JP4779391B2 - Pure water production equipment - Google Patents

Pure water production equipment Download PDF

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JP4779391B2
JP4779391B2 JP2005079702A JP2005079702A JP4779391B2 JP 4779391 B2 JP4779391 B2 JP 4779391B2 JP 2005079702 A JP2005079702 A JP 2005079702A JP 2005079702 A JP2005079702 A JP 2005079702A JP 4779391 B2 JP4779391 B2 JP 4779391B2
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成一 小野田
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Kurita Water Industries Ltd
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本発明は純水製造装置に係り、特に原水を逆浸透膜装置と電気脱イオン装置とによって処理するようにした純水製造装置に関する。   The present invention relates to a pure water production apparatus, and more particularly to a pure water production apparatus in which raw water is treated by a reverse osmosis membrane apparatus and an electrodeionization apparatus.

工水、市水、井水或いは半導体製造工程等からの回収水を処理して純水を製造するシステムとして、原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理する装置が周知である（例えば下記特許文献１，２）。   As a system for producing purified water by treating recovered water from industrial water, city water, well water, or semiconductor manufacturing processes, etc., a device that treats raw water with a reverse osmosis membrane device and then with an electrodeionization device is well known. (For example, Patent Documents 1 and 2 below).

図１（ｂ）は逆浸透膜装置及び電気脱イオン装置を用いた従来の純水製造装置の一例を示す系統図である。   FIG.1 (b) is a systematic diagram which shows an example of the conventional pure water manufacturing apparatus using a reverse osmosis membrane apparatus and an electrodeionization apparatus.

水道水などの原水は、弁２１、流量計２２、活性炭濾過装置２３、保安フィルタ２４、給水タンク２５、給水ポンプ２６、弁２７、逆浸透膜装置（ＲＯ装置）２８、流量計２９、電気脱イオン装置（ＥＤＩ）３０、弁３１、流量計３２の順に流れて純水となる。なお、活性炭濾過装置２３には弁２３ａを有した逆洗排水排出ライン２３ｂが設けられている。逆浸透膜装置２８の濃縮水は、配管４０を介して取り出され、その一部は弁４５、流量計４６及び配管４７を介して排出され、残部は配管４１、弁４２、流量計４３、配管４４を介して給水タンク２５へ返送される。   Raw water such as tap water is supplied from a valve 21, a flow meter 22, an activated carbon filtration device 23, a safety filter 24, a feed water tank 25, a feed water pump 26, a valve 27, a reverse osmosis membrane device (RO device) 28, a flow meter 29, It flows in the order of an ion device (EDI) 30, a valve 31, and a flow meter 32 to become pure water. The activated carbon filtration device 23 is provided with a backwash drainage discharge line 23b having a valve 23a. The concentrated water of the reverse osmosis membrane device 28 is taken out through the pipe 40, a part thereof is discharged through the valve 45, the flow meter 46 and the pipe 47, and the remaining part is the pipe 41, the valve 42, the flow meter 43 and the pipe. It is returned to the water supply tank 25 via 44.

電気脱イオン装置３０の濃縮水は、弁５１、流量計５２及び配管５３を介して給水タンク２５へ返送される。電気脱イオン装置３０の電極水は、弁５５、流量計５６及び配管５７を介して排出される。   The concentrated water of the electrodeionization device 30 is returned to the water supply tank 25 via the valve 51, the flow meter 52 and the pipe 53. The electrode water of the electrodeionization apparatus 30 is discharged through a valve 55, a flow meter 56, and a pipe 57.

上記の弁２１，２７，３１，４２，４５，５１，５５はいずれも開度調整可能な構造のものである。純水製造装置の運転を開始するに際しては、給水ポンプ５６を起動した後、製造される純水の水量が規定量となるように各弁の開度を調節する必要がある。
特開２００３−１２５９号公報 特開２００１−２９７５２号公報 The valves 21, 27, 31, 42, 45, 51, 55 are all structured so that the opening degree can be adjusted. When starting the operation of the pure water production apparatus, it is necessary to adjust the opening degree of each valve so that the amount of pure water produced becomes a specified amount after the feed water pump 56 is started.
JP 2003-1259 A JP 2001-29752 A

Ｉ．図１（ｂ）の従来例においては、純水製造装置の運転開始に際し、規定量の生産水量となるように各弁の開度調節を行う必要があり、相当の人手と時間がかかっていた。   I. In the conventional example of FIG. 1 (b), it is necessary to adjust the opening of each valve so as to obtain a specified amount of produced water at the start of operation of the pure water production apparatus, which takes considerable manpower and time. .

