP5966853B2 JP 5966853 B2 JP5966853 B2 JP 5966853B2 JP 2012236806 A JP2012236806 A JP 2012236806A JP 2012236806 A JP2012236806 A JP 2012236806A JP 5966853 B2 JP5966853 B2 JP 5966853B2
Authority
JP
Japan
Prior art keywords
application
region
reference position
application state
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012236806A
Other languages
Japanese (ja)
Other versions
JP2014083527A (en
Inventor
肇 坂野
肇 坂野
大輔 塩形
大輔 塩形
暢宏 柴崎
暢宏 柴崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IHI Corp
Original Assignee
IHI Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IHI Corp filed Critical IHI Corp
Priority to JP2012236806A priority Critical patent/JP5966853B2/en
Publication of JP2014083527A publication Critical patent/JP2014083527A/en
Application granted granted Critical
Publication of JP5966853B2 publication Critical patent/JP5966853B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Description

本発明は、塗布状態検査装置及び方法に関する。  The present invention relates to an application state inspection apparatus and method.

従来から、駆動部を持ち、潤滑油を必要とする機械の組立てにおいて、機械部品の接合部にシリコーンを材料としたシール剤と呼ばれる液状の物質を塗布することによって、接合部からの油漏れを防止する手法が広く用いられている。このような液状物質の塗布においては、ノズルを移動させると共に、ノズルから粘性流体を吐出させて所望の位置に塗布する形式が広く使われている。   Conventionally, in the assembly of machines that have a drive unit and require lubricating oil, oil leakage from the joints can be prevented by applying a liquid substance called a sealant made of silicone to the joints of machine parts. Techniques for preventing it are widely used. In the application of such a liquid substance, a form in which a nozzle is moved and a viscous fluid is discharged from the nozzle and applied to a desired position is widely used.

この工程では、シール剤の切れによる油漏れの発生のほか、飛散による駆動部への異物混入や、正しい位置にシール剤が塗布されないことによるシール性能の低下などが考えられるため、目視、あるいは画像計測等の方法によって、正常に塗布されていることを検査することが一般的である。   In this process, in addition to the occurrence of oil leakage due to the sealant being cut off, contamination of the drive unit due to scattering, or deterioration of the sealing performance due to the sealant not being applied at the correct position can be considered. It is common to inspect that the coating is normally applied by a method such as measurement.

例えば、下記特許文献1には、実際の製品の塗布領域をカメラによって撮影し、その撮影画像の画像処理を行い、塗布物の中心線が所定の幅を持つ基準領域に含まれているかを検査することにより、塗布状態の良否判定を行う技術が開示されている。
また、下記特許文献2には、実際の製品の塗布領域をカメラによって撮影し、その撮影画像の画像処理を行い、塗布領域が最大範囲の領域を越えていないか、或いは最小範囲の領域を割り込んでいないかを検査することにより、塗布状態の良否判定を行う技術が開示されている。
For example, in Patent Document 1 below, an application area of an actual product is photographed by a camera, image processing of the photographed image is performed, and it is inspected whether the center line of the coating is included in a reference area having a predetermined width. Thus, a technique for determining whether the application state is good or bad is disclosed.
Also, in Patent Document 2 below, an actual product application area is photographed by a camera, image processing of the photographed image is performed, and the application area does not exceed the maximum area or the minimum area is interrupted. A technique for determining whether a coating state is good or not by inspecting whether or not it is not disclosed is disclosed.

特開2011−95090号公報JP 2011-95090 A 特開2009−180613号公報JP 2009-180613 A

しかしながら、特許文献1の技術では、ワークの設置位置のガタなどでカメラと塗布済みワークとの位置関係にズレが生じてしまうと、ワークが画像上で平行移動や回転してしまい、所定の軌道からはみ出し、良品でも不良品と誤判定されるという問題があった。   However, in the technique of Patent Document 1, if the positional relationship between the camera and the coated workpiece is shifted due to play of the workpiece installation position, the workpiece is translated or rotated on the image, and a predetermined trajectory is obtained. There is a problem that the product protrudes from the surface and is erroneously judged as a defective product even if it is a good product.

また、特許文献2の技術では、特許文献1と同様に、ワークの設置位置のガタなどでカメラと塗布済みワークとの位置関係にズレが生じてしまう虞があるが、ボルト穴を基準に検査対象の画像に対して回転或いは移動による補正を行うことで、正しい位置関係の画像を生成することが提案されている。しかしながら、この手法はボルト穴が2個以上見つかることが前提となっており、カメラの正面にボルト穴が無い場合や、ボルト穴が見えにくい場合には適用できないという問題があった。   Further, in the technique of Patent Document 2, as in Patent Document 1, there is a possibility that the positional relationship between the camera and the coated work may be shifted due to looseness of the work installation position or the like. It has been proposed to generate an image having a correct positional relationship by performing correction by rotation or movement on a target image. However, this method is based on the premise that two or more bolt holes are found, and there is a problem that it cannot be applied when there is no bolt hole in the front of the camera or when it is difficult to see the bolt hole.

本発明は、上述した事情に鑑みてなされたものであり、検査途中でカメラ等の撮像手段と塗布物が塗布されたワークとの位置関係にズレが生じた場合でも、正確に塗布状態の良否判定を行うことの可能な塗布状態検査装置及び方法を提供することを目的とする。 The present invention has been made in view of the above-described circumstances. Even when a positional relationship between an imaging unit such as a camera and a workpiece on which a coating material is applied is misaligned during an inspection, the quality of the coating state is accurately determined. It is an object of the present invention to provide an application state inspection apparatus and method capable of performing determination.

上記目的を達成するために、本発明では、塗布状態検査装置に係る第1の解決手段として、ワークに塗布された塗布物の塗布状態を検査する塗布状態検査装置であって、前記塗布物が塗布された前記ワークを撮像する撮像手段と、前記撮像手段から得られた画像を前記塗布物が塗布された塗布領域とそれ以外の領域とに分割し、前記塗布領域に囲まれた閉領域を抽出する閉領域抽出手段と、抽出された前記閉領域の内、特定の閉領域内の1点を基準位置として決定し、当該基準位置を中心とした所定半径の円弧を描いて当該円弧と前記塗布領域との交差点を求め、所定の規則に従って前記交差点及び基準位置から基準方向を決定する基準標決定手段と、前記塗布領域から抽出した塗布軌跡と、基準塗布軌跡との比較によって前記塗布状態の良否判定を行うに当たって、前記基準位置及び前記基準方向を一致させた上で両者を比較する良否判定手段とを備える、という手段を採用する。  In order to achieve the above object, in the present invention, as a first solving means related to a coating state inspection apparatus, a coating state inspection apparatus for inspecting a coating state of a coating applied to a workpiece, wherein the coating is An imaging unit that images the coated workpiece, and an image obtained from the imaging unit is divided into a coating region where the coating is applied and a region other than that, and a closed region surrounded by the coating region is formed. A closed region extracting means for extracting, and determining one point in the specific closed region among the extracted closed regions as a reference position, drawing an arc of a predetermined radius centered on the reference position, Finding an intersection with the application region, a reference mark determining means for determining a reference direction from the intersection and a reference position according to a predetermined rule, and comparing the application trajectory extracted from the application region with the reference application trajectory. Good When a determination, and a quality determining means for comparing the two on-matched with the reference position and the reference direction, to employ a means of.

