JP4209762B2 - Imaging device - Google Patents

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JP4209762B2
JP4209762B2 JP2003415223A JP2003415223A JP4209762B2 JP 4209762 B2 JP4209762 B2 JP 4209762B2 JP 2003415223 A JP2003415223 A JP 2003415223A JP 2003415223 A JP2003415223 A JP 2003415223A JP 4209762 B2 JP4209762 B2 JP 4209762B2
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bent portion
bent
film substrate
image pickup
film
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JP2005175293A (en
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豊 原田
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Panasonic Corp
Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Description

本発明は、接続用リード部を設けたフィルム基板に撮像素子を固着搭載した撮像装置に関するものである。   The present invention relates to an image pickup apparatus in which an image pickup element is fixedly mounted on a film substrate provided with a connecting lead portion.

近年の電子機器の小型化、薄型化に伴い、撮像装置およびそのモジュールも小型化に向けた開発が行われている。そして、小型化、薄型化の実現手段として、特許文献1に記載されたような、フレキシブルなフィルム基板による実装形態が主流をなしている。   With recent downsizing and thinning of electronic devices, imaging devices and their modules have also been developed for downsizing. As a means for realizing miniaturization and thinning, a mounting form using a flexible film substrate as described in Patent Document 1 is mainly used.

図3は、従来のフレキシブルなフィルム基板を用いて撮像素子を実装した小型化撮像装置の斜視図、図4はその側面図である。フレキシブルなフィルム基板1は、予め所定の箇所が打ち抜かれたポリイミドから成る基材フィルム1a上に、5μmから35μmの厚さの銅箔が貼付けられ、この銅箔に、接続用リード部2aを含む配線パターン2が形成された構造を有する。配線パターン2の表面上には、錫、はんだ、あるいは金等のめっき被膜が施されており、接続用リード部2aとその先端部を除き、表面がソルダーレジストでコートされている。   FIG. 3 is a perspective view of a miniaturized imaging apparatus in which an imaging element is mounted using a conventional flexible film substrate, and FIG. 4 is a side view thereof. The flexible film substrate 1 has a copper foil having a thickness of 5 μm to 35 μm attached to a base film 1a made of polyimide with a predetermined portion punched in advance, and includes a connecting lead portion 2a. The wiring pattern 2 is formed. On the surface of the wiring pattern 2, a plating film such as tin, solder, or gold is applied, and the surface is coated with a solder resist except for the connecting lead portion 2a and its tip portion.

フィルム基板1上には、第一の樹脂8を介して撮像素子4が搭載されている。フィルム基板1と撮像素子4の電気的接続は、撮像素子4の主面(上面)周辺に形成された接続端子(図示せず)上のバンプ3と接続用リード部2aとを、加熱圧着により接合することで形成されている。   On the film substrate 1, the imaging element 4 is mounted via a first resin 8. The electrical connection between the film substrate 1 and the image sensor 4 is performed by thermocompression bonding the bumps 3 on the connection terminals (not shown) formed on the periphery of the main surface (upper surface) of the image sensor 4 and the connection leads 2a. It is formed by joining.

バンプ3の接合部分と接続用リード部2aとは、第二の樹脂6を塗布して加熱硬化することで固定されている。また、撮像素子4主面の光学部分には、透明樹脂7を用いてガラス板5が接着固定されている。   The joint portion of the bump 3 and the connecting lead portion 2a are fixed by applying the second resin 6 and curing it. A glass plate 5 is bonded and fixed to the optical part of the main surface of the image sensor 4 using a transparent resin 7.

第一の樹脂8としては、絶縁性もしくは導電性のペースト状もしくは半硬化シート状の固着物が用いられる。フィルム基板1上の撮像素子4を固着する箇所に、第一の樹脂8を塗布もしくは配置して、その上の適正位置に撮像素子4を載置して、その後紫外線や加熱等の方法で第一の樹脂8を硬化する。   As the first resin 8, an insulating or conductive paste-like or semi-cured sheet-like fixed substance is used. The first resin 8 is applied or arranged on the film substrate 1 where the image sensor 4 is fixed, and the image sensor 4 is placed at an appropriate position on the first resin 8. One resin 8 is cured.

