JP5432985B2 - Surface treatment method for members constituting mechanical booster pump, turbo molecular pump or dry pump, and mechanical booster pump, turbo molecular pump or dry pump treated by this surface treatment method - Google Patents
Surface treatment method for members constituting mechanical booster pump, turbo molecular pump or dry pump, and mechanical booster pump, turbo molecular pump or dry pump treated by this surface treatment method Download PDFInfo
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- JP5432985B2 JP5432985B2 JP2011508253A JP2011508253A JP5432985B2 JP 5432985 B2 JP5432985 B2 JP 5432985B2 JP 2011508253 A JP2011508253 A JP 2011508253A JP 2011508253 A JP2011508253 A JP 2011508253A JP 5432985 B2 JP5432985 B2 JP 5432985B2
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- 238000000034 method Methods 0.000 title claims description 14
- 238000004381 surface treatment Methods 0.000 title claims description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 15
- 229910000838 Al alloy Inorganic materials 0.000 claims description 13
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 239000004115 Sodium Silicate Substances 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 9
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 9
- 239000012670 alkaline solution Substances 0.000 claims description 8
- 238000007745 plasma electrolytic oxidation reaction Methods 0.000 claims description 7
- 235000019795 sodium metasilicate Nutrition 0.000 claims description 6
- 239000001488 sodium phosphate Substances 0.000 claims description 6
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 6
- 229910000406 trisodium phosphate Inorganic materials 0.000 claims description 6
- 235000019801 trisodium phosphate Nutrition 0.000 claims description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 claims description 3
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910000403 monosodium phosphate Inorganic materials 0.000 claims description 3
- 235000019799 monosodium phosphate Nutrition 0.000 claims description 3
- 239000011734 sodium Substances 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 235000015424 sodium Nutrition 0.000 claims description 3
- 229910001388 sodium aluminate Inorganic materials 0.000 claims description 3
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 claims description 3
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 claims description 3
- 235000019832 sodium triphosphate Nutrition 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 29
- 239000007789 gas Substances 0.000 description 23
- 238000005260 corrosion Methods 0.000 description 13
- 230000007797 corrosion Effects 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 7
- 238000005266 casting Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004512 die casting Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- RGGPNXQUMRMPRA-UHFFFAOYSA-N triethylgallium Chemical compound CC[Ga](CC)CC RGGPNXQUMRMPRA-UHFFFAOYSA-N 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 229910021364 Al-Si alloy Inorganic materials 0.000 description 1
- 229910000497 Amalgam Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/042—Turbomolecular vacuum pumps
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/026—Anodisation with spark discharge
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
- F04C23/003—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle having complementary function
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
- F04C23/006—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle having complementary function
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D29/00—Details, component parts, or accessories
- F04D29/02—Selection of particular materials
- F04D29/023—Selection of particular materials especially adapted for elastic fluid pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/10—Vacuum
- F04C2220/12—Dry running
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2230/00—Manufacture
- F04C2230/90—Improving properties of machine parts
- F04C2230/92—Surface treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05C—INDEXING SCHEME RELATING TO MATERIALS, MATERIAL PROPERTIES OR MATERIAL CHARACTERISTICS FOR MACHINES, ENGINES OR PUMPS OTHER THAN NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES
- F05C2201/00—Metals
- F05C2201/02—Light metals
- F05C2201/021—Aluminium
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05C—INDEXING SCHEME RELATING TO MATERIALS, MATERIAL PROPERTIES OR MATERIAL CHARACTERISTICS FOR MACHINES, ENGINES OR PUMPS OTHER THAN NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES
- F05C2201/00—Metals
- F05C2201/90—Alloys not otherwise provided for
- F05C2201/903—Aluminium alloy, e.g. AlCuMgPb F34,37
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2230/00—Manufacture
- F05D2230/90—Coating; Surface treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2260/00—Function
- F05D2260/95—Preventing corrosion
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2300/00—Materials; Properties thereof
- F05D2300/10—Metals, alloys or intermetallic compounds
- F05D2300/12—Light metals
- F05D2300/121—Aluminium
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2300/00—Materials; Properties thereof
- F05D2300/10—Metals, alloys or intermetallic compounds
- F05D2300/17—Alloys
- F05D2300/173—Aluminium alloys, e.g. AlCuMgPb
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Structures Of Non-Positive Displacement Pumps (AREA)
- Non-Positive Displacement Air Blowers (AREA)
Description
本発明は、気体流路に露出するアルミニウム又はアルミニウム合金から構成されるメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプの部品の表面処理方法及びこの表面処理方法により処理された部品から構成されるメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプに関する。 The present invention relates to a mechanical booster pump composed of aluminum or aluminum alloy exposed in a gas flow path, a surface treatment method for parts of a turbo molecular pump or a dry pump, and a mechanical booster composed of parts treated by this surface treatment method The present invention relates to a pump, a turbo molecular pump, or a dry pump.
