JP3553315B2 - シラン化ケイ酸、その製法及びそれを含有する低い降伏価を有する低粘度ポリマー系 - Google Patents
シラン化ケイ酸、その製法及びそれを含有する低い降伏価を有する低粘度ポリマー系 Download PDFInfo
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- JP3553315B2 JP3553315B2 JP10693797A JP10693797A JP3553315B2 JP 3553315 B2 JP3553315 B2 JP 3553315B2 JP 10693797 A JP10693797 A JP 10693797A JP 10693797 A JP10693797 A JP 10693797A JP 3553315 B2 JP3553315 B2 JP 3553315B2
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- Prior art keywords
- silicic acid
- low
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- system containing
- yield value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/42—Gloss-reducing agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/19—Oil-absorption capacity, e.g. DBP values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
- C01P2006/82—Compositional purity water content
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2200/00—Chemical nature of materials in mouldable or extrudable form for sealing or packing joints or covers
- C09K2200/02—Inorganic compounds
- C09K2200/0243—Silica-rich compounds, e.g. silicates, cement, glass
- C09K2200/0247—Silica
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Paints Or Removers (AREA)
Description
【発明の属する技術分野】
本発明は、低粘稠化性シラン化ケイ酸、その製法及びその使用に関する。
【0002】
【発明が解決しようとする課題】
本発明の課題は、低粘稠化性シラン化ケイ酸、その製法を発見することであった。
【0003】
【課題を解決するための手段】
本発明の目的は、次の物理学的−化学的特性を有するシラン化ケイ酸である:
比表面積(m2/g) 80〜400、
一次粒度(nm) 7〜40、
タップ密度(g/l) 50〜300、
pH 3〜10、
炭素含有率(%) 0.1〜15、
DBP−数(%) <200。
【0004】
本発明のもう1つの目的は、低粘稠化性シラン化ケイ酸の製法であり、それは、適当な混合容器中のケイ酸に、激しい混合下に、場合により、先ず水又は希酸を、引き続き、表面変性反応薬又は数種の表面変性反応薬からなる混合物を噴霧し、15〜30分、後撹拌し、100〜400℃の温度で、1〜6時間熱処理し、引き続き、疎水性シラン化ケイ酸を、機械的作用により(例えば、ボールミル中で)破壊/圧縮し、かつミル(例えば、エアジェットミル、ピンディスクミル)中で後粉砕することを特徴とする。
【0005】
ケイ酸としては、有利に、SiCl4の炎内加水分解による高熱分解で製造されたケイ酸を使用することができる。
【0006】
表面変性反応薬としては、例えば、ヘキサメチルジシラザンを使用することができる。
【0007】
本発明のもう1つの目的は、本発明の低粘稠化性シラン化ケイ酸を、低い降伏価を有する低粘度のポリマー系、例えば、1−及び2−成分過酸化物縮合架橋性シリコーンゴム材料及び付加架橋性シリコーンゴム材料、接着剤、成形体、充填物等の製造のために使用すること、例えば、ラッカー、シート中でのつや消し剤として、フリーフロー剤(例えば、SAP、消火粉末)として、ケーブルゲル(Kabelgelen)の製造のために、液体プラスチック系及び反応樹脂(例えば、合成大理石、ポリマーコンクリート、義歯)中での抗沈降剤として、研磨剤及び/又は擦り磨き剤として使用することである。
【0008】
本発明の低粘稠化性シラン化ケイ酸は、次の利点を有する:
合成ケイ酸で強化されるポリマー系中で、初めて非常に高い充填率で、良好な機械的強度が達成される。これは、公知のケイ酸では、相応する充填物、成型物、複製物等の製造/コンパウンドの際の強化ケイ酸のその場の疎水によってのみ可能であった。この方法は、非常に時間がかかり、かつエネルギーを浪費する。
【0009】
本発明のケイ酸は、その僅かな粘稠化作用及び低い降伏価により、例えば、高い充填率及びそれによる良好な機械的強度を可能にする。前記の経費のかかるコンパウンドプロセスは、完全に除くことができる。
【0010】
本発明の方法は、連続的な方法実施に基づき、製品品質に乱れが生ずることが減るという利点を有する。
【0011】
【実施例】
Aerosil 200を、水4.3部及びHMDS(ヘキサメチルジシラザン)18.5部と混合し、かつ140℃に加熱する。引き続き、疎水性にシラン化されたケイ酸を、連続的に処理する垂直ボールミルで、約250g/lまで圧縮した。この後、このケイ酸を、エアジェットミルを用いて後粉砕する。
【0012】
得られたケイ酸は、次の特性を有する:
【0013】
【表1】
【0014】
Claims (1)
- 次の物理学的−化学的特性を有し、高熱分解で製造されたケイ酸を表面変性後に破壊して製造したシラン化ケイ酸:
比表面積(m2/g) 80〜400、
一次粒度(nm) 7〜40、
タップ密度(g/l) 50〜300、
pH 3〜10、
炭素含有率(%) 0.1〜15、
DBP−数(%) <200。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19616781A DE19616781A1 (de) | 1996-04-26 | 1996-04-26 | Silanisierte Kieselsäure |
DE19616781.7 | 1996-04-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH1087317A JPH1087317A (ja) | 1998-04-07 |
JP3553315B2 true JP3553315B2 (ja) | 2004-08-11 |
Family
ID=7792574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10693797A Expired - Lifetime JP3553315B2 (ja) | 1996-04-26 | 1997-04-24 | シラン化ケイ酸、その製法及びそれを含有する低い降伏価を有する低粘度ポリマー系 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0808880B1 (ja) |
JP (1) | JP3553315B2 (ja) |
KR (1) | KR100260325B1 (ja) |
CN (1) | CN1083397C (ja) |
CA (1) | CA2203726C (ja) |
