JP4458379B2 - Organic EL display device - Google Patents

Organic EL display device Download PDF

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JP4458379B2
JP4458379B2 JP2008266528A JP2008266528A JP4458379B2 JP 4458379 B2 JP4458379 B2 JP 4458379B2 JP 2008266528 A JP2008266528 A JP 2008266528A JP 2008266528 A JP2008266528 A JP 2008266528A JP 4458379 B2 JP4458379 B2 JP 4458379B2
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film
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protective film
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display device
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JP2009164107A5 (en
JP2009164107A (en
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望 和泉
大介 由徳
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Canon Inc
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Canon Inc
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Priority to KR1020080126203A priority patent/KR101014674B1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/32115—Planarisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers

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Description

本発明は、有機エレクトロスミネッセンス（以下、有機ＥＬと記述する。）素子を用いた表示装置に係るものであり、詳しくは封止構造に関するものである。   The present invention relates to a display device using an organic electroluminescence (hereinafter referred to as organic EL) element, and particularly relates to a sealing structure.

近年、フラットパネルディスプレイとして、自発光型デバイスである有機ＥＬ表示装置が注目されている。有機ＥＬ表示装置の表示領域には、第一電極と第二電極とに挟まれた有機化合物層を備える有機ＥＬ素子が複数配置されており、前記有機ＥＬ素子が画素として発光し、画像を表示する。有機ＥＬ素子は水分や酸素に極めて弱く、外部から水分や酸素が浸入すると劣化し、ダークスポットと呼ばれる非発光部を発生してしまう。   In recent years, organic EL display devices, which are self-luminous devices, have attracted attention as flat panel displays. In the display area of the organic EL display device, a plurality of organic EL elements each having an organic compound layer sandwiched between a first electrode and a second electrode are arranged. The organic EL elements emit light as pixels and display an image. To do. The organic EL element is extremely weak against moisture and oxygen, and deteriorates when moisture or oxygen enters from the outside, and generates a non-light emitting portion called a dark spot.

外部から有機ＥＬ素子への水分や酸素の浸入を防ぐ構成として、図６に示すように、樹脂保護膜１０９と無機保護膜１１０とからなる保護膜で有機ＥＬ素子を覆う構成が特許文献１に開示されている。特許文献１によると、樹脂保護膜１０９は有機ＥＬ素子及びその周囲の基板の表面を覆い、無機保護膜１１０は樹脂保護膜１０９とその縁部及びその周囲の基板表面を覆う。このような構成により、水分の浸入経路となる樹脂保護膜１０９が外部にさらされないため水分が浸入することがなく、有機ＥＬ素子の劣化を防ぐことができる。   As a configuration for preventing moisture and oxygen from entering the organic EL element from the outside, Patent Document 1 discloses a configuration in which the organic EL element is covered with a protective film composed of a resin protective film 109 and an inorganic protective film 110 as shown in FIG. It is disclosed. According to Patent Document 1, the resin protective film 109 covers the surface of the organic EL element and the surrounding substrate, and the inorganic protective film 110 covers the resin protective film 109 and its edge and the surrounding substrate surface. With such a configuration, the resin protective film 109 serving as a moisture intrusion path is not exposed to the outside, so that moisture does not enter and deterioration of the organic EL element can be prevented.

外部から有機ＥＬ素子への水分の浸入を防ぐ別の構成として、特許文献２に表示領域の外周に沿って平坦化膜に分断領域を設け、ガラス基板で封止する構成が開示されている。断面図を図７に示す。   As another configuration for preventing moisture from entering the organic EL element from the outside, Patent Document 2 discloses a configuration in which a dividing region is provided in the planarizing film along the outer periphery of the display region and sealed with a glass substrate. A cross-sectional view is shown in FIG.

トップエミッション型の有機ＥＬ表示装置には、有機ＥＬ素子と基板との間に設けられた画素回路１０２の凹凸を平坦化し、積層する膜が凹凸部で不連続となるのを防止するために、樹脂材料からなる平坦化膜１０４が形成される。また、平坦化膜１０４は、画素回路１０２や周辺回路１０３を保護する機能も有するため、有機ＥＬ素子が形成されない周辺回路１０３の上にも表示領域から連続して平坦化膜が形成される。このような構成の有機ＥＬ表示装置を、ガラス基板７０１と接着剤７０２とで封止すると、外部から平坦化膜１０４を介して水分が表示領域内へ浸入し、有機ＥＬ素子が劣化するという問題が発生する。特許文献２はこの問題を解決するため、図７に示すように、表示領域の外周に沿って平坦化膜１０４が分断された領域Ｂを形成し、水分の浸入を防いでいる。
特開２００３−２８２２４０号公報 特開２００５−１６４８１８号公報 In the top emission type organic EL display device, the unevenness of the pixel circuit 102 provided between the organic EL element and the substrate is flattened, and the laminated film is prevented from being discontinuous at the uneven portion. A planarizing film 104 made of a resin material is formed. Further, since the planarization film 104 also has a function of protecting the pixel circuit 102 and the peripheral circuit 103, the planarization film is continuously formed from the display region on the peripheral circuit 103 where the organic EL element is not formed. When the organic EL display device having such a structure is sealed with the glass substrate 701 and the adhesive 702, moisture enters the display region from the outside through the planarization film 104, and the organic EL element deteriorates. Will occur. In order to solve this problem, Patent Document 2 forms a region B in which the planarization film 104 is divided along the outer periphery of the display region as shown in FIG. 7 to prevent moisture from entering.
JP 2003-282240 A JP 2005-164818 A

外部から有機ＥＬ素子への水分の浸入を防ぐために、樹脂保護膜と無機保護膜とを積層して有機ＥＬ素子を保護する構成は、コストや工程を削減できるため量産に適している。ところが、基板のほぼ全面に平坦化膜を有するトップエミッション型の有機ＥＬ表示装置にこのような保護膜を適用した場合、特許文献１の構成では、平坦化膜を介して外部から有機ＥＬ素子へ水分が浸入してしまう。   In order to prevent moisture from entering the organic EL element from the outside, a structure in which a resin protective film and an inorganic protective film are stacked to protect the organic EL element is suitable for mass production because costs and processes can be reduced. However, when such a protective film is applied to a top emission type organic EL display device having a planarizing film on almost the entire surface of the substrate, in the configuration of Patent Document 1, the organic EL element is externally passed through the planarizing film. Moisture enters.

特許文献２のように平坦化膜に分断領域を設けたとしても、図８のように樹脂保護膜の端部を分断領域Ｂよりも外側の平坦化膜上に形成してしまうと、平坦化膜から浸入した水分が樹脂保護膜１０９を介して表示領域に浸入してしまう。   Even if the dividing region is provided in the planarizing film as in Patent Document 2, if the end portion of the resin protective film is formed on the planarizing film outside the dividing region B as shown in FIG. Moisture that has entered from the film enters the display area through the resin protective film 109.

したがって、上記いずれの場合も、有機ＥＬ素子の発光特性について充分な信頼性が得られないという問題が発生する。   Therefore, in any of the above cases, there arises a problem that sufficient reliability cannot be obtained with respect to the light emission characteristics of the organic EL element.