従来のドライポンプの構造としては、例えば、図1に示されるように、筐体1の側面に対向するようにして配置された吸気口2及び排気口3を接続する流路において、ローター室4を設け、このローター室4内に、モーター5により駆動される回転軸6により軸支されたローター7〜12を設けることにより構成されるスクリュー型のものが知られている。尚、図示したものでは、ローター室4内に、加熱手段13により加熱された空気や乾燥窒素等を導入するためのガスバラスト14が接続され、また、回転軸6の周辺に軸シールガスを導入するための軸シールガス導入路15が形成されている。
上記構造において、真空チャンバーから吸引された気体は、吸気口2からローター室4を通り、排気口3から排気されることになるが、その間に、気体は、吸気口2、ローター7〜12、ローター室4や排気口3等の表面と接触し、吸引される気体が腐食性を有する場合には、通常は、各部品の表面にアルマイト処理を行うようにしている(例えば、特許文献1参照)。
しかしながら、アルマイト処理の場合には、部材表面にポーラス型の酸化皮膜が形成されるために、該皮膜から放出されるガス量が多く、真空ポンプの排気効率を低下させるという問題があった。また、アルマイト処理された部材は120℃程度に加熱されると皮膜にクラックが入り耐食性が低下する可能性があるという問題があった。更に、塩素を含有する気体を吸引するような場合にも短期間で部材が腐蝕するという問題があった。
一方、ワイドバンドギャップ化合物半導体であるGaNは、発光ダイオード(LED)やパワーデバイスとして、MBEやMOCVDで製造されており、量産化に伴い、MBE原料である金属Ga、或いは、MOCVD原料有機金属であるトリメチルガリウム(TMG)やトリエチルガリウム(TEG)が大量に消費される。ところが、反応性の高いGaはAlに触れると溶けてアマルガム状態になるため、原料および未反応のGaが流れる配管および構成部品には、アルミニウム製やアルミニウム合金製は使用できないという問題があった。As a conventional dry pump structure, for example, as shown in FIG. 1, the
In the above structure, the gas sucked from the vacuum chamber passes through the
However, in the case of alumite treatment, since a porous oxide film is formed on the surface of the member, there is a problem that the amount of gas released from the film is large and the exhaust efficiency of the vacuum pump is lowered. In addition, when the alumite-treated member is heated to about 120 ° C., there is a problem that the coating may crack and the corrosion resistance may be lowered. Further, there is a problem that the member is corroded in a short period of time when a gas containing chlorine is sucked.
On the other hand, GaN, which is a wide bandgap compound semiconductor, is manufactured by MBE or MOCVD as a light emitting diode (LED) or power device, and with mass production, metal Ga, which is an MBE raw material, or MOCVD raw material organic metal. Some trimethylgallium (TMG) and triethylgallium (TEG) are consumed in large quantities. However, since highly reactive Ga melts into an amalgam state when it comes into contact with Al, there is a problem that aluminum and aluminum alloys cannot be used for pipes and components through which raw materials and unreacted Ga flow.
そこで、本発明は、上記課題を解決すべく、耐食性に優れ放出ガスの少ないメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプを構成する部材の表面処理方法及びこの表面処理方法により処理されたメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプを提供することを目的とする。 In view of the above, the present invention provides a mechanical booster pump, a turbo molecular pump or a dry pump with a surface treatment method for a member constituting a mechanical booster pump which has excellent corrosion resistance and a low release gas, and a mechanical booster pump which has been treated by this surface treatment method. An object is to provide a turbo molecular pump or a dry pump.