本発明は、弁開度調節を行うことなく所要の生産水量を得るように運転開始することができる純水製造装置を提供することを第１の目的とする。   The first object of the present invention is to provide a pure water producing apparatus that can start operation so as to obtain a required amount of produced water without adjusting the valve opening.

II．原水を逆浸透膜装置及び電気脱イオン装置によって処理して純水を製造する純水製造装置においては、逆浸透膜装置によって処理される水の水温が変動すると、該逆浸透膜装置の透過水の水量が変動し、この結果、純水製造装置で製造される純水の水量が変動する。   II. In a pure water production apparatus for producing pure water by treating raw water with a reverse osmosis membrane apparatus and an electrodeionization apparatus, if the water temperature of the water treated by the reverse osmosis membrane apparatus fluctuates, the permeated water of the reverse osmosis membrane apparatus As a result, the amount of pure water produced by the pure water production apparatus fluctuates.

この水温変動による水量変動を防止するために、逆浸透膜装置の前段側に熱交換器を設置し、逆浸透膜装置への流入水の水温を一定とすることがある。しかしながら、このような熱交換器を設けると、純水製造装置の設備コストが嵩むことになる。   In order to prevent fluctuations in the amount of water due to fluctuations in the water temperature, a heat exchanger may be installed on the upstream side of the reverse osmosis membrane device to make the temperature of the inflow water to the reverse osmosis membrane device constant. However, when such a heat exchanger is provided, the equipment cost of a pure water manufacturing apparatus will increase.

本発明は、その一態様において、熱交換器を用いることなく、得られる純水の水量変動が防止される純水製造装置を提供することを第２の目的とする。   In one aspect of the present invention, a second object of the present invention is to provide an apparatus for producing pure water in which fluctuations in the amount of pure water obtained can be prevented without using a heat exchanger.

本発明（請求項１）の純水製造装置は、原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理して純水を製造する純水製造装置において、該逆浸透膜装置の濃縮水の一部をオリフィスを介して排出すると共に、残部をオリフィスを介して逆浸透膜装置の上流側へ返送し、電気脱イオン装置の濃縮水をオリフィスを介して電気脱イオン装置の上流側へ返送し、電気脱イオン装置の電極水をオリフィスを介して排出するよう構成したことを特徴とするものである。   The pure water production apparatus of the present invention (Claim 1) is a pure water production apparatus for producing pure water by treating raw water with a reverse osmosis membrane apparatus and then treating with an electrodeionization apparatus. A part of the concentrated water is discharged through the orifice and the remaining part is returned to the upstream side of the reverse osmosis membrane device through the orifice, and the concentrated water of the electrodeionization device is upstream of the electrodeionization device through the orifice. The electrode water of the electrodeionization apparatus is discharged through the orifice.

請求項２の純水製造装置は、請求項１において、該オリフィスはオリフィス板に複数の孔を設けたものであることを特徴とするものである。   The pure water production apparatus according to claim 2 is characterized in that, in claim 1, the orifice has a plurality of holes in the orifice plate.

請求項３の純水製造装置は、請求項１又は２において、該逆浸透膜装置の透過水の水温の検知手段と、該検知手段で検知された水温に基づき、逆浸透膜装置の透過水の水量が一定となるように該逆浸透膜装置への給水ポンプによる給水量を制御する給水ポンプ制御手段とを備えたことを特徴とするものである。   The pure water production apparatus according to claim 3 is the permeated water of the reverse osmosis membrane device according to claim 1 or 2, based on the water temperature detection means of the reverse osmosis membrane device and the water temperature detected by the detection means. And a water supply pump control means for controlling the amount of water supplied by the water supply pump to the reverse osmosis membrane device so that the amount of water becomes constant.

