JP4258436B2 - Water repellent treatment method - Google Patents

Water repellent treatment method Download PDF

Info

Publication number
JP4258436B2
JP4258436B2 JP2004156825A JP2004156825A JP4258436B2 JP 4258436 B2 JP4258436 B2 JP 4258436B2 JP 2004156825 A JP2004156825 A JP 2004156825A JP 2004156825 A JP2004156825 A JP 2004156825A JP 4258436 B2 JP4258436 B2 JP 4258436B2
Authority
JP
Japan
Prior art keywords
water
fine particles
repellent treatment
pores
electrostatic atomizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004156825A
Other languages
Japanese (ja)
Other versions
JP2005336321A (en
Inventor
重行 山口
一雅 六嶋
範行 北地
康成 前田
孝之 池田
良泰 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Electric Works Co Ltd
Original Assignee
Panasonic Corp
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Works Ltd filed Critical Panasonic Corp
Priority to JP2004156825A priority Critical patent/JP4258436B2/en
Publication of JP2005336321A publication Critical patent/JP2005336321A/en
Application granted granted Critical
Publication of JP4258436B2 publication Critical patent/JP4258436B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Description

本発明は、細孔を有する被処理物の表面を撥水処理するための撥水処理方法に関するものである。   The present invention relates to a water-repellent treatment method for performing a water-repellent treatment on the surface of an object having pores.

従来から被処理物の表面を撥水処理するには、フッ素系、シリコーン系、パラフィン系等の撥水剤を用いて表面処理するのが一般的である。(例えば、特許文献1、特許文献2参照)
ところが、上記のようにフッ素系、シリコーン系、パラフィン系等の撥水剤を用いて表面処理する従来例における撥水処理方法においては、特殊な撥水剤を必要とし、更に、含浸処理や高温処理や乾燥処理など多くの工程が必要となるという問題がある。
特開2003−105690号公報 特開平7−76797号公報
Conventionally, in order to perform a water repellent treatment on the surface of an object to be treated, a surface treatment is generally performed using a water repellent such as fluorine, silicone or paraffin. (For example, see Patent Document 1 and Patent Document 2)
However, the water repellent treatment method in the conventional example in which the surface treatment is performed using a fluorine-based, silicone-based, or paraffin-based water repellent as described above requires a special water repellent and further impregnation treatment or high temperature. There exists a problem that many processes, such as a process and a drying process, are needed.
JP 2003-105690 A JP-A-7-76797

本発明は上記の従来の問題点に鑑みて発明したものであって、撥水剤の使用や後工程を要することなく細孔を有する被処理物の表面に撥水性を簡単に付与することができる撥水処理方法を提供することを課題とするものである。   The present invention was invented in view of the above-described conventional problems, and can easily impart water repellency to the surface of an object having pores without the use of a water repellent or a post-process. It is an object to provide a water repellent treatment method that can be used.

上記課題を解決するために本発明に係る撥水処理方法は、細孔を有する不織布またはスポンジよりなる被処理物1の表面に、静電霧化装置2を用いて水を10〜30nmサイズに***させて生成した液滴微粒子を照射して被処理物1の表面を撥水処理することを特徴とするものである。 In order to solve the above-described problems, the water repellent treatment method according to the present invention uses an electrostatic atomizer 2 to reduce the size of water to 10 to 30 nm on the surface of an object 1 made of a nonwoven fabric or sponge having pores. The surface of the workpiece 1 is subjected to a water repellent treatment by irradiating the droplet fine particles generated by the division.

静電霧化装置2を用いて水を10〜30nmサイズに***させて生成した液滴微粒子には遊離基が含まれていると考えられており、さまざまな反応が期待でき、この10〜30nmサイズの液滴微粒子を細孔を有する不織布またはスポンジよりなる被処理物1の表面に照射させることで、細孔を有する不織布またはスポンジよりなる被処理物1の表面に撥水性を付与することができる。 It is considered that the droplet fine particles generated by splitting water into a size of 10 to 30 nm using the electrostatic atomizer 2 contain free radicals, and various reactions can be expected. By irradiating the surface of the workpiece 1 made of a nonwoven fabric or sponge having pores with droplet fine particles having a size, water repellency can be imparted to the surface of the workpiece 1 made of nonwoven fabric or sponge having pores. it can.

