JP3708593B2 - Liquid crystal display device and manufacturing method thereof - Google Patents

Liquid crystal display device and manufacturing method thereof Download PDF

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Publication number
JP3708593B2
JP3708593B2 JP22896995A JP22896995A JP3708593B2 JP 3708593 B2 JP3708593 B2 JP 3708593B2 JP 22896995 A JP22896995 A JP 22896995A JP 22896995 A JP22896995 A JP 22896995A JP 3708593 B2 JP3708593 B2 JP 3708593B2
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Japan
Prior art keywords
liquid crystal
substrate
columnar spacer
electrode
transfer
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JP22896995A
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JPH0973099A (en
Inventor
大輔 宮崎
亜希子 上埜
昭一 倉内
輝行 緑川
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Toshiba Corp
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Toshiba Corp
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Priority to JP22896995A priority Critical patent/JP3708593B2/en
Priority to TW085110746A priority patent/TW373098B/en
Priority to US08/708,485 priority patent/US5978061A/en
Priority to KR1019960039204A priority patent/KR100227692B1/en
Publication of JPH0973099A publication Critical patent/JPH0973099A/en
Priority to US09/388,945 priority patent/US6445437B1/en
Priority to US10/196,142 priority patent/US6888608B2/en
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Description

【０００１】
【発明の属する技術分野】
本発明は液晶表示装置に係り、特に上下基板間のトランスファに関する。
【０００２】
【従来の技術】
液晶表示装置は、上下２枚の電極基板間に液晶が封入されており、上下基板の電極間に電圧を与えて液晶の動きを制御し表示を行う。上下基板の電極に電圧を印加するために、従来は電源を片側の基板のみに接続させ、もう一方の基板に電圧を印加するためにトランスファーとして銀ペースト等をディスペンサー等で画面周辺部に配置し、このトランスファーで２枚の基板を電気的に接続している。
【０００３】
【発明が解決しようとする課題】
しかしながら、前述したトランスファー形成工程においては設備や人件費に大きなコストがかかっていた。また、トランスファーを画面周辺部に配置するための場所をトランスファー形成工程のマージンも含め、液晶セルの周辺非表示領域にある程度の面積（１ｍｍ２程度以上）をもって形成する必要があり、液晶セルの周辺非表示領域を小さくできなかった。またトランスファー材料をディスペンサー等に充填する際に混入した不純物により、液晶材料や配向膜を汚染し、表示不良が発生することがあり、歩留まりを低下させる原因となっていた。本発明は上記問題点に鑑み、歩留まりを高くし低コストで、かつ表示性能が良い液晶表示装置を提供することを目的とする。
【０００４】
