JP4535926B2 - Vapor deposition material evaporation equipment - Google Patents

Vapor deposition material evaporation equipment Download PDF

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JP4535926B2
JP4535926B2 JP2005127235A JP2005127235A JP4535926B2 JP 4535926 B2 JP4535926 B2 JP 4535926B2 JP 2005127235 A JP2005127235 A JP 2005127235A JP 2005127235 A JP2005127235 A JP 2005127235A JP 4535926 B2 JP4535926 B2 JP 4535926B2
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vapor deposition
evaporation
deposition material
cylindrical body
heating
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JP2006307239A (en
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鉄也 井上
泰英 岡崎
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Hitachi Zosen Corp
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Hitachi Zosen Corp
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本発明は、蒸着材料の蒸発装置に関するものである。   The present invention relates to an evaporation material evaporation apparatus.

真空下に置かれた基板の表面に、所定の材料を蒸着させて薄膜を形成する蒸着装置においては、真空下に配置された蒸着材料の蒸発源を加熱して材料を蒸発させるとともに、この蒸発した蒸発材料を、同じく真空下に置かれた基板の表面に付着させることにより薄膜が形成されている。   In a deposition apparatus that forms a thin film by depositing a predetermined material on the surface of a substrate placed under vacuum, the evaporation source of the deposition material placed under vacuum is heated to evaporate the material, and this evaporation A thin film is formed by adhering the evaporated material to the surface of the substrate which is also placed under vacuum.

従来、このような蒸着装置における蒸発源としては、蒸着材料が充填された坩堝が用いられており、この坩堝を真空下で加熱することにより、蒸着材料が蒸発されていた(例えば、特許文献1参照)。
特開2002−249868
Conventionally, as an evaporation source in such a vapor deposition apparatus, a crucible filled with a vapor deposition material is used, and the vapor deposition material is evaporated by heating the crucible under vacuum (for example, Patent Document 1). reference).
JP 2002-249868

ところで、上記特許文献1の構成によると、坩堝に充填された蒸着材料がなくなると、蒸着材料を追加するかまたは蒸着材料が充填された坩堝と交換する必要がある。
この坩堝の交換作業は、真空容器(成膜チャンバ)内を大気圧に戻した後、坩堝を交換し、そして、再び、真空容器内を所定の真空下にする必要があり、したがって作業時間のロスが発生してしまう。
By the way, according to the structure of the said patent document 1, when the vapor deposition material with which the crucible was filled is lost, it is necessary to add a vapor deposition material or to exchange with the crucible with which the vapor deposition material was filled.
This crucible replacement operation requires that the crucible be replaced after returning the inside of the vacuum vessel (film formation chamber) to atmospheric pressure, and the inside of the vacuum vessel is again under a predetermined vacuum. Loss will occur.

なお、坩堝に多くの蒸着材料を充填しておくことも考えられるが、蒸着材料が例えば有機EL材料である場合には、長く加熱しておくと、材料が劣化するという問題がある。
そこで、本発明は、蒸着材料を蒸発源に連続的に供給し得る蒸着材料の蒸発装置を提供することを目的とする。
Although it is conceivable to fill the crucible with a lot of vapor deposition material, for example, when the vapor deposition material is an organic EL material, there is a problem that the material deteriorates when heated for a long time.
Therefore, an object of the present invention is to provide a vapor deposition material evaporation apparatus capable of continuously supplying a vapor deposition material to an evaporation source.