上記課題を解決する手段として、請求項１に記載した発明は、複数の画素回路と周辺回路とが設けられた基板と、前記複数の画素回路と前記周辺回路との上に設けられた樹脂材料からなる平坦化膜と、前記平坦化膜上に、前記複数の画素回路に対応して配置された複数の有機ＥＬ素子と、前記複数の有機ＥＬ素子を覆う樹脂材料からなる樹脂保護膜と、前記樹脂保護膜を覆う無機材料からなる無機保護膜と、を有する有機ＥＬ表示装置であって、前記平坦化膜は、分断領域によって前記複数の画素回路の上に設けられた領域と前記周辺回路の上に設けられた周辺領域とに分けられており、前記樹脂保護膜の端部は、前記分断領域内に前記周辺領域の平坦化膜と離間して設けられ、前記無機保護膜は、前記分断領域で前記基板と接していることを特徴とする。   As means for solving the above-mentioned problems, the invention described in claim 1 includes a substrate provided with a plurality of pixel circuits and peripheral circuits, and a resin material provided on the plurality of pixel circuits and the peripheral circuits. A plurality of organic EL elements disposed on the planarizing film so as to correspond to the plurality of pixel circuits, and a resin protective film made of a resin material covering the plurality of organic EL elements, An organic EL display device having an inorganic protective film made of an inorganic material that covers the resin protective film, wherein the planarizing film includes a region provided on the plurality of pixel circuits by a divided region and the peripheral circuit. And an edge portion of the resin protective film is provided in the divided region so as to be separated from the planarizing film of the peripheral region, and the inorganic protective film is In contact with the substrate in the segmented area And features.

本発明の有機ＥＬ表示装置によれば、樹脂保護膜の端部が平坦化膜の分断領域、あるいは表示領域を含む平坦化膜上に、周辺領域の平坦化膜とは離間して設けられるため、水分の浸入経路となる樹脂材料を分断することができる。その結果、平坦化膜および樹脂保護膜を介して外部から表示領域へ水分が浸入するのを防止することができ、水分による有機ＥＬ素子の劣化が低減された、信頼性の高い有機ＥＬ表示装置を作製することができる。   According to the organic EL display device of the present invention, the end portion of the resin protective film is provided on the flattening film including the dividing region of the flattening film or the flattening film including the display region so as to be separated from the flattening film in the peripheral region. The resin material that becomes the moisture infiltration path can be divided. As a result, it is possible to prevent moisture from entering the display region from the outside through the planarization film and the resin protective film, and to reduce the deterioration of the organic EL element due to moisture, and to provide a highly reliable organic EL display device Can be produced.

以下に、本発明の実施形態を図１を用いて構成要素ごとに説明した後、その製造方法について説明する。   Below, after describing embodiment of this invention for every component using FIG. 1, the manufacturing method is demonstrated.

本発明の実施形態に係る有機ＥＬ表示装置を示す平面図を図１（ａ）、図１（ａ）のＤ−Ｄ´線の断面図を図１（ｂ）に示す。有機ＥＬ表示装置は、表示領域Ａを有している。   FIG. 1A is a plan view showing an organic EL display device according to an embodiment of the present invention, and FIG. 1B is a cross-sectional view taken along the line DD ′ of FIG. The organic EL display device has a display area A.

（基板）
ガラス等の絶縁性基板１０１上に駆動回路を形成し、基板として用いる。ここで、駆動回路は、有機ＥＬ素子を駆動するための画素回路１０２、画素回路１０２を駆動するための周辺回路１０３の両方もしくはどちらか一方を意味している。画素回路１０２と周辺回路１０３とが基板に形成される場合、前記両方の回路は配線（不図示）で電気的に繋がっている。駆動回路には、多結晶シリコン（以下ｐ−Ｓｉ）、或いは非晶質シリコン（以下ａ―Ｓｉ）等からなるＴＦＴを備えるアクティブマトリクス回路を好適に用いることができる。 (substrate)
A driver circuit is formed over an insulating substrate 101 such as glass and used as a substrate. Here, the drive circuit means the pixel circuit 102 for driving the organic EL element and / or the peripheral circuit 103 for driving the pixel circuit 102. When the pixel circuit 102 and the peripheral circuit 103 are formed on the substrate, both the circuits are electrically connected by wiring (not shown). As the driving circuit, an active matrix circuit including a TFT made of polycrystalline silicon (hereinafter p-Si), amorphous silicon (hereinafter a-Si) or the like can be suitably used.

（平坦化膜）
前記駆動回路の表面にはアクリル樹脂、ポリイミド樹脂等の樹脂材料からなる平坦化膜１０４が形成される。表示領域Ａにおいて、平坦化膜１０４は主に画素回路１０２による基板表面の凹凸を平坦化して、その上に積層する有機化合物層が凹凸により不連続となるのを防止する役割を担っている。周辺領域においては、電極等のエッチング工程から周辺回路を保護する役割を担っている。平坦化膜１０４を分断する分断領域Ｂは、表示領域Ａの周辺であって、かつ駆動回路の設けられていない領域に形成される。これにより、平坦化膜は、表示領域を含む領域とその周辺領域とに分断される。分断領域Ｂは、平坦化膜１０４を介して外部から表示領域Ａへ水分が浸入するのを防ぎ、有機ＥＬ素子の劣化を防止する。 (Flattening film)
A planarizing film 104 made of a resin material such as acrylic resin or polyimide resin is formed on the surface of the drive circuit. In the display region A, the planarization film 104 mainly plays a role of planarizing unevenness of the substrate surface by the pixel circuit 102 and preventing discontinuity of the organic compound layer stacked thereon due to the unevenness. In the peripheral region, it plays a role of protecting the peripheral circuit from the etching process of electrodes and the like. A dividing region B that divides the planarizing film 104 is formed in a region around the display region A and in which a driver circuit is not provided. Thereby, the planarization film is divided into a region including the display region and a peripheral region thereof. The dividing region B prevents moisture from entering the display region A from the outside through the planarizing film 104 and prevents deterioration of the organic EL element.

例えば画素回路１０２と、周辺回路１０３との間に分断領域Ｂを形成すると良い。このとき、画素回路１０２と周辺回路１０３の一部とを、表示領域を含む領域の平坦化膜で覆い、残りの周辺回路を周辺領域の平坦化膜で覆う配置であっても良い。   For example, a divided region B may be formed between the pixel circuit 102 and the peripheral circuit 103. At this time, the pixel circuit 102 and a part of the peripheral circuit 103 may be covered with a planarization film in a region including the display region, and the remaining peripheral circuits may be covered with a planarization film in the peripheral region.

周辺回路が、表示領域の全周ではなく周囲の一部に配置されている場合は、周辺領域の平坦化膜も表示領域の全周に設ける必要はなく、周辺回路が配置された部分にだけ設けてもよい。つまり、表示領域を含む領域の平坦化膜の周囲の一部に周辺領域の平坦化膜が形成されている場合は、分断領域も表示領域の周囲の一部分に形成されることになる。   When the peripheral circuit is arranged not on the entire periphery of the display area but on a part of the periphery, it is not necessary to provide a flattening film in the peripheral area on the entire periphery of the display area. It may be provided. That is, when the planarizing film of the peripheral region is formed in a part of the periphery of the planarizing film in the region including the display region, the divided region is also formed in a part of the periphery of the display region.

表示領域を含む領域の平坦化膜１０４には、後に形成する第一電極１０５と画素回路１０２を電気的に接続するためのコンタクトホール１１２が、画素回路ごとに形成される。   A contact hole 112 for electrically connecting the first electrode 105 to be formed later and the pixel circuit 102 is formed in the planarization film 104 in the region including the display region for each pixel circuit.