【課題を解決するための手段】
本発明の構成及び製造方法によれば、基板に形成された柱状スペーサーに電極を被覆し、これが引き出し電極と接触し、さらに上下基板間のトランスファーを担うことで、従来のトランスファーを形成する工程を省略することができる。また、従来、トランスファー材料をディスペンサーに充填する際に混入した不純物のために液晶材料や配向膜が汚染されて表示不良が発生することを防止でき、歩留まりを向上させることができる。
【０００５】
【発明の実施の形態】
以下に、本発明の実施例を図面を用いて詳細に説明する。
図１は、本実施例の液晶表示装置の断面図であり、下側基板である薄膜トランジスタ（ＴＦＴ：Ｔｈｉｎ Ｆｉｌｍ Ｔｒａｎｓｉｓｔｏｒ）アレイ基板１と上側基板である対向基板２とが平行に配置され液晶３を挟持し、シール材４によって封着されている。
【０００６】
まず、アレイ基板１は、厚さ１．１ｍｍのガラス基板５にスイッチング素子としてＴＦＴ６が形成され、そのＴＦＴ６に画素電極７が接続されている。そして最上層に配向膜８が形成されている。また、アレイ基板１には、対向基板２に電力を供給するための引き出し電極９が形成されている。
【０００７】
次に対向基板２は、厚さ１．１ｍｍのガラス基板１０上に黒色の遮光層１１と遮光層１１の間隙にＲ、Ｇ、Ｂの３色の着色層１２（Ｒ）、１２（Ｇ）、１２（Ｂ）が形成されている。さらに対向基板２には、柱状スペーサー１３が表示領域（シール材に囲まれた領域）内外に作り込まれている。柱状スペーサー１３は遮光層１１上に形成されており、所定の柱状スペーサー１３は上下基板間のトランスファの役割を担っている。このトランスファーを担う柱状スペーサーは全基板上に１０ないし１５本程度である。さらに、対向基板２には全面に共通電極１４が形成されており、そして表示領域内には最上層に配向膜１５が形成されている。また、トランスファとなる柱状スペーサー１３の頂上部は共通電極１４がむき出しの状態でアレイ基板１の引き出し電極９と電気的に接触している。
【０００８】
本発明の第１の基板は本実施例中で対向基板２に対応し、同様に第２の基板はアレイ基板１に、第１の透明電極は共通電極１４に、第２の透明電極は画素電極７に、第３の電極は共通電極１４に、それぞれ対応する。
【０００９】
次に本実施例の液晶表示装置の製造工程を説明する。
まず、対向基板２の製造工程を説明する。厚さ１．１ｍｍのガラス基板１０上に感光性の黒色樹脂をスピンナー等を用いて塗布し、約９０℃で１０分乾燥させた後、所定のパターン形状のフォトマスクを用いて露光した後、アルカリ性の溶液にて現像を行い、２００℃で６０分の焼成をして膜厚約２．０μｍの遮光層１１を形成する。
【００１０】
次に、赤色の顔料を分散させた紫外線硬化型アクリル樹脂をスピンナーにて塗布し、赤を着色したい部分に紫外線が照射されるようなフォトマスクを介して紫外線を照射し、例えばＫＯＨの１％水溶液で約１０秒間現像し、赤の着色層１２（Ｒ）を形成する。同様に緑、青の着色層１２（Ｇ）、１２（Ｂ）を繰り返し形成し、それぞれ２３０℃で６０分焼成する。このとき赤、緑、青の着色層１２（Ｒ）、１２（Ｇ）、１２（Ｂ）の膜厚はそれぞれ１．５μｍとした。
【００１１】
次に顔料の入っていない紫外線硬化型アクリル樹脂をスピンナーで全面に塗布し、所定の位置に柱状スペーサ１３が形成されるようなフォトマスクを介して３６５ｎｍの波長で、１００ｍＪ／ｃｍ2の紫外線を照射し、ＫＯＨの１％水溶液で３０秒間現像して、約４μｍの高さの柱状スペーサー１３を形成する。このような形成方法によれば柱状スペーサー１３をテーパー状に形成することができる。このとき表示領域内に形成される柱状スペーサー１３は、遮光層１１上にくるように形成する。このとき、後のラビング処理で柱状スペーサー１３が障害になってラビングの陰の領域ができてしまう。そこで、その陰の部分が遮光層１１の領域内でおさまり、表示に影響を及ぼさない位置にくるように柱状スペーサー１３の配置を考慮する必要がある。
【００１２】
また、トランスファーを担うものはアレイ基板１と組み合わせたときに、引き出し電極９に接触するような位置に形成する。
また、柱状スペーサー１３は着色層１２（Ｒ）、１２（Ｇ）、１２（Ｂ）を使って同時に形成してもかまわない。着色層１２（Ｒ）、１２（Ｇ）、１２（Ｂ）を形成する際のフォトマスクを柱状スペーサー１３も同時に形成できるようなパターンのものを使う。厚みに応じて、複数色の着色層を重ねて形成してももちろんかまわない。このように着色層１２と同時に柱状スペーサー１３を形成すれば、スペーサーを形成する工程を１つ減らすことができる。
【００１３】