本発明は、静電霧化装置を用いて水を10〜30nmサイズに***させて生成した液滴微粒子を細孔を有する不織布またはスポンジよりなる被処理物の表面に照射するだけで、細孔を有する不織布またはスポンジよりなる被処理物1の表面を撥水処理することができ、撥水剤の使用や後工程を要することなく、簡単に撥水処理を行うことができる。また、液滴微粒子を照射するのみなので、不織布またはスポンジよりなる被処理物の任意の箇所に簡単且つ確実に撥水性付与が可能である。 In the present invention, by simply irradiating the surface of an object made of a nonwoven fabric or sponge having pores with fine droplets generated by splitting water into 10 to 30 nm size using an electrostatic atomizer, the pores The surface of the object to be treated 1 made of a non-woven fabric or sponge having water can be subjected to water repellent treatment, and water repellent treatment can be easily performed without using a water repellent or a post-process. Further, since only the droplet fine particles are irradiated, it is possible to easily and reliably impart water repellency to an arbitrary portion of an object to be processed made of a nonwoven fabric or a sponge .

以下、本発明を添付図面に示す実施形態に基いて説明する。   Hereinafter, the present invention will be described based on embodiments shown in the accompanying drawings.

図1には撥水性付与装置3の概略構成図が示してある。撥水性付与装置3は、処理室4内に静電霧化装置2を配置し、更に、静電霧化装置2に対向する位置に細孔を有する被処理物配設部5を設けて該被処理物配設部5に細孔を有する被処理物1を配設するようになている。ここで、静電霧化装置2と被処理物1との間は一定の距離隔てられるようになっている。   FIG. 1 shows a schematic configuration diagram of the water repellency imparting device 3. The water repellency imparting device 3 includes an electrostatic atomizing device 2 disposed in a processing chamber 4, and further, an object disposing unit 5 having pores at a position facing the electrostatic atomizing device 2. A workpiece 1 having pores is disposed in the workpiece disposition portion 5. Here, the electrostatic atomizer 2 and the workpiece 1 are separated by a certain distance.

静電霧化装置2は、図2の原理図に示すようなもので、水を溜める液溜め部6と、液溜め部6の水を毛細管現象により液溜め部6の外部に位置する先端側に搬送する多孔質セラミックスや不織布等により形成された先端が尖った棒状の搬送部7と、搬送部7に対応するように配置された対向電極8と、液溜め部6から搬送部7の対向電極側8先端に至る経路中の水に電圧を印加するための液印加電極9と、液印加電極9と対向電極8との間に高電圧を印加する電圧印加部10とを備えたものであり、液印加電極9と対向電極8との間に高電圧を印加することにより搬送部7の先端に搬送された液が高電圧によりレイリー***を起こして10〜30nmサイズの粒子径の液滴微粒子(ミスト)を生じさせる静電霧化を行うようになっている。   The electrostatic atomizer 2 is as shown in the principle diagram of FIG. 2, and includes a liquid reservoir portion 6 that stores water, and a tip side that is located outside the liquid reservoir portion 6 by capillarity of water in the liquid reservoir portion 6. A rod-shaped transfer part 7 formed of porous ceramics, nonwoven fabric, or the like to be transferred to the surface, a counter electrode 8 disposed so as to correspond to the transfer part 7, and the liquid storage part 6 to face the transfer part 7 A liquid application electrode 9 for applying a voltage to water in the path leading to the tip of the electrode side 8 and a voltage application unit 10 for applying a high voltage between the liquid application electrode 9 and the counter electrode 8 are provided. Yes, by applying a high voltage between the liquid application electrode 9 and the counter electrode 8, the liquid transported to the tip of the transport unit 7 undergoes Rayleigh splitting due to the high voltage, resulting in a droplet having a particle size of 10 to 30 nm. Electrostatic atomization that generates fine particles (mist) is performed.

