JP5125228B2 - 流体制御装置およびその組立方法 - Google Patents
流体制御装置およびその組立方法 Download PDFInfo
- Publication number
- JP5125228B2 JP5125228B2 JP2007144927A JP2007144927A JP5125228B2 JP 5125228 B2 JP5125228 B2 JP 5125228B2 JP 2007144927 A JP2007144927 A JP 2007144927A JP 2007144927 A JP2007144927 A JP 2007144927A JP 5125228 B2 JP5125228 B2 JP 5125228B2
- Authority
- JP
- Japan
- Prior art keywords
- fluid control
- male screw
- joint
- rear direction
- control device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/003—Housing formed from a plurality of the same valve elements
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/598—With repair, tapping, assembly, or disassembly means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87885—Sectional block structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
- Y10T29/49947—Assembling or joining by applying separate fastener
- Y10T29/49963—Threaded fastener
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Valve Housings (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
(2) 減圧弁(流体制御機器)
(3)(5)(9)(10) ブロック状継手部材
(4) 圧力表示器(流体制御機器)
(6)(7)(12) 開閉弁(流体制御機器)
(6a)(7a)(12a) ブロック状継手部(ブロック状継手部材)
(11) 流量調整器(流体制御機器)
(18) 前後方向からのおねじ部材
(20) シール部(シール手段)
(29) ねじ挿通孔
(30) めねじ
(31) ベース部材
(33) ねじ挿通孔
(34) 上方からのおねじ部材(継手部材取付用おねじ部材)
Claims (2)
- 前後方向に並んで配置される複数の流体制御機器と、流体制御機器と一体または別体の複数のブロック状継手部材と、継手部材同士が突き合わされた部分におけるシール性を確保するためのシール手段とを備えている流体制御装置において、
継手部材の上面に、それぞれ前後に所定間隔をおいて1対のシール部が設けられているとともに、継手部材の前後端部の上面に、1対のシール部を前後から挟むように、1対のめねじが設けられて、各めねじにねじ合わされて流体制御機器を取り付ける第1の上方からのおねじ部材が、各シール部の前後方向外側に各1本ずつだけ配置されており、
各継手部材は、1対のシール部の前後の中央部を挟んで対向する1対の第2の上方からのおねじ部材によってベース部材に取り付けられているとともに、継手部材同士は、互いに突き合わされて前後方向からのおねじ部材によって結合されており、前後方向にのびるねじ挿通孔は、おねじ部材の頭部を受ける段部を有し、この段部が第2の上方からのおねじ部材の前後方向位置よりも前後方向からのおねじ部材の挿入先端側に寄って設けられており、第2の上方からのおねじ部材の頭部は、前後方向にのびるねじ挿通孔の下面で受けられていることを特徴とする流体制御装置。 - 請求項1の流体制御装置の組立方法であって、
各継手部材を上方からのおねじ部材によってベース部材に取り付ける工程と、互いに突き合わされた継手部材同士を前後方向からのおねじ部材によって結合する工程とを含んでおり、前後方向からのおねじ部材を先に、上方からのおねじ部材を後から締め付けることにより、前後方向からのおねじ部材と上方からのおねじ部材との干渉を避けることを特徴とする流体制御装置の組立方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007144927A JP5125228B2 (ja) | 2007-05-31 | 2007-05-31 | 流体制御装置およびその組立方法 |
KR1020097026375A KR101230747B1 (ko) | 2007-05-31 | 2008-05-26 | 유체 제어 장치 및 그 조립 방법 |
PCT/JP2008/059632 WO2008146779A1 (ja) | 2007-05-31 | 2008-05-26 | 流体制御装置およびその組立方法 |
US12/451,643 US8220495B2 (en) | 2007-05-31 | 2008-05-26 | Fluid control apparatus and method for assembling the same |
TW97119847A TWI387696B (zh) | 2007-05-31 | 2008-05-29 | 流體控制裝置及其組立方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007144927A JP5125228B2 (ja) | 2007-05-31 | 2007-05-31 | 流体制御装置およびその組立方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008298179A JP2008298179A (ja) | 2008-12-11 |
JP5125228B2 true JP5125228B2 (ja) | 2013-01-23 |
Family
ID=40075020
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007144927A Active JP5125228B2 (ja) | 2007-05-31 | 2007-05-31 | 流体制御装置およびその組立方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8220495B2 (ja) |
JP (1) | JP5125228B2 (ja) |
KR (1) | KR101230747B1 (ja) |
TW (1) | TWI387696B (ja) |
WO (1) | WO2008146779A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2420711B1 (en) * | 2009-04-17 | 2019-01-02 | Mitsubishi Electric Corporation | Valve block and valve block unit |
