JP4218899B2 - 静電チャックを備える基板ホルダ及びその製造方法 - Google Patents
静電チャックを備える基板ホルダ及びその製造方法 Download PDFInfo
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- JP4218899B2 JP4218899B2 JP2005208834A JP2005208834A JP4218899B2 JP 4218899 B2 JP4218899 B2 JP 4218899B2 JP 2005208834 A JP2005208834 A JP 2005208834A JP 2005208834 A JP2005208834 A JP 2005208834A JP 4218899 B2 JP4218899 B2 JP 4218899B2
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- Prior art keywords
- electrostatic chuck
- susceptor
- cooling gas
- substrate holder
- edge protrusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 title claims description 29
- 238000004519 manufacturing process Methods 0.000 title description 12
- 238000000034 method Methods 0.000 title description 10
- 239000000112 cooling gas Substances 0.000 claims description 37
- 239000000853 adhesive Substances 0.000 claims description 36
- 230000001070 adhesive effect Effects 0.000 claims description 33
- 239000013307 optical fiber Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 229920001296 polysiloxane Polymers 0.000 claims description 7
- 239000004593 Epoxy Substances 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 4
- 238000005260 corrosion Methods 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims 1
- 239000000919 ceramic Substances 0.000 description 21
- 238000009826 distribution Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 3
- 239000013464 silicone adhesive Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Images
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
340,440 電極
350,450 サセプタ
351,451 エッジ突出部
355,455 間隙
390,490 接着剤シート
395,495 ワイヤ
Claims (4)
- 縁にエッジ突出部が形成されているサセプタと、
前記エッジ突出部の内側に位置し、前記サセプタ上に位置した静電チャックとを備え、
前記静電チャックと前記サセプタは、複数の絶縁性ワイヤが挿入されたゲル状接着材シートにより接着され、前記エッジ突出部と前記静電チャックとの間には、シリコーンまたは耐蝕性エポキシ系物質が充填されており、
前記サセプタ、前記静電チャック及び前記ゲル状接着剤シートにはそれぞれ対応する位置に複数の冷却ガス供給ホールが形成されていることを特徴とする基板ホルダ。 - 前記複数の絶縁性ワイヤは光ファイバより形成されることを特徴とする請求項1に記載の基板ホルダ。
- 前記エッジ突出部は、前記サセプタと一体型で形成され、前記エッジ突出部の終端は、前記サセプタに接着されている前記静電チャックより低いか、または同位置にあることを特徴とする請求項1に記載の基板ホルダ。
- 縁にエッジ突出部が形成されており、複数の第1冷却ガス供給ホールが形成されているサセプタを準備するステップと、
前記エッジ突出部内及び前記サセプタ上に複数の絶縁性ワイヤが挿入されており、前記複数の第1冷却ガス供給ホールに対応する位置に複数の第2冷却ガス供給ホールが形成されている接着剤シートを積層するステップと、
前記接着剤シート上に前記複数の第2冷却ガス供給ホールに対応する位置に複数の第3冷却ガス供給ホールが形成されている静電チャックを積層するステップと、
前記静電チャックの上面に圧力と温度とを加え、前記静電チャックを前記サセプタに接着させるステップと、
前記静電チャックと前記エッジ突出部との間に、シリコーンまたはエポキシ系物質を充填させるステップとを含む基板ホルダの製造方法。
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JP2005208834A JP4218899B2 (ja) | 2005-07-19 | 2005-07-19 | 静電チャックを備える基板ホルダ及びその製造方法 |
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JP2005208834A JP4218899B2 (ja) | 2005-07-19 | 2005-07-19 | 静電チャックを備える基板ホルダ及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007027494A JP2007027494A (ja) | 2007-02-01 |
JP4218899B2 true JP4218899B2 (ja) | 2009-02-04 |
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JP2005208834A Active JP4218899B2 (ja) | 2005-07-19 | 2005-07-19 | 静電チャックを備える基板ホルダ及びその製造方法 |
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Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5049891B2 (ja) * | 2008-06-13 | 2012-10-17 | 新光電気工業株式会社 | 基板温調固定装置 |
JP5250408B2 (ja) * | 2008-12-24 | 2013-07-31 | 新光電気工業株式会社 | 基板温調固定装置 |
DE102014007903A1 (de) | 2014-05-28 | 2015-12-03 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. | Elektrostatische Haltevorrichtung mit Noppen-Elektroden und Verfahren zu deren Herstellung |
DE102014008031B4 (de) | 2014-05-28 | 2020-06-25 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. | Elektrostatische Haltevorrichtung mit einer Keramik-Elektrode und Verfahren zur Herstellung einer solchen Haltevorrichtung |
DE102014008029B4 (de) | 2014-05-28 | 2023-05-17 | Asml Netherlands B.V. | Elektrostatische Haltevorrichtung mit einer Elektroden-Trägerscheibe und Verfahren zur Herstellung der Haltevorrichtung |
DE102014008030A1 (de) * | 2014-05-28 | 2015-12-03 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co | Verfahren zur Herstellung einer elektrostatischen Haltevorrichtung |
CN108028219B (zh) * | 2015-09-25 | 2019-06-14 | 住友大阪水泥股份有限公司 | 静电卡盘装置 |
JP7203585B2 (ja) * | 2018-12-06 | 2023-01-13 | 東京エレクトロン株式会社 | 基板支持器、基板処理装置、基板処理システム、及び基板支持器における接着剤の浸食を検出する方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07263527A (ja) * | 1994-03-17 | 1995-10-13 | Fujitsu Ltd | 静電吸着装置 |
JP4346877B2 (ja) * | 2002-08-29 | 2009-10-21 | 東京エレクトロン株式会社 | 静電吸着装置および処理装置 |
KR100809124B1 (ko) * | 2003-03-19 | 2008-02-29 | 동경 엘렉트론 주식회사 | 정전척을 이용한 기판 유지 기구 및 그 제조 방법 |
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