上記の構成の静電霧化装置2の電圧印加部10に高電圧を印加して10〜30nmサイズの粒子径の液滴微粒子を発生させて被処理物1に10〜30nmサイズの粒子径の液滴微粒子を照射して付着させる。この場合、該10〜30nmサイズの粒子径の液滴微粒子は非常に小さなサイズであるため、被処理物1の細孔内部まで入り込んでいくことが可能である。更に、この液滴微粒子はレイリー***して発生して行く過程で、遊離基を含むものと考えられ、高い反応性を期待できるものである。また、***を繰り返していくため、数兆個を超える数となるので、反応効率は向上するもの考えられる。   A high voltage is applied to the voltage application unit 10 of the electrostatic atomizer 2 having the above-described configuration to generate droplet fine particles having a particle size of 10 to 30 nm, so that the object 1 has a particle size of 10 to 30 nm. Irradiate with droplet fine particles to adhere. In this case, since the droplet fine particles having a particle diameter of 10 to 30 nm are very small in size, it is possible to penetrate into the pores of the workpiece 1. Further, the droplet fine particles are considered to contain free radicals in the process of generating by Rayleigh splitting, and high reactivity can be expected. Moreover, since the number of trillions is exceeded because the division is repeated, the reaction efficiency can be improved.

このように高反応性の液滴微粒子を、細孔を有する被処理物1の表面に効率よく照射して付着させることで、細孔を有する被処理物1の表面に撥水性を付与することができる。静電霧化装置2により発生させた10〜30nmサイズの粒子径の液滴微粒子を細孔を有する被処理物1の表面に照射することで被処理物1の表面に撥水性を付与する具体的な機構についての詳細は現在のところよく解明されていないが、前述のような作用により撥水性が得られるものと考えられる。   By efficiently irradiating and adhering such highly reactive droplet fine particles to the surface of the object 1 having pores, the surface of the object 1 having pores is given water repellency. Can do. Specific example of imparting water repellency to the surface of the workpiece 1 by irradiating the surface of the workpiece 1 having pores with droplet fine particles having a particle size of 10 to 30 nm generated by the electrostatic atomizer 2 The details of the general mechanism are not well understood at present, but it is considered that water repellency can be obtained by the above-mentioned action.

以下、実施例を説明する。   Examples will be described below.

(実施例1)
被処理物1のサンプルとして不織布(目付量74kg/m、50×70mm)を用いた。容量54リットルの合成樹脂(ポリプロピレン)製の処理室4内に静電霧化装置2を内装した図1に示すような撥水性付与装置3を用い、処理室4内の被処理物配設部5に上記不織布を配置した(この場合、不織布と静電霧化装置2との間隔Lを120mmとした)。静電霧化装置2には搬送部7が6本あり、印加電圧6kV、電流値40〜50μAとなるように印加して10〜30nmサイズの粒子径の液滴微粒子を発生させて該液滴微粒子を被処理物1である不織布に照射した。静電霧化装置2を24時間運転して10〜30nmサイズの粒子径の液滴微粒子を発生させ、この雰囲気中に被処理物1である不織布を24時間暴露し続けた。
Example 1
A nonwoven fabric (weight per unit area 74 kg / m 2 , 50 × 70 mm) was used as a sample of the object 1 to be processed. A water repellent imparting device 3 as shown in FIG. 1 in which an electrostatic atomizer 2 is housed in a processing chamber 4 made of a synthetic resin (polypropylene) having a capacity of 54 liters, and a processing object disposing portion in the processing chamber 4 is used. The said nonwoven fabric was arrange | positioned to 5 (In this case, the space | interval L of a nonwoven fabric and the electrostatic atomizer 2 was 120 mm). The electrostatic atomizer 2 has six transport units 7 and is applied so that an applied voltage is 6 kV and a current value is 40 to 50 μA to generate droplet fine particles having a particle size of 10 to 30 nm. The nonwoven fabric which is the article 1 was irradiated with the fine particles. The electrostatic atomizer 2 was operated for 24 hours to generate droplet fine particles having a particle size of 10 to 30 nm, and the nonwoven fabric as the object 1 was continuously exposed to this atmosphere for 24 hours.

その後、上記のように静電霧化装置2を用いて生成した10〜30nmサイズの液滴微粒子が照射された被処理物1である不織布を処理室4から取出し、該10〜30nmサイズの液滴微粒子が照射された被処理物1である不織布の表面に水を滴下したところ、水が水玉状の水滴となって被処理物1である不織布の表面が撥水性を示した。撥水性の持続時間(水滴が球状を持続した時間)は5〜10分程度であった。   Then, the nonwoven fabric which is the to-be-processed object 1 irradiated with the droplet fine particle of 10-30 nm size produced | generated using the electrostatic atomizer 2 as mentioned above is taken out from the process chamber 4, and this 10-30 nm size liquid When water was dropped on the surface of the non-woven fabric, which was the object to be treated 1 irradiated with the droplets, the surface of the non-woven fabric, which was the object to be treated 1, exhibited water repellency. The duration of water repellency (the time that the water droplets were spherical) was about 5 to 10 minutes.

