JP4859457B2 - Liquid purification device - Google Patents

Liquid purification device Download PDF

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JP4859457B2
JP4859457B2 JP2005377280A JP2005377280A JP4859457B2 JP 4859457 B2 JP4859457 B2 JP 4859457B2 JP 2005377280 A JP2005377280 A JP 2005377280A JP 2005377280 A JP2005377280 A JP 2005377280A JP 4859457 B2 JP4859457 B2 JP 4859457B2
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treated water
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JP2007175628A (en
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幸夫 山口
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有限会社ヤマヱ
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Description

本発明は、例えば産業排水や生活排水、各種水槽内の水等の処理液体を浄化するための液体浄化装置に関する。   The present invention relates to a liquid purification apparatus for purifying treatment liquid such as industrial wastewater, domestic wastewater, and water in various water tanks.

従来、この種の浄化装置としては、例えば浄化槽内にシート状の合成樹脂膜を多数垂下させて並設し、これに汚濁物質を除去するバクテリア等を付着させて汚濁水と広い面積で接触させて浄化する等の各種装置が知られている。ところが、これらの装置にあっては、広大な沈殿池や大型の設備を必要として、設備投資と運用効率の面で劣るという不具合があり、当出願人は、特許文献１に開示の浄化装置を提案した。   Conventionally, as this type of purification device, for example, a large number of sheet-like synthetic resin films are suspended in a septic tank, and bacteria or the like for removing contaminants are attached to the septic tank so as to make contact with contaminated water over a wide area. Various devices are known for purifying and purifying. However, these devices require a large sedimentation basin and large facilities, and have the disadvantage that they are inferior in terms of capital investment and operational efficiency. Proposed.

この浄化装置は、その内部の上部に多数の落下穴を有する拡散板が配設された耐圧容器と、この耐圧容器に酸素を供給する酸素供給源とを備え、耐圧容器内に給水パイプから供給した処理水に酸素供給源から酸素を供給して、処理水の表面に酸素雰囲気の圧力を作用させることにより、処理水を浄化して外部に排水するようにしたものである。
特許第３３７５３４８号公報 This purification apparatus includes a pressure vessel in which a diffusion plate having a large number of dropping holes is disposed in the upper part of the purification device, and an oxygen supply source for supplying oxygen to the pressure vessel, and is supplied from a water supply pipe into the pressure vessel. By supplying oxygen from the oxygen supply source to the treated water and applying a pressure of an oxygen atmosphere to the surface of the treated water, the treated water is purified and drained to the outside.
Japanese Patent No. 3375348

しかしながら、この浄化装置にあっては、耐圧容器の内部の上部に外径の異なる２枚の円板状の拡散板が上下に設けられているのみであるため、給水パイプの吐出口から拡散板上に落下した処理水が、拡散板の各落下穴から落下したり各拡散板の外周縁外方から落下して、処理水が拡散板を通過して耐圧容器の下部に貯留されるまでの時間、すなわち酸素の処理水への接触時間が比較的短くなって、酸素の処理水への溶解が十分に行われない場合がある等、処理水の浄化作業を効率的に行うことが難しいという問題点を有している。   However, in this purifying device, only two disk-shaped diffusion plates having different outer diameters are provided above and below the upper part of the pressure vessel, so that the diffusion plate is connected to the discharge port of the water supply pipe. The treated water that has fallen above falls from each drop hole of the diffusion plate or falls from the outer periphery of each diffusion plate until the treated water passes through the diffusion plate and is stored in the lower part of the pressure vessel. It is difficult to efficiently purify the treated water, such as when the contact time of oxygen with the treated water becomes relatively short and the oxygen may not be sufficiently dissolved in the treated water. Has a problem.

本発明は、このような事情に鑑みてなされたもので、その目的は、耐圧容器内に供給される処理液体への気体の接触時間を長くして気体の処理液体への溶解を良好に行うことができて、処理液体の効率的な浄化作業が可能な液体浄化装置を提供することにある。   The present invention has been made in view of such circumstances, and the object thereof is to lengthen the contact time of the gas to the processing liquid supplied into the pressure-resistant container and to satisfactorily dissolve the gas in the processing liquid. Another object of the present invention is to provide a liquid purification apparatus that can efficiently purify the processing liquid.

かかる目的を達成すべく、本発明のうち請求項１に記載の発明は、上部に液体供給口と気体供給口が設けられ下部に液体排出口が設けられた耐圧容器と、該耐圧容器内に前記気体供給口から気体を供給する気体供給源と、を備え、前記液体供給口から前記耐圧容器内に供給した処理液体の表面に、前記気体供給口から前記耐圧容器内に供給した気体の圧力を作用させて処理液体を浄化する液体浄化装置であって、前記耐圧容器は、その内部の上部に、外形がそれぞれ同一形状に形成され外周縁に上方に突出した帯板が設けられると共に、円周方向に配置された複数の列状の落下穴が上下において異なる位置に形成された複数の邪魔板が積層状態で配設され、該複数の邪魔板は、その上面の複数箇所に上方に所定高さ突出した板体からなる突起物が設けられ、該突起物が上下の邪魔板において異なる位置で前記落下穴の列間に所定間隔で設けられていることを特徴とする。
In order to achieve such an object, the invention according to claim 1 of the present invention includes a pressure vessel having a liquid supply port and a gas supply port at an upper portion and a liquid discharge port at a lower portion, and the pressure vessel. A gas supply source for supplying gas from the gas supply port, and the pressure of the gas supplied from the gas supply port to the inside of the pressure vessel on the surface of the processing liquid supplied from the liquid supply port to the inside of the pressure vessel a liquid purifying device for purifying the process liquid by the action of the pressure vessel, the top of the interior, with strip outer shape projecting upward to the outer peripheral edge is formed into the same shape respectively are provided, circles A plurality of baffle plates in which a plurality of rows of drop holes arranged in the circumferential direction are formed in different positions in the upper and lower directions are arranged in a stacked state, and the plurality of baffle plates are predetermined upward at a plurality of locations on the upper surface thereof. Protrusion consisting of a plate protruding in height Is provided, the protrusion thereof is characterized in that are provided at predetermined intervals between the rows of the falling hole at different positions in the vertical baffles.