上記課題を解決するため、本発明の請求項1に係る蒸着材料の蒸発装置は、蒸着材料を貯留し得るとともに排気手段に接続された材料貯留手段と、この材料貯留手段に開閉バルブを介して接続され且つ当該材料貯留手段から導かれた蒸着材料を予熱するとともに所定方向に移送し得る予熱手段と、この予熱手段で予熱された蒸着材料を導き所定温度に加熱し蒸発させる加熱蒸発手段とから構成し、
さらに上記予熱手段を、一端側に蒸着材料の供給口が設けられるとともに他端側に排出口が設けられ且つ排出口が供給口と同一水平位置または供給口より低くなるように回転自在に配置された回転筒状体と、この回転筒状体を回転させる回転駆動装置と、上記回転筒状体の外周に配置された予熱用ヒータとから構成したものである。
In order to solve the above-described problem, an evaporation material evaporation apparatus according to claim 1 of the present invention is capable of storing a deposition material and is connected to an exhaust unit, and a material storage unit connected to an exhaust unit via an opening / closing valve. A preheating means that can preheat the vapor deposition material that is connected and led from the material storage means and can transfer the vapor deposition material in a predetermined direction; and a heating evaporation means that guides the vapor deposition material preheated by this preheating means and heats it to a predetermined temperature to evaporate it. configured,
Further, the preheating means is rotatably disposed so that a vapor deposition material supply port is provided on one end side and a discharge port is provided on the other end side, and the discharge port is at the same horizontal position as the supply port or lower than the supply port. The rotating cylindrical body, a rotation driving device for rotating the rotating cylindrical body, and a preheating heater disposed on the outer periphery of the rotating cylindrical body .

また、請求項2に係る蒸着材料の蒸発装置は、請求項1に記載の蒸発装置における加熱蒸発手段を、回転筒状体の排出口に対応する位置で鉛直軸心回りで回転自在に設けられた加熱用板体と、この加熱用板体を回転させる回転駆動装置と、上記加熱用板体を少なくとも蒸着材料の蒸発温度に加熱する加熱用ヒータとから構成したものである。 According to a second aspect of the present invention, there is provided an evaporation material evaporation apparatus according to the first aspect, in which the heating evaporation means in the evaporation apparatus according to the first aspect is rotatably provided around a vertical axis at a position corresponding to the discharge port of the rotating cylindrical body. The heating plate, a rotation driving device that rotates the heating plate, and a heating heater that heats the heating plate to at least the evaporation temperature of the vapor deposition material.

また、請求項3に係る蒸着材料の蒸発装置は、請求項1に記載の蒸発装置における予熱用ヒータを複数のヒータ部で構成するとともに、これら各ヒータ部の予熱温度が、回転筒状体の供給口側から排出口側に向かって順次高くなるようにしたものである。 According to a third aspect of the present invention, there is provided an evaporation material evaporation apparatus according to the first aspect , wherein the preheating heater in the evaporation apparatus according to the first aspect is composed of a plurality of heater portions, and the preheating temperature of each of the heater portions It is made to become higher sequentially from the supply port side to the discharge port side.

さらに、請求項4に係る蒸着材料の蒸発装置は、請求項1に記載の蒸発装置における回転筒状体の内部に、蒸着材料を加熱蒸発手段側に移送するためのスクリュウフィーダを配置したものである。 Furthermore, the evaporation apparatus for vapor deposition material according to claim 4 is provided with a screw feeder for transferring the vapor deposition material to the heating evaporation means inside the rotating cylindrical body in the evaporation apparatus according to claim 1. is there.

上記の構成によると、蒸着材料は、材料貯留手段を介して予熱手段にバッチ式で投入されるが、予熱手段は徐々に予熱温度まで加熱されるとともに、加熱蒸発手段側に少量ずつ連続的に供給されるので、蒸着材料を、全て、蒸発温度近傍に加熱しておく必要がないため、蒸着材料が有機EL材料などのように熱により劣化する材料である場合には、蒸着材料の劣化を防止することができる。   According to the above configuration, the vapor deposition material is batch-fed into the preheating means via the material storage means, but the preheating means is gradually heated to the preheating temperature and continuously to the heating evaporation means side by little. Since it is supplied, it is not necessary to heat the vapor deposition material in the vicinity of the evaporation temperature. Therefore, when the vapor deposition material is a material that deteriorates due to heat, such as an organic EL material, the vapor deposition material is deteriorated. Can be prevented.