上記課題を解決するために、本発明者等は鋭意検討の結果、下記の通り解決手段を見いだした。
即ち、本発明のメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプを構成する部材の表面処理方法の第1の解決手段は、メカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプを構成する部材を、アルミニウム又はアルミニウム合金から構成し、前記部材表面を、アルカリ溶液中に浸漬して、マイクロアーク酸化処理し、前記処理により前記部材表面に形成される酸化皮膜の膜厚を12μm〜15μmとすることを特徴とする。
また、第2の解決手段は、前記アルカリ溶液は、りん酸水素二ナトリウム、トリポリりん酸ナトリウム、りん酸二水素ナトリウム、ウルトラポリりん酸ナトリウム、ケイ酸ナトリウム、水酸化カリウム、二リン酸ナトリウム、リン酸三ナトリウム、アルミン酸ナトリウム、メタケイ酸ナトリウム及び水酸化ナトリウムの中の1種類又はこれらの中の混合物を水に溶解させて、その濃度0.1質量%〜5質量%としたことを特徴とする。
また、第3の解決手段は、前記マイクロアーク処理における印加電圧を300V〜600Vの範囲とし、電流密度を3.0A/dm2〜10A/dm2とすることを特徴とする。
また、第4の解決手段は、前記アルカリ溶液の温度を5〜90℃とすることを特徴とする。
また、第5の解決手段は、前記処理により部材表面に形成される酸化皮膜の膜厚を12μm〜15μmとすることを特徴とする。
また、本発明のメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプは、上記表面処理方法により処理された部材により構成されたことを特徴とする。
In order to solve the above-mentioned problems, the present inventors have found a solving means as follows as a result of intensive studies.
That is, the first solving means of the surface treatment method of the members constituting the mechanical booster pump, turbo molecular pump or dry pump of the present invention is to replace the members constituting the mechanical booster pump, turbo molecular pump or dry pump with aluminum or aluminum. It is composed of an alloy, and the surface of the member is immersed in an alkaline solution and subjected to micro-arc oxidation treatment, and the thickness of the oxide film formed on the surface of the member by the treatment is set to 12 μm to 15 μm. .
The second solution is that the alkaline solution is disodium hydrogen phosphate, sodium tripolyphosphate, sodium dihydrogen phosphate, sodium ultrapolyphosphate, sodium silicate, potassium hydroxide, sodium diphosphate, trisodium phosphate, sodium aluminate, one kind or a mixture of of these in the sodium metasilicate and sodium hydroxide were dissolved in water, that it has a concentration of 0.1 mass% to 5 mass% Features.
The third solving means is characterized in that the applied voltage in the micro arc treatment is in the range of 300 V to 600 V, and the current density is 3.0 A / dm 2 to 10 A / dm 2 .
Moreover, the 4th solution means makes the temperature of the said
The fifth solving means is characterized in that the film thickness of the oxide film formed on the surface of the member by the treatment is 12 μm to 15 μm.
Moreover, the mechanical booster pump, the turbo molecular pump or the dry pump of the present invention is constituted by a member treated by the surface treatment method.
本発明によれば、メカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプを構成する部材表面を、アルミニウム又はアルミニウム合金により構成してマイクロアーク酸化処理を行うことにより、腐食性を有するガスの排気に対して耐食性に優れ、放出ガス量の少ないドライポンプが得られる。そして、このメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプによれば、効率的な吸引が可能となる。また、Gaを含有するガスに対する耐食性の優れたものとなる。 According to the present invention, the surface of a member constituting a mechanical booster pump, a turbo molecular pump or a dry pump is made of aluminum or an aluminum alloy and subjected to a micro arc oxidation treatment, thereby exhausting corrosive gas. A dry pump having excellent corrosion resistance and a small amount of released gas can be obtained. And according to this mechanical booster pump, a turbo-molecular pump, or a dry pump, efficient suction becomes possible. Moreover, it becomes the thing with the excellent corrosion resistance with respect to the gas containing Ga.
本発明において使用するアルカリ溶液の電解液の例としては、りん酸水素二ナトリウム、トリポリりん酸ナトリウム、りん酸二水素ナトリウム、ウルトラポリりん酸ナトリウム、ケイ酸ナトリウム、水酸化カリウム、二リン酸ナトリウム、リン酸三ナトリウム、アルミン酸ナトリウム、メタケイ酸ナトリウム及び水酸化ナトリウム等の中の1種類又はこれらの中の混合物を、電解液に溶解させたものを用いることができる。その濃度は、0.1%〜5%の範囲とすることが好ましい。 Examples of the alkaline solution electrolyte used in the present invention include disodium hydrogen phosphate, sodium tripolyphosphate, sodium dihydrogen phosphate, sodium ultrapolyphosphate, sodium silicate, potassium hydroxide, sodium diphosphate. A solution obtained by dissolving one kind of trisodium phosphate, sodium aluminate, sodium metasilicate, sodium hydroxide, or the like or a mixture thereof in an electrolytic solution can be used. The concentration is preferably in the range of 0.1% to 5%.
