JP5035602B2 - エポキシ樹脂組成物及び新規フェノール樹脂 - Google Patents
エポキシ樹脂組成物及び新規フェノール樹脂 Download PDFInfo
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- JP5035602B2 JP5035602B2 JP2007027880A JP2007027880A JP5035602B2 JP 5035602 B2 JP5035602 B2 JP 5035602B2 JP 2007027880 A JP2007027880 A JP 2007027880A JP 2007027880 A JP2007027880 A JP 2007027880A JP 5035602 B2 JP5035602 B2 JP 5035602B2
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- epoxy resin
- phenol
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- phenol resin
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- 239000003822 epoxy resin Substances 0.000 title claims description 98
- 229920000647 polyepoxide Polymers 0.000 title claims description 98
- 239000005011 phenolic resin Substances 0.000 title claims description 85
- 239000000203 mixture Substances 0.000 title claims description 64
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 34
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 27
- 150000001875 compounds Chemical class 0.000 claims description 25
- 125000003545 alkoxy group Chemical group 0.000 claims description 23
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 9
- 239000011342 resin composition Substances 0.000 claims description 8
- 229920001568 phenolic resin Polymers 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 6
- 150000002085 enols Chemical class 0.000 claims 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 46
- 239000003063 flame retardant Substances 0.000 description 34
- 238000000034 method Methods 0.000 description 34
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 25
- 239000003795 chemical substances by application Substances 0.000 description 25
- 239000000047 product Substances 0.000 description 23
- 229920005989 resin Polymers 0.000 description 22
- 239000011347 resin Substances 0.000 description 22
- 150000002989 phenols Chemical class 0.000 description 21
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- -1 hydroxyphenylene group Chemical group 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 15
- 229910000679 solder Inorganic materials 0.000 description 15
- LUZDYPLAQQGJEA-UHFFFAOYSA-N 2-Methoxynaphthalene Chemical compound C1=CC=CC2=CC(OC)=CC=C21 LUZDYPLAQQGJEA-UHFFFAOYSA-N 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 229920003986 novolac Polymers 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 12
- 238000005406 washing Methods 0.000 description 12
- 239000000945 filler Substances 0.000 description 10
- 229910052736 halogen Inorganic materials 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 9
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 9
- 150000002367 halogens Chemical class 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 238000000576 coating method Methods 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 229930003836 cresol Natural products 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 7
- 125000004957 naphthylene group Chemical group 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 239000003566 sealing material Substances 0.000 description 7