第二の樹脂6としては液状樹脂が、接続用リード部2aと、ガラス板5側面と、撮像素子4側面が一体となるように塗布される。所定部が樹脂により充填された時点で、紫外線や加熱により第二の樹脂6を硬化する。   As the second resin 6, a liquid resin is applied so that the connecting lead portion 2 a, the side surface of the glass plate 5, and the side surface of the imaging element 4 are integrated. When the predetermined portion is filled with the resin, the second resin 6 is cured by ultraviolet rays or heating.

フィルム基板1は、撮像素子4裏面の稜部近傍で容易に屈曲し得るように、稜部分では基材フィルム1aが除去されて、配線パターン2が露出している。したがって、この部分では、複数の配線パターン2のみで支持されるスリット部9が形成されている。
特開平11−354766号公報(第4頁、図1)
The substrate film 1a is removed at the ridge portion so that the wiring pattern 2 is exposed so that the film substrate 1 can be easily bent in the vicinity of the ridge portion on the back surface of the imaging device 4. Therefore, in this portion, the slit portion 9 supported by only the plurality of wiring patterns 2 is formed.
Japanese Patent Laid-Open No. 11-354766 (page 4, FIG. 1)

前記従来の構成では、接続用リード部2aまたはスリット部9が屈曲するときの応力により、接続用リード部2aの曲げによるバネの効果が働き、スリット部9の配線パターン2が外側に引っ張られ、伸びて細くなり、断線する場合もある。また接続用リード部2aにおいて伸びが発生し、屈曲形状が安定しないという問題もあった。そのためフィルム基板1に対して撮像素子4を固定する場合、屈曲する配線パターン2に引張りの応力がかからないようにする必要があり、工程を煩雑にしていた。   In the conventional configuration, the spring effect due to the bending of the connecting lead portion 2a works due to the stress when the connecting lead portion 2a or the slit portion 9 bends, and the wiring pattern 2 of the slit portion 9 is pulled outward, It may become thin and stretch, and it may break. Further, there is a problem that elongation occurs in the connecting lead portion 2a and the bent shape is not stable. Therefore, when fixing the imaging device 4 to the film substrate 1, it is necessary to prevent a tensile stress from being applied to the wiring pattern 2 to be bent, and the process is complicated.

本発明は、上記従来の課題を解決するものであり、フィルム基板に固着された撮像素子とフィルム基板の配線パターンとを安定に接続し、位置決めすることが可能な撮像装置を提供することを目的とする。   An object of the present invention is to solve the above-described conventional problems, and to provide an imaging device capable of stably connecting and positioning an imaging element fixed to a film substrate and a wiring pattern of the film substrate. And

上記の課題を解決するため本発明の撮像装置は、撮像素子と、前記撮像素子が搭載され、表裏面が絶縁フィルムで覆われた配線パターンを有し、前記撮像素子の稜部近傍で前記撮像素子の主面に向かって屈曲した第1の屈曲部を有するフィルム基板と、前記フィルム基板における前記第1の屈曲部側の端部から前記配線パターンが延在して形成され、前記撮像素子に向かって屈曲する第2の屈曲部を有し、かつ前記撮像素子の主面に配置されたバンプ電極と電気的に接続された接続用リード部とを備え、前記第1の屈曲部において前記絶縁フィルムが部分的に除去されて、前記フィルム基板は、前記除去された部分の前記撮像素子の稜線方向における両端に残された連結部を有し、前記連結部の前記フイルム基板の側縁に沿った方向と、前記両端の連結部の各々に最も近い前記配線パターンの長手方向とが平行であることを特徴とする。
In order to solve the above-described problems, an imaging device according to the present invention includes an imaging element, a wiring pattern in which the imaging element is mounted, and front and back surfaces are covered with an insulating film, and the imaging is performed in the vicinity of a ridge portion of the imaging element A film substrate having a first bent portion bent toward the main surface of the element, and the wiring pattern extending from an end of the film substrate on the first bent portion side; A connecting lead portion electrically connected to a bump electrode disposed on the main surface of the image sensor, the insulating portion being at the first bent portion. The film is partially removed, and the film substrate has connection portions left at both ends in the ridge line direction of the image pickup device of the removed portion, and along the side edges of the film substrate of the connection portions. Direction and both It is characterized in that the longitudinal direction of the wiring pattern closest to each of the end connecting portions is parallel .

