JP4510812B2 - 磁気記録媒体 - Google Patents
磁気記録媒体 Download PDFInfo
- Publication number
- JP4510812B2 JP4510812B2 JP2006510350A JP2006510350A JP4510812B2 JP 4510812 B2 JP4510812 B2 JP 4510812B2 JP 2006510350 A JP2006510350 A JP 2006510350A JP 2006510350 A JP2006510350 A JP 2006510350A JP 4510812 B2 JP4510812 B2 JP 4510812B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- recording medium
- laminated
- exposed
- underlayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000693 micelle Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 12
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 7
- 239000011148 porous material Substances 0.000 claims description 6
- 238000004381 surface treatment Methods 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims 1
- 239000010408 film Substances 0.000 description 38
- 239000010409 thin film Substances 0.000 description 17
- 229920000428 triblock copolymer Polymers 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 230000005381 magnetic domain Effects 0.000 description 11
- 229910004298 SiO 2 Inorganic materials 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000008602 contraction Effects 0.000 description 7
- 230000005415 magnetization Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000000696 magnetic material Substances 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910018936 CoPd Inorganic materials 0.000 description 2
- 229910018979 CoPt Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910005335 FePt Inorganic materials 0.000 description 2
- 230000005374 Kerr effect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7377—Physical structure of underlayer, e.g. texture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
- G11B5/737—Physical structure of underlayer, e.g. texture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249975—Void shape specified [e.g., crushed, flat, round, etc.]
Description
Claims (2)
- 基板上に、均等に微小な凹部が表出されている下地層が積層され、
上記微小な凹部が表出されている下地層の表面上に、非晶質磁性膜が積層されてなり、
上記下地層は、テトラエトキシシランを原材料とし、面心立方構造状に均等に自己配列されたF68(EO 77 −PO 29 −EO 77 )又はF108(EO 133 −PO 50 −EO 133 )のトリブロック・コポリマーからなる球状ミセルが取り除かれることにより、同一サイズの球状の空孔が面心立方体構造状に均等に形成されてなる酸化珪素からなる層であり、上記非晶質磁性膜が積層される面に、均等に微小な凹部が表出されるように表面処理が施され、
上記非晶質磁性膜は、上記下地層に表出されている各凹部上に互いに独立して積層されて各凸部を形成し、各凸部同士は非連続であることを特徴とする磁気記録媒体。 - 上記下地層は、直径が数nm乃至数十nmの同一サイズの球状の空孔が面心立方構造状に均等に形成されてなることを特徴とする請求項1記載の磁気記録媒体。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004050366 | 2004-02-25 | ||
JP2004050366 | 2004-02-25 | ||
PCT/JP2005/003655 WO2005081233A1 (ja) | 2004-02-25 | 2005-02-25 | 薄膜材料及び記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2005081233A1 JPWO2005081233A1 (ja) | 2008-01-17 |
JP4510812B2 true JP4510812B2 (ja) | 2010-07-28 |
Family
ID=34879587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006510350A Expired - Fee Related JP4510812B2 (ja) | 2004-02-25 | 2005-02-25 | 磁気記録媒体 |
Country Status (3)
Country | Link |
---|---|
US (2) | US20090117410A1 (ja) |
