JP5396049B2 - 発光素子及びその製造方法 - Google Patents
発光素子及びその製造方法 Download PDFInfo
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- JP5396049B2 JP5396049B2 JP2008254167A JP2008254167A JP5396049B2 JP 5396049 B2 JP5396049 B2 JP 5396049B2 JP 2008254167 A JP2008254167 A JP 2008254167A JP 2008254167 A JP2008254167 A JP 2008254167A JP 5396049 B2 JP5396049 B2 JP 5396049B2
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- light emitting
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- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000004065 semiconductor Substances 0.000 claims description 100
- 238000000034 method Methods 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 212
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 6
- 229910052733 gallium Inorganic materials 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- RGGPNXQUMRMPRA-UHFFFAOYSA-N triethylgallium Chemical compound CC[Ga](CC)CC RGGPNXQUMRMPRA-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- HDZGCSFEDULWCS-UHFFFAOYSA-N monomethylhydrazine Chemical compound CNN HDZGCSFEDULWCS-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 2
- OTRPZROOJRIMKW-UHFFFAOYSA-N triethylindigane Chemical compound CC[In](CC)CC OTRPZROOJRIMKW-UHFFFAOYSA-N 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- -1 GaN Chemical class 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910010199 LiAl Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- CXNFERZVFRNSPE-UHFFFAOYSA-N alumane N,N-dimethylethanamine Chemical compound [H][Al]([H])[H].CCN(C)C CXNFERZVFRNSPE-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Description
本発明の他の目的は、P型半導体層と活性層をエッチングしてN型半導体層を露出させた網目構造トレンチを形成し、同トレンチに充填されるとともにN型半導体層上に形成される電極と接続される導電層を形成して、電流の均一な拡散を可能にする発光素子及びその製造方法を提供することにある。
さらにまた、本発明による発光素子は、同導電層と同透明電極との間に形成された第2の絶縁層をさらに備えている。
本発明の他の様態による発光素子の製造方法は、基板の上部にN型半導体層、活性層及びP型半導体層をこの順に形成するステップと、同P型半導体層及び活性層をエッチングして同N型半導体層を露出させる網目構造トレンチを形成するステップと、同トレンチに充填された導電層を形成するステップと、を備えている。
本発明による発光素子の製造方法は、同第2の絶縁層を形成した後、同P型半導体層の上部に透明電極を形成するステップと、同透明電極の上部に第2の電極を形成するステップと、をさらに備えている。
図5A乃至図5Dは、本発明の一実施形態による発光素子の製造方法における工程手順を示す断面図であり、図6は、本発明の一実施形態による発光素子の製造方法において感光膜が形成された状態の平面図である。
Claims (9)
- 基板と、前記基板の上部に順次形成されたN型半導体層、活性層及びP型半導体層と、を有する発光素子において、
前記P型半導体層、前記活性層及び少なくとも前記N型半導体層の内部まで形成された少なくとも一つのトレンチと、
前記トレンチの側壁に形成された第1の絶縁層と、
前記第1の絶縁層が形成された前記トレンチの内部に充填される導電層と、
前記P型半導体層の上部に形成された透明導電酸化物である透明電極と、
前記導電層と電気的に接続されるとともに前記N型半導体層の上部に形成された第1の電極と、
前記透明電極の上部に形成された第2の電極と、
前記導電層と前記透明電極との間に形成された第2の絶縁層と、
を備える発光素子。 - 前記P型半導体層の少なくとも一部が露出されるように前記透明電極の少なくとも一部が除去され、前記第2の電極が前記露出されたP型電極と接するように形成されている請求項1に記載の発光素子。
- 前記トレンチは網目構造に形成されている請求項1に記載の発光素子。
- 前記トレンチは、間隔の方が幅よりも広く形成されている請求項1に記載の発光素子。
- 基板の上部にN型半導体層、活性層及びP型半導体層をこの順にて形成するステップと、
前記P型半導体層及び前記活性層をエッチングして前記N型半導体層を露出させた網目構造のトレンチを形成するステップと、
前記トレンチの側壁に第1の絶縁層を形成するステップと、
前記トレンチに充填された導電層を形成するステップと、
前記導電層を形成した後に同導電層の上部に第2の絶縁層を形成するステップと、
前記第2の絶縁層を形成後、前記P型半導体層の上部に透明導電酸化物である透明電極を形成するステップと、
を含む発光素子の製造方法。 - 前記網目構造のトレンチと同時に前記N型半導体層を露出させる孔をさらに形成する、請求項5に記載の発光素子の製造方法。
- 前記孔内の前記N型半導体層の上部に第1の電極を形成するステップをさらに含む、請求項6に記載の発光素子の製造方法。
- 前記透明電極の上部に第2の電極を形成するステップをさらに含む、請求項5に記載の発光素子の製造方法。
