JP4568810B1 - 薄膜型光吸収膜 - Google Patents
薄膜型光吸収膜 Download PDFInfo
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- JP4568810B1 JP4568810B1 JP2010047068A JP2010047068A JP4568810B1 JP 4568810 B1 JP4568810 B1 JP 4568810B1 JP 2010047068 A JP2010047068 A JP 2010047068A JP 2010047068 A JP2010047068 A JP 2010047068A JP 4568810 B1 JP4568810 B1 JP 4568810B1
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- film
- light absorption
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- 239000010408 film Substances 0.000 title claims abstract description 177
- 230000031700 light absorption Effects 0.000 title claims abstract description 72
- 239000010409 thin film Substances 0.000 title claims abstract description 70
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 238000002834 transmittance Methods 0.000 description 31
- 238000012360 testing method Methods 0.000 description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 238000010586 diagram Methods 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 11
- 238000003384 imaging method Methods 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 230000035699 permeability Effects 0.000 description 8
- 235000012239 silicon dioxide Nutrition 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 230000008033 biological extinction Effects 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000012528 membrane Substances 0.000 description 5
- 239000011358 absorbing material Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/085—Oxides of iron group metals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0018—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Optical Filters (AREA)
Abstract
【選択図】図6
Description
図6は、実施例1の薄膜型光吸収膜の構成を示す図である。実施例1の薄膜型光吸収膜は、基板101上に四酸化三鉄(Fe3O4)からなる膜103を形成し、さらにその上に二酸化ケイ素(SiO2)からなる膜105を形成したものである。
図9は、実施例2の薄膜型光吸収膜の構成を示す図である。実施例2の薄膜型光吸収膜は、基板201上に酸化チタン(TixOy)からなる膜203、二酸化ケイ素(SiO2)からなる膜205、酸化チタン(TixOy)からなる膜207、二酸化ケイ素(SiO2)からなる膜209、チタン(Ti)からなる膜211、四酸化三鉄(Fe3O4)からなる膜213及び二酸化ケイ素(SiO2)からなる膜215を形成したものである。
Claims (4)
- 基板上に形成された多層膜からなる薄膜型光吸収膜であって、該多層膜は、四酸化三鉄からなる酸化鉄層と、誘電体からなる誘電体層と、を含み、該酸化鉄層の厚さは、100ナノメータ以上で、該酸化鉄層及び該誘電体層が、反射防止層を形成する薄膜型光吸収膜。
- 400乃至2000ナノメータの波長の光に対して使用することのできる請求項1に記載の薄膜型光吸収膜。
- 基板上に形成された多層膜からなる薄膜型光吸収膜であって、該多層膜は、四酸化三鉄からなる酸化鉄層と、誘電体からなる誘電体層と、金属からなる金属層と、を含み、該酸化鉄層の厚さは、100ナノメータ以上で、該金属層は、該酸化鉄層より該基板側に配置され、該酸化鉄層及び該金属層の少なくとも一つと該誘電体層とが、反射防止層を形成する薄膜型光吸収膜。
- 400乃至1400ナノメータの波長の光に対して使用することのできる請求項3に記載の薄膜型光吸収膜。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010047068A JP4568810B1 (ja) | 2010-03-03 | 2010-03-03 | 薄膜型光吸収膜 |
PCT/JP2010/005794 WO2011108040A1 (ja) | 2010-03-03 | 2010-09-27 | 薄膜型光吸収膜 |
US13/599,258 US20130045378A1 (en) | 2010-03-03 | 2012-08-30 | Thin-film type light-absorbing film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010047068A JP4568810B1 (ja) | 2010-03-03 | 2010-03-03 | 薄膜型光吸収膜 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP4568810B1 true JP4568810B1 (ja) | 2010-10-27 |
JP2011180532A JP2011180532A (ja) | 2011-09-15 |
Family