[実施の形態]
以下、本発明の実施の形態に係る蒸着材料の蒸発装置を図面に基づき説明する。
この蒸発装置は、例えば有機EL材料などの蒸着材料を加熱し蒸発させ、この蒸発された蒸着材料(以下、蒸発材料という)を、所定の真空度に維持された蒸着用容器(蒸着室ともいう)内に導き、当該蒸着用容器内に配置された被蒸着部材であるガラス基板の表面に蒸着させて有機EL膜を形成する蒸着装置に設けられるものである。
[Embodiment]
DESCRIPTION OF EMBODIMENTS Hereinafter, an evaporation material evaporation apparatus according to an embodiment of the present invention will be described with reference to the drawings.
The evaporation apparatus heats and evaporates a vapor deposition material such as an organic EL material, for example, and vaporizes the evaporated vapor deposition material (hereinafter, referred to as an evaporation material) in a predetermined vacuum degree (also referred to as a vapor deposition chamber). ), And is provided on a vapor deposition apparatus for forming an organic EL film by vapor deposition on the surface of a glass substrate which is a vapor deposition member disposed in the vapor deposition vessel.

以下、この蒸発装置について詳しく説明する。
図1に示すように、この蒸発装置1は、大きく分けて、有機EL材料などの蒸着材料を貯留し得るとともに上面開口部に開閉蓋2が設けられて密閉状態にし得る材料貯留容器(材料貯留手段の一例)3と、この材料貯留容器3に接続されて当該容器内を所定の真空度(例えば、10Pa以下)にするための真空ポンプ(排気手段の一例)4と、上記材料貯留容器3の下端開口部に真空バルブ(開閉バルブの一例)5を介して接続された予熱手段6と、この予熱手段6にて加熱(予熱)された蒸着材料を導きその蒸発温度まで加熱し蒸発させるための加熱蒸発手段7とから構成されている。
Hereinafter, this evaporation apparatus will be described in detail.
As shown in FIG. 1, the evaporation apparatus 1 is roughly divided into a material storage container (material storage) that can store a vapor deposition material such as an organic EL material and can be hermetically sealed by being provided with an opening / closing lid 2 at the upper surface opening. An example of means) 3, a vacuum pump (an example of exhaust means) 4 connected to the material storage container 3 to bring the inside of the container to a predetermined degree of vacuum (for example, 10 Pa or less), and the material storage container 3 A preheating means 6 connected to the lower end opening of the metal via a vacuum valve (an example of an on-off valve) 5, and a vapor deposition material heated (preheated) by the preheating means 6, to be heated to its evaporation temperature and evaporated. And the heating evaporation means 7.

なお、上記材料貯留容器3としては、鉛直方向の筒状部材11が用いられており、勿論、その上端開口部には開閉蓋2が設けられるとともに、その下端開口部には真空バルブ5が取り付けられている。   As the material storage container 3, a vertical cylindrical member 11 is used. Of course, an opening / closing lid 2 is provided at the upper end opening, and a vacuum valve 5 is attached to the lower end opening. It has been.

上記予熱手段6は、少なくとも前後の軸受(図示せず)を介して水平軸心(長手方向の回転軸心)回りで回転自在に支持されるとともに外周面に予熱用ヒータ12が配置された回転筒状体(ロータリキルンともいう)13と、この回転筒状体13を回転させる筒状側回転駆動装置14と、この筒状側回転駆動装置14の入口側と上記真空バルブ5とを接続する側面視がL字形状にされた筒状の材料ガイド部材15と、上記回転筒状体13内に水平方向(回転軸心と平行)で挿入配置されて材料を入口側から出口側に向かって移送させるスクリュウフィーダ(スクリュウ羽根ともいい、より具体的には、軸付き螺旋状羽根により構成されたもの)16と、このスクリュウフィーダ16を所定方向に回転させるスクリュウ側回転駆動装置17と、上記回転筒状体13の入口部(供給口)13a側および出口部(排出口)13b側に設けられて、固定側である材料ガイド部材15および加熱蒸発手段7側の固定部材との隙間を回転可能にシールを行うための環状接続部材18,19とから構成されている。   The preheating means 6 is rotatably supported around at least a horizontal axis (longitudinal axis of rotation) via front and rear bearings (not shown) and a preheating heater 12 is disposed on the outer peripheral surface. A cylindrical body (also referred to as a rotary kiln) 13, a cylindrical side rotational drive device 14 that rotates the rotary cylindrical body 13, and an inlet side of the cylindrical side rotational drive device 14 are connected to the vacuum valve 5. A cylindrical material guide member 15 having an L-shape in a side view and a material inserted in the horizontal direction (parallel to the rotation axis) into the rotating cylindrical body 13 to move the material from the inlet side toward the outlet side. A screw feeder (also referred to as a screw blade, more specifically, constituted by a spiral blade with a shaft) 16 to be transferred, a screw-side rotation driving device 17 that rotates the screw feeder 16 in a predetermined direction, It is provided on the inlet (supply port) 13a side and the outlet (discharge port) 13b side of the rotary cylindrical body 13, and a gap is formed between the material guide member 15 on the fixed side and the fixed member on the heating evaporation means 7 side. It is comprised from the annular connection members 18 and 19 for sealing so that rotation is possible.

