JP5769861B1 - Vacuum processing method and vacuum processing apparatus - Google Patents

Vacuum processing method and vacuum processing apparatus Download PDF

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JP5769861B1
JP5769861B1 JP2014243395A JP2014243395A JP5769861B1 JP 5769861 B1 JP5769861 B1 JP 5769861B1 JP 2014243395 A JP2014243395 A JP 2014243395A JP 2014243395 A JP2014243395 A JP 2014243395A JP 5769861 B1 JP5769861 B1 JP 5769861B1
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carry
vacuum
chamber
work
transfer path
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JP2016105448A (en
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英司 津田
英司 津田
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NAKA LIQUID CONTROL CO., LTD.
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Abstract

【課題】簡単な構造で高い気密性を実現する真空処理方法及び真空処理装置を提供する。【解決手段】真空処理方法は、開閉可能なワークの搬入口２２より真空容器２０内へワークを順次搬入し、真空状態に設定された真空容器２０内の搬送路２４に沿ってワークを搬送させた後、開閉可能なワークの搬出口２３より真空容器２０外へワークを順次搬出するもので、搬送路２４が設けられた搬送路室２１と、搬送路室２１に連通させて真空容器２０内に設けられた待避室２５とが、搬入口２２及び搬出口２３の開放前に真空状態に設定されたとき、搬送路２４上のワークを待避室２５内に移動させて待避室２５の出入口２６を気密状態で閉鎖し、搬入口２２及び搬出口２３よりワークの搬出入が行われた後に、搬入口２２及び搬出口２３が閉鎖されて搬送路室２１が真空状態に設定されたとき待避室２５内のワークを搬送路２４上に戻すことを特徴とする。【選択図】図１The present invention provides a vacuum processing method and a vacuum processing apparatus that achieve high airtightness with a simple structure. A vacuum processing method sequentially carries workpieces into a vacuum container 20 from a work inlet 22 that can be opened and closed, and conveys the workpieces along a conveyance path 24 in the vacuum vessel 20 set in a vacuum state. After that, the workpieces are sequentially carried out of the vacuum container 20 from the opening / closing port 23 of the openable / closable workpiece, and the conveyance path chamber 21 provided with the conveyance path 24 and the conveyance path chamber 21 communicate with the inside of the vacuum container 20. When the vacuum chamber 25 is set in a vacuum state before opening the carry-in port 22 and the carry-out port 23, the work on the transfer path 24 is moved into the save chamber 25 and the entrance / exit 26 of the save chamber 25 is opened. Is closed in an airtight state, and after the work is carried in and out from the carry-in port 22 and the carry-out port 23, the carry-in chamber 22 and the carry-out port 23 are closed and the transfer path chamber 21 is set in a vacuum state. The work in 25 is on the transport path 24 And returning. [Selection] Figure 1

Description

本発明は、真空容器内にワークを順次搬入して真空状態下で脱気や脱泡などの所定の処理を行うのに用いられる真空処理方法と、その真空処理方法を行うための真空処理装置に関する。   The present invention relates to a vacuum processing method used to sequentially carry workpieces into a vacuum vessel and perform predetermined processing such as deaeration and defoaming in a vacuum state, and a vacuum processing apparatus for performing the vacuum processing method About.

例えば、インライン式のスパッタリング装置１として、特許文献１に記載のものが提案されている。図９に示すように、スパッタリング装置１は、成膜処理を行うための成膜室２と、仕切りバルブ３Ａ，３Ｂを介して成膜室２の左右に設けられた仕込室４及び取出室５とを備えている。成膜室２には、基板が搭載された基板トレー８を搬送するための搬送手段６が設けられている。また、成膜室２、仕込室４、及び取出室５には、それぞれ独立した排気系統７が備えられ、排気系統７により内部圧力が真空に近い状態（以下、真空圧と称する。）と大気圧とに変更自在である。   For example, as an in-line type sputtering apparatus 1, the one described in Patent Document 1 has been proposed. As shown in FIG. 9, the sputtering apparatus 1 includes a film forming chamber 2 for performing a film forming process, and a preparation chamber 4 and an extraction chamber 5 provided on the left and right sides of the film forming chamber 2 through partition valves 3A and 3B. And. The film forming chamber 2 is provided with a transfer means 6 for transferring a substrate tray 8 on which a substrate is mounted. The film forming chamber 2, the preparation chamber 4, and the take-out chamber 5 are each provided with an independent exhaust system 7, and the exhaust system 7 has a large internal pressure (hereinafter referred to as a vacuum pressure). It can be changed to atmospheric pressure.

このようなスパッタリング装置１は、一般的に以下のように動作する。
仕切りバルブ３Ａ，３Ｂが閉じられ成膜室２が真空圧に保たれた状態において、基板トレー８が仕込室４に収容された後、仕込室４は排気系統７により真空圧にまで排気される。次に、仕込室４と成膜室２の間の仕切りバルブ３Ａが開けられて成膜室２の入口から基板トレー８が成膜室２に搬入され、仕切りバルブ３Ａが閉じられる。基板トレー８は成膜室２内で搬送手段６により搬送され、基板に各種の成膜処理が行われた後、あらかじめ真空圧に排気された取出室５と成膜室２との間の仕切りバルブ３Ｂが開かれて基板トレー８が成膜室２の出口から取出室５へ搬出される。仕切りバルブ３Ｂを閉じた後、取出室５の内部が大気圧に戻され、取出室５から基板トレー８が取り出される。 Such a sputtering apparatus 1 generally operates as follows.
In a state where the partition valves 3A and 3B are closed and the film forming chamber 2 is kept at a vacuum pressure, after the substrate tray 8 is accommodated in the preparation chamber 4, the preparation chamber 4 is exhausted to a vacuum pressure by the exhaust system 7. . Next, the partition valve 3A between the preparation chamber 4 and the film formation chamber 2 is opened, the substrate tray 8 is carried into the film formation chamber 2 from the entrance of the film formation chamber 2, and the partition valve 3A is closed. The substrate tray 8 is transported by the transport means 6 in the film forming chamber 2, and after the various film forming processes are performed on the substrate, the partition between the take-out chamber 5 and the film forming chamber 2 evacuated to a vacuum pressure in advance. The valve 3B is opened and the substrate tray 8 is carried out from the outlet of the film forming chamber 2 to the take-out chamber 5. After closing the partition valve 3 </ b> B, the inside of the take-out chamber 5 is returned to atmospheric pressure, and the substrate tray 8 is taken out from the take-out chamber 5.

特開２００６−３０７２５７号公報JP 2006-307257 A

上記構成のスパッタリング装置１においては、基板トレー８は、成膜室２の仕込室４側の入口から搬入され、成膜室２内を搬送されて、成膜室２の取出室５側の出口から搬出されており、成膜室２は、成膜室２の入口及び出口に設けられた仕切りバルブ３Ａ，３Ｂにより常に真空状態が保たれている。しかし、仕切りバルブ３Ａ，３Ｂを２つ用いているため、それぞれに仕切りバルブ３Ａ，３Ｂを開閉するための構造が必要になり、構造が複雑であり、また、成膜室の気密性も悪くなるという問題がある。   In the sputtering apparatus 1 having the above-described configuration, the substrate tray 8 is carried in from the entrance on the side of the preparation chamber 4 of the film formation chamber 2, transported in the film formation chamber 2, and exited on the take-out chamber 5 side of the film formation chamber 2. The film formation chamber 2 is always kept in a vacuum state by the partition valves 3A and 3B provided at the inlet and the outlet of the film formation chamber 2. However, since two partition valves 3A and 3B are used, a structure for opening and closing the partition valves 3A and 3B is required for each of them, the structure is complicated, and the airtightness of the film forming chamber is deteriorated. There is a problem.

本発明は、上記した課題に着目してなされたものであり、簡単な構成で高い気密性を実現することができる真空処理方法及び真空処理装置を提供することを目的とする。   The present invention has been made paying attention to the above-described problems, and an object thereof is to provide a vacuum processing method and a vacuum processing apparatus capable of realizing high airtightness with a simple configuration.

この発明による真空処理方法は、開閉可能なワークの搬入口より真空容器内へワークを順次搬入し、真空状態に設定された前記真空容器内のワークの搬送路に沿ってワークを搬送させた後、開閉可能なワークの搬出口より前記真空容器外へワークを順次搬出する真空処理方法であって、前記搬送路が設けられた前記真空容器内の搬送路室と、前記搬送路室に連通させて前記真空容器内に設けられたワークの待避室とが、前記搬入口及び搬出口の開放前に真空状態に設定されたとき、前記搬送路上のワークを前記待避室内に移動させて待避室の出入口を気密状態で閉鎖し、開放された前記搬入口及び前記搬出口よりワークの搬出入が行われた後に、前記搬入口及び搬出口が閉鎖されて前記搬送路室が真空状態に設定されたとき、前記待避室の出入口を開放して前記待避室内のワークを前記搬送路上に戻すことを特徴とする。   In the vacuum processing method according to the present invention, after the work is sequentially carried into the vacuum container from the work opening / closing opening that can be opened and closed, the work is conveyed along the work conveyance path in the vacuum container set in a vacuum state. A vacuum processing method for sequentially unloading a workpiece from the opening / closing port of the openable / closable workpiece to the outside of the vacuum vessel, wherein the workpiece is communicated with the conveyance path chamber in the vacuum vessel provided with the conveyance path. When the work receiving chamber provided in the vacuum container is set in a vacuum state before opening the carry-in port and the carry-out port, the work on the transfer path is moved into the save chamber to After the entrance / exit was closed in an airtight state and the workpieces were carried in / out from the opened entrance / exit, the entrance / exit was closed and the transfer path chamber was set in a vacuum state. When exiting the waiting room Open mouth and returning the retracted chamber of the workpiece to the transport path.

また、この発明による真空処理装置は、一端に開閉可能なワークの搬入口、他端に開閉可能なワークの搬出口、前記搬入口と前記搬出口との間にワークの搬送路を有する搬送路室が設けられるとともに前記搬送路室の上方に搬送路室と連通するワークの待避室が設けられた真空容器と、前記真空容器内を真空状態と大気圧の状態とに切換えて設定することが可能な真空排気機構と、前記真空容器の搬送路室内に前記搬入口より搬入されたワークを前記搬送路に沿って前記搬出口まで搬送するワーク搬送機構と、前記搬送路室内の搬送路上に配置され前記搬送路室と前記待避室との間を昇降動作させる昇降テーブルとを備えている。前記昇降テーブルは、その上面に前記待避室の出入口を閉鎖することが可能なワーク支持面を有し、前記ワーク支持面上には前記搬送路の一部を構成するガイド機構が設けられるとともに、前記昇降テーブルと待避室の出入口との間には昇降テーブルにより待避室の出入口を気密状態で閉鎖するためのシール機構が設けられている。   In addition, the vacuum processing apparatus according to the present invention includes a work entrance that can be opened and closed at one end, a work exit that can be opened and closed at the other end, and a work path that has a work transport path between the carry-in port and the carry-out port. A vacuum vessel provided with a chamber and a work chamber that communicates with the transfer path chamber above the transfer path chamber, and the inside of the vacuum container can be switched between a vacuum state and an atmospheric pressure state. An evacuating mechanism that is possible, a work transport mechanism that transports a work carried into the transport path chamber of the vacuum vessel from the carry-in inlet to the carry-out port along the transport path, and is disposed on the transport path in the transport path chamber And an elevating table that moves up and down between the transfer path chamber and the waiting room. The lifting table has a work support surface capable of closing the entrance / exit of the waiting room on its upper surface, and a guide mechanism constituting a part of the transport path is provided on the work support surface, A sealing mechanism is provided between the lift table and the entrance / exit of the waiting room to close the entrance / exit of the save room in an airtight state by the lift table.

