JP5908703B2 - Grinding apparatus and method for cleaning circular plate workpiece - Google Patents

Grinding apparatus and method for cleaning circular plate workpiece Download PDF

Info

Publication number
JP5908703B2
JP5908703B2 JP2011247420A JP2011247420A JP5908703B2 JP 5908703 B2 JP5908703 B2 JP 5908703B2 JP 2011247420 A JP2011247420 A JP 2011247420A JP 2011247420 A JP2011247420 A JP 2011247420A JP 5908703 B2 JP5908703 B2 JP 5908703B2
Authority
JP
Japan
Prior art keywords
cleaning
circular plate
workpiece
held
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011247420A
Other languages
Japanese (ja)
Other versions
JP2013105828A (en
Inventor
徹雄 久保
徹雄 久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Priority to JP2011247420A priority Critical patent/JP5908703B2/en
Publication of JP2013105828A publication Critical patent/JP2013105828A/en
Application granted granted Critical
Publication of JP5908703B2 publication Critical patent/JP5908703B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Description

本発明は、研削時にチャックテーブルに保持されていた被加工物の面をチャックテーブルから搬出する際に洗浄することができる研削装置に関する。   The present invention relates to a grinding apparatus capable of cleaning when a surface of a workpiece held on a chuck table during grinding is carried out of the chuck table.

例えば半導体ウェーハのような円形板状ワークは、一方の面が研削装置のチャックテーブルに保持された状態で、他方の面に研削砥石が接触して研削が行われて所定の厚さに形成されるが、円形板状ワークの厚さが数十μｍ以下のように極めて薄くなると、破損しやすくなり、その後の搬送等の取り扱いが困難になるという問題がある。そこで、円形板状ワークの外周部は研削せずに厚みを残したままとして環状の補強部を形成することにより、破損を防止するとともに、取り扱いを容易としている。   For example, a circular plate-like workpiece such as a semiconductor wafer is formed to a predetermined thickness by grinding with a grinding wheel coming into contact with the other surface while one surface is held by a chuck table of a grinding device. However, when the thickness of the circular plate-shaped workpiece is extremely thin, such as several tens of μm or less, there is a problem that it becomes easy to break and handling such as subsequent conveyance becomes difficult. Therefore, the outer peripheral portion of the circular plate-like workpiece is not ground but remains in thickness, and an annular reinforcing portion is formed to prevent breakage and facilitate handling.

ところが、環状の補強部が形成された円形板状ワークを全面吸着パッドによって吸引保持して搬送しようとすると、薄く形成された部分を吸着することができないため、薄く形成された部分が湾曲して破損するという問題がある。   However, if the circular plate-like workpiece formed with the annular reinforcing portion is sucked and held by the entire surface suction pad, the thinly formed portion cannot be adsorbed, so that the thinly formed portion is curved. There is a problem of damage.

そこで、放射方向に移動可能な少なくとも３つの保持部材を備えた保持機構を用い、これら保持部材が円形板状ワークの補強部の外周部を側面側から支持することにより、薄く形成された部分の湾曲による破損を防止する技術が提案されている（例えば、特許文献１参照）。   Therefore, by using a holding mechanism having at least three holding members movable in the radial direction, and these holding members support the outer peripheral portion of the reinforcing portion of the circular plate-shaped workpiece from the side surface side, A technique for preventing breakage due to bending has been proposed (see, for example, Patent Document 1).

また、円形板状ワークの研削加工時には、研削装置のチャックテーブルに保持され保護テープが貼着されている被保持面側にも研削屑等が付着するため、スポンジ等からなる柔軟部材を保護テープに接触させて洗浄を行う洗浄機構が提案されている（例えば、特許文献２参照）。   Also, when grinding circular plate-like workpieces, grinding scraps also adhere to the surface to be held, which is held on the chuck table of the grinding device and to which the protective tape is attached, so that the flexible member made of sponge or the like is protected with the protective tape A cleaning mechanism has been proposed in which cleaning is performed in contact with the substrate (for example, see Patent Document 2).

特開２００７−２５８４５０号公報JP 2007-258450 A 特開２０１０−９４７８５号公報JP 2010-94785 A

しかし、特許文献１に開示された保持機構は、円形板状ワークの外周部において被保持面側も保持部材によって保持するため、洗浄機構を用いて被保持面を洗浄しようとすると、洗浄機構が保持部材に接触し、被保持面の全面を洗浄することができないという問題がある。   However, since the holding mechanism disclosed in Patent Document 1 holds the held surface side by the holding member at the outer peripheral portion of the circular plate-shaped workpiece, when the cleaning mechanism is used to clean the held surface, the cleaning mechanism is There is a problem that the entire surface of the surface to be held cannot be cleaned due to contact with the holding member.

また、円形板状ワークの被保持面側に保護テープは、洗浄機構による洗浄後に保護テープの周縁部に剥離テープを貼着し、剥離テープを引っ張ることによって円形板状ワークから剥離されるが、保持機構の保持部材によって保持されている部分が洗浄されていないと、当該部分の保護テープに研削屑が付着しているため、研削屑が付着している部分に剥離テープを貼り付けてしまうと、引っ張ったときに研削屑だけが剥離テープにくっついてきてしまい、保護テープを剥離できないという問題がある。したがって、かかる問題を回避するためには、保護テープのうち洗浄機構による洗浄が行われていない部分を認識し、その部分を避けて剥離テープを貼着するという煩雑な処理が必要となる。   In addition, the protective tape on the held surface side of the circular plate-shaped workpiece is peeled off from the circular plate-shaped workpiece by attaching the peeling tape to the peripheral edge of the protective tape after washing by the cleaning mechanism and pulling the peeling tape. If the part held by the holding member of the holding mechanism is not washed, grinding scraps are attached to the protective tape of the part, so if you attach the peeling tape to the part where the grinding scraps are attached When pulled, only grinding scraps stick to the peeling tape, and there is a problem that the protective tape cannot be peeled off. Therefore, in order to avoid such a problem, a complicated process of recognizing a portion of the protective tape that has not been cleaned by the cleaning mechanism and applying the release tape while avoiding that portion is necessary.

本発明は、このような問題にかんがみなされたもので、研削装置のチャックテーブルに保持されていた円形板状ワークの被保持面側が保持部材によって保持されている場合において、被保持面のうち保持部材によって保持されている部分についても洗浄できるようにすることを課題とする。   The present invention has been considered in view of such problems, and when the held surface side of the circular plate-like workpiece held by the chuck table of the grinding apparatus is held by the holding member, the holding surface is held. It is an object of the present invention to enable cleaning of a portion held by a member.

