JP4840532B2 - ガスクロマトグラフ - Google Patents
ガスクロマトグラフ Download PDFInfo
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- JP4840532B2 JP4840532B2 JP2010505066A JP2010505066A JP4840532B2 JP 4840532 B2 JP4840532 B2 JP 4840532B2 JP 2010505066 A JP2010505066 A JP 2010505066A JP 2010505066 A JP2010505066 A JP 2010505066A JP 4840532 B2 JP4840532 B2 JP 4840532B2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 25
- 229910052710 silicon Inorganic materials 0.000 claims description 25
- 239000010703 silicon Substances 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 25
- 239000007789 gas Substances 0.000 claims description 19
- 238000000926 separation method Methods 0.000 claims description 11
- 239000012159 carrier gas Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 10
- 229910021426 porous silicon Inorganic materials 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 238000007599 discharging Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 238000000347 anisotropic wet etching Methods 0.000 claims description 3
- 230000008016 vaporization Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 11
- 238000005530 etching Methods 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229940090046 jet injector Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000009279 wet oxidation reaction Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/04—Preparation or injection of sample to be analysed
- G01N30/16—Injection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/02—Burettes; Pipettes
- B01L3/0241—Drop counters; Drop formers
- B01L3/0268—Drop counters; Drop formers using pulse dispensing or spraying, eg. inkjet type, piezo actuated ejection of droplets from capillaries
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/00351—Means for dispensing and evacuation of reagents
- B01J2219/00378—Piezoelectric or ink jet dispensers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/02—Adapting objects or devices to another
- B01L2200/026—Fluid interfacing between devices or objects, e.g. connectors, inlet details
- B01L2200/027—Fluid interfacing between devices or objects, e.g. connectors, inlet details for microfluidic devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0832—Geometry, shape and general structure cylindrical, tube shaped
- B01L2300/0838—Capillaries
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/04—Moving fluids with specific forces or mechanical means
- B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
- B01L2400/0433—Moving fluids with specific forces or mechanical means specific forces vibrational forces
- B01L2400/0439—Moving fluids with specific forces or mechanical means specific forces vibrational forces ultrasonic vibrations, vibrating piezo elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/04—Moving fluids with specific forces or mechanical means
- B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
- B01L2400/0442—Moving fluids with specific forces or mechanical means specific forces thermal energy, e.g. vaporisation, bubble jet
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N2030/022—Column chromatography characterised by the kind of separation mechanism
- G01N2030/025—Gas chromatography
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Clinical Laboratory Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Sampling And Sample Adjustment (AREA)
