JP4145810B2 - Transparent substrate for LCD panel - Google Patents
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- JP4145810B2 JP4145810B2 JP2004024953A JP2004024953A JP4145810B2 JP 4145810 B2 JP4145810 B2 JP 4145810B2 JP 2004024953 A JP2004024953 A JP 2004024953A JP 2004024953 A JP2004024953 A JP 2004024953A JP 4145810 B2 JP4145810 B2 JP 4145810B2
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- 239000000758 substrate Substances 0.000 title claims description 42
- 239000004973 liquid crystal related substance Substances 0.000 claims description 39
- 238000002834 transmittance Methods 0.000 claims description 37
- 239000011029 spinel Substances 0.000 claims description 19
- 229910052596 spinel Inorganic materials 0.000 claims description 19
- 239000011247 coating layer Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 8
- 239000000843 powder Substances 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000005245 sintering Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 claims description 5
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 16
- 239000013078 crystal Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 229910052594 sapphire Inorganic materials 0.000 description 7
- 239000010980 sapphire Substances 0.000 description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- 238000001513 hot isostatic pressing Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- 229910017768 LaF 3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- -1 SiO 2 Chemical class 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
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Description
本発明は、液晶パネルを保護する透明基板、特に液晶プロジェクター等に用いる液晶保護用透明基板、前記透明基板を備える液晶プロジェクター及び前記透明基板に用いる透明立方晶多結晶体スピネルに関する。 The present invention relates to a transparent substrate for protecting a liquid crystal panel, particularly a transparent substrate for protecting a liquid crystal used in a liquid crystal projector, a liquid crystal projector including the transparent substrate, and a transparent cubic polycrystalline spinel used for the transparent substrate.
通常の液晶は、表面を汚れや外気から保護する目的で、使用する際に何らかの保護層を有する。ＣＲＴ等に用いる場合は、透明プラスチックでもその効果は十分にある。また、携帯電話等の画面保護の場合は、強度を要求されるため、ガラス等を用いる場合がある。
最近では、このような液晶画面の表裏を透明化し、液晶パネルとして一方から光を当て、レンズ等で透過光を調整した液晶プロジェクターが市販されている。このような液晶プロジェクターにおける、液晶画面を保護する透明基板には、単に液晶画面の汚れや外気からの保護だけでなく、近接する光源からの熱保護と、該光源からの光により、液晶画面に発生する吸熱現象に伴う昇温とを放熱する目的が加わってくる。そして、透明基板自身も昇温するため、耐熱性を必要とする。
Ordinary liquid crystals have some kind of protective layer when used for the purpose of protecting the surface from dirt and outside air. When used for CRT or the like, even a transparent plastic has a sufficient effect. In the case of screen protection for a mobile phone or the like, glass or the like may be used because strength is required.
Recently, a liquid crystal projector in which the front and back surfaces of such a liquid crystal screen are made transparent, light is applied from one side as a liquid crystal panel, and transmitted light is adjusted with a lens or the like is commercially available. In such a liquid crystal projector, the transparent substrate that protects the liquid crystal screen is not only protected from dirt and the outside air of the liquid crystal screen, but also protected from heat by a nearby light source and light from the light source. The purpose of radiating the temperature rise accompanying the generated endothermic phenomenon is added. And since the transparent substrate itself also heats up, heat resistance is required.
前記使用用途における透明基板には、通常ガラスを用いることが考えられるが、ガラスの熱伝導性を２０〜３０倍向上させる単結晶サファイアを使用する開示がある（引用文献１参照）。さらに、単結晶サファイアは強度が大きく、石英ガラスに比べ非常に硬いので、透明基板を薄くすることができるとの記載もある。但し単結晶サファイアは高価であるため、ガラスとの組み合わせで用いても良いとの記載もある。
液晶パネルに用いる保護用の透明基板として、特に液晶プロジェクターに用いられる場合等の耐熱性と光透過性、および液晶の温度上昇を抑える等の要求に耐えるものとする。既に、前記特許文献１に単結晶サファイアが開示されているが、単結晶サファイアには複屈折なる特性があるため、組み立て時に結晶軸の方位を合わせる等の、複雑な作業を有し、かつ高価である。 As a protective transparent substrate for use in a liquid crystal panel, it is required to withstand demands such as heat resistance and light transmission particularly when used in a liquid crystal projector, and suppression of temperature rise of the liquid crystal. Although single crystal sapphire has already been disclosed in Patent Document 1, since single crystal sapphire has a characteristic of birefringence, it has complicated work such as alignment of crystal axis orientation during assembly and is expensive. It is.