本発明の請求項１に記載の発明によれば、耐圧容器内の上部に、外形がそれぞれ同一形状に形成され外周縁に上方に突出した帯板が設けられると共に、多数の落下穴が上下において異なる位置に形成された複数の邪魔板が積層状態で配設されているため、各邪魔板の帯板によりその外周縁外方への処理液体の落下が確実に阻止され、処理液体の落下速度を遅らせて気体との接触時間を十分に長くすることができ、気体を処理液体に良好に溶解させることができて、処理液体の浄化作業を効率的に行うことが可能となる。   According to the invention described in claim 1 of the present invention, at the upper part in the pressure vessel, the strips are provided with the same outer shape and projecting upward on the outer peripheral edge, and a large number of the fall holes are arranged at the top and bottom. Since a plurality of baffle plates formed in different positions are arranged in a stacked state, the baffle plate of each baffle plate reliably prevents the processing liquid from falling outside the outer peripheral edge, and the processing liquid drop speed The contact time with the gas can be made sufficiently long by delaying the gas, the gas can be dissolved well in the processing liquid, and the purification operation of the processing liquid can be performed efficiently.

また、各邪魔板の上面に所定高さの突起物が複数箇所に設けられているため、この突起物で処理液体の落下速度を一層遅らせることができて、気体との接触時間を一層長くすることができる。さらに、突起物が円周方向に配置された複数の列状の落下穴の列間に所定間隔で設けられた板体で形成されかつ上下の邪魔板においてその位置が異なるため、処理液体の落下速度をより一層遅らせることができて、気体との接触時間をより一層長くすることができる。
In addition, since a plurality of protrusions having a predetermined height are provided on the upper surface of each baffle plate, the protrusions can further reduce the falling speed of the processing liquid and further increase the contact time with the gas. be able to. Furthermore, since the protrusions are formed of plates provided at predetermined intervals between rows of a plurality of rows of drop holes arranged in the circumferential direction and the positions of the upper and lower baffle plates are different, the drop of the treatment liquid The speed can be further reduced, and the contact time with the gas can be further increased.

以下、本発明を実施するための最良の形態を図面に基づいて詳細に説明する。
図１〜図９は、本発明に係わる液体浄化装置の一実施形態を示し、図１がその構成図、図２がその平面図、図３が蓋体の正面図、図４及び図５が各邪魔板の基本概念を示す図、図６及び図７が各邪魔板の具体例を示す図、図８及び図９が装置の動作説明図である。
The best mode for carrying out the present invention will be described below in detail with reference to the drawings.
1 to 9 show an embodiment of a liquid purification apparatus according to the present invention, FIG. 1 is a configuration diagram thereof, FIG. 2 is a plan view thereof, FIG. 3 is a front view of a lid body, and FIGS. illustrates the basic concept of each baffle, FIG 6 and FIG 7 shows a specific example of the baffle plates, 8 and 9 is a diagram for describing operation of the device.

図１〜図３において、液体浄化装置１は、底部に脚３とドレインバルブ４が設けられ上面が開口する有底円筒形状の容器本体２ａと、この容器本体２ａの上面開口部に着脱可能に配設される蓋体２ｂからなる耐圧容器２を有している。この耐圧容器２の蓋体２ｂには、その中心位置に下端に液体供給口５ａが設けられ上端にフランジ５ｂが設けられた液体供給パイプ５が固定されると共に、その直径方向の一方の端部に、下端に液体排出口６ａが設けられ上端にフランジ６ｂが設けられた排出パイプ６の上部が固定されている。この時、液体供給口５ａは蓋体２ａの内面直下（すなわち耐圧容器２の最上部）の位置に、液体排出口６ａは容器本体２ａの下部である底部近傍に位置するように設定されている。
1 to 3, the liquid purification apparatus 1 is detachably attached to a bottomed cylindrical container body 2a having a leg 3 and a drain valve 4 provided at the bottom and having an upper surface opened, and an upper surface opening of the container body 2a. It has a pressure-resistant container 2 composed of a lid 2b provided. The lid 2b of the pressure vessel 2 is fixed with a liquid supply pipe 5 having a liquid supply port 5a at the lower end and a flange 5b at the upper end at the center, and one end in the diameter direction thereof. Further, the upper portion of the discharge pipe 6 having the liquid discharge port 6a at the lower end and the flange 6b at the upper end is fixed. At this time, the liquid supply port 5a is set to a position immediately below the inner surface of the lid 2a (that is, the uppermost portion of the pressure vessel 2) , and the liquid discharge port 6a is set to be positioned near the bottom, which is the lower portion of the container body 2a. .

そして、液体供給パイプ５のフランジ５ｂには、外部供給管７を介して揚水ポンプ８が接続されており、この外部供給管７の途中の所定位置には、逆止弁９と液体供給調整バルブ１０が接続されている。なお、逆止弁９は、液体供給口５ａのできるだけ近い位置に配置することが、液体浄化装置１を停止させた際の気体の逆流を防止する観点から好ましい。また、前記排出パイプ６のフランジ６ｂには、その途中に圧力・吐出量調整バルブ１２が接続された外部排出管１１が接続されている。   A pump 5 is connected to the flange 5b of the liquid supply pipe 5 through an external supply pipe 7. A check valve 9 and a liquid supply adjustment valve are provided at predetermined positions in the middle of the external supply pipe 7. 10 is connected. The check valve 9 is preferably disposed as close as possible to the liquid supply port 5a from the viewpoint of preventing a backflow of gas when the liquid purification apparatus 1 is stopped. The flange 6b of the discharge pipe 6 is connected to an external discharge pipe 11 to which a pressure / discharge amount adjusting valve 12 is connected.

これにより、液体供給調整バルブ１０が開状態で揚水ポンプ８が作動することにより、処理液体が外部供給管７を介して耐圧容器２の上部の液体供給口５ａから容器本体２ａ内に吐出され、耐圧容器２内で浄化された清浄な液体が、圧力・吐出量調整バルブ１２を開状態にすることにより、液体排出口６ａから排出パイプ６及び外部排出管１１を介して外部に排出されるようになっている。   As a result, the pumping pump 8 is operated with the liquid supply adjustment valve 10 in the open state, whereby the processing liquid is discharged into the container body 2a from the liquid supply port 5a at the top of the pressure vessel 2 via the external supply pipe 7. The clean liquid purified in the pressure vessel 2 is discharged to the outside from the liquid discharge port 6a through the discharge pipe 6 and the external discharge pipe 11 by opening the pressure / discharge amount adjusting valve 12. It has become.

