JP3804899B2

JP3804899B2 - Sputtering device for optical recording medium production

Info

Publication number: JP3804899B2
Application number: JP15471299A
Authority: JP
Inventors: 康知阿萬; 浩司出口; 渉大谷; 勝真貝; 裕司三浦
Original assignee: Ricoh Co Ltd
Current assignee: Ricoh Co Ltd
Priority date: 1999-06-02
Filing date: 1999-06-02
Publication date: 2006-08-02
Anticipated expiration: 2019-06-02
Also published as: JP2000345331A

Description

【０００１】
【発明の属する技術分野】
この発明は、ＣＤ−ＲＯＭ，ＣＤ−Ｒ，ＣＤ−ＲＷ，ＤＶＤ等の光情報記録媒体を作製するスパッタ装置及び光記録媒体の製造方法、特にスパッタ成膜中に被成膜基板を保持する基板ホルダの構造に関するものである。
【０００２】
【従来の技術】
例えばＣＤ−ＲＯＭやＤＶＤ等の光情報記録媒体を作製するときは、基板に反射層と記録層と誘電体層あるいは保護層をスパッタ装置により成膜している。スパッタ装置による成膜は、真空中でアルゴンプラズマ等を発生させ、そのプラズマ中のイオンによってターゲット表面をたたき、対向する基板に膜を堆積させる方法である。このためスパッタ成膜時の熱の発生は避けることができない。一般的に光情報記録媒体は基板にポリカーボネイト等の高分子材料が用いられているため、成膜室内の温度上昇は基板の変形を引き起こす要因となる。特に、連続高速成膜を行う場合や厚肉成膜を行う場合、あるいは同一基板に２層以上の成膜を繰り返し行う場合等において基板の変形は大きな問題となる。また、ＤＶＤに用いられる０．６ｍｍの薄肉基板を用いる場合には基板の変形は特に重大な問題となる。
【０００３】
この問題を解決するため、例えば特開平１０−８１９６４号公報に示された光情報記録媒体用の基板ホルダは、図７の断面図に示すように、ディスク基板１３を保持する基板ホルダ３１の外周部３２を内周部３３より高くし、ディスク基板１３を円錐状に保持して、ディスク基板１３がスパッタにより反る方向と逆方向に歪ませてスパッタを行い、スパッタ終了時に、スパッタ成膜の応力によりディスク基板１３の歪を低減するようにしている。
【０００４】
【発明が解決しようとする課題】
例えばＤＶＤの作製においては、一般に０．６ｍｍのディスク基板にスパッタ成膜した後、０．６ｍｍのブランク基板を貼り合わせる方法が採られる。この貼り合わせ工程においては円周方向の反りを矯正することが困難であることから、スパッタ成膜において極力円周方向の反りを低く抑えておくことが必要である。しかしながら特開平１０−８１９６４号公報に示されたスパッタホルダはディスク基板の半径方向の反りは低減できるが、ディスク基板の円周方向についての基板機械特性に関しては、何ら対策がなされているものではなく、総合的に見るとスパッタ成膜による基板変形に関わる対策としては不十分である。
【０００５】
また、ディスク基板に薄膜を成膜するときに、ディスク基板の薄膜成膜部分の裏面の少なくとも一部分を、基板ホルダと密着させて成膜する方法もある。この方法はスパッタ成膜による基板変形に関してきわめて有効な方法であり、ディスク基板の半径方向の反りに加え、円周方向の反りを低減させることもできる。
【０００６】
しかしながら、この方法においては、スパッタ成膜後にスパッタ成膜装置からディスク基板を取り出す際に、ディスク基板が基板ホルダに真空吸着した状態になっているため、ディスク基板を基板ホルダから取り出すことが容易でなく、搬送系側でディスク基板を基板ホルダから引き剥がすことができたとしても、ディスク基板裏面への傷等が生じるという問題があり、光ディスクを作製するときの歩留まりを低下させるとともに基板搬送プロセスの高速化を図る上でも重大な障害となる。
【０００７】
この解決策として基板ホルダにあらかじめ溝を設けておく等の方法も取られているが、基板真空吸着を解除するための手段としては十分なものではなく、ディスク基板搬送の安定性の面で問題が残る。また、ディスク基板裏面と密着する面に溝を形成することは、基板変形にも悪影響を与えることとなり、十分な基板変形低減の効果を得ることが難しい。
【０００８】
この発明はかかる短所を改善し、スパッタ成膜によって生じるディスク基板の変形を低減させ、かつ安定した基板搬送が行える光記録媒体用スパッタ装置及び光記録媒体の製造方法を提供することを目的とするものである。
【０００９】
【課題を解決するための手段】
この発明に係る光記録媒体作製用スパッタ装置は、ディスク基板を保持する基板ホルダは固定部と可動部を有し、可動部は保持するディスク基板と接触する一定面積の接触面を有し、固定部の嵌合穴に沿って保持するディスク基板のディスク面に対して直交する方向に移動し、ディスク基板に成膜するときは可動部の接触面をディスク基板の裏面に接触させてディスク基板の情報記録領域全面を固定部の接触面と可動部の接触面で密着保持し、ディスク基板を着脱するときは可動部の接触面を固定部の嵌合穴に沿って移動しディスク基板の裏面から離すことを特徴とする。
【００１０】
上記固定部の嵌合穴に導通するガス導入口を設け、可動部の接触面をディスク基板の裏面から離すときに、ガス導入口が固定部の嵌合穴に開口する位置まで可動部を移動すると良い。
【００１１】
また、上記可動部と固定部の接触面の少なくとも一方の面に潤滑処理を施したり、可動部と固定部の接触面の少なくとも一方の面を潤滑性を有する材料で形成すると良い。
【００１２】
さらに、可動部と固定部のディスク基板との接触面を潤滑性を有する材料で形成することが望ましい。また、可動部と固定部を潤滑性を有する材料で形成しても良い。
【００１３】
この発明の光記録媒体の製造方法は、ディスク基板を保持する接触面に対して直交する方向に設けた嵌合穴に移動自在に取り付けた可動部を有する固定部の接触面にディスク基板を保持し、可動部の接触面をディスク基板の裏面に接触させてディスク基板の情報記録領域全面を固定部の接触面と可動部の接触面で密着保持した状態でディスク基板に成膜して情報記録層を作製し、ディスク基板に情報記録層を作製した後、可動部の接触面を固定部の嵌合穴に沿って移動しディスク基板の裏面から離してディスク基板を固定部から取り外すことを特徴とする。
【００１４】
【発明の実施の形態】