本発明は、透明立方晶多結晶体スピネル（ＭｇＯ・ｎＡｌThe present invention relates to a transparent cubic polycrystalline spinel (MgO.nAl
２2
ＯO
３3
；ｎ＝１〜３）の板に反射防止コーティング層が形成されてなる、液晶パネルの保護に用いる液晶パネル用透明基板であって、前記透明立方晶多結晶体スピネルは、純度９９．９％以上のスピネル粉末を予備成形し、前記予備成形で出来た成形体を加圧焼結し、前記加圧焼結により得られた焼結体をＨＩＰを用いて多結晶化したものであり、熱伝導率が１０Ｗ／ｍ・Ｋ以上で、A transparent substrate for a liquid crystal panel used for protecting a liquid crystal panel, in which an antireflection coating layer is formed on a plate of n = 1 to 3), wherein the transparent cubic polycrystalline spinel has a purity of 99.9% The above-mentioned spinel powder is preformed, the compact made by the preforming is pressure sintered, and the sintered compact obtained by the pressure sintering is polycrystallized using HIP. Conductivity is 10 W / m · K or more,
かつ、厚さ１ｍｍの板に加工しその表面に反射防止コーティングを行った場合の光透過率が波長０．３μｍ〜１μｍにおいて８０％以上となるものである、液晶パネル用透明基板である。In addition, it is a transparent substrate for a liquid crystal panel, which has a light transmittance of 80% or more at a wavelength of 0.3 μm to 1 μm when processed into a 1 mm thick plate and subjected to an antireflection coating on the surface thereof.
前記反射防止コーティング層は、特に該高熱伝導性透明立方晶多結晶体より屈折率の低い材料でコーティングされていると、光の透過性が良くなる。またコーティング層は金属弗化物と金属酸化物から選ばれる層を２種以上組合わせた複層とすると、高熱伝導性透明立方晶多結晶体の板との密着性も良く、かつ環境安定性に優れる。 When the antireflection coating layer is coated with a material having a refractive index lower than that of the highly heat conductive transparent cubic polycrystal, the light transmittance is improved. In addition, when the coating layer is a multi-layer composed of two or more layers selected from metal fluorides and metal oxides, it has good adhesion to the plate of the high thermal conductivity transparent cubic polycrystal and is environmentally stable. Excellent.
また本発明は、可視光を発する光源と、上記の液晶パネル用透明基板とを備えている液晶プロジェクターである。 Moreover, this invention is a liquid crystal projector provided with the light source which emits visible light, and said transparent substrate for liquid crystal panels.
本発明になる透明立方晶多結晶体の板は、多結晶なので、液晶パネルに組み立てる際に結晶軸の方位を気にせず組み立てることができる。また、光透過性がよいため、光源からの光による熱吸収も少ないので、液晶の昇温を熱放散できる。この特性により、液晶プロジェクター用透明基板として有用である。 Since the transparent cubic polycrystalline plate according to the present invention is polycrystalline, it can be assembled without worrying about the orientation of the crystal axis when assembling into a liquid crystal panel. Further, since the light transmittance is good, there is little heat absorption by light from the light source, so that the temperature rise of the liquid crystal can be dissipated. This characteristic makes it useful as a transparent substrate for a liquid crystal projector.