(実施例2)
被処理物1のサンプルとしてスポンジ体(45×80mm、厚さ10mm、空隙率60〜80%)を用いた。撥水性付与装置3は実施例1と同様の撥水付与装置3を用い、静電霧化装置2を48時間運転して被処理物1であるスポンジ体を48時間暴露した以外は上記実施例1と同様の条件でスポンジ体表面に10〜30nmサイズの粒子径の液滴微粒子を照射し続けた。
(Example 2)
A sponge body (45 × 80 mm, thickness 10 mm, porosity 60-80%) was used as a sample of the object 1 to be processed. The water repellency imparting device 3 uses the same water repellency imparting device 3 as in Example 1 except that the electrostatic atomizer 2 is operated for 48 hours to expose the sponge body as the object 1 to be treated for 48 hours. 1 was continuously irradiated with droplet fine particles having a particle size of 10 to 30 nm on the surface of the sponge body.

その後、上記のように静電霧化装置2を用いて生成した10〜30nmサイズの液滴微粒子が照射された被処理物1であるスポンジ体を処理室4から取出し、該10〜30nmサイズの液滴微粒子が照射された被処理物1であるスポンジの表面に水を滴下したところ、水が水玉状の水滴となって被処理物1であるスポンジの表面が撥水性を示した。撥水性の持続時間(水滴が球状を持続した時間)は5〜10分程度であった。   Then, the sponge body which is the to-be-processed object 1 irradiated with the droplet fine particle of 10-30 nm size produced | generated using the electrostatic atomizer 2 as mentioned above is taken out from the processing chamber 4, and this 10-30 nm size is taken out. When water was dropped on the surface of the sponge 1 to which the droplet fine particles were irradiated, water became polka dots and the surface of the sponge 1 to be processed 1 showed water repellency. The duration of water repellency (the time that the water droplets were spherical) was about 5 to 10 minutes.

(比較例1)
実施例1において被処理物1として使用した不織布と同じ不織布を比較サンプルとし、該比較サンプルである不織布の表面に実施例1と同様にして水を滴下したところ、滴下した水は水玉状の水滴とならずに直ちに比較サンプル全体に広がって比較サンプルである不織布に吸収された。
(Comparative Example 1)
When the same non-woven fabric as the non-woven fabric used as the object to be treated 1 in Example 1 was used as a comparative sample, and water was dropped onto the surface of the non-woven fabric as the comparative sample in the same manner as in Example 1, the dropped water was a polka-drop-shaped water droplet. Instead, it immediately spread throughout the comparative sample and was absorbed by the comparative nonwoven fabric.

(比較例2)
実施例2において被処理物1として使用したスポンジと同じスポンジを比較サンプルとし、該比較サンプルであるスポンジの表面に実施例2と同様にして水を滴下したところ、滴下した水は水玉状の水滴とならずに直ちに比較サンプル全体に広がって比較サンプルであるスポンジに吸収された。
(Comparative Example 2)
When the same sponge as the sponge used as the object to be treated 1 in Example 2 was used as a comparative sample, and water was dropped onto the surface of the comparative sample in the same manner as in Example 2, the dropped water was a polka-dotted water droplet. Instead, it immediately spread throughout the comparative sample and was absorbed by the sponge, which is the comparative sample.

上記の実施例1、実施例2、比較例1、比較例2により明らかなように、比較例1、比較例2は撥水性がないが、実施例1、実施例2は撥水性が得られていた。これにより、細孔を有する被処理物1の表面に、静電霧化装置2を用いて水を10〜30nmサイズに***させて生成した液滴微粒子を照射した実施例1、実施例2は表面に撥水性が得られていることが判明した。   As is clear from the above-mentioned Example 1, Example 2, Comparative Example 1, and Comparative Example 2, Comparative Example 1 and Comparative Example 2 have no water repellency, but Examples 1 and 2 have water repellency. It was. Thus, Example 1 and Example 2 in which the surface of the workpiece 1 having pores was irradiated with droplet fine particles generated by splitting water into a size of 10 to 30 nm using the electrostatic atomizer 2 are as follows: It was found that water repellency was obtained on the surface.

