JP4617650B2 - 多面取り用フォトマスク、電気光学装置の製造方法 - Google Patents
多面取り用フォトマスク、電気光学装置の製造方法 Download PDFInfo
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- JP4617650B2 JP4617650B2 JP2003335534A JP2003335534A JP4617650B2 JP 4617650 B2 JP4617650 B2 JP 4617650B2 JP 2003335534 A JP2003335534 A JP 2003335534A JP 2003335534 A JP2003335534 A JP 2003335534A JP 4617650 B2 JP4617650 B2 JP 4617650B2
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- photomask
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- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 20
- 239000011159 matrix material Substances 0.000 description 21
- 230000002093 peripheral effect Effects 0.000 description 15
- 239000010408 film Substances 0.000 description 8
- 239000011651 chromium Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Images
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Liquid Crystal (AREA)
- Electroluminescent Light Sources (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
次に、本発明にかかる電気光学装置を適用可能な電子機器の具体例について図6を参照して説明する。図6−1は、本発明にかかる電気光学装置を可搬型のパーソナルコンピュータ(いわゆるノート型パソコン)30の表示部に適用した例を示す斜視図である。同図に示すように、パーソナルコンピュータ30は、キーボード31を備えた本体部32と、本発明にかかる電気光学装置を適用した表示部33とを備えている。図6−2は、本発明にかかる電気光学装置を携帯電話機40の表示部に適用した例を示す斜視図である。同図に示すように、携帯電話機40は、複数の操作ボタン41のほか、受話口42、送話口43とともに、本発明にかかる電気光学装置を適用した表示部44を備えている。
Claims (2)
- 複数のマスク領域を備えた多面取り用フォトマスクにおいて、
前記マスク領域の各々には、光が通過する複数の開口部が形成され、
前記マスク領域の各々は、前記多面取り用フォトマスクの中心部から同心円状に配置される第1〜第5の領域に設けられ、
前記第1〜第5の領域のうち同一領域における前記マスク領域は、前記開口部が同じ大きさであり、
前記開口部は、前記第1の領域から前記第5の領域の順に大きくなっており、
前記第1の領域が前記多面取り用フォトマスクの中心部に設けられ、該中心部から外周に向かって順に第2〜第5の領域が設けられることを特徴とする多面取り用フォトマスク。 - 請求項1に記載の多面取り用フォトマスクを使用して、電気光学装置用基板にパターンを形成することを特徴とする電気光学装置の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003335534A JP4617650B2 (ja) | 2003-09-26 | 2003-09-26 | 多面取り用フォトマスク、電気光学装置の製造方法 |
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JP2003335534A JP4617650B2 (ja) | 2003-09-26 | 2003-09-26 | 多面取り用フォトマスク、電気光学装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005099618A JP2005099618A (ja) | 2005-04-14 |
JP4617650B2 true JP4617650B2 (ja) | 2011-01-26 |
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JP2003335534A Expired - Fee Related JP4617650B2 (ja) | 2003-09-26 | 2003-09-26 | 多面取り用フォトマスク、電気光学装置の製造方法 |
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JP (1) | JP4617650B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7498119B2 (en) * | 2006-01-20 | 2009-03-03 | Palo Alto Research Center Incorporated | Process for forming a feature by undercutting a printed mask |
KR100784541B1 (ko) | 2006-07-14 | 2007-12-11 | 엘지전자 주식회사 | 마스크 및 이를 이용한 전계 발광 소자의 제조방법 |
JP6037199B2 (ja) * | 2011-06-02 | 2016-12-07 | 株式会社ブイ・テクノロジー | 露光装置及び露光方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02151861A (ja) * | 1988-12-05 | 1990-06-11 | Sony Corp | パターン形成方法 |
JPH04261012A (ja) * | 1990-11-30 | 1992-09-17 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
JPH0743881A (ja) * | 1993-07-28 | 1995-02-14 | Seiko Epson Corp | フォトマスクの構造と半導体装置の製造方法 |
JPH07134390A (ja) * | 1993-06-14 | 1995-05-23 | Sony Corp | 露光装置の設計方法及び露光用マスクの設計方法 |
JPH10189427A (ja) * | 1996-10-25 | 1998-07-21 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
JP2001358050A (ja) * | 2000-06-13 | 2001-12-26 | Seiko Epson Corp | 露光基板の製造方法及び電気光学装置の製造方法、並びに露光基板及び電気光学装置 |
JP2002365810A (ja) * | 2001-06-12 | 2002-12-18 | Nsk Ltd | 分割逐次近接露光装置 |
JP2003043661A (ja) * | 2001-07-30 | 2003-02-13 | Toshiba Corp | パターン形成方法 |
-
2003
- 2003-09-26 JP JP2003335534A patent/JP4617650B2/ja not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02151861A (ja) * | 1988-12-05 | 1990-06-11 | Sony Corp | パターン形成方法 |
JPH04261012A (ja) * | 1990-11-30 | 1992-09-17 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
JPH07134390A (ja) * | 1993-06-14 | 1995-05-23 | Sony Corp | 露光装置の設計方法及び露光用マスクの設計方法 |
JPH0743881A (ja) * | 1993-07-28 | 1995-02-14 | Seiko Epson Corp | フォトマスクの構造と半導体装置の製造方法 |
JPH10189427A (ja) * | 1996-10-25 | 1998-07-21 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
JP2001358050A (ja) * | 2000-06-13 | 2001-12-26 | Seiko Epson Corp | 露光基板の製造方法及び電気光学装置の製造方法、並びに露光基板及び電気光学装置 |
JP2002365810A (ja) * | 2001-06-12 | 2002-12-18 | Nsk Ltd | 分割逐次近接露光装置 |
JP2003043661A (ja) * | 2001-07-30 | 2003-02-13 | Toshiba Corp | パターン形成方法 |
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JP2005099618A (ja) | 2005-04-14 |
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