図１に、高熱伝導性透明立方晶多結晶体基板の１つであるＺｎＳの光透過性グラフを示す。比較用にサファイア単結晶基板と、石英基板も合わせて示す。横軸は光の波長で、縦軸がその波長における光透過率（％）である。該グラフによれば、高熱伝導性透明立方晶多結晶体基板の１つであるＺｎＳは波長１μｍ以下の可視光線領域で光透過性が９０％以上と優れており、また波長１μｍ以上の広い領域で７０％程度の光透過性を示す。これに比べ、サファイア単結晶基板では、可視光線の透過性が８５％程度であり、近赤外域ではＺｎＳより光透過性がよいが、波長６μｍ付近から長波長領域で光を透過しなくなる。また、石英基板は、可視光線領域では９０％程度の光透過性を示すが、赤外線領域では光透過性が良くない。 FIG. 1 shows a light transmission graph of ZnS, which is one of high thermal conductivity transparent cubic polycrystalline substrates. For comparison, a sapphire single crystal substrate and a quartz substrate are also shown. The horizontal axis is the wavelength of light, and the vertical axis is the light transmittance (%) at that wavelength. According to the graph, ZnS, which is one of the highly heat-conductive transparent cubic polycrystal substrates, has an excellent light transmittance of 90% or more in a visible light region having a wavelength of 1 μm or less, and a wide region having a wavelength of 1 μm or more. Shows a light transmittance of about 70%. Compared to this, the sapphire single crystal substrate has a visible light transmittance of about 85% and better light transmittance than ZnS in the near-infrared region, but does not transmit light in the long wavelength region from around the wavelength of 6 μm. In addition, the quartz substrate exhibits a light transmittance of about 90% in the visible light region, but the light transmittance is not good in the infrared region.
なお、図２に高熱伝導性透明立方晶多結晶体基板であるＺｎＳ基板及び本発明になるスピネル基板の可視光領域における光透過率のグラフを示す。可視光と呼ばれる０．４μｍ〜１μｍの領域において、非常に光透過性が良いことを示している。特にスピネル基板の場合には、短波長領域（０．４μｍ以下）でも光透過性が良い。 FIG. 2 shows a graph of light transmittance in a visible light region of a ZnS substrate which is a high thermal conductivity transparent cubic polycrystalline substrate and a spinel substrate according to the present invention. In the region of 0.4 μm to 1 μm called visible light, the light transmittance is very good. In particular, in the case of a spinel substrate, light transmittance is good even in a short wavelength region (0.4 μm or less).
また、プロジェクターの光源は、可視光線を発すると同時に、赤外線領域の波長を有する目に見えない光をも合わせて発している。これらの赤外線は熱線とも呼ばれ、物質に吸収されやすい。この領域で本発明になる高熱伝導性透明立方晶多結晶体の基板は、光透過性に優れているため、プロジェクターの光源から発する熱線が透明基板内をほとんど通り抜け、内部に吸収される熱線量が少ないので、昇温しにくい。透明基板の温度上昇が少なければ、液晶パネルに構成される、２つの透明基板によって挟まれる液晶部分（透明導電体からなる画素電極、配線、配向膜などが形成された透明の素子基板とその対向基板、および両基板に挟まれた液晶）の温度上昇による熱を吸熱することができる。
そして、高熱伝導性透明立方晶多結晶体の一例であるＺｎＳの熱伝導率は約２１Ｗ／ｍ・Ｋであり、石英ガラスよりもずっと大きく、前記吸熱を素早く外部に放熱できる。
Further, the light source of the projector emits visible light and simultaneously emits invisible light having a wavelength in the infrared region. These infrared rays are also called heat rays and are easily absorbed by substances. In this region, the substrate of the high thermal conductivity transparent cubic polycrystalline body according to the present invention is excellent in light transmittance, so that heat rays emitted from the light source of the projector almost pass through the transparent substrate and are absorbed in the inside. Because there is little, temperature rise is difficult. If the temperature rise of the transparent substrate is small, the liquid crystal part sandwiched between two transparent substrates (a transparent element substrate on which a transparent conductive material pixel electrode, wiring, alignment film, etc. are formed, and its opposite) The heat due to the temperature rise of the substrate and the liquid crystal sandwiched between the substrates can be absorbed.