上記構成の撮像装置は、前記第1の屈曲部において前記絶縁フィルムが薄く形成されている構成とすることができる
Imaging device of the construction can be configured to the insulating film before Symbol first bent portion is formed thin.

上記構成の撮像装置によれば、フィルム基板の屈曲部において基材フィルムの一部が残されるので、接続用リード部の屈曲する部分とスリット部の剛性に差異が設けられると共にスリット部の剛性が高まるため、安定した屈曲形状が実現できる。またスリット部にかかる曲げ応力によるリードへのストレスも緩和することができるため折れ曲がりや断線を防止することができる。   According to the imaging apparatus having the above configuration, since a part of the base film is left in the bent portion of the film substrate, a difference is provided in the rigidity of the bent portion of the connecting lead portion and the slit portion, and the rigidity of the slit portion is increased. Therefore, a stable bent shape can be realized. In addition, since stress on the lead due to bending stress applied to the slit portion can be reduced, bending and disconnection can be prevented.

本発明の撮像装置は、好ましくは、第1の屈曲部と第2の屈曲部の間に付設された絶縁フィルムの付設領域の長さが、撮像素子の厚みの±300μm以内である。また、前記接続用リード部の屈曲する部分の剛性と、前記絶縁フィルムの連結部の剛性とが異なることが好ましい。

Imaging apparatus of the present invention, good Mashiku the length of attached region of the insulating film that is attached between a first bent portion and the second bent portion, is within ± 300 [mu] m thickness of the image sensor. Moreover, it is preferable that the rigidity of the bent portion of the connecting lead portion and the rigidity of the connecting portion of the insulating film are different.

以下、本発明の実施の形態における撮像装置について、図面を参照しながら説明する。図1は、本実施の形態における撮像装置の斜視図である。図2は側面図である。図3および図4に示した従来例と同様の要素には、同じ参照符号を付して説明を簡略化する。   Hereinafter, an imaging device according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view of the imaging apparatus according to the present embodiment. FIG. 2 is a side view. Elements similar to those of the conventional example shown in FIGS. 3 and 4 are denoted by the same reference numerals, and description thereof will be simplified.

本実施の形態は、フレキシブルなフィルム基板10の構造に特徴を有する。フィルム基板10は、配線パターン2の表裏面が絶縁フィルムからなる基材フィルム10aで覆われた構造を有する。絶縁フィルムとしては、例えばポリイミドフィルムを用いることができる。基材フィルム10aは、接続用リード部2aを露出させて、配線パターン2に付設されている。また、撮像素子4裏面の稜近傍の屈曲部においては、両側端の連結部11を除いて基材フィルム10aが除去されて、屈曲部に沿ったスリット部12が形成されている。それにより、配線パターン2に基材フィルム10aが付設されていない領域が形成され、フィルム基板10が撮像素子4裏面の稜近傍で容易に屈曲可能となっている。   This embodiment is characterized by the structure of the flexible film substrate 10. The film substrate 10 has a structure in which the front and back surfaces of the wiring pattern 2 are covered with a base film 10a made of an insulating film. As the insulating film, for example, a polyimide film can be used. The base film 10 a is attached to the wiring pattern 2 with the connecting lead portion 2 a exposed. Further, in the bent portion near the ridge on the back surface of the image sensor 4, the base film 10 a is removed except for the connecting portions 11 at both ends, and the slit portion 12 is formed along the bent portion. Thereby, the area | region where the base film 10a is not attached to the wiring pattern 2 is formed, and the film board | substrate 10 can be bent easily in the ridge vicinity of the image pick-up element 4 back surface.