請求項４の純水製造装置は、請求項１ないし３のいずれか１項において、前記水温の検知手段は、逆浸透膜装置の透過水の導電率計又は比抵抗計の温度補正用検出器と兼用されていることを特徴とするものである。   4. The pure water production apparatus according to claim 4, wherein the water temperature detecting means is a conductivity correction meter for a permeated water of a reverse osmosis membrane device or a temperature correction detector for a specific resistance meter. It is also used as a feature.

本発明の純水製造装置は、逆浸透膜装置からの濃縮水の返送量と排出量の割合をオリフィスによって設定している。また、電気脱イオン装置からの濃縮水の返送量及び電極水の排出量をそれぞれオリフィスによって設定している。このようにオリフィスによって流量設定を行うところから、弁開度調節を行うことなく純水製造装置の運転を開始し、所要の生産水量を得ることができる。   In the pure water production apparatus of the present invention, the ratio between the return amount and the discharge amount of the concentrated water from the reverse osmosis membrane device is set by the orifice. Moreover, the return amount of the concentrated water from the electrodeionization apparatus and the discharge amount of the electrode water are respectively set by the orifices. Since the flow rate is set by the orifice in this way, the operation of the pure water production apparatus can be started without adjusting the valve opening, and the required production water amount can be obtained.

このオリフィスとして、オリフィス板に２以上の孔を設けたものを用いると、オリフィスから発生する通水騒音が減少する。   If an orifice plate having two or more holes is used as the orifice, water flow noise generated from the orifice is reduced.

本発明の純水製造装置においては、逆浸透膜装置の透過水の水温を検知し、この検知水温に基づいて逆浸透膜装置への給水量を制御することにより、該逆浸透膜装置の透過水の水量を一定とすることができる。このように逆浸透膜装置への給水量を制御することにより、逆浸透膜装置の透過水の水量変動が防止され、この結果として純水の水量変動が防止されるので、逆浸透膜装置の前段側に熱交換器を設けることが不要となり、純水製造装置の設備コストが低減される。   In the pure water production apparatus of the present invention, the permeated water temperature of the reverse osmosis membrane device is detected, and the amount of water supplied to the reverse osmosis membrane device is controlled based on the detected water temperature. The amount of water can be made constant. By controlling the amount of water supplied to the reverse osmosis membrane device in this way, fluctuations in the amount of permeated water in the reverse osmosis membrane device are prevented, and as a result, fluctuations in the amount of pure water are prevented. It is not necessary to provide a heat exchanger on the front side, and the equipment cost of the pure water production apparatus is reduced.

特に、この水温検知手段として、逆浸透膜装置の透過水の水質検知用の導電率計又は比抵抗計の温度補正用検出器を利用することにより、設備コストをさらに低減させることが可能である。   In particular, it is possible to further reduce the equipment cost by using a conductivity meter for detecting the water quality of the permeated water of the reverse osmosis membrane device or a temperature correction detector for a specific resistance meter as the water temperature detecting means. .

以下、図面を参照して実施の形態について説明する。図１は実施の形態に係る純水製造装置の系統図である。   Hereinafter, embodiments will be described with reference to the drawings. FIG. 1 is a system diagram of a pure water production apparatus according to an embodiment.

原水は、オリフィス１及び保安フィルタ２を通過し、活性炭濾過装置３によって濾過された後、給水タンク４に導入される。この給水タンク４内の水は、ポンプ５を経て逆浸透膜装置（ＲＯ）６へ送られ、脱塩処理される。逆浸透膜装置６で脱塩処理された水は、水温センサを備えた水質センサ７と接触した後、電気脱イオン装置（ＥＤＩ）８へ送られ、電気脱イオン処理される。この電気脱イオン処理水は、処理水（純水）として取り出される。   The raw water passes through the orifice 1 and the safety filter 2, is filtered by the activated carbon filter 3, and then introduced into the water supply tank 4. The water in the water supply tank 4 is sent to a reverse osmosis membrane device (RO) 6 through a pump 5 and desalted. The water demineralized by the reverse osmosis membrane device 6 is brought into contact with a water quality sensor 7 equipped with a water temperature sensor, and then sent to an electrodeionization device (EDI) 8 to be electrodeionized. This electrodeionized treated water is taken out as treated water (pure water).