第１の発明は、円形板状ワークを吸引保持するチャックテーブルと、チャックテーブルに保持された円形板状ワークを研削加工する研削手段と、研削手段によって研削された円形板状ワークの外周縁を保持しチャックテーブルから搬出する搬出手段と、搬出手段の搬出経路に配設されチャックテーブルに吸引保持されていた円形板状ワークの被保持面を洗浄する洗浄手段と、を備える研削装置に関するもので、搬出手段は、均等な角度で少なくとも３つ配置され円形板状ワークの外周縁を保持する保持部と、保持部を放射方向に動作させる案内部と、案内部に沿って保持部を移動させる移動手段と、を備え、移動手段によって駆動されて移動する保持部を円形板状ワークの外周縁に接触させ円形板状ワークを保持するように構成され、洗浄手段は、搬出手段が保持する円形板状ワークの被保持面に垂直な回転軸と、回転軸を回転させる回転手段と、回転軸に連結され均等な角度で少なくとも３つ配置され円形板状ワークの外周部を洗浄する洗浄部材と、洗浄部材を円形板状ワークに当接させ回転手段によって洗浄部材を回転させる洗浄動作によって円形板状ワークが回転するのを防止するための回転防止手段と、から構成され、回転防止手段は、洗浄手段の回転軸と軸心を同じくし、洗浄手段と相対的に上下する上下動手段と、洗浄手段の回転軸を中心に均等な角度で少なくとも３つ配置され搬出手段の保持部より内側に位置する回転防止部と、を備えており、搬出手段に保持された円形板状ワークの中心が洗浄手段の回転軸と一致する搬出手段の搬出経路上のワーク洗浄位置において、洗浄部が、円形板状ワークの被保持面の外周部を洗浄する。 According to a first aspect of the present invention, there is provided a chuck table for sucking and holding a circular plate-like workpiece, a grinding means for grinding the circular plate-like workpiece held on the chuck table, and an outer peripheral edge of the circular plate-like workpiece ground by the grinding means. The present invention relates to a grinding apparatus comprising: unloading means for holding and unloading from a chuck table; and cleaning means for cleaning a surface to be held of a circular plate-like workpiece that is disposed in the unloading path of the unloading means and is sucked and held by the chuck table. The unloading means is arranged at least three at equal angles to hold the outer peripheral edge of the circular plate-shaped workpiece, a guide portion that moves the holding portion in the radial direction, and moves the holding portion along the guide portion. And a moving means driven by the moving means to contact the outer peripheral edge of the circular plate workpiece to hold the circular plate workpiece. The rotating plate perpendicular to the surface to be held of the circular plate-like workpiece held by the unloading means, the rotating means for rotating the rotating shaft, and at least three of the circular plate-like workpieces connected to the rotating shaft and arranged at equal angles. A cleaning member for cleaning the outer peripheral portion, and a rotation preventing means for preventing the circular plate workpiece from rotating by a cleaning operation in which the cleaning member is brought into contact with the circular plate workpiece and the cleaning member is rotated by the rotating means. The rotation prevention means is configured to have the same axis as the rotation axis of the cleaning means, and is provided with at least three vertical movement means that move up and down relative to the cleaning means, and at an equal angle around the rotation axis of the cleaning means. A rotation preventing portion positioned inside the holding portion of the unloading means, and the workpiece cleaning on the unloading path of the unloading means where the center of the circular plate-like work held by the unloading means coincides with the rotation axis of the cleaning means In position Te, cleaning unit, for cleaning the outer peripheral portion of the holding surface of the circular plate-shaped workpiece.

第２の発明は、上記研削装置において、上記洗浄手段を用いて円形板状ワークを洗浄する方法に関するもので、洗浄手段を構成する洗浄部材に、搬出手段が保持した円形板状ワークの被保持面を接触させ、洗浄手段を構成する回転防止手段を上昇させ被保持面に接触させて洗浄部材の回転動作によって被保持面のうち回転防止部が接触している箇所以外の部分を洗浄し、その後、回転防止手段を下降させて、被保持面のうち回転防止手段が接触していた部分を露出させ、洗浄部材を所定角度回転させることによって円形板状ワークが所定角度と同じ角度回転した後、再び回転防止部を上昇させ被保持面に接触させて洗浄部材の回転動作によって被保持面の未洗浄部分を洗浄する。   The second invention relates to a method for cleaning a circular plate-shaped workpiece using the cleaning means in the grinding apparatus, and the circular plate-shaped workpiece held by the carry-out means is held by a cleaning member constituting the cleaning means. The surface is brought into contact, the rotation preventing means constituting the cleaning means is raised and brought into contact with the held surface, and the portion other than the portion where the rotation preventing portion is in contact with the held surface is cleaned by the rotation operation of the cleaning member, After that, the rotation preventing means is lowered to expose the portion of the held surface that is in contact with the rotation preventing means, and the circular plate-shaped workpiece is rotated by the same angle as the predetermined angle by rotating the cleaning member by a predetermined angle. Then, the rotation preventing portion is raised again and brought into contact with the held surface, and the uncleaned portion of the held surface is cleaned by the rotation operation of the cleaning member.

本発明では、被保持面に洗浄部材が接触した円形板状部材を回転させることにより、未洗浄部分を残して被保持面の外周部を洗浄した後、円形板状部材を回転させて未洗浄部分を露出させてから、洗浄部材を当該未洗浄部分に接触させて円形板状部材を回転させることで、被保持面の外周部を全周にわたって洗浄することができる。したがって、被保持面が保護テープである場合に、保護テープを剥離するための剥離テープを貼着する部分に研削屑が付着していることがないため、剥離テープを貼着して引っ張ることにより、確実に保護テープを円形板状ワークから確実に剥離することができ、保護テープのうち洗浄が行われていない部分を認識し、その部分を避けて剥離テープを貼着するという煩雑な処理が不要となる。   In the present invention, by rotating the circular plate member whose cleaning member is in contact with the surface to be held, the outer peripheral portion of the surface to be held is cleaned while leaving an uncleaned portion, and then the circular plate member is rotated and uncleaned. By exposing the portion and then bringing the cleaning member into contact with the uncleaned portion and rotating the circular plate member, the outer peripheral portion of the held surface can be cleaned over the entire periphery. Therefore, when the surface to be held is a protective tape, grinding scraps are not attached to the part where the release tape for peeling the protective tape is attached. It is possible to reliably peel off the protective tape from the circular plate-shaped workpiece, and recognize the part of the protective tape that has not been cleaned, and avoid the complicated process of attaching the peeling tape. It becomes unnecessary.

研削装置の一例を模式的に示した平面図である。It is the top view which showed an example of the grinding device typically. 搬出手段を構成する保持機構の一例を示す斜視図である。It is a perspective view which shows an example of the holding mechanism which comprises a carrying-out means. 同保持機構の一例を示す分解斜視図である。It is a disassembled perspective view which shows an example of the holding mechanism. 保持機構の動作例を模式的に示す平面図である。It is a top view which shows typically the operation example of a holding mechanism. 洗浄手段の一例を略示的に示す断面図である。It is sectional drawing which shows typically an example of a washing | cleaning means. 同洗浄手段を模式的に示す底面図である。It is a bottom view which shows the same washing | cleaning means typically. 研削後の被加工物の一例を示す断面図である。It is sectional drawing which shows an example of the to-be-processed object after grinding. 保持機構が同被加工物を保持した状態を略示的に示す断面図である。It is sectional drawing which shows schematically the state in which the holding mechanism hold | maintained the said workpiece. 洗浄手段によって被加工物を洗浄する状態を略示的に示す断面図である。It is sectional drawing which shows schematically the state which wash | cleans a to-be-processed object by a washing | cleaning means. 同洗浄手段によって被加工物を洗浄する手順の一例を模式的に示す底面図である。It is a bottom view which shows typically an example of the procedure which wash | cleans a to-be-processed object by the same washing | cleaning means. 同洗浄手段によって洗浄された被加工物の洗浄された領域を示す底面図である。It is a bottom view which shows the area | region where the workpiece cleaned by the cleaning means was cleaned.