（第一電極）
コンタクトホール１１２を介して画素回路１０２に接続する第一電極１０５が、平坦化膜上に有機ＥＬ素子ごとに形成される。第一電極１０５には、Ａｌ、Ａｇ、Ａｕ、ＩＴＯ、ＩＺＯ、ＺｎＯ等、有機ＥＬ素子の電極として公知の材料を用いることができる。 (First electrode)
A first electrode 105 connected to the pixel circuit 102 via the contact hole 112 is formed for each organic EL element on the planarizing film. For the first electrode 105, a known material as an electrode of an organic EL element such as Al, Ag, Au, ITO, IZO, ZnO or the like can be used.

必要に応じて、有機ＥＬ素子間に素子分離膜１０６を形成してもよい。素子分離膜１０６は、後に堆積する有機化合物層が第１電極の膜厚による段差部で途切れないようにするとともに、有機ＥＬ素子の発光領域を規定するものである。素子分離膜１０６の材料には絶縁材料が好適に用いられ、具体的には、アクリル樹脂、ポリイミド樹脂などの樹脂材料が好適に用いられる。   If necessary, an element isolation film 106 may be formed between the organic EL elements. The element isolation film 106 prevents an organic compound layer deposited later from being interrupted by a step portion due to the film thickness of the first electrode, and defines a light emitting region of the organic EL element. An insulating material is preferably used as the material of the element isolation film 106, and specifically, a resin material such as an acrylic resin or a polyimide resin is preferably used.

（有機化合物層）
第一電極１０５上には発光層を備える有機化合物層１０７が形成される。有機化合物層１０７は前記発光層の他に、ホール注入層、ホール輸送層、電子輸送層、電子注入層等の機能を持つ層を有していてもよい。有機化合物層１０７の各層には、公知の材料を用いることができる。 (Organic compound layer)
An organic compound layer 107 including a light emitting layer is formed on the first electrode 105. In addition to the light emitting layer, the organic compound layer 107 may have a layer having a function such as a hole injection layer, a hole transport layer, an electron transport layer, or an electron injection layer. A known material can be used for each layer of the organic compound layer 107.

（第二電極）
有機化合物層１０７上に第二電極１０８が形成され、一対の電極に挟まれた有機化合物層１０７を備える有機ＥＬ素子が形成される。第二電極１０８には第一電極１０５と同様の材料を用いることが出来る。ただし、有機ＥＬ素子で発光した光を取り出すため、第一電極１０５と第二電極１０８の少なくとも一方を透明にしておかなければならない。光取り出し側に形成する電極には、透明導電膜や薄膜金属からなる半透過導電膜、あるいはそれらを積層した膜を用いる。 (Second electrode)
A second electrode 108 is formed on the organic compound layer 107, and an organic EL element including the organic compound layer 107 sandwiched between a pair of electrodes is formed. A material similar to that of the first electrode 105 can be used for the second electrode 108. However, in order to extract light emitted from the organic EL element, at least one of the first electrode 105 and the second electrode 108 must be transparent. As the electrode formed on the light extraction side, a transparent conductive film, a semi-transparent conductive film made of a thin film metal, or a film in which these are laminated is used.

（保護膜）
第二電極１０８上には、樹脂保護膜１０９と無機保護膜１１０からなる保護膜が形成される。 (Protective film)
A protective film composed of a resin protective film 109 and an inorganic protective film 110 is formed on the second electrode 108.

有機ＥＬ表示装置は、複数回のフォトリソグラフィ等によるパターン形成工程や真空成膜工程を経て作製される。これらの工程によるエッチング残渣や、真空装置の内壁から剥がれた膜が付着するなどにより、有機ＥＬ素子が設けられている表示領域の表面には凹凸ができてしまう。凹凸の段差は、製造方法や真空装置等に依存するが、５μｍ以下のものが多い。このような表示領域の表面を無機保護膜のみで保護しようとすると、膜厚が薄い場合は、凹凸を覆いきれずに無機保護膜に欠陥ができて水分が浸入してしまう。凹凸を充分に覆うために凹凸段差以上の厚い無機保護膜を形成すると、膜応力が大きくなって亀裂が入り易くなり、さらに製造のタクト及びコストも増大してしまう。   The organic EL display device is manufactured through a pattern forming process or a vacuum film forming process by a plurality of times of photolithography or the like. The surface of the display area where the organic EL element is provided becomes uneven due to etching residues resulting from these steps or adhesion of a film peeled off from the inner wall of the vacuum apparatus. The uneven step depends on the manufacturing method, the vacuum apparatus, etc., but is often 5 μm or less. If an attempt is made to protect the surface of such a display region only with an inorganic protective film, if the film thickness is thin, the inorganic protective film cannot be covered and a defect is formed and moisture enters. If a thick inorganic protective film having a thickness greater than or equal to the unevenness is formed to sufficiently cover the unevenness, the film stress increases and cracks easily occur, and the manufacturing tact and cost also increase.

そこで本発明では、無機保護膜形成前に樹脂保護膜１０９で少なくとも有機ＥＬ素子の表面を覆い、表面の凹凸を平坦化しておく。樹脂保護膜１０９は、製造工程によって発生する凹凸の段差と同等以上の膜厚に形成する。一般的な製造工程による凹凸の段差と製造コストとを考慮すると、５〜３０μｍの膜厚が好ましい。   Therefore, in the present invention, at least the surface of the organic EL element is covered with the resin protective film 109 before the inorganic protective film is formed, and the unevenness of the surface is flattened. The resin protective film 109 is formed to have a film thickness equal to or greater than the uneven step generated by the manufacturing process. In consideration of uneven steps and manufacturing costs due to a general manufacturing process, a film thickness of 5 to 30 μm is preferable.

樹脂保護膜１０９の端部は、平坦化膜１０４の分断領域、あるいは表示領域を含む領域の平坦化膜上に、周辺領域の平坦化膜とは離間するように設ける。樹脂保護膜１０９の端部が周辺領域の平坦化膜と接したり、周辺領域の平坦膜の上に設けられたりすると、平坦化膜１０４を伝って外部から浸入した水分が樹脂保護膜１０９を介して表示領域Ａに浸入し、有機ＥＬ素子の劣化を引き起こしてしまうからである。   The end portion of the resin protective film 109 is provided on the dividing region of the planarizing film 104 or the planarizing film in the region including the display region so as to be separated from the planarizing film in the peripheral region. When the end portion of the resin protective film 109 is in contact with the planarizing film in the peripheral region or provided on the flat film in the peripheral region, moisture that has entered from the outside through the planarizing film 104 passes through the resin protective film 109. This is because the liquid crystal enters the display area A and causes deterioration of the organic EL element.

また、周辺回路の配置に応じて、周辺領域の平坦化膜が表示領域の周囲の一部にしか設けられていない場合において、周辺領域の平坦化膜のない部分では、樹脂保護膜が基板の端まで広がらないように制御しなければならない。樹脂保護膜表面を確実に無機保護膜で覆い、樹脂保護膜を介して水分が浸入を防止するためである。   Further, when the planarizing film in the peripheral region is provided only in a part of the periphery of the display region according to the arrangement of the peripheral circuit, the resin protective film is formed on the substrate in the portion without the planarizing film in the peripheral region. It must be controlled so that it does not spread to the end. This is because the surface of the resin protective film is surely covered with an inorganic protective film and moisture is prevented from entering through the resin protective film.

