JP5220467B2 - 電子部品を冷却するための熱ペースト及び方法 - Google Patents
電子部品を冷却するための熱ペースト及び方法 Download PDFInfo
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- JP5220467B2 JP5220467B2 JP2008108110A JP2008108110A JP5220467B2 JP 5220467 B2 JP5220467 B2 JP 5220467B2 JP 2008108110 A JP2008108110 A JP 2008108110A JP 2008108110 A JP2008108110 A JP 2008108110A JP 5220467 B2 JP5220467 B2 JP 5220467B2
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- 238000001816 cooling Methods 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 8
- 239000000203 mixture Substances 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 49
- 239000004020 conductor Substances 0.000 claims description 39
- 239000002245 particle Substances 0.000 claims description 27
- 239000007788 liquid Substances 0.000 claims description 17
- 239000002270 dispersing agent Substances 0.000 claims description 14
- 239000002470 thermal conductor Substances 0.000 claims description 12
- 239000003963 antioxidant agent Substances 0.000 claims description 10
- 230000003078 antioxidant effect Effects 0.000 claims description 7
- 239000011231 conductive filler Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 description 12
- 239000007787 solid Substances 0.000 description 6
- 238000012546 transfer Methods 0.000 description 5
- 238000009472 formulation Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 238000012856 packing Methods 0.000 description 3
- 238000005191 phase separation Methods 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- AUVPWTYQZMLSKY-UHFFFAOYSA-N boron;vanadium Chemical compound [V]#B AUVPWTYQZMLSKY-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- -1 fatty acid esters Chemical class 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229940114072 12-hydroxystearic acid Drugs 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- ULQISTXYYBZJSJ-UHFFFAOYSA-N R-12-HOA Natural products CCCCCCC(O)CCCCCCCCCCC(O)=O ULQISTXYYBZJSJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002199 base oil Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229920013639 polyalphaolefin Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Lubricants (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Description
約30から70容量%まで、好ましくは53から58容量%までのA容量%の量の、約5から20ミクロンまで、好ましくは10から15ミクロンまでの粒径範囲を有する第1の熱導体材料と、
約5から35容量%まで、好ましくは18から23容量%までのB容量%の量の、約0.5から10ミクロンまで、好ましくは3.0から7.5ミクロンまでの粒径範囲を有する第2の熱導体材料と、
約10から50容量%まで、好ましくは21から26容量%のC容量%の量の、約0.05から2ミクロンまで、好ましくは0.3から0.5ミクロンまでの粒径範囲を有する第3の熱導体材料と、
を含み、A、B及びCは、A+B+C≦100の関係を満たし、
第1の熱導体材料と第2の熱導体材料と前記第3の熱導体材料とは、
第1の熱導体材料対第2の熱導体材料が約1:2から10:1まで、好ましくは1:1から6:1まで、最も好ましくは1.2:1から5:1まで、
第1の熱導体材料対第3の熱導体材料が約1:4から6:1まで、好ましくは1:1から4:1まで、最も好ましくは1:1から3.2:1まで、且つ
第2の熱導体材料対第3の熱導体材料が約1:4から7:2まで、好ましくは1:4から1.5:1、最も好ましくは1:4から1.2:1まで
の粒子容量比率で混合物中に存在する。
約45から95容量%まで、好ましくは70から75容量%までのD容量%の量の、約5から20ミクロンまで、好ましくは10から15ミクロンまでの粒径を有する第1の熱導体材料と、
約5容量%から55容量%まで、好ましくは25から30容量%までのE容量%の量の、約0.05から2ミクロンまで、好ましくは0.3から0.5ミクロンまでの粒径を有する第2の熱導体材料と、
を含み、D及びEは、D+E≦100の関係を満たし、
第1の熱導体材料と前記第2の熱導体材料とは、
第1の導体材料対第2の導体材料が約1:2から4:1まで、好ましくは1:1から3:1まで、最も好ましくは1:1から2.3:1まで
の粒子容量比率で混合物中に存在する。
冷却する電子部品を準備するステップと、
電子部品の近傍に冷却手段を設けるステップと、
本発明の熱伝導性ペーストの層を電子部品の表面と冷却手段の表面に塗布し、電子部品と冷却手段の表面との間に熱ペーストの接続を設けるステップとを含む。
Claims (2)
- 熱伝導性製品を作るために有用な高い熱伝導率を有する熱伝導性充填材混合物を含む、電子部品を冷却するための熱ペーストであって、
前記熱伝導性充填材混合物は、
53容量%から58容量%までのA容量%の量の、10〜15ミクロンまでの粒径範囲を有する第1の熱導体材料と、
18容量%から23容量%までのB容量%の量の、3.0〜7.5ミクロンまでの粒径範囲を有する第2の熱導体材料と、