このようにスリット部12の一部に基材フィルム10aが連続した部分を有することにより、スリット部12の剛性を高まると共に、接続用リード部2aの屈曲する部分とスリット部12の剛性に相違が設けられる。これにより、屈曲時には、まず接続用リード部2aが屈曲し、次にスリット部12が屈曲するため、安定した屈曲形状を形成できる。またスリット部12にかかる曲げ応力による配線パターン2へのストレスも緩和することができる。   Thus, by having the part which the base film 10a continued in a part of slit part 12, while increasing the rigidity of the slit part 12, the difference in the rigidity of the part where the lead part 2a for a connection bends and the slit part 12 is different. Provided. Thereby, at the time of bending, the connecting lead portion 2a is bent first, and then the slit portion 12 is bent, so that a stable bent shape can be formed. Further, the stress on the wiring pattern 2 due to the bending stress applied to the slit portion 12 can be reduced.

次に、上記構成の撮像装置の製造方法について説明する。   Next, a method for manufacturing the imaging device having the above configuration will be described.

まず、フィルム基板10を用意する。フィルム基板10は、上述のように、撮像素子4固着部と、撮像素子4から離れて配置される電子部品(図示せず)とを接続するための配線パターン2を有する。配線パターン2は、接続用リード部2aおよび他の外部接続端子部(図示せず)を除いた表裏面が、有機絶縁膜からなる基材フィルム10aで覆われている。フィルム基板10は更に、撮像素子4裏面の稜近傍に対応する屈曲部においては、両側端の連結部11を除いて基材フィルム10aが除去されて、屈曲部に沿ったスリット部12が形成されている。それにより、フィルム基板10が撮像素子4裏面の稜近傍で容易に屈曲可能である。   First, the film substrate 10 is prepared. As described above, the film substrate 10 has the wiring pattern 2 for connecting the image sensor 4 fixing portion and an electronic component (not shown) arranged away from the image sensor 4. The wiring pattern 2 is covered with a base film 10a made of an organic insulating film on the front and back surfaces excluding the connecting lead portion 2a and other external connection terminal portions (not shown). Further, in the bent portion corresponding to the vicinity of the ridge of the back surface of the image sensor 4 on the film substrate 10, the base film 10 a is removed except for the connecting portions 11 on both ends, and a slit portion 12 is formed along the bent portion. ing. Thereby, the film substrate 10 can be easily bent in the vicinity of the ridge on the back surface of the imaging element 4.

次に、TAB(Tape Automated Bonding)技術により、撮像素子4主面周辺にSBB(Stad Bump Bonding)法で形成された金バンプ3に、フィルム基板1の先端から延在する接続用リード部2aの先端部を接合する。この時、バンプ3高さ、および接続用リード部2aの撮像素子4主面に対する角度は、それぞれ10μmから75μm、および±30°以内の角度に限定される。撮像素子4周辺の切断分離部(ダイシング部)の稜との接触回避と、外形小型化の維持のためである。   Next, the connection lead portion 2a extending from the tip of the film substrate 1 is formed on the gold bump 3 formed by the SBB (Stad Bump Bonding) method around the main surface of the image sensor 4 by TAB (Tape Automated Bonding) technology. Join the tip. At this time, the height of the bump 3 and the angle of the connecting lead portion 2a with respect to the main surface of the image sensor 4 are limited to angles of 10 μm to 75 μm and ± 30 °, respectively. This is for avoiding contact with the edge of the cutting / separating portion (dicing portion) around the image pickup device 4 and maintaining the downsizing of the outer shape.