樹脂保護膜１０９の表面は凹凸が小さく滑らかであることが好ましいため、液状で基板上に塗布でき、その後硬化して固体にできる材料が好適に用いられる。具体的には、ポリオレフィン系樹脂、ポリエーテル樹脂、エポキシ系樹脂、アクリル樹脂、シリコーン樹脂等が挙げられる。   Since the surface of the resin protective film 109 is preferably smooth with small irregularities, a material that can be applied to the substrate in a liquid state and then cured to be a solid is preferably used. Specific examples include polyolefin resins, polyether resins, epoxy resins, acrylic resins, and silicone resins.

次に、少なくとも樹脂保護膜１０９の表面を無機保護膜１１０で覆い、有機ＥＬ素子へ水分が浸入するのを防止する。樹脂保護膜１０９の表面は滑らかで平坦であるため、無機保護膜１１０は０．５〜３μｍ程度の膜厚でその表面を覆うことができ、水分の浸入を防ぐことができる。無機保護膜１１０には、水分透過率の低い、窒化珪素、酸化珪素、その混合物等が用いられる。   Next, at least the surface of the resin protective film 109 is covered with an inorganic protective film 110 to prevent moisture from entering the organic EL element. Since the surface of the resin protective film 109 is smooth and flat, the inorganic protective film 110 can cover the surface with a film thickness of about 0.5 to 3 μm and can prevent moisture from entering. For the inorganic protective film 110, silicon nitride, silicon oxide, a mixture thereof, or the like having a low moisture permeability is used.

ここで図４に示すように、樹脂保護膜１０９形成前に、表示領域Ａの第二電極１０８上に機械的強度の高い材料からなる無機下地膜４０２を形成しておいてもよい。無機下地膜を形成しておけば、樹脂保護膜１０９材料が硬化する際の硬化収縮や硬化後の膜応力が無機下地膜４０２より下に積層されている層に伝わるのを防ぎ、膜剥がれを防止することができる。さらに無機下地膜４０２を設けない場合に比べて許容できる樹脂保護膜材料の硬化収縮率や膜応力の幅が広がり、樹脂保護膜として用いることのできる樹脂材料の選択肢を増やすことができる。   Here, as shown in FIG. 4, an inorganic underlayer film 402 made of a material having high mechanical strength may be formed on the second electrode 108 in the display area A before the resin protective film 109 is formed. If an inorganic underlayer film is formed, it is possible to prevent the film shrinkage when the resin protective film 109 material is cured and the film stress after curing from being transmitted to the layer laminated below the inorganic underlayer film 402, thereby preventing film peeling. Can be prevented. Furthermore, as compared with the case where the inorganic base film 402 is not provided, the allowable range of cure shrinkage and the range of film stress of the resin protective film material are widened, and the choice of resin materials that can be used as the resin protective film can be increased.

無機下地膜４０２には、酸化アルミニウム、窒化珪素、酸化珪素等を用いることができる。また、無機下地膜４０２には水分を遮断する機能は必要でないため、膜厚は０．１〜１μｍで良い。   For the inorganic base film 402, aluminum oxide, silicon nitride, silicon oxide, or the like can be used. Further, since the inorganic base film 402 does not need a function of blocking moisture, the film thickness may be 0.1 to 1 μm.

（製造方法）
本発明の実施形態である有機ＥＬ表示装置の製造方法について述べる。 (Production method)
A method for manufacturing an organic EL display device according to an embodiment of the present invention will be described.

ＴＦＴや駆動回路は、従来の方法でガラス等の絶縁性基板上に形成することができる。   The TFT and the driving circuit can be formed on an insulating substrate such as glass by a conventional method.

駆動回路を形成した側の基板全面に、大気中で感光性アクリル樹脂をスピンコーターで塗布した後に加熱硬化し、平坦化膜１０４とする。続いてフォトリソグラフィを用い、表示領域Ａの周囲の平坦化膜１０４を除去して分断領域Ｂを形成する。この時、画素ごとにコンタクトホール１１２を同時に形成する。   A photosensitive acrylic resin is applied to the entire surface of the substrate on the side where the drive circuit is formed with a spin coater in the air, and then cured by heating to form the planarizing film 104. Subsequently, the planarizing film 104 around the display area A is removed using photolithography to form the divided area B. At this time, the contact hole 112 is simultaneously formed for each pixel.

第一電極１０５の形成にはスパッタリング法を用い、例えばＡｌとＩＴＯの積層膜を形成し、フォトリソグラフィにて有機ＥＬ素子に対応するパターンに形成する。それぞれ第一電極１０５は、平坦化膜１０４に形成したコンタクトホールを通じて対応する画素回路１０２に電気的に接続される。   The first electrode 105 is formed by sputtering, for example, a laminated film of Al and ITO is formed into a pattern corresponding to the organic EL element by photolithography. Each first electrode 105 is electrically connected to the corresponding pixel circuit 102 through a contact hole formed in the planarization film 104.

素子分離膜１０６は、平坦化膜１０４と同様に、スピンコーターで基板全体に形成した後、フォトリソグラフィにてパターニングされ、脱水のためアニールされる。平坦化膜１０４や素子分離膜１０６に含まれる水分を十分に脱水することにより、後に形成する有機ＥＬ素子に水分が浸入するのを防ぐことができる。   As with the planarization film 104, the element isolation film 106 is formed on the entire substrate by a spin coater, patterned by photolithography, and annealed for dehydration. By sufficiently dehydrating moisture contained in the planarization film 104 and the element isolation film 106, it is possible to prevent moisture from entering an organic EL element to be formed later.

有機化合物層１０７は従来の材料を用いて、蒸着法、レーザー転写法、インクジェット等を用いた塗布法などを用いて形成することが出来る。蒸着法にて、有機化合物層１０７を有機ＥＬ素子ごとに膜厚や材料を変えて形成する場合は、メタルマスクを用いるとよい。有機化合物層１０７を形成した後、無機保護膜１１０を形成するまでは、露点管理した雰囲気中で工程を行い、工程中に水分が有機ＥＬ素子へ浸入するのを防止する。   The organic compound layer 107 can be formed using a conventional material by a vapor deposition method, a laser transfer method, a coating method using an inkjet, or the like. In the case where the organic compound layer 107 is formed by changing the film thickness or material for each organic EL element by vapor deposition, a metal mask may be used. After the organic compound layer 107 is formed and before the inorganic protective film 110 is formed, a process is performed in an atmosphere with dew point control to prevent moisture from entering the organic EL element during the process.

樹脂保護膜１０９は、端部が分断領域、あるいは表示領域を含む領域の平坦化膜上に、周辺領域の平坦化膜とは離間するように形成する。樹脂保護膜１０９の端部を所定の位置に形成する手段として、あらかじめ塗布手段の塗布精度より広い幅に分断領域Ｂを形成しておき、描画可能なディスペンサーやスクリーン印刷法等を用いる方法が挙げられる。分断領域Ｂの幅が広くなると、その分出来上がった有機ＥＬ表示装置の額縁が広くなってしまうため、塗布精度の高い塗布手段を採用し、分断領域Ｂの幅を２０〜２００μｍとするのが好ましい。   The resin protective film 109 is formed on the flattening film in the region including the divided region or the display region so that the end portion is separated from the flattening film in the peripheral region. As a means for forming the end portion of the resin protective film 109 at a predetermined position, there is a method in which a divided region B is formed in advance with a width wider than the application accuracy of the application means, and a drawable dispenser, a screen printing method, or the like is used. It is done. When the width of the divided region B is widened, the frame of the organic EL display device thus completed becomes wide. Therefore, it is preferable to employ a coating means with high coating accuracy and to set the width of the divided region B to 20 to 200 μm. .