真空容器内に搬入されたワークは、真空容器外へ搬出されるまでの間、以下のように、真空容器内で真空状態下に継続して置かれ、この間に脱泡などの所定の処理が行われることになる。
まず、搬入口より真空容器の搬送路室に１番目のワークが搬入されると、搬入口が閉じられた後、真空排気機構により真空容器内が真空状態に設定され、真空脱泡などの処理が開始される。ワークは搬送路室の搬送路に沿って昇降テーブルのワーク支持面上まで搬送される。２番目のワークの搬入に先立ち、昇降テーブルを上昇させ、昇降テーブル上のワークを待避室へ待避させる。待避室の出入口は昇降テーブルより塞がれ、シール機構により気密状態で閉鎖されるので、待避室は真空状態が保たれる。 The work carried into the vacuum vessel is continuously placed under vacuum in the vacuum vessel until it is carried out of the vacuum vessel as shown below, during which predetermined processing such as defoaming is performed. Will be done.
First, when the first work is loaded from the carry-in entrance into the transfer path chamber of the vacuum vessel, the inside of the vacuum vessel is set to a vacuum state by the vacuum exhaust mechanism after the carry-in entrance is closed, and processing such as vacuum defoaming is performed. Is started. The work is transported to the work support surface of the lifting table along the transport path of the transport path chamber. Prior to carrying in the second workpiece, the lifting table is raised and the workpiece on the lifting table is retracted to the waiting room. Since the entrance / exit of the waiting room is closed by the lifting table and is closed in an airtight state by the sealing mechanism, the waiting room is kept in a vacuum state.

次に、真空排気機構により搬送路室内が大気圧の状態に設定された後、搬入口が開き、２番目のワークが真空容器の搬送路室に搬入される。搬送路室は大気圧の状態になっているので、搬入口が閉じられた後、真空排気機構により真空容器内が真空状態に設定される。待避室に待避している１番目のワークは待避中に真空脱泡などの処理が継続されたり、或いは所定の処理が行われる。搬送路室が真空状態に設定されると、昇降テーブルが降下して待避室の出入口が開放され、待避中のワークは搬送路室の搬送路上に戻される。   Next, after the conveyance path chamber is set to an atmospheric pressure state by the vacuum exhaust mechanism, the carry-in entrance is opened, and the second workpiece is carried into the conveyance path chamber of the vacuum vessel. Since the transfer path chamber is at atmospheric pressure, the inside of the vacuum container is set to a vacuum state by the vacuum exhaust mechanism after the carry-in port is closed. A process such as vacuum defoaming is continued or a predetermined process is performed on the first work being saved in the waiting room. When the transfer path chamber is set to a vacuum state, the lifting table is lowered to open the entrance / exit of the waiting room, and the work being saved is returned to the transfer path of the transfer path chamber.

次に、搬送路上に戻った１番目のワークと搬入口より搬入された２番目のワークは、搬送路室の搬送路に沿って搬送される。待避室に１個のワークを待避させる実施態様では、１番目のワークは搬出口まで搬送され、２番目のワークは昇降テーブルのワーク支持面上まで搬送される。３番目のワークの搬入に先立ち、昇降テーブルを上昇させ、昇降テーブル上のワークを待避室へ待避させる。待避室の出入口は昇降テーブルより塞がれ、シール機構により気密状態で閉鎖されるので、待避室は真空状態が保たれる。次に搬入口が開かれ、３番目のワークが真空容器の搬送路室に搬入される。同時に搬出口も開かれ、１番目のワークを搬出口より搬出させる。   Next, the first workpiece returned on the conveyance path and the second workpiece carried in from the carry-in port are conveyed along the conveyance path of the conveyance path chamber. In the embodiment in which one work is retracted in the waiting room, the first work is transported to the carry-out port, and the second work is transported to the work support surface of the lifting table. Prior to loading the third work, the lift table is raised, and the work on the lift table is retracted to the waiting room. Since the entrance / exit of the waiting room is closed by the lifting table and is closed in an airtight state by the sealing mechanism, the waiting room is kept in a vacuum state. Next, the carry-in port is opened, and the third work is carried into the transfer path chamber of the vacuum vessel. At the same time, the unloading port is opened, and the first workpiece is unloaded from the unloading port.

なお、待避室に２個のワークを待避させてもよい。この場合、搬送路上に戻った１番目のワークと搬入口より搬入された２番目のワークは、ともに昇降テーブルのワーク支持面上に搬送される。３番目のワークの搬入に先立ち、昇降テーブルを上昇させ、１番目と２番目のワークを待避室へ待避させる。   Two workpieces may be saved in the waiting room. In this case, both the first workpiece returned to the conveyance path and the second workpiece carried in from the carry-in port are conveyed onto the workpiece support surface of the lifting table. Prior to carrying in the third work, the lifting table is raised and the first and second works are retracted to the waiting room.

上記したとおり、搬入口や搬出口が開かれるとき、真空容器内に搬入されているワークは真空容器内の待避室に待避させるので、真空状態下に継続して置かれることになる。また、待避室に待避中のワークは、待避室から搬送路室に戻すとき、搬送路室を真空状態に設定した後に搬送路室に戻すので、真空状態下に継続して置かれることになる。このように、真空容器内に搬入されたワークは、搬出されるまでの間、真空容器内で真空状態下に置かれ、この間に所定の処理が行われる。   As described above, when the carry-in port or the carry-out port is opened, the work carried in the vacuum vessel is evacuated to the retreat chamber in the vacuum vessel, so that it is continuously placed under a vacuum state. In addition, when returning from the waiting room to the transfer path chamber, the work being saved in the save room is returned to the transfer path chamber after the transfer path chamber is set in a vacuum state, and thus the workpiece is continuously placed in a vacuum state. . In this way, the work carried into the vacuum container is placed in a vacuum state in the vacuum container until it is carried out, and predetermined processing is performed during this time.

本発明によれば、常に真空状態が保たれる待避室を設け、ワークを搬送路室から待避室へ待避させた上で次のワークの搬入と処理済のワークの搬出を行い、その後、ワークを待避室から搬送路室の搬送路上に戻す構成としたので、待避室の出入口は1つ設けるだけでよい。このため、従来技術のように搬送路上に所定の処理を行う室を設け、この室の入口と出口のそれぞれに仕切りバルブを設けて真空状態を保持する構成のものに比べて、構成が簡単であり、気密性を高めることができる。   According to the present invention, a evacuation chamber in which a vacuum state is always maintained is provided, and after the workpiece is evacuated from the transfer path chamber to the evacuation chamber, the next workpiece is loaded and the processed workpiece is unloaded. Since the construction is such that the storage room is returned from the waiting room onto the transfer path of the transfer path room, only one entrance / exit of the waiting room is required. For this reason, the configuration is simpler than a configuration in which a chamber for performing a predetermined process is provided on the conveyance path as in the prior art, and a partition valve is provided at each of the inlet and outlet of the chamber to maintain a vacuum state. Yes, airtightness can be increased.

前記ワーク搬送機構は、前記ワークの搬送路に沿って往復動する往復動板と、前記往復動板に前記搬送路室内に対して進退動作が可能に支持される複数の棒状部材と、ワークの搬送時に各棒状部材を各ワークの後部位置へ前進させる往復動機構と、前記往復動板をワークの順送り距離だけ往復動させる駆動機構とを備えていることが好ましい。   The workpiece transfer mechanism includes a reciprocating plate that reciprocates along the workpiece transfer path, a plurality of rod-like members that are supported by the reciprocating plate so as to advance and retreat with respect to the transfer path chamber, It is preferable to include a reciprocating mechanism that moves each rod-shaped member forward to the rear position of each workpiece during conveyance, and a drive mechanism that reciprocates the reciprocating plate by a forward feed distance of the workpiece.

前記構成によれば、ワークの搬送時には、まず、棒状部材が往復動機構により搬送路室内に対して前進して、ワークの後部に位置する。ここで、後部とは、搬送路室の搬入口から搬出口に向かう方向を前方向とすると、ワークの前方向の側が前部、反対方向の側が後部である。
次に、駆動機構により往復動板を順送り距離だけワークの前方向に移動させることにより、往復動板に支持された棒状部材がワークを後部から押し、搬送路に沿って順送り距離だけ搬送する。ワークの搬送が終了すると、棒状部材を往復動機構によりワークの後部位置から後退させ、往復動板は駆動機構により元の位置に戻される。 According to the above configuration, when the work is transported, first, the rod-shaped member moves forward with respect to the transport path chamber by the reciprocating mechanism and is positioned at the rear part of the work. Here, when the direction from the carry-in entrance to the carry-out exit of the transfer path chamber is defined as the front direction, the rear portion is the front portion and the opposite side is the rear portion.
Next, the reciprocating plate is moved in the forward direction by the driving mechanism by the driving mechanism, so that the bar-like member supported by the reciprocating plate pushes the workpiece from the rear and conveys it along the conveying path by the progressive distance. When the conveyance of the workpiece is completed, the rod-shaped member is retracted from the rear position of the workpiece by the reciprocating mechanism, and the reciprocating plate is returned to the original position by the driving mechanism.

このように、ワークの搬送時には棒状部材をワークの後部に位置させ、ワークの搬送が終了すると、棒状部材をワークの後部から後退させて搬送路上や昇降テーブル上に棒状部材が位置しないようにしているので、昇降テーブルの昇降動作が妨げられることはない。   As described above, when the workpiece is transferred, the rod-shaped member is positioned at the rear portion of the workpiece, and when the workpiece is transferred, the rod-shaped member is retracted from the rear portion of the workpiece so that the rod-shaped member is not positioned on the transfer path or the lifting table. Therefore, the lifting operation of the lifting table is not hindered.