また、本発明では、塗布状態検査装置に係る第2の解決手段として、上記第1の解決手段において、前記基準標決定手段は、前記特定の閉領域の重心を前記基準位置として決定する、という手段を採用する。
また、本発明では、塗布状態検査装置に係る第3の解決手段として、上記第1の解決手段において、前記基準標決定手段は、前記特定の閉領域の内接円或いは外接円の中心を前記基準位置として決定する、という手段を採用する。
Further, in the present invention, as the second solving means relating to the application state inspection apparatus, in the first solving means, the reference mark determining means determines the center of gravity of the specific closed region as the reference position. Adopt means.
Further, in the present invention, as a third solving means related to the application state inspection apparatus, in the first solving means, the reference mark determining means sets the center of the inscribed circle or circumscribed circle of the specific closed region as the center. A method of determining as a reference position is adopted.

また、本発明では、塗布状態検査装置に係る第4の解決手段として、上記第1〜第3のいずれかの解決手段において、前記基準標決定手段は、前記円弧と前記塗布領域との交差点が1つ存在する場合、前記基準位置から前記1つの交差点に向かう方向を前記基準方向として決定する、という手段を採用する。
また、本発明では、塗布状態検査装置に係る第5の解決手段として、上記第1〜第3のいずれかの解決手段において、前記基準標決定手段は、前記円弧と前記塗布領域との交差点が複数存在する場合、前記基準位置から前記複数の交差点に向かうそれぞれの方向の合成方向或いは平均方向を前記基準方向として決定する、という手段を採用する。
また、本発明では、塗布状態検査装置に係る第6の解決手段として、上記第1〜第5のいずれかの解決手段において、前記基準標決定手段は、抽出された前記閉領域の内、最も大きい閉領域内の1点を基準位置として決定する、という手段を採用する。
Further, in the present invention, as a fourth solving means related to the application state inspection device, in any one of the first to third solving means, the reference mark determining means has an intersection between the arc and the application area. If one exists, a means is adopted in which a direction from the reference position toward the one intersection is determined as the reference direction.
Further, in the present invention, as a fifth solving means related to the application state inspection apparatus, in any one of the first to third solving means, the reference mark determining means has an intersection of the arc and the application area. In the case where there are a plurality, a means is adopted in which a combined direction or an average direction of the respective directions from the reference position toward the plurality of intersections is determined as the reference direction.
In the present invention, as a sixth solving means relating to the application state inspection apparatus, in any one of the first to fifth solving means, the reference mark determining means is the most of the extracted closed regions. A method is adopted in which one point in a large closed region is determined as a reference position.

また、本発明では、塗布状態検査装置に係る第7の解決手段として、上記第1〜第6のいずれかの解決手段において、前記良否判定手段は、前記塗布領域の中心線を前記塗布軌跡として抽出し、前記塗布軌跡が前記基準塗布軌跡を中心とする許容範囲内に収まっていた場合に前記塗布状態が正常であると判定する、という手段を採用する。  In the present invention, as a seventh solving means relating to the application state inspection apparatus, in any one of the first to sixth solving means, the pass / fail judgment means uses the center line of the application region as the application locus. Extraction is performed, and when the application trajectory is within an allowable range centered on the reference application trajectory, a means is adopted that determines that the application state is normal.

また、本発明では、塗布状態検査装置に係る第8の解決手段として、上記第1〜第6のいずれかの解決手段において、前記良否判定手段は、前記塗布領域の輪郭線を前記塗布軌跡として抽出し、前記塗布軌跡と前記基準塗布軌跡とのズレ量が許容値以下の場合に前記塗布状態が正常であると判定する、という手段を採用する。  In the present invention, as the eighth solving means relating to the application state inspection apparatus, in any one of the first to sixth solving means, the pass / fail judgment means uses the outline of the application region as the application locus. A means for extracting and determining that the application state is normal when a deviation amount between the application trajectory and the reference application trajectory is an allowable value or less is adopted.

また、本発明では、塗布状態検査装置に係る第9の解決手段として、上記第1〜第8のいずれかの解決手段において、前記良否判定手段は、事前に前記塗布物が正常に塗布された前記ワークを撮像して得られた画像に含まれる塗布領域から抽出した塗布軌跡を、前記基準塗布軌跡として用いる、という手段を採用する。  In the present invention, as the ninth solving means related to the application state inspection apparatus, in the first to eighth solving means, the quality determination means is configured such that the application is normally applied in advance. A means is adopted in which an application locus extracted from an application region included in an image obtained by imaging the workpiece is used as the reference application locus.

一方、本発明では、塗布状態検査方法に係る解決手段として、ワークに塗布された塗布物の塗布状態を検査する塗布状態検査方法であって、前記塗布物が塗布された前記ワークを撮像する撮像工程と、前記撮像工程から得られた画像を前記塗布物が塗布された塗布領域とそれ以外の領域とに分割し、前記塗布領域に囲まれた閉領域を抽出する閉領域抽出工程と、抽出された前記閉領域の内、特定の閉領域内の1点を基準位置として決定し、当該基準位置を中心とした所定半径の円弧を描いて当該円弧と前記塗布領域との交差点を求め、所定の規則に従って前記交差点及び基準位置から基準方向を決定する基準標決定工程と、前記塗布領域から抽出した塗布軌跡と、基準塗布軌跡との比較によって前記塗布状態の良否判定を行うに当たって、前記基準位置及び前記基準方向を一致させた上で両者を比較する良否判定工程とを有する、という手段を採用する。   On the other hand, in the present invention, as a means for solving the application state inspection method, there is an application state inspection method for inspecting the application state of the application applied to the workpiece, and imaging for imaging the workpiece on which the application is applied A closed region extracting step of extracting a closed region surrounded by the coating region by dividing the image obtained from the imaging step and the coating region to which the coating material is applied and the other region One point in the specified closed region is determined as a reference position, and an arc having a predetermined radius with the reference position as the center is drawn to obtain an intersection between the arc and the application region. In performing the pass / fail judgment of the application state by comparing the reference mark determining step for determining the reference direction from the intersection and the reference position according to the rules of the above, the application trajectory extracted from the application region, and the reference application trajectory, And a quality decision step of comparing both on the reference position and were matched the reference direction, to employ a means of.

