JP4663510B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP4663510B2 JP4663510B2 JP2005367293A JP2005367293A JP4663510B2 JP 4663510 B2 JP4663510 B2 JP 4663510B2 JP 2005367293 A JP2005367293 A JP 2005367293A JP 2005367293 A JP2005367293 A JP 2005367293A JP 4663510 B2 JP4663510 B2 JP 4663510B2
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- 239000004065 semiconductor Substances 0.000 title claims description 82
- 239000010410 layer Substances 0.000 claims description 100
- 238000007689 inspection Methods 0.000 claims description 43
- 238000002161 passivation Methods 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 13
- 239000011229 interlayer Substances 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 description 19
- 239000000523 sample Substances 0.000 description 14
- 239000010949 copper Substances 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000001574 biopsy Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Description
また、第2の発明によれば、半導体装置をダマシン工法で形成された配線を有する多層配線構造とする場合、第2導電層において第1導電層の検査領域と垂直方向に重なる部分に配線を配置することにより、第1導電層と、その検査領域以外と垂直方向に重なる第2導電層の配線とを、それぞれ電気的に直接接続されない状態にすることができる。
なお、本発明の実施の形態の説明は、すべて例として、絶縁膜が2層でCu配線のデュアルダマシンプロセスの半導体装置で行う。また、本発明の実施の形態の半導体装置の製造工程や製造条件等は、通常の半導体装置の製造工程や製造条件等と基本的には同じであるため、その詳細な説明は省略する。
(実施の形態1)
本発明の実施の形態1の半導体装置について、その構造を図1を用いて以下に説明する。
また、絶縁膜2、3とその絶縁膜2、3内のビアと配線の間には、例えばTaNからなるバリア膜が、パッシベーション膜4と第1導電層5間には例えばTiとTiNからなるバリア膜が形成されている。
本実施の形態1の半導体装置の製造方法は、通常の半導体装置の形成方法と同じであり、半導体素子6を形成した半導体基板1上に、例えば配線とビアがCuの場合は、まず酸化物誘電体の絶縁膜2を、CVD法(Chemical Vapor Deposition 化学気相成長法)により形成する。
(実施の形態2)
本発明の実施の形態2の半導体装置について、その構造を図2を用いて以下に説明する。
図2(a)に、プローブやWLBIの検査工程で、プローブやWLBIのバンプが接触して衝撃が与えられる検査領域51を示す。プローブやWLBIのバンプが電極パッドの第1導電層5内に接触する箇所は、ウェハ内の同じ箇所のチップの同じ箇所の電極パッドであっても、毎回同じ箇所ではなく、プローバ装置のプローブやWLBI装置のバンプ、またはウェハのアライメントのずれにより、数μmから数十μm程度のばらつきをもつ。
(実施の形態3)
本発明の実施の形態3の半導体装置について、その構造を図3を用いて以下に説明する。
図3(a)に示すように、絶縁膜3内において第1導電層5の検査領域51の下層にある第2導電層の配線31eは、パッシベーション膜4の開口42を介して第1導電層5と電気的に接続されている。なお、形成方法は、実施の形態1の半導体装置の製造方法と同様である。
(実施の形態4)
本発明の実施の形態4の半導体装置について、その構造を図4を用いて以下に説明する。
図4(a)に示すように、第1導電層5の検査領域51の下層のパッシベーション膜4に、検査領域51と同じ大きさの開口42が形成されており、絶縁膜3内の第2導電層の配線31eは、パッシベーション膜4の開口42を介して第1導電層5と接続されている。なお、形成方法は、実施の形態1の半導体装置の製造方法と同様である。
2、3 絶縁膜
4 パッシベーション膜
5 第1導電層
6 半導体素子
21a、21b、21c、21d 配線
31a、31b、31c、31d、31e 第2導電層の配線
22、32 ビア
33a、33b、33c 絶縁膜の支柱部
42 パッシベーション膜の開口
51 検査領域
Claims (3)
- 半導体基板上に、複数の層間絶縁膜と、ダマシン工法で形成された配線と、単層からなるパッシベーション膜と、前記パッシベーション膜上に形成され外部と電気的接続するための電極パッドとを有する多層配線構造の半導体装置であって、
前記電極パッドの下層に半導体素子が形成され、
前記パッシベーション膜の直下に、前記配線を複数有する導電層が形成され、
複数の前記配線の少なくとも1つは、前記電極パッドと電気的に接続され、
複数の前記配線の少なくとも1つは、前記電極パッドと電気的に接続されない状態で前記半導体基板の垂直方向に重なっており、
前記電極パッドと前記半導体基板の垂直方向に重なっている前記導電層の前記配線は、
少なくとも前記電極パッドの電気検査用の端子が接触する検査領域と垂直方向に重なっていることを特徴とする半導体装置。 - 請求項1記載の半導体装置であって、
前記検査領域と垂直方向に重なる部分を有する前記導電層の前記配線は、前記電極パッドと直接的に電気的接続されていることを特徴とする半導体装置。 - 請求項2記載の半導体装置であって、
前記パッシベーション膜において、前記検査領域と垂直方向に重なる部分に開口を形成し、
前記電極パッドと前記導電層の配線との前記電気的接続を、前記パッシベーション膜の開口を通じて行うことを特徴とする半導体装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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JP2005367293A JP4663510B2 (ja) | 2005-12-21 | 2005-12-21 | 半導体装置 |
CNA2006101413863A CN1988144A (zh) | 2005-12-21 | 2006-09-26 | 半导体器件 |