また、前記蓋体２ｂの直径方向の他端部にはガス供給口１３（気体供給口）が設けられ、このガス供給口１３は、ガス流量調整バルブ１４を介してガス供給源１５（気体供給源）に接続されると共に圧力計１６やエアー抜きバルブ１７が接続されたガス供給管１８に接続されている。また、ガス供給管１８には、上下にバルブ１９ａ、１９ｂを有する透明なモニター管１９が接続されている。   A gas supply port 13 (gas supply port) is provided at the other end in the diameter direction of the lid 2b. The gas supply port 13 is connected to a gas supply source 15 (gas supply) via a gas flow rate adjusting valve 14. And a gas supply pipe 18 to which a pressure gauge 16 and an air vent valve 17 are connected. The gas supply pipe 18 is connected to a transparent monitor pipe 19 having valves 19a and 19b above and below.

これにより、前記ガス流量調整バルブ１４を手動で開放操作することによって、ガス供給源１５からガス供給管１８を介して所定量のガスがガス供給口１３から耐圧容器２内に供給されるようになっている。この時、後述するように、耐圧容器２内に供給されるガスの圧力は、例えば１ｋｇ／ｃｍ２〜３ｋｇ／ｃｍ２となるようにガス流量調整バルブ１４が調整される。 Thus, by manually opening the gas flow rate adjusting valve 14, a predetermined amount of gas is supplied from the gas supply source 13 into the pressure-resistant container 2 through the gas supply pipe 18. It has become. At this time, as described later, the pressure of the gas supplied into the pressure-resistant container 2, the gas flow rate adjusting valve 14 is adjusted so as for example a 1kg / cm 2 ~3kg / cm 2 .

なお、本発明の液体浄化装置１で使用される気体（ガス）としては、窒素ガス、炭酸ガス、酸素ガス、オゾンガス等があり、例えば窒素ガスは、脱酸素水の飽和溶存窒素濃度を遙かに超えた濃度の溶解液を得ることで、長時間これを維持し酸素による酸化を抑える場合に使用され、炭酸ガスは、アルカリ水の中和に利用して、極めて短時間に高濃度の炭酸水を得る場合に使用される。また、オゾンガスは、溶解させるオゾン濃度だけのオゾンガスを生成させる極めて小型のオゾン生成装置として使用され、酸素ガスは、各種処理水に使用して、より一層酸素溶解効率を高める場合等に使用される。   In addition, as gas (gas) used with the liquid purification apparatus 1 of this invention, there exist nitrogen gas, carbon dioxide gas, oxygen gas, ozone gas etc., for example, nitrogen gas raises the saturation dissolved nitrogen concentration of deoxygenated water. Is used to maintain this solution for a long time and suppress oxidation by oxygen. Carbon dioxide gas is used for neutralization of alkaline water and carbon dioxide with a high concentration in an extremely short time. Used when obtaining water. In addition, ozone gas is used as an extremely small ozone generating device that generates ozone gas having a concentration of ozone to be dissolved, and oxygen gas is used for various treatment waters to further increase the oxygen dissolution efficiency. .

また、本発明の液体浄化装置１は、例えば図示はしないが前記透明なモニター管１９の上下２カ所に水位センサやガス量センサを配置すると共にガス供給管１８に電磁弁を配設して、上部のセンサが所定の信号を検知した際に電磁弁を開にして耐圧容器２内にガスを供給し、下部のセンサが所定の信号を検知した際に電磁弁を閉にしてガスの供給を停止させる等、ガスの耐圧容器２内への供給を自動的に行うように構成することもできる。   Further, the liquid purification apparatus 1 of the present invention has, for example, a water level sensor and a gas amount sensor arranged at two places above and below the transparent monitor pipe 19 but an electromagnetic valve in the gas supply pipe 18 (not shown), When the upper sensor detects a predetermined signal, the solenoid valve is opened to supply gas into the pressure vessel 2 and when the lower sensor detects a predetermined signal, the solenoid valve is closed to supply gas. It can also be configured to automatically supply the gas into the pressure-resistant container 2 such as by stopping.

前記耐圧容器２の内部の上部には、３枚の邪魔板２１ａ〜２１ｃが上下方向に積層状態で配設されている。この邪魔板２１ａ〜２１ｃは、図３〜図５に示すように、その外形形状が全て同一の円形に形成され、蓋体２ｂの内面に上端が溶接固定された複数の支持棒２２に溶接することによって蓋体２ｂに取り付けられている。そして、着脱可能な蓋体２ｂの外周フランジ２３を容器本体２ａの上端フランジ２４に被せて多数のネジ２５（図２参照）で固定した際に、耐圧容器２の全高の上部から１／４〜１／３の高さ位置となるように設定されている。また、上段邪魔板２１ａは容器本体２ａの上端フランジ２４から５０〜１５０ｍｍの位置となり、各邪魔板２１ａ〜２１ｃの間隔寸法は１００〜３００ｍｍとなるように設定されている。   Three baffle plates 21 a to 21 c are arranged in a stacked state in the vertical direction at the upper part inside the pressure vessel 2. As shown in FIGS. 3 to 5, the baffle plates 21 a to 21 c are all formed in the same circular shape, and are welded to a plurality of support rods 22 whose upper ends are welded and fixed to the inner surface of the lid 2 b. This is attached to the lid 2b. Then, when the outer peripheral flange 23 of the detachable lid 2b is put on the upper end flange 24 of the container main body 2a and fixed with a large number of screws 25 (see FIG. 2), 1/4 to The height is set to 1/3. Further, the upper baffle plate 21a is positioned 50 to 150 mm from the upper end flange 24 of the container body 2a, and the distance between the baffle plates 21a to 21c is set to 100 to 300 mm.