また、母材としては、アルミニウム又はアルミニウム合金を使用する。アルミニウム合金の鋳物材料、ダイキャスト材料はシリコンを代表として、一般的に含有されている元素が多く、ポーラス型アノード酸化皮膜が形成し難いといわれている。
本発明によれば、このようなシリコンが多い鋳物、ダイキャストでも耐食性良好な皮膜を形成することができる。また、展伸材の中でもAl−Si合金の4000番系の処理も同様な理由でポーラス型アノード酸化処理の耐食性は悪いが、本発明によれば、良好な酸化皮膜が形成できる。シリコンが析出していないような展伸材、1000番〜3000番、5000番から7000番台のアルミニウム合金についても複雑形状の場合や100℃以上の高温になる場合には効果がある。Further, aluminum or an aluminum alloy is used as the base material. Aluminum alloy casting materials and die-casting materials, typically silicon, contain many elements in general, and it is said that it is difficult to form a porous anodic oxide film.
According to the present invention, it is possible to form a coating film with good corrosion resistance even in such a casting or die-casting with a lot of silicon. Further, among the wrought materials, the No. 4000 series treatment of the Al—Si alloy has a poor corrosion resistance due to the same reason, but according to the present invention, a good oxide film can be formed. The wrought material, in which silicon is not precipitated, and aluminum alloys in the 1000th to 3000th, 5000th to 7000th range, are also effective in the case of a complicated shape or a high temperature of 100 ° C. or higher.
本発明では、上記した母材を、メカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプの構成部材として、アルカリ溶液中に浸漬して、マイクロアーク酸化処理を行うものであるが、アルカリ溶液の温度条件としては、特に制限するものではないが、該溶液が凍結乃至沸騰しない範囲(5℃〜90℃程度)とすることが好ましい。また、印加する電圧は、300V〜600Vとすることが好ましい。300V未満であると絶縁破壊が起こらず、600Vを超えると皮膜のボイドが大きくなるからである。また、電流密度については、3.0A/dm2〜10A/dm2とすることが好ましい。3.0A/dm2であると厚膜化できず、10A/dm2を超えると電圧が上昇しボイドが大きくなるからである。また、電流に関しては、直流、交流及び直交重畳のいずれであってもよい。In the present invention, the above-described base material is immersed in an alkaline solution as a constituent member of a mechanical booster pump, a turbo molecular pump or a dry pump to perform micro-arc oxidation treatment. Is not particularly limited, but is preferably in a range where the solution does not freeze or boil (about 5 ° C. to 90 ° C.). Moreover, it is preferable that the applied voltage shall be 300V-600V. If it is less than 300 V, dielectric breakdown does not occur, and if it exceeds 600 V, the voids of the film increase. The current density is preferably 3.0 A / dm 2 to 10 A / dm 2 . This is because if it is 3.0 A / dm 2 , the film cannot be thickened, and if it exceeds 10 A / dm 2 , the voltage increases and voids increase. In addition, the current may be any of direct current, alternating current, and orthogonal superimposition.
また、母材表面に形成される酸化皮膜の膜厚については特に制限はないが、12μm〜15μmの範囲とすることが好ましい。ポンプの作動に支障を与えない範囲で、酸化皮膜としての機能も発揮する範囲であるためである。 Moreover, there is no restriction | limiting in particular about the film thickness of the oxide film formed in a base material surface, However, It is preferable to set it as the range of 12 micrometers-15 micrometers. This is because the function as an oxide film is exhibited within a range that does not hinder the operation of the pump.