この発明のスパッタ装置は基板搬入・排出室と複数の成膜室が一順するように連続して設けられ、基板搬入・排出室と各成膜室に光ディスクの基板を搬送する基板ホルダを保持した伸縮自在のアームが、一順する基板搬入・排出室と複数の成膜室の中心に設けられた回転軸に取り付けられている。
【００１５】
基板ホルダは固定部と複数の可動部を有する。可動部は固定部の中心から一定半径の位置に等間隔で配置された一定大きさの円柱状からなり、下端部にエアーシリンダ等の駆動部が連結され、固定部に設けられた穴に沿って移動する。固定部にはディスク基板を保持する面の外周部に外周マスクを吸着する複数の磁石を有し、中心部に内周マスクを吸着する磁石を有する。この固定部の可動部を嵌合している穴の上端部はガス導入路に連通している。この基板ホルダは、外周マスクと内周マスクによりディスク基板を保持して、基板搬入・排出室と各成膜室の装着部に装着される。
【００１６】
このスパッタ装置の基板搬入・排出室にディスク基板が搬入されると、基板搬入・排出室に装着された基板ホルダで搬入されたディスク基板を保持する。このディスク基板を保持するときに、基板ホルダの駆動部により可動部を後退させ、可動部の先端表面がガス導入路より外れてガス導入路が固定部の穴に開口する位置まで後退させた状態で固定部の表面にディスク基板を接触させて保持する。この状態でアームを一定距離だけ後退してから回転軸を一定角度回動してディスク基板を保持した基板ホルダを第１の成膜室に装着する。そして基板ホルダの駆動部により可動部を前進させ、可動部の先端表面を固定部の表面と一致させ、固定部の表面と可動部の先端表面にディスク基板の情報記録領域の全面を接触させて保持する。この状態で第１の成膜室でディスク基板の表面に成膜する。第１の成膜室で成膜したディスク基板は基板ホルダの固定部の表面と可動部の先端表面で情報記録領域の全面を接触させて保持した状態で第２の成膜室に送られ成膜される。このディスク基板の搬送と成膜を最後の成膜室まで繰返してディスク基板の表面に多層膜を形成する。最後の成膜室で成膜されたディスク基板は基板ホルダの固定部の表面と可動部の先端表面で情報記録領域の全面を接触させて保持した状態で基板搬入・排出室に搬送する。ディスク基板を基板搬入・排出室に搬送したら基板ホルダの駆動部により可動部を後退させ、可動部の先端表面がガス導入路より外れてガス導入路が開口する位置まで後退させる。この状態で外部搬送用ホルダによりディスク基板を保持してガス導入路からベントガスを導入して多層膜が形成されたディスク基板を基板ホルダから取外し、外部搬送用ホルダにより外部に排出して搬送する。
【００１７】
【実施例】
図１はこの発明の一実施例の多層成膜用スパッタ装置の概要を示す上面図である。図に示すように、スパッタ装置１は基板搬入・排出室２と第１成膜室３と第２成膜室４と第３成膜室５と第４成膜室６と第５成膜室７と第６成膜室８と第７成膜室９が一順するように連続して設けられ、基板搬入・排出室２と第１成膜室３〜第７成膜室９に光ディスクの基板を搬送する基板ホルダ１０を保持した伸縮自在のアーム１１が、一順する基板搬入・排出室２と第１成膜室３〜第７成膜室９の中心に設けられた回転軸１２に取り付けられている。
【００１８】
基板ホルダ１０は例えば銅等の熱伝導の良好な金属材料からなり、図２の上面図に示すように、固定部２１と複数の可動部２２を有する。可動部２２は、図３のＡ−Ａ断面図に示すように、固定部２１の中心から一定半径例えば半径４０ｍｍの位置に等間隔で配置された一定大きさ例えば直径が２０ｍｍの円柱状からなり、下端部にエアーシリンダ等の駆動部２３が連結され、固定部２１に設けられた穴２４に沿って移動する。この可動部２２と固定部２１の接触面の少なくとも一方の面には、例えばフッ化黒鉛（ＣＦ）ｎやフッ素樹脂（ＰＴＦＥ，ＰＦＡ，ＦＥＰ）の撥水性粉末を用いた複合メッキ、あるいはフルオロアルキル基を有するクロロシラン系化学吸着剤を用いた処理等の撥水処理により潤滑処理が施されている。
【００１９】
固定部２１には、図４のＢ−Ｂ断面図に示すように、ディスク基板１３を保持する面の外周部に外周マスク１４を吸着する複数の磁石２５を有し、中心部に内周マスク１５を吸着する磁石２６を有する。内周マスク１５を吸着する磁石２６の外周部にはスタックリング１６を避ける溝２７が設けられている。この固定部２１の可動部２２を嵌合している穴２４の上端部は、図３に示すように、ガス導入路２８に連通している。この基板ホルダ１０は、外周マスク１４と内周マスク１５によりディスク基板１３を保持して、図４に示すように、基板搬入・排出室２と第１成膜室３〜第７成膜室９の筐体１７の装着部にＯリング１８を介して装着される。基板搬入・排出室２には外周部と中心に外周マスク１４と内周マスク１５を吸着する磁石１９を有する外部搬送用ホルダ２０を有し、外部搬送用ホルダ２０によりディスク基板１３を保持してスパッタ装置１に搬入し、成膜したディスク基板１３をスパッタ装置１から排出する。
【００２０】
上記のように構成されたスパッタ装置１の基板搬入・排出室２にディスク基板１３が搬入されると、基板搬入・排出室２の筐体１７に装着された基板ホルダ１０で搬入されたディスク基板１３を保持する。このディスク基板１３を保持するときに、基板ホルダ１０の駆動部２３により可動部２２を後退させ、図５に示すように、可動部２２の先端表面がガス導入路２８より外れてガス導入路２８が穴２４に開口する位置まで後退させた状態で固定部２１の表面にディスク基板１３を接触させて保持する。この状態でアーム１１を一定距離だけ後退してから回転軸１２を一定角度回動してディスク基板１３を保持した基板ホルダ１０を第１成膜室３に装着する。そして基板ホルダ１０の駆動部２３により可動部２２を前進させ、図３に示すように可動部２２の先端表面を固定部２１の表面と一致させ、固定部２１の表面と可動部２２の先端表面にディスク基板１３の情報記録領域の全面を接触させて保持する。この状態で第１成膜室３でディスク基板１３の表面に成膜する。第１成膜室３で成膜したディスク基板１３は基板ホルダ１０の固定部２１の表面と可動部２２の先端表面で情報記録領域の全面を接触させて保持した状態で第２成膜室４に送られ成膜される。このディスク基板１３の搬送と成膜を第７成膜室９まで繰返してディスク基板１３の表面に多層膜を形成する。第７成膜室９で成膜されたディスク基板１３は基板ホルダ１０の固定部２１の表面と可動部２２の先端表面で情報記録領域の全面を接触させて保持した状態で基板搬入・排出室２に搬送する。ディスク基板１３を基板搬入・排出室２に搬送したら基板ホルダ１０の駆動部２３により可動部２２を後退させ、図５に示すように、可動部２２の先端表面がガス導入路２８より外れてガス導入路２８が開口する位置まで後退させる。この状態で外部搬送用ホルダ２０によりディスク基板１３を保持してガス導入路２８からベントガスを導入して多層膜が形成されたディスク基板１３を基板ホルダ１０から取外し、外部搬送用ホルダ２０により外部に排出して搬送する。