本発明によれば、検査途中でカメラ等の撮像手段と塗布物が塗布されたワークとの位置関係にズレが生じた場合でも、正確に塗布状態の良否判定を行うことが可能となる。  According to the present invention, it is possible to accurately determine whether the application state is good or not even when there is a deviation in the positional relationship between the imaging means such as a camera and the workpiece on which the application is applied during the inspection.

本実施形態に係る塗布状態検査装置Aの概略構成図である。It is a schematic block diagram of the application state inspection apparatus A which concerns on this embodiment. 塗布状態検査装置Aの動作を示すフローチャートである。4 is a flowchart showing the operation of the application state inspection apparatus A. 図2のステップS2〜S4の処理に関する補足説明図である。It is a supplementary explanatory drawing regarding the process of step S2-S4 of FIG. 図2のステップS5〜S10の処理に関する補足説明図である。It is a supplementary explanatory drawing regarding the process of step S5-S10 of FIG.

図1は、本実施形態に係る塗布状態検査装置Aの概略構成図である。この図1に示すように、本塗布状態検査装置Aは、ワークWに塗布されたシール剤(塗布物)Sの塗布状態を検査するものであり、撮像装置1、画像処理装置2及び記憶装置3を備えている。なお、本実施形態では、シール剤Sに染料などを配合して、ワークWの表面とシール剤Sとの間に色の違いを発生させているものとする。  FIG. 1 is a schematic configuration diagram of a coating state inspection apparatus A according to the present embodiment. As shown in FIG. 1, the application state inspection apparatus A inspects the application state of a sealant (application) S applied to a workpiece W, and includes an imaging device 1, an image processing device 2, and a storage device. 3 is provided. In the present embodiment, it is assumed that a color difference is generated between the surface of the workpiece W and the sealing agent S by adding a dye or the like to the sealing agent S.

撮像装置1は、例えばCCD(Charge Coupled Devices)カメラであり、ワークWの直上に配置されて、ワークW上におけるシール剤Sの塗布部を撮影し、その撮影画像を表す画像データを画像処理装置2に出力する。ここで、撮像装置1の解像度をVGA(Video Graphic Array)と仮定すると、撮像装置1から出力される画像データは、撮影画像を構成する640×480個の各画素の明るさ(輝度)を示す輝度データを含んでいる。なお、各輝度データのビット数を8ビットと仮定すると、各画素の輝度は0〜255の階調値で表される。  The imaging device 1 is, for example, a CCD (Charge Coupled Devices) camera, which is arranged immediately above the workpiece W, images the application portion of the sealant S on the workpiece W, and displays image data representing the captured image as an image processing device. Output to 2. Here, assuming that the resolution of the imaging apparatus 1 is VGA (Video Graphic Array), the image data output from the imaging apparatus 1 indicates the brightness (luminance) of each of the 640 × 480 pixels constituting the captured image. Contains luminance data. If the number of bits of each luminance data is assumed to be 8 bits, the luminance of each pixel is represented by a gradation value from 0 to 255.

画像処理装置2は、記憶装置3に記憶されている塗布状態検査プログラムに従って、上記撮像装置1から入力される画像データを基に所定の画像処理を実行することにより、シール剤Sの塗布状態が正常か否かの良否判定を行い、その判定結果を検査結果として出力するコンピュータである。このような画像処理装置2としては、マイクロコンピュータやCPU(Central Processing Unit)等を用いることができる。
なお、この画像処理装置2は、塗布状態検査プログラムの実行によって実現される機能部として、閉領域抽出部2a、基準標決定部2b及び良否判定部2cを備えている。
The image processing apparatus 2 performs predetermined image processing based on the image data input from the imaging apparatus 1 according to the application state inspection program stored in the storage device 3, so that the application state of the sealant S is This is a computer that determines whether the product is normal or not and outputs the result of the determination as an inspection result. As such an image processing apparatus 2, a microcomputer, CPU (Central Processing Unit), etc. can be used.
The image processing apparatus 2 includes a closed region extraction unit 2a, a reference mark determination unit 2b, and a quality determination unit 2c as functional units realized by executing the application state inspection program.

閉領域抽出部2aは、撮像装置1から入力される画像データを基に、ワークWの撮影画像をシール剤Sが塗布された塗布領域とそれ以外の領域とに分割し、塗布領域に囲まれた閉領域を抽出する。基準標決定部2bは、抽出された閉領域の内、特定の閉領域内の1点を基準位置として決定し、当該基準位置を中心とした所定半径の円弧を描いて当該円弧と塗布領域との交差点を求め、所定の規則に従って交差点及び基準位置から基準方向を決定する。良否判定部2cは、上記塗布領域から抽出した塗布軌跡と、基準塗布軌跡との比較によって塗布状態の良否判定を行うに当たって、上記の基準位置及び基準方向を一致させた上で両者を比較する。ここで、良否判定部2cは、事前にシール剤Sが正常に塗布されたワークWを撮像して得られた画像に含まれる塗布領域から抽出した塗布軌跡を、上記の基準塗布軌跡として用いる。例えば、塗布領域の中心線が塗布軌跡として抽出される場合、事前にシール剤Sが正常に塗布されたワークWを撮像して得られた画像に含まれる塗布領域の中心線が基準塗布軌跡として用いられる。  The closed region extraction unit 2a divides the captured image of the workpiece W into the application region where the sealant S is applied and the other region based on the image data input from the imaging device 1, and is surrounded by the application region. Extract the closed region. The reference mark determining unit 2b determines, as a reference position, one point in the specific closed area among the extracted closed areas, and draws an arc with a predetermined radius centered on the reference position, The intersection is determined, and the reference direction is determined from the intersection and the reference position according to a predetermined rule. The pass / fail judgment unit 2c compares the reference position and the reference direction after making the pass / fail judgment of the application state by comparing the application trajectory extracted from the application region with the reference application trajectory. Here, the quality determination unit 2c uses, as the above-described reference application locus, the application locus extracted from the application region included in the image obtained by imaging the workpiece W to which the sealant S has been normally applied in advance. For example, when the center line of the application region is extracted as the application trajectory, the center line of the application region included in the image obtained by imaging the workpiece W to which the sealant S has been normally applied in advance is used as the reference application trajectory. Used.