The thermal conductivity of ZnS, which is an example of a high thermal conductivity transparent cubic polycrystal, is about 21 W / m · K, which is much higher than that of quartz glass, and the heat absorption can be quickly dissipated to the outside.
特に、液晶は画像を形成することにより、光源からの光を画像により一部遮断することになるため、該液晶内に吸熱される量が大きく、温度上昇しやすい。温度上昇により、該液晶は配向特性を阻害されることになるため、冷却は必須である。従って、透明基板は放熱体としての特性を必要とし、熱伝導性が良くかつ光源からの光吸収による温度上昇が少ないものが選ばれる。
こうした用途に透明立方晶多結晶体基板は好適な基板である。
In particular, the liquid crystal forms an image, so that the light from the light source is partially blocked by the image, so that the amount of heat absorbed in the liquid crystal is large and the temperature is likely to rise. Cooling is essential because the liquid crystal is disturbed in alignment properties due to the temperature rise. Therefore, the transparent substrate is required to have characteristics as a heat radiator, have good thermal conductivity, and have a small temperature rise due to light absorption from the light source.
A transparent cubic polycrystalline substrate is suitable for such applications.
透明立方晶多結晶体は、以下の手段により得られる。
高純度の原料を成形体とする。スピネル、ＭｇＯは粉末焼結法により得ることが出来る。またＺｎＳは、Ｚｎ粉末とＨ２Ｓを原料として、ＣＶＤ（化学気相堆積法）を用いるとよい。得られた焼結体は、ＨＩＰ（熱間等方圧プレス）により、透明な多結晶体とする。
The transparent cubic polycrystal is obtained by the following means.
A high purity raw material is used as a molded body. Spinel and MgO can be obtained by a powder sintering method. As ZnS, it is preferable to use CVD (Chemical Vapor Deposition) using Zn powder and H 2 S as raw materials. The obtained sintered body is made into a transparent polycrystalline body by HIP (hot isostatic pressing).
前記透明立方晶多結晶体は、そのままの状態でも使用できるが、光透過性の向上と、表面安定性を向上させるため、表面にコーティング処理を施すとよい。コーティングの材料としては、高熱伝導性透明立方晶多結晶体となじみの良い材料であり、かつ透明性、硬さ、熱伝導において素材となる高熱伝導性透明立方晶多結晶体の特性を生かすもので有れば特定しない。そして、コーティング層は、単層でも使用できるが、好ましくは複層のコーティング層を形成するのがよい。 The transparent cubic polycrystal can be used as it is, but the surface may be coated to improve light transmission and surface stability. As a coating material, it is a material that is well-suited to highly heat-conductive transparent cubic polycrystals, and that makes use of the characteristics of high heat-conductivity transparent cubic polycrystals that are materials for transparency, hardness, and heat conduction. If it is, it does not specify. The coating layer can be used as a single layer, but preferably a multilayer coating layer is formed.
コーティング層を複層にする場合、金属酸化物、例えばＳｉＯ２、ＴｉＯ２、Ａｌ２Ｏ３、Ｙ２Ｏ３、Ｔａ２Ｏ５、ＺｒＯ２、金属弗化物、例えば、ＭｇＦ２、ＹＦ３、ＬａＦ３、ＣｅＦ３、ＢａＦ２等が好ましく使用できる。
また、これらの層は２層乃至２０層程度重ねたものでも使用できる。そして、前記コーティング層は、複層構成としても最大５μｍまでの厚みとするのがよい。
前記コーティング層の形成は、物理蒸着法（ＰＶＤ法）を用いるのが良く、公知のスパッタリング法、イオンプレーティング法、真空蒸着法等で実施できる。特に、イオンアシスト、プラズマアシストを併用すると膜性能が向上する。
以下実施例を記載するが、本発明は実施例により限定されるものでもない。
＜参考例１＞
When the coating layer is a multilayer, metal oxides such as SiO 2 , TiO 2 , Al 2 O 3 , Y 2 O 3 , Ta 2 O 5 , ZrO 2 , metal fluorides such as MgF 2 , YF 3 , LaF 3 , CeF 3 , BaF 2 and the like can be preferably used.