【００２１】
このように、基板ホルダ１０により例えばＤＶＤメディア用の厚さが０．６ｍｍのポリカーボネイトのディスク基板１３の情報記録領域の全面を保持した状態で第１成膜室３〜第７成膜室９により誘電体層としてＺｎＳ・ＳｉＯ₂、記録層としてＡｇＩｎＳｂＴｅ、反射層としてＡｌを用い、誘電体層と記録層と誘電体層と反射層の順に積層成膜して、全体の膜厚が４００ｎｍの多層膜を形成した結果、従来と比べてスパッタ成膜によって引き起こされるディスク基板１３の変形を飛躍的に低減できた。また、基板搬入・搬出室２からディスク基板１３を排出するときに真空吸着による問題も全く発生せず、ディスク基板１３に疵等を付けずに基板ホルダ１０から取り外すことができ、安定して排出することができた。
【００２２】
また、基板ホルダ１０の可動部２２と固定部２１の接触面の少なくとも一方の面に、例えばフッ化黒鉛（ＣＦ）ｎやフッ素樹脂（ＰＴＦＥ，ＰＦＡ，ＦＥＰ）の撥水性粉末を用いた複合メッキ、あるいはフルオロアルキル基を有するクロロシラン系化学吸着剤を用いた処理等の撥水処理により潤滑処理が施されているから、可動部２２を安定して繰返し移動することができ、基板ホルダ１０の耐久性を高めることができた。
【００２３】
上記実施例は基板ホルダ１０に、固定部２１の中心から一定半径の位置に等間隔で配置された複数の可動部２２を設けた場合について説明たが、図６の上面図に示すように、内外径が一定大きさ例えば内径が４０ｍｍ、外径が１１９ｍｍを有する円筒状の可動部２２を設けても上記実施例と同様な作用を奏することができる。
【００２４】
上記各実施例は基板ホルダ１０の可動部２２を前後退する駆動部２３にエアーシリンダを使用した場合について説明したが、油圧シリンダやリニアモータ等を使用しても良い。
【００２５】
また、上記各実施例は第１成膜室３から第７成膜室９まで基板ホルダ１０の可動部２２を前進させた状態でディスク基板１３を保持した場合について説明したが、第１成膜室３から第７成膜室９の各成膜室で成膜時だけ可動部２２を前進させても良い。この場合、第１成膜室３から第７成膜室９の各成膜室で成膜終了後の可動部２２を後退した空き時間にガス導入口２８から冷却ガスを導入することにより、多層成膜途中のディスク基板１３を冷却することができ、ディスク基板１３の変形をより低減することができる。
【００２６】
また、上記実施例は基板ホルダ１０の可動部２２と固定部２１の接触面の少なくとも一方の面に潤滑処理を施した場合について説明したが、可動部２２と固定部２１の接触面の少なくとも一方の面をフッ素樹脂（ＰＴＦＥ）やポリアセタールに代表される潤滑性を有する材料で形成したり、可動部２２と固定部２１を潤滑性を有するフッ素樹脂（ＰＴＦＥ）やポリアセタール等の潤滑性を有する材料で形成しても良い。
【００２７】
さらに、基板ホルダ１０の可動部２２と固定部２１のディスク基板１３と接触する面に潤滑処理を施したり、可動部２２と固定部２１を潤滑性を有するフッ素樹脂（ＰＴＦＥ）やポリアセタール等の潤滑性を有する材料で形成することにより、ディスク基板１３が基板ホルダ１０に接触することにより生じる疵を飛躍的に低減することができる。
【００２８】
【発明の効果】
この発明は以上説明したように、ディスク基板に成膜するときは基板ホルダの可動部の接触面をディスク基板の裏面に接触させてディスク基板の情報記録領域全面を固定部の接触面と可動部の接触面で密着保持するようにしたから、成膜により生じるディスク基板の変形を大幅に低減することができる。
【００２９】
また、ディスク基板を着脱するときは可動部の接触面を固定部の嵌合穴に沿って移動しディスク基板の裏面から離すことにより、ディスク基板を基板ホルダに容易に着脱することができ、良質な光情報記録媒体を安定して作製することができる。
【００３０】
さらに、基板ホルダの固定部の嵌合穴に導通するガス導入口を設け、可動部の接触面をディスク基板の裏面から離すときに、ガス導入口が固定部の嵌合穴に開口する位置まで可動部を移動するから、ディスク基板に成膜した後に冷却ガスを導入してディスク基板を冷却したり、基板ホルダからディスク基板を取り外すときにガス導入口からガスを導入して基板ホルダに対するディスク基板の真空吸着を解消することができ、光情報記録媒体を安定して作製することができる。
【００３１】
また、可動部と固定部の接触面の少なくとも一方の面に潤滑処理を施したり、可動部と固定部の接触面の少なくとも一方の面を潤滑性を有する材料で形成することにより、可動部を安定して繰返し移動することができ、基板ホルダの耐久性を高めることができる。
【００３２】
さらに、基板ホルダの可動部と固定部のディスク基板との接触面に潤滑処理を施したり、可動部と固定部のディスク基板との接触面を潤滑性を有する材料で形成することにより、ディスク基板が基板ホルダに接触することにより生じる疵を飛躍的に低減することができる。
【００３３】
また、基板ホルダの可動部と固定部を潤滑性を有する材料で形成することにより、基板ホルダの耐久性を高めるとともにディスク基板が基板ホルダに接触することにより生じる疵を飛躍的に低減することができる。
【図面の簡単な説明】
【図１】この発明の実施例の多層成膜用スパッタ装置の概要を示す上面図である。
【図２】基板ホルダの上面図である。
【図３】図２のＡ−Ａ断面図である。
【図４】図２のＢ−Ｂ断面図である。
【図５】基板ホルダの可動部が移動した状態を示す断面図である。
【図６】他の実施例の基板ホルダの上面図である。
【図７】従来例の断面図である。
【符号の説明】
１；スパッタ装置、２；基板搬入・排出室、３；第１成膜室、
４；第２成膜室、５；第３成膜室、６；第４成膜室、７；第５成膜室
８；第６成膜室、９；第７成膜室、１０；基板ホルダ、１１；アーム
１２；回転軸、２１；固定部、２２；可動部、２３；駆動部、
２８；ガス導入路。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a sputtering apparatus for producing an optical information recording medium such as a CD-ROM, a CD-R, a CD-RW, and a DVD, and a method for producing the optical recording medium, and more particularly, a substrate for holding a film formation substrate during sputtering film formation. This relates to the structure of the holder.
[0002]