ID=43098847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010047068A Active JP4568810B1 (ja) | 2010-03-03 | 2010-03-03 | 薄膜型光吸収膜 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20130045378A1 (ja) |
JP (1) | JP4568810B1 (ja) |
WO (1) | WO2011108040A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5849719B2 (ja) * | 2012-01-23 | 2016-02-03 | 旭硝子株式会社 | 光吸収体及びこれを用いた撮像装置 |
JP5864405B2 (ja) * | 2012-12-14 | 2016-02-17 | 株式会社エツミ光学 | 暈し着色レンズおよび暈し着色製品 |
JP6156468B2 (ja) * | 2015-11-12 | 2017-07-05 | 旭硝子株式会社 | 光吸収体及びこれを用いた撮像装置 |
JP2017167557A (ja) * | 2017-05-22 | 2017-09-21 | 旭硝子株式会社 | 光吸収体及びこれを用いた撮像装置 |
TWI676852B (zh) * | 2018-10-31 | 2019-11-11 | 白金科技股份有限公司 | 遮光片 |
KR102251173B1 (ko) * | 2019-08-01 | 2021-05-12 | (주)에이치엠웍스 | 스마트폰 카메라용 렌즈유닛 |
DE102019131429A1 (de) * | 2019-11-21 | 2021-05-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Störstrahlung reduzierendes Schichtsystem |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0593811A (ja) * | 1991-08-06 | 1993-04-16 | Olympus Optical Co Ltd | 光吸収膜 |
JPH07325212A (ja) * | 1994-05-31 | 1995-12-12 | Daiichi Meteko Kk | 光吸収・放射膜および光吸収・放射体の製造方法 |
JPH10274710A (ja) * | 1997-03-29 | 1998-10-13 | Tokyo Ohka Kogyo Co Ltd | 耐熱性カラーフィルタ用光重合性組成物およびこれを用いたカラーフィルタの製造方法 |
JP2003043211A (ja) * | 2001-07-27 | 2003-02-13 | Nidec Copal Corp | 薄膜型ndフィルタ及びその製造方法 |
JP2007206136A (ja) * | 2006-01-31 | 2007-08-16 | Canon Electronics Inc | Ndフィルタおよびその製造方法、それらを用いた光量絞り装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000352612A (ja) * | 1999-06-11 | 2000-12-19 | Stanley Electric Co Ltd | 多層膜フィルタ |
US6565770B1 (en) * | 2000-11-17 | 2003-05-20 | Flex Products, Inc. | Color-shifting pigments and foils with luminescent coatings |
JP4133787B2 (ja) * | 2003-12-17 | 2008-08-13 | Tdk株式会社 | 転写用機能性フィルム、機能性層の形成方法、及び機能性層が付与された物体 |
JP2006091859A (ja) * | 2004-08-27 | 2006-04-06 | Fuji Photo Film Co Ltd | 反射防止フィルム、並びにそれを用いた偏光板及び画像表示装置 |
GB2437768A (en) * | 2006-05-03 | 2007-11-07 | Seiko Epson Corp | Photosensing TFT |
JP2009200312A (ja) * | 2008-02-22 | 2009-09-03 | Dainippon Printing Co Ltd | 電磁波シールド材及びその製造方法並びにディスプレイ用フィルター |
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2010
- 2010-03-03 JP JP2010047068A patent/JP4568810B1/ja active Active
- 2010-09-27 WO PCT/JP2010/005794 patent/WO2011108040A1/ja active Application Filing
-
2012
- 2012-08-30 US US13/599,258 patent/US20130045378A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0593811A (ja) * | 1991-08-06 | 1993-04-16 | Olympus Optical Co Ltd | 光吸収膜 |
JPH07325212A (ja) * | 1994-05-31 | 1995-12-12 | Daiichi Meteko Kk | 光吸収・放射膜および光吸収・放射体の製造方法 |
JPH10274710A (ja) * | 1997-03-29 | 1998-10-13 | Tokyo Ohka Kogyo Co Ltd | 耐熱性カラーフィルタ用光重合性組成物およびこれを用いたカラーフィルタの製造方法 |
JP2003043211A (ja) * | 2001-07-27 | 2003-02-13 | Nidec Copal Corp | 薄膜型ndフィルタ及びその製造方法 |
JP2007206136A (ja) * | 2006-01-31 | 2007-08-16 | Canon Electronics Inc | Ndフィルタおよびその製造方法、それらを用いた光量絞り装置 |
Also Published As
Publication number | Publication date |
---|---|
US20130045378A1 (en) | 2013-02-21 |
WO2011108040A1 (ja) | 2011-09-09 |
JP2011180532A (ja) | 2011-09-15 |
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