また、トランスファーとなる柱状スペーサー１３は図１のように表示領域内に形成しても良いし、表示領域外に形成してもかまわない。
その後、共通電極１４としてＩＴＯ（Ｉｎｄｉｕｍ Ｔｉｎ Ｏｘｉｄｅ）膜をスパッタ法にて１５００オングストロームの厚さに形成する。ここで、柱状スペーサー１３がテーパー状に形成されているので、ＩＴＯ膜を柱状スペーサー１３上に均一に被覆することができる。
【００１４】
この上に、例えばポリイミドを形成しラビング処理を行って配向膜１５を形成し、対向基板２が完成する。
次にアレイ基板１の製造方法は、厚さ１．１ｍｍのガラス基板５上に通常のＴＦＴ６を形成する工程と同様に成膜とパターニングを繰り返す。ＭｏＷ（モリブデン・タングステン）、あるいはＭｏＴａ（モリブデン・タンタル）等から成るゲート線２０、図示しない補助容量線、及び補助容量線と一体のトランスファ用の引き出し電極９を形成し、そのうえ全面にＳｉＯXをプラズマＣＶＤ法により、４０００オングストロームの厚さに堆積し、ゲート絶縁膜２１を形成する。
【００１５】
その上に、ａ−Ｓｉ（アモルファスシリコン）から成る半導体層２２をプラズマＣＶＤ法により形成し所定の形状にパターニングする。
さらに、ｎ+ａ−Ｓｉオーミックコンタクト層を介して、Ｍｏ／Ａｌ／Ｍｏから成る電極を形成し、所望の形状にパターニングすることによってソース電極２３、ドレイン電極２４、図示しない信号線を形成する。
【００１６】
次に、透明電極であるＩＴＯをソース電極２３に接触させるようにパターニングして画素電極７を形成する。最後に、ポリイミド等を形成し、ラビング処理を行うことにより配向膜８を形成するが、対向基板２側のトランスファを担う柱状スペーサー１３と接触する領域は配向膜８を被覆せず、引き出し電極９を露出させる。引き出し電極９上には図１に示すようにＭｏ／Ａｌ／Ｍｏ等の電極と同一材料を形成しても良い。このようにすると高さの調節が可能になるなどの利点がある。
【００１７】
この後、対向基板２の配向膜１５の周辺に沿って注入口の部分以外にシール材４を印刷する。
次にアレイ基板１と、対向基板２の配向膜８がそれぞれ対向し、かつラビング方向が９０°の角度をなすように配置させ、加熱することでシール材４を硬化させ、貼り合わせる。
【００１８】
次に、真空中に空セルを置き、注入口に液晶材料を浸した状態で徐々に真空状態から大気圧に戻すことによって液晶３を注入することができる。
このようにして本実施例における所望の液晶表示装置が得られる。
【００１９】
本実施例の構成及び製造方法によれば上下基板間のトランスファを形成する工程を削除することができる。
なお、本実施例は対向基板側に遮光層が形成された構造であるが、本発明はアレイ基板側に遮光層が形成された構造の液晶表示装置にも適用できる。この場合、柱状スペーサーが形成されている基板と、遮光層が形成されている基板とが別々になることになる。
【００２０】
また、本実施例は、ＴＦＴアレイ基板を用いたアクティブマトリクス型液晶表示装置であるが、ＴＦＴの構造は本実施例のように逆スタガ型のみに限るものでなく、さらには上下基板にストライプ状の電極を備えたシンプルマトリクス型液晶表示装置にも適用可能である。
このように、本実施例は多くの変更及び修正をつけ加えるられることは勿論である。
【００２１】
【発明の効果】
本発明によれば、柱状スペーサー上に透明電極を被覆し、所定の柱状スペーサーが上下基板間のトランスファを兼ねることで、トランスファ形成工程を省略できる。すなわち、トランスファ形成工程における設備や人件費などの大幅なコスト低減、また従来のトランスファ形成工程における作業時の不純物混入がなくなり、表示不良による歩留まりの悪さを改善することができる。
【図面の簡単な説明】
【図１】本発明の一実施例における液晶表示装置であり、トランスファーを担う柱状スペーサーを示す断面図である。
【図２】本発明の一実施例におけるトランスファーを担わない柱状スペーサーを示す断面図である。
【図３】本発明の一実施例におけるトランスファーを担う柱状スペーサーであり、複数の着色層を積層して形成されている柱状スペーサーを示す図である。
【符号の説明】
１…アレイ基板
２…対向基板
３…液晶
４…シール材
６…ＴＦＴ
７…画素電極
８、１５…配向膜
９…引き出し電極
１１…遮光層
１２…着色層
１３…柱状スペーサー
１４…共通電極[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a liquid crystal display device, and more particularly to transfer between upper and lower substrates.