前記真空処理装置では、ワークを搬入テーブルの上面のワーク支持面に載せて前記搬入口より前記真空容器の搬送路室内へ搬入する搬入機構と、前記真空容器の搬送路室内のワークを搬出テーブルの上面のワーク支持面に載せて前記搬出口より前記真空容器外へ搬出する搬出機構とをさらに備えている。前記搬入テーブルとワークの搬入口との間、及び前記搬出テーブルとワークの搬出口との間には、搬入テーブル及び搬出テーブルにより搬入口及び搬出口を気密状態で閉鎖するためのシール機構が設けられていることが好ましい。   In the vacuum processing apparatus, a work-in mechanism that places a work on the work support surface on the upper surface of the carry-in table and carries the work into the transfer path chamber of the vacuum vessel from the carry-in entrance; An unloading mechanism that is placed on an upper work support surface and unloads from the unloading port to the outside of the vacuum vessel. A seal mechanism is provided between the carry-in table and the work carry-in port and between the carry-out table and the work carry-out port to close the carry-in port and the carry-out port in an airtight state by the carry-in table and the carry-out table. It is preferable that

前記構成によれば、シール機構により搬入テーブル及び搬出テーブルが搬入口及び搬出口を気密状態で閉鎖するので、搬送路室の真空状態を保持することができる。
また、搬入テーブルが搬入口を閉鎖する動作の次は、搬入テーブルの上面に載せられたワークが搬送路室内へ搬入され、さらに、搬出テーブルが搬出口を開放する動作の次は、搬出テーブルの上面に載せられたワークが搬送路室から搬出されるので、処理の効率がはかられる。 According to the above configuration, since the carry-in table and the carry-out table close the carry-in port and the carry-out port in an airtight state by the sealing mechanism, the vacuum state of the transfer path chamber can be maintained.
In addition, after the operation of the carry-in table closing the carry-in entrance, the work placed on the upper surface of the carry-in table is carried into the transfer path chamber, and after the operation of the carry-out table opening the carry-out port, Since the work placed on the upper surface is unloaded from the transfer path chamber, the processing efficiency is improved.

本発明によれば、真空容器内に常に真空状態が保たれる待避室を設け、その待避室の出入口を気密状態で閉鎖する構成としたので、待避室の一つの出入口を開閉するだけでよく、構成が簡単であり、気密性を高めることができる。   According to the present invention, since a evacuation chamber in which a vacuum state is always maintained is provided in the vacuum vessel and the entrance / exit of the evacuation chamber is closed in an airtight state, it is only necessary to open and close one entrance / exit of the evacuation chamber. The structure is simple and the airtightness can be improved.

本発明の一実施形態に係る真空処理装置を示す図であり、真空容器を断面で示した正面図である。It is a figure which shows the vacuum processing apparatus which concerns on one Embodiment of this invention, and is the front view which showed the vacuum vessel in the cross section. 図１のＡ−Ａ線に沿った真空容器の断面図である。It is sectional drawing of the vacuum vessel along the AA line of FIG. 図２のＢ−Ｂ線に沿った真空容器の断面図である。It is sectional drawing of the vacuum vessel along the BB line of FIG. 真空処理装置の背面図である。It is a rear view of a vacuum processing apparatus. 真空処理方法の流れを示す説明図である。It is explanatory drawing which shows the flow of a vacuum processing method. 真空処理方法の流れを示す説明図である。It is explanatory drawing which shows the flow of a vacuum processing method. 真空処理方法の流れを示す説明図である。It is explanatory drawing which shows the flow of a vacuum processing method. 真空処理方法の流れを示す説明図である。It is explanatory drawing which shows the flow of a vacuum processing method. 従来技術を示す説明図である。It is explanatory drawing which shows a prior art.

以下、本発明の実施形態について、添付図面を参照しながら説明する。
図１〜図４は本発明の一実施形態に係る真空処理装置１０の構成を示している。
図示例の真空処理装置１０は、搬送路室２１とワークＷの待避室２５とを備えた真空容器２０と、真空容器２０内を真空状態と大気圧の状態とに切換えて設定することが可能な真空排気機構３０Ａ，３０Ｂと、搬入口２２より搬送路室２１内に搬入されたワークＷを搬送路２４に沿って搬出口２３まで搬送するワーク搬送機構４０と、ワークＷを搬送路室２１からその上方位置の待避室２５へ搬送するための昇降テーブル１００と、昇降テーブル１００を昇降動作させるテーブル昇降機構５０と、ワークＷを搬送路室２１内へ搬入するための搬入テーブル１１０と、搬入テーブル１１０を昇降動作させる搬入機構６０と、ワークＷを搬送路室２１から搬出するための搬出テーブル１２０と、搬出テーブル１２０を昇降動作させる搬出機構７０とを備えている。 Embodiments of the present invention will be described below with reference to the accompanying drawings.
1 to 4 show a configuration of a vacuum processing apparatus 10 according to an embodiment of the present invention.
The vacuum processing apparatus 10 in the illustrated example can be set by switching between a vacuum container 20 having a transfer path chamber 21 and a work chamber W and a vacuum state and an atmospheric pressure state in the vacuum container 20. Vacuum evacuation mechanisms 30A and 30B, a work transport mechanism 40 that transports the work W carried into the transport path chamber 21 from the transport inlet 22 to the transport outlet 23 along the transport path 24, and the transport path chamber 21. A lift table 100 for transporting the lift table 100 to the waiting room 25 from above, a table lift mechanism 50 for moving the lift table 100 up and down, a loading table 110 for loading the workpiece W into the transport path chamber 21, and a loading A carry-in mechanism 60 that moves the table 110 up and down, a carry-out table 120 that carries the workpiece W out of the transfer path chamber 21, and a carry-out mechanism 70 that moves the carry-out table 120 up and down It is equipped with a.

この実施例の真空処理装置１０では、ワークプレートＰ上に載置されたワークＷを、搬入テーブル１１０上に載置して、開閉可能なワークＷの搬入口２２より真空容器２０内へ順次搬入している。ワークＷは、真空状態に設定された真空容器２０内のワークＷの搬送路２４に沿って搬送された後、搬出テーブル１２０上に載置されて開閉可能なワークＷの搬出口２３より真空容器２０外へ順次搬出される。   In the vacuum processing apparatus 10 of this embodiment, the work W placed on the work plate P is placed on the carry-in table 110 and is sequentially carried into the vacuum container 20 from the carry-in port 22 of the work W that can be opened and closed. doing. After the workpiece W is transported along the transport path 24 of the workpiece W in the vacuum container 20 set in a vacuum state, the workpiece W is placed on the unloading table 120 and can be opened / closed from the unloading opening 23 of the workpiece W. 20 is sequentially carried out.

なお、以下の説明で、図１において、右側から左側へ向かう方向、すなわち、搬送路室２１の搬入口２２から搬出口２３へ向かう方向を前方向、前方向と反対方向を後方向としている。ワークＷは前方向に向かって搬送される。また、図１の上下方向を真空処理装置１０の上下方向とする。さらに、図２において、左側を正面側、右側を背面側としている。図３、図４においては、左側から右側へ向かう方向を前方向としている。
また、図２において、真空容器２０を断面図、その他は側面図で示している。図４においては、テーブル昇降機構５０、搬入機構６０、搬出機構７０の図示は省略している。図３において、真空容器２０、往復動板４１（後述）及びシール板４５（後述）を断面図、その他を平面図で示している。 In the following description, in FIG. 1, the direction from the right side to the left side, that is, the direction from the carry-in port 22 to the carry-out port 23 of the transfer path chamber 21 is defined as the front direction, and the direction opposite to the front direction is defined as the rear direction. The workpiece W is conveyed in the forward direction. Further, the vertical direction of FIG. 1 is the vertical direction of the vacuum processing apparatus 10. Further, in FIG. 2, the left side is the front side and the right side is the back side. 3 and 4, the direction from the left side to the right side is the forward direction.
Further, in FIG. 2, the vacuum vessel 20 is shown in a sectional view, and the others are shown in a side view. In FIG. 4, the table elevating mechanism 50, the carry-in mechanism 60, and the carry-out mechanism 70 are not shown. In FIG. 3, the vacuum container 20, the reciprocating plate 41 (described later) and the seal plate 45 (described later) are shown in a sectional view, and the others are shown in plan views.

図１に示すように、ベース（図示せず）上に固定され、真空容器２０の下方に設けられた脚付きの支持台２００に、テーブル昇降機構５０、搬入機構６０、および搬出機構７０が取り付けられている。さらに、支持台２００の上面に取り付けられた支柱２１０に真空容器２０が取り付けられている。   As shown in FIG. 1, a table elevating mechanism 50, a carry-in mechanism 60, and a carry-out mechanism 70 are attached to a support base 200 with a leg fixed on a base (not shown) and provided below the vacuum vessel 20. It has been. Further, the vacuum vessel 20 is attached to a support column 210 attached to the upper surface of the support base 200.

図１〜図３に示すように、真空容器２０は直方体状の搬送路室２１を有し、搬送路室２１の底壁２１ａには、前後方向の一端の側に開閉可能なワークＷの搬入口２２、他端の側に開閉可能なワークＷの搬出口２３が設けられ、さらに搬入口２２と搬出口２３との間にワークＷの搬送路２４が形成されている。
また、真空容器２０は直方体状のワークＷの待避室２５を有している。待避室２５は搬送路室２１の上方に位置し、搬送路室２１と待避室２５の出入口２６において連通している。
この実施例の待避室２５は、２個のワークを待避させることができる大きさに設定されているが、１個のワークを待避させることができる大きさであってもよく、３個以上のワークを待避させることができる大きさであってもよい。 As shown in FIGS. 1 to 3, the vacuum container 20 has a rectangular parallelepiped conveyance path chamber 21, and a work W that can be opened and closed on one end side in the front-rear direction is loaded into the bottom wall 21 a of the conveyance path chamber 21. An opening / closing port 23 for the work W that can be opened and closed is provided on the side of the opening 22 and the other end, and a transfer path 24 for the workpiece W is formed between the transfer port 22 and the transfer port 23.
Further, the vacuum container 20 has a waiting room 25 for a rectangular parallelepiped work W. The waiting room 25 is located above the transfer path chamber 21 and communicates with the transfer path room 21 at the entrance 26 of the waiting room 25.
The waiting room 25 of this embodiment is set to a size that allows two workpieces to be saved, but may be a size that allows one workpiece to be saved. The size may be such that the workpiece can be saved.