[Prior art]
For example, when an optical information recording medium such as a CD-ROM or DVD is manufactured, a reflective layer, a recording layer, a dielectric layer or a protective layer are formed on a substrate by a sputtering apparatus. Film formation by a sputtering apparatus is a method in which argon plasma or the like is generated in a vacuum, a target surface is struck by ions in the plasma, and a film is deposited on an opposing substrate. For this reason, generation of heat during sputtering film formation cannot be avoided. In general, since an optical information recording medium uses a polymer material such as polycarbonate for a substrate, a rise in temperature in the film forming chamber causes deformation of the substrate. In particular, when performing continuous high-speed film formation, when performing thick film formation, or when repeatedly forming two or more layers on the same substrate, deformation of the substrate becomes a serious problem. Further, when a 0.6 mm thin substrate used for a DVD is used, the deformation of the substrate becomes a particularly serious problem.
[0003]
In order to solve this problem, for example, a substrate holder for an optical information recording medium disclosed in Japanese Patent Application Laid-Open No. 10-81964 has an outer periphery of a substrate holder 31 that holds a disk substrate 13 as shown in a sectional view of FIG. The part 32 is made higher than the inner peripheral part 33, the disk substrate 13 is held in a conical shape, the disk substrate 13 is distorted in a direction opposite to the direction warped by sputtering, and sputtering is performed. The distortion of the disk substrate 13 is reduced by the stress.
[0004]
[Problems to be solved by the invention]
For example, in the production of a DVD, a method is generally employed in which a 0.6 mm blank substrate is bonded to a 0.6 mm disk substrate after sputtering. In this bonding step, it is difficult to correct the circumferential warp, so it is necessary to keep the circumferential warp as low as possible in the sputter film formation. However, the sputter holder disclosed in Japanese Patent Laid-Open No. 10-81964 can reduce the warpage of the disk substrate in the radial direction, but no measures are taken with respect to the substrate mechanical characteristics in the circumferential direction of the disk substrate. However, when viewed comprehensively, it is not sufficient as a countermeasure for substrate deformation by sputter deposition.
[0005]
There is also a method of forming a thin film on the disk substrate by bringing at least a part of the back surface of the thin film forming portion of the disk substrate into close contact with the substrate holder. This method is very effective for substrate deformation by sputter deposition, and can reduce the warpage in the circumferential direction in addition to the warpage in the radial direction of the disk substrate.
