JP5261845B2 - Defect correction method - Google Patents

Defect correction method Download PDF

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JP5261845B2
JP5261845B2 JP2008276581A JP2008276581A JP5261845B2 JP 5261845 B2 JP5261845 B2 JP 5261845B2 JP 2008276581 A JP2008276581 A JP 2008276581A JP 2008276581 A JP2008276581 A JP 2008276581A JP 5261845 B2 JP5261845 B2 JP 5261845B2
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defect
correction
stamp
chemical
coating film
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JP2010104865A (en
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貴文 平野
愛 中林
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V Technology Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To shorten the time for correcting defects in a wide area of a coating film, and to achieve the uniformity of the thickness of the coating film regardless of the unevenness of a substrate surface. <P>SOLUTION: In a defect correction method for correcting a defect 6 of an orientation film 3 formed on a color filter substrate 1 surface, a chemical liquid dropping step of dropping a proper amount of a correcting liquid 5 to the defect 6, and a stamp pressing step of spreading out the correcting liquid 5 by pressing the color filter substrate 1 surface with a stamp 8 elastically deformed according to the unevenness of the color filter substrate 1 surface are carried out. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

本発明は、基板面に形成された塗膜の欠陥部を修正する欠陥修正方法に関し、詳しくは、塗膜の広範囲に亘る欠陥部の修正時間を短縮すると共に、基板面の凹凸に寄らず修正薬液の塗膜厚みの均一化を可能にする欠陥修正方法に係るものである。   The present invention relates to a defect correction method for correcting a defective portion of a coating film formed on a substrate surface. More specifically, the invention corrects the defect correction time over a wide area of the coating film and corrects it regardless of the unevenness of the substrate surface. The present invention relates to a defect correction method that enables uniform coating film thickness of a chemical solution.

従来の欠陥修正方法は、基板表面に形成されたパターンと同形状に形成され一面が平坦な樹脂製の小片を、平坦面を下にして針の先端部に取り付ける段階と、小片の平坦面に修正材を付着させる段階と、欠陥部を有するパターンに小片を圧接して修正材を転写させる段階と、を行うものとなっていた(例えば、特許文献1参照)。
特開2007−279513号公報
A conventional defect correction method includes a step of attaching a resin small piece formed in the same shape as the pattern formed on the substrate surface to the tip of the needle with the flat surface down, and a flat surface of the small piece. A step of attaching a correction material and a step of transferring a correction material by pressing a small piece on a pattern having a defective portion are performed (for example, see Patent Document 1).
JP 2007-279513 A

しかし、このような従来の欠陥修正方法においては、基板表面に形成されたパターンと同形状に形成された小片の下面に修正液(修正薬液)を付着させた後、この小片を欠陥パターンに圧接して修正液を転写させるようにしたものであったため、複数のパターンに跨る広範囲の欠陥部を修正するときには、小片下面への修正液の付着、小片による欠陥部への圧接、修正液の転写という一連の動作を複数回繰り返して欠陥部を修正しなければならず、欠陥の修正に長時間を要する場合があった。また、広範囲の欠陥部を複数回の転写動作により修正する場合には、修正膜厚が均一になり難いという問題もある。   However, in such a conventional defect correction method, after a correction liquid (correction chemical) is attached to the lower surface of a small piece formed in the same shape as the pattern formed on the substrate surface, the small piece is pressed against the defect pattern. Therefore, when correcting a wide range of defects across multiple patterns, the correction liquid adheres to the lower surface of the small piece, the pressure contact with the defective portion by the small piece, and the transfer of the correction liquid. Such a series of operations must be repeated a plurality of times to correct the defective portion, and it may take a long time to correct the defect. In addition, when a wide range of defective portions is corrected by a plurality of transfer operations, there is a problem that the corrected film thickness is difficult to be uniform.