Further, these layers can be used by stacking about 2 to 20 layers. And the said coating layer is good to set it as the thickness to a maximum of 5 micrometers also as a multilayer structure.
The coating layer can be formed by a physical vapor deposition method (PVD method), and can be performed by a known sputtering method, ion plating method, vacuum vapor deposition method or the like. In particular, when ion assist and plasma assist are used in combination, the film performance is improved.
Examples will be described below, but the present invention is not limited to the examples.
<Reference Example 1>
純度９９．９％以上のＺｎとＨ２Ｓを、ＣＶＤ装置を用いて高純度のＺｎＳバルクとした。ＣＶＤにおける反応条件は、基板温度７００℃、坩堝温度７００℃、炉内圧力１０Ｔｏｒｒとし、アルゴンガス雰囲気中で反応させた。得られたＺｎＳバルクは、半透明の黄色を呈する。このバルクを熱間等方圧プレス（ＨＩＰ）を用いて、温度１０００℃、圧力２０００ｋｇ／ｃｍ２及びアルゴンガス雰囲気の条件で多結晶化した。得られたＺｎＳ多結晶体は、無色透明になった。このＺｎＳ多結晶体を厚み１ｍｍの板に加工し、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は７３％であった。 Zn and H 2 S having a purity of 99.9% or more were converted into a high-purity ZnS bulk using a CVD apparatus. The reaction conditions in CVD were a substrate temperature of 700 ° C., a crucible temperature of 700 ° C., and a furnace pressure of 10 Torr, and the reaction was performed in an argon gas atmosphere. The obtained ZnS bulk exhibits a translucent yellow color. This bulk was polycrystallized using a hot isostatic press (HIP) under the conditions of a temperature of 1000 ° C., a pressure of 2000 kg / cm 2 and an argon gas atmosphere. The obtained ZnS polycrystal became colorless and transparent. When this ZnS polycrystal was processed into a plate having a thickness of 1 mm and the spectral transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 73%.
前記板状のＺｎＳ多結晶体の光透過率を向上させるために、低屈折率材にＭｇＦ２、高屈折率材にＡｌ２Ｏ３を用いた反射防止コーティングを総厚０．３μｍ行い、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は９０％となった。この板を窓材として液晶パネルに組み込み、画像評価をしたところ、映し出される映像は、照度のムラが無く、石英ガラスと同等であり、良好と判断した。 In order to improve the light transmittance of the plate-like ZnS polycrystal, an antireflection coating using MgF 2 as a low refractive index material and Al 2 O 3 as a high refractive index material is performed with a total thickness of 0.3 μm. When the transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 90%. When this plate was incorporated into a liquid crystal panel as a window material and image evaluation was performed, the projected image had no illuminance unevenness and was judged to be good because it was equivalent to quartz glass.
純度９９．９％以上のスピネル（ＭｇＯ・Ａｌ２Ｏ３）粉末を、圧力１５００ｋｇ／ｃｍ２で予備成形し、出来た成形体をグラファイト製の容器に入れ、真空中で温度１５００℃、圧力３５０ｋｇ／ｃｍ２にし、加圧焼結した。得られたスピネル焼結体を、ＨＩＰを用いて、温度１６５０℃、圧力２０００ｋｇ／ｃｍ２及びアルゴンガス雰囲気の条件で多結晶化した。得られたスピネル多結晶体は、無色透明であった。このスピネル多結晶体を厚み１ｍｍの板に加工し、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は８４％であった。 Spinel (MgO.Al 2 O 3 ) powder having a purity of 99.9% or more was preformed at a pressure of 1500 kg / cm 2 , and the resulting compact was placed in a graphite container, and the temperature was 1500 ° C. and the pressure was 350 kg in a vacuum. / Cm 2 and pressure sintered. The obtained spinel sintered body was polycrystallized using HIP under the conditions of a temperature of 1650 ° C., a pressure of 2000 kg / cm 2 and an argon gas atmosphere. The obtained spinel polycrystal was colorless and transparent. When this spinel polycrystal was processed into a plate having a thickness of 1 mm and the spectral transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 84%.