記憶装置3は、例えばHDD(Hard Disk Drive)であり、画像処理装置2が実行する塗布状態検査プログラムと、事前に取得していた良否判定用の基準データ3aを記憶している。なお、この基準データ3aには、上記の基準塗布軌跡そのものを示すデータ(正常に塗布されたシール剤Sを事前に撮影して得られた撮影画像から、シール剤Sの塗布領域を抽出し、さらにその塗布領域の中心線を基準塗布軌跡として抽出したもの)の他、事前に正常な塗布状態で得られた撮影画像を基に決定された基準位置及び基準方向を示すデータも含まれている。  The storage device 3 is, for example, an HDD (Hard Disk Drive), and stores an application state inspection program executed by the image processing device 2 and reference data 3a for pass / fail determination acquired in advance. In addition, in this reference data 3a, the application area of the sealing agent S is extracted from the data indicating the reference application trajectory itself (from the photographed image obtained by photographing the sealing agent S applied normally in advance, In addition, the center line of the application area is extracted as a reference application trajectory), and data indicating a reference position and a reference direction determined based on a photographed image obtained in a normal application state in advance is also included. .

次に、上記のように構成された塗布状態検査装置Aの動作について、図2〜図4を参照しながら詳細に説明する。
図2は、塗布状態検査装置Aの動作を示すフローチャートである。この図2に示すように、検査開始時において、まず、撮像装置1は、画像処理装置2からの要求に応じてワークW上におけるシール剤Sの塗布部を撮影し、その撮影画像を表す画像データを画像処理装置2に出力する(ステップS1:撮像工程)。
Next, operation | movement of the application | coating state inspection apparatus A comprised as mentioned above is demonstrated in detail, referring FIGS.
FIG. 2 is a flowchart showing the operation of the application state inspection apparatus A. As shown in FIG. 2, at the start of the inspection, first, the imaging device 1 captures the application portion of the sealant S on the workpiece W in response to a request from the image processing device 2, and represents the captured image. Data is output to the image processing apparatus 2 (step S1: imaging step).

続いて、画像処理装置2の閉領域抽出部2aは、撮像装置1から入力される画像データを基に2値化処理を行うことにより、撮影画像をシール剤Sが塗布された塗布領域とそれ以外の領域とに分割する(ステップS2)。ここで、撮像装置1から入力される画像データには、R(赤)、G(緑)、B(青)の3原色に対応する輝度データが含まれているため、撮影画像もR、G、Bの各色毎に得られることになる。例えば、シール剤Sが赤色の場合、赤色とワークWの色(例えば青色)との輝度差(R−B)を計算し、その計算結果(以下、差分画像と称する)を赤色の強さと考え、当該差分画像を2値化処理することが好ましい。  Subsequently, the closed region extraction unit 2a of the image processing device 2 performs binarization processing based on the image data input from the imaging device 1, whereby the photographed image is applied to the application region where the sealant S is applied and the application region. (Step S2). Here, since the image data input from the imaging apparatus 1 includes luminance data corresponding to the three primary colors R (red), G (green), and B (blue), the captured image is also R, G. , B for each color. For example, when the sealant S is red, the luminance difference (RB) between red and the color of the workpiece W (for example, blue) is calculated, and the calculation result (hereinafter referred to as a difference image) is considered as the intensity of red. It is preferable that the difference image is binarized.

ここで、2値化処理に用いられる閾値は、シール剤Sの輝度に該当する画素がシール剤Sの塗布領域の構成画素として判別され、それ以外のワークW表面の輝度に該当する画素がワーク領域の構成画素として判別されるように設定されている。つまり、このように設定された閾値を用いて差分画像を2値化処理することにより、差分画像を構成する画素の内、閾値以上の輝度を有する画素は、その輝度を第1輝度値(例えば最大階調値「255」)に変換されて、シール剤Sの塗布領域を構成する画素となり、閾値未満の輝度を有する画素は、その輝度を第2輝度値(例えば最小階調値「0」)に変換されて、ワーク領域を構成する画素となる。図3(a)に、上記のような2値化処理によって得られた画像の一例を示す。この図3(a)において、符号SAはシール剤Sの塗布領域を示し、符号WAはワーク領域を示している。  Here, the threshold value used for the binarization processing is determined such that a pixel corresponding to the luminance of the sealant S is determined as a constituent pixel of the application region of the sealant S, and other pixels corresponding to the luminance of the surface of the workpiece W are workpieces. It is set so as to be identified as a constituent pixel of the region. In other words, by binarizing the difference image using the threshold value set in this manner, among the pixels constituting the difference image, the pixel having the luminance equal to or higher than the threshold value is set to the first luminance value (for example, Converted to the maximum gradation value “255”) and becomes a pixel constituting the application region of the sealant S, and the pixel having the luminance less than the threshold value is set to the second luminance value (for example, the minimum gradation value “0”). ) To become pixels constituting the work area. FIG. 3A shows an example of an image obtained by the binarization process as described above. In FIG. 3A, the symbol SA indicates the application area of the sealant S, and the symbol WA indicates the work area.

続いて、画像処理装置2の閉領域抽出部2aは、上記のような2値化処理によって、撮影画像をシール剤Sが塗布された塗布領域SAとそれ以外の領域(ワーク領域WA)とに分割した後、塗布領域SAに囲まれた閉領域を抽出する(ステップS3)。図3(a)を参照すると、閉領域抽出部2aは、塗布領域SAに囲まれた閉領域として、比較的大きな閉領域WA1と比較的小さな閉領域WA2との2つの閉領域を抽出する。なお、これらステップS2及びS3の処理は閉領域抽出工程に相当する。  Subsequently, the closed area extraction unit 2a of the image processing apparatus 2 performs the binarization process as described above to divide the captured image into the application area SA where the sealant S is applied and the other area (work area WA). After the division, a closed region surrounded by the application region SA is extracted (step S3). Referring to FIG. 3A, the closed region extraction unit 2a extracts two closed regions, a relatively large closed region WA1 and a relatively small closed region WA2, as closed regions surrounded by the application region SA. Note that the processing of these steps S2 and S3 corresponds to a closed region extraction step.