- 前記第2の電極を形成する前に前記P型半導体層の一部が露出されるように前記透明電極の少なくとも一部を除去するステップをさらに含み、露出されたP型半導体層と接するように前記第2の電極が形成される、請求項8に記載の発光素子の製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2008-0057791 | 2008-06-19 | ||
KR20080057791A KR101478339B1 (ko) | 2008-06-19 | 2008-06-19 | 발광 소자 및 그 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010004005A JP2010004005A (ja) | 2010-01-07 |
JP5396049B2 true JP5396049B2 (ja) | 2014-01-22 |
Family
ID=41430296
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008254167A Expired - Fee Related JP5396049B2 (ja) | 2008-06-19 | 2008-09-30 | 発光素子及びその製造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US8390002B2 (ja) |
JP (1) | JP5396049B2 (ja) |
KR (1) | KR101478339B1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101028206B1 (ko) | 2010-04-08 | 2011-04-11 | 엘지이노텍 주식회사 | 발광소자, 발광소자의 제조방법 및 발광소자 패키지 |
CN102810613B (zh) * | 2011-05-30 | 2016-04-13 | 比亚迪股份有限公司 | 电流扩散电极、半导体发光器件及其制备方法 |
KR20170028082A (ko) * | 2015-09-03 | 2017-03-13 | 삼성전자주식회사 | 반도체 발광소자 및 제조방법 |
CN109599410B (zh) * | 2018-12-03 | 2021-03-26 | 中国科学院半导体研究所 | 调制带宽增强的可见光通信光源及其制备方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5779924A (en) * | 1996-03-22 | 1998-07-14 | Hewlett-Packard Company | Ordered interface texturing for a light emitting device |
US6037612A (en) | 1997-09-11 | 2000-03-14 | Kokusai Denshin Denwa Kabushiki Kaisha | Semiconductor light emitting device having nanostructure porous silicon and mesostructure porous silicon |
JP3490903B2 (ja) * | 1997-09-11 | 2004-01-26 | Kddi株式会社 | 半導体発光素子およびその製造方法 |
JP3576859B2 (ja) * | 1999-03-19 | 2004-10-13 | 株式会社東芝 | 発光装置及びそれを用いたシステム |
US7083993B2 (en) * | 2003-04-15 | 2006-08-01 | Luminus Devices, Inc. | Methods of making multi-layer light emitting devices |
JP4755901B2 (ja) | 2003-08-08 | 2011-08-24 | サンキュウ カン | 高輝度の窒化物マイクロ発光ダイオード及びその製造方法 |
US6958494B2 (en) * | 2003-08-14 | 2005-10-25 | Dicon Fiberoptics, Inc. | Light emitting diodes with current spreading layer |
KR100597166B1 (ko) | 2005-05-03 | 2006-07-04 | 삼성전기주식회사 | 플립 칩 발광다이오드 및 그 제조방법 |
US20070158661A1 (en) * | 2006-01-12 | 2007-07-12 | Rutgers, The State University Of New Jersey | ZnO nanostructure-based light emitting device |
JP2007214260A (ja) * | 2006-02-08 | 2007-08-23 | Matsushita Electric Ind Co Ltd | 半導体発光素子およびその製造方法 |
JP4915218B2 (ja) * | 2006-11-17 | 2012-04-11 | ソニー株式会社 | 発光ダイオードの製造方法 |
-
2008
- 2008-06-19 KR KR20080057791A patent/KR101478339B1/ko active IP Right Grant
- 2008-09-30 JP JP2008254167A patent/JP5396049B2/ja not_active Expired - Fee Related
- 2008-10-15 US US12/251,735 patent/US8390002B2/en active Active
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2010
- 2010-09-15 US US12/882,449 patent/US8247244B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2010004005A (ja) | 2010-01-07 |
US20090315063A1 (en) | 2009-12-24 |
US8247244B2 (en) | 2012-08-21 |
US20110003407A1 (en) | 2011-01-06 |
KR101478339B1 (ko) | 2015-01-08 |
US8390002B2 (en) | 2013-03-05 |
KR20090131838A (ko) | 2009-12-30 |
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