本発明に使用するドライポンプは、ポンプ内部のガス通路に油を使用しないものであれば、図1に示される構造に特に制限をするものではないが、構造的には、排気する回転体の形状に応じて、ルーツ型、クロー型、スクリュー型、ターボ型、スクロール型のもの、多段式のものやダイヤフラム型等を挙げることができる。
また、メカニカルブースターポンプの構造に関しても特に制限するものではないが、一例を図2を参照して説明する。図中の符号21はケーシングであり、ケーシング21は、上流部を構成する上側ケーシング21aと下流部を構成する下側ケーシング21bとを一体化した構成となっている。このケーシング21には吸気口22及び排気口23が設けられ、吸気口22を設けた上側ケーシング21a側の内部には静翼25が固定して設けられている。これら静翼25は、それぞれスペーサ28によってその位置が固定されている。
ケーシング21及び静翼25を備えた静止側に対し、ケーシング21内には回転体31が高速回転可能に設置されている。この回転体31は、回転軸34と一体的に連結されたロータ部35に設けられた複数段の動翼32及びねじ溝部33を備えており、従って、軸流段及びねじ溝段よりなる二段圧縮構造となっている。回転体31側の動翼32は、上述した静翼25と回転軸34の軸方向において交互に配設されている。
回転体31の回転軸34は、下側ケーシング21bに固定されたステータ26の内周面に取り付けられている上部軸受としての磁気軸受29aと、下部軸受としての磁気軸受29bと、軸方向軸受としての磁気軸受29cとにより支持されて高速回転可能となっている。なお、図中の符号Mは、ステータ26の内周面と回転軸34との間に設けられているロータ駆動用モータである。
このような構成とすれば、吸気口22から吸引したガスは静翼25及び動翼32の間を通過して軸流段による圧縮を受けた後、ねじ溝部33と放熱板41との間を通過してねじ溝段による圧縮を受けるというガス流路の主流を流れて排気口23から流出する。
上記構造において、回転体31の動翼32、ケーシング21b、スペーサ28で固定された静翼25及び回転体31のねじ溝部33を、アルミニウム又はアルミニウム合金により構成する。The dry pump used in the present invention is not particularly limited to the structure shown in FIG. 1 as long as it does not use oil in the gas passage inside the pump. Depending on the shape, a root type, a claw type, a screw type, a turbo type, a scroll type, a multistage type, a diaphragm type, and the like can be given.
Moreover, although it does not restrict | limit especially regarding the structure of a mechanical booster pump, an example is demonstrated with reference to FIG.
A rotating body 31 is installed in the
The rotating
With such a configuration, the gas sucked from the
In the above structure, the rotor blade 32 of the rotating body 31, the
(実施例1)
以下に、本発明の実施例に関し、比較例とともに説明する。
直径40mm、長さ3mmの円盤状のアルミニウム合金鋳物(AC4A)材を、室温下で、水酸化カリウム1g/L、メタケイ酸ナトリウム2g/L及びリン酸三ナトリウム3g/Lの(0.1%水酸化カリウム、0.1%メタけい酸ナトリウム、0.3%りん酸三ナトリウム)電解液に入れ、50Hz交直重畳波形定電流モードでマイクロアーク酸化処理を行い、部材表面に膜厚約15μmの酸化皮膜を成長させた。Example 1
Hereinafter, examples of the present invention will be described together with comparative examples.
A disc-shaped aluminum alloy casting (AC4A) material having a diameter of 40 mm and a length of 3 mm is made at room temperature with potassium hydroxide 1 g / L, sodium metasilicate 2 g / L and trisodium phosphate 3 g / L (0.1% hydroxide). (Potassium, 0.1% sodium metasilicate, 0.3% trisodium phosphate) in an electrolytic solution and microarc oxidation treatment was performed in a 50 Hz AC / DC superimposed waveform constant current mode to grow an oxide film with a thickness of about 15 μm on the surface of the member. .
(実施例2)
図1の構造のドライポンプ(最大排気速度が1.72×10-2m3/s(50Hz))を構成する、アルミニウム合金鋳物製のローター8〜12、ローター室4、筐体1、吸気口2及び排気口3の表面を実施例1と同様にマイクロアーク酸化処理を行い、部材表面に膜厚約12μmの酸化皮膜を成長させた。尚、処理を行わない部分、即ち、鉄心のローターシャフト部6及びノックピン部は、それぞれ、シリコンシーラー及びシリコンゴム栓によりマスキングを行った。
上記処理の終了後に各部材からドライポンプを組み立てた。(Example 2)
A
A dry pump was assembled from each member after the above treatment.
(比較例1)
実施例1と同じアルミニウム合金鋳物製の部材に対して、20質量%の硫酸溶液を用いてアルマイト処理を行い、部材表面に膜厚約20μmのアルマイト皮膜を成長させた。その後、沸騰水に20分間浸漬して封孔処理を行った。(Comparative Example 1)
The same aluminum alloy casting member as in Example 1 was subjected to an alumite treatment using a 20% by mass sulfuric acid solution to grow an alumite film having a thickness of about 20 μm on the surface of the member. Then, the sealing process was performed by immersing in boiling water for 20 minutes.