樹脂保護膜１０９の端部位置を決める別の手段として、樹脂保護膜の端部位置決め構造を設けても良い。端部位置決め構造は、塗布後の樹脂保護膜材料が塗布面を伝って広がる際の抵抗となり、所定の位置で広がりを止めることができる。端部位置決め構造は、樹脂保護膜１０９を形成する領域の外周に、溝や土手、若しくはそれらを組み合わせて形成することができる。端部位置決め構造を採用すれば、ディスペンサーによる描画や印刷だけでは塗布後に材料が広がり、端部位置を決めることのできない、粘度の低い樹脂材料を好適に用いることが可能となる。樹脂保護膜材料の粘度に応じて、端部位置決め構造を複数設けても良い。   As another means for determining the end position of the resin protective film 109, an end positioning structure of the resin protective film may be provided. The end positioning structure becomes resistance when the resin protective film material after application spreads along the application surface, and can stop spreading at a predetermined position. The end portion positioning structure can be formed on the outer periphery of the region where the resin protective film 109 is formed by combining a groove, a bank, or a combination thereof. If the end portion positioning structure is adopted, it is possible to suitably use a low viscosity resin material in which the material spreads after application only by drawing or printing with a dispenser and the end position cannot be determined. A plurality of end positioning structures may be provided according to the viscosity of the resin protective film material.

分断領域のない部分において樹脂保護膜の端部の位置を決めるためにも、分断領域と同様の端部位置決め構造を用いることができる。   In order to determine the position of the end portion of the resin protective film in the portion without the dividing region, an end portion positioning structure similar to that of the dividing region can be used.

端部位置決め構造は、平坦化膜や素子分離膜など、表示領域をを構成する材料を利用して、それらをパターニングする際に同時に形成しておくと、工程や材料を追加することなく好ましい。   It is preferable that the edge positioning structure is formed at the same time as patterning using a material constituting the display region such as a planarization film or an element isolation film without patterning or adding any process.

端部位置を決め構造を樹脂材料で形成したときは、樹脂保護膜の表面を覆うとともに端部位置決め構造の表面を覆い、分断領域に達するまで無機保護膜を形成して外部から水分が浸入しないようにしておく必要がある。   When the edge position is determined and the structure is formed of a resin material, the surface of the resin protective film is covered and the surface of the edge positioning structure is covered, and an inorganic protective film is formed until the dividing region is reached, so that moisture does not enter from the outside. It is necessary to do so.

塗布した樹脂保護膜材料は、加熱、或いはＵＶ照射により硬化する。   The applied resin protective film material is cured by heating or UV irradiation.

無機保護膜１１０や図４に示した無機下地膜４０１の形成方法には、プラズマＣＶＤ法、スパッタリング法等の真空成膜法を好適に用いることができる。   As a method for forming the inorganic protective film 110 or the inorganic base film 401 shown in FIG. 4, a vacuum film forming method such as a plasma CVD method or a sputtering method can be suitably used.

以下に、本発明の実施例について詳細に説明する。   Hereinafter, examples of the present invention will be described in detail.

〈実施例１〉
図１（ａ）は、本実施例にかかる有機ＥＬ表示装置の平面図、図１（ｂ）は（ａ）のＤ−Ｄ´断面図である。 <Example 1>
FIG. 1A is a plan view of an organic EL display device according to this example, and FIG. 1B is a cross-sectional view taken along the line DD ′ in FIG.

まず、縦１００ｍｍ、横１００ｍｍ、厚さ０．５ｍｍのガラス基板上に、ｐ−ＳｉからなるＴＦＴを備える駆動回路を形成した。表示領域Ａには複数の画素回路１０２を形成し、周辺部には画素回路１０２を駆動するための周辺回路１０３を、表示領域Ａを囲むように形成した。次に、駆動回路上に平坦化膜材料のフォトレジタイプの紫外線硬化性アクリル樹脂をスピンコーターを用いて塗布し、コンタクトホール１１２と分断領域Ｂのパターンを有するフォトマスクを載せて、１８００ｍＷの照度で露光した。さらに現像液で現像し、２００℃でポストベークして、コンタクトホール１１２と分断領域Ｂを有する膜厚２μｍの平坦化膜１０４を形成した。分断領域Ｂは、表示領域Ａの外周より３５０μｍ外側の位置から幅２００μｍで平坦化膜を除去して形成した。これにより、平坦化膜は、表示領域を含む領域と周辺領域とに分断された。   First, a drive circuit including TFTs made of p-Si was formed on a glass substrate having a length of 100 mm, a width of 100 mm, and a thickness of 0.5 mm. A plurality of pixel circuits 102 are formed in the display area A, and a peripheral circuit 103 for driving the pixel circuits 102 is formed in the peripheral portion so as to surround the display area A. Next, a photo-resist type ultraviolet curable acrylic resin, which is a planarizing film material, is applied onto the drive circuit using a spin coater, and a photomask having a pattern of the contact hole 112 and the dividing region B is placed thereon, and an illuminance of 1800 mW And exposed. Further, the film was developed with a developer and post-baked at 200 ° C. to form a planarizing film 104 having a thickness of 2 μm having a contact hole 112 and a divided region B. The dividing region B was formed by removing the planarizing film with a width of 200 μm from a position 350 μm outside the outer periphery of the display region A. Thereby, the planarizing film was divided into a region including the display region and a peripheral region.

次に、膜厚１００ｎｍのＡｌ上に膜厚５０ｎｍのＩＺＯをスパッタリング法により積層し、第一電極１０５とした。第一電極１０５は、基板上の積層体全面に形成した後フォトリソグラフィにてパターニングし、画素回路１０２に対応する位置に形成した。第一電極１０５は前記コンタクトホール１１２を通してそれぞれ画素回路１０２に電気的に接続された。   Next, IZO having a thickness of 50 nm was stacked on the Al having a thickness of 100 nm by a sputtering method to form the first electrode 105. The first electrode 105 was formed on the entire surface of the stacked body on the substrate and then patterned by photolithography to be formed at a position corresponding to the pixel circuit 102. The first electrodes 105 were electrically connected to the pixel circuits 102 through the contact holes 112, respectively.

平坦化膜１０４および第一電極１０５の上に、スピンコーターでポリイミド樹脂を厚さ１．６μｍに塗布した後、各画素の発光領域と、表示領域Ａより外側の領域とに形成されたポリイミド樹脂をフォトリソグラフィ法にて除去し、素子分離膜１０６とした。   A polyimide resin is applied on the planarizing film 104 and the first electrode 105 with a spin coater to a thickness of 1.6 μm, and then formed in a light emitting region of each pixel and a region outside the display region A. Was removed by photolithography to form an element isolation film 106.

素子分離膜１０６等が形成された基板を、圧力１０−２Ｐａ、１５０℃雰囲気下で１０分加熱した後、表示領域Ａの第一電極１０５上に有機化合物層１０７を形成した。有機化合物層１０７には、公知の有機材料からなるホール輸送層、発光層、電子輸送層、電子注入層を、抵抗加熱蒸着法を用いて順次積層した。 The substrate on which the element isolation film 106 and the like were formed was heated for 10 minutes in a pressure 10 −2 Pa and 150 ° C. atmosphere, and then an organic compound layer 107 was formed on the first electrode 105 in the display region A. A hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer made of a known organic material were sequentially stacked on the organic compound layer 107 by using a resistance heating vapor deposition method.