逆浸透膜装置６の濃縮水の一部は、オリフィス１０、配管１１、オリフィス１２を介して排出され、残部は該配管１１から分岐した配管１３及びオリフィス１４を介して給水タンク４へ返送される。   A part of the concentrated water of the reverse osmosis membrane device 6 is discharged through the orifice 10, the pipe 11 and the orifice 12, and the remaining part is returned to the water supply tank 4 through the pipe 13 and the orifice 14 branched from the pipe 11. .

電気脱イオン装置８からの濃縮水は、配管１５及びオリフィス１６を介して給水タンク４へ返送される。電気脱イオン装置８からの電極水は、配管１７及びオリフィス１８を介して排出される。   The concentrated water from the electrodeionization device 8 is returned to the water supply tank 4 through the pipe 15 and the orifice 16. Electrode water from the electrodeionization device 8 is discharged through the pipe 17 and the orifice 18.

上記のセンサ７の水温検知信号は、ポンプ制御回路９に入力され、水温変動に起因した逆浸透膜装置６の透過水変動を補償して透過水量が一定となるように、ポンプ５の吐出量を制御する。このポンプ５の制御は、例えばインバータにより行われる。なお、一般に逆浸透膜装置の透過水量は水温が高くなる程増加し、水温が低くなる程減少する。そこで、ポンプ制御回路９は、水温が高くなる程ポンプ５の回転数を少なくし、逆に水温が低くなる程ポンプ５の回転数を増加させる。   The water temperature detection signal of the sensor 7 is input to the pump control circuit 9, and the discharge amount of the pump 5 is set so that the permeated water amount becomes constant by compensating for the permeated water variation of the reverse osmosis membrane device 6 caused by the water temperature variation. To control. The pump 5 is controlled by an inverter, for example. In general, the amount of permeated water in the reverse osmosis membrane device increases as the water temperature increases, and decreases as the water temperature decreases. Therefore, the pump control circuit 9 decreases the rotational speed of the pump 5 as the water temperature increases, and conversely increases the rotational speed of the pump 5 as the water temperature decreases.

この純水製造装置によると、逆浸透膜装置６からの濃縮水の排出量と返送量との比率の設定をオリフィス１０，１２，１４で行い、電気脱イオン装置８の濃縮水の返送量及び電極水の排出量をそれぞれオリフィス１６，１８で設定するようにしており、純水製造装置の運転に際し弁開度調節を行うことが不要である。そのため、純水製造装置に配管を接続し、原水を給水タンク４まで通過させて所定水量の活性炭濾過水を給水タンク４に溜めた後、運転開始スイッチをＯＮ操作するだけで純水製造装置を起動させ、所要水量の純水を得ることができる。従って、純水製造装置の据え付け後に専門の操作員が居なくても運転開始することができる。   According to this pure water production apparatus, the ratio between the amount of concentrated water discharged from the reverse osmosis membrane device 6 and the amount returned is set by the orifices 10, 12, and 14, and the amount of concentrated water returned from the electrodeionization device 8 and The discharge amount of the electrode water is set by the orifices 16 and 18, respectively, and it is not necessary to adjust the valve opening when the pure water production apparatus is operated. Therefore, the pipe is connected to the pure water production apparatus, the raw water is passed to the water supply tank 4 and a predetermined amount of activated carbon filtrate is collected in the water supply tank 4, and then the pure water production apparatus is simply turned on. It can be activated to obtain the required amount of pure water. Therefore, the operation can be started even without a specialized operator after the installation of the pure water production apparatus.

また、この純水製造装置によると、逆浸透膜装置６からの脱塩水の水温を水温センサで検知し、これに基づいてポンプ５の吐出量を制御して脱塩水の水量変動を防止するようにしており、脱塩水の水量変動が熱交換器を用いることなく防止されるので、得られる純水の水量変動が確実に防止されると共に、純水製造装置の設備コストも低廉である。   Moreover, according to this pure water manufacturing apparatus, the water temperature of the desalted water from the reverse osmosis membrane device 6 is detected by the water temperature sensor, and the discharge amount of the pump 5 is controlled based on the detected temperature to prevent fluctuations in the amount of desalted water. In addition, since fluctuations in the amount of demineralized water are prevented without using a heat exchanger, fluctuations in the amount of pure water obtained are reliably prevented, and the equipment cost of the pure water production apparatus is low.