(比較例2)
実施例2と同じアルミニウム合金鋳物製の部材に対して、比較例1と同じ処理を行った。(Comparative Example 2)
The same treatment as in Comparative Example 1 was performed on the same aluminum alloy casting member as in Example 2.
(比較試験1)
実施例1及比較例1の部材の室温下でのガス放出特性を測定した結果を図3のグラフに示す。グラフ縦軸は、単位面積当たりのガス放出量(Pa・m・s-1)、横軸は時間(時間)を示す。
このグラフから、比較例1に対して実施例1では、単位面積当たりのガス放出量が約1/100となることがわかった。(Comparative test 1)
FIG. 3 is a graph showing the results of measuring the gas release characteristics of the members of Example 1 and Comparative Example 1 at room temperature. The vertical axis of the graph represents the amount of gas released per unit area (Pa · m · s −1 ), and the horizontal axis represents time (hours).
From this graph, it was found that in Example 1, the amount of gas released per unit area was about 1/100 compared to Comparative Example 1.
(比較試験2)
実施例1及び比較例1の部材のそれぞれに対して、120℃の大気下で30分間の加熱を3回行った後、各部材の表面SEM画像を図4に示す。
図4から実施例1は、加熱前後で皮膜形態は変化が見られず、比較例2では、加熱後にクラックが入ることがわかった。(Comparative test 2)
Each of the members of Example 1 and Comparative Example 1 was subjected to heating for 30 minutes in an atmosphere of 120 ° C. three times, and then a surface SEM image of each member is shown in FIG.
From FIG. 4, it was found that Example 1 showed no change in film form before and after heating, and Comparative Example 2 showed that cracks occurred after heating.
(比較試験3)
実施例1及び比較例1の部材のそれぞれを、35〜38質量%の濃塩酸に浸漬して、激しく発泡するまでの時間を測定した結果を図5のグラフに示す。グラフ縦軸は、時間(分)であり、横軸は膜厚(μm)である。
グラフから比較例1に対して、実施例1は約2.5倍の耐食性を有することがわかった。また、大気加熱(比較試験2と同じ)後では、実施例1は耐食性がほぼ変化せず、比較例1は耐食性がないものとなった。比較例1は、皮膜にクラックが生じて、母材の表面が露出したことによるものと考えられる。(Comparative test 3)
The results of measuring the time until each of the members of Example 1 and Comparative Example 1 was immersed in 35 to 38 mass% concentrated hydrochloric acid and foamed vigorously are shown in the graph of FIG. The vertical axis of the graph is time (minutes), and the horizontal axis is the film thickness (μm).
From the graph, it was found that Example 1 has a corrosion resistance of about 2.5 times that of Comparative Example 1. Moreover, after atmospheric heating (same as the comparative test 2), the corrosion resistance of Example 1 hardly changed, and Comparative Example 1 had no corrosion resistance. In Comparative Example 1, it is considered that cracks occurred in the film and the surface of the base material was exposed.
(比較試験4)
実施例2及び比較例2のドライポンプを使用して、1m3のチャンバーを排気した時のチャンバー内の圧力の時間変化を図6に示す。
グラフから実施例2及び比較例2のドライポンプを使用し、チャンバー内圧力が102Pa以上では、両例とも大差はないが、102Pa未満になると実施例2のドライポンプで排気した方が圧力の時間変化量が大きくなった。また、到達圧力も2.5倍程度高くなった。(Comparative test 4)
FIG. 6 shows the time change of the pressure in the chamber when the 1 m 3 chamber was evacuated using the dry pumps of Example 2 and Comparative Example 2.
From the graph, when the dry pumps of Example 2 and Comparative Example 2 were used and the pressure in the chamber was 10 2 Pa or higher, there was not much difference between both cases, but when the pressure was less than 10 2 Pa, the air was exhausted by the dry pump of Example 2 However, the amount of pressure change over time increased. In addition, the ultimate pressure was increased about 2.5 times.