[0002]
[Prior art]
In the liquid crystal display device, liquid crystal is sealed between two upper and lower electrode substrates, and a voltage is applied between the electrodes on the upper and lower substrates to control the movement of the liquid crystal and perform display. In order to apply a voltage to the electrodes on the upper and lower substrates, a power source is conventionally connected to only one substrate, and silver paste or the like is placed around the screen with a dispenser as a transfer to apply a voltage to the other substrate. The two substrates are electrically connected by this transfer.
[0003]
[Problems to be solved by the invention]
However, in the transfer formation process described above, equipment and labor costs are very expensive. Further, it is necessary to form a place for arranging the transfer in the periphery of the screen including a margin in the transfer forming process in a non-display area around the liquid crystal cell with a certain area (about 1 mm 2 or more). The display area could not be reduced. In addition, impurities mixed when the transfer material is filled in a dispenser or the like may contaminate the liquid crystal material or the alignment film, resulting in a display failure, which causes a decrease in yield. In view of the above problems, an object of the present invention is to provide a liquid crystal display device with high yield, low cost, and good display performance.
[0004]
[Means for Solving the Problems]
According to the configuration and the manufacturing method of the present invention, the step of forming a conventional transfer is performed by covering a columnar spacer formed on a substrate with an electrode, which is in contact with the extraction electrode, and further responsible for transfer between the upper and lower substrates. Can be omitted. Conventionally, it is possible to prevent display defects due to contamination of the liquid crystal material and the alignment film due to impurities mixed when the transfer material is filled in the dispenser, and the yield can be improved.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below in detail with reference to the drawings.
FIG. 1 is a cross-sectional view of a liquid crystal display device according to the present embodiment. A thin film transistor (TFT) array substrate 1 as a lower substrate and a counter substrate 2 as an upper substrate are arranged in parallel to form a liquid crystal 3. It is sandwiched and sealed with a sealing material 4.
[0006]
First, the array substrate 1 has a TFT 6 formed as a switching element on a glass substrate 5 having a thickness of 1.1 mm, and a pixel electrode 7 is connected to the TFT 6. An alignment film 8 is formed as the uppermost layer. In addition, an extraction electrode 9 for supplying power to the counter substrate 2 is formed on the array substrate 1.
[0007]
Next, the counter substrate 2 is formed on a glass substrate 10 having a thickness of 1.1 mm and colored layers 12 (R) and 12 (G) of three colors R, G, and B in the gap between the black light shielding layer 11 and the light shielding layer 11. , 12 (B) are formed. Further, columnar spacers 13 are formed on the counter substrate 2 inside and outside the display area (area surrounded by the sealing material). The columnar spacers 13 are formed on the light shielding layer 11, and the predetermined columnar spacers 13 serve as a transfer between the upper and lower substrates. There are about 10 to 15 columnar spacers responsible for this transfer on all substrates. Further, a common electrode 14 is formed on the entire surface of the counter substrate 2, and an alignment film 15 is formed on the uppermost layer in the display area. Further, the top of the columnar spacer 13 serving as a transfer is in electrical contact with the extraction electrode 9 of the array substrate 1 with the common electrode 14 exposed.
[0008]
The first substrate of the present invention corresponds to the counter substrate 2 in this embodiment. Similarly, the second substrate is the array substrate 1, the first transparent electrode is the common electrode 14, and the second transparent electrode is the pixel. The third electrode corresponds to the electrode 7, and the third electrode corresponds to the common electrode 14.
[0009]
Next, the manufacturing process of the liquid crystal display device of the present embodiment will be described.
First, the manufacturing process of the counter substrate 2 will be described. A photosensitive black resin is applied onto a glass substrate 10 having a thickness of 1.1 mm using a spinner or the like, dried at about 90 ° C. for 10 minutes, and then exposed using a photomask having a predetermined pattern shape. Development is performed with an alkaline solution and baking is performed at 200 ° C. for 60 minutes to form the light-shielding layer 11 having a thickness of about 2.0 μm.
[0010]
Next, an ultraviolet curable acrylic resin in which a red pigment is dispersed is applied with a spinner, and ultraviolet rays are irradiated through a photomask that irradiates the portion to be colored red with ultraviolet rays, for example, 1% of KOH. Development is performed with an aqueous solution for about 10 seconds to form a red colored layer 12 (R). Similarly, green and blue colored layers 12 (G) and 12 (B) are repeatedly formed and fired at 230 ° C. for 60 minutes, respectively. At this time, the film thicknesses of the red, green, and blue colored layers 12 (R), 12 (G), and 12 (B) were 1.5 μm, respectively.