DE (2) | DE19616781A1 (ja) |
Families Citing this family (49)
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EP0544902B1 (en) * | 1990-03-22 | 1998-05-13 | Fanuc Ltd. | Automatic mold exchange type injection molding machine |
DE19800022A1 (de) * | 1998-01-02 | 1999-07-08 | Huels Silicone Gmbh | Verfahren zur Herstellung von Siliconpolymer-Feststoff-Mischungen für fließfähige RTV2-Silicon-Massen mit niedriger Fließgrenze |
DE19929845A1 (de) | 1999-06-29 | 2001-01-11 | Degussa | Oberflächenmodifiziertes Titandioxid |
GB2357497A (en) | 1999-12-22 | 2001-06-27 | Degussa | Hydrophobic silica |
ATE496098T1 (de) | 2000-10-21 | 2011-02-15 | Evonik Degussa Gmbh | Strahlenhärtende lacksysteme |
EP1199336B1 (de) * | 2000-10-21 | 2014-01-15 | Evonik Degussa GmbH | Funktionalisierte, strukturmodifizierte Kieselsäuren |
EP1199335B1 (de) * | 2000-10-21 | 2010-12-22 | Evonik Degussa GmbH | Funktionalisierte Kieselsäuren |
DE10105750A1 (de) * | 2001-02-08 | 2002-10-10 | Degussa | Fällungskieselsäuren mit enger Partikelgrößenverteilung |
DE10138490A1 (de) * | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme |
DE10138491A1 (de) * | 2001-08-04 | 2003-02-13 | Degussa | Verfahren zur Herstellung einer hydrophoben Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme |
DE10138492A1 (de) * | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad |
DE10145162A1 (de) * | 2001-09-13 | 2003-04-10 | Wacker Chemie Gmbh | Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen |
JP3965497B2 (ja) * | 2001-12-28 | 2007-08-29 | 日本アエロジル株式会社 | 低増粘性フュームドシリカおよびそのスラリー |
EP1541525A1 (de) * | 2002-03-30 | 2005-06-15 | Degussa AG | Pyrogene Kieselsäuren mit enger Partikelgrössenverteilung |
DE10239423A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäure |
DE10239424A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäuren |
DE10250712A1 (de) | 2002-10-31 | 2004-05-19 | Degussa Ag | Pulverförmige Stoffe |
DE10258858A1 (de) * | 2002-12-17 | 2004-08-05 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxid |
EP1431245A1 (de) * | 2002-12-17 | 2004-06-23 | Degussa-Hüls Aktiengesellschaft | Oberflächenmodifizierte, aerogelartige, strukturierte Kieselsäure |
KR101053797B1 (ko) | 2002-12-18 | 2011-08-03 | 에보닉 데구사 게엠베하 | 텍스쳐 피복된 실리카 |
KR100954073B1 (ko) * | 2002-12-18 | 2010-04-23 | 에보닉 데구사 게엠베하 | 구조적으로 피복된 실리카 |
JP2006515556A (ja) | 2002-12-18 | 2006-06-01 | デグサ アクチエンゲゼルシャフト | 表面改質された、エアロゲル型ストラクチャードシリカ |
DE10337198A1 (de) * | 2003-08-13 | 2005-03-17 | Degussa Ag | Träger auf Basis von Granulaten, die aus pyrogen hergestelltem Siliciumdioxiden hergestellt sind |
DE102004010755A1 (de) * | 2004-03-05 | 2005-09-22 | Degussa Ag | Silikonkautschuk |
DE102004010756A1 (de) * | 2004-03-05 | 2005-09-22 | Degussa Ag | Silanisierte Kieselsäuren |
EP1736505B1 (en) * | 2005-06-25 | 2008-08-27 | Evonik Degussa GmbH | Thermoplastic matrix comprising silanised pyrogenic silica |
CA2617909C (en) | 2005-08-05 | 2014-02-04 | 3M Innovative Properties Company | Compositions exhibiting improved flowability |
US8455165B2 (en) | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
US8435474B2 (en) * | 2006-09-15 | 2013-05-07 | Cabot Corporation | Surface-treated metal oxide particles |
US20080070146A1 (en) | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
US8202502B2 (en) | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
DE102006048509A1 (de) * | 2006-10-13 | 2008-04-17 | Evonik Degussa Gmbh | Oberflächenmodifizierte, strukturmodifizierte pyrogen hergestellte Kieselsäuren |