さらに、各邪魔板２１ａ〜２１ｃは、例えばステンレス板のプレス加工によって、図４及び図５に示すように円板状に形成されている。すなわち、上段邪魔板２１ａ、中段邪魔板２１ｂ及び下段邪魔板２１ｃは、図４（ｂ）に示す（図では上段邪魔板２１ａを示すが中段邪魔板２１ｂと下段邪魔板２１ｃも同様に形成されている）ように、円板の外周縁に上方に所定高さ立設された堰き状の帯板２６が一体形成されている。また、各邪魔板２１ａ〜２１ｃの所定位置には、所定内径の円形の落下穴２７が多数穿設されている。   Furthermore, each baffle plate 21a-21c is formed in disk shape as shown in FIG.4 and FIG.5 by the press work of a stainless steel plate, for example. That is, the upper baffle plate 21a, the middle baffle plate 21b, and the lower baffle plate 21c are shown in FIG. 4B (in the figure, the upper baffle plate 21a is shown, but the middle baffle plate 21b and the lower baffle plate 21c are formed in the same manner. As shown in the figure, a dam-like band plate 26 is integrally formed on the outer peripheral edge of the disc so as to stand upward at a predetermined height. A large number of circular drop holes 27 having a predetermined inner diameter are formed at predetermined positions of the baffle plates 21a to 21c.

この時、各邪魔板２１ａ〜２１ｃの落下穴２７は、中心から複数の所定半径の円周線上に円周方向に沿って等間隔、つまり列状態で形成され、上段邪魔板２１ａの落下穴２７は、図４（ａ）に示すように６列状態で、中段邪魔板２１ｂと下段邪魔板２１ｃの落下穴２７は、図５（ａ）（ｂ）に示すように３列状態でそれぞれ形成されている。また、各邪魔板２１ａ〜２１ｃの上下方向に一致する各列の落下穴２７の間隔を異ならせることにより、落下穴２７が上下方向において一致して貫通状態とならないように設定されている。なお、各邪魔板２１ａ〜２１ｃの直径方向の一端部には、前記排出パイプ６が挿通するパイプ挿通穴２８がそれぞれ形成されている。   At this time, the drop holes 27 of the respective baffle plates 21a to 21c are formed at equal intervals along the circumferential direction on a plurality of circumferential lines having a predetermined radius from the center, that is, in a row state, and the drop holes 27 of the upper baffle plate 21a. As shown in FIG. 4 (a), the drop holes 27 of the middle baffle plate 21b and the lower baffle plate 21c are formed in three rows as shown in FIGS. 5 (a) and 5 (b). ing. In addition, by setting different intervals between the drop holes 27 in the respective rows that coincide with each other in the vertical direction of the baffle plates 21a to 21c, the fall holes 27 are set so as not to coincide with each other in the vertical direction and enter the through state. A pipe insertion hole 28 through which the discharge pipe 6 is inserted is formed at one end of each baffle plate 21a to 21c in the diameter direction.

このように構成された各邪魔板２１ａ〜２１ｃは、図３に示すように、蓋体２ｂの内面に溶接固定された前記支持棒２２を、上段邪魔板２１ａと中段邪魔板２１ｂに設けた図示しない固定穴に貫通させると共に、下端を下段邪魔板２１ｃ上に当接させて各部を溶接すること等により、蓋体２ｂに一体的に取り付けられる。そして、蓋体２ｂの外周フランジ２３を容器本体２ａの上端フランジ２４に載置して、両フランジ２３、２４をネジ２５で固定することにより、蓋体２ｂが容器本体２ａに取り付けられて密閉状態の耐圧容器２が形成されると共に、３枚の邪魔板２１ａ〜２１ｃが耐圧容器２の容器本体２ａの上部に前記高さ位置で位置することになる。   As shown in FIG. 3, each of the baffle plates 21a to 21c configured as described above is provided with the support rod 22 welded and fixed to the inner surface of the lid 2b on the upper baffle plate 21a and the middle baffle plate 21b. The lower end baffle plate 21c is brought into contact with the lower end baffle plate 21c, and the respective parts are welded together. Then, the outer peripheral flange 23 of the lid 2b is placed on the upper end flange 24 of the container body 2a, and both the flanges 23, 24 are fixed with screws 25, so that the lid 2b is attached to the container body 2a and sealed. Thus, the three baffle plates 21a to 21c are located at the height position above the container body 2a of the pressure vessel 2.

そして、本発明に係わる前記３枚の邪魔板２１ａ〜２１ｃは、図６及び図７に示すように構成されている。すなわち、各邪魔板２１ａ〜２１ｃの外周縁に帯板２６を一体形成すると共に所定位置に列状の多数の落下穴２７を上下方向においてその位置が一致しないように穿設し、かつ列状の落下穴２７の間の適宜位置に、上方に所定高さ突出した突起物としての遮蔽板２９を所定枚数一体的に設ける。この時、遮蔽板２９の高さ寸法は帯板２６の高さ寸法より低く設定されて、各邪魔板２１ａ〜２１ｃの上面に溶接等によって固着される。
 The three baffle plates 21a to 21c according to the present invention are configured as shown in FIGS. That is, the band plate 26 is integrally formed on the outer peripheral edges of the baffle plates 21a to 21c, and a large number of drop holes 27 in a row are formed at predetermined positions so that their positions do not coincide with each other in the vertical direction. A predetermined number of shielding plates 29 as protrusions protruding upward by a predetermined height are integrally provided at appropriate positions between the drop holes 27. At this time, the height dimension of the shielding plate 29 is set lower than the height dimension of the band plate 26 and is fixed to the upper surfaces of the baffle plates 21a to 21c by welding or the like.

この邪魔板２１ａ〜２１ｃによれば、遮蔽板２９によって各邪魔板２１ａ〜２１ｃ上において処理水の落下口２７方向への流れが規制されて、各邪魔板２１ａ〜２１ｃ上を長い時間かけて流れる状態となり、各邪魔板２１ａ〜２１ｃを介して落下する処理水の落下時間を一層長く設定できることになる。なお、この邪魔板２１ａ〜２１ｃの場合、遮蔽板２９の長さや高さによって、各邪魔板２１ａ〜２１ｃ上を処理水が流れる時間を調整できるが、遮蔽板２９自体にその内外方向（各邪魔板２１ａ〜２１ｃの半径方向）に連通する流通穴を穿設することにより、流れる時間をさらに微妙に調整することも可能である。   According to the baffle plates 21a to 21c, the flow of the treated water in the direction of the drop port 27 is regulated on the baffle plates 21a to 21c by the shielding plate 29, and flows on the baffle plates 21a to 21c over a long time. It will be in a state, and the fall time of the treated water which falls via each baffle plate 21a-21c can be set still longer. In the case of the baffle plates 21a to 21c, the length of time and the height of the shielding plate 29 can adjust the time for the treated water to flow on the baffle plates 21a to 21c. It is also possible to finely adjust the flowing time by drilling a flow hole communicating in the radial direction of the plates 21a to 21c.