前記板状のスピネル多結晶体の光透過率を向上させるために、低屈折率材にＭｇＦ２、高屈折率材にＡｌ２Ｏ３を用いた反射防止コーティングを総厚０．３μｍ行い、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は９３％となった。この板を窓材として液晶パネルに組み込み、画像評価をしたところ、映し出される映像は、照度のムラが無く、石英ガラスと同等であり、良好と判断した。 In order to improve the light transmittance of the plate-like spinel polycrystal, an antireflection coating using MgF 2 as a low refractive index material and Al 2 O 3 as a high refractive index material is performed with a total thickness of 0.3 μm. When the transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 93%. When this plate was incorporated into a liquid crystal panel as a window material and image evaluation was performed, the projected image had no illuminance unevenness and was judged to be good because it was equivalent to quartz glass.
＜参考例２＞
純度９９．９％以上のＹＡＧ（３Ｙ２Ｏ３・５Ａｌ２Ｏ３）粉末を、圧力１５００ｋｇ／ｃｍ２で予備成形し、出来た成形体をアルミナ製の容器に入れ、真空中で温度１５００℃にし、焼結した。得られたＹＡＧ多結晶体は、無色透明であった。このＹＡＧ多結晶体を厚み１ｍｍの板に加工し、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は８３％であった。
<Reference Example 2>
YAG (3Y 2 O 3 .5Al 2 O 3 ) powder having a purity of 99.9% or more was preformed at a pressure of 1500 kg / cm 2 , and the resulting molded body was placed in an alumina container, and the temperature was 1500 ° C. in a vacuum. And sintered. The obtained YAG polycrystal was colorless and transparent. When this YAG polycrystal was processed into a plate having a thickness of 1 mm and the spectral transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 83%.
前記板状のＹＡＧ多結晶体の光透過率を向上させるために、低屈折率材にＭｇＦ２、高屈折率材にＡｌ２Ｏ３を用いた反射防止コーティングを総厚０．３μｍ行い、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は９２％となった。この板を窓材として液晶パネルに組み込み、画像評価をしたところ、映し出される映像は、照度のムラが無く、石英ガラスと同等であり、良好と判断した。
＜参考例３＞
In order to improve the light transmittance of the plate-like YAG polycrystal, an antireflection coating using MgF 2 as a low refractive index material and Al 2 O 3 as a high refractive index material is performed with a total thickness of 0.3 μm, When the transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 92%. When this plate was incorporated into a liquid crystal panel as a window material and image evaluation was performed, the projected image had no illuminance unevenness and was judged to be good because it was equivalent to quartz glass.
<Reference Example 3>
純度９９．９％以上のＭｇＯ粉末を、圧力１５００ｋｇ／ｃｍ２で予備成形し、出来た成形体をグラファイト製の容器に入れ、真空中で温度１５００℃、圧力３５０ｋｇ／ｃｍ２にし、加圧焼結した。得られたＭｇＯ焼結体を、ＨＩＰを用いて、温度１６５０℃、圧力２０００ｋｇ／ｃｍ２及びアルゴンガス雰囲気の条件で多結晶化した。得られたＭｇＯ多結晶体は、無色透明であった。このＭｇＯ多結晶体を厚み１ｍｍの板に加工し、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は８４％であった。 MgO powder with a purity of 99.9% or more is preformed at a pressure of 1500 kg / cm 2 , and the resulting compact is placed in a graphite container, and is heated to 1500 ° C. under a pressure of 350 kg / cm 2 in a vacuum. I concluded. The obtained MgO sintered body was polycrystallized using HIP under the conditions of a temperature of 1650 ° C., a pressure of 2000 kg / cm 2 and an argon gas atmosphere. The obtained MgO polycrystal was colorless and transparent. When this MgO polycrystal was processed into a plate having a thickness of 1 mm and the spectral transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 84%.