続いて、分断領域Ｂの外周よりも表示領域側の全面に、ＩＺＯからなる第二電極１０８を、スパッタリング法により５０ｎｍの膜厚で形成した。   Subsequently, a second electrode 108 made of IZO was formed with a film thickness of 50 nm on the entire surface closer to the display region than the outer periphery of the divided region B by a sputtering method.

次に、露点温度−６０℃の窒素雰囲気下で、粘度３０００ｍＰａ・ｓの熱硬化性のエポキシ樹脂を精密描画が可能なディスペンサー（武蔵エンジニアリング社製ＳＨＯＴ ＭＩＮＩ ＳＬ）を用い、有機ＥＬ素子を覆うように塗布した。ディスペンサー吐出口が描く軌跡の外周が、分断領域Ｂの幅方向の中心線をなぞるようにして塗布したところ、エポキシ樹脂の端部を幅２００μｍの平坦化膜の分断領域Ｂ内に周辺領域の平坦化膜とは離間して配置することができた。塗布後のエポキシ樹脂は、真空環境下で１００℃の温度で１５分間加熱して硬化させ、膜厚３０μｍの樹脂保護膜１０９とした。   Next, in a nitrogen atmosphere with a dew point temperature of −60 ° C., a dispenser (SHOT MINI SL manufactured by Musashi Engineering Co., Ltd.) capable of accurately drawing a thermosetting epoxy resin having a viscosity of 3000 mPa · s is used to cover the organic EL element. It was applied to. When the outer periphery of the locus drawn by the dispenser discharge port is applied so as to trace the center line in the width direction of the dividing region B, the end portion of the epoxy resin is flattened in the dividing region B of the flattening film having a width of 200 μm. It was possible to arrange it away from the chemical film. The epoxy resin after coating was cured by heating at a temperature of 100 ° C. for 15 minutes in a vacuum environment to form a resin protective film 109 having a thickness of 30 μm.

さらに、窒化珪素からなる無機保護膜１１０を、ＳｉＨ４ガス、Ｎ２ガス、Ｈ２ガスを用いたプラズマＣＶＤ法で成膜した。無機保護膜の膜厚は１μｍとし、有機ＥＬ素子が形成された基板表面全体を覆うように形成した。   Further, an inorganic protective film 110 made of silicon nitride was formed by a plasma CVD method using SiH 4 gas, N 2 gas, and H 2 gas. The film thickness of the inorganic protective film was 1 μm, and was formed so as to cover the entire substrate surface on which the organic EL element was formed.

以上のようにして形成された有機ＥＬ表示装置の表示領域Ａ、平坦化膜１０４、分断領域Ｂ、樹脂保護膜１０９との位置関係を、図１（ｂ）に示しておく。   FIG. 1B shows the positional relationship between the display area A, the planarizing film 104, the dividing area B, and the resin protective film 109 of the organic EL display device formed as described above.

作製した有機ＥＬ表示装置について、温度６０℃、湿度９０％環境下での保存試験を行ったところ、１０００時間の保存試験の結果においても、ダークスポットは発生しなかった。   The produced organic EL display device was subjected to a storage test under a temperature of 60 ° C. and a humidity of 90%. As a result of the storage test for 1000 hours, no dark spot was generated.

〈実施例２〉
本実施例の有機ＥＬ表示装置の断面を図２に示す。 <Example 2>
A cross section of the organic EL display device of this example is shown in FIG.

本実施例は、樹脂保護膜１０９の端部を表示領域を含む領域の平坦化膜上に設け、素子分離膜材料からなる、樹脂保護膜の端部位置を決めるための構造２０１を形成し、粘度の低い樹脂保護膜材料を用いた点が実施例１とは異なっている。図１と共通の番号を付した構成は、実施例１と同様に形成した。   In this embodiment, the end portion of the resin protective film 109 is provided on the planarizing film in the region including the display region, and the structure 201 for determining the end position of the resin protective film made of the element isolation film material is formed. The difference from Example 1 is that a resin protective film material having a low viscosity is used. The configurations denoted by the same reference numerals as those in FIG. 1 were formed in the same manner as in Example 1.

樹脂保護膜の端部位置を決めるための構造２０１は、素子分離膜１０６パターンを形成する際、表示領域Ａと分断領域Ｂの内周との間に表示領域Ａを囲むように幅５０μｍの素子分離膜材料を残したものである。表示領域Ａより外側の素子分離膜１０６を除去する部分Ｃには第一電極材料を残しておいた。部分Ｃの第一電極材料は、素子分離膜材料のパターンを形成する際に平坦化膜１０４がオーバーエッチングされるのを防ぐエッチングストップ膜２０２として機能する。   The structure 201 for determining the position of the end portion of the resin protective film is an element having a width of 50 μm so as to surround the display area A between the display area A and the inner periphery of the divided area B when the element isolation film 106 pattern is formed. The separation membrane material remains. The first electrode material was left in the portion C where the element isolation film 106 outside the display area A was removed. The first electrode material of the portion C functions as an etching stop film 202 that prevents the planarization film 104 from being over-etched when the pattern of the element isolation film material is formed.

樹脂保護膜材料として、粘度１５００ｍＰａ・ｓの熱硬化性のエポキシ樹脂を、樹脂保護膜の端部位置を決めるための構造２０１から１ｍｍ表示領域側に入った位置まで塗布した。塗布したエポキシ樹脂は粘度が低いため塗布面を伝って広がるが、端部位置決め構造２０１を超えて広がる事はなく、表示領域を含む領域の平坦化膜上に樹脂保護膜の端部を配置することができた。また、粘度が低いため実施例１に比べて２０μｍの薄い樹脂保護膜を形成することができた。   As the resin protective film material, a thermosetting epoxy resin having a viscosity of 1500 mPa · s was applied from the structure 201 for determining the end position of the resin protective film to a position entering the 1 mm display area side. Since the applied epoxy resin has a low viscosity and spreads along the coated surface, it does not spread beyond the end positioning structure 201, and the end portion of the resin protective film is disposed on the planarizing film in the region including the display region. I was able to. Further, since the viscosity was low, a thin resin protective film having a thickness of 20 μm as compared with Example 1 could be formed.

出来上がった有機ＥＬ表示装置を、温度６０℃、湿度９０％環境下での保存試験を行ったところ、１０００時間の保存試験の結果においても、ダークスポットは発生しなかった。   When the completed organic EL display device was subjected to a storage test under an environment of a temperature of 60 ° C. and a humidity of 90%, no dark spot was generated even in the result of the storage test for 1000 hours.

〈実施例３〉
本実施例の有機ＥＬ表示装置の断面を図３に示す。 <Example 3>
FIG. 3 shows a cross section of the organic EL display device of this example.

本実施例は、平坦化膜の分断領域を二重に形成し、表示領域側の分断領域Ｂ３１を樹脂保護膜の端部位置を決めるための構造として利用した点が実施例２と異なっている。図２と共通の番号を付した構成は、実施例２と同様に形成した。   The present embodiment is different from the second embodiment in that the dividing region of the flattening film is doubled and the dividing region B31 on the display region side is used as a structure for determining the end position of the resin protective film. . The configurations denoted by the same reference numerals as in FIG. 2 were formed in the same manner as in Example 2.