搬送路室２１の搬入口２２は、搬入口２２の下方に配置された矩形状を呈する搬入テーブル１１０により気密状態で閉鎖される。
搬入テーブル１１０は搬入口２２を閉鎖することが可能な大きさに形成され、搬入機構６０により、搬送路室２１の搬入口２２に対して昇降動作する。搬入テーブル１１０の上面には搬入口２２を気密状態で閉鎖するためのシール機構１１１が設けられている。シール機構１１１は、搬入テーブル１１０の上面の四つの辺に沿って形成された溝にＯリングが嵌め込まれたものである。搬入テーブル１１０が搬入口２２を閉鎖した状態で、シール機構１１１は搬送路室２１の底壁２１ａの搬入口２２の周囲の面に当接している。真空排気機構３０Ａ、３０Ｂにより真空容器２０内が真空状態に設定された場合に、搬送路室２１の真空圧により搬入テーブル１１０が搬入口２２の周囲の面に引きつけられ、Ｏリングにより搬送路室２１の搬入口２２が気密状態に閉鎖される。 The carry-in port 22 of the transfer path chamber 21 is closed in an airtight state by a carry-in table 110 having a rectangular shape disposed below the carry-in port 22.
The carry-in table 110 is formed in a size capable of closing the carry-in port 22, and is moved up and down with respect to the carry-in port 22 in the transfer path chamber 21 by the carry-in mechanism 60. On the upper surface of the carry-in table 110, a seal mechanism 111 for closing the carry-in port 22 in an airtight state is provided. The seal mechanism 111 has an O-ring fitted in grooves formed along the four sides of the upper surface of the carry-in table 110. With the carry-in table 110 closing the carry-in port 22, the seal mechanism 111 is in contact with the surface around the carry-in port 22 of the bottom wall 21 a of the transfer path chamber 21. When the inside of the vacuum container 20 is set to a vacuum state by the vacuum exhaust mechanisms 30A and 30B, the carry-in table 110 is attracted to the surface around the carry-in port 22 by the vacuum pressure of the carry-path chamber 21, and the carry-path chamber is formed by the O-ring. The 21 carry-in ports 22 are closed in an airtight state.

また、図１、図３に示すように、搬入テーブル１１０の上面には支持棒１１２を介してワーク支持台１１３が取り付けられている。ワーク支持台１１３の上面１１３ａには２本のガイドレール１１４、１１４からなるガイド機構が設けられている。この２本のガイドレール１１４、１１４の間に、ワークＷが載置されたワークプレートＰが移動自由に支持される。ワークＷが載置された搬入テーブル１１０が搬入機構６０により上昇して搬送路室２１の搬入口２２を閉鎖することで、ワークＷが搬入口２２から搬送路室２１内に搬入される。   Further, as shown in FIGS. 1 and 3, a work support 113 is attached to the upper surface of the carry-in table 110 via a support bar 112. A guide mechanism including two guide rails 114 and 114 is provided on the upper surface 113a of the work support 113. The work plate P on which the work W is placed is supported between the two guide rails 114 and 114 so as to be freely movable. The carry-in table 110 on which the work W is placed is raised by the carry-in mechanism 60 to close the carry-in port 22 of the transfer path chamber 21, so that the work W is carried into the transfer path chamber 21 from the carry-in port 22.

搬送路室２１の搬出口２３は、搬送路室２１の搬入口２２の下方に配置された矩形状を呈する搬出テーブル１２０により気密状態で閉鎖される。
搬出テーブル１２０は搬入テーブル１１０と同様の構成であり、搬出機構７０により搬送路室２１の搬出口２３に対して昇降動作する。搬出テーブル１２０の上面には溝にＯリングが嵌め込まれたシール機構１２１が設けられている。搬出テーブル１２０の上面には支持棒１２２を介してワーク支持台１２３が取り付けられている。ワーク支持台１２３の上面１２３ａには２本のガイドレール１２４、１２４からなるガイド機構が設けられている。ワークＷが載置された搬出テーブル１２０が搬出機構７０により下降して搬送路室２１の搬出口２３を開放することで、ワークＷが搬出口２３より搬送路室２１外へ搬出される。 The carry-out port 23 of the transfer path chamber 21 is closed in an airtight state by a carry-out table 120 having a rectangular shape disposed below the carry-in port 22 of the transfer path chamber 21.
The carry-out table 120 has the same configuration as that of the carry-in table 110, and is moved up and down with respect to the carry-out port 23 of the carrying path chamber 21 by the carry-out mechanism 70. On the upper surface of the carry-out table 120, a seal mechanism 121 in which an O-ring is fitted in the groove is provided. A work support base 123 is attached to the upper surface of the carry-out table 120 via a support bar 122. A guide mechanism including two guide rails 124 and 124 is provided on the upper surface 123 a of the work support base 123. The unloading table 120 on which the workpiece W is placed is lowered by the unloading mechanism 70 to open the unloading port 23 of the transfer path chamber 21, whereby the work W is unloaded from the unloading port 23 to the outside of the transfer path chamber 21.

前記の昇降テーブル１００は、搬入テーブル１１０のワーク支持台１１３と搬出テーブル１２０のワーク支持台１２３との間に配置されており、テーブル昇降機構５０により搬送路２４上と待避室２５の出入口２６との間を昇降動作する。昇降テーブル１００の昇降により、昇降テーブル１００の上面のワーク支持面１００ａに載置されたワークプレートＰが待避室２５に搬出入される。   The lift table 100 is disposed between the work support 113 of the carry-in table 110 and the work support 123 of the carry-out table 120. The table lift mechanism 50 allows the lift table 100 to be located on the transport path 24 and the entrance / exit 26 of the waiting room 25. Move up and down. By lifting and lowering the lifting table 100, the work plate P placed on the workpiece support surface 100 a on the upper surface of the lifting table 100 is carried into and out of the waiting room 25.

昇降テーブル１００は、ワーク支持面１００ａが２個のワークプレートＰを支持することが可能な大きさであって、待避室２５の出入口２６を気密状態で閉鎖することが可能な大きさに構成されている。
搬送路室２１の上壁２１ｂであり、待避室２５の出入口２６の周囲の壁の内側にはシール機構２８が設けられている。シール機構２８は、待避室２５の出入口２６の周囲の壁に形成された溝にＯリングが溝に嵌め込まれたものであり、搬送路室２１が大気圧の状態であり、待避室２５が真空状態である場合には、待避室２５の真空圧により昇降テーブル１００が出入口２６の周囲の壁のシール機構２８のＯリングに引き付けられて待避室２５の気密状態が保持される。 The lifting table 100 is sized such that the work support surface 100a can support two work plates P, and can be closed in an airtight manner at the entrance 26 of the waiting room 25. ing.
A seal mechanism 28 is provided inside the wall around the entrance / exit 26 of the waiting room 25, which is the upper wall 21 b of the transfer path chamber 21. The seal mechanism 28 is configured such that an O-ring is fitted in a groove formed on a wall around the entrance / exit 26 of the waiting chamber 25, the transfer path chamber 21 is in an atmospheric pressure state, and the waiting chamber 25 is vacuumed. In the state, the lifting table 100 is attracted to the O-ring of the sealing mechanism 28 on the wall around the entrance / exit 26 by the vacuum pressure of the waiting room 25, and the airtight state of the waiting room 25 is maintained.

昇降テーブル１００の上面のワーク支持面１００ａには、２本のガイドレール１０１、１０１からなるガイド機構が形成されている。この２本のガイドレール１０１、１０１の間にワークＷが載置されたワークプレーＰが移動自在に支持される。   A guide mechanism composed of two guide rails 101, 101 is formed on the workpiece support surface 100 a on the upper surface of the lifting table 100. A work play P on which a work W is placed is supported between the two guide rails 101 and 101 so as to be movable.

また、搬入テーブル１１０のワーク支持台１１３と昇降テーブル１００との間、及び搬出テーブル１２０のワーク支持台１２３と昇降テーブル１００との間には補助板１３０が設けられている。補助板１３０は、搬送路室２１の底壁２１ａ上に支持棒１３１を介して支持されている。各補助板１３０の上面１３０ａには、２本の補助ガイドレール１３３、１３３が設けられている。   Further, auxiliary plates 130 are provided between the work support 113 of the carry-in table 110 and the lift table 100 and between the work support 123 of the carry-out table 120 and the lift table 100. The auxiliary plate 130 is supported on the bottom wall 21 a of the transfer path chamber 21 via a support bar 131. Two auxiliary guide rails 133 and 133 are provided on the upper surface 130 a of each auxiliary plate 130.

搬送路室２１のワークＷの搬送路２４は、搬入テーブル１１０の２本のガイドレール１１４、１１４からなるガイド機構と、搬出テーブル１２０の２本のガイドレール１２４、１２４からなるガイド機構と、昇降テーブル１００の２本のガイドレール１０１、１０１からなるガイド機構と、補助板１３０の補助ガイドレール１３３、１３３とから構成されている。   The transfer path 24 for the workpiece W in the transfer path chamber 21 is a guide mechanism including the two guide rails 114 and 114 of the carry-in table 110, a guide mechanism including the two guide rails 124 and 124 of the carry-out table 120, The guide mechanism includes two guide rails 101 and 101 of the table 100, and auxiliary guide rails 133 and 133 of the auxiliary plate 130.

ワークプレートＰを搬送路２４に沿って搬送するために、搬入テーブル１１０の支持棒１１２、搬出テーブル１２０の支持棒１２２、及び補助板１３０の支持棒１３１の長さを調整して、搬入テーブル１１０のワーク支持台１１３の上面１１３ａの高さと、搬出テーブル１２０のワーク支持台１２３の上面１２３ａの高さと、昇降テーブル１００のワーク支持面１００ａと補助板１３０の上面１３０ａの高さとを揃えている。   In order to transport the work plate P along the transport path 24, the lengths of the support rod 112 of the carry-in table 110, the support rod 122 of the carry-out table 120, and the support rod 131 of the auxiliary plate 130 are adjusted, and the carry-in table 110 is adjusted. The height of the upper surface 113a of the workpiece support table 113, the height of the upper surface 123a of the workpiece support table 123 of the carry-out table 120, and the height of the workpiece support surface 100a of the lifting table 100 and the upper surface 130a of the auxiliary plate 130 are aligned.

昇降テーブル１００のガイドレール１０１と補助ガイドレール１３３、１３３には、搬入口２２の側の端部がテーパー１０１ａ、１３３ａになっており、搬入テーブル１１０の搬送路２４から昇降テーブル１００の搬送路２４へ、昇降テーブル１００の搬送路２４から搬出テーブル１２０の搬送路２４へのワークプレートＰの搬送時に、ワークプレートＰの受け渡しが容易になるようにしている。   The ends of the guide rail 101 and the auxiliary guide rails 133 and 133 of the lift table 100 on the side of the carry-in port 22 are tapered 101 a and 133 a, and the transport path 24 of the lift table 100 from the transport path 24 of the carry-in table 110. When the work plate P is transported from the transport path 24 of the lifting table 100 to the transport path 24 of the carry-out table 120, the work plate P is easily transferred.

真空排気機構３０Ａ，３０Ｂは、真空容器２０の一端の側及び他端の側に設けられており、真空容器２０内を真空状態と大気圧の状態とに切換えて設定することが可能である。一端の側の真空排気機構３０Ａは真空容器２０内を真空状態にするためのポンプ及びバルブを備え、他端の側の真空排気機構３０Ｂは真空容器２０内の搬送路室２１を大気圧の状態にするためのバルブを備えている。   The vacuum exhaust mechanisms 30A and 30B are provided on one end side and the other end side of the vacuum vessel 20, and the inside of the vacuum vessel 20 can be switched between a vacuum state and an atmospheric pressure state. The vacuum exhaust mechanism 30A on one end side is provided with a pump and a valve for bringing the inside of the vacuum vessel 20 into a vacuum state, and the vacuum exhaust mechanism 30B on the other end side is in a state where the transfer path chamber 21 in the vacuum vessel 20 is at atmospheric pressure. It has a valve to make it.