続いて、画像処理装置2の基準標決定部2bは、上記ステップS3にて抽出した閉領域の内、特定の閉領域内の1点を基準位置として決定し、当該基準位置を中心とした所定半径の円弧を描いて当該円弧と塗布領域との交差点を求め、所定の規則に従って上記交差点及び基準位置から基準方向を決定する(ステップS4:基準標決定工程)。  Subsequently, the reference mark determination unit 2b of the image processing apparatus 2 determines one point in the specific closed region among the closed regions extracted in step S3 as a reference position, and a predetermined centered on the reference position. An arc having a radius is drawn to determine an intersection between the arc and the application region, and a reference direction is determined from the intersection and the reference position according to a predetermined rule (step S4: reference mark determining step).

具体的には、基準標決定部2bは、図3(b)に示すように、抽出された閉領域WA1、WA2の内、最も大きい閉領域WA1内の重心を求め、この重心を基準位置P1として決定する(ステップS4a)。そして、基準標決定部2bは、基準位置P1を中心とした所定半径の円弧Rを描いて当該円弧Rと塗布領域SAとの交差点を求める(ステップS4b)。図3(b)を参照すると、基準標決定部2bは、円弧Rと塗布領域SAとの交差点として2つの交差点C1、C2を得る。なお、塗布領域SAは、ある幅を持った領域であるため、円弧Rと交差する中心点を交差点とする。  Specifically, as shown in FIG. 3B, the reference mark determination unit 2b obtains the center of gravity in the largest closed region WA1 among the extracted closed regions WA1 and WA2, and uses this center of gravity as the reference position P1. (Step S4a). Then, the reference mark determining unit 2b draws an arc R with a predetermined radius centered on the reference position P1, and obtains an intersection between the arc R and the application area SA (step S4b). Referring to FIG. 3B, the reference mark determination unit 2b obtains two intersections C1 and C2 as intersections between the arc R and the application area SA. In addition, since application | coating area | region SA is an area | region with a certain width | variety, let the center point which cross | intersects the circular arc R be an intersection.

そして、基準標決定部2bは、図3(c)に示すように、基準位置P1から2つの交差点C1、C2に向かうそれぞれの方向(ベクトル)の合成方向(合成ベクトル)或いは平均方向(平均ベクトル)を基準方向Dとして決定する(ステップS4c)。このように、基準標決定部2bは、円弧Rと塗布領域SAとの交差点が複数存在する場合、基準位置P1から複数の交差点に向かうベクトルの合成ベクトル或いは平均ベクトルを基準方向Dとして決定する。また、基準標決定部2bは、円弧Rと塗布領域SAとの交差点が1つ存在する場合、基準位置P1から1つの交差点に向かうベクトルを基準方向Dとして決定する。  Then, as shown in FIG. 3C, the reference mark determining unit 2b combines the direction (vector) or the average direction (average vector) of the respective directions (vectors) from the reference position P1 toward the two intersections C1 and C2. ) Is determined as the reference direction D (step S4c). Thus, when there are a plurality of intersections between the arc R and the application area SA, the reference mark determination unit 2b determines a combined vector or average vector of vectors from the reference position P1 toward the plurality of intersections as the reference direction D. In addition, when there is one intersection between the arc R and the application area SA, the reference mark determination unit 2b determines a vector from the reference position P1 toward one intersection as the reference direction D.

なお、円弧Rと塗布領域SAとの交差点が複数存在する場合には、上記のように基準位置P1から複数の交差点に向かうベクトルの合成ベクトル或いは平均ベクトルを基準方向Dとして決定する他、例えば複数のベクトル間に挟まれた角度の反時計回りの最初のベクトルを基準方向Dとして決定しても良い。または、複数のベクトルの内、最も長い、或いはn番目の長さのベクトルを基準方向Dとして決定しても良い。
つまり、円弧と塗布領域との交差点と基準位置とから基準方向を決定するための規則は、シール剤Sの塗布パターン等に応じてユーザが任意に決めれば良い。
When there are a plurality of intersections between the arc R and the application area SA, the combined vector or average vector of the vectors from the reference position P1 toward the plurality of intersections is determined as the reference direction D as described above. The first counter-clockwise vector sandwiched between the vectors may be determined as the reference direction D. Alternatively, the longest or nth vector among the plurality of vectors may be determined as the reference direction D.
That is, the rule for determining the reference direction from the intersection of the arc and the application region and the reference position may be arbitrarily determined by the user according to the application pattern of the sealant S or the like.

続いて、画像処理装置2の良否判定部2cは、図4(a)に示すように、塗布領域SAの中心線を塗布軌跡Lとして抽出する(ステップS5)。ここで、記憶装置3に記憶されている基準塗布軌跡をLrefとすると、検査途中で撮像装置1(つまりカメラ)とワークWとの位置関係にズレが生じていなければ、塗布軌跡Lと基準塗布軌跡Lrefとの基準位置及び基準方向は一致するはずであるが、ワークWの設置位置のガタなどで撮像装置1とワークWとの位置関係にズレが生じた場合、図4(a)に示すように、塗布軌跡Lと基準塗布軌跡Lrefとの基準位置及び基準方向にズレが生じる、つまり塗布軌跡Lと基準塗布軌跡Lrefとの位置関係にズレが生じることになる。  Subsequently, the quality determination unit 2c of the image processing apparatus 2 extracts the center line of the application area SA as an application locus L as shown in FIG. 4A (step S5). Here, when the reference application trajectory stored in the storage device 3 is Lref, the application trajectory L and the reference application are not subject to any deviation in the positional relationship between the imaging device 1 (that is, the camera) and the workpiece W during the inspection. If the reference position and the reference direction with the locus Lref should match, but the positional relationship between the imaging device 1 and the workpiece W is shifted due to the play of the installation position of the workpiece W or the like, as shown in FIG. As described above, a deviation occurs in the reference position and the reference direction between the application locus L and the reference application locus Lref, that is, a deviation occurs in the positional relationship between the application locus L and the reference application locus Lref.