JP (1) | JP4510812B2 (ja) |
WO (1) | WO2005081233A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008071455A (ja) * | 2006-09-15 | 2008-03-27 | Matsushita Electric Ind Co Ltd | 磁気記録媒体とその製造方法、および、磁気記録媒体の記録再生装置と記録再生方法 |
JP2015109118A (ja) | 2013-12-03 | 2015-06-11 | 株式会社東芝 | 垂直磁気記録媒体 |
JP2015198203A (ja) * | 2014-04-02 | 2015-11-09 | 株式会社豊田中央研究所 | 高保磁力化永久磁石 |
JP2016051487A (ja) | 2014-08-29 | 2016-04-11 | 株式会社東芝 | 磁気記録媒体、磁気記録媒体の製造方法、磁気記録再生装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62289921A (ja) * | 1986-06-10 | 1987-12-16 | Matsushita Electric Ind Co Ltd | 磁気記録媒体 |
JP2002083417A (ja) * | 2000-09-07 | 2002-03-22 | Hitachi Maxell Ltd | 磁気記録媒体及びそれを用いた磁気記録装置 |
JP2003016636A (ja) * | 2001-04-27 | 2003-01-17 | Sharp Corp | 磁気記録媒体およびそれを用いた磁気記録装置 |
JP2003317222A (ja) * | 2002-04-19 | 2003-11-07 | Hitachi Ltd | 記録媒体 |
JP2004047052A (ja) * | 2002-05-14 | 2004-02-12 | Fujitsu Ltd | 情報記録媒体 |
JP2004071096A (ja) * | 2002-08-08 | 2004-03-04 | Fujitsu Ltd | 記録媒体および記録媒体の下地層の形成方法 |
JP2004253103A (ja) * | 2002-12-24 | 2004-09-09 | Fujitsu Ltd | 記録媒体基板およびその製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0765414A (ja) * | 1993-08-23 | 1995-03-10 | Hitachi Ltd | 情報記録用媒体 |
JP2001014649A (ja) * | 1999-06-28 | 2001-01-19 | Hitachi Ltd | 板状体、無機化合物基板、磁気記録媒体及び磁気記憶装置 |
JP3730822B2 (ja) * | 1999-11-08 | 2006-01-05 | 日立マクセル株式会社 | 磁気記録媒体、及び磁気記録装置 |
JP2002163819A (ja) * | 2000-11-22 | 2002-06-07 | Hitachi Maxell Ltd | 情報記録媒体及びそれを用いた情報記録装置 |
JP3793040B2 (ja) * | 2001-05-09 | 2006-07-05 | 株式会社東芝 | 記録媒体およびその製造方法 |
JP2003338019A (ja) * | 2002-05-22 | 2003-11-28 | Hitachi Ltd | 磁気記録媒体、及びその製造方法 |
JP2004086968A (ja) * | 2002-08-26 | 2004-03-18 | Sharp Corp | 磁気記録媒体 |
JP2004164692A (ja) * | 2002-11-08 | 2004-06-10 | Toshiba Corp | 磁気記録媒体及びその製造方法 |
-
2005
- 2005-02-25 WO PCT/JP2005/003655 patent/WO2005081233A1/ja active Application Filing
- 2005-02-25 US US10/599,665 patent/US20090117410A1/en not_active Abandoned
- 2005-02-25 JP JP2006510350A patent/JP4510812B2/ja not_active Expired - Fee Related
-
2010
- 2010-02-18 US US12/708,139 patent/US20100209738A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62289921A (ja) * | 1986-06-10 | 1987-12-16 | Matsushita Electric Ind Co Ltd | 磁気記録媒体 |
JP2002083417A (ja) * | 2000-09-07 | 2002-03-22 | Hitachi Maxell Ltd | 磁気記録媒体及びそれを用いた磁気記録装置 |
JP2003016636A (ja) * | 2001-04-27 | 2003-01-17 | Sharp Corp | 磁気記録媒体およびそれを用いた磁気記録装置 |
JP2003317222A (ja) * | 2002-04-19 | 2003-11-07 | Hitachi Ltd | 記録媒体 |
JP2004047052A (ja) * | 2002-05-14 | 2004-02-12 | Fujitsu Ltd | 情報記録媒体 |
JP2004071096A (ja) * | 2002-08-08 | 2004-03-04 | Fujitsu Ltd | 記録媒体および記録媒体の下地層の形成方法 |
JP2004253103A (ja) * | 2002-12-24 | 2004-09-09 | Fujitsu Ltd | 記録媒体基板およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2005081233A1 (ja) | 2008-01-17 |
WO2005081233A1 (ja) | 2005-09-01 |
US20100209738A1 (en) | 2010-08-19 |
US20090117410A1 (en) | 2009-05-07 |
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