JP4875994B2 - 中和剤 - Google Patents
中和剤 Download PDFInfo
- Publication number
- JP4875994B2 JP4875994B2 JP2007010263A JP2007010263A JP4875994B2 JP 4875994 B2 JP4875994 B2 JP 4875994B2 JP 2007010263 A JP2007010263 A JP 2007010263A JP 2007010263 A JP2007010263 A JP 2007010263A JP 4875994 B2 JP4875994 B2 JP 4875994B2
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- JP
- Japan
- Prior art keywords
- concentration
- neutralizing agent
- agent
- fluoride
- acidic chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000003795 chemical substances by application Substances 0.000 claims description 87
- 230000003472 neutralizing effect Effects 0.000 claims description 56
- 230000002378 acidificating effect Effects 0.000 claims description 48
- 239000000126 substance Substances 0.000 claims description 47
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 42
- 230000003113 alkalizing effect Effects 0.000 claims description 28
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 14
- 239000000872 buffer Substances 0.000 claims description 14
- -1 fluoride ions Chemical class 0.000 claims description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 12
- 239000006172 buffering agent Substances 0.000 claims description 12
- 239000003513 alkali Substances 0.000 claims description 9
- 239000002244 precipitate Substances 0.000 claims description 7
- 150000008044 alkali metal hydroxides Chemical group 0.000 claims description 3
- 229910000318 alkali metal phosphate Inorganic materials 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 30
- 238000005259 measurement Methods 0.000 description 26
- 238000002347 injection Methods 0.000 description 12
- 239000007924 injection Substances 0.000 description 12
- 239000011259 mixed solution Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 239000003814 drug Substances 0.000 description 6
- 229940079593 drug Drugs 0.000 description 6
- 238000001139 pH measurement Methods 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 230000003139 buffering effect Effects 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- 238000006386 neutralization reaction Methods 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012362 glacial acetic acid Substances 0.000 description 2
- 238000005185 salting out Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- LRDIEHDJWYRVPT-UHFFFAOYSA-N 4-amino-5-hydroxynaphthalene-1-sulfonic acid Chemical compound C1=CC(O)=C2C(N)=CC=C(S(O)(=O)=O)C2=C1 LRDIEHDJWYRVPT-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000012556 adjustment buffer Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000009965 odorless effect Effects 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
Description
前記緩衝剤が前記酸性薬液と混合する際に実質的に析出しない濃度に設定した、前記酸性薬液に含まれる強酸を中和可能なアルカリであるアルカリ化剤とを含み、
酸性薬液に含まれるフッ化物濃度を、フッ化物イオン電極を用いて測定するのに用いることを特徴とする(請求項1)。
(2)メインポンプ7を動作させ、酸性薬液SをpH測定系5に導入する。この途中で、酸性薬液Sはサブポンプ10に導かれる中和剤11と混合される。
(3)pH測定系5において、酸性薬液Sと中和剤11とが混合された混合液のpHをpH電極で測定する。
2 メイン流路
3 サブ流路
4 測定装置の最上流側
5 pH測定系
6 フッ化物イオン測定系
7 液送用メインポンプ
8 中和剤収容タンク
9 メイン流路との合流点
10 液送用サブポンプ
11 中和剤
12 サブ流路に設けた電磁弁
13 メイン流路に設けた電磁弁
14 制御部
S 酸性薬液
Claims (4)
- 酸性薬液中のフッ化物がフッ化物イオンとして安定に存在するpHに緩衝能を有する緩衝剤と、
前記緩衝剤が前記酸性薬液と混合する際に実質的に析出しない濃度に設定した、前記酸性薬液に含まれる強酸を中和可能なアルカリであるアルカリ化剤とを含み、
酸性薬液に含まれるフッ化物濃度を、フッ化物イオン電極を用いて測定するのに用いる中和剤。 - 少なくとも硫酸およびフッ化水素酸を含む酸性薬液に含まれるフッ化水素酸の濃度を、フッ化物イオン電極を用いて測定するのに用いる請求項1に記載の中和剤。
- 前記緩衝剤がアルカリ金属のリン酸塩である、請求項1又は2に記載の中和剤。
- 前記アルカリ化剤がアルカリ金属の水酸化物である、請求項1又は2に記載の中和剤。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007010263A JP4875994B2 (ja) | 2007-01-19 | 2007-01-19 | 中和剤 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007010263A JP4875994B2 (ja) | 2007-01-19 | 2007-01-19 | 中和剤 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008177408A JP2008177408A (ja) | 2008-07-31 |
JP4875994B2 true JP4875994B2 (ja) | 2012-02-15 |
Family
ID=39704203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007010263A Active JP4875994B2 (ja) | 2007-01-19 | 2007-01-19 | 中和剤 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4875994B2 (ja) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0695086B2 (ja) * | 1982-06-03 | 1994-11-24 | 新日本製鐵株式会社 | 電解クロム酸処理鋼板用メツキ浴中のフツ化物濃度の自動制御方法及び装置 |
IT1217581B (it) * | 1988-05-13 | 1990-03-30 | Instrumentation Lab Spa | Sistema di soluzioni tampone per la standardizzazione di analizzatori di ph ed elettroliti |
JP2002087844A (ja) * | 2000-09-14 | 2002-03-27 | Sony Corp | 表示パネルの製造方法 |
-
2007
- 2007-01-19 JP JP2007010263A patent/JP4875994B2/ja active Active
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Publication number | Publication date |
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JP2008177408A (ja) | 2008-07-31 |
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