[0006]
However, in this method, when the disk substrate is taken out from the sputter film forming apparatus after the sputter film formation, the disk substrate is in a state of being vacuum-sucked to the substrate holder, so that the disk substrate can be easily taken out from the substrate holder. Even if the disk substrate can be peeled off from the substrate holder on the transport system side, there is a problem that the back surface of the disk substrate is scratched, which reduces the yield when manufacturing the optical disk and reduces the substrate transport process. This is a serious obstacle to speeding up.
[0007]
As a solution to this, a method such as providing a groove in the substrate holder in advance has been taken, but it is not sufficient as a means for releasing the vacuum suction of the substrate, and there is a problem in terms of stability of transporting the disk substrate. Remains. In addition, forming a groove on the surface that is in close contact with the back surface of the disk substrate adversely affects substrate deformation, and it is difficult to obtain a sufficient effect of reducing substrate deformation.
[0008]
An object of the present invention is to provide an optical recording medium sputtering apparatus and an optical recording medium manufacturing method that can improve such disadvantages, reduce deformation of a disk substrate caused by sputtering film formation, and perform stable substrate conveyance. Is.
[0009]
[Means for Solving the Problems]
In the sputtering apparatus for producing an optical recording medium according to the present invention, the substrate holder for holding the disk substrate has a fixed part and a movable part, and the movable part has a contact surface of a certain area in contact with the disk substrate to be held and fixed. When the film is deposited on the disk substrate, the contact surface of the movable part is brought into contact with the back surface of the disk substrate. The entire surface of the information recording area is closely held by the contact surface of the fixed portion and the contact surface of the movable portion. When the disk substrate is attached or detached, the contact surface of the movable portion is moved along the fitting hole of the fixed portion and moved from the back surface of the disk substrate. It is characterized by releasing.
[0010]
A gas introduction port that conducts to the fitting hole of the fixed part is provided, and when the contact surface of the movable part is separated from the back surface of the disk substrate, the movable part is moved to a position where the gas introduction port opens in the fitting hole of the fixed part. Good.
[0011]
Further, it is preferable that at least one of the contact surfaces of the movable portion and the fixed portion is lubricated, or at least one of the contact surfaces of the movable portion and the fixed portion is formed of a material having lubricity.
[0012]
Furthermore, it is desirable to form the contact surface between the movable part and the disk substrate of the fixed part with a material having lubricity. Moreover, you may form a movable part and a fixed part with the material which has lubricity.
[0013]
The optical recording medium manufacturing method of the present invention holds a disk substrate on the contact surface of a fixed portion having a movable portion movably attached to a fitting hole provided in a direction orthogonal to the contact surface holding the disk substrate. Then, the contact surface of the movable part is brought into contact with the back surface of the disk substrate, and the entire information recording area of the disk substrate is held in close contact with the contact surface of the fixed part and the contact surface of the movable part. After the layer is manufactured and the information recording layer is manufactured on the disc substrate, the contact surface of the movable portion is moved along the fitting hole of the fixed portion, and is separated from the back surface of the disc substrate to remove the disc substrate from the fixed portion. And
[0014]
DETAILED DESCRIPTION OF THE INVENTION
The sputtering apparatus of the present invention is continuously provided so that the substrate carry-in / discharge chamber and the plurality of film forming chambers are arranged in order, and holds the substrate holder for carrying the optical disk substrate to the substrate carry-in / discharge chamber and each film forming chamber. The extendable and retractable arm is attached to a rotation shaft provided at the center of the substrate loading / unloading chamber and the plurality of film forming chambers.
[0015]
The substrate holder has a fixed part and a plurality of movable parts. The movable part has a cylindrical shape with a constant size arranged at equal intervals from the center of the fixed part, and a drive part such as an air cylinder is connected to the lower end part along a hole provided in the fixed part. Move. The fixed portion has a plurality of magnets for attracting the outer peripheral mask on the outer peripheral portion of the surface holding the disk substrate, and has a magnet for attracting the inner peripheral mask at the central portion. The upper end portion of the hole into which the movable portion of the fixed portion is fitted communicates with the gas introduction path. This substrate holder holds a disk substrate by an outer peripheral mask and an inner peripheral mask, and is mounted on the substrate loading / unloading chamber and the mounting portion of each film forming chamber.
[0016]
When the disk substrate is loaded into the substrate loading / unloading chamber of the sputtering apparatus, the loaded disk substrate is held by the substrate holder mounted in the substrate loading / unloading chamber. When holding the disk substrate, the movable part is moved backward by the drive part of the substrate holder, and the tip surface of the movable part is moved away from the gas introduction path and the gas introduction path is retracted to the position where it opens in the hole of the fixed part. The disk substrate is brought into contact with the surface of the fixed portion and held. In this state, the arm is retracted by a certain distance, and then the rotation shaft is rotated by a certain angle to mount the substrate holder holding the disk substrate in the first film forming chamber. Then, the movable part is advanced by the drive part of the substrate holder, the tip surface of the movable part is made to coincide with the surface of the fixed part, and the entire surface of the information recording area of the disk substrate is brought into contact with the surface of the fixed part and the tip surface of the movable part. Hold. In this state, a film is formed on the surface of the disk substrate in the first film formation chamber. The disk substrate formed in the first film formation chamber is sent to the second film formation chamber with the entire surface of the information recording area held in contact with the surface of the fixed portion of the substrate holder and the tip surface of the movable portion. Be filmed. This disk substrate transport and film formation are repeated up to the last film formation chamber to form a multilayer film on the surface of the disk substrate. The disk substrate formed in the last film forming chamber is conveyed to the substrate carry-in / out chamber with the entire surface of the information recording area held in contact with the surface of the fixed portion of the substrate holder and the tip surface of the movable portion. When the disk substrate is transported to the substrate loading / unloading chamber, the movable portion is moved backward by the drive portion of the substrate holder, and is moved back to a position where the front end surface of the movable portion is detached from the gas introducing passage and the gas introducing passage is opened. In this state, the disk substrate is held by the external transfer holder, the vent gas is introduced from the gas introduction path, the disk substrate on which the multilayer film is formed is removed from the substrate holder, and is discharged and transferred to the outside by the external transfer holder.
