JP5335671B2 - パルス・ストレッチャを有する高出力エキシマ・レーザ - Google Patents
パルス・ストレッチャを有する高出力エキシマ・レーザ Download PDFInfo
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- JP5335671B2 JP5335671B2 JP2009514318A JP2009514318A JP5335671B2 JP 5335671 B2 JP5335671 B2 JP 5335671B2 JP 2009514318 A JP2009514318 A JP 2009514318A JP 2009514318 A JP2009514318 A JP 2009514318A JP 5335671 B2 JP5335671 B2 JP 5335671B2
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- Prior art keywords
- mirror
- delay path
- optical delay
- purge
- purge gas
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Description
Claims (5)
- 高出力エキシマ又は分子状フッ素ガス放電レーザDUV光源システム
を備え、
前記光源システムはパルス・ストレッチャを備え、
前記パルス・ストレッチャは、光遅延経路ミラーと光遅延経路ミラー・ガス・パージ・アセンブリとを備え、
前記ガス・パージ・アセンブリは、
パージ・ガス供給システムと、
少なくとも1組の、前記光遅延経路ミラーの表面を横切るようにパージ・ガスを誘導するための、マニホルド出口開口部を備えるパージ・ガス・マニホルド、及びそれぞれの光遅延経路ミラーを前記遅延経路内の光ビームに曝す光透過開口部を含むガス・パージ・バッフル板と、
前記光透過開口部を取り囲むガラス板と、を備える、
ことを特徴とする装置。 - 複数の光遅延経路ミラーを含む前記光遅延経路ミラーと、
前記複数の光遅延経路ミラーの各々の表面を横切るようにパージ・ガスを誘導する前記パージ・ガス供給システムと、
をさらに備えることを特徴とする請求項1に記載の装置。 - 少なくとも1組の前記パージ・ガス・マニホルド及びガス・パージ・バッフル板について、前記ガス・パージ・バッフル板は、前記パージ・ガス・マニホルドに含まれ、上部バッフル板と下部バッフル板を含み、前記上部バッフル板と前記下部バッフル板は、互いに接合されたとき、パージ・ガス注入ラインを前記マニホルド出口開口部に接続する内部チャネルを形成することを特徴とする請求項1に記載の装置。
- 前記光遅延経路の位置合せの誤差を補正するための、光遅延経路ミラーの位置を調整するミラー位置調整機構をさらに備えることを特徴とする請求項1又は3に記載の装置。
- 前記光遅延経路に対して前記光遅延経路ミラーを移動させるための、光遅延経路筐体壁に移動可能に接続された光遅延経路ミラー取付け台を備える前記ミラー位置調整機構
をさらに含むことを特徴とする請求項4に記載の装置。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81124206P | 2006-06-05 | 2006-06-05 | |
US60/811,242 | 2006-06-05 | ||
US11/805,583 US7564888B2 (en) | 2004-05-18 | 2007-05-23 | High power excimer laser with a pulse stretcher |
US11/805,583 | 2007-05-23 | ||
PCT/US2007/013032 WO2007143145A2 (en) | 2006-06-05 | 2007-05-31 | High power excimer laser with a pulse stretcher |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009540571A JP2009540571A (ja) | 2009-11-19 |
JP2009540571A5 JP2009540571A5 (ja) | 2010-07-15 |
JP5335671B2 true JP5335671B2 (ja) | 2013-11-06 |
Family
ID=38802102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009514318A Active JP5335671B2 (ja) | 2006-06-05 | 2007-05-31 | パルス・ストレッチャを有する高出力エキシマ・レーザ |
Country Status (6)
Country | Link |
---|---|
US (1) | US7564888B2 (ja) |
EP (1) | EP2036170B1 (ja) |
JP (1) | JP5335671B2 (ja) |
KR (1) | KR101385046B1 (ja) |
TW (1) | TWI361532B (ja) |
WO (1) | WO2007143145A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102674285B1 (ko) * | 2019-10-16 | 2024-06-10 | 사이머 엘엘씨 | 스페클 감소를 위한 일련의 적층형 공초점 펄스 신장기 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8803027B2 (en) * | 2006-06-05 | 2014-08-12 | Cymer, Llc | Device and method to create a low divergence, high power laser beam for material processing applications |
US7643528B2 (en) * | 2007-09-20 | 2010-01-05 | Cymer, Inc. | Immersion lithography laser light source with pulse stretcher |
US9151940B2 (en) * | 2012-12-05 | 2015-10-06 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
JP6220879B2 (ja) | 2013-08-27 | 2017-10-25 | ギガフォトン株式会社 | 極端紫外光生成装置及び極端紫外光生成システム |
US9709897B2 (en) | 2015-10-28 | 2017-07-18 | Cymer, Llc | Polarization control of pulsed light beam |
WO2018020564A1 (ja) * | 2016-07-26 | 2018-02-01 | ギガフォトン株式会社 | レーザシステム |
CN114843868A (zh) * | 2018-04-23 | 2022-08-02 | 极光先进雷射株式会社 | 激光腔和电子器件的制造方法 |
DE102018218064B4 (de) | 2018-10-22 | 2024-01-18 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere für die Mikrolithographie |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
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US6067311A (en) | 1998-09-04 | 2000-05-23 | Cymer, Inc. | Excimer laser with pulse multiplier |