本発明の撥水処理方法に用いる撥水性付与装置の概略構成図である。It is a schematic block diagram of the water-repellent provision apparatus used for the water-repellent treatment method of this invention. 同上に用いる静電霧化装置の概略構成図である。It is a schematic block diagram of the electrostatic atomizer used for the same as the above.

符号の説明Explanation of symbols

1 被処理物
2 静電霧化装置
1 Workpiece 2 Electrostatic atomizer

Claims (1)

細孔を有する不織布またはスポンジよりなる被処理物の表面に、静電霧化装置を用いて水を10〜30nmサイズに***させて生成した液滴微粒子を照射して被処理物の表面を撥水処理することを特徴とする撥水処理方法。 Irradiate the surface of the object to be processed, which is made of a non-woven fabric or sponge having pores, with droplet fine particles generated by splitting water into a size of 10 to 30 nm using an electrostatic atomizer to repel the surface of the object to be processed. A water repellent treatment method characterized by water treatment.
JP2004156825A 2004-05-26 2004-05-26 Water repellent treatment method Expired - Fee Related JP4258436B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004156825A JP4258436B2 (en) 2004-05-26 2004-05-26 Water repellent treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004156825A JP4258436B2 (en) 2004-05-26 2004-05-26 Water repellent treatment method

Publications (2)

Publication Number Publication Date
JP2005336321A JP2005336321A (en) 2005-12-08
JP4258436B2 true JP4258436B2 (en) 2009-04-30

Family

ID=35490234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004156825A Expired - Fee Related JP4258436B2 (en) 2004-05-26 2004-05-26 Water repellent treatment method

Country Status (1)

Country Link
JP (1) JP4258436B2 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53141167A (en) * 1977-05-14 1978-12-08 Daikin Ind Ltd Electrostatic atomizing type air purifying device
DK0486198T3 (en) * 1990-11-12 2001-06-18 Procter & Gamble Injection device
JP4598237B2 (en) * 2000-05-22 2010-12-15 株式会社テクノ菱和 Electrostatic atomization ionization apparatus and method, and charged particle transport ionization apparatus and method
JP4004437B2 (en) * 2002-06-25 2007-11-07 松下電工株式会社 Air cleaner
JP4269993B2 (en) * 2004-03-25 2009-05-27 パナソニック電工株式会社 Surface treatment method
JP4625267B2 (en) * 2004-04-08 2011-02-02 パナソニック電工株式会社 Electrostatic atomizer

Also Published As

Publication number Publication date
JP2005336321A (en) 2005-12-08

Similar Documents

Publication Publication Date Title
JP5920802B2 (en) Method for forming adhered substance using plasma
PL417116A1 (en) Modified porous coatings and the modular device for purification of air that contains the modified porous coatings
KR960002537A (en) How to clean electrostatic chuck in plasma reactor
JP2002515639A (en) Method of forming a physically and chemically active environment by a plasma jet and related plasma jet
JP2009202059A (en) Electrostatic atomizing apparatus
JP2006204968A (en) Atomizer
JP2011183204A (en) Sterilizer and air cleaner provided therewith
JP4645204B2 (en) Electrostatic atomizer
JP4258436B2 (en) Water repellent treatment method
Burgo et al. Electrified water: liquid, vapor and aerosol
JPH0819766A (en) Cleaning device using light impulse wave
JPH1147558A (en) Air cleaning process
KR101778120B1 (en) Plasma Discharge Source For Charging Particles
JP4093282B1 (en) Electrostatic atomizer
JP6633950B2 (en) Polychlorinated biphenyl removal method
WO2015031196A1 (en) Method and device for surface modification by cold plasma treatment at ambient pressure
JP6073729B2 (en) Deodorization device
JP2007167761A (en) Electrostatic atomization apparatus
JP2003275024A (en) Face mask
JP2015112585A (en) Filter electrification processor and filter electrification processing method
JP4269993B2 (en) Surface treatment method
JP2011062673A (en) Electrostatic atomizing apparatus
JP2008183484A (en) Electrostatic atomizer
JPH1087857A (en) Method for treating skin surface of non-conductive porous body
JP2015013244A (en) Deposition apparatus and deposition method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060327

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080626

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080708

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080908

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090113

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090126

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120220

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120220

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130220

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130220

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140220

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees