JP5150256B2 - 固体電解質コンデンサを製造するためのタンタル粉末 - Google Patents
固体電解質コンデンサを製造するためのタンタル粉末 Download PDFInfo
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- JP5150256B2 JP5150256B2 JP2007535049A JP2007535049A JP5150256B2 JP 5150256 B2 JP5150256 B2 JP 5150256B2 JP 2007535049 A JP2007535049 A JP 2007535049A JP 2007535049 A JP2007535049 A JP 2007535049A JP 5150256 B2 JP5150256 B2 JP 5150256B2
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- Prior art keywords
- ppm
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- tantalum powder
- tantalum
- solid electrolyte
- Prior art date
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title claims abstract description 24
- 239000003990 capacitor Substances 0.000 title claims description 28
- 239000007784 solid electrolyte Substances 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title description 4
- 239000011164 primary particle Substances 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 8
- 238000009826 distribution Methods 0.000 claims abstract description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 9
- 230000006835 compression Effects 0.000 claims description 8
- 238000007906 compression Methods 0.000 claims description 8
- 239000012535 impurity Substances 0.000 claims description 4
- 238000000527 sonication Methods 0.000 claims 1
- 238000005491 wire drawing Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 abstract description 21
- 238000005245 sintering Methods 0.000 abstract description 17
- 239000011814 protection agent Substances 0.000 abstract description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 230000002776 aggregation Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 238000005054 agglomeration Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000006392 deoxygenation reaction Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 238000012805 post-processing Methods 0.000 description 3
- 238000002048 anodisation reaction Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- WTKKCYNZRWIVKL-UHFFFAOYSA-N tantalum Chemical compound [Ta+5] WTKKCYNZRWIVKL-UHFFFAOYSA-N 0.000 description 1
- HAKPHVWPADQDBE-UHFFFAOYSA-N tantalum hydrofluoride Chemical compound F.[Ta] HAKPHVWPADQDBE-UHFFFAOYSA-N 0.000 description 1
- ZIRLXLUNCURZTP-UHFFFAOYSA-I tantalum(5+);pentahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[Ta+5] ZIRLXLUNCURZTP-UHFFFAOYSA-I 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/052—Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/24—Obtaining niobium or tantalum
Description
C=(F・ε)/d
〔式中、Fは、コンデンサの表面積を表わし、εは、誘電定数を表わし、dは、絶縁層の厚さを表わす〕により算出される。
約2.5μmの平均一次粒径(走査電子顕微鏡(REM)撮影により目視的に測定した)、ASTM B 822(機器Malvem社 マスターサイザー(MasterSizer) Sμ)により測定された、5.7μmのD10値、28.3μmのD50値および72.1μmのD90値に相当する一定の粒度分布およびASTM D 3663により測定された、0.54m2/gの比表面積(BET)を有する微粒状の部分焼結された出発五酸化タンタルを使用する。
Desox.-Tは、脱酸素が実施された温度を示す。"嵩密度"は、ASTM B 329によるスコット(Scott)体積計を用いて測定された。
Claims (8)
- 0.2〜0.8μmの最小の一次粒子寸法、0.9〜2.5m2/gの比表面積、5〜25μmのD10値、20〜140μmのD50値および40〜250μmのD90値に相当するASTM B 822(超音波処理無し)により測定された粒度分布を有する凝集された一次粒子からなるタンタル粉末であって、P30ppm未満、N400ppm未満、B10ppm未満、Si20ppm未満、S10ppm未満およびAs10ppm未満の含量を有する、固体電解質コンデンサアノードを製造するための前記タンタル粉末。
- P10ppm未満、およびN300ppm未満の含量、並びに残分としてタンタル及び避けることできない不純物を有する、請求項1記載のタンタル粉末。
- N100ppm未満の含量、並びに残分としてタンタル及び避けることできない不純物を有する、請求項2記載のタンタル粉末。
- 直径5.1mmおよび長さ5.1mm、および5.0g/cm3の圧縮密度を有する円筒形への圧縮後に4kgを上廻るシャティヨンによる圧縮強度を有する、請求項1から3までのいずれか1項に記載のタンタル粉末。
- シャティヨンによる圧縮強度が5kgを上廻る、請求項4記載のタンタル粉末。
- 0.5〜1m2/gのコンデンサとして有効な比表面積を有し、請求項1に記載のタンタル粉末からなる固体電解質コンデンサアノード。
- 30kgを上廻る線材引抜強さを有する、請求項6記載の固体電解質コンデンサアノード。