加えて、この実施の形態では、水温センサとして水質センサ７の温度補正用の水温センサを利用しているので、水温センサを新設する必要がなく、これによっても純水製造装置の設備コストが一層低廉化される。   In addition, in this embodiment, since the water temperature sensor for correcting the temperature of the water quality sensor 7 is used as the water temperature sensor, there is no need to newly install a water temperature sensor, which also increases the equipment cost of the pure water production apparatus. It will be cheaper.

本発明において、処理対象となる原水は、工水、市水、井水又は製造プロセス回収水、例えば半導体又は液晶等の製造プロセスの洗浄排水等であり、これらの２種以上を混合して原水としても良い。半導体製造回収水のような製造プロセス回収水を原水とする場合であって、当該回収水の有機物（ＴＯＣ）濃度が高い場合には、生物処理手段、加熱手段、触媒による分解手段等のＴＯＣ除去装置で予め処理してもよい。   In the present invention, raw water to be treated is industrial water, city water, well water or manufacturing process recovered water, for example, washing waste water of a manufacturing process such as semiconductor or liquid crystal. It is also good. When manufacturing process recovered water such as semiconductor manufacturing recovered water is used as raw water, and the organic matter (TOC) concentration of the recovered water is high, TOC removal such as biological treatment means, heating means, catalytic decomposition means, etc. You may process beforehand with an apparatus.

また、工水、市水、井水等の原水は、必要に応じてこの実施の形態のように、活性炭濾過装置３などで前処理するのが好ましい。なお、活性炭濾過装置以外のものとして限外濾過（ＵＦ）膜装置、精密濾過（ＭＦ）膜装置等を用いてもよい。   In addition, raw water such as industrial water, city water, and well water is preferably pretreated with the activated carbon filtration device 3 or the like as in this embodiment, if necessary. In addition, you may use an ultrafiltration (UF) membrane apparatus, a microfiltration (MF) membrane apparatus, etc. as things other than an activated carbon filtration apparatus.

原水又はその前処理水（又はＴＯＣ除去処理水）は、ＨＣｌ，Ｈ２ＳＯ４等の鉱酸を添加してｐＨ４〜６に調整した後、脱酸素装置で処理してもよい。 The raw water or its pretreated water (or TOC removal treated water) may be treated with a deoxygenation apparatus after adding a mineral acid such as HCl and H 2 SO 4 to adjust the pH to 4-6.

ここで、ｐＨ調整は酸素と共に炭酸ガスを除去するために行うものであり、後段の脱塩装置の負荷を軽減させる。この脱酸素装置としては、膜脱気装置、真空脱気装置、空気ガス脱気装置等を用いることができる。ｐＨを酸性として脱酸素装置で脱酸素処理した場合は、その後、ＮａＯＨ等のアルカリを添加してｐＨ７〜８に調整する。   Here, pH adjustment is performed in order to remove carbon dioxide together with oxygen, and reduces the load on the subsequent desalting apparatus. As this deoxygenating device, a membrane degassing device, a vacuum degassing device, an air gas degassing device or the like can be used. When the pH is acid and the deoxygenation is performed by the deoxygenation device, an alkali such as NaOH is added to adjust the pH to 7-8.

逆浸透膜装置の膜としては特に制限はなく、ポリスルホン、ポリアミド、ポリ酢酸ビニル等の膜を用いることができる。   There is no restriction | limiting in particular as a film | membrane of a reverse osmosis membrane apparatus, Membranes, such as a polysulfone, polyamide, a polyvinyl acetate, can be used.

電気脱イオン装置８としては、陽極を備える陽極室と陰極を備える陰極室との間に、複数のアニオン交換膜及びカチオン交換膜を交互に配列して濃縮室と脱塩室とを交互に形成し、脱塩室にアニオン交換樹脂とカチオン交換樹脂との混合樹脂やイオン交換繊維等のイオン交換体を充填したもの等を使用することができる。この電気脱イオン装置５の印加電圧は１０〜１００Ｖ特に３０〜７０Ｖ程度が好適であり、通電電流密度は４〜２０Ａ／ｍ２、特に６〜１０Ａ／ｍ２程度が好適である。 As the electrodeionization apparatus 8, a plurality of anion exchange membranes and cation exchange membranes are alternately arranged between an anode chamber having an anode and a cathode chamber having a cathode, thereby alternately forming a concentration chamber and a desalting chamber. In addition, it is possible to use a desalting chamber filled with a mixed resin of an anion exchange resin and a cation exchange resin or an ion exchanger such as an ion exchange fiber. The applied voltage of the electrodeionization device 5 is preferably about 10 to 100 V, particularly about 30 to 70 V, and the energization current density is preferably about 4 to 20 A / m 2 , particularly about 6 to 10 A / m 2 .