US6801560B2 (en) * | 1999-05-10 | 2004-10-05 | Cymer, Inc. | Line selected F2 two chamber laser system |
US6535531B1 (en) | 2001-11-29 | 2003-03-18 | Cymer, Inc. | Gas discharge laser with pulse multiplier |
US6507393B2 (en) * | 1999-05-12 | 2003-01-14 | John Samuel Batchelder | Surface cleaning and particle counting |
EP1234358B1 (en) * | 1999-11-30 | 2010-01-06 | Cymer, Inc. | High power gas discharge laser with helium purged line narrowing unit |
US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
US6571057B2 (en) * | 2000-03-27 | 2003-05-27 | Nikon Corporation | Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
US6904073B2 (en) * | 2001-01-29 | 2005-06-07 | Cymer, Inc. | High power deep ultraviolet laser with long life optics |
JP2002083766A (ja) * | 2000-06-19 | 2002-03-22 | Nikon Corp | 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置 |
US6704340B2 (en) | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
US7009140B2 (en) | 2001-04-18 | 2006-03-07 | Cymer, Inc. | Laser thin film poly-silicon annealing optical system |
US7167499B2 (en) | 2001-04-18 | 2007-01-23 | Tcz Pte. Ltd. | Very high energy, high stability gas discharge laser surface treatment system |
US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
JP3773858B2 (ja) * | 2002-01-30 | 2006-05-10 | 株式会社小松製作所 | 注入同期式又はmopa方式のガスレーザ装置 |
US6943886B2 (en) * | 2002-02-11 | 2005-09-13 | Air Liquide America, L.P. | Method for enhanced gas monitoring in high particle density flow streams |
US7016388B2 (en) * | 2002-05-07 | 2006-03-21 | Cymer, Inc. | Laser lithography light source with beam delivery |
US7050149B2 (en) * | 2002-06-11 | 2006-05-23 | Nikon Corporation | Exposure apparatus and exposure method |
EP1376239A3 (en) * | 2002-06-25 | 2005-06-29 | Nikon Corporation | Cooling device for an optical element |
JP2005148549A (ja) * | 2003-11-18 | 2005-06-09 | Gigaphoton Inc | 光学的パルス伸長器および露光用放電励起ガスレーザ装置 |
US7035012B2 (en) * | 2004-03-01 | 2006-04-25 | Coherent, Inc. | Optical pulse duration extender |
US7471455B2 (en) | 2005-10-28 | 2008-12-30 | Cymer, Inc. | Systems and methods for generating laser light shaped as a line beam |
US20070278193A1 (en) | 2006-06-05 | 2007-12-06 | Cymer, Inc. | Device and method to create a low divergence, high power laser beam for material processing applications |
US7369596B2 (en) | 2006-06-05 | 2008-05-06 | Cymer, Inc. | Chamber for a high energy excimer laser source |
US7433372B2 (en) | 2006-06-05 | 2008-10-07 | Cymer, Inc. | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
-
2007
- 2007-05-23 US US11/805,583 patent/US7564888B2/en not_active Expired - Lifetime
- 2007-05-31 JP JP2009514318A patent/JP5335671B2/ja active Active
- 2007-05-31 WO PCT/US2007/013032 patent/WO2007143145A2/en active Application Filing
- 2007-05-31 KR KR1020087031844A patent/KR101385046B1/ko active IP Right Grant
- 2007-05-31 TW TW096119487A patent/TWI361532B/zh active
- 2007-05-31 EP EP07815066.1A patent/EP2036170B1/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102674285B1 (ko) * | 2019-10-16 | 2024-06-10 | 사이머 엘엘씨 | 스페클 감소를 위한 일련의 적층형 공초점 펄스 신장기 |
Also Published As
Publication number | Publication date |
---|---|
JP2009540571A (ja) | 2009-11-19 |
TW200814477A (en) | 2008-03-16 |
EP2036170A2 (en) | 2009-03-18 |
TWI361532B (en) | 2012-04-01 |
EP2036170B1 (en) | 2013-08-21 |
KR101385046B1 (ko) | 2014-04-14 |
WO2007143145A2 (en) | 2007-12-13 |
KR20090020649A (ko) | 2009-02-26 |
EP2036170A4 (en) | 2012-07-04 |
WO2007143145A3 (en) | 2008-09-12 |
US7564888B2 (en) | 2009-07-21 |
US20070280308A1 (en) | 2007-12-06 |
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