JP4411520B2 - 転がり軸受の製造方法 - Google Patents
転がり軸受の製造方法 Download PDFInfo
- Publication number
- JP4411520B2 JP4411520B2 JP2004020007A JP2004020007A JP4411520B2 JP 4411520 B2 JP4411520 B2 JP 4411520B2 JP 2004020007 A JP2004020007 A JP 2004020007A JP 2004020007 A JP2004020007 A JP 2004020007A JP 4411520 B2 JP4411520 B2 JP 4411520B2
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- Prior art keywords
- rolling bearing
- colloidal silica
- rolling
- manufacturing
- bearing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Rolling Contact Bearings (AREA)
Description
Claims (4)
- 内輪及び外輪から構成される両輪と、前記両輪との間に転動自在に配設された複数の転動体と、を備える転がり軸受の製造方法であって、
前記両輪の軌道表面と前記転動体の表面のうち少なくともいずれかを、粒径4nm〜1μmのコロイダルシリカを用いて研磨し、鋼の酸化物層又は極表面層を選択的に除去することによって炭化物粒子を残存させ、前記両輪の軌道表面と前記転動体の表面のうち少なくとも一つの最表面に、炭化物粒子により構成されている炭化物層を形成する転がり軸受の製造方法。 - 前記研磨の方法が、液体ホーニングである請求項1に記載の転がり軸受の製造方法。
- 前記研磨の方法が、
粒径4nm〜1μmのコロイダルシリカを0.1〜15重量%含有するグリース組成物を転がり軸受に封入して当該軸受を回転させることにより行うものである請求項1に記載の転がり軸受の製造方法。 - 前記コロイダルシリカの粒径が、6nm〜15nmである請求項1乃至3のいずれか一項に記載の転がり軸受の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2004020007A JP4411520B2 (ja) | 2004-01-28 | 2004-01-28 | 転がり軸受の製造方法 |
Applications Claiming Priority (1)
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JP2004020007A JP4411520B2 (ja) | 2004-01-28 | 2004-01-28 | 転がり軸受の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005214261A JP2005214261A (ja) | 2005-08-11 |
JP4411520B2 true JP4411520B2 (ja) | 2010-02-10 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2004020007A Expired - Fee Related JP4411520B2 (ja) | 2004-01-28 | 2004-01-28 | 転がり軸受の製造方法 |
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JP (1) | JP4411520B2 (ja) |
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2004
- 2004-01-28 JP JP2004020007A patent/JP4411520B2/ja not_active Expired - Fee Related
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JP2005214261A (ja) | 2005-08-11 |
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