- 229920000877 Melamine resin Polymers 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 238000000691 measurement method Methods 0.000 description 6
- 239000000155 melt Substances 0.000 description 6
- 150000002790 naphthalenes Chemical class 0.000 description 6
- 235000006408 oxalic acid Nutrition 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000005336 cracking Methods 0.000 description 5
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 5
- 239000000347 magnesium hydroxide Substances 0.000 description 5
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000007973 cyanuric acids Chemical class 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- 150000002484 inorganic compounds Chemical class 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 239000012796 inorganic flame retardant Substances 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000001491 aromatic compounds Chemical class 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910000000 metal hydroxide Inorganic materials 0.000 description 3
- 150000004692 metal hydroxides Chemical class 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 150000002903 organophosphorus compounds Chemical class 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 150000003018 phosphorus compounds Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 3
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 3
- 229940007718 zinc hydroxide Drugs 0.000 description 3
- NQMUGNMMFTYOHK-UHFFFAOYSA-N 1-methoxynaphthalene Chemical compound C1=CC=C2C(OC)=CC=CC2=C1 NQMUGNMMFTYOHK-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- PPKHAIRFQKFMLE-UHFFFAOYSA-N 2,7-dimethoxynaphthalene Chemical compound C1=CC(OC)=CC2=CC(OC)=CC=C21 PPKHAIRFQKFMLE-UHFFFAOYSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- GSKNLOOGBYYDHV-UHFFFAOYSA-N 2-methylphenol;naphthalen-1-ol Chemical compound CC1=CC=CC=C1O.C1=CC=C2C(O)=CC=CC2=C1 GSKNLOOGBYYDHV-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical compound [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229910000416 bismuth oxide Inorganic materials 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 150000001639 boron compounds Chemical class 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 2
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 2
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000006266 etherification reaction Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000008098 formaldehyde solution Substances 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 229910001701 hydrotalcite Inorganic materials 0.000 description 2
- 229960001545 hydrotalcite Drugs 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 2
- 239000001095 magnesium carbonate Substances 0.000 description 2
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000005078 molybdenum compound Substances 0.000 description 2
- 150000002752 molybdenum compounds Chemical class 0.000 description 2
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 2