DE102007024365A1 (de) * | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Pyrogen hergestellte silanisierte und vermahlene Kieselsäure |
DE102007025685A1 (de) * | 2007-06-01 | 2008-12-04 | Evonik Degussa Gmbh | RTV-Zweikomponenten-Silikonkautschuk |
DE102007026214A1 (de) | 2007-06-05 | 2008-12-11 | Evonik Degussa Gmbh | Flammruß |
DE102007035952A1 (de) | 2007-07-30 | 2009-04-09 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
EP2070992A1 (de) * | 2007-12-11 | 2009-06-17 | Evonik Degussa GmbH | Lacksysteme |
DE102008001433A1 (de) * | 2008-04-28 | 2009-10-29 | Evonik Degussa Gmbh | Hydrophobiertes Silicium-Eisen-Mischoxid |
DE102008001437A1 (de) * | 2008-04-28 | 2009-10-29 | Evonik Degussa Gmbh | Oberflächenmodifizierte, superparamagnetische oxidische Partikel |
DE102008001808A1 (de) | 2008-05-15 | 2009-11-19 | Evonik Degussa Gmbh | Beschichtungszusammensetzung |
EP2119737B1 (en) * | 2008-05-15 | 2011-05-04 | Evonik Degussa GmbH | Electronic packaging |
DE102008001855A1 (de) | 2008-05-19 | 2009-11-26 | Evonik Degussa Gmbh | Zweikomponenten-Zusammensetzung zur Herstellung von flexiblen Polyurethan-Gelcoats |
EP2123712A1 (en) | 2008-05-19 | 2009-11-25 | Evonik Degussa GmbH | Epoxy resin composition and electronic part |
EP2145929B1 (de) | 2008-07-18 | 2020-06-24 | Evonik Operations GmbH | Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel |
ES2644759T3 (es) | 2008-07-18 | 2017-11-30 | Evonik Degussa Gmbh | Dispersión de partículas de dióxido de silicio hidrofobizadas y granulado de la misma |
CN102391296B (zh) * | 2011-07-13 | 2014-05-14 | 山东旭业新材料股份有限公司 | 疏水性硅烷分散剂的制备方法 |
DE102013224206A1 (de) | 2013-11-27 | 2015-05-28 | Wacker Chemie Ag | Oberflächenmodifizierte partikuläre Metalloxide |
JP7055294B2 (ja) * | 2018-04-02 | 2022-04-18 | 株式会社トラディショナルインテリジェンス | コーティング部材およびシリカ質コーティング層の形成方法 |
CN109320998B (zh) * | 2018-10-10 | 2021-02-23 | 江苏联瑞新材料股份有限公司 | 一种亚微米硅微粉表面改性的方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL41404A (en) * | 1972-02-17 | 1975-12-31 | Cabot Corp | Water-repellent coating compositions |
DE2403783C2 (de) * | 1974-01-26 | 1982-10-21 | Bayer Ag, 5090 Leverkusen | Verfahren zur Herstellung hydrophobierter pyrogener Kieselsäure |
US4208316A (en) * | 1978-06-29 | 1980-06-17 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Hydrophobic precipitated silicic acid and compositions containing same |
DE59000148D1 (de) * | 1990-07-19 | 1992-07-09 | Degussa | Oberflaechenmodifizierte siliciumdioxide. |
-
1996
- 1996-04-26 DE DE19616781A patent/DE19616781A1/de not_active Ceased
-
1997
- 1997-04-10 DE DE59709069T patent/DE59709069D1/de not_active Expired - Lifetime
- 1997-04-10 EP EP97105909A patent/EP0808880B1/de not_active Expired - Lifetime
- 1997-04-24 CN CN97111729A patent/CN1083397C/zh not_active Expired - Lifetime
- 1997-04-24 JP JP10693797A patent/JP3553315B2/ja not_active Expired - Lifetime
- 1997-04-25 CA CA002203726A patent/CA2203726C/en not_active Expired - Lifetime
- 1997-04-25 KR KR1019970015688A patent/KR100260325B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1167729A (zh) | 1997-12-17 |
CN1083397C (zh) | 2002-04-24 |
DE59709069D1 (de) | 2003-02-13 |
KR970069878A (ko) | 1997-11-07 |
KR100260325B1 (ko) | 2000-07-01 |
DE19616781A1 (de) | 1997-11-06 |
JPH1087317A (ja) | 1998-04-07 |
CA2203726C (en) | 2001-08-07 |
EP0808880B1 (de) | 2003-01-08 |
EP0808880A2 (de) | 1997-11-26 |
CA2203726A1 (en) | 1997-10-26 |
EP0808880A3 (de) | 1999-10-27 |
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