次に、前記液体浄化装置１の動作の一例を、処理液体が沈殿池の処理水で気体が酸素ガスである場合を例にして説明する。先ず、液体浄化装置１を所定位置に設置した状態で、揚水ポンプ８を作動させて供給調整バルブ１０を開状態にすると、処理水が沈殿池からくみ上げられて外部供給管７から、蓋体２ｂの液体供給パイプ５の液体供給口５ｂから耐圧容器２内に吐出される。また、処理水の供給を開始したら、ガス流量調整バルブ１４を開状態にして耐圧容器２内に酸素ガスを供給し、この時、圧力計１６で確認しながら、耐圧容器２内の圧力が前述した所定値となるように設定する。   Next, an example of the operation of the liquid purification apparatus 1 will be described by taking as an example the case where the treatment liquid is the treatment water of the settling basin and the gas is oxygen gas. First, when the liquid purification apparatus 1 is installed at a predetermined position and the pumping pump 8 is operated to open the supply adjustment valve 10, the treated water is drawn up from the settling basin and is supplied from the external supply pipe 7 to the lid 2 b. From the liquid supply port 5 b of the liquid supply pipe 5. When the supply of the treated water is started, the gas flow rate adjustment valve 14 is opened to supply oxygen gas into the pressure vessel 2, and at this time, the pressure in the pressure vessel 2 is checked with the pressure gauge 16 while the pressure in the pressure vessel 2 is as described above. The predetermined value is set.

そして、液体供給口５ｂから耐圧容器２内に吐出された処理水は、図８に示すように、耐圧容器２内の最上部から矢印イの如く拡散される状態で下方の各邪魔板２１ａ〜２１ｃ上に落下する。この各邪魔板２１ａ〜２１ｃ上に落下した処理水は、先ず上段邪魔板２１ａ上に落下してこの上段邪魔板２１ａの落下穴２７から矢印ロの如く中段邪魔板２１ｂ上に落下し、この中段邪魔板２１ｂの落下穴２７から矢印ハの如く下段邪魔板２１ｃ上に落下し、さらに、この下段邪魔板２１ｃの落下穴２７から矢印ニの如く容器本体２ａの下方に落下する。   Then, the treated water discharged from the liquid supply port 5b into the pressure vessel 2 is diffused from the uppermost portion of the pressure vessel 2 as indicated by an arrow a in the respective baffle plates 21a to 21b below. It falls on 21c. The treated water dropped on the baffle plates 21a to 21c first falls on the upper baffle plate 21a and falls on the middle baffle plate 21b as indicated by the arrow b from the drop hole 27 of the upper baffle plate 21a. From the drop hole 27 of the baffle plate 21b, it falls onto the lower baffle plate 21c as indicated by the arrow C, and further falls from the drop hole 27 of the lower baffle plate 21c to the lower side of the container body 2a as indicated by the arrow D.

この処理水の各邪魔板２１ａ〜２１ｃの落下穴２７の通過による落下時に、各邪魔板２１ａ〜２１ｃの落下穴２７が上下方向に異なる位置に形成されていることから、各邪魔板２１ａ〜２１ｃ上に落下した処理水が直接下方に落下することがなくなると共に、各邪魔板２１ａ〜２１ｃの帯板２６によりその外周縁外方への処理水の落下が確実に防止されつつ、各邪魔板２１ａ〜２１ｃ上を所定方向に流れた後に落下穴２７から下方に落下する状態となる。これにより、上段邪魔板２１ａ上に落下した処理水の各邪魔板２１ａ〜２１ｃを通過して落下するための時間が長く、すなわち各邪魔板２１ａ〜２１ｃ上の処理水への酸素ガスの接触時間（圧力の作用時間）が長くなって、酸素ガスが処理水内に良好に溶解されることになる。   Since the baffle holes 27 of the baffle plates 21a to 21c are formed at different positions in the vertical direction when the baffle plates 21a to 21c are dropped due to the passage of the drop holes 27, the baffle plates 21a to 21c. The treated water that has dropped down does not fall directly downward, and the baffle plates 26 of the baffle plates 21a to 21c reliably prevent the treated water from falling outward from the outer peripheral edge of each baffle plate 21a. It will be in the state which falls below from the fall hole 27, after flowing on 21c on a predetermined direction. Thereby, the time for passing through the baffle plates 21a to 21c dropped on the upper baffle plate 21a and dropping is long, that is, the contact time of oxygen gas to the treated water on the baffle plates 21a to 21c. The (pressure action time) becomes longer, and the oxygen gas is well dissolved in the treated water.

そして、各邪魔板２１ａ〜２１ｃを介した落下により酸素ガスが溶解した処理水は、下段邪魔板２１ｃの下方から矢印ホの如く容器本体２ａ内に落下する際にも、処理水ＷのゴミＳが付着した水玉ＷＳの表面に酸素ガスの圧力が作用して酸素ガスが処理水Ｗ（水玉ＷＳ）中に溶解しつつつつ落下し、これが容器本体２ａの下部に貯留される。この容器本体２ａ内に貯留された処理水Ｗに溶解された酸素は、図９に示すように、処理水Ｗ中で気泡Ｋになると共にゴミＳが付着した状態となり、このゴミＳが付着した気泡Ｋが処理水Ｗ内を矢印ヘの如く浮上して処理水Ｗの表面に漂うことになる。この気泡Ｋを、例えば液体浄化装置１の保守（清掃）時に、蓋体２ｂを容器本体２ａから取り外して矢印トの如く払ってすくい上げること等により、ゴミＳが耐圧容器２内から除去される。   The treated water in which the oxygen gas is dissolved by dropping through the baffle plates 21a to 21c also falls into the container main body 2a as shown by the arrow H from below the lower baffle plate 21c. The pressure of the oxygen gas acts on the surface of the polka dots WS to which the water adheres, and the oxygen gas falls while dissolving in the treated water W (polka dots WS), and this is stored in the lower part of the container body 2a. As shown in FIG. 9, the oxygen dissolved in the treated water W stored in the container body 2 a becomes a bubble K in the treated water W and is in a state where dust S adheres, and the dust S adheres. The bubbles K float in the treated water W as indicated by arrows and float on the surface of the treated water W. For example, during maintenance (cleaning) of the liquid purification apparatus 1, the dust S is removed from the pressure-resistant container 2 by removing the lid 2b from the container main body 2a and scooping up the bubbles K as indicated by arrows.