また、上記予熱用ヒータ12は、複数の、例えば4つのヒータ部(電熱線により構成されたもの)12a〜12dと、これら各ヒータ部12a〜12dでの予熱温度を制御するための温度制御部(図示せず)とから構成されるとともに、この温度制御部により、上記各ヒータ部12a〜12dの予熱温度が、入口側から出口側に向かって順次高くなるようにされている。   The preheating heater 12 includes, for example, a plurality of, for example, four heater units (configured by heating wires) 12a to 12d, and a temperature control unit for controlling the preheating temperature in each of the heater units 12a to 12d. (Not shown), and the temperature control unit is configured to sequentially increase the preheating temperatures of the heater units 12a to 12d from the inlet side toward the outlet side.

上記筒状側回転駆動装置14は、回転筒状体13の外周に取り付けられたリングギヤ21と、このリングギヤ21に噛合するピニオン22と、このピニオン22を回転させる電動機23とから構成されており、また上記スクリュウ側回転駆動装置17としては、スクリュウフィーダ16の回転軸部16aに連結されて当該スクリュウフィーダ16を回転させる減速機付き電動機が用いられている。   The cylindrical-side rotational drive device 14 includes a ring gear 21 attached to the outer periphery of the rotating cylindrical body 13, a pinion 22 that meshes with the ring gear 21, and an electric motor 23 that rotates the pinion 22. In addition, as the screw side rotation drive device 17, an electric motor with a speed reducer that is connected to the rotation shaft portion 16 a of the screw feeder 16 and rotates the screw feeder 16 is used.

上記加熱蒸発手段7は、有底で且つ上端が開口されるとともに下部側壁部に、上記回転筒状体13の出口部13bが挿入される側方開口部31aが形成され、且つ底壁部31bに穴部31cを有する有底筒状部(軸受部でもある)31dが突設された鉛直方向の固定側筒状容器31と、この固定側筒状容器31の下部内に配置されるとともに回転筒状体13の出口部13bより下方位置で且つ固定側筒状容器31の底壁部31bに設けられた有底筒状部31dの穴部31cにガイド用軸部32aが挿入されて鉛直軸心回りで回転自在に支持された円形の蒸発皿(加熱用板体の一例である)32と、この蒸発皿32のガイド用軸部32aを介して蒸発皿32を回転させる非接触式皿用回転駆動装置33と、上記固定側筒状容器31の外周面に巻装された容器用ヒータ(例えば、電熱線が用いられる)34と、上記蒸発皿32の下面に沿って例えば渦巻き状に配置された皿用ヒータ(例えば、電熱線が用いられる)35とから構成されている。なお、蒸発皿32の上面である加熱面32bは、回転筒状体13から供給される蒸着材料を保持するために緩やかな傾斜面を有するすり鉢状に形成されるとともに、その外周には所定高さの縁部32cが設けられて、回転により蒸着材料が外側に飛び出さないようにされている。   The heating and evaporating means 7 has a bottom, an upper end being opened, and a side opening 31a into which the outlet 13b of the rotating tubular body 13 is inserted is formed in the lower side wall, and the bottom wall 31b. A fixed-side cylindrical container 31 in the vertical direction in which a bottomed cylindrical part (also a bearing part) 31d having a hole portion 31c is provided in a projecting manner, and is disposed in the lower part of the fixed-side cylindrical container 31 and rotates. A guide shaft portion 32a is inserted into a hole portion 31c of a bottomed tubular portion 31d provided at a position below the outlet portion 13b of the tubular body 13 and provided on the bottom wall portion 31b of the fixed-side tubular container 31, so that the vertical axis A circular evaporating dish (an example of a heating plate) 32 that is rotatably supported around the center and a non-contact type dish that rotates the evaporating dish 32 via a guide shaft 32a of the evaporating dish 32 The rotary drive device 33 and the outer peripheral surface of the fixed-side cylindrical container 31 are wound around The container heater 34 (for example, a heating wire is used) and a dish heater (for example, a heating wire is used) 35 disposed in a spiral shape along the lower surface of the evaporating dish 32. ing. The heating surface 32b, which is the upper surface of the evaporating dish 32, is formed in a mortar shape having a gently inclined surface to hold the vapor deposition material supplied from the rotating cylindrical body 13, and has a predetermined height on the outer periphery thereof. The edge portion 32c is provided so that the vapor deposition material does not jump out by rotation.