搬送路室２１の上壁２１ｂ及び側壁２１ｃ、待避室２５の上壁２５ａ及び側壁２５ｂには、ワークＷの搬出入を観察するためのガラス製の覗き板２７による覗き窓が設けられている。
詳細には、搬送路室２１の搬入口２２、搬出口２３のそれぞれの位置に対応する搬送路室２１の上壁２１ｂに開口２１ｄ−１、２１ｄ−２が、ワークＷの待避室２５の出入口２６の位置に対応する待避室２５の上壁２５ａの位置に開口２５ｃ−１が、搬送路室２１と待避室２５との正面側の側壁２１ｃ、２５ｂにそれぞれ開口２１ｄ−３、２５ｃ−２が、それぞれ形成されている。
搬送路室２１の上壁２１ｂ及び側壁２１ｃ、待避室２５の上壁２５ａ及び側壁２５ｂの外側であって、それぞれの開口２１ｄ−１、２１ｄ−２、２１ｄ−３、２５ｃ−１、２５ｃ−２の周囲に溝が形成され、溝にＯリング２７ａが嵌め込まれている。覗き板２７は係止片２７ｂによって係止され、開口２１ｄ−１、２１ｄ−２、２１ｄ−３、２５ｃ−１、２５ｃ−２を外側から覆うように配置されており、真空排気機構３０Ａにより搬送路室２１や待避室２５が真空状態とされた時に、覗き板２７がそれぞれ壁２１ｂ、２１ｃ、２５ａ、２５ｂの側に引き付けられて気密状態が保持される。 On the upper wall 21 b and the side wall 21 c of the transfer path chamber 21 and on the upper wall 25 a and the side wall 25 b of the waiting room 25, a viewing window is provided by a glass viewing plate 27 for observing the loading / unloading of the workpiece W.
Specifically, openings 21d-1 and 21d-2 are provided on the upper wall 21b of the transfer path chamber 21 corresponding to the positions of the transfer entrance 22 and the transfer exit 23 of the transfer path chamber 21, respectively, and the entrance and exit of the waiting room 25 for the workpiece W are provided. The opening 25c-1 is provided at the position of the upper wall 25a of the waiting room 25 corresponding to the position 26, and the openings 21d-3 and 25c-2 are provided on the front side walls 21c and 25b of the transfer path chamber 21 and the waiting room 25, respectively. , Each is formed.
The upper wall 21b and the side wall 21c of the transfer path chamber 21 and the outer side of the upper wall 25a and the side wall 25b of the waiting room 25, and the respective openings 21d-1, 21d-2, 21d-3, 25c-1, 25c-2. Is formed with an O-ring 27a fitted in the groove. The viewing plate 27 is locked by a locking piece 27b, and is arranged so as to cover the openings 21d-1, 21d-2, 21d-3, 25c-1, and 25c-2 from the outside, and is conveyed by the vacuum exhaust mechanism 30A. When the passage chamber 21 and the waiting room 25 are in a vacuum state, the peeping plates 27 are attracted to the walls 21b, 21c, 25a, and 25b, respectively, and the airtight state is maintained.

また、搬送路室２１の底壁２１ａの搬入口２２と搬出口２３の間には、真空容器２０の組立時に昇降テーブル１００を搬送路室２１内に配置するための組立用開口２１ｇが形成されている。この組立用開口は閉鎖板２１ｈで閉鎖されている。   In addition, an assembly opening 21g for arranging the lifting table 100 in the transport path chamber 21 when the vacuum container 20 is assembled is formed between the transport inlet 22 and the transport outlet 23 of the bottom wall 21a of the transport path chamber 21. ing. This assembly opening is closed by a closing plate 21h.

前記テーブル昇降機構５０は、図１に示すように、真空容器２０の搬送路室２１の底壁２１ａに設けられた閉鎖板２１ｈの開口２１ｆ、２１ｆを貫通して昇降テーブル１００の下面に接続される２本の平行なガイド棒５１、５１と、ガイド棒５１、５１の下端を支持する水平プレート５２と、支持台２００に支持される昇降用シリンダ５３とを備えている。昇降用シリンダ５３のロッド５３ａの上端部は水平プレート５２の下面の２本のガイド棒５１、５１の間の位置に連結されている。   As shown in FIG. 1, the table elevating mechanism 50 is connected to the lower surface of the elevating table 100 through the openings 21f and 21f of the closing plate 21h provided in the bottom wall 21a of the transfer passage chamber 21 of the vacuum vessel 20. Two parallel guide rods 51, 51, a horizontal plate 52 that supports the lower ends of the guide rods 51, 51, and a lifting cylinder 53 that is supported by the support base 200. The upper end of the rod 53 a of the elevating cylinder 53 is connected to a position between the two guide bars 51, 51 on the lower surface of the horizontal plate 52.

真空容器２０の搬送路室２１の底壁２１ａの閉鎖板２１ｈの下面には、内部にガイド孔（図示せず）を有するガイド筒５４、５４が設けられている。ガイド筒５４、５４のガイド孔は前記閉鎖板２１ｈの開口２１ｆ、２１ｆに連続している。２本のガイド棒５１、５１は、搬送路室２１の閉鎖板２１ｈの開口２１ｆ、２１ｆと、ガイド筒５４、５４のガイド孔とを貫通しており、これにより、水平プレート５２は回動することなく上下方向に往復動作する。
開口２１ｆ、２１ｆの内部にはＯリング（図示せず）が設けられ、ガイド棒５１、５１が上下方向に移動する場合であっても真空容器２０の気密状態が保持されている。 Guide cylinders 54, 54 having guide holes (not shown) are provided in the lower surface of the closing plate 21 h of the bottom wall 21 a of the conveyance path chamber 21 of the vacuum container 20. The guide holes of the guide cylinders 54, 54 are continuous with the openings 21f, 21f of the closing plate 21h. The two guide rods 51 and 51 pass through the openings 21f and 21f of the closing plate 21h of the conveyance path chamber 21 and the guide holes of the guide cylinders 54 and 54, whereby the horizontal plate 52 rotates. It reciprocates up and down without any change.
O-rings (not shown) are provided inside the openings 21f and 21f, and the airtight state of the vacuum vessel 20 is maintained even when the guide bars 51 and 51 move in the vertical direction.

搬送路室２１の底壁２１ａの閉鎖板２１ｈの下面には、昇降テーブル１００が待避室２５の出入口２６の周囲の壁と当接した際に昇降テーブル１００に生じる振動を軽減するショックアブソーバー５６ａ、５６ａが設けられている。ショックアブソーバー５６ａ、５６ａに水平プレート５２の上面が当接することで、テーブル昇降機構５０の上昇動作を停止させる。
さらに、支持台２００の上面には、昇降テーブル１００が降下して停止する際に昇降テーブル１００に生じる振動を軽減するショックアブソーバー５６ｂ、５６ｂが設けられている。水平プレート５２の下面が支持台２００のショックアブソーバー５６ｂ、５６ｂに当接することで、テーブル昇降機構５０の下降動作を停止させる。 A shock absorber 56a that reduces vibration generated in the lifting table 100 when the lifting table 100 comes into contact with the surrounding wall of the entrance / exit 26 of the waiting room 25, on the lower surface of the closing plate 21h of the bottom wall 21a of the transfer path chamber 21; 56a is provided. When the upper surface of the horizontal plate 52 comes into contact with the shock absorbers 56a and 56a, the lifting operation of the table lifting mechanism 50 is stopped.
Furthermore, shock absorbers 56b and 56b are provided on the upper surface of the support base 200. The shock absorbers 56b and 56b reduce the vibration generated in the lifting table 100 when the lifting table 100 descends and stops. The lowering operation of the table elevating mechanism 50 is stopped when the lower surface of the horizontal plate 52 contacts the shock absorbers 56b and 56b of the support base 200.

前記のワークＷの搬入機構６０は、搬入テーブル１１０の下面に連結される２本の平行なガイド棒６１、６１と、搬入テーブル１１０の下面の２本のガイド棒６１、６１の間の位置にロッド６３ａの上端部が連結される昇降用シリンダ６３と、２本のガイド棒６１、６１の下端を支持する水平プレート６２とを備えている。昇降用シリンダ６３は、支持台２００に取り付けられている。支持台２００には２つのガイド筒６４、６４が取り付けられており、ガイド棒６１、６１はこのガイド筒６４、６４のガイド孔（図示ぜず）を貫通している。このガイド筒６４、６４により２本のガイド棒６１、６１が移動自由に支持されることで、搬入テーブル１１０が回動することなく上下方向に往復動作する。   The workpiece W loading mechanism 60 is located at a position between two parallel guide rods 61, 61 connected to the lower surface of the loading table 110 and the two guide rods 61, 61 on the lower surface of the loading table 110. An elevating cylinder 63 to which the upper end of the rod 63a is connected, and a horizontal plate 62 that supports the lower ends of the two guide rods 61, 61 are provided. The lifting cylinder 63 is attached to the support base 200. Two guide cylinders 64 and 64 are attached to the support base 200, and the guide rods 61 and 61 pass through guide holes (not shown) of the guide cylinders 64 and 64. Since the two guide rods 61 and 61 are supported by the guide tubes 64 and 64 so as to move freely, the carry-in table 110 reciprocates vertically without rotating.

支持台２００の下面であって２つのガイド筒６４、６４の外側には、搬入テーブル１１０が搬送路室２１の出入口２６の周囲の壁と当接した際に搬入テーブル１１０に生じる振動を軽減するショックアブソーバー６６ａ、６６ａが設けられている。ショックアブソーバー６６ａ、６６ａに水平プレート６２の上面が当接することで、搬入機構６０の上昇動作を停止させる。
さらに、支持台２００の上面であって２つのガイド筒６４、６４の外側には、搬入テーブル１１０が降下して停止する際に搬入テーブル１１０に生じる振動を軽減するショックアブソーバー６６ｂ，６６ｂが設けられている。ショックアブソーバー６６ｂ，６６ｂに搬入テーブル１１０の下面が当接することで、搬入機構６０の下降動作を停止させる。 On the lower surface of the support base 200 and outside the two guide cylinders 64, 64, vibration generated in the carry-in table 110 when the carry-in table 110 comes into contact with the wall around the entrance / exit 26 of the transfer path chamber 21 is reduced. Shock absorbers 66a and 66a are provided. When the upper surface of the horizontal plate 62 contacts the shock absorbers 66a and 66a, the lifting operation of the carry-in mechanism 60 is stopped.
Further, shock absorbers 66b and 66b are provided on the upper surface of the support base 200 and outside the two guide cylinders 64 and 64 to reduce vibration generated in the carry-in table 110 when the carry-in table 110 descends and stops. ing. When the lower surface of the carry-in table 110 comes into contact with the shock absorbers 66b and 66b, the lowering operation of the carry-in mechanism 60 is stopped.