つまり、３枚の邪魔板２１ａ〜２１ｃによって、処理水Ｗと酸素ガスの接触時間が長くなり酸素ガスが処理水Ｗ内に良好に溶解されつつ下方に落下すると共に、容器本体２ａの下部に貯留されている処理水Ｗの水面に到達するまでの間も酸素ガスと接触し続けて、その表面張力によって球体の水玉ＷＳに近い状態を保ちつつ落下する。この時、耐圧容器２内が前記所定圧力で加圧されて圧縮されていることから、水玉ＷＳの濃度が高くなって酸素ガスの処理水Ｗへの溶解効率が一層高められることになる。   That is, the three baffle plates 21a to 21c increase the contact time between the treated water W and the oxygen gas, and the oxygen gas falls down while being well dissolved in the treated water W, and is stored in the lower portion of the container body 2a. Until it reaches the water surface of the treated water W, it continues to come into contact with the oxygen gas and falls while maintaining a state close to the spherical polka dots WS due to its surface tension. At this time, since the inside of the pressure vessel 2 is pressurized and compressed at the predetermined pressure, the concentration of the polka dots WS is increased, and the dissolution efficiency of the oxygen gas into the treated water W is further enhanced.

そして、処理水Ｗを耐圧容器２内に一定量、一定時間貯留させることで、酸素ガスと処理水Ｗが混合した状態から、酸素ガスを気泡Ｋとして処理水Ｗから分離させることができ、酸素ガスが処理水Ｗに溶解した部分の液体、すなわち清浄な水のみが液体排出口６ａから排出される。この時、処理水Ｗの供給や排出の制御及び酸素ガスの供給制御を、図示しない流量計や液面センサ等の感知で自動的に行うことにより、処理水Ｗの耐圧容器２内における滞留時間と滞留液体量が一定に維持される。   Then, by storing the treated water W in the pressure-resistant vessel 2 for a certain amount of time, the oxygen gas can be separated from the treated water W as bubbles K from the state where the oxygen gas and the treated water W are mixed, Only the liquid in which the gas is dissolved in the treated water W, that is, only clean water is discharged from the liquid discharge port 6a. At this time, the supply time and the discharge control of the treated water W and the supply control of the oxygen gas are automatically performed by sensing a flow meter, a liquid level sensor, etc. (not shown) so that the residence time of the treated water W in the pressure vessel 2 is obtained. And the amount of staying liquid is kept constant.

なお、前記処理液体として汚染された処理水を使用し気体として酸素ガスを使用すると共に、耐圧容器２の大きさとして全高＝１０００ｍｍで外径φ＝２７０ｍｍ、図４及び図５に示す邪魔板２１ａ〜２１ｃの落下穴２７の直径＝３０ｍｍのものを使用し、耐圧容器２内の圧力を変化させた場合の排出される水の状態について確認したところ、耐圧容器２内の圧力が１ｋｇ／ｃｍ２〜３ｋｇ／ｃｍ２の範囲が最適であることが判明した。この理由としては、圧力が１ｋｇ／ｃｍ２を下回るような低い圧力だと、酸素ガスの処理水への溶解が十分に行われず、逆に圧力が３ｋｇ／ｃｍ２を超えるような高い圧力だと、大気圧との差が大きくなりすぎて処理水がほとんとんど泡状になってしまい、十分な浄化効果が得られなくなるものと考えられる。 In addition, while using contaminated treated water as the treated liquid and oxygen gas as the gas, the pressure vessel 2 has a total height = 1000 mm and an outer diameter φ = 270 mm, baffle plate 21a shown in FIG. 4 and FIG. When the diameter of the fall hole 27 of ˜21c = 30 mm was used and the state of the discharged water when the pressure in the pressure vessel 2 was changed was confirmed, the pressure in the pressure vessel 2 was 1 kg / cm 2. A range of ˜3 kg / cm 2 has been found to be optimal. The reason for this is that if the pressure is low enough to be less than 1 kg / cm 2 , oxygen gas will not be sufficiently dissolved in the treated water, and conversely if the pressure is high such that the pressure exceeds 3 kg / cm 2 . It is considered that the difference from the atmospheric pressure becomes too large, so that the treated water becomes almost foamy and a sufficient purification effect cannot be obtained.

このように、上記実施形態の液体浄化装置１にあっては、邪魔板２１ａ〜２１ｃが、その外形形状が同一の円形に形成されて外周縁に上方に突出した帯板２６が設けられると共に、多数の落下穴２７が上下において異なる位置に形成されていため、帯板２６により各邪魔板２１ａ〜２１ｃ上に落下した処理水の外周縁部からの落下を確実に阻止して、各邪魔板２１ａ〜２１ｃ上を流しつつ各落下穴２７から落下させることができ、処理水の各邪魔板２１ａ〜２１ｃを介した落下速度を遅らせて酸素ガスとの接触時間を十分に長くすることができる。   Thus, in the liquid purification apparatus 1 of the above-described embodiment, the baffle plates 21a to 21c are formed in the same circular shape and provided with the band plate 26 protruding upward at the outer peripheral edge, Since a large number of drop holes 27 are formed at different positions in the upper and lower directions, the strip 26 reliably prevents the treated water falling on the baffle plates 21a to 21c from dropping from the outer peripheral edge portion, and each baffle plate 21a. It can be dropped from each drop hole 27 while flowing over 21c, and the contact speed with oxygen gas can be made sufficiently long by delaying the drop speed via the baffle plates 21a-21c of the treated water.