さらに、上記小片は、基板面の凹凸に倣って弾性変形するものでないため、表面に凹凸のある基板の塗膜の欠陥修正においては、修正膜の膜厚を均一にするこができないという問題がある。   Furthermore, since the small piece is not elastically deformed following the unevenness of the substrate surface, there is a problem that the film thickness of the correction film cannot be made uniform in the defect correction of the coating film on the substrate having unevenness on the surface. is there.

そこで、本発明は、このような問題点に対処し、塗膜の広範囲に亘る欠陥部の修正時間を短縮すると共に、基板面の凹凸に寄らず修正薬液の塗膜厚みの均一化を可能にする欠陥修正方法を提供することを目的とする。   Therefore, the present invention addresses such problems, shortens the time required for repairing defective portions of the coating film over a wide range, and makes it possible to make the coating film thickness of the correction chemical liquid uniform regardless of the unevenness of the substrate surface. An object of the present invention is to provide a defect correction method.

上記目的を達成するために、本発明による欠陥修正方法は、基板面に形成された塗膜の欠陥部を修正する欠陥修正方法であって、予め撮像した画像に基づいて前記欠陥部の面積を算出し、該面積と塗膜の膜厚から修正液の滴下量を算出し、同量の前記修正液を前記欠陥部に滴下する薬液滴下段階と、前記基板面の凹凸に倣って押圧部が弾性変形するブロック状のスタンプにより、該スタンプの前記押圧部が前記欠陥部以外では前記塗膜の表面に接触し、前記欠陥部では前記基板の表面との間に前記塗膜の厚みに等しい隙間を形成するように前記基板面を押圧して前記修正薬液を押し広げるスタンプ押圧段階と、を行うものである。 In order to achieve the above object, a defect correction method according to the present invention is a defect correction method for correcting a defect portion of a coating film formed on a substrate surface, and the area of the defect portion is determined based on a pre-captured image. calculated, calculates the drop amount of correction fluid from the thickness of the area and the coating film, and chemical dropping step of lower drop the correction fluid of the same amount to the defective portion, the pressing portion following the unevenness of the substrate surface the block-shaped stamp but elastically deformed, by the pressing portion of the stamp than the defective portion is in contact with the surface of the coating film, wherein a defect portion equal to the thickness of the coating film between the surface of the substrate A stamp pressing step of pressing the substrate surface to spread the correction chemical so as to form a gap.

このような構成により、予め撮像した画像に基づいて前記欠陥部の面積を算出し、該面積と塗膜の膜厚から修正液の滴下量を算出し、同量の前記修正液を前記欠陥部に滴下し、基板面の凹凸に倣って押圧部が弾性変形するブロック状のスタンプにより、該スタンプの押圧部が欠陥部以外では塗膜の表面に接触し、欠陥部では基板の表面との間に塗膜の厚みに等しい隙間を形成するように基板面を押圧して修正薬液を押し広げ、塗膜の欠陥部を修正する。 With such a configuration, an area of the defect portion is calculated based on an image captured in advance, a dripping amount of the correction liquid is calculated from the area and the film thickness of the coating film, and the same amount of the correction liquid is added to the defect portion. beat drops, the block-shaped stamp pressing portion following the unevenness of the substrate surface are elastically deformed, the pressing portion of the stamp contacts the surface of the coating in the non-defective part, the defect portion of the surface of the substrate The substrate surface is pressed so that a gap equal to the thickness of the coating film is formed between them, and the correction chemical is spread to correct the defective portion of the coating film.

また、前記スタンプは、前記修正薬液に対して耐薬品性及び撥液性を有する材料で形成されたものである。これにより、修正薬液に対して耐薬品性及び撥液性を有する材料で形成したスタンプで修正薬液を押し広げる。   The stamp is made of a material having chemical resistance and liquid repellency with respect to the correction chemical. Thus, the correction chemical is spread with a stamp formed of a material having chemical resistance and liquid repellency with respect to the correction chemical.

さらに、前記材料は、フッ素樹脂又はシリコーン樹脂である。これにより、フッ素樹脂又はシリコーン樹脂から成る材料で形成したスタンプで修正薬液を押し広げる。   Further, the material is a fluororesin or a silicone resin. Thus, the correction chemical is spread with a stamp formed of a material made of fluororesin or silicone resin.

