JP4455030B2 - 透明合成石英ガラスの製造方法 - Google Patents
透明合成石英ガラスの製造方法 Download PDFInfo
- Publication number
- JP4455030B2 JP4455030B2 JP2003403903A JP2003403903A JP4455030B2 JP 4455030 B2 JP4455030 B2 JP 4455030B2 JP 2003403903 A JP2003403903 A JP 2003403903A JP 2003403903 A JP2003403903 A JP 2003403903A JP 4455030 B2 JP4455030 B2 JP 4455030B2
- Authority
- JP
- Japan
- Prior art keywords
- synthetic quartz
- quartz glass
- transparent synthetic
- producing
- ppm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 61
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000010453 quartz Substances 0.000 claims description 22
- 239000000843 powder Substances 0.000 claims description 18
- 238000010304 firing Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 8
- 239000012535 impurity Substances 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 238000006460 hydrolysis reaction Methods 0.000 claims description 5
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 4
- 230000005484 gravity Effects 0.000 claims description 4
- 239000005049 silicon tetrachloride Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 11
- 230000008018 melting Effects 0.000 description 7
- 239000010419 fine particle Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
Description
四塩化珪素を火炎加水分解で得られた合成石英ガラス微粒子(スート微粒子)を採集し、内径600mm×高さ500mmのカーボン鋳型中に、65kg充填し、カーボン製の上下移動可能な蓋をして、プレス機(TOYO HYDRAULIC EQIPMENT CO.LTD製、商品名:ENERPAC HYDRAULIC PRESS)にセットして、上方から1kgf/cm2の圧力を加えてプレスし石英成形体を作成した。
実施例1と同様の合成石英ガラス微粒子を用いて、実施例1と同様、該石英ガラス微粒子をカーボン鋳型中に充填し、上下移動可能な蓋をして、プレス機にセットした後、上方から1kgf/cm2の圧力を加えて石英成形体を形成した。その後、プレスした状態のまま、加熱溶融炉の中にセットして、1×10-2mmHg以下に減圧後、実施例1と同様の温度条件で加熱焼成を行い、石英ガラス塊を得た。
粒径分布範囲が100μm〜500μmの天然石英ガラス粉を、内径600mm×高さ500mmのカーボン鋳型中に充填し、加熱溶融炉の中にセットして、1200℃までは、1時間で昇温させ、1200℃から1750℃までは、2℃/分で昇温させ、1750℃で1時間保持し、降温させた。室温に冷却後、鋳型とともに石英ガラス塊を取り出した。
Claims (3)
- BET比表面積が40〜80m2/g、平均粒度が60〜90nm、粒度分布範囲が30〜400nm、見かけ比重が110〜170g/L、HCl含有率が50〜140ppm、含有される金属不純物の総量が2ppm以下である高純度合成石英粉を使用して、少なくとも1方向から、0.1〜100kgf/cm2のプレスをかけて、石英成形体を形成した後、減圧下、又は02、H2、He及びArの少なくとも1種を含む雰囲気中で、1300〜1500℃の温度域において、加熱焼成処理を行うことを特徴とする透明合成石英ガラスの製造方法。
- 前記加熱焼成処理を、加熱溶融中に0.1〜100kgf/cm2のプレスをかけながら行うことを特徴とする請求項1記載の透明合成石英ガラスの製造方法。
- 前記高純度合成石英粉が、四塩化珪素の火炎加水分解反応によって製造されたものであることを特徴とする請求項1又は2記載の透明合成石英ガラスの製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003403903A JP4455030B2 (ja) | 2003-12-03 | 2003-12-03 | 透明合成石英ガラスの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003403903A JP4455030B2 (ja) | 2003-12-03 | 2003-12-03 | 透明合成石英ガラスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005162535A JP2005162535A (ja) | 2005-06-23 |
JP4455030B2 true JP4455030B2 (ja) | 2010-04-21 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003403903A Expired - Lifetime JP4455030B2 (ja) | 2003-12-03 | 2003-12-03 | 透明合成石英ガラスの製造方法 |
Country Status (1)
Country | Link |
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JP (1) | JP4455030B2 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
WO2017103124A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
TWI808933B (zh) | 2015-12-18 | 2023-07-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法 |
WO2017103123A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
TW201733931A (zh) * | 2015-12-18 | 2017-10-01 | 何瑞斯廓格拉斯公司 | 自熱製二氧化矽顆粒所得的均質石英玻璃 |
CN108698888A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备 |
WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
CN112624579B (zh) * | 2020-12-03 | 2021-09-17 | 东海县奥兰石英科技有限公司 | 一种一体集成法生产大直径透明石英坨的制备方法及装置 |
-
2003
- 2003-12-03 JP JP2003403903A patent/JP4455030B2/ja not_active Expired - Lifetime
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Publication number | Publication date |
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JP2005162535A (ja) | 2005-06-23 |
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