また、上記皿用回転駆動装置33は、固定側筒状容器31の有底筒状部31dを案内し得る凹状部41aを有する軸体41と、この軸体41を回転させる減速機付き電動機42と、この軸体41の凹状部41aの内周面に配置されて蒸発皿32のガイド用軸部32aを磁力(非接触式である)により回転させるための磁石部41bとから構成されている。したがって、電動機42により磁石部41bが回転すると、その磁力によりガイド用軸部32aが回転され、すなわち蒸発皿32が回転される。   The dish rotation driving device 33 includes a shaft body 41 having a concave portion 41 a that can guide the bottomed cylindrical portion 31 d of the fixed-side cylindrical container 31, and a motor 42 with a speed reducer that rotates the shaft body 41. And a magnet portion 41b disposed on the inner peripheral surface of the concave portion 41a of the shaft body 41 for rotating the guide shaft portion 32a of the evaporating dish 32 by a magnetic force (non-contact type). . Therefore, when the magnet portion 41b is rotated by the electric motor 42, the guide shaft portion 32a is rotated by the magnetic force, that is, the evaporating dish 32 is rotated.

そして、上記真空バルブ5と加熱蒸発手段7との間、正確には、真空バルブ5と固定側筒状容器31との間の経路全体が真空容器45で覆われている。勿論、この真空容器45には真空ポンプ(排気手段)46が接続されて、所定の真空度(例えば、10Pa以下)に維持されている。   The entire path between the vacuum valve 5 and the heating evaporation means 7, more precisely, between the vacuum valve 5 and the fixed cylindrical container 31 is covered with a vacuum container 45. Of course, a vacuum pump (exhaust means) 46 is connected to the vacuum vessel 45 and is maintained at a predetermined degree of vacuum (for example, 10 Pa or less).

また、上記固定側筒状容器31の上端開口部は、蒸発材料を蒸着室に導くための材料移送管47に接続されている。
なお、上述したように、予熱手段6の全体および加熱蒸発手段7における少なくとも予熱手段6との接続部分については、真空容器45で覆う(つまり、密閉状態にする)とともに真空ポンプ46にて所定の真空度に維持するようにしたが、例えば予熱手段6および加熱蒸発手段7の全体を真空容器で覆うとともにこの真空容器を被蒸着部材が配置される蒸着室側に連通させて、蒸着室側に接続された真空ポンプ(排気手段)により、これら予熱手段6および加熱蒸発手段7を、蒸着室と一緒に所定の真空度に維持するようにしてもよい。さらに、蒸着室内に予熱手段6および加熱蒸発手段7を配置するようにしてもよく、この場合、材料貯留容器3だけが蒸着室(蒸着用容器)外に配置されることになる。
The upper end opening of the fixed cylindrical container 31 is connected to a material transfer pipe 47 for guiding the evaporation material to the vapor deposition chamber.
As described above, the entire preheating means 6 and at least the connection portion of the heating evaporation means 7 with the preheating means 6 are covered with a vacuum vessel 45 (that is, sealed) and predetermined with a vacuum pump 46. Although the degree of vacuum is maintained, for example, the whole of the preheating means 6 and the heating evaporation means 7 is covered with a vacuum vessel, and this vacuum vessel is connected to the vapor deposition chamber side where the vapor deposition member is disposed, The preheating unit 6 and the heating evaporation unit 7 may be maintained at a predetermined vacuum level together with the vapor deposition chamber by a connected vacuum pump (exhaust unit). Further, the preheating means 6 and the heating evaporation means 7 may be arranged in the vapor deposition chamber. In this case, only the material storage container 3 is arranged outside the vapor deposition chamber (deposition container).