そして、前記材料は、可視光に対して透過性を有するものである。これにより、可視光に対して透過性を有する材料で形成したスタンプで修正薬液を押し広げる。   The material is transparent to visible light. As a result, the correction chemical is spread with a stamp formed of a material that is transparent to visible light.

請求項1に係る発明によれば、スタンプで基板面を押圧して修正薬液を押し広げるようにしているので、スタンプによる1回の押圧で修正薬液を広範囲に行渡らせることができ、塗膜の広範囲に亘る欠陥部の修正時間を短縮することができる。また、スタンプが基板面の凹凸に倣って弾性変形するものであるため、基板の表面の凹凸に寄らず、均一な膜厚で修正薬液を塗布することができる。   According to the first aspect of the invention, since the correction chemical is spread by pressing the substrate surface with the stamp, the correction chemical can be spread over a wide range by one press with the stamp. It is possible to reduce the time required for repairing the defect portion over a wide range. Further, since the stamp is elastically deformed following the unevenness of the substrate surface, the correction chemical solution can be applied with a uniform film thickness without depending on the unevenness of the surface of the substrate.

また、請求項2に係る発明によれば、スタンプが修正薬液に対して耐薬品性及び撥液性を有する材料で形成されているため、スタンプが修正薬液と反応して溶け出してしまったり、スタンプによる押圧を解除した際に修正薬液がスタンプの押圧面に付着して塗膜厚みが薄くなったりすることがない。   Further, according to the invention according to claim 2, since the stamp is formed of a material having chemical resistance and liquid repellency with respect to the correction chemical, the stamp reacts with the correction chemical and dissolves. When the pressing by the stamp is released, the correction chemical solution does not adhere to the pressing surface of the stamp and the coating thickness does not decrease.

さらに、請求項3に係る発明によれば、スタンプ材料がフッ素樹脂又はシリコーン樹脂であるため、スタンプを様々な修正薬液に対して耐薬品性及び撥液性を有するものとすることができる。   Further, according to the invention of claim 3, since the stamp material is a fluororesin or a silicone resin, the stamp can have chemical resistance and liquid repellency against various correction chemicals.

そして、請求項4に係る発明によれば、スタンプ材料が可視光に対して透過性を有するものであるため、スタンプ押圧段階において、顕微鏡等によりスタンプ上方からスタンプを透して修正薬液の広がり状態を観察することができる。したがって、修正薬液が欠陥部の全体に行渡ったか否かを確認することができ、欠陥修正を確実に行なうことができる。   According to the invention according to claim 4, since the stamp material is permeable to visible light, in the stamp pressing stage, the correction chemical solution spreads through the stamp from above the stamp with a microscope or the like. Can be observed. Therefore, it can be confirmed whether or not the correction chemical has spread over the entire defective portion, and the defect correction can be reliably performed.

以下、本発明の実施形態を添付図面に基づいて詳細に説明する。図1は本発明による欠陥修正方法の実施形態を断面で示す工程図であり、図2は平面で示す工程図である。この欠陥修正方法は、基板面に形成された塗膜の欠陥部を修正するもので、薬液滴下段階と、スタンプ位置付け段階と、スタンプ押圧段階と、塗膜乾燥段階とから成る。なお、以下の説明においては、基板が配向膜を有するカラーフィルタ基板1の場合について述べる。   Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an embodiment of the defect correcting method according to the present invention, and FIG. This defect correction method corrects a defective portion of a coating film formed on a substrate surface, and includes a chemical liquid drop stage, a stamp positioning stage, a stamp pressing stage, and a coating film drying stage. In the following description, the case where the substrate is the color filter substrate 1 having an alignment film will be described.