平坦化膜の分断領域Ｂ３１およびＢ３２は、幅１００μｍで７０μｍの間隔をおいて二重に形成した。塗布した樹脂保護膜材料は、表示領域側に形成された分断領域Ｂ３１で止まり、分断領域Ｂ３２にまで広がることは無かった。   The dividing regions B31 and B32 of the flattening film were doubled with a width of 100 μm and an interval of 70 μm. The applied resin protective film material stopped at the dividing area B31 formed on the display area side, and did not spread to the dividing area B32.

出来上がった有機ＥＬ表示装置を、温度６０℃、湿度９０％環境下での保存試験を行ったところ、１０００時間の保存試験の結果においても、ダークスポットは発生しなかった。   When the completed organic EL display device was subjected to a storage test under an environment of a temperature of 60 ° C. and a humidity of 90%, no dark spot was generated even in the result of the storage test for 1000 hours.

〈実施例４〉
本実施例の有機ＥＬ表示装置の断面を図４に示す。 <Example 4>
FIG. 4 shows a cross section of the organic EL display device of this example.

本実施例は、平坦化膜の分断領域を幅方向に分割するように素子分離膜材料で仕切り４０１を形成し、表示領域側の分断領域Ｂ４１を樹脂保護膜の端部位置決め構造として利用した点、および表示領域に無機下地膜４０２を形成した点が実施例３と異なっている。   In this embodiment, the partition 401 is formed of the element isolation film material so as to divide the dividing region of the flattening film in the width direction, and the dividing region B41 on the display region side is used as the end portion positioning structure of the resin protective film. And the point that the inorganic base film 402 is formed in the display region is different from the third embodiment.

無機下地膜４０２を形成しておくことで、樹脂保護膜１０９材料が硬化する際の収縮せん断力や硬化後の膜応力が、無機下地膜４０２より下に積層した層に伝わらず、膜剥がれを防止することができる。図１と共通の番号を付した構成は、実施例２と同様に形成した。   By forming the inorganic base film 402, the shrinkage shear force when the resin protective film 109 material is cured and the film stress after curing are not transmitted to the layer laminated below the inorganic base film 402, and the film is peeled off. Can be prevented. The configurations denoted by the same reference numerals as in FIG. 1 were formed in the same manner as in Example 2.

仕切り４０１は、表示領域Ａを囲んで平坦化膜の分断領域Ｂ４２を分割するように、素子分離膜材料にて幅５０μｍで形成した。   The partition 401 is formed with an element isolation film material with a width of 50 μm so as to divide the dividing region B42 of the planarization film so as to surround the display region A.

無機下地膜４０２として、第二電極１０８を形成した表示領域上に、ＳｉＨ４ガス、Ｎ２ガス、Ｈ２ガスを用いたプラズマＣＶＤ法にて、窒化珪素を０．２μｍの膜厚で形成した。   As the inorganic base film 402, silicon nitride was formed to a thickness of 0.2 μm on the display region where the second electrode 108 was formed by a plasma CVD method using SiH 4 gas, N 2 gas, and H 2 gas.

出来上がった有機ＥＬ表示装置を、温度６０℃、湿度９０％環境下での保存試験を行ったところ、１０００時間の保存試験の結果においても、ダークスポットは発生しなかった。   When the completed organic EL display device was subjected to a storage test under an environment of a temperature of 60 ° C. and a humidity of 90%, no dark spot was generated even in the result of the storage test for 1000 hours.

〈実施例５〉
本実施例の有機ＥＬ表示装置の平面図を図５に示す。 <Example 5>
FIG. 5 shows a plan view of the organic EL display device of this example.

本実施例は、周辺回路を表示領域Ａの周囲の一部にのみ形成した点が、実施例１と異なる。そのため、平坦化膜１０４は表示領域Ａを含む領域、およびそのの周囲の一部に設けられている。図１と共通の番号を付した構成は、実施例１と同様に形成した。   The present embodiment is different from the first embodiment in that the peripheral circuit is formed only in a part of the periphery of the display area A. Therefore, the planarization film 104 is provided in a region including the display region A and a part of the periphery thereof. The configurations denoted by the same reference numerals as those in FIG. 1 were formed in the same manner as in Example 1.

表示領域Ａを含む領域の周辺に平坦化膜１０４が設けられている部分では、ディスペンサー吐出口の描く軌跡の外周が分断領域Ｂの幅方向の中心線をたどるように塗布した。結果、幅２００μｍの平坦化膜の分断領域Ｂ内に樹脂保護膜の端部を配置することができた。表示領域Ａを含む領域の周辺に平坦化膜１０４が形成されていない部分では、表示領域Ａを含む平坦化膜の端から５００μｍ離れた位置をディスペンサー吐出口が軌跡を描くように樹脂保護膜材料を塗布した。その結果、基板の端部より内側（表示領域側）５００μｍの位置に樹脂保護膜の端部を配置することができた。   In the portion where the planarizing film 104 is provided around the area including the display area A, the coating is applied so that the outer periphery of the locus drawn by the dispenser discharge port follows the center line in the width direction of the divided area B. As a result, the end portion of the resin protective film could be disposed in the dividing region B of the planarizing film having a width of 200 μm. Resin protective film material so that the dispenser discharge port draws a locus at a position 500 μm away from the edge of the flattening film including the display area A in a portion where the flattening film 104 is not formed around the area including the display area A Was applied. As a result, the end portion of the resin protective film could be arranged at a position 500 μm inside (display area side) from the end portion of the substrate.

出来上がった有機ＥＬ表示装置を、温度６０℃、湿度９０％環境下での保存試験を行ったところ、１０００時間の保存試験の結果においても、ダークスポットは発生しなかった。   When the completed organic EL display device was subjected to a storage test under an environment of a temperature of 60 ° C. and a humidity of 90%, no dark spot was generated even in the result of the storage test for 1000 hours.

〈比較例〉
図８に示すように、樹脂保護膜１０９の端部を分断領域Ｂより外側にある周辺領域の平坦化膜上に形成した以外は実施例１と同様にして有機ＥＬ表示装置を作製し、温度６０℃、湿度９０％環境下で１０００時間の保存試験を行った。保存試験の結果、約２０ヶ所でダークスポットの拡大が確認された。 <Comparative example>
As shown in FIG. 8, an organic EL display device was fabricated in the same manner as in Example 1 except that the end portion of the resin protective film 109 was formed on the planarizing film in the peripheral region outside the dividing region B. A storage test was conducted for 1000 hours in an environment of 60 ° C. and 90% humidity. As a result of the storage test, expansion of dark spots was confirmed at about 20 locations.

（ａ）は本発明の実施形態および実施例１に係る有機ＥＬ表示装置の平面図であり、（ｂ）は（ａ）に示した本実施例のＤ−Ｄ’断面図。(A) is a top view of the organic electroluminescent display apparatus which concerns on embodiment and Example 1 of this invention, (b) is D-D 'sectional drawing of the present Example shown to (a). 本発明の実施例２に係る有機ＥＬ表示装置の断面図。Sectional drawing of the organic electroluminescence display which concerns on Example 2 of this invention. 本発明の実施例３に係る有機ＥＬ表示装置の断面図。Sectional drawing of the organic electroluminescence display which concerns on Example 3 of this invention. 本発明の実施例４に係る有機ＥＬ表示装置の断面図。Sectional drawing of the organic electroluminescence display which concerns on Example 4 of this invention. 本発明の実施例５に係る有機ＥＬ表示装置の平面図。The top view of the organic electroluminescence display which concerns on Example 5 of this invention. 特許文献１に係る有機ＥＬ表示装置の断面図。Sectional drawing of the organic electroluminescence display which concerns on patent document 1. FIG. 特許文献２に係る有機ＥＬ表示装置の断面図。Sectional drawing of the organic electroluminescence display which concerns on patent document 2. FIG. 比較例に係る有機ＥＬ表示装置の断面図。Sectional drawing of the organic electroluminescence display which concerns on a comparative example.