そこで、良否判定部2cは、上記ステップS5にて塗布領域SAの中心線を塗布軌跡Lとして抽出した後、記憶装置3から基準塗布軌跡Lrefとその基準位置及び基準方向を示すデータを読み出し、基準塗布軌跡Lrefの基準位置及び基準方向が塗布軌跡Lの基準位置と基準方向と一致するように基準塗布軌跡Lrefを移動(平行移動或いは回転)させることにより、撮像装置1とワークWとの位置ズレに起因する塗布軌跡Lと基準塗布軌跡Lrefとの位置ズレを補正する(ステップS6)。  Therefore, the pass / fail judgment unit 2c extracts the center line of the application area SA as the application locus L in step S5, and then reads the reference application locus Lref, data indicating the reference position and reference direction from the storage device 3, and the reference By moving (parallel movement or rotation) the reference application locus Lref so that the reference position and reference direction of the application locus Lref coincide with the reference position and reference direction of the application locus L, the positional deviation between the imaging device 1 and the workpiece W is achieved. The positional deviation between the application locus L and the reference application locus Lref due to the above is corrected (step S6).

基準塗布軌跡Lrefの移動量は、基準塗布軌跡Lrefを生成した元となる正常サンプル画像から計算した基準位置及び基準方向と、塗布軌跡Lの基準位置及び基準方向との差を基に計算すれば良い。この場合、基準位置の差分だけ基準塗布軌跡Lrefを平行移動させた後、基準方向の差分だけ基準塗布軌跡Lrefを回転させることになる。なお、基準塗布軌跡Lrefを正常サンプル画像ではなく、CADモデルなどから生成している場合には、CADモデルから得られた基準塗布軌跡Lrefの基準位置及び基準方向を用いて、基準塗布軌跡Lrefの移動量を計算しても良い。  The movement amount of the reference application trajectory Lref can be calculated based on the difference between the reference position and the reference direction calculated from the normal sample image from which the reference application trajectory Lref is generated and the reference position and reference direction of the application trajectory L. good. In this case, after the reference application locus Lref is translated by the difference in the reference position, the reference application locus Lref is rotated by the difference in the reference direction. When the reference application locus Lref is generated from a CAD model or the like instead of a normal sample image, the reference application locus Lref is obtained using the reference position and reference direction of the reference application locus Lref obtained from the CAD model. The movement amount may be calculated.

そして、良否判定部2cは、上記ステップS6にて塗布軌跡Lと基準塗布軌跡Lrefとの位置ズレを補正した後、塗布軌跡Lと基準塗布軌跡Lrefとを比較し(ステップS7)、図4(b)に示すように、塗布軌跡Lの全てが基準塗布軌跡Lrefを中心とする許容範囲LA内に収まっているか否かを判定する(ステップS8)。  The pass / fail judgment unit 2c corrects the positional deviation between the application locus L and the reference application locus Lref in step S6, and then compares the application locus L with the reference application locus Lref (step S7). As shown in b), it is determined whether or not all of the application locus L is within an allowable range LA centered on the reference application locus Lref (step S8).

良否判定部2cは、上記ステップS8にて「Yes」の場合、つまり塗布軌跡Lの全てが基準塗布軌跡Lrefを中心とする許容範囲LA内に収まっている場合、シール剤Sの塗布状態は正常であると判定する(ステップS9)。一方、良否判定部2cは、上記ステップS8にて「No」の場合、つまり塗布軌跡Lの一部が基準塗布軌跡Lrefを中心とする許容範囲LA内に収まっていない場合、シール剤Sの塗布状態は異常であると判定する(ステップS10)。なお、上記のステップS5〜S10は良否判定工程に相当する。  In the case of “Yes” in step S8, that is, when all of the application trajectory L is within the allowable range LA centered on the reference application trajectory Lref, the pass / fail judgment unit 2c is in a normal state. (Step S9). On the other hand, in the case of “No” in step S8, that is, when a part of the application locus L is not within the allowable range LA centered on the reference application locus Lref, the pass / fail judgment unit 2c applies the sealant S. It is determined that the state is abnormal (step S10). In addition, said step S5-S10 is corresponded to a quality determination process.

以上のように、本実施形態に係る塗布状態検査装置Aによれば、塗布軌跡Lと基準塗布軌跡Lrefとの比較によって塗布状態の良否判定を行うに当たって、基準位置及び基準方向を一致させた上で両者を比較する、つまり撮像装置1とワークWとの位置ズレに起因する塗布軌跡Lと基準塗布軌跡Lrefとの位置ズレを補正した上で両者を比較するので、検査途中で撮像装置1とワークWとの位置関係にズレが生じた場合でも、正確に塗布状態の良否判定を行うことが可能となる。  As described above, according to the application state inspection apparatus A according to the present embodiment, the reference position and the reference direction are matched in determining whether the application state is good or bad by comparing the application locus L with the reference application locus Lref. Are compared with each other, that is, the positional deviation between the application locus L and the reference application locus Lref caused by the positional deviation between the imaging device 1 and the workpiece W is corrected and compared with each other. Even when the positional relationship with the workpiece W is deviated, it is possible to accurately determine whether the application state is good or bad.

なお、本発明は上記実施形態に限定されず、以下のような変形例が挙げられる。
(1)上記実施形態では、抽出した閉領域の内、最も大きい閉領域の重心を基準位置として決定する場合を例示したが、例えばその閉領域のそれぞれの内接円或いは外接円の中心を基準位置として決定しても良い。また、抽出した閉領域の内、所定の大きさ、或いは大きい順に決められた所定順位の閉領域を選択しても良い。
In addition, this invention is not limited to the said embodiment, The following modifications are mentioned.
(1) In the above embodiment, the case where the center of gravity of the largest closed region among the extracted closed regions is determined as the reference position is exemplified. For example, the center of each inscribed circle or circumscribed circle of the closed region is used as a reference. The position may be determined. Moreover, you may select the closed area | region of the predetermined order decided in order of predetermined magnitude | size or the largest among the extracted closed area | regions.

(2)上記実施形態では、塗布領域SAの中心線を塗布軌跡Lとして抽出し、塗布軌跡Lが基準塗布軌跡Lrefを中心とする許容範囲LA内に収まっていた場合に塗布状態が正常であると判定する場合を例示したが、例えば塗布領域SAの輪郭線を塗布軌跡Lとして抽出し、塗布軌跡Lと基準塗布軌跡Lrefとのズレ量が許容値以下の場合に塗布状態が正常であると判定するようにしても良い。この場合、良否判定部2cは、事前にシール剤S(塗布物)が正常に塗布されたワークWを撮像して得られた画像に含まれる塗布領域から抽出した塗布軌跡(塗布領域の輪郭線)を、基準塗布軌跡Lrefとして用いることになる。 (2) In the above embodiment, the center line of the application area SA is extracted as the application locus L, and the application state is normal when the application locus L is within the allowable range LA centered on the reference application locus Lref. However, for example, when the contour line of the application area SA is extracted as the application trajectory L and the amount of deviation between the application trajectory L and the reference application trajectory Lref is equal to or less than the allowable value, the application state is normal. It may be determined. In this case, the pass / fail determination unit 2c applies a coating locus (contour line of the coating region) extracted from the coating region included in the image obtained by imaging the workpiece W to which the sealant S (coating material) has been normally coated in advance. ) Is used as the reference application locus Lref.

