JP4982891B2 - 反応性プラズマ中におけるラジカル及びダスト濃度測定方法 - Google Patents
反応性プラズマ中におけるラジカル及びダスト濃度測定方法 Download PDFInfo
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- JP4982891B2 JP4982891B2 JP2007105293A JP2007105293A JP4982891B2 JP 4982891 B2 JP4982891 B2 JP 4982891B2 JP 2007105293 A JP2007105293 A JP 2007105293A JP 2007105293 A JP2007105293 A JP 2007105293A JP 4982891 B2 JP4982891 B2 JP 4982891B2
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Description
T. Nagai, A. H. M. Smets, and M. Kondo,Jpn. J. Appl. Phys. 45, 8095 (2006) W. M. M. Kessels, A. Leroux, M. G. H.Boogaarts, J. P. H. Hoefnagels, M. C. M. van de Sanden, and D. C. Schram, J.Vac. Sci. Technol. A 19, 467 (2001). S. H. Hong and J. Winter, J. Appl. Phys. 100,064303 (2006). D. Kujundzic and A. Gallagher, J. Appl.Phys. 99, 033301-1 (2006)
τ0=1/2(1−R) (1)
τ1=1/2{(1−R)+L0+L1+L2} (2)
Cavity Loss=1/c(1/τ1−1/τ0)=σNd (3)
ただし、cは光速、σは吸収及び散乱断面積、Nはラジカル及びダストの濃度、dは電極の直径である。
Nc∝ton −χ (5)
Cavity Lossabs∝ton 4−χ (6)
Cavity Lossscat∝ton 6−χ (7)
但し、280nmのレーザー光を用いた場合には、「ダストによる吸収に起因したキャビティ内の光損失」が続く様子が観測されている。
Claims (1)
- キャビティリングダウン分光法を利用した反応性プラズマ中のラジカル及びダストの濃度測定方法において、
波長の異なる2つのレーザー光を測定対象に照射し、それぞれの波長によるキャビティ内の光損失を時間分解しながら計測し、
前記2つのレーザー光の波長は、前記ラジカルの吸収のある波長と前記ラジカルの吸収の無い波長であり、前記ラジカルの吸収のある波長のレーザー光の光損失に基づき、前記ラジカルの濃度を求め、
ダストのサイズが8nm以下である、ダストによる吸収に起因したキャビティ内の光損失成分が現れるプラズマ点灯時間の時間領域における、光損失のプラズマ点灯時間依存性に基づいて、前記ダストの濃度を求めることを特徴とする濃度測定方法。
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JP2008261758A JP2008261758A (ja) | 2008-10-30 |
JP4982891B2 true JP4982891B2 (ja) | 2012-07-25 |
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KR20150114963A (ko) * | 2013-02-14 | 2015-10-13 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | 조성 분석 시스템을 위한 레이저 어블레이션 셀 및 토치 시스템 |
US20140227776A1 (en) | 2013-02-14 | 2014-08-14 | Electro Scientific Industries, Inc. | Laser ablation cell and torch system for a compositional analysis system |
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