- VSWALKINGSNVAR-UHFFFAOYSA-N naphthalen-1-ol;phenol Chemical compound OC1=CC=CC=C1.C1=CC=C2C(O)=CC=CC2=C1 VSWALKINGSNVAR-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
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- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- FOZHTJJTSSSURD-UHFFFAOYSA-J titanium(4+);dicarbonate Chemical compound [Ti+4].[O-]C([O-])=O.[O-]C([O-])=O FOZHTJJTSSSURD-UHFFFAOYSA-J 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- PZRXQXJGIQEYOG-UHFFFAOYSA-N zinc;oxido(oxo)borane Chemical compound [Zn+2].[O-]B=O.[O-]B=O PZRXQXJGIQEYOG-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Epoxy Resins (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Description
然しながら、かかるエポキシ樹脂用硬化剤は、誘電特性は良好であるものの、近年のBGA、CSPといった表面実装パッケージへの移行、及び鉛フリー半田への対応によるリフロー処理温度の高温化に対応できるハンダクラック性を有していないという課題を有していた。
R3、R4、及びR5は、それぞれ独立的に、水素原子、炭素原子数1〜4のアルキル基、又はアルコキシ基を表す。)
で表される構造を有する化合物の含有率が該フェノール樹脂中0.5質量%以下であることを特徴とするエポキシ樹脂組成物に関する。
本発明で用いるフェノール樹脂は、前記した通り、フェノール構造部位がメチレン基を介してアルコキシナフタレン構造部位と結合した分子構造を有するフェノール樹脂である。このような構造を有するフェノール樹脂中には、通常、下記構造式(1)
R3、R4、及びR5は、それぞれ独立的に、水素原子、炭素原子数1〜4のアルキル基、又はアルコキシ基を表す。)
で表される構造の化合物が含まれている。本発明は、フェノール樹脂中の該化合物の含有率を0.5質量%以下となる範囲にまで低減させることにより前記フェノール樹脂が本来有する低誘電率、低誘電正接を何等損なうことなく耐ハンダクラック性が飛躍的に改善できたものである。
(式中、R1、R2はそれぞれ独立的に、水素原子、水酸基、又は炭素原子数1〜6のアルキル基を表す。)で表される化合物が挙げられ、具体的には、フェノール、レゾルシノール、ヒドロキノンなどの無置換フェノール類、クレゾール、エチルフェノール、n−プロピルフェノール、iso−プロピルフェノール、t−ブチルフェノールなどの一置換フェノール類、キシレノール、メチルプロピルフェノール、メチルブチルフェノール、ジプロピルフェノール、ジブチルフェノールなどの二置換フェノール類が挙げられる。
(R3、R4、及びR5は水素原子、炭素原子数1〜4のアルキル基、又はアルコキシ基を表す。)で表される化合物が挙げられ、具体的には、1−メトキシナフタレン、2−メトキシナフタレン、1−メチル−2−メトキシナフタレン、2,6−ジメトキシナフタレン、2,7−ジメトキシナフタレン、1−エトキシナフタレン、1,4−ジメトキシナフタレン、1−t−ブトキシナフタレン等が挙げられる。
これらの中でも特に分子末端にアルコキシナフタレン骨格を形成し易い点から2−メトキシナフタレン、及び2,7−ジメトキシナフタレンが好ましく、特に誘電特性の点から2−メトキシナフタレンが好ましい。
(式中、X及びYは、一方がメチレン基で他方が酸素原子であり、R1、R2はそれぞれ独立的に、水素原子、水酸基、又は炭素原子数1〜6のアルキル基を表し、
R3、R4、及びR5は水素原子、炭素原子数1〜4のアルキル基、又はアルコキシ基を表す。)
で表される分子構造の化合物が副生成物として混入する。本発明は前記フェノール樹脂中の該化合物の含有率を0.5質量%以下とすることにより、耐ハンダクラック性が飛躍的に向上したものである。特に、耐ハンダクラック性の改善効果が顕著である点から前記フェノール樹脂中の該化合物の含有率は0.01〜0.4質量%であることが好ましい。
2)GPC:
測定装置 :東ソー株式会社製「HLC−8220 GPC」、
カラム:東ソー株式会社製ガードカラム「HXL−L」
+東ソー株式会社製「TSK−GEL G2000HXL」
+東ソー株式会社製「TSK−GEL G2000HXL」
+東ソー株式会社製「TSK−GEL G3000HXL」
+東ソー株式会社製「TSK−GEL G4000HXL」
検出器: RI(示差屈折径)
データ処理:東ソー株式会社製「GPC−8020モデルIIバージョン4.10」
測定条件: カラム温度 40℃
展開溶媒 テトラヒドロフラン
流速 1.0ml/分
標準 : 前記「GPC−8020モデルIIバージョン4.10」の測定マニュアルに準拠して、分子量が既知の下記の単分散ポリスチレンを用いた。
(使用ポリスチレン)
東ソー株式会社製「A−500」
東ソー株式会社製「A−1000」
東ソー株式会社製「A−2500」
東ソー株式会社製「A−5000」
東ソー株式会社製「F−1」
東ソー株式会社製「F−2」
東ソー株式会社製「F−4」
東ソー株式会社製「F−10」
東ソー株式会社製「F−20」
東ソー株式会社製「F−40」
東ソー株式会社製「F−80」
東ソー株式会社製「F−128」
試料 : 樹脂固形分換算で1.0質量%のテトラヒドロフラン溶液をマイクロフィルターでろ過したもの(50μl)。
4)NMR:日本電子株式会社製 「NMR GSX270」
5)MS :日本電子株式会社製 二重収束型重量分析装置 AX505H(FD505H)
温度計、冷却管、分留管、窒素ガス導入管、撹拌器を取り付けたフラスコに、ο-クレゾール432.0g(4.0モル)と2−メトキシナフタレン158.2g(1.0モル)と37質量%ホルムアルデヒド水溶液48.6g(0.6モル)を仕込み、シュウ酸9.0gを加えて、90℃まで昇温した。ついで37質量%ホルムアルデヒド水溶液291.9g(3.00モル)を,90℃に保ちながら3時間かけて滴下した。滴下終了後,更に90℃で5時間反応させた。反応終了後、更にメチルイソブチルケトン1500gを加え、分液ロートに移し水洗した。次いで洗浄水が中性を示すまで水洗後、有機層から未反応のο-クレゾールと2−メトキシナフタレン、及びメチルイソブチルケトンを加熱減圧下に除去し、フェノール樹脂(A−1)を得た。