(3)上記実施形態において、計側面の輝度を一定に保つために、照明をワークWの上方、撮像装置1に近接して設置するようにしても良い。
また、既知の画像処理手法によって、シール剤Sに切れが存在しないこと、或いはシール剤Sの太さが所定の範囲内であることを確認するなどの処理を追加し、組み合わせることが可能である。
また、本発明は、シール剤Sに限定せず、一般的な塗布物であっても、塗布の位置が適正であることを検査する工程に対して、この手法を適用することができる。
(3) In the above embodiment, the illumination may be installed above the workpiece W and in the vicinity of the imaging device 1 in order to keep the luminance of the side surface constant.
Further, it is possible to add and combine processes such as confirming that the sealant S is not cut or that the thickness of the sealant S is within a predetermined range by a known image processing method. .
Further, the present invention is not limited to the sealant S, and this method can be applied to a process of inspecting that the position of application is appropriate even for a general application.

(4)上記実施形態では、良否判定部2cが、事前にシール剤S(塗布物)が正常に塗布されたワークWを撮像して得られた画像に含まれる塗布領域から抽出した塗布軌跡(例えば塗布領域の中心線或いは輪郭線)を、基準塗布軌跡Lrefとして用いる場合を例示した。これに限らず、シール剤Sの塗布状態を規定する設計図面やCADモデル等の設計データを基に予め作成しておいた基準塗布軌跡Lrefを用いるようにしても良い。 (4) In the above embodiment, the pass / fail trajectory (c) extracted from the application region included in the image obtained by imaging the workpiece W on which the sealant S (application) has been normally applied in advance by the quality determination unit 2c. For example, the case where the center line or the contour line of the application region is used as the reference application locus Lref is illustrated. However, the present invention is not limited to this, and a reference application locus Lref created in advance based on design data such as a design drawing or a CAD model that defines the application state of the sealant S may be used.

A…塗布状態検査装置、1…撮像装置、2…画像処理装置、3…記憶装置、2a…閉領域抽出部、2b…基準標決定部、2c…良否判定部、S…シール剤、W…ワーク   A ... coating state inspection device, 1 ... imaging device, 2 ... image processing device, 3 ... storage device, 2a ... closed region extraction unit, 2b ... reference mark determination unit, 2c ... pass / fail judgment unit, S ... sealant, W ... work

Claims (10)

ワークに塗布された塗布物の塗布状態を検査する塗布状態検査装置であって、
前記塗布物が塗布された前記ワークを撮像する撮像手段と、
前記撮像手段から得られた画像を前記塗布物が塗布された塗布領域とそれ以外の領域とに分割し、前記塗布領域に囲まれた閉領域を抽出する閉領域抽出手段と、
抽出された前記閉領域の内、特定の閉領域内の1点を基準位置として決定し、当該基準位置を中心とした所定半径の円弧を描いて当該円弧と前記塗布領域との交差点を求め、所定の規則に従って前記交差点及び基準位置から基準方向を決定する基準標決定手段と、
前記塗布領域から抽出した塗布軌跡と、基準塗布軌跡との比較によって前記塗布状態の良否判定を行うに当たって、前記基準位置及び前記基準方向を一致させた上で両者を比較する良否判定手段と、
を備えることを特徴とする塗布状態検査装置。
An application state inspection device for inspecting the application state of a coating applied to a workpiece,
Imaging means for imaging the workpiece coated with the coating,
A closed region extraction unit that divides an image obtained from the imaging unit into a coating region to which the coating material is applied and a region other than that, and extracts a closed region surrounded by the coating region;
Of the extracted closed areas, determine one point in a specific closed area as a reference position, draw an arc of a predetermined radius centered on the reference position, to obtain the intersection of the arc and the application area, Reference mark determining means for determining a reference direction from the intersection and the reference position according to a predetermined rule;
In performing the pass / fail determination of the application state by comparing the application trajectory extracted from the application region and the reference application trajectory, the pass / fail determination means that compares the reference position and the reference direction and then compares both,
An application state inspection apparatus comprising:
前記基準標決定手段は、前記特定の閉領域の重心を前記基準位置として決定することを特徴とする請求項1に記載の塗布状態検査装置。   The application state inspection apparatus according to claim 1, wherein the reference mark determination unit determines a center of gravity of the specific closed region as the reference position. 前記基準標決定手段は、前記特定の閉領域の内接円或いは外接円の中心を前記基準位置として決定することを特徴とする請求項1に記載の塗布状態検査装置。   2. The application state inspection apparatus according to claim 1, wherein the reference mark determining unit determines an inscribed circle or a center of a circumscribed circle of the specific closed region as the reference position. 前記基準標決定手段は、前記円弧と前記塗布領域との交差点が1つ存在する場合、前記基準位置から前記1つの交差点に向かう方向を前記基準方向として決定することを特徴とする請求項1〜3のいずれか一項に記載の塗布状態検査装置。   The reference mark determining means determines a direction from the reference position toward the one intersection as the reference direction when there is one intersection between the arc and the application region. 4. The application state inspection apparatus according to any one of 3 above. 前記基準標決定手段は、前記円弧と前記塗布領域との交差点が複数存在する場合、前記基準位置から前記複数の交差点に向かうそれぞれの方向の合成方向或いは平均方向を前記基準方向として決定することを特徴とする請求項1〜3のいずれか一項に記載の塗布状態検査装置。   When there are a plurality of intersections between the arc and the application region, the reference mark determining means determines a combined direction or an average direction of each direction from the reference position toward the plurality of intersections as the reference direction. The application state inspection device according to any one of claims 1 to 3. 前記基準標決定手段は、抽出された前記閉領域の内、最も大きい閉領域内の1点を基準位置として決定することを特徴とする請求項1〜5のいずれか一項に記載の塗布状態検査装置。   The application state according to any one of claims 1 to 5, wherein the reference mark determining means determines, as a reference position, one point in the largest closed region among the extracted closed regions. Inspection device. 前記良否判定手段は、前記塗布領域の中心線を前記塗布軌跡として抽出し、前記塗布軌跡が前記基準塗布軌跡を中心とする許容範囲内に収まっていた場合に前記塗布状態が正常であると判定することを特徴とする請求項1〜6のいずれか一項に記載の塗布状態検査装置。   The pass / fail determination means extracts the center line of the application region as the application locus, and determines that the application state is normal when the application locus is within an allowable range centered on the reference application locus. The application state inspection device according to claim 1, wherein 前記良否判定手段は、前記塗布領域の輪郭線を前記塗布軌跡として抽出し、前記塗布軌跡と前記基準塗布軌跡とのズレ量が許容値以下の場合に前記塗布状態が正常であると判定することを特徴とする請求項1〜6のいずれか一項に記載の塗布状態検査装置。   The quality determination unit extracts the contour line of the application region as the application locus, and determines that the application state is normal when a deviation amount between the application locus and the reference application locus is an allowable value or less. The coating state inspection apparatus according to any one of claims 1 to 6. 前記良否判定手段は、事前に前記塗布物が正常に塗布された前記ワークを撮像して得られた画像に含まれる塗布領域から抽出した塗布軌跡を、前記基準塗布軌跡として用いることを特徴とする請求項1〜8のいずれか一項に記載の塗布状態検査装置。   The pass / fail judgment means uses, as the reference application trajectory, an application trajectory extracted from an application area included in an image obtained by imaging the workpiece on which the application material has been normally applied in advance. The application state inspection apparatus according to any one of claims 1 to 8. ワークに塗布された塗布物の塗布状態を検査する塗布状態検査方法であって、
前記塗布物が塗布された前記ワークを撮像する撮像工程と、
前記撮像工程から得られた画像を前記塗布物が塗布された塗布領域とそれ以外の領域とに分割し、前記塗布領域に囲まれた閉領域を抽出する閉領域抽出工程と、
抽出された前記閉領域の内、特定の閉領域内の1点を基準位置として決定し、当該基準位置を中心とした所定半径の円弧を描いて当該円弧と前記塗布領域との交差点を求め、所定の規則に従って前記交差点及び基準位置から基準方向を決定する基準標決定工程と、
前記塗布領域から抽出した塗布軌跡と、基準塗布軌跡との比較によって前記塗布状態の良否判定を行うに当たって、前記基準位置及び前記基準方向を一致させた上で両者を比較する良否判定工程と、
を有することを特徴とする塗布状態検査方法。
An application state inspection method for inspecting the application state of a coating applied to a workpiece,
An imaging step of imaging the workpiece coated with the coating;
A closed region extraction step of dividing the image obtained from the imaging step into a coating region to which the coating is applied and a region other than that, and extracting a closed region surrounded by the coating region;
Of the extracted closed areas, determine one point in a specific closed area as a reference position, draw an arc of a predetermined radius centered on the reference position, to obtain the intersection of the arc and the application area, A reference mark determining step for determining a reference direction from the intersection and the reference position according to a predetermined rule;
In performing the pass / fail determination of the application state by comparing the application trajectory extracted from the application region and the reference application trajectory, the pass / fail determination step of comparing both after matching the reference position and the reference direction,
An application state inspection method comprising:
JP2012236806A 2012-10-26 2012-10-26 Application state inspection apparatus and method Active JP5966853B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012236806A JP5966853B2 (en) 2012-10-26 2012-10-26 Application state inspection apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012236806A JP5966853B2 (en) 2012-10-26 2012-10-26 Application state inspection apparatus and method