符号の説明Explanation of symbols

１０１ 基板
１０２ 駆動回路
１０３ 周辺回路
１０４ 平坦化膜
１０５ 第一電極
１０６ 分離膜
１０７ 有機化合物層
１０８ 第二電極
１０９ 樹脂保護膜
１１０ 無機保護膜
４０１ 仕切り
４０２ 無機下地膜
２０１ 樹脂保護膜の端部位置決め構造
２０２ エッチングストップ層
Ａ 表示領域
Ｂ 分断領域
Ｂ３１ 表示領域側分断領域（樹脂保護膜の端部位置決め構造）
Ｂ３２ 外側分断領域
Ｂ４１ 表示領域側分断領域（樹脂保護膜端部位置決め構造）
Ｂ４２ 外側分断領域
７０１ ガラス基板
７０２ 接着剤 DESCRIPTION OF SYMBOLS 101 Substrate 102 Drive circuit 103 Peripheral circuit 104 Flattening film 105 First electrode 106 Separation film 107 Organic compound layer 108 Second electrode 109 Resin protective film 110 Inorganic protective film 401 Partition 402 Inorganic base film 201 End positioning structure of resin protective film 202 Etching Stop Layer A Display Area B Divided Area B31 Display Area Side Divided Area (End Positioning Structure of Resin Protective Film)
B32 Outside dividing area B41 Display area side dividing area (resin protective film edge positioning structure)
B42 Outside parting region 701 Glass substrate 702 Adhesive

Claims (7)

複数の画素回路と周辺回路とが設けられた基板と、
前記複数の画素回路と前記周辺回路との上に設けられた樹脂材料からなる平坦化膜と、
前記平坦化膜上に、前記複数の画素回路に対応して配置された複数の有機ＥＬ素子と、
前記複数の有機ＥＬ素子を覆う樹脂材料からなる樹脂保護膜と、
前記樹脂保護膜を覆う無機材料からなる無機保護膜と、
を有する有機ＥＬ表示装置であって、
前記平坦化膜は、分断領域によって前記複数の画素回路の上に設けられた領域と前記周辺回路の上に設けられた周辺領域とに分けられており、
前記樹脂保護膜の端部は、前記分断領域内に前記周辺領域の平坦化膜と離間して設けられ、
前記無機保護膜は、前記分断領域で前記基板と接していることを特徴とする有機ＥＬ表示装置。 A substrate provided with a plurality of pixel circuits and peripheral circuits;
A planarizing film made of a resin material provided on the plurality of pixel circuits and the peripheral circuit;
A plurality of organic EL elements disposed on the planarizing film so as to correspond to the plurality of pixel circuits;
A resin protective film made of a resin material covering the plurality of organic EL elements;
An inorganic protective film made of an inorganic material covering the resin protective film;
An organic EL display device having
The planarizing film is divided into a region provided on the plurality of pixel circuits and a peripheral region provided on the peripheral circuit by a dividing region,
The end portion of the resin protective film is provided in the divided region so as to be separated from the planarizing film in the peripheral region,
The organic EL display device, wherein the inorganic protective film is in contact with the substrate in the divided region. 土手もしくは溝もしくはそれらを組み合わせた位置決め構造によって前記樹脂保護膜の端部位置が決められている請求項１に記載の有機ＥＬ表示装置。   The organic EL display device according to claim 1, wherein an end portion position of the resin protective film is determined by a bank, a groove, or a positioning structure combining them. 前記土手もしくは溝もしくはそれらを組み合わせた構造は、前記平坦化膜を構成する材料からなることを特徴とする請求項２に記載の有機ＥＬ表示装置。   3. The organic EL display device according to claim 2, wherein the bank, the groove, or a combination thereof is made of a material constituting the planarizing film. 前記有機ＥＬ表示装置は、前記複数の有機ＥＬ素子の発光領域を区画する素子分離膜をさらに有しており、前記位置決め構造は、前記素子分離膜を構成する材料からなることを特徴とする請求項２に記載の有機ＥＬ表示装置。   The organic EL display device further includes an element isolation film that partitions light emitting regions of the plurality of organic EL elements, and the positioning structure is made of a material constituting the element isolation film. Item 3. An organic EL display device according to Item 2. 複数の画素回路と周辺回路とが設けられた基板と、
前記複数の画素回路と前記周辺回路との上に設けられた樹脂材料からなる平坦化膜と、
前記平坦化膜上に、前記複数の画素回路に対応して配置された複数の有機ＥＬ素子と、
前記複数の有機ＥＬ素子を覆う無機材料からなる無機下地膜と、
前記無機下地膜の上に設けられ、前記複数の有機ＥＬ素子を覆う樹脂材料からなる樹脂保護膜と、
前記樹脂保護膜を覆う無機材料からなる無機保護膜と、
を有する有機ＥＬ表示装置であって、
前記平坦化膜は、分断領域によって前記複数の画素回路の上に設けられた領域と前記周辺回路の上に設けられた周辺領域とに分けられており、
前記樹脂保護膜の端部は、前記分断領域内に前記周辺領域の平坦化膜と離間して設けられ、
前記分断領域において、
前記無機下地膜は前記基板と接しており、
前記無機下地膜が前記基板と接する部分で、前記無機保護膜は前記無機下地膜と接していることを特徴とする有機ＥＬ表示装置。 A substrate provided with a plurality of pixel circuits and peripheral circuits;
A planarizing film made of a resin material provided on the plurality of pixel circuits and the peripheral circuit;
A plurality of organic EL elements disposed on the planarizing film so as to correspond to the plurality of pixel circuits;
An inorganic base film made of an inorganic material covering the plurality of organic EL elements;
A resin protective film made of a resin material provided on the inorganic base film and covering the plurality of organic EL elements;
An inorganic protective film made of an inorganic material covering the resin protective film;
An organic EL display device having
The planarizing film is divided into a region provided on the plurality of pixel circuits and a peripheral region provided on the peripheral circuit by a dividing region,
The end portion of the resin protective film is provided in the divided region so as to be separated from the planarizing film in the peripheral region,
In the divided region,
The inorganic base film is in contact with the substrate;
The organic EL display device, wherein the inorganic base film is in contact with the inorganic base film at a portion where the inorganic base film is in contact with the substrate. 土手もしくは溝もしくはそれらを組み合わせた構造によって前記樹脂保護膜の端部位置が決められている請求項５に記載の有機ＥＬ表示装置。   The organic EL display device according to claim 5, wherein an end position of the resin protective film is determined by a bank, a groove, or a structure combining them. 前記有機ＥＬ表示装置は、前記複数の有機ＥＬ素子の発光領域を区画する素子分離膜をさらに有しており、
前記土手もしくは溝もしくはそれらを組み合わせた構造は、前記素子分離膜を構成する材料からなることを特徴とする請求項５に記載の有機ＥＬ表示装置。 The organic EL display device further includes an element isolation film that partitions light emitting regions of the plurality of organic EL elements,
The organic EL display device according to claim 5, wherein the bank, the groove, or a combination thereof is made of a material constituting the element isolation film.
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