次に、上記蒸発装置での蒸着材料の蒸発作用について説明する。
まず、材料貯留容器3内に蒸着材料を充填するとともに所定の真空度にしておき、また真空容器45内も所定の真空度にしておき、さらに回転筒状体13およびスクリュウフィーダ16を回転させるとともに、蒸発皿32も回転させておき、且つ各ヒータ12,34,35を作動させて所定の温度に維持させておく。
Next, the evaporation action of the vapor deposition material in the evaporator will be described.
First, the material storage container 3 is filled with a vapor deposition material and a predetermined degree of vacuum is set, and the vacuum container 45 is also set to a predetermined degree of vacuum, and the rotating cylindrical body 13 and the screw feeder 16 are rotated. The evaporating dish 32 is also rotated, and the heaters 12, 34, 35 are operated to maintain a predetermined temperature.

この状態において、真空バルブ5が開かれて蒸着材料が、材料ガイド部材15を介して回転筒状体13内に供給されると、回転筒状体13およびスクリュウフィーダ16の回転により、蒸着材料は回転筒状体13内を入口側から出口側に向かって順次移送されるとともに、この移送の途中で、4つのヒータ部12a〜12dにより、徐々に、蒸着材料が蒸発する温度の手前近傍の予熱温度まで加熱(予熱)される。   In this state, when the vacuum valve 5 is opened and the vapor deposition material is supplied into the rotary cylindrical body 13 via the material guide member 15, the vapor deposition material is rotated by the rotation of the rotary cylindrical body 13 and the screw feeder 16. The inside of the rotating cylindrical body 13 is sequentially transferred from the inlet side to the outlet side, and in the middle of this transfer, preheating near the temperature before the vapor deposition material evaporates gradually by the four heater portions 12a to 12d. Heated to temperature (preheated).

そして、予熱温度まで加熱された蒸着材料は、出口部13bから蒸発皿32上に供給され、当該蒸発皿32が所定角度、例えば一回転するまでの間で、その下方に配置された皿用ヒータ35にて蒸発温度まで加熱されて蒸発が行われる。   The vapor deposition material heated to the preheating temperature is supplied onto the evaporating dish 32 from the outlet portion 13b, and the evaporating dish 32 is disposed below the evaporating dish 32 at a predetermined angle, for example, once. Evaporation is performed by heating to the evaporation temperature at 35.

なお、蒸着材料は予熱手段6にて、蒸発の一歩手前の温度まで加熱されているため、蒸発皿32上で少し加熱されるだけで、直ぐに(例えば、蒸発皿が一周するまでの間)、蒸発して蒸発材料が得られる。   In addition, since the vapor deposition material is heated up to a temperature just before evaporation by the preheating means 6, it is only slightly heated on the evaporating dish 32 and immediately (for example, until the evaporating dish goes around once), Evaporate to obtain the evaporated material.

この蒸発材料は、その上端の開口部から材料移送管47を介して、蒸着室に移送される。なお、この材料移送管47の途中には、蒸着室への蒸発材料の供給量を制御するための制御バルブが設けられている。   This evaporation material is transferred to the vapor deposition chamber through the material transfer pipe 47 from the opening at the upper end. In the middle of the material transfer pipe 47, a control valve for controlling the supply amount of the evaporation material to the vapor deposition chamber is provided.

そして、回転筒状体13内での蒸着材料が徐々に減ってくると、新たに、蒸着材料が供給される。
すなわち、材料貯留容器3内が大気圧に戻された後、開閉蓋2が開かれて新たに蒸着材料が供給され、そして開閉蓋2が閉じられた後、真空ポンプ4により所定の真空度にされる。
When the vapor deposition material in the rotating cylindrical body 13 gradually decreases, the vapor deposition material is newly supplied.
That is, after the inside of the material storage container 3 is returned to the atmospheric pressure, the opening / closing lid 2 is opened to newly supply the vapor deposition material, and after the opening / closing lid 2 is closed, the vacuum pump 4 is used to obtain a predetermined degree of vacuum. Is done.