図１に示す研削装置１は、円形板状ワークを吸引保持する複数の（図示の例では４つの）チャックテーブル２と、チャックテーブル２に保持された円形板状ワークに対して研削加工を施す第1研削手段３０及び第２研削手段３１と、研削された円形板状ワークを研磨する研磨手段３２とを備えている。複数のチャックテーブル２は、ターンテーブル２ａによって公転及び自転可能に支持されている。   A grinding apparatus 1 shown in FIG. 1 performs a grinding process on a plurality of (four in the illustrated example) chuck tables 2 for sucking and holding a circular plate workpiece and the circular plate workpieces held on the chuck table 2. A first grinding means 30 and a second grinding means 31 and a grinding means 32 for grinding the ground circular plate-like workpiece are provided. The plurality of chuck tables 2 are supported by the turntable 2a so as to be able to revolve and rotate.

研削装置１の前部側には、加工前の円形板状ワークＷを収容する第１カセット４０と、加工後の円形板状ワークＷを収容する第２カセット４１とを備えている。そして、第１カセット４０及び第２カセット４１の近傍には、第１カセット４０からの円形板状ワークＷの取り出し及び第２カセット４１への円形板状ワークＷの収容を行うロボット４２が配設されている。なお、円形板状ワークＷには、結晶方位識別マークであるオリエンテーションフラットやノッチが形成されているものも含まれる。   On the front side of the grinding apparatus 1, there are provided a first cassette 40 for storing the circular plate-shaped workpiece W before processing and a second cassette 41 for storing the circular plate-shaped workpiece W after processing. In the vicinity of the first cassette 40 and the second cassette 41, a robot 42 for taking out the circular plate-like workpiece W from the first cassette 40 and storing the circular plate-like workpiece W in the second cassette 41 is arranged. Has been. Note that the circular plate-like workpiece W includes those in which an orientation flat or notch as a crystal orientation identification mark is formed.

ロボット４２は、円形板状ワークＷを吸引保持するハンド部４２０と、ハンド部４２０に連結され屈曲可能なアーム部４２１と、ハンド部４２０及びアーム部４２１をＸ軸方向に移動させる駆動手段４２２とを備えている。   The robot 42 includes a hand unit 420 that sucks and holds the circular plate-shaped workpiece W, an arm unit 421 that is connected to the hand unit 420 and can be bent, and a driving unit 422 that moves the hand unit 420 and the arm unit 421 in the X-axis direction. It has.

ハンド部４２０の可動域には、加工前の円形板状ワークＷを所定の位置に位置あわせする仮置きテーブル４３が配設されている。   In the movable range of the hand unit 420, a temporary placement table 43 for aligning the circular plate-like workpiece W before processing at a predetermined position is disposed.

第１研削手段３の前方は、加工前の円形板状ワークＷをチャックテーブル２に載置したり、加工後の円形板状ワークＷを次の工程に移送するためにチャックテーブル２から取り出したりする領域である搬出入領域４４となっている。搬出入領域４４の近傍には、仮置きテーブル４３から搬出入領域４４に位置するチャックテーブル２への円形板状ワークＷの搬入を行う搬入手段４５と、搬出入領域４４に位置するチャックテーブル２からの円形板状ワークＷの搬出を行う搬出手段５とが配設されている。搬出手段５は、アーム部１１の先端に取り付けられ円形板状ワークＷを保持する保持機構１０を備えている。保持機構１０は、研削された円形板状ワークＷの外周縁を保持し、その状態でアーム部１１を旋回及びＹ軸方向に移動させることにより、円形板状ワークＷをチャックテーブル２から搬出することができる。   In front of the first grinding means 3, the circular plate-like workpiece W before processing is placed on the chuck table 2, or the processed circular plate-like workpiece W is taken out from the chuck table 2 to be transferred to the next step. It is a carry-in / out area 44 which is an area to be operated. In the vicinity of the loading / unloading area 44, loading means 45 for loading the circular plate-shaped workpiece W from the temporary placement table 43 to the chuck table 2 positioned in the loading / unloading area 44 and the chuck table 2 positioned in the loading / unloading area 44. Unloading means 5 for unloading the circular plate-like workpiece W from is provided. The carry-out means 5 includes a holding mechanism 10 that is attached to the tip of the arm portion 11 and holds the circular plate-like workpiece W. The holding mechanism 10 holds the outer peripheral edge of the ground circular plate-like workpiece W, and in this state, the arm portion 11 is turned and moved in the Y-axis direction to carry out the circular plate-like workpiece W from the chuck table 2. be able to.

搬出手段５による円形板状ワークＷの搬出経路には、保持機構１０によって保持された円形板状ワークＷの下面、すなわちチャックテーブル２によって吸引保持されていた被保持面を洗浄する洗浄手段６を備えている。また、洗浄手段６の近傍には、円形板状ワークＷの上面側を洗浄し乾燥する洗浄乾燥手段７が配設されている。なお、洗浄手段６の配設位置は、搬出手段６による円形板状ワークＷの搬出経路の下方であれば、図示の位置には限定されない。   A cleaning unit 6 for cleaning the lower surface of the circular plate-like workpiece W held by the holding mechanism 10, that is, the surface to be held that is sucked and held by the chuck table 2, is provided in the carry-out path of the circular plate-like workpiece W by the carry-out means 5. I have. Further, in the vicinity of the cleaning means 6, a cleaning / drying means 7 for cleaning and drying the upper surface side of the circular plate-like workpiece W is disposed. The position of the cleaning means 6 is not limited to the illustrated position as long as it is below the carry-out path of the circular plate workpiece W by the carry-out means 6.

図２に示すように、保持機構１０は、板状ワークの外周縁に係合して板状ワークを保持する少なくとも３個の保持部１３と、保持部１３を板状ワークの外周縁に対して水平方向に移動可能に支持する支持プレート１４と、支持プレート１４の上面側において支持プレート１４に対して所定範囲回動可能に配設された回動プレート１５と、アーム部１１の先端の取り付けられ支持プレート１４に対して傾斜可能に連結された取り付け板１６と、支持プレート１４を鉛直方向に移動させる垂直方向駆動部１７とを備えている。   As shown in FIG. 2, the holding mechanism 10 includes at least three holding portions 13 that engage with the outer peripheral edge of the plate-like workpiece to hold the plate-like workpiece, and the holding portion 13 with respect to the outer peripheral edge of the plate-like workpiece. A support plate 14 that is movably supported in the horizontal direction, a rotation plate 15 that is disposed on the upper surface side of the support plate 14 so as to be rotatable within a predetermined range with respect to the support plate 14, and attachment of the tip of the arm portion 11. The mounting plate 16 is connected to the support plate 14 so as to be tiltable, and the vertical driving unit 17 moves the support plate 14 in the vertical direction.