Description
分析化学 Vol.54, No.6, pp.533-539 (2005) P.Steiner et al., Micromachining applications of porous silicon, Thin Solid Films 255 (1995) 52-58
4 インジェクタ
6 インサート
8 吐出口
13 インジェクタ領域
14 第1位置決め部としての凹部
18 密閉容器
20 試料入口
22 加熱部
24 排出口
26 分離カラムとしてのキャピラリカラム
28 インサート領域
32 ヒータ
38 断熱領域
40 キャリアガス供給口
42 検出器
図1A〜図1Dは一実施例のガスクロマトグラフの概略構成図である。図1Aは試料注入部の平面図であり、密閉容器とインサートを透視して一部を断面図で示している。図1Bは同実施例の正面図であり、密閉容器を透視して示している。図1Cは図1AのC−C線位置での断面図、図1Dはインサートとキャピラリカラムとの接続状態を示す断面図である。図2は基台と基台に位置決めされて固定されたインジェクタ及びインサートを示す斜視図である。
Claims (6)
- 液体試料を圧電素子によって吐出するインジェクタと、
前記インジェクタから吐出された液体試料を受け取る試料入口、受け取った液体試料を加熱して気化する加熱部及び気化した試料を排出する排出口をもつインサートと、
断熱領域を挟んで一端側がインジェクタ領域、他端側がインサート領域となっている基台であって、前記インジェクタ領域には前記インジェクタを位置決めする第1位置決め部が設けられ、前記インサート領域には前記インジェクタの吐出口の中心と前記インサートの試料入口中心とが同一直線上にくるように前記インサートを位置決めする第2の位置決め部が設けられている基台と、
前記基台のインサート領域において前記インサートの加熱部を加熱するように配置されたヒータと、
前記インジェクタの試料吐出口及び前記インサートの試料入口を共通の内部空間に含むように被い、キャリアガスが供給されるキャリアガス供給口をもつ密閉容器と、
前記インサートの排出口に接続された分離カラムと、
前記分離カラムの下流に接続された検出器と、
を備えたガスクロマトグラフ。 - 前記インサートは円筒状の外形形状をもち、前記基台はシリコン基板からなり前記第2の位置決め部はシリコン基板の異方性ウエットエッチングにより形成された断面がV字型の溝であり、前記インサートは第2の位置決め部の溝に嵌め込まれることにより位置決めされている請求項1に記載のガスクロマトグラフ。
- 前記分離カラムはキャピラリカラムであり、前記インサートはその内部空間が前記キャピラリカラムと連通するようにキャピラリカラムに接続されており、
前記インサートの試料入口は直径が1mm以下である請求項2に記載のガスクロマトグラフ。 - 前記インジェクタの底面は矩形の平坦面であり、前記第1の位置決め部は前記基台に形成された平坦面をもつ凹部であり、前記凹部の底面が前記インジェクタの底面形状と一致する形状に形成されており、前記インジェクタが前記凹部に嵌め込まれることにより位置決めされている請求項2又は3に記載のガスクロマトグラフ。
- 前記断熱領域は前記基台に形成された多孔質二酸化シリコンからなる領域である請求項2から4のいずれか一項に記載のガスクロマトグラフ。
- 前記ヒータは基台上に形成された金属薄膜抵抗体である請求項1から5のいずれかに記載のガスクロマトグラフ。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2008/055542 WO2009118825A1 (ja) | 2008-03-25 | 2008-03-25 | ガスクロマトグラフ |
Publications (2)
Publication Number | Publication Date |
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JPWO2009118825A1 JPWO2009118825A1 (ja) | 2011-07-21 |
JP4840532B2 true JP4840532B2 (ja) | 2011-12-21 |
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Application Number | Title | Priority Date | Filing Date |
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JP2010505066A Active JP4840532B2 (ja) | 2008-03-25 | 2008-03-25 | ガスクロマトグラフ |
Country Status (2)
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JP (1) | JP4840532B2 (ja) |
WO (1) | WO2009118825A1 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000137034A (ja) * | 1998-10-30 | 2000-05-16 | Shimadzu Corp | 液体注入装置 |
JP2002207027A (ja) * | 2001-01-11 | 2002-07-26 | Shimadzu Corp | 微小流路を有する樹脂製部材の作製方法、その方法により作製された部材およびそれを用いた計測装置 |
WO2008026241A1 (fr) * | 2006-08-28 | 2008-03-06 | Shimadzu Corporation | Chromatographe en phase gazeuse |
-
2008
- 2008-03-25 JP JP2010505066A patent/JP4840532B2/ja active Active
- 2008-03-25 WO PCT/JP2008/055542 patent/WO2009118825A1/ja active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000137034A (ja) * | 1998-10-30 | 2000-05-16 | Shimadzu Corp | 液体注入装置 |
JP2002207027A (ja) * | 2001-01-11 | 2002-07-26 | Shimadzu Corp | 微小流路を有する樹脂製部材の作製方法、その方法により作製された部材およびそれを用いた計測装置 |
WO2008026241A1 (fr) * | 2006-08-28 | 2008-03-06 | Shimadzu Corporation | Chromatographe en phase gazeuse |
Also Published As
Publication number | Publication date |
---|---|
JPWO2009118825A1 (ja) | 2011-07-21 |
WO2009118825A1 (ja) | 2009-10-01 |
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