21容量%から26容量%までのC容量%の量の、0.3〜0.5ミクロンまでの粒径範囲を有する第3の熱導体材料と、を含み、
前記第1の熱導体材料と前記第2の熱導体材料と前記第3の熱導体材料とが、
第1の熱導体材料対第2の熱導体材料が1.2:1から5:1まで、
第1の熱導体材料対第3の熱導体材料が1:1から3.2:1まで、且つ
第2の熱導体材料対第3の熱導体材料が1:4から1.2:1まで、の粒子容量比率で前記混合物中に存在し、
前記熱ペーストは、
90〜96重量%の前記熱伝導性充填材混合物に加えて、4〜10重量%の分散剤、酸化防止剤、及び液体担体を含み、さらに、
6〜9W/mKの熱伝導率を有し、110℃における粘度が80から280Pa・秒である、熱ペースト。 - 電子部品を冷却する方法であって、
冷却する電子部品を準備するステップと、
前記電子部品の近傍に冷却手段を設けるステップと、
熱ペーストの層を前記電子部品の表面と前記冷却手段の表面に塗布して前記電子部品と前記冷却手段の表面との間に熱ペーストの接続を設けるステップとを含み、
前記熱ペーストは、
90〜96重量%の熱伝導性充填材混合物と、4〜10重量%の分散剤、酸化防止剤、及び液体担体とを含み、6〜9W/mKの熱伝導率を有し、110℃における粘度が80から280Pa・秒であり、
前記熱伝導性充填材混合物は、
53容量%から58容量%までのA容量%の量の、10〜15ミクロンまでの粒径範囲を有する第1の熱導体材料と、
18容量%から23容量%までのB容量%の量の、3.0〜7.5ミクロンまでの粒径範囲を有する第2の熱導体材料と、
21容量%から26容量%までのC容量%の量の、0.3〜0.5ミクロンまでの粒径範囲を有する第3の熱導体材料と、を含み、
前記第1の熱導体材料と前記第2の熱導体材料と前記第3の熱導体材料とが、
第1の熱導体材料対第2の熱導体材料が1.2:1から5:1まで、
第1の熱導体材料対第3の熱導体材料が1:1から3.2:1まで、且つ
第2の熱導体材料対第3の熱導体材料が1:4から1.2:1まで、の粒子容量比率で前記混合物中に存在する、方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/739701 | 2007-04-25 | ||
US11/739,701 US7462294B2 (en) | 2007-04-25 | 2007-04-25 | Enhanced thermal conducting formulations |
Publications (2)
Publication Number | Publication Date |
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JP2008277813A JP2008277813A (ja) | 2008-11-13 |
JP5220467B2 true JP5220467B2 (ja) | 2013-06-26 |
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JP2008108110A Expired - Fee Related JP5220467B2 (ja) | 2007-04-25 | 2008-04-17 | 電子部品を冷却するための熱ペースト及び方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7462294B2 (ja) |
JP (1) | JP5220467B2 (ja) |
CN (1) | CN101294065B (ja) |
TW (1) | TW200908257A (ja) |
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US20050038183A1 (en) * | 2003-08-14 | 2005-02-17 | Dongchan Ahn | Silicones having improved surface properties and curable silicone compositions for preparing the silicones |
JP2005226007A (ja) * | 2004-02-13 | 2005-08-25 | Three M Innovative Properties Co | 難燃性アクリル系熱伝導性シート |
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JP2005330426A (ja) * | 2004-05-21 | 2005-12-02 | Shin Etsu Chem Co Ltd | 放熱用シリコーングリース組成物 |
US20060228542A1 (en) * | 2005-04-08 | 2006-10-12 | Saint-Gobain Performance Plastics Corporation | Thermal interface material having spheroidal particulate filler |
EP1839469A2 (en) * | 2005-11-01 | 2007-10-03 | Techfilm, LLC | Thermal interface material with multiple size distribution thermally conductive fillers |
CN1986643B (zh) * | 2005-12-23 | 2010-05-12 | 富准精密工业(深圳)有限公司 | 硅脂组合物 |
JP2007277387A (ja) * | 2006-04-06 | 2007-10-25 | Shin Etsu Chem Co Ltd | 熱伝導性シリコーングリース組成物 |
US7462294B2 (en) * | 2007-04-25 | 2008-12-09 | International Business Machines Corporation | Enhanced thermal conducting formulations |
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2007
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2008
- 2008-04-10 TW TW097113093A patent/TW200908257A/zh unknown
- 2008-04-17 JP JP2008108110A patent/JP5220467B2/ja not_active Expired - Fee Related
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Publication number | Publication date |
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US20080266809A1 (en) | 2008-10-30 |
US7641811B2 (en) | 2010-01-05 |
TW200908257A (en) | 2009-02-16 |
US20080311381A1 (en) | 2008-12-18 |
US7462294B2 (en) | 2008-12-09 |
CN101294065A (zh) | 2008-10-29 |
JP2008277813A (ja) | 2008-11-13 |
CN101294065B (zh) | 2012-08-08 |
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