図３に示すように、保持部１３は、フッ素系樹脂等の摩擦抵抗の小さい合成樹脂によって形成され係合凹部１３０ａを備えた係合部材１３０と、係合部材１３０から上方に立設された円柱状の被支持部１３１とから構成され、被支持部１３１の内周面には、ボルトを螺合させる雌ねじ穴１３１ａが形成されている。３つの保持部１３は、支持プレート１４の中心を基準に均等な角度で配置されており、係合凹部１３０ａにおいて円形板状ワークＷの外周縁を係合させることにより、円形板状ワークＷを外周面側から保持することができる。   As shown in FIG. 3, the holding portion 13 is formed of a synthetic resin having a low frictional resistance such as a fluorine resin, and includes an engaging member 130 having an engaging concave portion 130 a, and is erected upward from the engaging member 130. A cylindrical threaded supported portion 131 is formed, and a female screw hole 131 a for screwing a bolt is formed on the inner peripheral surface of the supported portion 131. The three holding portions 13 are arranged at an equal angle with respect to the center of the support plate 14. By engaging the outer peripheral edge of the circular plate-like workpiece W in the engagement recess 130 a, the circular plate-like workpiece W is arranged. It can hold | maintain from an outer peripheral surface side.

支持プレート１４には、保持部１３の個数及び位置に対応して、径方向に長く表裏面を貫通する長孔１４０が形成されている。長孔１４０は、保持部１３の被支持部１３１を長孔１４０の長手方向に移動自在に支持し、３つの保持部１３を放射方向に動作させる際の案内部として機能する。長孔１４０の幅は、被支持部１３１の直径よりわずかに大きく形成されている。   In the support plate 14, corresponding to the number and position of the holding portions 13, elongated holes 140 that are long in the radial direction and penetrate the front and back surfaces are formed. The long hole 140 functions as a guide portion when the supported portion 131 of the holding portion 13 is movably supported in the longitudinal direction of the long hole 140 and the three holding portions 13 are operated in the radial direction. The width of the long hole 140 is slightly larger than the diameter of the supported portion 131.

支持プレート１４の下面からは、保持対象の円形板状ワークＷの水平方向の移動を規制する少なくとも３個の長さが等しい水平方向移動規制ピン１８が下方に突出して形成されており、その下端は保持部１３より下方に位置している。支持プレート１４の上面からは、３本の複数の支持柱１９が立設されている。支持柱１９の上端には雌ねじ穴１９ａが形成されている。それぞれの支持柱１９には、コイルバネ１９０が挿嵌されている。一方、支持プレート１４の中心部上面には、大径部２０ａ及び小径部２０ｂを有する段つきナット２０が取り付けられている。   From the lower surface of the support plate 14, at least three horizontal direction movement restriction pins 18 that restrict the movement of the circular plate-like workpiece W to be held in the horizontal direction protrude downward, and the lower ends thereof are formed. Is located below the holding portion 13. From the upper surface of the support plate 14, three support pillars 19 are erected. A female screw hole 19 a is formed at the upper end of the support column 19. A coil spring 190 is inserted into each support column 19. On the other hand, a stepped nut 20 having a large diameter portion 20a and a small diameter portion 20b is attached to the upper surface of the center portion of the support plate 14.

回動プレート１５は、段突きナット２０の小径部２０ｂに嵌合する内径を有する中心孔１５０と、周方向に長く形成され表裏面を貫通する３個の長孔１５１と、所定間隔をおいて外周方向に突出形成された３個のアーム部１５２とを有している。それぞれのアーム部１５２の先端には、枢軸１５３によってアーム部１５２に対して回動可能にリンク１５４が連結されている。リンク１５４には、表裏面を貫通する貫通孔１５４ａが形成されている。３個のアーム部１５２のうちの１つから周方向に突出した位置には、上方に突出する連結突起１５５が形成されている。   The rotating plate 15 has a center hole 150 having an inner diameter that fits into the small diameter portion 20b of the stepped nut 20 and three long holes 151 that are long in the circumferential direction and penetrate the front and back surfaces, with a predetermined interval. And three arm portions 152 projecting in the outer circumferential direction. A link 154 is connected to the tip of each arm portion 152 so as to be rotatable with respect to the arm portion 152 by a pivot 153. The link 154 has a through hole 154a that penetrates the front and back surfaces. A connecting protrusion 155 protruding upward is formed at a position protruding in the circumferential direction from one of the three arm portions 152.

支持プレート１４の上面側には、ピストンロッド２１を出没させるエアシリンダ２２が配設されており、ピストンロッド２１の先端部には、回動プレート１５においてリング状に形成された連結突起１５５と係合する連結係合部２１ａが形成されている。   An air cylinder 22 for projecting and retracting the piston rod 21 is disposed on the upper surface side of the support plate 14, and a distal end portion of the piston rod 21 is connected to a connection protrusion 155 formed in a ring shape on the rotating plate 15. A mating engagement portion 21a is formed.

また、図２に示したように、ボルト２３を図３に示した貫通孔１５４ａ、スペーサ２４及び長孔１４０に挿通し、係合部材１３の雌ねじ穴１３１ａに螺合させると、枢軸１５３を中心としてリンク１５４が回動することにより回動プレート１５が支持プレート１４に対して所定範囲回動可能となった状態で、支持プレート１４と回動プレート１５とが連結される。段つきナット２０にはボルト２６を螺合させ、回動プレート１５の抜けを防止する。   Further, as shown in FIG. 2, when the bolt 23 is inserted into the through hole 154a, the spacer 24 and the long hole 140 shown in FIG. 3 and screwed into the female screw hole 131a of the engaging member 13, the pivot 153 is centered. As the link 154 is rotated, the support plate 14 and the rotation plate 15 are connected in a state where the rotation plate 15 can rotate within a predetermined range with respect to the support plate 14. A bolt 26 is screwed into the stepped nut 20 to prevent the turning plate 15 from coming off.

また、アーム部１５２から側方に突出した位置に設けられた連結突起１５５をピストンロッド２１の先端の連結係合部２１ａに係合させると、エアシリンダ２２によってピストンロッド２１が図２における矢印Ａ方向に駆動されることにより、回動プレート１５が矢印Ｂ方向に回動可能となる。そして、回動プレート１５が矢印Ｂ方向に回動すると、それにともないリンク１５４が矢印Ｃ方向に動くため、リンク１５４に連結された保持部１３が矢印Ｄ方向、すなわち支持プレート１４の中心に向かう方向に移動する。この動きについて図４を参照して説明すると、初期状態では、図４（ａ）に示すように、３個のアーム部１５２がリンク１５４と一直線上にある。そして、図４（ｂ）に示すように、エアシリンダ２２によって駆動されて回動プレート１５が矢印Ｂ方向に回動すると、アーム部１５２とリンク１５４とが一直線上でなくなり、Ｃ方向に向きを変えたリンク１５４が保持部１３を支持プレート１４の中心に向かう方向に引っぱり、これによって保持部１３が長孔１４０に沿って互いが近づく方向（Ｄ方向）に移動する。   Further, when the connection protrusion 155 provided at a position protruding sideways from the arm portion 152 is engaged with the connection engagement portion 21a at the tip of the piston rod 21, the piston rod 21 is moved by the arrow A in FIG. By being driven in the direction, the rotation plate 15 can be rotated in the arrow B direction. When the rotation plate 15 rotates in the direction of arrow B, the link 154 moves in the direction of arrow C accordingly, so that the holding portion 13 connected to the link 154 moves in the direction of arrow D, that is, the direction toward the center of the support plate 14. Move to. This movement will be described with reference to FIG. 4. In the initial state, as shown in FIG. 4A, the three arm portions 152 are in line with the link 154. Then, as shown in FIG. 4B, when the rotation plate 15 is driven by the air cylinder 22 and rotates in the arrow B direction, the arm portion 152 and the link 154 are not in a straight line, and are directed in the C direction. The changed link 154 pulls the holding portion 13 in the direction toward the center of the support plate 14, thereby moving the holding portion 13 along the long hole 140 in a direction (D direction) toward each other.