次に、撮像素子4の少なくとも画素領域上を覆うようにガラス板5を、紫外線や加熱等の方法によって硬化する透明性の接着部材で貼付ける。   Next, the glass plate 5 is pasted with a transparent adhesive member that is cured by a method such as ultraviolet rays or heating so as to cover at least the pixel region of the image sensor 4.

次に、フィルム基板10上の撮像素子4を固着する箇所に、第二の樹脂8である絶縁性もしくは導電性のペースト状もしくは半硬化シート状の固着部材を塗布もしくは配置して、その上の適正位置に撮像素子4を載置し、その後、紫外線や加熱等の方法で固着部材を硬化させる。   Next, an insulating or conductive paste-like or semi-cured sheet-like fixing member, which is the second resin 8, is applied or arranged on the film substrate 10 where the imaging element 4 is fixed, The imaging element 4 is placed at an appropriate position, and then the fixing member is cured by a method such as ultraviolet rays or heating.

最後に、接続用リード部2a、ガラス板5側面、および撮像素子4側面が一体となるように、第一の樹脂6である液状樹脂を供与し、所定部が樹脂により充填された時点で紫外線や加熱により第一の樹脂6を硬化させる。以上の工程により撮像装置が完成する。   Finally, a liquid resin as the first resin 6 is provided so that the connecting lead portion 2a, the glass plate 5 side surface, and the image pickup device 4 side surface are integrated, and when the predetermined portion is filled with the resin, ultraviolet rays are supplied. The first resin 6 is cured by heating. The imaging device is completed through the above steps.

なお、本実施の形態では、撮像素子4、およびフィルム基板1がそれぞれ、入射光に対して垂直に配置される。したがって、固体撮像素子4とフィルム基板1とは平行な状態で固着される。   In the present embodiment, the image sensor 4 and the film substrate 1 are each arranged perpendicular to the incident light. Therefore, the solid-state imaging device 4 and the film substrate 1 are fixed in a parallel state.

また、接続用リード部2aの先端部と接続するためのバンプ3には、SBBでなくメッキバンプを用いてもよい。   Further, instead of SBB, a plated bump may be used as the bump 3 for connecting to the tip of the connecting lead portion 2a.

また、本実施の形態において、配線パターン2は、撮像素子の厚みの±300μm以内の長さ分だけ基材フィルム10aが付設され、残りの接続用リード部2aは基材フィルム10aから露出した構造とする。これにより、撮像素子4端部で円滑に接続用リード部2aを曲げることができる。 In the present embodiment, the wiring pattern 2 has a structure in which the base film 10a is provided for the length within ± 300 μm of the thickness of the imaging device, and the remaining connecting lead portions 2a are exposed from the base film 10a. to. This ensures that it is possible to bend smoothly connecting lead portions 2a by the image sensor 4 ends.

なお、本実施の形態では、屈曲部において両端部を除いて基材フィルムが除去された構造としたが、基材フィルムを残す部分は両端部に限らず、例えば中央部のみ、あるいは複数分割された部分などであっても構わない。   In the present embodiment, the base film is removed except for both end portions in the bent portion, but the portion where the base film is left is not limited to both end portions, for example, only the central portion or divided into a plurality of portions. It may be a part.

また、本実施の形態では、屈曲部において両端部を除いて基材フィルムが除去された構造としたが、屈曲部の基材フィルムを薄く形成することで柔軟性と剛性を高めて、同等の効果を得ることも可能である。   In the present embodiment, the base film is removed except for both ends at the bent portion. However, by forming the base film at the bent portion thinly, the flexibility and rigidity are increased, It is also possible to obtain an effect.