- 70000〜150000μFv/gの比容量および1nA/μFv未満の比残留電流を有する、請求項6または7記載のアノードを有する固体電解質コンデンサ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004049040A DE102004049040B4 (de) | 2004-10-08 | 2004-10-08 | Verfahren zur Herstellung von Festelektrolytkondensatoren |
DE102004049040.6 | 2004-10-08 | ||
PCT/EP2005/010361 WO2006037497A1 (de) | 2004-10-08 | 2005-09-24 | Tantalpulver zur herstellung von festelektrolytkondensatoren |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011173296A Division JP5193341B2 (ja) | 2004-10-08 | 2011-08-08 | 固体電解質コンデンサを製造するためのタンタル粉末 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008516432A JP2008516432A (ja) | 2008-05-15 |
JP5150256B2 true JP5150256B2 (ja) | 2013-02-20 |
Family
ID=35645881
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007535049A Active JP5150256B2 (ja) | 2004-10-08 | 2005-09-24 | 固体電解質コンデンサを製造するためのタンタル粉末 |
JP2011173296A Active JP5193341B2 (ja) | 2004-10-08 | 2011-08-08 | 固体電解質コンデンサを製造するためのタンタル粉末 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011173296A Active JP5193341B2 (ja) | 2004-10-08 | 2011-08-08 | 固体電解質コンデンサを製造するためのタンタル粉末 |
Country Status (17)
Country | Link |
---|---|
US (1) | US7898794B2 (ja) |
EP (1) | EP1843868B1 (ja) |
JP (2) | JP5150256B2 (ja) |
KR (1) | KR101285491B1 (ja) |
CN (1) | CN101035640B (ja) |
AT (1) | ATE517707T1 (ja) |
AU (1) | AU2005291557B2 (ja) |
BR (1) | BRPI0516563B1 (ja) |
DE (1) | DE102004049040B4 (ja) |
IL (2) | IL182216A0 (ja) |
MX (1) | MX2007003962A (ja) |
PT (1) | PT1843868E (ja) |
RU (1) | RU2414990C2 (ja) |
SV (1) | SV2006002260A (ja) |
TW (1) | TWI386263B (ja) |
WO (1) | WO2006037497A1 (ja) |
ZA (1) | ZA200702885B (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007130483A2 (en) * | 2006-05-05 | 2007-11-15 | Cabot Corporation | Tantalum powder with smooth surface and methods of manufacturing same |
DE102008026304A1 (de) * | 2008-06-02 | 2009-12-03 | H.C. Starck Gmbh | Verfahren zur Herstellung von Elektrolytkondensatoren mit niedrigem Leckstrom |
DE102013213720A1 (de) | 2012-07-19 | 2014-01-23 | Avx Corporation | Temperaturstabiler Festelektrolytkondensator |
US9548163B2 (en) | 2012-07-19 | 2017-01-17 | Avx Corporation | Solid electrolytic capacitor with improved performance at high voltages |
DE102013213723A1 (de) | 2012-07-19 | 2014-01-23 | Avx Corporation | Festelektrolytkondensator mit erhöhter Feucht-zu-Trocken-Kapazität |
DE102013213728A1 (de) | 2012-07-19 | 2014-01-23 | Avx Corporation | Nichtionisches Tensid zur Verwendung in einem festen Elektrolyten eines Elektrolytkondensators |
GB2512480B (en) | 2013-03-13 | 2018-05-30 | Avx Corp | Solid electrolytic capacitor for use in extreme conditions |
DE102013206603A1 (de) * | 2013-04-12 | 2014-10-16 | H.C. Starck Gmbh | Verfahren zur Herstellung von sauerstoffarmen Ventilmetallsinterkörpern mit hoher Oberfläche |
WO2015081508A1 (zh) * | 2013-12-04 | 2015-06-11 | 宁夏东方钽业股份有限公司 | 一种超高比容钽粉末的团化方法及由该方法制备的钽粉 |
AT14301U1 (de) * | 2014-07-09 | 2015-07-15 | Plansee Se | Verfahren zur Herstellung eines Bauteils |
CN104209512B (zh) * | 2014-09-05 | 2018-01-16 | 宁夏东方钽业股份有限公司 | 一种中压钽粉及其制备方法 |
US10290430B2 (en) | 2014-11-24 | 2019-05-14 | Avx Corporation | Wet Electrolytic Capacitor for an Implantable Medical Device |
RU2740582C1 (ru) * | 2020-07-21 | 2021-01-15 | федеральное государственное бюджетное образовательное учреждение высшего образования "Пермский национальный исследовательский политехнический университет" | Способ изготовления анодов танталового конденсатора |
CN116148296B (zh) * | 2023-04-19 | 2023-08-25 | 中国科学院过程工程研究所 | 含金属固体物料自动化xrf检测集成装置的检测方法 |
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US5217526A (en) * | 1991-05-31 | 1993-06-08 | Cabot Corporation | Fibrous tantalum and capacitors made therefrom |