このように、エアシリンダ２２及びピストンロッド２１並びに回動プレート１５は、３つの係合部材１３を、互いが近づく方向に移動させる移動手段２７を構成しており、移動手段２７によって駆動されて移動する保持部１３を円形板状ワークＷの外周縁に接触させて円形板状ワークＷを保持するように構成されている。   As described above, the air cylinder 22, the piston rod 21, and the rotation plate 15 constitute a moving unit 27 that moves the three engaging members 13 in a direction in which the three engaging members 13 approach each other, and is moved by being driven by the moving unit 27. The holding part 13 to be in contact with the outer peripheral edge of the circular plate-like workpiece W is configured to hold the circular plate-like workpiece W.

さらに、図３に示すように、取り付け板１６においては、支持プレート１４の上面から立設された３本の支持柱１９に対応する位置に３つの貫通孔１６０が配設されており、これら貫通孔１６０に挿通するボルト２５を支持柱１９に形成された雌ねじ穴１９ａに螺合させることにより、取り付け板１６に支持プレート１４が固定される。   Further, as shown in FIG. 3, in the mounting plate 16, three through holes 160 are disposed at positions corresponding to the three support pillars 19 erected from the upper surface of the support plate 14. The support plate 14 is fixed to the mounting plate 16 by screwing the bolt 25 inserted into the hole 160 into the female screw hole 19 a formed in the support column 19.

図５に示すように、洗浄手段６は、回転軸６０と、回転軸６０を回転させるモータからなる回転手段６１と、回転軸６０に連結された洗浄部６２とを備えている。   As shown in FIG. 5, the cleaning unit 6 includes a rotating shaft 60, a rotating unit 61 including a motor that rotates the rotating shaft 60, and a cleaning unit 62 connected to the rotating shaft 60.

回転軸６０の軸心は、搬出手段５を構成する図２及び図３に示した保持機構１０が保持する円形板状ワークＷの被保持面に対して垂直となっている。ここで、被保持面は、研削時に図１に示したチャックテーブル２に保持される面である。   The axis of the rotary shaft 60 is perpendicular to the held surface of the circular plate-like workpiece W held by the holding mechanism 10 shown in FIGS. Here, the surface to be held is a surface held by the chuck table 2 shown in FIG. 1 during grinding.

洗浄部６２は、図６に示すように、回転軸６０に連結され放射状に延びる少なくとも３つの板部材６２０と、板部材６２０の先端部上面に固着された少なくとも３つの洗浄部材６２１とを備えている。洗浄部材６２１は、均等な角度で少なくとも３個配設されている。個々の洗浄部材６２１は、スポンジのような柔軟な部材であり、例えばアイオン株式会社のソフラスという製品を使用することができる。洗浄部６２は、円形板状ワークＷの被保持面に接触し回転することにより、被保持面の外周部を洗浄することができる。   As shown in FIG. 6, the cleaning unit 62 includes at least three plate members 620 that are connected to the rotation shaft 60 and extend radially, and at least three cleaning members 621 that are fixed to the upper surface of the front end of the plate member 620. Yes. At least three cleaning members 621 are arranged at an equal angle. Each cleaning member 621 is a flexible member such as a sponge, and for example, a product called Sofras manufactured by Aion Co., Ltd. can be used. The cleaning unit 62 can clean the outer peripheral portion of the held surface by contacting and rotating the held surface of the circular plate-like workpiece W.

図５に示すように、洗浄部６２の下方には、洗浄手段６によって洗浄される円形板状ワークが回転するのを防止する回転防止手段８が配設されている。回転防止手段８は洗浄手段６の回転軸６０と軸心を同じくしており、回転軸６０の周囲に筒部８０が巻かれている。図６に示すように、筒部８０からは放射状に少なくとも３つの板部材８１が延びており、板部材８１の先端部上面には回転防止部材８２が固着されている。回転防止部材８２は、洗浄手段６の回転軸６０を中心に均等な角度で配置されている。また、搬出手段５が洗浄手段６及び回転防止手段８の直上に位置する状態では、３つの回転防止部材８２は、搬出手段５の３つの保持部１３を結ぶ円弧よりも内側に位置している。   As shown in FIG. 5, below the cleaning unit 62, rotation preventing means 8 that prevents the circular plate-like workpiece cleaned by the cleaning means 6 from rotating is disposed. The rotation preventing means 8 has the same axis as the rotating shaft 60 of the cleaning means 6, and a cylindrical portion 80 is wound around the rotating shaft 60. As shown in FIG. 6, at least three plate members 81 extend radially from the cylindrical portion 80, and a rotation preventing member 82 is fixed to the upper surface of the distal end portion of the plate member 81. The rotation preventing member 82 is arranged at an equal angle around the rotation shaft 60 of the cleaning means 6. Further, in a state in which the carry-out means 5 is located immediately above the cleaning means 6 and the rotation prevention means 8, the three rotation prevention members 82 are located inside the arc connecting the three holding portions 13 of the carry-out means 5. .

図５に示すように、筒部８０の外周側にはシリンダ８３によって駆動されて昇降するピストン８４が連結されており、ピストン８４の昇降とともに筒部８０も昇降する構成となっており、シリンダ８３とピストン８４とで、回転防止手段８を洗浄手段６に対して相対的に上下動させる上下動手段８５を構成している。   As shown in FIG. 5, a piston 84 that is driven by a cylinder 83 to move up and down is connected to the outer peripheral side of the cylinder portion 80, and the cylinder portion 80 is also moved up and down as the piston 84 moves up and down. The piston 84 and the piston 84 constitute a vertical movement means 85 that moves the rotation prevention means 8 up and down relatively with respect to the cleaning means 6.

図１に示した研削装置１においては、ロボット４２によって第１カセット４０から加工前の円形板状ワークＷが取り出され、仮置きテーブル４３に搬送される。そして、仮置きテーブル４３において円形板状ワークＷが所定の位置に位置決めされた後、搬入手段４５によって搬出入領域４４に位置するチャックテーブル２に搬送され保持される。   In the grinding apparatus 1 shown in FIG. 1, the circular plate-like workpiece W before processing is taken out from the first cassette 40 by the robot 42 and conveyed to the temporary placement table 43. Then, after the circular plate-like workpiece W is positioned at a predetermined position on the temporary placement table 43, it is conveyed and held by the loading means 45 on the chuck table 2 located in the loading / unloading area 44.