[0017]
【Example】
FIG. 1 is a top view showing an outline of a multilayer film forming sputtering apparatus according to an embodiment of the present invention. As shown in the figure, the sputtering apparatus 1 includes a substrate carry-in / out chamber 2, a first film forming chamber 3, a second film forming chamber 4, a third film forming chamber 5, a fourth film forming chamber 6, and a fifth film forming chamber. 7, the sixth film forming chamber 8 and the seventh film forming chamber 9 are successively provided so that the substrate loading / unloading chamber 2 and the first film forming chamber 3 to the seventh film forming chamber 9 A telescopic arm 11 holding a substrate holder 10 for transporting a substrate is attached to a rotating shaft 12 provided in the center of the substrate loading / unloading chamber 2 and the first film forming chamber 3 to the seventh film forming chamber 9. It is attached.
[0018]
The substrate holder 10 is made of a metal material having good thermal conductivity such as copper, and has a fixed portion 21 and a plurality of movable portions 22 as shown in a top view of FIG. As shown in the AA sectional view of FIG. 3, the movable portion 22 has a columnar shape with a constant size, for example, a diameter of 20 mm, arranged at equal intervals from the center of the fixed portion 21 at a constant radius, for example, a radius of 40 mm. The drive part 23 such as an air cylinder is connected to the lower end part and moves along a hole 24 provided in the fixed part 21. On at least one of the contact surfaces of the movable portion 22 and the fixed portion 21, for example, composite plating using water repellent powder of graphite fluoride (CF) n or fluororesin (PTFE, PFA, FEP), or fluoroalkyl Lubricating treatment is performed by water repellent treatment such as treatment using a chlorosilane-based chemical adsorbent having a group.
[0019]
As shown in the BB cross-sectional view of FIG. 4, the fixed portion 21 has a plurality of magnets 25 that attract the outer peripheral mask 14 to the outer peripheral portion of the surface holding the disk substrate 13, and the inner peripheral mask at the center 15 has a magnet 26 for adsorbing 15. A groove 27 that avoids the stack ring 16 is provided on the outer peripheral portion of the magnet 26 that attracts the inner peripheral mask 15. The upper end portion of the hole 24 into which the movable portion 22 of the fixed portion 21 is fitted communicates with the gas introduction path 28 as shown in FIG. The substrate holder 10 holds the disk substrate 13 with an outer peripheral mask 14 and an inner peripheral mask 15, and as shown in FIG. 4, the substrate carry-in / out chamber 2 and the first film forming chamber 3 to the seventh film forming chamber 9. Is mounted on the mounting portion of the housing 17 via an O-ring 18. The substrate carry-in / discharge chamber 2 has an outer transfer holder 20 having a magnet 19 that attracts the outer peripheral mask 14 and the inner peripheral mask 15 at the outer periphery and the center, and holds the disk substrate 13 by the outer transfer holder 20. The disk substrate 13 that has been carried into the sputtering apparatus 1 and formed into a film is discharged from the sputtering apparatus 1.
[0020]
When the disk substrate 13 is loaded into the substrate loading / unloading chamber 2 of the sputtering apparatus 1 configured as described above, the disk substrate loaded by the substrate holder 10 mounted on the housing 17 of the substrate loading / unloading chamber 2. 13 is held. When holding the disk substrate 13, the movable portion 22 is moved backward by the drive portion 23 of the substrate holder 10, and as shown in FIG. 5, the front end surface of the movable portion 22 is detached from the gas introduction passage 28 and the gas introduction passage 28. The disk substrate 13 is held in contact with the surface of the fixed portion 21 in a state in which the disk substrate 13 is retracted to a position where it opens into the hole 24. In this state, the arm 11 is retracted by a certain distance, and then the rotating shaft 12 is rotated by a certain angle to mount the substrate holder 10 holding the disk substrate 13 in the first film forming chamber 3. And the movable part 22 is advanced by the drive part 23 of the substrate holder 10, and as shown in FIG. 3, the front end surface of the movable part 22 is made to coincide with the surface of the fixed part 21, the surface of the fixed part 21 and the front end surface of the movable part 22 Is held in contact with the entire surface of the information recording area of the disk substrate 13. In this state, a film is formed on the surface of the disk substrate 13 in the first film formation chamber 3. The disk substrate 13 formed in the first film formation chamber 3 is held in a state where the entire surface of the information recording area is held in contact with the surface of the fixed portion 21 of the substrate holder 10 and the tip surface of the movable portion 22. To be deposited. The conveyance and film formation of the disk substrate 13 are repeated up to the seventh film formation chamber 9 to form a multilayer film on the surface of the disk substrate 13. The disk substrate 13 formed in the seventh film formation chamber 9 is a substrate carry-in / discharge chamber in a state where the entire surface of the information recording area is held in contact with the surface of the fixed portion 21 of the substrate holder 10 and the tip surface of the movable portion 22. 2 to transport. When the disk substrate 13 is transported to the substrate loading / unloading chamber 2, the movable portion 22 is moved backward by the drive portion 23 of the substrate holder 10, and as shown in FIG. Retract to a position where the introduction path 28 opens. In this state, the disk substrate 13 is held by the external transfer holder 20 and vent gas is introduced from the gas introduction path 28 to remove the disk substrate 13 having the multilayer film formed from the substrate holder 10. Eject and transport.