電気脱イオン装置８の脱イオン水は、必要に応じ、第２の逆浸透膜装置や、限外濾過膜装置（図示略）で処理して、更に残留する微量のＴＯＣやシリカ等を除去して純度を高めてもよい。   The deionized water of the electrodeionization device 8 is treated with a second reverse osmosis membrane device or an ultrafiltration membrane device (not shown) as necessary to remove further traces of TOC and silica. The purity may be increased.

なお、オリフィスとして２個以上の孔がオリフィス板に設けられたものを用いることにより、オリフィス通水騒音を低下させることができる。   In addition, the orifice water flow noise can be reduced by using an orifice plate having two or more holes provided in the orifice plate.

（ａ）図は本発明の純水製造装置の実施の形態を示す系統図である。（ｂ）図は従来の純水製造装置を示す系統図である。(A) The figure is a systematic diagram which shows embodiment of the pure water manufacturing apparatus of this invention. (B) is a system diagram showing a conventional pure water production apparatus.

符号の説明Explanation of symbols

１，１０，１２，１４，１６，１８ オリフィス
３，２３ 活性炭濾過装置
５，２６ 逆浸透膜装置への給水ポンプ
６，２８ 逆浸透膜装置
８，３０ 電気脱イオン装置
９ ポンプ制御回路 1,10,12,14,16,18 Orifice 3,23 Activated carbon filtration device 5,26 Water supply pump to reverse osmosis membrane device 6,28 Reverse osmosis membrane device 8,30 Electrodeionization device 9 Pump control circuit

Claims (4)

原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理して純水を製造する純水製造装置において、
該逆浸透膜装置の濃縮水の一部をオリフィスを介して排出すると共に、残部をオリフィスを介して逆浸透膜装置の上流側へ返送し、
電気脱イオン装置の濃縮水をオリフィスを介して電気脱イオン装置の上流側へ返送し、
電気脱イオン装置の電極水をオリフィスを介して排出するよう構成したことを特徴とする純水製造装置。 In a pure water production apparatus for producing pure water by treating raw water with a reverse osmosis membrane device and then treating with an electrodeionization device,
A part of the concentrated water of the reverse osmosis membrane device is discharged through the orifice, and the remaining part is returned to the upstream side of the reverse osmosis membrane device through the orifice,
The concentrated water of the electrodeionization device is returned to the upstream side of the electrodeionization device through the orifice,
An apparatus for producing pure water, characterized in that electrode water of an electrodeionization apparatus is discharged through an orifice. 請求項１において、該オリフィスはオリフィス板に複数の孔を設けたものであることを特徴とする純水製造装置。   2. The apparatus for producing pure water according to claim 1, wherein the orifice is formed by providing a plurality of holes in an orifice plate. 請求項１又は２において、該逆浸透膜装置の透過水の水温の検知手段と、
該検知手段で検知された水温に基づき、逆浸透膜装置の透過水の水量が一定となるように該逆浸透膜装置への給水ポンプによる給水量を制御する給水ポンプ制御手段と
を備えたことを特徴とする純水製造装置。 In Claim 1 or 2, the detection means of the water temperature of the permeated water of the reverse osmosis membrane device,
A water supply pump control means for controlling the amount of water supplied to the reverse osmosis membrane device by the water supply pump based on the water temperature detected by the detection means so that the amount of permeated water of the reverse osmosis membrane device is constant. An apparatus for producing pure water. 請求項１ないし３のいずれか１項において、前記水温の検知手段は、逆浸透膜装置の透過水の導電率計又は比抵抗計の温度補正用検出器と兼用されていることを特徴とする純水製造装置。   4. The water temperature detecting means according to claim 1, wherein the water temperature detecting means is also used as a permeated water conductivity meter of a reverse osmosis membrane device or a temperature correction detector of a specific resistance meter. Pure water production equipment.
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