また、各邪魔板２１ａ〜２１ｃの上面に所定高さの遮蔽板２９が設けられているため、各邪魔板２１ａ〜２１ｃ上での処理水の流れを制御して処理水の流れる時間を一層長くして、この間にも酸素ガスの圧力を作用（接触）させることができ、特に、各邪魔板２１ａ〜２１ｃに設けられる遮蔽板２９の位置を上下において異ならせることにより、処理水の各邪魔板２１ａ〜２１ｃを介した落下速度をより一層遅らせることができる。これらにより、処理水に酸素ガスを良好に溶解させることができて、処理水の処理時間を大幅に短縮できる等、処理水の浄化作業の効率を向上させることが可能となる。
Further, since the shield plate 29 having a predetermined height is provided on the upper surface of each baffle plate 21a to 21c, the flow of the treated water is further controlled by controlling the flow of the treated water on each baffle plate 21a to 21c. During this time, the pressure of the oxygen gas can be applied (contacted), and in particular, each baffle plate of the treated water can be obtained by making the positions of the shielding plates 29 provided on the baffle plates 21a to 21c different from each other. The falling speed via 21a-21c can be further delayed. As a result, the oxygen gas can be dissolved well in the treated water, and the treatment time of the treated water can be improved, for example, the treatment time of the treated water can be greatly shortened.

さらに、ガス供給源１５から耐圧容器２内に供給される酸素ガスの圧力が１ｋｇ／ｃｍ２〜３ｋｇ／ｃｍ２に設定されるため、最適圧力の酸素ガスを処理水内に良好に溶解させることができ、この酸素ガスに浮遊物を付着させて処理水の水面上に確実に浮上させることができて、処理水の浄化作業の一層の効率向上を図ることができる。 Further, since the pressure of the oxygen gas supplied from the gas supply source 15 into the pressure-resistant container 2 is set to 1kg / cm 2 ~3kg / cm 2 , thereby favorably dissolve the oxygen gas of the optimum pressure within the processing water It is possible to make floating matter adhere to the oxygen gas and ascend to the surface of the treated water with certainty, thereby further improving the efficiency of the treatment water purification operation.

また、耐圧容器２内に例えば用途に応じた酸素ガス、窒素ガス、炭酸ガス、オゾンガス等を供給することができるため、液体浄化装置１を各種ガスに応じた用途で使用できて、液体浄化装置１の汎用性の向上が図れ、特に、邪魔板２１ａ〜２１ｃの落下穴２７の位置や形態を処理液体の種類に応じて設定すること等により、液体浄化装置１の汎用性を一層高めることが可能となる。   Further, for example, oxygen gas, nitrogen gas, carbon dioxide gas, ozone gas or the like according to the application can be supplied into the pressure resistant container 2, so that the liquid purification apparatus 1 can be used for various purposes according to the liquid purification apparatus. 1 can be improved, and in particular, the versatility of the liquid purification apparatus 1 can be further enhanced by setting the position and form of the drop holes 27 of the baffle plates 21a to 21c according to the type of the processing liquid. It becomes possible.

またさらに、３枚の邪魔板２１ａ〜２１ｃが容器本体２ａに着脱される蓋体２ｂに一体的に固定されているため、予め蓋体２ｂに溶接等により邪魔板２１ａ〜２１ｃを所定間隔で配置できたり、蓋体２ｂの内面の各種コーティング作業が簡単に行える等、液体浄化装置１の製造を容易に行うことができると共に、蓋体２ｂを取り外すことで容器本体２ａ内や邪魔板２１ａ〜２１ｃが固定された蓋体２ｂ等の清掃やゴミＳの除去が簡単に行え、点検・保守作業を容易に行うこともできる。その結果、製造コストの低減化や保守コストの低減化が図れて安価な液体浄化装置１を提供することが可能となる。   Further, since the three baffle plates 21a to 21c are integrally fixed to the lid body 2b attached to and detached from the container main body 2a, the baffle plates 21a to 21c are previously arranged on the lid body 2b at predetermined intervals by welding or the like. The liquid purification device 1 can be easily manufactured, such as being able to perform various coating operations on the inner surface of the lid body 2b, and removing the lid body 2b, and the inside of the container body 2a and the baffle plates 21a to 21c. It is possible to easily clean the lid 2b and the like, and to remove the dust S, and to easily perform inspection and maintenance work. As a result, it is possible to reduce the manufacturing cost and the maintenance cost and to provide an inexpensive liquid purifying apparatus 1.

なお、上記実施形態における各邪魔板２１ａ〜２１ｃの落下穴２７は、全て同一直径の円形穴に限らず、邪魔板２１ａ〜２１ｃ毎に異なる直径の円形穴や楕円形状、方形状等の落下穴２７としても良い。また、各邪魔板２１ａ〜２１ｃの落下穴２７の穴径を、例えば粘性の高い処理液体や浮遊物の多い処理液体の場合あるいは供給される処理液体の量が多い場合に大きくする等、液体浄化装置１の用途に応じて穴径等の形状を適宜に設定して、液体浄化装置１の汎用性を一層高めることもできる。   In addition, the drop holes 27 of the baffle plates 21a to 21c in the above-described embodiment are not limited to circular holes having the same diameter, but fall holes having different diameters, oval shapes, rectangular shapes, or the like for the baffle plates 21a to 21c. 27 may be used. Further, the liquid purification such as increasing the diameter of the drop hole 27 of each baffle plate 21a to 21c, for example, in the case of a processing liquid having a high viscosity or a processing liquid with a lot of suspended matters or a large amount of processing liquid supplied. The versatility of the liquid purification apparatus 1 can be further enhanced by appropriately setting the shape such as the hole diameter according to the application of the apparatus 1.

さらに、上記実施形態においては、耐圧容器２の内部の上部に３枚の邪魔板２１ａ〜２１ｃを配設する場合について説明したが、２枚あるいは４枚以上の複数枚の邪魔板を配設しても良い。また、上記実施形態における、耐圧容器２の大きさ、配管構造等の形態等も一例であって、本発明に係わる各発明の要旨を逸脱しない範囲において適宜に変更することができる。   Furthermore, in the above-described embodiment, the case where the three baffle plates 21a to 21c are arranged in the upper part of the pressure vessel 2 has been described. However, two or four or more baffle plates are arranged. May be. Moreover, the size of the pressure vessel 2 and the form of the piping structure and the like in the above embodiment are examples, and can be appropriately changed without departing from the gist of each invention according to the present invention.