[0021]
Thus, the first film formation chamber 3 to the seventh film formation chamber 9 hold the entire information recording area of the polycarbonate disk substrate 13 having a thickness of 0.6 mm for DVD media, for example, by the substrate holder 10. ZnS · SiO ₂ as the dielectric layer, AgInSbTe as the recording layer, Al as the reflective layer, and a multilayer structure in which the dielectric layer, the recording layer, the dielectric layer, and the reflective layer are stacked in this order, and the total thickness is 400 nm. As a result of forming the film, the deformation of the disk substrate 13 caused by the sputter film formation can be drastically reduced as compared with the conventional case. Further, when the disk substrate 13 is discharged from the substrate loading / unloading chamber 2, there is no problem due to vacuum suction, and the disk substrate 13 can be detached from the substrate holder 10 without any wrinkles or the like, and is stably discharged. We were able to.
[0022]
In addition, composite plating using water repellent powder of, for example, fluorinated graphite (CF) n or fluororesin (PTFE, PFA, FEP) on at least one of the contact surfaces of the movable portion 22 and the fixed portion 21 of the substrate holder 10. Alternatively, since the lubrication treatment is performed by a water repellent treatment such as a treatment using a chlorosilane-based chemical adsorbent having a fluoroalkyl group, the movable portion 22 can be stably and repeatedly moved, and the durability of the substrate holder 10 can be improved. I was able to improve the sex.
[0023]
Although the said Example demonstrated the case where the several movable part 22 arrange | positioned at equal intervals in the position of the fixed radius from the center of the fixed part 21 was provided in the board | substrate holder 10, as shown in the top view of FIG. Even if the cylindrical movable portion 22 having a constant inner and outer diameter, for example, an inner diameter of 40 mm and an outer diameter of 119 mm, is provided, the same effect as in the above embodiment can be obtained.
[0024]
In each of the above embodiments, the case where the air cylinder is used for the drive unit 23 that moves forward and backward with respect to the movable unit 22 of the substrate holder 10 has been described. However, a hydraulic cylinder, a linear motor, or the like may be used.
[0025]
In each of the above embodiments, the case where the disk substrate 13 is held with the movable portion 22 of the substrate holder 10 advanced from the first film formation chamber 3 to the seventh film formation chamber 9 has been described. The movable portion 22 may be advanced only during film formation in each film formation chamber from the chamber 3 to the seventh film formation chamber 9. In this case, the cooling gas is introduced from the gas introduction port 28 during the idle time in which the movable part 22 after the completion of film formation is retracted in each film formation chamber from the first film formation chamber 3 to the seventh film formation chamber 9. The disk substrate 13 in the middle of film formation can be cooled, and the deformation of the disk substrate 13 can be further reduced.
[0026]
Moreover, although the said Example demonstrated the case where the lubrication process was performed to at least one surface of the movable part 22 of the board | substrate holder 10 and the fixed part 21, at least one of the contact surface of the movable part 22 and the fixed part 21 was demonstrated. Is formed of a material having lubricity typified by fluororesin (PTFE) or polyacetal, or a material having lubricity such as fluororesin (PTFE) or polyacetal having lubricity for the movable portion 22 and the fixed portion 21. May be formed.
[0027]
Further, the surface of the substrate holder 10 that contacts the movable portion 22 and the fixed portion 21 with the disk substrate 13 is lubricated, or the movable portion 22 and the fixed portion 21 are lubricated with a fluororesin (PTFE) or polyacetal having lubricity. By forming the material with the property, wrinkles generated when the disk substrate 13 contacts the substrate holder 10 can be drastically reduced.
[0028]
【The invention's effect】
As described above, in the present invention, when the film is formed on the disk substrate, the contact surface of the movable part of the substrate holder is brought into contact with the back surface of the disk substrate so that the entire information recording area of the disk substrate is contacted with the contact surface of the fixed part and the movable part. Therefore, the deformation of the disk substrate caused by the film formation can be greatly reduced.
[0029]
Also, when attaching / detaching the disk substrate, the disk substrate can be easily attached / detached to / from the substrate holder by moving the contact surface of the movable part along the fitting hole of the fixed part and separating it from the back surface of the disk substrate. A stable optical information recording medium can be produced.
[0030]
Furthermore, a gas introduction port that conducts to the fitting hole of the fixed part of the substrate holder is provided, and when the contact surface of the movable part is separated from the back surface of the disk substrate, the gas introduction port is opened to the position where it opens in the fitting hole of the fixed part. Since the moving part moves, the disk substrate is cooled by introducing a cooling gas after forming the film on the disk substrate, or when the disk substrate is removed from the substrate holder, the gas is introduced from the gas introduction port to remove the disk substrate from the substrate holder. Can be eliminated, and an optical information recording medium can be produced stably.
[0031]
Further, the movable part is formed by subjecting at least one of the contact surfaces of the movable part and the fixed part to lubrication or forming at least one of the contact surfaces of the movable part and the fixed part with a material having lubricity. The substrate holder can be moved stably and repeatedly, and the durability of the substrate holder can be enhanced.
[0032]
Further, the contact surface between the movable part of the substrate holder and the disk substrate of the fixed part is lubricated, or the contact surface of the movable part and the disk substrate of the fixed part is formed of a material having lubricity, whereby the disk substrate It is possible to drastically reduce wrinkles caused by contact with the substrate holder.
[0033]
In addition, by forming the movable part and the fixed part of the substrate holder with a material having lubricity, the durability of the substrate holder can be improved and the wrinkles caused by the contact of the disk substrate with the substrate holder can be drastically reduced. it can.
[Brief description of the drawings]
FIG. 1 is a top view showing an outline of a sputtering apparatus for multilayer film formation according to an embodiment of the present invention.
FIG. 2 is a top view of a substrate holder.