上記薬液滴下段階は、先端部に数μmの開口を有するガラス製のニードル2を使用するマイクロディスペンサーにより、カラーフィルタ基板1上の配向膜3の欠陥部(例えば、下地のカラーフィルタ膜4と配向膜3の修正薬液5との親和性の影響により修正薬液5が塗れなかった部分)6に配向膜3を形成するための修正薬液5を適量だけ滴下する。この場合、予め撮影した画像に基づいて欠陥部6の面積を算出し、この面積と配向膜3の膜厚から修正薬液5の滴下量を算出し、略同量の修正薬液5を欠陥部6に滴下する。その際、欠陥部6が図1(a)及び図2(a)に示すようにカラーフィルタ基板1の複数のピクセル7に跨るときには、欠陥部6の略中心に修正薬液5を滴下する。   In the step of lowering the drug droplet, a micro dispenser using a glass needle 2 having an opening of several μm at the tip is used to detect a defective portion of the alignment film 3 on the color filter substrate 1 (for example, alignment with the underlying color filter film 4). An appropriate amount of the correction chemical 5 for forming the alignment film 3 is dropped on the portion 6) where the correction chemical 5 has not been applied due to the influence of the affinity of the film 3 with the correction chemical 5. In this case, the area of the defect portion 6 is calculated based on a pre-captured image, the dripping amount of the correction chemical solution 5 is calculated from this area and the film thickness of the alignment film 3, and approximately the same amount of the correction chemical solution 5 is added to the defect portion 6. Dripping into. At that time, when the defective portion 6 straddles the plurality of pixels 7 of the color filter substrate 1 as shown in FIGS. 1A and 2A, the correction chemical 5 is dropped on the approximate center of the defective portion 6.

次に、スタンプ位置付け段階においては、先ず、マイクロディスペンサーのニードル2をカラーフィルタ基板1の表面領域外の退避位置に退避させると共に、カラーフィルタ基板1の表面領域外の別の退避位置に退避していたスタンプ8を移動して、図1(b)及び図2(b)に示すように欠陥部6の上方に位置付ける。ここで使用するスタンプ8は、カラーフィルタ基板1面の凹凸に倣って弾性変形し、配向膜3の修正薬液5に対して溶出しない耐薬品性及び修正薬液5をはじく撥液性を有する材料で形成されており、例えば、フッ素樹脂又はシリコーン樹脂の材料から成るものである。この場合、スタンプ材料は、可視光に対して透過性を有するものであるとよい。   Next, in the stamp positioning step, first, the needle 2 of the microdispenser is retracted to a retracted position outside the surface area of the color filter substrate 1 and retracted to another retracted position outside the surface area of the color filter substrate 1. The stamp 8 is moved and positioned above the defective portion 6 as shown in FIGS. 1 (b) and 2 (b). The stamp 8 used here is a material that is elastically deformed following the irregularities of the surface of the color filter substrate 1 and has chemical resistance that does not elute to the correction chemical solution 5 of the alignment film 3 and liquid repellency that repels the correction chemical solution 5. For example, it is made of a fluororesin or silicone resin material. In this case, the stamp material is preferably transparent to visible light.