前記のワークＷの搬出機構７０は、ワークＷの搬入機構６０と同様の構成のものであり、搬出テーブル１２０の下面に連結される２本の平行なガイド棒７１、７１と、搬出テーブル１２０の下面の２本のガイド棒７１、７１の間の位置にロッド７３ａの上端部が取り付けられる昇降用シリンダ７３と、２本のガイド棒７１、７１の下端を支持する水平プレート７２とを備えている。昇降用シリンダ７３は、支持台２００に取り付けられている。支持台２００にはガイド棒７１、７１が貫通する２つのガイド筒７４、７４が取り付けられている。支持台２００の下面及び上面であって２つのガイド筒７４、７４の外側には、それぞれショックアブソーバー７６ａ，７６ａ、７６ｂ，７６ｂが設けられている。   The work W carry-out mechanism 70 has the same configuration as the work W carry-in mechanism 60, and includes two parallel guide bars 71 and 71 coupled to the lower surface of the carry-out table 120, and the carry-out table 120. A lifting cylinder 73 to which the upper end portion of the rod 73a is attached at a position between the two guide rods 71, 71 on the lower surface and a horizontal plate 72 that supports the lower ends of the two guide rods 71, 71 are provided. . The lifting cylinder 73 is attached to the support base 200. Two guide cylinders 74, 74 through which the guide rods 71, 71 pass are attached to the support base 200. Shock absorbers 76a, 76a, 76b, and 76b are provided on the lower and upper surfaces of the support base 200 and outside the two guide cylinders 74 and 74, respectively.

前記のワーク搬送機構４０は、図２〜図４に示すように、ワークＷを搬送路室２１の搬送路２４に沿って搬送するものであり、搬送路室２１及び待避室２５の背面側の側壁２１ｃ、２５ｂに設けられワークＷの搬送路２４に沿って往復動する往復動板４１と、往復動板４１に搬送路室２１内に対して進退動作が可能に支持される複数本（図示例では３本）の棒状部材４２Ａ〜４２Ｃと、ワークＷの搬送時に各棒状部材４２Ａ〜４２Ｃを各ワークＷの後部位置へ前進させる往復動機構４３Ａ〜４３Ｃと、往復動板４１をワークＷを順送りする距離だけ往復動させる駆動機構４４とを備えている。なお、図３、図４においては、真空排気機構３０Ａ、３０Ｂの記載は省略している。   As shown in FIGS. 2 to 4, the workpiece transfer mechanism 40 transfers the workpiece W along the transfer path 24 of the transfer path chamber 21, and is provided on the rear side of the transfer path chamber 21 and the waiting room 25. A reciprocating plate 41 which is provided on the side walls 21c and 25b and reciprocates along the conveying path 24 of the workpiece W, and a plurality of reciprocating plates 41 supported by the reciprocating plate 41 so as to be able to advance and retreat with respect to the inside of the conveying path chamber 21 (see FIG. In the example shown, there are three rod-shaped members 42A to 42C, reciprocating mechanisms 43A to 43C for moving the rod-shaped members 42A to 42C to the rear positions of the workpieces W during conveyance of the workpieces W, and the reciprocating plates 41 to the workpieces W. And a drive mechanism 44 that reciprocates by a distance for forward feeding. 3 and 4, the illustration of the vacuum exhaust mechanisms 30A and 30B is omitted.

往復動板４１は、シール板４５を介して搬送路室２１の背面側の側壁２１ｃの外側に取り付けられている。詳細には、搬送路室２１の側壁２１ｃには、前後方向に長いの往復動用の長孔２１ｅが形成されているとともに、シール板４５にも搬送路室２１の側壁２１ｃの往復動用の長孔２１ｅと略同一の大きさの往復動用の長孔４５ａが形成されている。シール板４５は、その往復動用の長孔４５ａの位置が、搬送路室２１の往復動用の長孔２１ｅと一致するように搬送路室２１の側壁２１ｃに取り付けられている。往復動板４１は搬送路室２１の側壁２１ｃの往復動用の長孔２１ｅとシール板４５の往復動用の長孔４５ａを覆うように取り付けられている。シール板４５の往復動用の長孔４５ａの周囲であって、側壁２１ｃの側の面と往復動板４１の側の面には、それぞれ溝にＯリングが嵌め込まれたシール機構４５ｂ、４５ｂが形成されいる。このシール板４５のシール機構４５ｂ、４５ｂにより往復動板４１で往復動用の長孔２１ｅ、４５ａを気密状態で閉鎖している。   The reciprocating plate 41 is attached to the outside of the side wall 21 c on the back side of the transfer path chamber 21 via a seal plate 45. Specifically, the side wall 21c of the transfer path chamber 21 is formed with a long reciprocating long hole 21e in the front-rear direction, and the seal plate 45 also has a long hole for reciprocating movement of the side wall 21c of the transfer path chamber 21. A long hole 45a for reciprocating movement having the same size as 21e is formed. The seal plate 45 is attached to the side wall 21 c of the transport path chamber 21 so that the position of the reciprocating slot 45 a coincides with the reciprocating slot 21 e of the transport path chamber 21. The reciprocating plate 41 is attached so as to cover the reciprocating long hole 21 e of the side wall 21 c of the transport path chamber 21 and the reciprocating long hole 45 a of the seal plate 45. Seal mechanisms 45b and 45b each having an O-ring fitted in a groove are formed around the reciprocating long hole 45a of the seal plate 45 and on the side wall 21c side surface and the reciprocating plate 41 side surface. It has been. The reciprocating motion plate 41 closes the reciprocating long holes 21e, 45a in an airtight state by the sealing mechanisms 45b, 45b of the sealing plate 45.

各棒状部材４２Ａ〜４２Ｃは、往復動板４１にワークＷの搬送方向にワークＷの順送り距離だけ間隔を開けて形成された支持孔４１ａに挿入されることで往復動板４１に摺動自由に支持されている。また、各棒状部材４２Ａ〜４２Ｃは搬送路室２１の側壁２１ｃの往復動用の長孔２１ｅ及びシール板４５の往復動用の長孔４５ａに挿入されて前後方向に直交する方向に延びている。   Each of the rod-like members 42A to 42C is slidable freely on the reciprocating plate 41 by being inserted into the support holes 41a formed in the reciprocating plate 41 at intervals in the conveyance direction of the work W by the forward feed distance of the workpiece W. It is supported. Each of the rod-shaped members 42A to 42C is inserted into the reciprocating long hole 21e of the side wall 21c of the transfer path chamber 21 and the reciprocating long hole 45a of the seal plate 45 and extends in a direction perpendicular to the front-rear direction.

各棒状部材４２Ａ〜４２Ｃを往復動させる往復動機構４３Ａ〜４３Ｃは、棒状部材４２Ａ〜４２Ｃを挟んで往復動板４１に一端が取り付けられた２本の平行な支持棒４３１、４３１と、支持棒４３１、４３１の他端に取り付けられた平行プレート４３２と、平行プレート４３２の２本の支持棒４３１、４３１の間の位置に支持されたシリンダ４３３とを備えている。シリンダ４３３のロッド４３３ａの先端部は平行プレート４３２から突出し、棒状部材４２Ａ〜４２Ｃの基端部に連結されている。ワークＷの搬送時には、シリンダ４３３のロッド４３３ａが突き出ることで、各棒状部材４２Ａ〜４２Ｃの先端部を搬送路２４上の各ワークＷの後部位置まで前進させる。ワークＷの搬送が終了すると、シリンダ４３３のロッド４３３ａが引っ込むことで、各棒状部材４２Ａ〜４２Ｃの先端部を搬送路２４上から後退させ、昇降テーブル１００の昇降を妨げないようにしている。   The reciprocating mechanisms 43A to 43C for reciprocating the rod members 42A to 42C include two parallel support rods 431 and 431 having one end attached to the reciprocating plate 41 with the rod members 42A to 42C interposed therebetween, and a support rod. The parallel plate 432 attached to the other end of 431 and 431 and the cylinder 433 supported in the position between the two support rods 431 and 431 of the parallel plate 432 are provided. The distal end portion of the rod 433a of the cylinder 433 protrudes from the parallel plate 432 and is connected to the proximal end portions of the rod-like members 42A to 42C. When the workpiece W is transported, the rod 433a of the cylinder 433 protrudes to advance the tip end portions of the rod-shaped members 42A to 42C to the rear position of each workpiece W on the transport path 24. When the conveyance of the workpiece W is completed, the rod 433a of the cylinder 433 is retracted, so that the tip end portions of the rod-like members 42A to 42C are retracted from the conveyance path 24 so that the elevation table 100 is not hindered.

往復動板４１を往復動させる駆動機構４４は、図２、図４に示すように、往復動板４１の上方に設けられたロッドレスシリンダ４４１と、ロッドレスシリンダ４４１の可動部４４３を往復動板４１に連結する連結板４４２とを備える。ロッドレスシリンダ４４１の可動部４４３がワークＷの順送り距離だけ進退動作することで往復動板４１が往復動して、ワークＷを順送り距離だけ搬送する。
また、往復動板４１の下方には往復動板４１を支持するベアリング４１１が設けられるとともに、往復動板４１と搬送路室２１及び待避室２５の背面側の側壁２１ｃとの間に往復動板４１の往復動の案内用レール４１２が設けられている。 The drive mechanism 44 that reciprocates the reciprocating plate 41 reciprocates the rodless cylinder 441 provided above the reciprocating plate 41 and the movable portion 443 of the rodless cylinder 441 as shown in FIGS. A connecting plate 442 connected to the plate 41. The movable portion 443 of the rodless cylinder 441 moves back and forth by the forward feed distance of the workpiece W, so that the reciprocating plate 41 reciprocates and transports the workpiece W by the forward feed distance.
A bearing 411 that supports the reciprocating plate 41 is provided below the reciprocating plate 41, and the reciprocating plate is disposed between the reciprocating plate 41 and the side wall 21 c on the back side of the transfer path chamber 21 and the waiting chamber 25. 41 reciprocating guide rails 412 are provided.

次に、本発明の真空処理装置１０を用いた真空処理方法について、図５〜図８を用いて説明する。
図５〜図８は真空処理を行う方法の説明のために、真空容器２０の搬送路室２１、待避室２５、搬入口２２、搬出口２３、出入口２６、昇降テーブル１００、搬入テーブル１１０、搬出テーブル１２０のみを簡略化して記載しており、その他の構成については記載を省略している。 Next, the vacuum processing method using the vacuum processing apparatus 10 of this invention is demonstrated using FIGS.
FIGS. 5 to 8 illustrate a method for performing vacuum processing, such as a transfer path chamber 21, a waiting room 25, a carry-in port 22, a carry-out port 23, an entrance / exit 26, a lift table 100, a carry-in table 110, a carry-out table. Only the table 120 is described in a simplified manner, and description of other configurations is omitted.