3 is a cross-sectional view taken along the line AA in FIG.
4 is a cross-sectional view taken along the line BB in FIG.
FIG. 5 is a cross-sectional view showing a state in which a movable part of the substrate holder has moved.
FIG. 6 is a top view of a substrate holder according to another embodiment.
FIG. 7 is a cross-sectional view of a conventional example.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1; Sputtering apparatus, 2; Substrate carrying in / out chamber, 3; 1st film-forming chamber,
4; second film formation chamber, 5; third film formation chamber, 6; fourth film formation chamber, 7; fifth film formation chamber 8; sixth film formation chamber, 9; Holder, 11; arm 12; rotating shaft, 21; fixed part, 22; movable part, 23;
28: Gas introduction path.

Claims

ディスク基板に成膜して光情報記録媒体を作製する光記録媒体作製用スパッタ装置において、
ディスク基板を保持する基板ホルダは固定部と可動部を有し、可動部は保持するディスク基板と接触する一定面積の接触面を有し、固定部の嵌合穴に沿って保持するディスク基板のディスク面に対して直交する方向に移動し、ディスク基板に成膜するときは可動部の接触面をディスク基板の裏面に接触させてディスク基板の情報記録領域全面を固定部の接触面と可動部の接触面で密着保持し、ディスク基板を着脱するときは可動部の接触面を固定部の嵌合穴に沿って移動しディスク基板の裏面から離すことを特徴とする光情報記録媒体作製用スパッタ装置。In an optical recording medium production sputtering apparatus for producing an optical information recording medium by forming a film on a disk substrate,
A substrate holder for holding a disk substrate has a fixed portion and a movable portion, and the movable portion has a contact surface of a certain area that comes into contact with the disk substrate to be held, and the disk substrate is held along the fitting hole of the fixed portion. When moving to a direction orthogonal to the disk surface and depositing on the disk substrate, the contact surface of the movable part is brought into contact with the back surface of the disk substrate, and the entire information recording area of the disk substrate is contacted with the contact surface of the fixed part and the movable part. The contact surface of the movable part is moved along the fitting hole of the fixed part and separated from the back surface of the disk substrate when attaching and detaching the disk substrate. apparatus.

上記固定部の嵌合穴に導通するガス導入口を設け、可動部の接触面をディスク基板の裏面から離すときに、ガス導入口が固定部の嵌合穴に開口する位置まで可動部を移動する請求項１記載の光情報記録媒体作製用スパッタ装置。The gas inlet is connected to the fitting hole of the fixed part, and the movable part is moved to the position where the gas inlet opens to the fitting hole of the fixed part when the contact surface of the movable part is separated from the back surface of the disk substrate. The sputtering apparatus for producing an optical information recording medium according to claim 1.

上記可動部と固定部の接触面の少なくとも一方の面に潤滑処理を施した請求項１又は２記載の光情報記録媒体作製用スパッタ装置。The sputtering apparatus for producing an optical information recording medium according to claim 1 or 2, wherein at least one of the contact surfaces of the movable part and the fixed part is lubricated.

上記可動部と固定部の接触面の少なくとも一方の面を潤滑性を有する材料で形成した請求項１又は２記載の光情報記録媒体作製用スパッタ装置。3. The sputtering apparatus for producing an optical information recording medium according to claim 1, wherein at least one of the contact surfaces of the movable portion and the fixed portion is formed of a material having lubricity.

上記可動部と固定部のディスク基板との接触面に潤滑処理を施した請求項１又は２記載の光情報記録媒体作製用スパッタ装置。3. The sputtering apparatus for producing an optical information recording medium according to claim 1, wherein a lubrication treatment is applied to a contact surface between the movable part and the disk substrate of the fixed part.

上記可動部と固定部のディスク基板との接触面を潤滑性を有する材料で形成した請求項１又は２記載の光情報記録媒体作製用スパッタ装置。The sputtering apparatus for producing an optical information recording medium according to claim 1 or 2, wherein a contact surface between the movable part and the disk substrate of the fixed part is formed of a material having lubricity.

上記可動部と固定部を潤滑性を有する材料で形成した請求項１又は２記載の光情報記録媒体作製用スパッタ装置。3. The sputtering apparatus for producing an optical information recording medium according to claim 1, wherein the movable part and the fixed part are formed of a material having lubricity.

ディスク基板に成膜して情報記録層を作製する光記録媒体の製造方法において、In a manufacturing method of an optical recording medium for forming an information recording layer by forming a film on a disk substrate,
ディスク基板を保持する接触面に対して直交する方向に設けた嵌合穴に移動自在に取り付けた可動部を有する固定部の接触面にディスク基板を保持し、可動部 The disk substrate is held on the contact surface of the fixed portion having a movable portion movably attached to a fitting hole provided in a direction orthogonal to the contact surface holding the disk substrate, and the movable portion の接触面をディスク基板の裏面に接触させてディスク基板の情報記録領域全面を固定部の接触面と可動部の接触面で密着保持した状態でディスク基板に成膜して情報記録層を作製し、ディスク基板に情報記録層を作製した後、可動部の接触面を固定部の嵌合穴に沿って移動しディスク基板の裏面から離してディスク基板を固定部から取り外すことを特徴とする光記録媒体の製造方法。The information recording layer is formed by forming a film on the disk substrate with the contact surface of the disk substrate in contact with the back surface of the disk substrate and keeping the entire information recording area of the disk substrate in close contact with the contact surface of the fixed portion and the contact surface of the movable portion. The optical recording is characterized in that after the information recording layer is formed on the disc substrate, the contact surface of the movable portion is moved along the fitting hole of the fixed portion, and the disc substrate is detached from the fixed portion away from the back surface of the disc substrate. A method for producing a medium.