スタンプ8が欠陥部6の上方に位置付けられると、スタンプ押圧段階に移る。このスタンプ押圧段階においては、スタンプ8を下降して所定の押圧力で修正薬液5を押しつぶすように基板面を押圧して、図1(c)及び図2(c)に示すように、修正薬液5を押し広げる。これにより、修正薬液5は、欠陥部6のピクセル7を含んでその周辺の複数のピクセル7にまで広がって行く。このとき、スタンプ8の基板面に接触する押圧部8aは、カラーフィルタ基板1面のピクセル7の凹凸に倣って弾性変形する。したがって、スタンプ8は、欠陥部6以外では、下地の配向膜3の表面に接触し、欠陥部6おいては、下地のカラーフィルタ膜4の表面と押圧部8aとの間に配向膜3の厚みと略等しい隙間を形成することになる。そして、この隙間には修正薬液5が残るため、欠陥部6に所定の厚みの配向膜3の修正薬液5を塗布することができる。なお、本実施形態においては、欠陥部6に滴下された修正薬液5をスタンプ8により圧着塗布するようにしているため、修正薬液5と下地膜のカラーフィルタ膜4との親和性の良否に寄らず、修正薬液5の均一な塗膜を得ることができる。ここで、スタンプ8は、カラーフィルタ基板1面を押圧した状態で前後左右に微動させてもよい。これにより、塗膜の厚みをより均一化することができる。   When the stamp 8 is positioned above the defective portion 6, the stamp pressing stage is started. In this stamp pressing stage, the stamp 8 is lowered to press the substrate surface so as to crush the correcting chemical 5 with a predetermined pressing force, and as shown in FIGS. 1 (c) and 2 (c), the correcting chemical is used. Push 5 out. As a result, the correction chemical 5 spreads to a plurality of peripheral pixels 7 including the pixel 7 of the defect portion 6. At this time, the pressing portion 8 a that contacts the substrate surface of the stamp 8 is elastically deformed following the unevenness of the pixels 7 on the surface of the color filter substrate 1. Therefore, the stamp 8 is in contact with the surface of the underlying alignment film 3 except for the defect portion 6, and in the defect portion 6, the alignment film 3 is interposed between the surface of the underlying color filter film 4 and the pressing portion 8 a. A gap substantially equal to the thickness is formed. And since the correction chemical | medical solution 5 remains in this clearance gap, the correction chemical | medical solution 5 of the alignment film 3 of predetermined thickness can be apply | coated to the defect part 6. FIG. In the present embodiment, the correction chemical solution 5 dropped onto the defective portion 6 is applied by pressure bonding with the stamp 8, so that the affinity between the correction chemical solution 5 and the color filter film 4 of the underlying film is good. Therefore, a uniform coating film of the correction chemical solution 5 can be obtained. Here, the stamp 8 may be finely moved back and forth and left and right while pressing the surface of the color filter substrate 1. Thereby, the thickness of a coating film can be made more uniform.

欠陥部6に配向膜3の修正薬液5が塗布されると、塗膜乾燥段階に移る。この塗膜乾燥段階においては、スタンプ8をカラーフィルタ基板1の表面領域外に退避させた後、塗布された修正薬液5を乾燥させる。この場合、修正薬液5が熱硬化性の材料であるときには、所定の温度で所定時間加熱して修正薬液5を乾燥し、硬化させる。また、修正薬液5が紫外線硬化性の材料であるときには、所定量の紫外線を照射して修正薬液5を硬化させる。これにより、図1(d)及び図2(d)に示すように、欠陥部6に所定厚みの配向膜3が形成される。   When the correction chemical solution 5 for the alignment film 3 is applied to the defect portion 6, the coating film drying stage is started. In this coating film drying stage, the stamp 8 is moved out of the surface area of the color filter substrate 1 and then the applied correction chemical 5 is dried. In this case, when the correction chemical liquid 5 is a thermosetting material, the correction chemical liquid 5 is dried and cured by heating at a predetermined temperature for a predetermined time. Further, when the correction chemical 5 is an ultraviolet curable material, the correction chemical 5 is cured by irradiating a predetermined amount of ultraviolet rays. Thereby, as shown in FIGS. 1D and 2D, the alignment film 3 having a predetermined thickness is formed in the defect portion 6.

なお、図1及び図2において、符号9は、透明基板を示し、符号10は、ブラックマトリクスを示す。   1 and 2, reference numeral 9 indicates a transparent substrate, and reference numeral 10 indicates a black matrix.

以上の説明においては、スタンプ8をカラーフィルタ基板1面から離した状態で修正薬液5を乾燥硬化させる場合について述べたが、本発明はこれに限られず、スタンプ8でカラーフィルタ基板1面を押圧させた状態で修正薬液5を乾燥硬化させてもよい。   In the above description, the case where the correction chemical 5 is dried and cured while the stamp 8 is separated from the surface of the color filter substrate 1 is described. However, the present invention is not limited to this, and the stamp 8 presses the surface of the color filter substrate 1. You may dry-harden the correction chemical | medical solution 5 in the made state.