(実施例3)
直径40mm、長さ3mmの円盤状のアルミニウム材を、室温下で、水酸化カリウム1g/L、メタケイ酸ナトリウム2g/L及びリン酸三ナトリウム3g/Lの電解液に入れ、50Hz交直重畳波形定電流モードでマイクロアーク酸化処理を行い、部材表面に膜厚約15μmの酸化皮膜を成長させた。(Example 3)
A disc-shaped aluminum material having a diameter of 40 mm and a length of 3 mm is placed in an electrolytic solution of potassium hydroxide 1 g / L, sodium metasilicate 2 g / L and trisodium phosphate 3 g / L at room temperature, and a 50 Hz AC / DC superimposed waveform setting is performed. Micro-arc oxidation treatment was performed in the current mode, and an oxide film having a thickness of about 15 μm was grown on the surface of the member.
(比較例3)
実施例3で使用した部材に対して、部材表面に処理を施さないものとした。(Comparative Example 3)
The member used in Example 3 was not subjected to treatment on the member surface.
(比較試験5)
実施例3及び比較例3の部材のGaに対する耐食性を比較するために、Ga雰囲気(気体)とすることは困難であるため、各部材の温度を100℃程度に加熱した状態で、液体状のGaを各部材に擦りつけ、60時間スライドガラスで上から押さえて密着させた後の各部材の表面SEM画像を図7に示す。実施例3の部材表面に腐食等は見られず、比較例3の部材そのものとGaが接触し、Alを腐食させていると考えられる。(Comparative test 5)
In order to compare the corrosion resistance of the members of Example 3 and Comparative Example 3 against Ga, it is difficult to obtain a Ga atmosphere (gas). Therefore, in a state where the temperature of each member is heated to about 100 ° C., the liquid state FIG. 7 shows a surface SEM image of each member after the Ga was rubbed against each member and pressed with a slide glass from the top for 60 hours to be adhered. No corrosion or the like is observed on the surface of the member of Example 3, and it is considered that Ga is in contact with the member of Comparative Example 3 and corrodes Al.
本発明は、アルミニウム又はアルミニウム合金を母材としてメカニカルブースターポンプ、ターボ分子ポンプ又はドライポンプを構成される部品に対して耐食性を付与する上で産業上の利用可能性を有する。 INDUSTRIAL APPLICABILITY The present invention has industrial applicability in imparting corrosion resistance to components constituting a mechanical booster pump, a turbo molecular pump, or a dry pump using aluminum or an aluminum alloy as a base material.
1 筐体
2 吸気口
3 排気口
4 ローター室
5 モーター
6 回転軸
7〜12 ローター
13 加熱手段
14 ガスバラスト
15 軸シールガス導入路
21 ケーシング
21a 上側ケーシング(上流部)
21b 下側ケーシング(下流部)
22 吸気口
23 排気口
24 静止体
25 静翼
26 ステータ
28 スペーサ
29c 磁気軸受
30 ポンプ機構
31 回転体
32 動翼
33 ねじ溝部
34 回転軸
41 放熱板
HI 断熱部材
Ht ヒータ
T トラップ部材DESCRIPTION OF
21b Lower casing (downstream part)
22
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PCT/JP2010/002576 WO2010116747A1 (en) | 2009-04-10 | 2010-04-08 | Surface-treatment method for components of mechanical booster pumps, turbomolecular pumps, or dry pumps, as well as mechanical booster pump, turbomolecular pump, or dry pump treated with said surface-treatment method |
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JP6398337B2 (en) * | 2014-06-04 | 2018-10-03 | 株式会社島津製作所 | Turbo molecular pump |
FR3025842B1 (en) | 2014-09-17 | 2019-04-05 | Liebherr-Aerospace Toulouse Sas | COMPRESSION DEVICE AND SPIRAL COMPRESSOR USING SUCH A COMPRESSION DEVICE |
CN104404596A (en) * | 2014-12-16 | 2015-03-11 | 常熟市东方特种金属材料厂 | Abrasion-resistant aluminum alloy |
JP2016156036A (en) * | 2015-02-23 | 2016-09-01 | 株式会社栗本鐵工所 | Coating formation method |
EP4361449A1 (en) * | 2024-02-29 | 2024-05-01 | Pfeiffer Vacuum Technology AG | Vacuum pump |
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JP2006528279A (en) * | 2003-07-23 | 2006-12-14 | ザ ビーオーシー グループ ピーエルシー | coating |
JP2008088506A (en) * | 2006-10-02 | 2008-04-17 | Ulvac Japan Ltd | Surface treatment method for aluminum material |
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TWI467060B (en) | 2015-01-01 |
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WO2010116747A1 (en) | 2010-10-14 |
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