前記板状のＭｇＯ多結晶体の光透過率を向上させるために、低屈折率材にＭｇＦ２、高屈折率材にＡｌ２Ｏ３を用いた反射防止コーティングを総厚０．３μｍ行い、分光透過率を測定したところ、波長０．４〜０．８μｍの平均透過率は９３％となった。この板を窓材として液晶パネルに組み込み、画像評価をしたところ、映し出される映像は、照度のムラが無く、石英ガラスと同等であり、良好と判断した。 In order to improve the light transmittance of the plate-like MgO polycrystal, an antireflection coating using MgF 2 as a low refractive index material and Al 2 O 3 as a high refractive index material is performed with a total thickness of 0.3 μm. When the transmittance was measured, the average transmittance at a wavelength of 0.4 to 0.8 μm was 93%. When this plate was incorporated into a liquid crystal panel as a window material and image evaluation was performed, the projected image had no illuminance unevenness and was judged to be good because it was equivalent to quartz glass.
Claims (4)
前記透明立方晶多結晶体スピネルは、The transparent cubic polycrystalline spinel is
純度９９．９％以上のスピネル粉末を予備成形し、Pre-form spinel powder with a purity of 99.9% or more,
前記予備成形で出来た成形体を加圧焼結し、Pressure-sintering the molded body made by the preforming,
前記加圧焼結により得られた焼結体をＨＩＰを用いて多結晶化したものであり、The sintered body obtained by the pressure sintering is polycrystallized using HIP,
熱伝導率が１０Ｗ／ｍ・Ｋ以上で、Thermal conductivity is 10 W / m · K or more,
かつ、厚さ１ｍｍの板に加工しその表面に反射防止コーティングを行った場合の光透過率が波長０．３μｍ〜１μｍにおいて８０％以上となるものである、And the light transmittance when processed into a plate having a thickness of 1 mm and antireflection coating on the surface thereof is 80% or more at a wavelength of 0.3 μm to 1 μm.
液晶パネル用透明基板。Transparent substrate for LCD panels.
前記予備成形で出来た成形体を加圧焼結する工程と、
前記加圧焼結により得られた焼結体をＨＩＰを用いて多結晶化する工程と、
前記ＨＩＰにより得られたスピネル多結晶体を板に加工する工程と、
前記加工により得られたスピネル多結晶体の板に反射防止コーティングを行う工程と、
を有する請求項１または請求項２に記載の透明立方晶多結晶体スピネルの板からなる液晶パネル用透明基板の製造方法。 A step of preforming a spinel powder on purity of 99.9% or more,
A step of pressure-sintering the molded body made by the preforming, and
A step of polycrystallizing the sintered body obtained by the pressure sintering using HIP;
Processing the spinel polycrystal obtained by the HIP into a plate;
And performing anti-reflection coatings on the plate of the obtained spinel polycrystalline body by pre Symbol Processing,
The manufacturing method of the transparent substrate for liquid crystal panels which consists of a board | substrate of the transparent cubic polycrystal spinel of Claim 1 or Claim 2 which has these.
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| JP2005283969A (en) * | 2004-03-30 | 2005-10-13 | Nec Corp | Liquid crystal display device and liquid crystal projector using the same |
| JP2006273679A (en) * | 2005-03-30 | 2006-10-12 | Sumitomo Electric Ind Ltd | Spinel sintered compact, light transmission window, and light transmission lens |
| KR20080093019A (en) * | 2005-12-15 | 2008-10-17 | 에스이아이 하이브리드 가부시키가이샤 | Transparent spinel substrate, transparent substrate for optical engine, rear projection television receiver using them and image projector using liquid crystal |
| JP4830911B2 (en) | 2007-03-02 | 2011-12-07 | 住友電気工業株式会社 | Spinel sintered body, manufacturing method thereof, transparent substrate and liquid crystal projector |
| RU2678032C2 (en) * | 2014-02-07 | 2019-01-22 | Керамтек-Этек Гмбх | Substrate ceramic laminate |
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