US5954856A (en) | 1996-04-25 | 1999-09-21 | Cabot Corporation | Method of making tantalum metal powder with controlled size distribution and products made therefrom |
DE59801636D1 (de) * | 1997-02-19 | 2001-11-08 | Starck H C Gmbh Co Kg | Tantalpulver, verfahren zu seiner herstellung, sowie daraus erhältliche sinteranoden |
BR9807239A (pt) * | 1997-02-19 | 2000-04-25 | Starck H C Gmbh Co Kg | Pós de tântalo, processos para a sua preparação, bem como anodos de sinterização preparados a partir deles |
US6171363B1 (en) * | 1998-05-06 | 2001-01-09 | H. C. Starck, Inc. | Method for producing tantallum/niobium metal powders by the reduction of their oxides with gaseous magnesium |
CN1069564C (zh) * | 1998-07-07 | 2001-08-15 | 宁夏有色金属冶炼厂 | 钽粉末的制造方法 |
DE19847012A1 (de) * | 1998-10-13 | 2000-04-20 | Starck H C Gmbh Co Kg | Niobpulver und Verfahren zu dessen Herstellung |
JP2001148326A (ja) * | 1999-11-19 | 2001-05-29 | Matsushita Electric Ind Co Ltd | タンタル固体電解コンデンサの製造方法および製造装置 |
JP3806567B2 (ja) * | 2000-01-17 | 2006-08-09 | 三洋電機株式会社 | 固体電解コンデンサの製造方法及び製造装置 |
JP2002060803A (ja) * | 2000-08-10 | 2002-02-28 | Showa Kyabotto Super Metal Kk | 電解コンデンサ用タンタル焼結体の製造方法 |
US6611421B2 (en) * | 2000-09-08 | 2003-08-26 | Avx Corporation | Non-polarized tantalum capacitor and capacitor array |
CN1169643C (zh) * | 2001-09-29 | 2004-10-06 | 宁夏东方钽业股份有限公司 | 高比表面积钽粉和/或铌粉的制备方法 |
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DE10307716B4 (de) | 2002-03-12 | 2021-11-18 | Taniobis Gmbh | Ventilmetall-Pulver und Verfahren zu deren Herstellung |
US7142408B2 (en) * | 2003-06-10 | 2006-11-28 | Cabot Corporation | Tantalum powders and methods of producing same |
RU2236930C1 (ru) | 2003-06-24 | 2004-09-27 | Институт химии и технологии редких элементов и минерального сырья им. И.В. Тананаева Кольского научного центра РАН | Способ получения легированного порошка вентильного металла |
US7116548B2 (en) * | 2004-04-23 | 2006-10-03 | Kemet Electronics Corporation | Fluted anode with minimal density gradients and capacitor comprising same |
US6952339B1 (en) * | 2004-05-13 | 2005-10-04 | Todd Knowles | Tantalum capacitor case with increased volumetric efficiency |
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2004
- 2004-10-08 DE DE102004049040A patent/DE102004049040B4/de not_active Expired - Fee Related
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2005
- 2005-09-24 AU AU2005291557A patent/AU2005291557B2/en not_active Ceased
- 2005-09-24 CN CN2005800341700A patent/CN101035640B/zh active Active
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Also Published As
Publication number | Publication date |
---|---|
KR20070053369A (ko) | 2007-05-23 |
US7898794B2 (en) | 2011-03-01 |
RU2414990C2 (ru) | 2011-03-27 |
AU2005291557A1 (en) | 2006-04-13 |
US20080094779A1 (en) | 2008-04-24 |
TWI386263B (zh) | 2013-02-21 |
ZA200702885B (en) | 2008-08-27 |
IL182216A0 (en) | 2007-09-20 |
CN101035640A (zh) | 2007-09-12 |
ATE517707T1 (de) | 2011-08-15 |
DE102004049040A1 (de) | 2006-04-13 |
IL203658A (en) | 2012-12-31 |
RU2007116851A (ru) | 2008-11-20 |
SV2006002260A (es) | 2006-06-26 |
BRPI0516563B1 (pt) | 2014-03-11 |
EP1843868B1 (de) | 2011-07-27 |
CN101035640B (zh) | 2011-05-25 |
PT1843868E (pt) | 2011-09-19 |
KR101285491B1 (ko) | 2013-07-12 |
BRPI0516563A (pt) | 2008-09-09 |
JP2012019223A (ja) | 2012-01-26 |
JP5193341B2 (ja) | 2013-05-08 |
AU2005291557B2 (en) | 2010-07-29 |
JP2008516432A (ja) | 2008-05-15 |
EP1843868A1 (de) | 2007-10-17 |
DE102004049040B4 (de) | 2008-11-27 |
MX2007003962A (es) | 2008-03-13 |
WO2006037497A1 (de) | 2006-04-13 |
TW200626260A (en) | 2006-08-01 |
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