以下の説明では、ワークＷＡが真空容器２０内に搬入されてから搬出されるまでの動作について説明する。
まず、ワークＷAが搬入テーブル１１０の上に載置されると（図５（Ａ））、搬入機構６０により搬入テーブル１１０が上昇してワークＷAが真空容器２０の搬送路室２１に搬入され、搬入口２２が搬入テーブル１１０により閉鎖される（図５（Ｂ））。
次に、真空排気機構３０により、真空容器２０内（この場合、待避室２５及び搬送路室２１内）が真空状態に設定され、真空脱泡などの処理が開始される。
ワークＷＡは、ワーク搬送機構４０により、搬送路２４に沿って順送り距離だけ搬送され、昇降テーブル１００のワーク支持面１００ａ上に載置される（図５（Ｃ））。
次に、テーブル昇降機構５０により昇降テーブル１００を上昇させて、ワークＷＡを待避室２５に待避させる（図５（Ｄ））。待避室２５の出入口２６は昇降テーブル１００より塞がれ、シール機構２８により気密状態で閉鎖されるので、待避室２５は真空状態が保たれる。 In the following description, an operation from when the work WA is carried into the vacuum vessel 20 until it is carried out will be described.
First, when the work WA is placed on the carry-in table 110 (FIG. 5A), the carry-in table 110 is raised by the carry-in mechanism 60, and the work WA is carried into the transfer path chamber 21 of the vacuum container 20, The carry-in port 22 is closed by the carry-in table 110 (FIG. 5B).
Next, the inside of the vacuum container 20 (in this case, the inside of the waiting room 25 and the transfer path chamber 21) is set to a vacuum state by the vacuum exhaust mechanism 30, and processing such as vacuum defoaming is started.
The work WA is transported by the work transport mechanism 40 along the transport path 24 by a forward feed distance, and is placed on the work support surface 100a of the lifting table 100 (FIG. 5C).
Next, the lifting / lowering table 100 is lifted by the table lifting / lowering mechanism 50, and the work WA is retracted in the waiting room 25 (FIG. 5D). Since the entrance / exit 26 of the waiting room 25 is closed by the lifting table 100 and is closed in an airtight state by the sealing mechanism 28, the waiting room 25 is kept in a vacuum state.

次に、真空排気機構３０Ｂにより搬送路室２１内を大気圧の状態に設定した後、搬入機構６０により搬入テーブル１１０を降下させて搬入口２２を開く。搬入テーブル１１０に２番目のワークＷＢを載置すると（図６（Ａ））、搬入テーブル１１０を上昇させ、第２のワークＷＢが搬送路室２１に搬入される（図６（Ｂ））。
搬送路室２１は大気圧の状態になっているので、搬入口２２が気密状態で閉鎖された後、真空排気機構３０Ａにより真空容器２０内（この場合、搬送路室２１内）が真空状態に設定される。待避室２５に待避している１番目のワークＷＡは、待避中に真空脱泡などの処理が継続されるが、待避室２５において所定の処理が行われるようにしてもよい。
搬送路室２１が真空状態に設定されると、昇降テーブル１００が降下して待避室２５の出入口２６が開放され、待避中のワークＷＡは搬送路室２１の搬送路２４上に戻される（図６（Ｃ））。 Next, after the inside of the transfer path chamber 21 is set to an atmospheric pressure state by the vacuum exhaust mechanism 30 </ b> B, the carry-in table 110 is lowered by the carry-in mechanism 60 to open the carry-in port 22. When the second work WB is placed on the carry-in table 110 (FIG. 6A), the carry-in table 110 is raised and the second work WB is carried into the transfer path chamber 21 (FIG. 6B).
Since the transfer path chamber 21 is in an atmospheric pressure state, the inside of the vacuum container 20 (in this case, the transfer path chamber 21) is evacuated by the vacuum exhaust mechanism 30A after the carry-in port 22 is closed in an airtight state. Is set. The first work WA that has been saved in the waiting room 25 is continuously subjected to processing such as vacuum defoaming during the saving, but a predetermined process may be performed in the waiting room 25.
When the transfer path chamber 21 is set in a vacuum state, the elevating table 100 is lowered to open the entrance / exit 26 of the waiting room 25, and the work WA being saved is returned onto the transfer path 24 of the transfer path chamber 21 (FIG. 6 (C)).

次に、搬送路２４上に戻った１番目のワークＷＡと搬入口２２より搬入された２番目のワークＷＢは、搬送路室２１の搬送路２４に沿って順送り距離だけ搬送される（図６（Ｄ））。図示例では、待避室２５には２つのワークＷを待避させることが可能であるため、昇降テーブル１００上には２つのワークＷＡ，ＷＢが載置される。
次に、テーブル昇降機構５０により昇降テーブル１００を上昇させて、ワークＷＡ、ＷＢを待避室２５に待避させる（図７（Ａ））。待避室２５の出入口２６は昇降テーブル１００より塞がれ、シール機構２８により気密状態で閉鎖され、待避室２５は真空状態が保たれる。 Next, the first workpiece WA returned on the conveyance path 24 and the second workpiece WB carried in from the carry-in port 22 are conveyed along the conveyance path 24 in the conveyance path chamber 21 by a forward distance (FIG. 6). (D)). In the illustrated example, since the two work Ws can be saved in the waiting room 25, the two works WA and WB are placed on the lifting table 100.
Next, the lifting / lowering table 100 is lifted by the table lifting / lowering mechanism 50 to retract the workpieces WA and WB in the waiting room 25 (FIG. 7A). The entrance / exit 26 of the waiting room 25 is closed by the lifting table 100 and is closed in an airtight state by the seal mechanism 28, and the waiting room 25 is kept in a vacuum state.

次に、搬送路室２１内を大気圧の状態に設定した後、搬入機構６０により搬入テーブル１１０を降下させて搬入口２２を開き、搬入テーブル１１０に３番目のワークＷＣを載置すると（図７（Ｂ））、搬入テーブル１１０を上昇させ、第３のワークＷＣは搬送路室２１に搬入される（図７（Ｃ））。
搬送路室２１は大気圧の状態になっているので、搬入口２２が気密状態で閉鎖された後、真空排気機構３０Ａにより搬送路室２１内が真空状態に設定される。待避室２５に待避している２つのワークＷＡ、ＷＢは、待避中に脱泡処理など所定の処理が継続される。
搬送路室２１が真空状態に設定されると、昇降テーブル１００が降下して待避室２５の出入口２６が開放され、待避中のワークＷＡ、ＷＢは搬送路室２１の搬送路２４上に戻される（図７（Ｄ））。 Next, after the inside of the transfer path chamber 21 is set to an atmospheric pressure state, the carry-in mechanism 60 is lowered by the carry-in mechanism 60 to open the carry-in entrance 22, and the third work WC is placed on the carry-in table 110 (FIG. 7 (B)), the carry-in table 110 is raised, and the third work WC is carried into the transfer path chamber 21 (FIG. 7C).
Since the transfer path chamber 21 is in an atmospheric pressure state, after the carry-in port 22 is closed in an airtight state, the inside of the transfer path chamber 21 is set to a vacuum state by the vacuum exhaust mechanism 30A. Predetermined processing such as defoaming processing is continued while the two workpieces WA and WB are being saved in the waiting room 25.
When the transfer path chamber 21 is set in a vacuum state, the elevating table 100 is lowered to open the entrance / exit 26 of the waiting room 25 and the workpieces WA and WB being saved are returned onto the transfer path 24 of the transfer path chamber 21. (FIG. 7 (D)).

待避室２５から搬送路２４上に戻った２つのワークＷＡ，ＷＢと搬入口２２より搬入された３番目のワークＷＣは、搬送路室２１の搬送路２４に沿って搬送される。すなわち、１番目のワークＷＡは搬出テーブル１２０上に載置され、２番目、３番目のワークＷＢ，ＷＣは昇降テーブル１００上に載置される（図８（Ａ））。
次に、昇降テーブル１００を上昇させて、ワークＷＢ，ＷＣを待避室２５に待避させる（図８（Ｂ））。待避室２５の出入口２６は昇降テーブル１００より塞がれ、シール機構２８により気密状態で閉鎖され、待避室２５は真空状態が保たれる。 The two works WA and WB returned from the waiting room 25 onto the transfer path 24 and the third work WC carried in from the carry-in port 22 are transferred along the transfer path 24 of the transfer path chamber 21. That is, the first workpiece WA is placed on the carry-out table 120, and the second and third workpieces WB and WC are placed on the lifting table 100 (FIG. 8A).
Next, the lifting table 100 is raised to retract the workpieces WB and WC in the waiting room 25 (FIG. 8B). The entrance / exit 26 of the waiting room 25 is closed by the lifting table 100 and is closed in an airtight state by the seal mechanism 28, and the waiting room 25 is kept in a vacuum state.

次に、搬送路室２１内を大気圧の状態に設定した後、搬入機構６０により搬入テーブル１１０を降下させて搬入口２２を開き、搬入テーブル１１０に４番目のワークＷＤを載置する（図８（Ｃ））。
さらに、搬出テーブル１２０を下降させて搬出口２３を開き、１番目のワークＷＡを搬出口２３より搬出する。同時に、搬入テーブル１１０を上昇させ、４番目のワークＷＤを真空容器の搬送路室２１に搬入させる（図８（Ｄ））。
以下、同様にして順次ワークＷが真空容器２０内に搬入されると同時に、ワークＷが真空容器２０から順次搬出される。 Next, after the inside of the transfer path chamber 21 is set to an atmospheric pressure state, the carry-in mechanism 60 is lowered by the carry-in mechanism 60 to open the carry-in entrance 22, and the fourth work WD is placed on the carry-in table 110 (FIG. 8 (C)).
Further, the unloading table 120 is lowered to open the unloading port 23, and the first work WA is unloaded from the unloading port 23. At the same time, the carry-in table 110 is raised, and the fourth work WD is carried into the transfer path chamber 21 of the vacuum container (FIG. 8D).
Thereafter, the workpieces W are sequentially carried into the vacuum vessel 20 in the same manner, and at the same time, the workpieces W are sequentially carried out from the vacuum vessel 20.