[0011]
Next, an ultraviolet curable acrylic resin containing no pigment is applied to the entire surface with a spinner, and 100 mJ / cm 2 of ultraviolet light is applied at a wavelength of 365 nm through a photomask that forms columnar spacers 13 at predetermined positions. Irradiate and develop with a 1% aqueous solution of KOH for 30 seconds to form columnar spacers 13 having a height of about 4 μm. According to such a forming method, the columnar spacer 13 can be formed in a tapered shape. At this time, the columnar spacers 13 formed in the display area are formed on the light shielding layer 11. At this time, the columnar spacer 13 becomes an obstacle in the subsequent rubbing process, and an area behind the rubbing is formed. Therefore, it is necessary to consider the arrangement of the columnar spacers 13 so that the shaded portion is settled in the region of the light shielding layer 11 and is positioned so as not to affect the display.
[0012]
In addition, the one that bears the transfer is formed at a position that comes into contact with the extraction electrode 9 when combined with the array substrate 1.
The columnar spacers 13 may be formed simultaneously using the colored layers 12 (R), 12 (G), and 12 (B). A photomask for forming the colored layers 12 (R), 12 (G), and 12 (B) having a pattern that can simultaneously form the columnar spacers 13 is used. Of course, a plurality of colored layers may be stacked depending on the thickness. If the columnar spacers 13 are formed simultaneously with the colored layer 12 in this way, the number of steps for forming the spacers can be reduced by one.
[0013]
Further, the columnar spacer 13 serving as a transfer may be formed in the display area as shown in FIG. 1 or may be formed outside the display area.
Thereafter, an ITO (Indium Tin Oxide) film is formed as the common electrode 14 to a thickness of 1500 angstrom by sputtering. Here, since the columnar spacers 13 are formed in a tapered shape, the ITO film can be uniformly coated on the columnar spacers 13.
[0014]
On this, for example, polyimide is formed and a rubbing process is performed to form an alignment film 15, thereby completing the counter substrate 2.
Next, in the manufacturing method of the array substrate 1, film formation and patterning are repeated in the same manner as the step of forming the normal TFT 6 on the glass substrate 5 having a thickness of 1.1 mm. A gate line 20 made of MoW (molybdenum / tungsten) or MoTa (molybdenum / tantalum), an unillustrated auxiliary capacitance line, and a transfer lead electrode 9 integral with the auxiliary capacitance line are formed, and SiO x is formed on the entire surface. A gate insulating film 21 is formed by plasma CVD to a thickness of 4000 angstroms.
[0015]
On top of this, a semiconductor layer 22 made of a-Si (amorphous silicon) is formed by plasma CVD and patterned into a predetermined shape.
Further, an electrode made of Mo / Al / Mo is formed through an n + a-Si ohmic contact layer, and patterned into a desired shape to form a source electrode 23, a drain electrode 24, and a signal line (not shown).
[0016]
Next, the pixel electrode 7 is formed by patterning ITO, which is a transparent electrode, in contact with the source electrode 23. Finally, polyimide or the like is formed and the alignment film 8 is formed by performing a rubbing process. However, the region in contact with the columnar spacer 13 that bears the transfer on the counter substrate 2 side does not cover the alignment film 8, and the extraction electrode 9 To expose. On the extraction electrode 9, as shown in FIG. 1, the same material as the electrode such as Mo / Al / Mo may be formed. This has the advantage that the height can be adjusted.
[0017]
Thereafter, the sealing material 4 is printed along the periphery of the alignment film 15 of the counter substrate 2 except for the injection port.
Next, the array substrate 1 and the alignment film 8 of the counter substrate 2 are opposed to each other and arranged so that the rubbing direction forms an angle of 90 °, and the sealing material 4 is cured and bonded by heating.
[0018]
Next, the liquid crystal 3 can be injected by placing an empty cell in a vacuum and gradually returning the state from the vacuum state to the atmospheric pressure with the liquid crystal material immersed in the injection port.
In this way, the desired liquid crystal display device in this embodiment can be obtained.