本発明は、耐圧容器内に処理液体を供給し処理した清浄な液体を外部に排出する構成に限らず、例えば廃水に含まれるゴミ等を浮上させてこれを除去する加圧浮上装置としても適用できる。   The present invention is not limited to the configuration in which the treated liquid is supplied into the pressure vessel and the treated clean liquid is discharged to the outside. For example, the present invention is also applied as a pressurized levitation device that floats and removes dust contained in wastewater. it can.

本発明に係わる液体浄化装置の一実施形態を正面側から見た構成図The block diagram which looked at one Embodiment of the liquid purification apparatus concerning this invention from the front side 同その平面図The plan view 同蓋体の正面図Front view of the lid 同上段邪魔板の基本概念を示す（ａ）が平面図（ｂ）が断面図(A) is a plan view showing the basic concept of the same baffle plate (b) is a sectional view 同中段邪魔板及び下段邪魔板の基本概念を示す平面図The top view which shows the basic concept of the middle baffle and the lower baffle 同上段邪魔板の具体例を示す（ａ）が平面図（ｂ）が断面図(A) is a plan view showing a specific example of the same baffle plate (b) is a sectional view 同中段邪魔板及び下段邪魔板の具体例を示す平面図The top view which shows the specific example of the same middle baffle plate and a lower baffle plate 同装置の動作説明図Operation explanation diagram of the device 同他の動作説明図Other operation explanation diagram

符号の説明Explanation of symbols

１・・・液体浄化装置、２・・・耐圧容器、２ａ・・・容器本体、２ｂ・・・蓋体、５・・・液体供給パイプ、５ａ・・・液体供給口、６・・・排出パイプ、６ａ・・・液体排出口、７・・・外部供給管、８・・・揚水ポンプ、９・・・逆止弁、１０・・・液体供給調整バルブ、１１・・・外部排出管、１２・・・圧力・吐出量調整バルブ、１３・・・ガス供給口（気体供給口）、１４・・・ガス流量調整バルブ、１５・・・ガス供給源（気体供給源）、１８・・・ガス供給管、１９・・・モニター管、２１ａ・・・上段邪魔板、２１ｂ・・・中段邪魔板、２１ｃ・・・下段邪魔板、２６・・・帯板、２７・・・落下穴、２９、遮蔽板（突起物）、Ｗ・・・処理水、ＷＳ・・・水玉、Ｓ・・・ゴミ、Ｋ・・・気泡。   DESCRIPTION OF SYMBOLS 1 ... Liquid purification apparatus, 2 ... Pressure-resistant container, 2a ... Container main body, 2b ... Lid body, 5 ... Liquid supply pipe, 5a ... Liquid supply port, 6 ... Discharge Pipe, 6a ... liquid discharge port, 7 ... external supply pipe, 8 ... pumping pump, 9 ... check valve, 10 ... liquid supply adjustment valve, 11 ... external discharge pipe, DESCRIPTION OF SYMBOLS 12 ... Pressure / discharge amount adjustment valve, 13 ... Gas supply port (gas supply port), 14 ... Gas flow rate adjustment valve, 15 ... Gas supply source (gas supply source), 18 ... Gas supply pipe, 19 ... monitor pipe, 21a ... upper baffle, 21b ... middle baffle, 21c ... lower baffle, 26 ... band, 27 ... fall hole, 29 , Shielding plates (projections), W ... treated water, WS ... polka dots, S ... dust, K ... bubbles.

Claims (1)

上部に液体供給口と気体供給口が設けられ下部に液体排出口が設けられた耐圧容器と、該耐圧容器内に前記気体供給口から気体を供給する気体供給源と、を備え、前記液体供給口から前記耐圧容器内に供給した処理液体の表面に、前記気体供給口から前記耐圧容器内に供給した気体の圧力を作用させて前記処理液体を浄化する液体浄化装置であって、
前記耐圧容器は、その内部の上部に、外形がそれぞれ同一形状に形成され外周縁に上方に突出した帯板が設けられると共に、円周方向に配置された複数の列状の落下穴が上下において異なる位置に形成された複数の邪魔板が積層状態で配設され、該複数の邪魔板は、その上面の複数箇所に上方に所定高さ突出した板体からなる突起物が設けられ、該突起物が上下の邪魔板において異なる位置で前記落下穴の列間に所定間隔で設けられていることを特徴とする液体浄化装置。 Comprising a pressure vessel a liquid discharge port provided in the lower liquid supply port and the gas supply port is provided on the upper, and a gas supply source for supplying gas from the gas supply port into the pressure vessel, the liquid supply A liquid purifier for purifying the processing liquid by applying a pressure of the gas supplied from the gas supply port to the inside of the pressure vessel on the surface of the processing liquid supplied from the mouth into the pressure vessel ;
The pressure vessel is provided with a band plate formed in the same shape at the top inside thereof and protruding upward at the outer peripheral edge, and a plurality of rows of dropping holes arranged in the circumferential direction are provided at the top and bottom. A plurality of baffle plates formed at different positions are arranged in a stacked state, and the plurality of baffle plates are provided with projections made of plate bodies protruding upward at a predetermined height at a plurality of locations on the upper surface thereof. A liquid purifying apparatus , wherein objects are provided at predetermined intervals between rows of the drop holes at different positions on the upper and lower baffle plates .
JP2005377280A 2005-12-28 2005-12-28 Liquid purification device Active JP4859457B2 (en)

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Publication number Priority date Publication date Assignee Title
CN108017140A (en) * 2017-12-08 2018-05-11 安徽金联地矿科技有限公司 A kind of waste water treatment system based on the micro-nano bubble of ozone

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JP5927556B2 (en) * 2012-05-10 2016-06-01 パナソニックＩｐマネジメント株式会社 Gas dissolving device
JP6617228B2 (en) * 2017-09-29 2019-12-11 株式会社ヤマト Water agitator

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JP3375348B2 (en) * 1992-05-13 2003-02-10 有限会社ヤマヱ Oxygen replenishment equipment for wastewater purification equipment
JP3819732B2 (en) * 2001-05-28 2006-09-13 横河電機株式会社 Gas dissolving device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108017140A (en) * 2017-12-08 2018-05-11 安徽金联地矿科技有限公司 A kind of waste water treatment system based on the micro-nano bubble of ozone

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