次に、ターンテーブル２ａが回転することによりチャックテーブル２に保持された円形板状ワークＷが第１研削手段３０、第２研削手段３１、研磨手段３２の下方に順次移送され、円形板状ワークＷの露出面（上面）に対してそれぞれの手段による加工が行われる。そして、図７に示すように、円形板状ワークＷの裏面Ｗ２のうち、デバイスが存在しない周縁部の領域である余剰領域を研削せず、デバイス領域の裏側のみを研削すると、余剰領域については当初の厚さが維持されて補強部Ｗ３が形成される。補強部Ｗ３が形成された円形板状ワークＷは、補強部Ｗ３のない円形板状ワークと比較して、その後の搬送等の取り扱いが容易となる。円形板状ワークＷの表面Ｗ１には、デバイス保護のための保護テープＴが貼着されている。   Next, when the turntable 2a is rotated, the circular plate-like workpiece W held on the chuck table 2 is sequentially transferred below the first grinding means 30, the second grinding means 31, and the polishing means 32, so that the circular plate-like workpiece is transferred. The exposed surface (upper surface) of W is processed by each means. And, as shown in FIG. 7, when grinding only the back side of the device region without grinding the surplus region which is the region of the peripheral portion of the back surface W2 of the circular plate-like workpiece W, about the surplus region, The initial thickness is maintained and the reinforcing portion W3 is formed. The circular plate-like workpiece W on which the reinforcing portion W3 is formed is easier to handle such as subsequent conveyance as compared with the circular plate-like workpiece without the reinforcing portion W3. A protective tape T for device protection is attached to the surface W1 of the circular plate workpiece W.

こうして研磨手段３２による加工が行われた後、ターンテーブル２ａの回転によって加工後の円形板状ワークＷが搬出入領域４４に移動し、搬出手段５によって加工後の円形板状ワークＷが保持される。   After the processing by the polishing means 32 is performed in this way, the circular plate-like workpiece W after processing is moved to the carry-in / out area 44 by the rotation of the turntable 2a, and the circular plate-like workpiece W after processing is held by the carry-out means 5. The

搬出手段５を構成する保持機構１０においては、図８に示すように、３つの保持部１３が円形板状ワークＷの外周縁Ｗ４に接触して保持される。またこのとき、水平方向移動規制ピン１８によって円形板状ワークＷが水平方向にずれるのを防止する。   In the holding mechanism 10 constituting the carry-out means 5, the three holding portions 13 are held in contact with the outer peripheral edge W4 of the circular plate-like workpiece W as shown in FIG. Further, at this time, the circular plate-like workpiece W is prevented from being shifted in the horizontal direction by the horizontal direction movement restriction pin 18.

このようにして加工後の円形板状ワークＷが保持機構１０によって保持されると、図１に示したアーム部１１のＹ軸方向の移動及び旋回により、円形板状ワークＷが、搬出経路に位置する洗浄手段６及び回転防止手段８の直上に移動し、そこで停止する。このとき、搬出手段５に保持された円形板状ワークＷの位置は、その中心が洗浄手段６の回転軸６０と一致するワーク洗浄位置となる。   When the circular plate-like workpiece W after processing is held by the holding mechanism 10 in this way, the circular plate-like workpiece W is moved to the carry-out path by the movement and turning of the arm portion 11 shown in FIG. It moves right above the cleaning means 6 and the rotation prevention means 8 that are positioned, and stops there. At this time, the position of the circular plate-like workpiece W held by the carry-out means 5 is a workpiece cleaning position whose center coincides with the rotation shaft 60 of the cleaning means 6.

円形板状ワークＷがワーク洗浄位置に位置した状態で、保持機構１０が下降することにより、図９に示すように、円形板状ワークＷの被保持面Ｗ１側の保護テープＴに洗浄部材６２１を接触させる。また、上下動手段８５の駆動により、回転防止手段８を上昇させて、回転防止部材８２を保護テープＴに接触させる。このとき、回転防止部材８２の上面は、洗浄部材６２１の上面よりも０．５ｍｍほど高い位置にあり、回転防止部材８２は、洗浄部材６２１よりも強く保護テープＴを押圧する。このようにして、回転防止部材８２が保護テープＴ及び円形板状ワークＷの回転を阻止する。   With the circular plate-like workpiece W positioned at the workpiece cleaning position, the holding mechanism 10 is lowered, so that the cleaning member 621 is applied to the protective tape T on the held surface W1 side of the circular plate-like workpiece W as shown in FIG. Contact. Further, by driving the vertical movement means 85, the rotation prevention means 8 is raised and the rotation prevention member 82 is brought into contact with the protective tape T. At this time, the upper surface of the rotation preventing member 82 is at a position higher by about 0.5 mm than the upper surface of the cleaning member 621, and the rotation preventing member 82 presses the protective tape T stronger than the cleaning member 621. In this manner, the rotation preventing member 82 prevents the rotation of the protective tape T and the circular plate workpiece W.

図９に示したように、洗浄部材６２１及び回転防止部材８２を保護テープＴに接触させた時は、洗浄部材６２１と回転防止部材８２とが重ならない位置に位置している。そして、図１０（ａ）に示すように、回転手段６１の駆動により洗浄手段６を矢印Ｐ方向に回転させる。具体的には、洗浄手段６は、１つの洗浄部材６２１が２つの回転防止部材８２に衝突しない範囲で回転させてから停止させる。このようにして、洗浄部材６２１が保護テープＴに接触した状態で回転することにより、図１１（ａ）に示すように、被保持面である保護テープＴの外周部のうち、回転防止部材８２が接触している箇所以外の部分である第１領域１００が洗浄される。洗浄中は、図９に示した回転手段６１が洗浄部材６２１を回転させることによって円形板状ワークＷが回転するのを回転防止手段８２が防止するため、洗浄を確実に行うことができる。この段階では、隣り合う第1領域１００間に、未洗浄領域である第２領域が残されている。なお、図１１においては、洗浄済みの領域に斜線を引いて示している。   As shown in FIG. 9, when the cleaning member 621 and the rotation prevention member 82 are brought into contact with the protective tape T, the cleaning member 621 and the rotation prevention member 82 are positioned so as not to overlap each other. Then, as shown in FIG. 10A, the cleaning means 6 is rotated in the direction of arrow P by driving the rotation means 61. Specifically, the cleaning means 6 stops after rotating one cleaning member 621 within a range where it does not collide with the two rotation preventing members 82. Thus, by rotating the cleaning member 621 in contact with the protective tape T, as shown in FIG. 11A, the anti-rotation member 82 of the outer peripheral portion of the protective tape T that is the held surface is provided. The first region 100 which is a portion other than the portion in contact with is cleaned. During cleaning, the rotation preventing means 82 prevents the circular plate-like workpiece W from rotating by rotating the cleaning member 621 by the rotating means 61 shown in FIG. 9, so that cleaning can be performed reliably. At this stage, a second region that is an uncleaned region remains between the adjacent first regions 100. In FIG. 11, the cleaned region is indicated by hatching.

次に、回転防止手段８を下降させることにより回転防止部材８２と保護テープＴとの接触状態を解除した後、図１０（ｂ）に示すように、洗浄手段６を矢印Ｑ方向に回転させる。そうすると、保護テープＴが回転防止部材８２と接触していないため、洗浄部材６２１とともに保護テープＴ及び円形板状ワークＷも矢印Ｑ方向に回転する。   Next, after the rotation preventing means 8 is lowered to release the contact state between the rotation preventing member 82 and the protective tape T, the cleaning means 6 is rotated in the arrow Q direction as shown in FIG. Then, since the protective tape T is not in contact with the rotation preventing member 82, the protective tape T and the circular plate-shaped workpiece W are also rotated in the arrow Q direction together with the cleaning member 621.