[0019]
According to the configuration and the manufacturing method of the present embodiment, the step of forming the transfer between the upper and lower substrates can be eliminated.
Although this embodiment has a structure in which a light shielding layer is formed on the counter substrate side, the present invention can also be applied to a liquid crystal display device having a structure in which a light shielding layer is formed on the array substrate side. In this case, the substrate on which the columnar spacer is formed and the substrate on which the light shielding layer is formed are separated.
[0020]
In addition, this embodiment is an active matrix type liquid crystal display device using a TFT array substrate, but the structure of the TFT is not limited to the reverse stagger type as in this embodiment. The present invention is also applicable to a simple matrix type liquid crystal display device having the above electrodes.
As described above, it is needless to say that the present embodiment can add many changes and modifications.
[0021]
【The invention's effect】
According to the present invention, a transparent electrode is coated on a columnar spacer, and the predetermined columnar spacer also serves as a transfer between the upper and lower substrates, whereby the transfer forming step can be omitted. That is, a significant cost reduction such as equipment and labor costs in the transfer forming process is eliminated, and impurities are not mixed at the time of work in the conventional transfer forming process, so that poor yield due to display defects can be improved.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing a columnar spacer that bears a transfer, which is a liquid crystal display device according to an embodiment of the present invention.
FIG. 2 is a cross-sectional view showing a columnar spacer that does not bear transfer in one embodiment of the present invention.
FIG. 3 is a view showing a columnar spacer which is a columnar spacer responsible for transfer in one embodiment of the present invention and is formed by laminating a plurality of colored layers.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Array substrate 2 ... Opposite substrate 3 ... Liquid crystal 4 ... Sealing material 6 ... TFT
7 ... Pixel electrodes 8, 15 ... Alignment film 9 ... Lead electrode 11 ... Light shielding layer 12 ... Colored layer 13 ... Columnar spacer 14 ... Common electrode

Claims (6)

第１の基板と第２の基板とに液晶が挟持され、
前記第１の基板には、前記第１の基板と前記第２の基板との間隔を保つ複数の柱状スペーサーと、前記液晶に電圧を与える第１の透明電極とを備え、
前記第２の基板には、前記液晶に電圧を与える第２の透明電極と、電源から電力を供給する引き出し電極とを備えた液晶表示装置において、
複数の前記柱状スペーサーは、配向膜に覆われた柱状スペーサーと、前記引き出し電極に対向して配置され前記第１の透明電極と同一かつ一体、もしくは電気的に接続された第３の電極が被覆された柱状スペーサーを含み、前記引き出し電極と前記第３の電極と前記第１の透明電極とが電気的に接続されていることを特徴とする液晶表示装置。Liquid crystal is sandwiched between the first substrate and the second substrate,
The first substrate includes a plurality of columnar spacers that maintain a distance between the first substrate and the second substrate, and a first transparent electrode that applies a voltage to the liquid crystal,
In the liquid crystal display device, the second substrate includes a second transparent electrode that applies a voltage to the liquid crystal, and an extraction electrode that supplies power from a power source.