また、上記実施形態においては、複数の欠陥ピクセル7が隣接して存在する場合について説明したが、本発明はこれに限られず、複数の欠陥ピクセル7が所定範囲内に離れて存在していてもよい。この場合、各欠陥ピクセル7に対して修正薬液5を滴下し、一つのスタンプ8で同時に押圧して複数の欠陥部6を一度に修正するとよい。   In the above embodiment, the case where a plurality of defective pixels 7 exist adjacent to each other has been described. However, the present invention is not limited to this, and the plurality of defective pixels 7 may exist apart from each other within a predetermined range. Good. In this case, the correction chemical 5 may be dropped on each defective pixel 7 and simultaneously pressed with one stamp 8 to correct a plurality of defective portions 6 at a time.

さらに、上記実施形態においては、カラーフィルタ基板1の配向膜3の欠陥修正について説明したが、本発明はこれに限られず、カラーフィルタ基板1のカラーフィルタ膜4の欠陥修正、その他様々な塗膜の欠陥修正に適用することができる。   Furthermore, in the above embodiment, the defect correction of the alignment film 3 of the color filter substrate 1 has been described. However, the present invention is not limited to this, and the defect correction of the color filter film 4 of the color filter substrate 1 and various other coating films are performed. It can be applied to defect correction.

本発明による欠陥修正方法の実施形態を断面で示す工程図である。It is process drawing which shows embodiment of the defect correction method by this invention in a cross section. 本発明による欠陥修正方法の実施形態を平面で示す工程図である。It is process drawing which shows embodiment of the defect correction method by this invention by a plane.

符号の説明Explanation of symbols

1…カラーフィルタ基板
3…配向膜(塗膜)
5…修正薬液
6…欠陥部
8…スタンプ
8a…押圧部
1. Color filter substrate 3. Orientation film (coating film)
5 ... Correction chemical 6 ... Defect 8 ... Stamp
8a ... Pressing part

Claims (4)

基板面に形成された塗膜の欠陥部を修正する欠陥修正方法であって、
予め撮像した画像に基づいて前記欠陥部の面積を算出し、該面積と塗膜の膜厚から修正液の滴下量を算出し、同量の前記修正液を前記欠陥部に滴下する薬液滴下段階と、
前記基板面の凹凸に倣って押圧部が弾性変形するブロック状のスタンプにより、該スタンプの前記押圧部が前記欠陥部以外では前記塗膜の表面に接触し、前記欠陥部では前記基板の表面との間に前記塗膜の厚みに等しい隙間を形成するように前記基板面を押圧して前記修正薬液を押し広げるスタンプ押圧段階と、
を行うことを特徴とする欠陥修正方法。
A defect correction method for correcting a defective portion of a coating film formed on a substrate surface,
Calculating the area of the defect portion, based on the previously captured image, chemical dropwise to calculating the dropping amount of correction fluid from the thickness of the area and the coating film, to drop below the correction fluid of the same amount to the defect Stages,
The block-shaped stamp pressing portion is elastically deformed according to unevenness of the substrate surface, and by the pressing portion of the stamp than the defective portion is the contact with the surface of the coating film, wherein a defect portion surface of said substrate A stamp pressing step that presses the substrate surface to spread the correction chemical solution so as to form a gap equal to the thickness of the coating film between
A defect correcting method characterized in that:
前記スタンプは、前記修正薬液に対して耐薬品性及び撥液性を有する材料で形成されたことを特徴とする請求項1記載の欠陥修正方法。   The defect correction method according to claim 1, wherein the stamp is formed of a material having chemical resistance and liquid repellency with respect to the correction chemical. 前記材料は、フッ素樹脂又はシリコーン樹脂であることを特徴とする請求項2記載の欠陥修正方法。   The defect correction method according to claim 2, wherein the material is a fluororesin or a silicone resin. 前記材料は、可視光に対して透過性を有するものであることを特徴とする請求項2又は3記載の欠陥修正方法。   The defect correction method according to claim 2, wherein the material is transparent to visible light.
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