そして、図１１（ｂ）に示すように、被保持面である保護テープＴのうち回転防止手段８を構成する回転防止部材８２が接触していた部分である未洗浄の第２領域１０１が露出する。   And as shown in FIG.11 (b), the 2nd area | region 101 which is not wash | cleaned which is the part which the rotation prevention member 82 which comprises the rotation prevention means 8 was contacting among the protective tape T which is a to-be-held surface is exposed. To do.

このようにして第２領域１０１が露出した後、再び回転防止部材８２を上昇させて保護テープＴに接触させ、図１０（ｃ）に示すように、洗浄部材６２１の矢印Ｒ方向の回転動作によって第２領域１０１を洗浄する。そうすると、図１１（ｃ）に示すように、第２領域１０１にも洗浄部材６２１が接触して洗浄され、外周部が全周にわたって洗浄される。なお、２回目の洗浄を行う場合は、回転防止部材８２が接触していた第３領域１０２が未洗浄となっているため、第３領域１０２が露出するようにしてから洗浄を行えばよい。   After the second region 101 is exposed in this manner, the rotation preventing member 82 is raised again and brought into contact with the protective tape T, and the cleaning member 621 is rotated in the direction of arrow R as shown in FIG. The second area 101 is cleaned. Then, as shown in FIG. 11C, the cleaning member 621 comes into contact with the second region 101 and is cleaned, and the outer peripheral portion is cleaned over the entire circumference. In the case of performing the second cleaning, since the third region 102 in contact with the rotation preventing member 82 is not cleaned, the cleaning may be performed after the third region 102 is exposed.

洗浄部材６２１は、１回目の洗浄において保護テープＴの汚れた面と接触するため、研削屑がわずかに付着するが、保護テープＴに付着する研削屑は、円形板状ワークの品質には影響しない。   Since the cleaning member 621 comes into contact with the dirty surface of the protective tape T in the first cleaning, a slight amount of grinding dust adheres to the cleaning member 621. However, the grinding dust adhering to the protective tape T affects the quality of the circular plate workpiece. do not do.

このようにして保護テープＴが洗浄されると、保護テープＴに剥離テープを貼着し、剥離テープを引っ張ることによって、保護テープＴが円形板状ワークから剥離される。剥離テープを保護テープＴに貼着する際には、保護テープＴに研削屑等が付着していないため、剥離テープを貼りつける位置を選ぶ必要がない。   When the protective tape T is washed in this way, the protective tape T is peeled from the circular plate-shaped workpiece by sticking the peeling tape to the protective tape T and pulling the peeling tape. When the release tape is attached to the protective tape T, there is no need to select the position where the release tape is applied because no grinding dust or the like adheres to the protective tape T.

１：研削装置
２：チャックテーブル ２ａ：ターンテーブル
３０：第１研削手段 ３１：第２研削手段 ３２：研磨手段
４０：第１カセット ４１：第２カセット
４２：ロボット ４２０：ハンド部 ４２１：アーム部 ４２２：駆動手段
４３：仮置きテーブル ４４：搬出入領域 ４５：搬入手段
５：搬出手段
６：洗浄手段 ６０：回転軸 ６１：回転手段
６２：洗浄部 ６２０：板部材 ６２１：洗浄部材
７：洗浄乾燥手段
８：回転防止手段 ８０：筒部 ８１：板部材 ８２：回転防止部材
８３：シリンダ ８４：ピストン
１０：保持機構
１１：アーム部
１３：保持部
１３０：係合部材 １３１：被保持部 １３１ａ：雌ねじ穴
１４：支持プレート １４０：長孔（案内部）
１５：回動プレート
１５０：中心孔 １５１：長孔 １５２：アーム部 １５３：枢軸
１５４：リンク １５４ａ：貫通孔 １５５：連結突起
１６：取り付け板 １６０：貫通孔
１７：垂直方向駆動部
１８：水平方向移動規制ピン
１９：支持柱 １９ａ：雌ねじ穴 １９０：コイルバネ
２０：段つきナット ２０ａ：大径部 ２０ｂ：小径部
２１：ピストンロッド ２１ａ：連結係合部 ２２：エアシリンダ
２３：ボルト ２４：スペーサ ２５：ボルト ２６：ボルト
２７：移動手段 1: Grinding device 2: Chuck table 2a: Turntable 30: First grinding means 31: Second grinding means 32: Polishing means 40: First cassette 41: Second cassette 42: Robot 420: Hand part 421: Arm part 422 : Driving means 43: Temporary placement table 44: Loading / unloading area 45: Loading / unloading means 5: Unloading means 6: Cleaning means 60: Rotating shaft 61: Rotating means 62: Cleaning unit 620: Plate member 621: Cleaning member 7: Cleaning and drying means 8: Anti-rotation means 80: Tube portion 81: Plate member 82: Anti-rotation member 83: Cylinder 84: Piston 10: Holding mechanism 11: Arm portion 13: Holding portion
130: engaging member 131: held portion 131a: female screw hole 14: support plate 140: long hole (guide portion)
15: Rotating plate 150: Center hole 151: Long hole 152: Arm part 153: Pivot 154: Link 154a: Through hole 155: Connection protrusion 16: Mounting plate 160: Through hole 17: Vertical drive part 18: Horizontal movement Restriction pin 19: Support pillar 19a: Female screw hole 190: Coil spring 20: Stepped nut 20a: Large diameter portion 20b: Small diameter portion 21: Piston rod 21a: Connection engagement portion 22: Air cylinder 23: Bolt 24: Spacer 25: Bolt 26: Bolt 27: Moving means

Claims (2)