得られたフェノール樹脂の軟化点は74℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:150℃)は0.8dPa・s、水酸基当量は167g/eq.であった。GPC分析の結果、分子構造式(1−b)で表される構造を有する化合物の含有率は、0.22重量%であった。
得られたフェノール樹脂のGPCチャートを図1に、C13−NMRチャートを図2に、MSスペクトルを図3に示す。
温度計、冷却管、分留管、窒素ガス導入管、撹拌器を取り付けたフラスコに、フェノール376.0g(4.0モル)と2−メトキシナフタレン158.2g(1.0モル)を仕込み、シュウ酸2.0gを加えて、95℃まで昇温した。ついで37質量%ホルムアルデヒド水溶液223.0g(2.75モル)を95℃に保持しながら3時間かけて滴下した。滴下終了後,更に95℃で3時間反応させた。反応終了後、更にメチルイソブチルケトン1500gを加え、分液ロートに移し水洗した。次いで洗浄水が中性を示すまで水洗後、有機層から未反応のフェノールと2−メトキシナフタレン、及びメチルイソブチルケトンを加熱減圧下に除去し、フェノール樹脂(A−2)を得た。
得られたフェノール樹脂の軟化点は75℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:150℃)は0.9dPa・s、水酸基当量は158g/eq.であった。GPC分析の結果、分子構造式(1−a)で表される構造を有する化合物の含有率は、0.27重量%であった。
得られたフェノール樹脂のGPCチャートを図4に示す。
実施例2において、フェノール282.0g(3.0モル)、37質量%ホルムアルデヒド水溶液356.8g(4.4モル)とした以外は同様にして、フェノール樹脂(A−3)を得た。
得られたフェノール樹脂の軟化点は110℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:150℃)は16dPa・s、水酸基当量は174g/eq.であった。GPC分析の結果、分子構造式(1−a)で表される構造を有する化合物の含有率は、0.17重量%であった。
温度計、冷却管、分留管、窒素ガス導入管、撹拌器を取り付けたフラスコに、フェノール376.0g(4.0モル)と2−メトキシナフタレン158.2g(1.0モル)を仕込み、シュウ酸2.0gを加えて100℃まで昇温した。ついで37質量%ホルムアルデヒド水溶液223.0g(2.75モル)を,水を分留環で捕集しながら115℃で3時間かけて滴下した。滴下終了後,更に115℃で3時間反応させた。反応終了後、更にメチルイソブチルケトン1500gを加え、分液ロートに移し水洗した。次いで洗浄水が中性を示すまで水洗後、有機層から未反応のフェノールと2−メトキシナフタレン、及びメチルイソブチルケトンを加熱減圧下に除去し、フェノール樹脂(A−4)を得た。
得られたフェノール樹脂の軟化点は73℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:150℃)は0.8dPa・s、水酸基当量は160g/eq.であった。GPC分析の結果、分子構造式(1−a)で表される構造を有する化合物の含有率は、0.57重量%であった。
温度計、冷却管、分留管、窒素ガス導入管、撹拌器を取り付けたフラスコに、フェノール282.0g(3.0モル)と2−メトキシナフタレン158.2g(1.0モル)を仕込み、シュウ酸2.0gを加えて50℃まで昇温した。ついで92質量%パラホルムアルデヒド97.8g(ホルムアルデヒド換算で3.0モル)を、2時間かけて5分割添加しながら、110℃まで昇温した。その後、140℃で更に2時間反応させた。反応終了後、更にメチルイソブチルケトン1500gを加え、分液ロートに移し水洗した。次いで洗浄水が中性を示すまで水洗後、有機層から未反応のフェノールと2−メトキシナフタレン、及びメチルイソブチルケトンを加熱減圧下に除去し、フェノール樹脂(A−5)を得た。
得られたフェノール樹脂の軟化点は77℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:150℃)は1.0dPa・s、水酸基当量は168g/eq.であった。GPC分析の結果、分子構造式(1−a)で表される構造を有する化合物の含有率は、0.53重量%であった。
エポキシ樹脂として、大日本インキ化学工業製N−665−EXP(オルソクレゾールノボラック型エポキシ樹脂、エポキシ当量203g/eq)、フェノール樹脂として(A−1)〜(A−5)を用い、硬化促進剤としてトリフェニルホスフィン(TPP)、無機充填材として球状シリカ(株式会社マイクロン製S−COL)、シランカップリング剤としてγ−グリシドキシトリエトキシキシシラン(信越化学工業株式会社製「KBM−403」)、カルナウバワックス(株式会社セラリカ野田製「パール・ワックス No.1−P」)、カーボンブラックを用いて、表1に示した配合に従って調整した混合物を、2本ロールを用いて90℃の温度で5分間溶融混練して目的の組成物を作成した。得られた組成物を粉砕したものを、トランスファー成形機にて、圧力70kg/cm2、ラム速度5cm/秒、温度175℃、時間180秒でφ50mm×3(t)mmの円板状に成形したものを評価用のサンプルとして用いた。硬化性の評価を行った。硬化物の耐熱性、吸湿性、ハンダクラック性は、上記評価用サンプルを用い、以下の方法で評価した。
ガラス転移温度:粘弾性測定装置(レオメトリック社製 固体粘弾性測定装置「RSAII」、二重カレンチレバー法;周波数1Hz、昇温速度3℃/min)を用いて測定した。
尚、試験片は、前記円板状の試験片を幅5mm、長さ54mmに切り出したものとした。
<吸湿性>
85℃/85%RHの雰囲気下168時間放置し、処理前後の重量変化を測定した。
<ハンダクラック性>
10個の試験片を、85℃/85%RHの雰囲気下168時間放置し、吸湿処理を行った後、これを260℃のハンダ浴に10秒間浸漬させた際、クラックの発生した試験片の数を数えた。
Claims (4)
- エポキシ樹脂及びフェノール樹脂を必須成分とするエポキシ樹脂組成物であって、前記フェノール樹脂が、フェノール構造部位がメチレン基を介してアルコキシナフタレン構造部位と結合した分子構造を有するものであり、かつ、下記構造式(1)
R3、R4、及びR5は、それぞれ独立的に、水素原子、炭素原子数1〜4のアルキル基、又はアルコキシ基を表す。)
で表される構造を有する化合物の含有率が該フェノール樹脂中0.27質量%以下であることを特徴とするエポキシ樹脂組成物。 - 前記フェノール樹脂が、軟化点が170℃以下、水酸基当量が120〜500g/eqのものである請求項1記載のエポキシ樹脂組成物。
- 請求項1又は2記載のエポキシ樹脂組成物を硬化してなるエポキシ樹脂硬化物。
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