このように、搬入口２２や搬出口２３が開かれるとき、真空容器２０内に搬入されているワークは真空容器２０内の待避室２５に待避させるので、真空状態下に継続して置かれることになる。また、待避室２５に待避中のワークＷは、待避室２５から搬送路室２１に戻すとき、搬送路室２１を真空状態に設定した後に搬送路室２１に戻すので、真空状態下に継続して置かれることになる。このように、真空容器２０内に搬入されたワークＷは、搬出されるまでの間、真空容器２０内で真空状態下に置かれ、この間に所定の処理が行われる。   As described above, when the carry-in port 22 and the carry-out port 23 are opened, the work carried into the vacuum vessel 20 is evacuated to the evacuation chamber 25 in the vacuum vessel 20, so that the workpiece is continuously placed under a vacuum state. become. Further, when the workpiece W being saved in the waiting room 25 is returned from the waiting room 25 to the transfer path chamber 21, it is returned to the transfer path chamber 21 after the transfer path chamber 21 is set in a vacuum state, and thus continues in a vacuum state. Will be placed. In this way, the workpiece W carried into the vacuum container 20 is placed in a vacuum state in the vacuum container 20 until it is carried out, and a predetermined process is performed during this time.

前記構成によれば、真空容器２０内に常に真空状態が保たれる待避室２５を設け、その待避室２５の出入口２６を気密状態で閉鎖する構造としたので、待避室２５の１つの出入口２６を開閉するだけでよい。このため、従来技術のように搬送経路に所定の処理を行うための室を設け、この室の入口と出口それぞれに仕切りバルブを設けて真空状態を保持する場合に比べて、本発明の真空処理装置１０及び真空処理方法は、構造が簡単であり気密性を高めることができる。   According to the above-described configuration, the evacuation chamber 25 in which the vacuum state is always maintained is provided in the vacuum container 20, and the entrance / exit 26 of the evacuation chamber 25 is closed in an airtight state. Just open and close. For this reason, the vacuum processing of the present invention is compared with the case where a chamber for performing a predetermined processing is provided in the transfer path as in the prior art, and a partition valve is provided at each of the inlet and outlet of the chamber to maintain a vacuum state. The apparatus 10 and the vacuum processing method have a simple structure and can improve airtightness.

また、上記の実施態様によれば、搬入テーブル１１０、搬出テーブル１２０、昇降テーブル１００の昇降動作に伴って、搬送路室２１の搬入口２２、搬出口２３、待避室２５の出入口２６のそれぞれを閉鎖又は開放させるので、構造が簡略化されかつ処理の効率化がはかられる。   Further, according to the above-described embodiment, as the carry-in table 110, the carry-out table 120, and the lift table 100 are moved up and down, the carry-in entrance 22, the carry-out exit 23, and the entrance / exit 26 in the waiting room 25 are respectively set. Since it is closed or opened, the structure is simplified and the processing efficiency is improved.

また、本発明においては、待避室２５を設けており、真空容器２０へのワークＷの搬入出の際には、既に真空容器２０内にあるワークＷは真空状態を保ったまま待避室２５に待避させられる。このため、従来技術のように、ワークＷの搬送経路にワークＷの搬入出を行う室と処理のための室が配置されている装置に比べ、待避室２５への移動や待避室２５から搬送路室２１に戻るために要する時間だけ、ワークＷを真空状態に配置する時間を長くすることができる。このため、ワークＷに合成樹脂が塗布されている場合には、ワークＷをより長い時間真空状態に配置することで、脱泡処理をより効果的に行うことができる。   Further, in the present invention, a waiting room 25 is provided, and when the work W is carried into and out of the vacuum container 20, the work W already in the vacuum container 20 is placed in the waiting room 25 while maintaining a vacuum state. Evacuated. For this reason, as compared with a device in which a chamber for loading and unloading a workpiece W and a chamber for processing are arranged on the conveyance path of the workpiece W as in the prior art, the movement to the waiting room 25 and the conveying from the waiting room 25 are performed. The time required for placing the workpiece W in the vacuum state can be increased by the time required for returning to the passage chamber 21. For this reason, when synthetic resin is apply | coated to the workpiece | work W, the defoaming process can be performed more effectively by arrange | positioning the workpiece | work W in a vacuum state for a longer time.

以上、本発明の一実施形態について説明したが、本発明は上記実施形態に限定されるものではなく、本発明の趣旨を逸脱しない限りにおいて種々の変更が可能である。
本実施形態では搬入口２２、搬出口２３を閉鎖するためのシール機構１１１、１２１はそれぞれ搬入テーブル１１０、搬出テーブル１２０の上面に設けられているが、搬送路室２１の床壁２１ａの下面であって、搬入口２２、搬出口２３の周囲に設けられていてもよい。また、待避室２５の出入口２６を閉鎖するためのシール機構２８は、出入口２６の周囲の壁に形成されているが、昇降テーブル１００の上面に設けられていてもよい。 As mentioned above, although one Embodiment of this invention was described, this invention is not limited to the said embodiment, A various change is possible unless it deviates from the meaning of this invention.
In this embodiment, the seal mechanisms 111 and 121 for closing the carry-in port 22 and the carry-out port 23 are provided on the upper surface of the carry-in table 110 and the carry-out table 120, respectively. In addition, it may be provided around the carry-in port 22 and the carry-out port 23. Further, the sealing mechanism 28 for closing the entrance 26 of the waiting room 25 is formed on the wall around the entrance 26, but may be provided on the upper surface of the lifting table 100.

さらに、待避室２５の上方に合成樹脂等の吐出用のディスペンサを取り付け、真空状態に置かれたワークＷに樹脂を吐出して真空処理を行ってもよい。   Furthermore, a dispenser for discharging synthetic resin or the like may be attached above the waiting room 25, and the resin may be discharged onto the workpiece W placed in a vacuum state to perform vacuum processing.

１０ 真空処理装置
２０ 真空容器
２２ 搬入口
２３ 搬出口
２４ 搬送路
２５ 待避室
３０Ａ，３０Ｂ 真空排気機構
４０ ワーク搬送機構
４１ 往復動板
４２Ａ〜４２Ｃ 棒状部材
４３Ａ〜４３Ｃ 往復動機構
４４ 駆動機構
５０ 昇降テーブル昇降機構
６０ 搬入機構
７０ 搬出機構
１００ 昇降テーブル
１００ａ ワーク支持面
１０１、１０１ ２本のガイドレール（ガイド機構）
１１０ 搬入テーブル
１２０ 搬出テーブル
Ｐ ワークプレート
Ｗ ワーク DESCRIPTION OF SYMBOLS 10 Vacuum processing apparatus 20 Vacuum container 22 Carry-in port 23 Carry-out port 24 Carriage path 25 Retraction | saving chamber 30A, 30B Vacuum exhaust mechanism 40 Work conveyance mechanism 41 Reciprocating plate 42A-42C Rod-shaped member 43A-43C Reciprocating mechanism 44 Drive mechanism 50 Lifting table Lifting mechanism 60 Loading mechanism 70 Unloading mechanism 100 Lifting table 100a Work support surface 101, 101 Two guide rails (guide mechanism)
110 carry-in table 120 carry-out table P work plate W work

Claims (2)

開閉可能なワークの搬入口より真空容器内へワークを順次搬入し、真空状態に設定された前記真空容器内のワークの搬送路に沿ってワークを搬送させた後、開閉可能なワークの搬出口より前記真空容器外へワークを順次搬出する真空処理方法であって、
前記搬送路が設けられた前記真空容器内の搬送路室と、前記搬送路室に連通させて前記真空容器内に設けられたワークの待避室とが、前記搬送路室の一端に設けられた前記搬入口及び前記搬送路室の他端に設けられた搬出口の開放前に真空状態に設定されたとき、前記搬送路上のワークを前記待避室内に移動させて待避室の出入口を気密状態で閉鎖し、前記搬送路室が大気圧状態に設定され、開放された前記搬入口及び前記搬出口よりワークの搬出入が行われた後に、前記搬入口及び搬出口が閉鎖されて前記搬送路室が真空状態に設定されたとき、前記待避室の出入口を開放して前記待避室内のワークを前記搬送路上に戻すことを特徴とする真空処理方法。 The workpiece can be sequentially transferred into the vacuum vessel from the opening / closing port of the openable / closable workpiece, the workpiece is transferred along the workpiece transfer path in the vacuum vessel set in a vacuum state, and then the workpiece outlet / outlet that can be opened / closed A vacuum processing method for sequentially unloading the workpiece out of the vacuum container,
A transfer path chamber in the vacuum container provided with the transfer path, and a work receiving chamber provided in the vacuum container in communication with the transfer path chamber are provided at one end of the transfer path chamber. When the vacuum state is set before opening of the carry-out port and the carry-out port provided at the other end of the transfer path chamber, the work on the transfer path is moved into the save chamber so that the entrance / exit of the save chamber is in an airtight state. The transfer path chamber is closed and the transfer path chamber is set to an atmospheric pressure state . After the work is loaded and unloaded from the opened transfer port and the transfer port, the transfer port and the transfer port are closed, and the transfer path chamber is closed. When the vacuum is set to a vacuum state, the vacuum processing method is characterized by opening the entrance / exit of the waiting room and returning the work in the waiting room onto the transfer path. 一端に開閉可能なワークの搬入口、他端に開閉可能なワークの搬出口、前記搬入口と前記搬出口との間にワークの搬送路を有する搬送路室が設けられるとともに前記搬送路室の上方に搬送路室と連通するワークの待避室が設けられた真空容器と、
前記真空容器を真空状態と大気圧の状態とに切換えて設定することが可能な真空排気機構と、
前記真空容器の搬送路室内に前記搬入口より搬入されたワークを前記搬送路に沿って前記搬出口まで搬送するワーク搬送機構と、
前記搬送路室内の搬送路上に配置され前記搬送路室と前記待避室との間を昇降動作させる昇降テーブルとを備え、
前記昇降テーブルは、その上面に前記待避室の出入口を閉鎖することが可能なワーク支持面を有し、前記ワーク支持面上には前記搬送路の一部を構成するガイド機構が設けられるとともに、前記昇降テーブルと待避室の出入口との間には昇降テーブルにより待避室の出入口を気密状態で閉鎖するためのシール機構が設けられてなる真空処理装置。 A work entrance that can be opened and closed at one end, a work exit that can be opened and closed at the other end, a transport path chamber having a work transport path between the transport inlet and the transport outlet, and a transport path chamber of the transport path chamber A vacuum vessel provided with a work waiting room communicating with the transfer path chamber above;
An evacuation mechanism capable of switching and setting the vacuum vessel between a vacuum state and an atmospheric pressure state;
A workpiece transfer mechanism for transferring a workpiece carried from the carry-in entrance to the carry-out port of the vacuum vessel to the carry-out port along the carry route;
An elevating table disposed on the conveying path in the conveying path chamber and moving up and down between the conveying path chamber and the waiting room;
The lifting table has a work support surface capable of closing the entrance / exit of the waiting room on its upper surface, and a guide mechanism constituting a part of the transport path is provided on the work support surface, A vacuum processing apparatus, wherein a sealing mechanism is provided between the lifting table and the entrance / exit of the waiting room to close the entrance / exit of the waiting room in an airtight state by the lifting table.
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