次に、真空バルブ5を開いて蒸着材料を材料ガイド部材15を介して回転筒状体13内に供給した後、真空バルブ5を閉じる。
回転筒状体13内に供給された蒸着材料は、当該回転筒状体13の自転およびスクリュウフィーダ16の回転により、ゆっくりと加熱(予熱)されながら出口側に移送され、そして出口部13bから蒸発皿32に供給されて蒸発が行われる。
Next, after the vacuum valve 5 is opened and the vapor deposition material is supplied into the rotating cylindrical body 13 through the material guide member 15, the vacuum valve 5 is closed.
The vapor deposition material supplied into the rotating cylindrical body 13 is transferred to the outlet side while being slowly heated (preheated) by the rotation of the rotating cylindrical body 13 and the rotation of the screw feeder 16, and is evaporated from the outlet portion 13b. It is supplied to the dish 32 and evaporation is performed.

このように、蒸着材料は、材料貯留容器3を介して回転筒状体13内にバッチ式で投入されるが、回転筒状体13内では徐々に予熱温度まで加熱されるとともに、蒸発皿32側に少量ずつ連続的に供給される。   As described above, the vapor deposition material is batch-fed into the rotating cylindrical body 13 via the material storage container 3, and is gradually heated to the preheating temperature in the rotating cylindrical body 13, and the evaporating dish 32. A small amount is continuously supplied to the side.

したがって、蒸着材料を、全て、蒸発温度近傍に加熱しておく必要がないため、蒸着材料が有機EL材料などのように熱により劣化する材料である場合には、蒸着材料の劣化を防止することができる。   Therefore, since it is not necessary to heat the vapor deposition material in the vicinity of the evaporation temperature, when the vapor deposition material is a material that deteriorates due to heat such as an organic EL material, the vapor deposition material should be prevented from deteriorating. Can do.

ところで、上記実施の形態においては、蒸着材料として有機EL材料である場合について説明したが、この有機EL材料は昇華型と溶融型とがあるが、加熱により溶融する溶融型である場合には、スクリュウフィーダで移送する必要がなく、例えば回転筒状体13を、出口側が入口側よりも少し低くなるように、その回転軸心を下向きに傾斜させるだけであってもよい。勿論、上記実施の形態においても、回転筒状体13を下向きに傾斜させてもよい。   By the way, in the said embodiment, although the case where it was an organic EL material as a vapor deposition material was demonstrated, although this organic EL material has a sublimation type and a fusion type, when it is a fusion type which melts by heating, There is no need to transfer it with a screw feeder, and for example, the rotational cylindrical body 13 may be simply tilted downward so that the outlet side is slightly lower than the inlet side. Of course, in the above embodiment, the rotating cylindrical body 13 may be inclined downward.

また、蒸発皿の回転については、蒸発皿上に供給された予熱済材料を古いものから順番に蒸発させるように、その大きさと回転速度および加熱温度を決定するのが好ましい。   Moreover, about rotation of an evaporating dish, it is preferable to determine the magnitude | size, rotational speed, and heating temperature so that the preheated material supplied on the evaporating dish may be evaporated in order from an old thing.

本発明の実施の形態に係る蒸発装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the evaporation apparatus which concerns on embodiment of this invention. 同蒸発装置の加熱蒸発手段の要部断面図である。It is principal part sectional drawing of the heating evaporation means of the evaporation apparatus.

符号の説明Explanation of symbols

1 蒸発装置
2 開閉蓋
3 材料貯留容器
4 真空ポンプ
5 真空バルブ
6 予熱手段
7 加熱蒸発手段
11 筒状部材
12 予熱用ヒータ
13 回転筒状体
13a 入口部
13b 出口部
14 筒状側回転駆動装置
15 材料ガイド部材
16 スクリュウフィーダ
17 スクリュウ側回転駆動装置
31 固定側筒状容器
32 蒸発皿
33 皿用回転駆動装置
35 皿用ヒータ
DESCRIPTION OF SYMBOLS 1 Evaporator 2 Opening and closing lid 3 Material storage container 4 Vacuum pump 5 Vacuum valve 6 Preheating means 7 Heating evaporation means 11 Cylindrical member 12 Preheating heater 13 Rotating cylindrical body 13a Inlet part 13b Outlet part 14 Cylindrical side rotation drive device 15 Material guide member 16 Screw feeder 17 Screw side rotation drive device 31 Fixed side cylindrical container 32 Evaporating tray 33 Plate rotation drive device 35 Plate heater