円形板状ワークを吸引保持するチャックテーブルと、該チャックテーブルに保持された円形板状ワークを研削加工する研削手段と、該研削手段によって研削された円形板状ワークの外周縁を保持し該チャックテーブルから搬出する搬出手段と、該搬出手段の搬出経路に配設され該チャックテーブルに吸引保持されていた円形板状ワークの被保持面を洗浄する洗浄手段と、を備える研削装置において、
該搬出手段は、均等な角度で少なくとも３つ配置され円形板状ワークの外周縁を保持する保持部と、該保持部を放射方向に動作させる案内部と、該案内部に沿って該保持部を移動させる移動手段と、を備え、該移動手段によって駆動されて移動する該保持部を円形板状ワークの外周縁に接触させ円形板状ワークを保持するように構成され、
該洗浄手段は、該搬出手段が保持する円形板状ワークの該被保持面に垂直な回転軸と、該回転軸を回転させる回転手段と、該回転軸に連結され均等な角度で少なくとも３つ配置され円形板状ワークの外周部を洗浄する洗浄部材と、該洗浄部材を円形板状ワークに当接させ該回転手段によって該洗浄部材を回転させる洗浄動作によって円形板状ワークが回転するのを防止するための回転防止手段と、から構成され、
該回転防止手段は、該洗浄手段の該回転軸と軸心を同じくし、該洗浄手段と相対的に上下する上下動手段と、該洗浄手段の回転軸を中心に均等な角度で少なくとも３つ配置され該搬出手段の保持部より内側に位置する回転防止部材と、を備えており、
該搬出手段に保持された円形板状ワークの中心が該洗浄手段の回転軸と一致する該搬出手段の搬出経路上のワーク洗浄位置において、該洗浄部材が、円形板状ワークの該被保持面の外周部を洗浄する研削装置。 A chuck table for sucking and holding a circular plate workpiece, a grinding means for grinding the circular plate workpiece held on the chuck table, and an outer peripheral edge of the circular plate workpiece ground by the grinding means for holding the chuck In a grinding apparatus comprising unloading means for unloading from a table, and cleaning means for cleaning a surface to be held of a circular plate-like workpiece disposed in the unloading path of the unloading means and held by suction on the chuck table.
The carrying-out means includes at least three holding parts arranged at equal angles to hold the outer peripheral edge of the circular plate-shaped workpiece, a guide part for operating the holding part in a radial direction, and the holding part along the guide part. Moving means, and is configured to hold the circular plate workpiece by bringing the holding portion that is driven and moved by the moving device into contact with the outer peripheral edge of the circular plate workpiece,
The cleaning means includes at least three rotation shafts that are perpendicular to the held surface of the circular plate-like workpiece held by the carry-out means, rotation means that rotate the rotation shaft, and are connected to the rotation shaft at an equal angle. A cleaning member arranged to clean the outer peripheral portion of the circular plate-shaped workpiece, and the circular plate-shaped workpiece is rotated by a cleaning operation in which the cleaning member is brought into contact with the circular plate-shaped workpiece and the cleaning member is rotated by the rotating means. An anti-rotation means for preventing, and
The rotation prevention means has at least three vertical movement means that are aligned with the rotation axis of the cleaning means and move up and down relative to the cleaning means, and at an equal angle around the rotation axis of the cleaning means. An anti-rotation member that is disposed and located inside the holding portion of the unloading means,
In the work the cleaning position on the unloading path of該搬detecting means該搬out the center of the circular plate-like work held on the device coincides with the axis of rotation of the cleaning means, the cleaning member, the held surface of the circular plate-shaped workpiece Grinding device for cleaning the outer periphery of the machine. 請求項１に記載の研削装置において、前記洗浄手段を用いて円形板状ワークを洗浄する方法であって、
前記洗浄手段を構成する洗浄部材に、前記搬出手段が保持した円形板状ワークの被保持面を接触させ、該洗浄手段を構成する回転防止部材を上昇させ該被保持面に接触させて該洗浄部材の回転動作によって該被保持面のうち該回転防止部材が接触している箇所以外の部分を洗浄し、
その後、該回転防止部材を下降させて、該被保持面のうち該回転防止部材が接触していた部分を露出させ、該洗浄部材を所定角度回転させることによって円形板状ワークが該所定角度と同じ角度回転した後、再び該回転防止部材を上昇させ該被保持面に接触させて該洗浄部材の回転動作によって該被保持面の未洗浄部分を洗浄する、
円形板状ワークの洗浄方法。 The grinding apparatus according to claim 1, wherein the cleaning means is used to clean a circular plate workpiece,
The cleaning member constituting the cleaning means is brought into contact with the held surface of the circular plate-like workpiece held by the carry-out means, and the anti-rotation member constituting the cleaning means is raised and brought into contact with the held surface to perform the cleaning. Washing a portion of the held surface other than the portion in contact with the anti-rotation member by rotating the member,
Thereafter, the anti-rotation member is lowered to expose a portion of the held surface that is in contact with the anti-rotation member, and by rotating the cleaning member by a predetermined angle, the circular plate-shaped workpiece is moved to the predetermined angle. After rotating the same angle, the anti-rotation member is again raised and brought into contact with the held surface, and the uncleaned portion of the held surface is cleaned by the rotating operation of the cleaning member.
A method for cleaning circular plate workpieces.
JP2011247420A 2011-11-11 2011-11-11 Grinding apparatus and method for cleaning circular plate workpiece Active JP5908703B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011247420A JP5908703B2 (en) 2011-11-11 2011-11-11 Grinding apparatus and method for cleaning circular plate workpiece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011247420A JP5908703B2 (en) 2011-11-11 2011-11-11 Grinding apparatus and method for cleaning circular plate workpiece

Publications (2)

Publication Number Publication Date
JP2013105828A JP2013105828A (en) 2013-05-30
JP5908703B2 true JP5908703B2 (en) 2016-04-26

Family

ID=48625179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011247420A Active JP5908703B2 (en) 2011-11-11 2011-11-11 Grinding apparatus and method for cleaning circular plate workpiece

Country Status (1)

Country Link
JP (1) JP5908703B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI821679B (en) * 2020-08-25 2023-11-11 南韓商杰宜斯科技有限公司 Wafer processing apparatus and wafer processing method
CN116978847B (en) * 2023-09-22 2023-12-12 山东汉旗科技有限公司 Wafer carrying platform with position monitoring device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06310481A (en) * 1993-04-26 1994-11-04 Fuji Film Micro Device Kk Method and device for cleaning by brush scrubbing
JP3743954B2 (en) * 2000-02-23 2006-02-08 東京エレクトロン株式会社 Processing apparatus, processing method, substrate cleaning apparatus, substrate cleaning method, developing apparatus, and developing method
JP4634950B2 (en) * 2006-03-23 2011-02-16 株式会社ディスコ Wafer holding mechanism
JP5320014B2 (en) * 2008-10-17 2013-10-23 株式会社ディスコ Grinding equipment

Also Published As

Publication number Publication date
JP2013105828A (en) 2013-05-30

Similar Documents

Publication Publication Date Title
JP5014892B2 (en) Blade replacement tool
JP5773660B2 (en) Resin peeling device and grinding device
TWI680521B (en) Device and method for at least partial loosening of a connecting layer of a temporarily bonded substrate stack
TWI596687B (en) Substrate processing apparatus
TWI663687B (en) Substrate holding apparatus and substrate cleaning apparatus
US20170221696A1 (en) Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method
TWI534879B (en) Processing method
JP2008166368A (en) Substrate processing apparatus
JP2006344878A (en) Processing apparatus and processing method
JP4619144B2 (en) Substrate processing equipment
JP5320014B2 (en) Grinding equipment
JP4841451B2 (en) Substrate processing apparatus and substrate processing method
JP2009253244A (en) Method of carrying out wafer
JP5908703B2 (en) Grinding apparatus and method for cleaning circular plate workpiece
JP7057673B2 (en) Processing equipment
JP2000260740A (en) Spin cleaner
JP2008098574A (en) Polishing device of wafer
JP5037379B2 (en) Plate-shaped material transfer device
JP2019135071A (en) Cylindrical cornice cover
JP6373803B2 (en) Substrate processing apparatus, substrate processing method, and storage medium
US20160233115A1 (en) Cleaning apparatus for semiconductor equipment
JP2014225585A (en) Spinner and method for passing semiconductor substrate to spinner by using substrate transfer apparatus
JPH07130637A (en) Semiconductor manufacturing equipment
KR102159929B1 (en) Substrate treatment method
JP6220240B2 (en) Grinding equipment

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20141024

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20150427

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151215

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20151216

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160209

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160301

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160324

R150 Certificate of patent or registration of utility model

Ref document number: 5908703

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250