The plurality of columnar spacers are covered with a columnar spacer covered with an alignment film, and a third electrode disposed opposite to the extraction electrode and the same, integral or electrically connected with the first transparent electrode. A liquid crystal display device comprising a columnar spacer, wherein the lead electrode, the third electrode, and the first transparent electrode are electrically connected. 前記柱状スペーサーは樹脂層からなることを特徴とする請求項１記載の液晶表示装置。The liquid crystal display device according to claim 1, wherein the columnar spacer is characterized by comprising a resin layer. 前記第１の基板には複数色の着色層が形成されており、前記柱状スペーサーは前記着色層が複数積層されてなることを特徴とする請求項１または２に記載の液晶表示装置。Wherein the first substrate and the colored layer of a plurality of colors are formed, the liquid crystal display device according to claim 1 or 2, wherein the columnar spacer is characterized in that the colored layer is formed by stacking a plurality. 前記柱状スペーサーは、テーパー状になっていることを特長とする請求項１ないし３のいずれかに記載の液晶表示装置。The columnar spacer, the liquid crystal display device according to any one of claims 1 to features that tapered 3. 第１の基板と第２の基板とに液晶が挟持され、前記第１の基板には、前記第１の基板と前記第２の基板との間隔を保つ複数の柱状スペーサーと、前記液晶に電圧を与える第１の透明電極とを備え、前記第２の基板には、前記液晶に電圧を与える第２の透明電極と、電源から電力を供給する引き出し電極とを備えた液晶表示装置の製造方法であって、
前記第１の基板の製造工程は、
遮光膜を形成する工程と、
着色層を形成する工程と、
トランスファーを担う柱状スペーサーとトランスファーを担わない柱状スペーサーを形成する工程と、
前記両柱状スペーサー上を少なくとも含んで前記第 1 の透明電極を形成する工程と、
前記トランスファーを担う柱状スペーサーを除き配向膜を形成する工程と、
前記トランスファーを担う柱状スペーサーを介して前記第 1 の透明電極と前記引き出し電極を接続する工程と、を含むことを特徴とする液晶表示装置の製造方法。A liquid crystal is sandwiched between a first substrate and a second substrate, the first substrate includes a plurality of columnar spacers that maintain a distance between the first substrate and the second substrate, and a voltage applied to the liquid crystal. And a second transparent electrode for applying a voltage to the liquid crystal and a lead electrode for supplying electric power from a power source. Because
The manufacturing process of the first substrate includes:
Forming a light shielding film;
Forming a colored layer;
A step of forming a columnar spacer that bears the transfer and a columnar spacer that does not bear the transfer;
And forming the first transparent electrode comprises at least the upper two columnar spacers,
Forming an alignment film excluding the columnar spacer responsible for the transfer ; and
Method of manufacturing a liquid crystal display device according to feature in that it comprises a step of connecting the lead electrode and the first transparent electrode through a columnar spacer responsible for the transfer. 第１の基板と第２の基板とに液晶が挟持され、前記第１の基板には、前記第１の基板と前記第２の基板との間隔を保つ複数の柱状スペーサーと、前記液晶に電圧を与える第１の透明電極とを備え、前記第２の基板には、前記液晶に電圧を与える第２の透明電極と、電源から電力を供給する引き出し電極とを備えた液晶表示装置の製造方法であって、
前記第１の基板の製造工程は、
遮光膜を形成する工程と、
着色層と同材質かつ同時にトランスファーを担う柱状スペーサーとトランスファーを担わない柱状スペーサーを形成する工程と、
前記両柱状スペーサー上を少なくとも含んで前記第 1 の透明電極を形成する工程と、
前記トランスファーを担う柱状スペーサーを除き配向膜を形成する工程と、
前記トランスファーを担う柱状スペーサーを介して前記第 1 の透明電極と前記引き出し電極を接続する工程と、を含むことを特徴とする液晶表示装置の製造方法。A liquid crystal is sandwiched between a first substrate and a second substrate, the first substrate includes a plurality of columnar spacers that maintain a distance between the first substrate and the second substrate, and a voltage applied to the liquid crystal. And a second transparent electrode for applying a voltage to the liquid crystal and a lead electrode for supplying electric power from a power source. Because
The manufacturing process of the first substrate includes:
Forming a light shielding film;
Forming a columnar spacer that bears the same material as the colored layer and at the same time, and a columnar spacer that does not bear the transfer;
And forming the first transparent electrode comprises at least the upper two columnar spacers,
Forming an alignment film excluding the columnar spacer responsible for the transfer ; and
Method of manufacturing a liquid crystal display device according to feature in that it comprises a step of connecting the lead electrode and the first transparent electrode through a columnar spacer responsible for the transfer.
JP22896995A 1995-09-06 1995-09-06 Liquid crystal display device and manufacturing method thereof Expired - Lifetime JP3708593B2 (en)

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TW085110746A TW373098B (en) 1995-09-06 1996-09-03 Liquid crystal exposure component and its fabricating method
US08/708,485 US5978061A (en) 1995-09-06 1996-09-05 Liquid crystal display device
KR1019960039204A KR100227692B1 (en) 1995-09-06 1996-09-06 Lcd and its fabrication method
US09/388,945 US6445437B1 (en) 1995-09-06 1999-09-02 Liquid crystal display device
US10/196,142 US6888608B2 (en) 1995-09-06 2002-07-17 Liquid crystal display device

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