Claims (4)

蒸着材料を貯留し得るとともに排気手段に接続された材料貯留手段と、この材料貯留手段に開閉バルブを介して接続され且つ当該材料貯留手段から導かれた蒸着材料を予熱するとともに所定方向に移送し得る予熱手段と、この予熱手段で予熱された蒸着材料を導き所定温度に加熱し蒸発させる加熱蒸発手段とから構成し、
さらに上記予熱手段を、一端側に蒸着材料の供給口が設けられるとともに他端側に排出口が設けられ且つ排出口が供給口と同一水平位置または供給口より低くなるように回転自在に配置された回転筒状体と、この回転筒状体を回転させる回転駆動装置と、上記回転筒状体の外周に配置された予熱用ヒータとから構成したことを特徴とする蒸着材料の蒸発装置。
The material storage means that can store the vapor deposition material and is connected to the exhaust means, and the vapor deposition material that is connected to the material storage means via the open / close valve and led from the material storage means is preheated and transferred in a predetermined direction. A preheating means for obtaining, and a heating evaporation means for guiding the vapor deposition material preheated by the preheating means to heat to a predetermined temperature and evaporate ,
Further, the preheating means is rotatably disposed so that a vapor deposition material supply port is provided on one end side and a discharge port is provided on the other end side, and the discharge port is at the same horizontal position as the supply port or lower than the supply port. An evaporation apparatus for vapor deposition material , comprising: a rotating cylindrical body, a rotation driving device for rotating the rotating cylindrical body, and a preheating heater disposed on an outer periphery of the rotating cylindrical body .
加熱蒸発手段を、回転筒状体の排出口に対応する位置で鉛直軸心回りで回転自在に設けられた加熱用板体と、この加熱用板体を回転させる回転駆動装置と、上記加熱用板体を少なくとも蒸着材料の蒸発温度に加熱する加熱用ヒータとから構成したことを特徴とする請求項1に記載の蒸着材料の蒸発装置。   A heating plate provided in a position corresponding to the discharge port of the rotating cylindrical body so as to be rotatable about the vertical axis, a heating drive unit that rotates the heating plate, and the heating evaporator 2. The vapor deposition material evaporation apparatus according to claim 1, wherein the plate body includes at least a heater for heating to the evaporation temperature of the vapor deposition material. 予熱用ヒータを複数のヒータ部で構成するとともに、これら各ヒータ部の予熱温度が、回転筒状体の供給口側から排出口側に向かって順次高くなるようにしたことを特徴とする請求項1に記載の蒸着材料の蒸発装置。 With constituting a preheating heater at a plurality of heater portion, claims these preheating temperatures of the heater unit, characterized in that set to be sequentially increased toward the outlet side from the supply port side of the rotary cylindrical body 2. The evaporation apparatus for vapor deposition material according to 1 . 回転筒状体の内部に、蒸着材料を加熱蒸発手段側に移送するためのスクリュウフィーダを配置したことを特徴とする請求項1に記載の蒸着材料の蒸発装置。 2. The evaporation material evaporation apparatus according to claim 1 , wherein a screw feeder for transferring the evaporation material to the heating evaporation means side is disposed inside the rotating cylindrical body.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08111386A (en) * 1995-08-18 1996-04-30 Hitachi Ltd Surface processing method
JPH10204624A (en) * 1997-01-14 1998-08-04 Sumitomo Heavy Ind Ltd Material supply device for vacuum film forming apparatus
JP2004346371A (en) * 2003-05-22 2004-12-09 Matsushita Electric Ind Co Ltd Film deposition method and system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08111386A (en) * 1995-08-18 1996-04-30 Hitachi Ltd Surface processing method
JPH10204624A (en) * 1997-01-14 1998-08-04 Sumitomo Heavy Ind Ltd Material supply device for vacuum film forming apparatus
JP2004346371A (en) * 2003-05-22 2004-12-09 Matsushita Electric Ind Co Ltd Film deposition method and system

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