Publications (2)

Publication Number Publication Date
JP2014083527A JP2014083527A (en) 2014-05-12
JP5966853B2 true JP5966853B2 (en) 2016-08-10

Family

ID=50787128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012236806A Active JP5966853B2 (en) 2012-10-26 2012-10-26 Application state inspection apparatus and method

Country Status (1)

Country Link
JP (1) JP5966853B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6056374B2 (en) * 2012-10-26 2017-01-11 株式会社Ihi Application state inspection apparatus and method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02230381A (en) * 1989-03-02 1990-09-12 Toyota Motor Corp Work inspecting device
JP2000046748A (en) * 1998-07-27 2000-02-18 Hitachi Ltd Method and apparatus for inspecting conductor pattern and production of multilayered substrate
JP2005049222A (en) * 2003-07-29 2005-02-24 Toto Ltd High precision positioning device
JP2009180613A (en) * 2008-01-30 2009-08-13 Toyota Motor Corp Coated line inspection method, coated line inspection device, coated line inspection program, and computer readable storage medium storing coated line inspection program
JP5399205B2 (en) * 2009-11-02 2014-01-29 株式会社サキコーポレーション Inspection device for inspection object and position correction device for electronic substrate

Also Published As

Publication number Publication date
JP2014083527A (en) 2014-05-12

Similar Documents

Publication Publication Date Title
WO2016039041A1 (en) Overlay measurement method, device and display device
US20090290782A1 (en) Method and a system for establishing an inspection-recipe
US20070047801A1 (en) Defect detecting method and defect detecting device
JP6056374B2 (en) Application state inspection apparatus and method
JP2010008159A (en) Visual inspection processing method
JP4577717B2 (en) Bump inspection apparatus and method
JP5966853B2 (en) Application state inspection apparatus and method
JP2006258713A (en) Method and apparatus for detecting stain defect
JP2005345290A (en) Streak-like flaw detecting method and streak-like flaw detector
JP5326990B2 (en) Application state inspection apparatus and method, and program
US9230337B2 (en) Analysis of the digital image of the internal surface of a tyre and processing of false measurement points
JP2005337797A (en) Pixel position acquiring method of display element, and inspection method of display panel
JP5560661B2 (en) Application state inspection apparatus and method, and program
KR101559941B1 (en) A system for detecting fault of print pattern
US10048131B2 (en) Chromaticity test method and chromaticity test apparatus
JP2019045451A (en) Inspection apparatus, inspection method and program
JP2012237681A (en) Device and method for inspecting coated state, and program
JP2006284543A (en) Method and device for inspecting mounted circuit board
JP2012237679A (en) Device and method for inspecting coated state, and program
JP4372660B2 (en) Image determination method and image processing apparatus
KR102177329B1 (en) Method for sensing of fiducial Mark
KR102174224B1 (en) Inspection method for discharge state of sealer
WO2023248795A1 (en) Defect inspecting device, and defect inspecting method
WO2020021832A1 (en) Mark inspection device, mark inspection method and article inspection device
JP4889018B2 (en) Appearance inspection method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150827

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160518

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160607

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160620

R151 Written notification of patent or utility model registration

Ref document number: 5966853

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250