本発明によれば、フィルム基板に固着された撮像素子とフィルム基板の配線パターンとを安定に接続し、位置決めすることが可能であるため、例えば、医療用等における薄型かつ柔軟性が要求される撮像装置に好適である。   According to the present invention, it is possible to stably connect and position the imaging element fixed to the film substrate and the wiring pattern of the film substrate, and thus, for example, thinness and flexibility in medical use are required. It is suitable for an imaging device.

本発明の実施の形態における撮像装置の斜視図The perspective view of the image pick-up device in an embodiment of the invention 同撮像装置の側面図Side view of the imaging device 従来例の撮像装置の斜視図A perspective view of a conventional imaging apparatus 同撮像装置の側面図Side view of the imaging device

符号の説明Explanation of symbols

1、10 フィルム基板
1a、10a 基材フィルム
2 配線パターン
2a 接続用リード部
3 バンプ
4 撮像素子
5 ガラス板
6 第二の樹脂
7 透明樹脂
8 第一の樹脂
9、12 スリット部
11 連結部

DESCRIPTION OF SYMBOLS 1, 10 Film board | substrate 1a, 10a Base film 2 Wiring pattern 2a Connection lead part 3 Bump 4 Image sensor 5 Glass plate 6 Second resin 7 Transparent resin 8 First resin 9, 12 Slit part 11 Connection part

Claims (4)

撮像素子と、
前記撮像素子が搭載され、表裏面が絶縁フィルムで覆われた配線パターンを有し、前記撮像素子の稜部近傍で前記撮像素子の主面に向かって屈曲した第1の屈曲部を有するフィルム基板と、
前記フィルム基板における前記第1の屈曲部側の端部から前記配線パターンが延在して形成され、前記撮像素子に向かって屈曲する第2の屈曲部を有し、かつ前記撮像素子の主面に配置されたバンプ電極と電気的に接続された接続用リード部とを備え、
前記第1の屈曲部において前記絶縁フィルムが部分的に除去されて、前記フィルム基板は、前記除去された部分の前記撮像素子の稜線方向における両端に残された連結部を有し、
前記連結部の前記フイルム基板の側縁に沿った方向と、前記両端の連結部の各々に最も近い前記配線パターンの長手方向とが平行であることを特徴とする撮像装置。
An image sensor;
A film substrate having a first bent portion mounted with the image pickup device, having a wiring pattern in which front and back surfaces are covered with an insulating film, and bent toward the main surface of the image pickup device in the vicinity of the ridge portion of the image pickup device. When,
The wiring substrate is formed to extend from an end portion on the first bent portion side of the film substrate, has a second bent portion bent toward the image pickup device, and has a main surface of the image pickup device A bump electrode and a connection lead portion electrically connected to the bump electrode,
The insulating film is partially removed in the first bent portion, and the film substrate has connecting portions left at both ends in the ridge line direction of the imaging device of the removed portion,
An image pickup apparatus , wherein a direction along a side edge of the film substrate of the connecting portion is parallel to a longitudinal direction of the wiring pattern closest to each of the connecting portions at both ends .
記第1の屈曲部において前記絶縁フィルムが薄く形成されていることを特徴とする請求項1に記載の撮像装置。 The imaging apparatus according to claim 1, wherein the insulating film is formed thinly before Symbol first bent portion. 前記第1の屈曲部と前記第2の屈曲部の間に付設された前記絶縁フィルムの付設領域の長さは、前記撮像素子の厚みの±300μm以内である請求項1に記載の撮像装置。   2. The imaging apparatus according to claim 1, wherein a length of a region where the insulating film is provided between the first bent portion and the second bent portion is within ± 300 μm of a thickness of the imaging element. 前記接続用リード部の屈曲する部分の剛性と、前記絶縁フィルムの連結部の剛性とが異なることを特徴とする請求項1に記載の撮像装置。The imaging apparatus according to claim 1, wherein the rigidity of the bent portion of the connecting lead portion is different from the rigidity of the connecting portion of the insulating film.
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