US11/594,875 US20070138638A1 (en) | 2005-12-21 | 2006-11-09 | Semiconductor device |
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JP2005367293A JP4663510B2 (ja) | 2005-12-21 | 2005-12-21 | 半導体装置 |
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JP2007173419A JP2007173419A (ja) | 2007-07-05 |
JP4663510B2 true JP4663510B2 (ja) | 2011-04-06 |
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JP2005367293A Active JP4663510B2 (ja) | 2005-12-21 | 2005-12-21 | 半導体装置 |
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US (1) | US20070138638A1 (ja) |
JP (1) | JP4663510B2 (ja) |
CN (1) | CN1988144A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10714438B2 (en) | 2018-01-03 | 2020-07-14 | Samsung Electronics Co., Ltd. | Semiconductor device having metal bump and method of manufacturing the same |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102484080B (zh) | 2009-06-18 | 2015-07-22 | 罗姆股份有限公司 | 半导体装置 |
JP2011119506A (ja) * | 2009-12-04 | 2011-06-16 | Panasonic Corp | 半導体装置 |
JP6524730B2 (ja) * | 2015-03-17 | 2019-06-05 | セイコーエプソン株式会社 | 半導体装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11307724A (ja) * | 1998-04-21 | 1999-11-05 | Rohm Co Ltd | 半導体集積回路 |
JP2000049190A (ja) * | 1998-07-14 | 2000-02-18 | Texas Instr Inc <Ti> | 能動集積回路上のボンディングのためのシステム及び方法 |
JP2005520342A (ja) * | 2002-03-13 | 2005-07-07 | フリースケール セミコンダクター インコーポレイテッド | ワイヤボンドパッドを有する半導体装置とその製作方法 |
JP2005268611A (ja) * | 2004-03-19 | 2005-09-29 | Renesas Technology Corp | 半導体装置の製造方法 |
JP2006203214A (ja) * | 2005-01-21 | 2006-08-03 | Infineon Technologies Ag | 半導体デバイス、および、その製造方法 |
Family Cites Families (1)
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US2004A (en) * | 1841-03-12 | Improvement in the manner of constructing and propelling steam-vessels |
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2005
- 2005-12-21 JP JP2005367293A patent/JP4663510B2/ja active Active
-
2006
- 2006-09-26 CN CNA2006101413863A patent/CN1988144A/zh active Pending
- 2006-11-09 US US11/594,875 patent/US20070138638A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11307724A (ja) * | 1998-04-21 | 1999-11-05 | Rohm Co Ltd | 半導体集積回路 |
JP2000049190A (ja) * | 1998-07-14 | 2000-02-18 | Texas Instr Inc <Ti> | 能動集積回路上のボンディングのためのシステム及び方法 |
JP2005520342A (ja) * | 2002-03-13 | 2005-07-07 | フリースケール セミコンダクター インコーポレイテッド | ワイヤボンドパッドを有する半導体装置とその製作方法 |
JP2005268611A (ja) * | 2004-03-19 | 2005-09-29 | Renesas Technology Corp | 半導体装置の製造方法 |
JP2006203214A (ja) * | 2005-01-21 | 2006-08-03 | Infineon Technologies Ag | 半導体デバイス、および、その製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10714438B2 (en) | 2018-01-03 | 2020-07-14 | Samsung Electronics Co., Ltd. | Semiconductor device having metal bump and method of manufacturing the same |
US11037894B2 (en) | 2018-01-03 | 2021-06-15 | Samsung Electronics Co., Ltd. | Semiconductor device having metal bump and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
CN1988144A (zh) | 2007-06-27 |
US20070138638A1 (en) | 2007-06-21 |
JP2007173419A (ja) | 2007-07-05 |
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