WO2013046660A1 (ja) * | 2011-09-30 | 2013-04-04 | 株式会社フジキン | ガス供給装置 |
WO2014069344A1 (ja) * | 2012-10-30 | 2014-05-08 | Ckd株式会社 | 流体制御機器マニホールド、マニホールド組立方法、接続用工具 |
US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
TWI650499B (zh) * | 2013-12-05 | 2019-02-11 | Ckd股份有限公司 | 流路方塊及流體供給控制裝置 |
JP6404101B2 (ja) * | 2013-12-05 | 2018-10-10 | Ckd株式会社 | 配管継手、流体供給制御装置、及び配管接続構造 |
WO2015168369A1 (en) * | 2014-04-30 | 2015-11-05 | Parker-Hannifin Corporation | Hydraulic sectional control valve with multiple relief slots |
JP1539278S (ja) * | 2015-03-31 | 2015-11-30 | ||
USD854656S1 (en) * | 2016-05-19 | 2019-07-23 | Nagano Keiki Co., Ltd. | Fluid controller |
KR102152822B1 (ko) * | 2016-06-21 | 2020-09-07 | 가부시키가이샤 후지킨 | 유체제어장치 |
KR20190075100A (ko) * | 2016-10-24 | 2019-06-28 | 가부시키가이샤 후지킨 | 유체제어장치 및 이 유체제어장치를 사용한 제품 제조방법 |
US10983538B2 (en) | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
Family Cites Families (19)
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US3654960A (en) * | 1969-12-31 | 1972-04-11 | Hydro Stack Mfg Corp | Modular hydraulic system |
DE2119224B2 (de) * | 1971-04-21 | 1977-09-29 | Robert Bosch Gmbh, 7000 Stuttgart | Baueinheit zum aufbau einer mit druckmittel fuehrenden kanaelen versehenen grundplatte |
JPS5086322A (ja) | 1973-11-30 | 1975-07-11 | ||
JPS5310573Y2 (ja) * | 1973-12-11 | 1978-03-22 | ||
JPS5170978U (ja) * | 1974-11-30 | 1976-06-04 | ||
JPS5170978A (en) | 1974-12-17 | 1976-06-19 | Sharp Kk | Enshindatsusuikino baransaasochi |
GB1545488A (en) * | 1975-04-01 | 1979-05-10 | B & G Hydraulics Ltd | Hydraulic circuit units |
GB2232240A (en) | 1989-05-25 | 1990-12-05 | Svecia Antiqua Ltd | Checking and combining corresponding items such as letters and their envelopes. |
JP2506756Y2 (ja) * | 1990-01-19 | 1996-08-14 | いすゞ自動車株式会社 | クランク軸の支持構造 |
JPH0447646U (ja) * | 1990-08-29 | 1992-04-22 | ||
JPH0547646A (ja) | 1991-08-21 | 1993-02-26 | Hitachi Ltd | 電子線描画方法 |
JP3997338B2 (ja) | 1997-02-14 | 2007-10-24 | 忠弘 大見 | 流体制御装置 |
JP4110304B2 (ja) * | 1998-06-30 | 2008-07-02 | 株式会社フジキン | 流体制御装置および流体制御装置組立て方法 |
DE10039072C2 (de) * | 2000-08-10 | 2002-07-18 | Festo Ag & Co | Ventilanordnung |
JP2002346814A (ja) * | 2001-05-21 | 2002-12-04 | Yoshikawa Tekkosho:Kk | 旋盤用チャック装置 |
US6951226B2 (en) * | 2001-07-13 | 2005-10-04 | Talon Innovations, Inc. | Shear-resistant modular fluidic blocks |
JP4058531B2 (ja) * | 2002-06-11 | 2008-03-12 | Smc株式会社 | ユニットマニホールドバルブ |
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2007
- 2007-05-31 JP JP2007144927A patent/JP5125228B2/ja active Active
-
2008
- 2008-05-26 WO PCT/JP2008/059632 patent/WO2008146779A1/ja active Application Filing
- 2008-05-26 US US12/451,643 patent/US8220495B2/en active Active
- 2008-05-26 KR KR1020097026375A patent/KR101230747B1/ko active IP Right Grant
- 2008-05-29 TW TW97119847A patent/TWI387696B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW200912168A (en) | 2009-03-16 |
KR20100022055A (ko) | 2010-02-26 |
KR101230747B1 (ko) | 2013-02-07 |
WO2008146779A1 (ja) | 2008-12-04 |
JP2008298179A (ja) | 2008-12-11 |
TWI387696B (zh) | 2013-03-01 |
US20100132808A1 (en) | 2010-06-03 |
US8220495B2 (en) | 2012-07-17 |
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