JP3405591B2 - Decomposition treatment method for harmful organic chlorine compounds - Google Patents
Decomposition treatment method for harmful organic chlorine compoundsInfo
- Publication number
- JP3405591B2 JP3405591B2 JP10968994A JP10968994A JP3405591B2 JP 3405591 B2 JP3405591 B2 JP 3405591B2 JP 10968994 A JP10968994 A JP 10968994A JP 10968994 A JP10968994 A JP 10968994A JP 3405591 B2 JP3405591 B2 JP 3405591B2
- Authority
- JP
- Japan
- Prior art keywords
- decomposition
- organic chlorine
- harmful
- decomposing
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 78
- 238000000354 decomposition reaction Methods 0.000 title claims description 52
- 150000004045 organic chlorine compounds Chemical class 0.000 title claims description 48
- 150000001875 compounds Chemical class 0.000 claims description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 17
- 238000006298 dechlorination reaction Methods 0.000 claims description 15
- 238000000926 separation method Methods 0.000 claims description 12
- 239000000460 chlorine Substances 0.000 claims description 9
- 150000001805 chlorine compounds Chemical class 0.000 claims description 9
- 238000004821 distillation Methods 0.000 claims description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- 229910001504 inorganic chloride Inorganic materials 0.000 claims description 7
- 230000005855 radiation Effects 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- 231100000331 toxic Toxicity 0.000 claims description 6
- 230000002588 toxic effect Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 230000000382 dechlorinating effect Effects 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 3
- 230000003472 neutralizing effect Effects 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- 239000000155 melt Substances 0.000 claims description 2
- 238000000746 purification Methods 0.000 claims description 2
- 238000001953 recrystallisation Methods 0.000 claims description 2
- 238000007670 refining Methods 0.000 claims description 2
- 238000005660 chlorination reaction Methods 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 230000001473 noxious effect Effects 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 36
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 30
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 28
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 24
- 235000010290 biphenyl Nutrition 0.000 description 14
- 239000004305 biphenyl Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 13
- 239000011780 sodium chloride Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000006303 photolysis reaction Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 150000002013 dioxins Chemical class 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 230000015843 photosynthesis, light reaction Effects 0.000 description 3
- ODPYDILFQYARBK-UHFFFAOYSA-N 7-thiabicyclo[4.1.0]hepta-1,3,5-triene Chemical compound C1=CC=C2SC2=C1 ODPYDILFQYARBK-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 244000005700 microbiome Species 0.000 description 2
- 238000005373 pervaporation Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004857 zone melting Methods 0.000 description 2
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 241000588724 Escherichia coli Species 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- CKAPSXZOOQJIBF-UHFFFAOYSA-N hexachlorobenzene Chemical class ClC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl CKAPSXZOOQJIBF-UHFFFAOYSA-N 0.000 description 1
- 231100000171 higher toxicity Toxicity 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 230000000813 microbial effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000035772 mutation Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 102220115768 rs886039839 Human genes 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Processing Of Solid Wastes (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Fire-Extinguishing Compositions (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は有害有機塩素系化合物の
分解処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for decomposing harmful organic chlorine compounds.
【０００２】[0002]
【従来の技術】ポリ塩化ビフェニル（ＰＣＢ），ダイオ
キシン，六塩化ベンゼン（ＢＨＣ），またはクロロフェ
ノタン（ＤＤＴ）等の有機塩素系化合物は、一般に化学
的に非常に安定な化合物であって、水，酸，アルカリ等
によっては化学的に分解されないだけでなく、熱的にも
かなりの高温でもほとんど分解しない。2. Description of the Related Art Organochlorine compounds such as polychlorinated biphenyls (PCBs), dioxins, hexachlorobenzenes (BHCs) or chlorophenotanes (DDTs) are generally chemically very stable compounds and , Not only chemically decomposed by acids, alkalis, etc., but also hardly decomposed thermally or at a considerably high temperature.
【０００３】なかでもＰＣＢは電気絶縁性に優れ、油に
非常に溶けやすいといった優れた性質があるために、電
気機器類の絶縁油や、熱媒体，複写紙等に広く使用され
てきた。また、ＢＨＣ，ＤＤＴ等も一時は農薬として非
常に多く用いられていた。[0003] Among them, PCB has been widely used as insulating oil for electric equipment, heat medium, copy paper, etc. because of its excellent electric insulation and the fact that it is very soluble in oil. In addition, BHC, DDT, etc. were once used very often as pesticides.
【０００４】しかし、これらの化合物はいずれも極めて
強い発癌性や変異現性を有し、また生体内に取り込まれ
た場合には体外に排出されずそのまま蓄積されるという
性質がある。However, any of these compounds also have a very strong carcinogenic and mutation current property and the property that it is accumulated without being discharged to the outside of the body when taken into the living body.
【０００５】上述のような問題点があるため、これらの
有害有機塩素系化合物を安定な媒体内に封じ込めて外部
へ漏れ出さないようにするか、または他の無害な化合物
に分解するかのいずれかの処理を行うことが求められて
いる。Due to the above-mentioned problems, these harmful organochlorine compounds are either enclosed in a stable medium so that they do not leak outside, or decomposed into other harmless compounds. It is required to perform such processing.
【０００６】有害有機塩素系化合物を無害化合物へ分解
処理するための具体的な技術としては、例えば有害有機
塩素系化合物がＰＣＢである場合に、以下に示すような
公知例がある。
（１）空気中で1300℃以上程度の高温下で熱分解・焼却
する方法（奈良 洋：産業公害 11(3)，221(1975)
等）。
（２）硫黄と混ぜ合わせて加熱処理することでフェニレ
ンスルフィド樹脂化する方法（米国特許：第 3354129号
明細書(1967)）。
（３）300 ℃、 100〜200atm程度の高温・高圧の下でア
ルカリ水溶液により加水分解する方法（水熱分解法）
（山崎 他：高知大学水熱化学実験所報告 １(1），
１；(4) ，22(1973)）。
（４）アルカリ性溶液中で紫外線などの光や、γ線など
の電離放射線の照射によって脱塩素化分解する方法（光
分解法）（砂田：原子力工業 16(11)，68(1970)篠崎
他：特開昭49−109351号（特公昭 52-47457号）等）。
（５）活性汚泥や大腸菌等の細菌により分解する方法
（微生物分解法）（喜多村他：日本衛生学雑誌 28
(1)，85(1973)）。As a specific technique for decomposing harmful organic chlorine compounds into harmless compounds, for example, when the harmful organic chlorine compound is PCB, there are known examples as shown below. (1) Method of pyrolyzing and incinerating in air at a high temperature of 1300 ° C or higher (Hiro Nara: Industrial Pollution 11 (3), 221 (1975)
etc). (2) A method of forming a phenylene sulfide resin by mixing with sulfur and heat treatment (US Pat. No. 3354129 (1967)). (3) Method of hydrolyzing with alkaline aqueous solution under high temperature and high pressure of 300 to 100 atm of 100 to 200 atm (hydrothermal decomposition method)
(Yamazaki et al .: Report of Hydrothermal Chemistry Laboratory, Kochi University 1 (1),
1; (4), 22 (1973)). (4) Method of dechlorinating and decomposing by irradiating light such as ultraviolet ray and ionizing radiation such as γ ray in alkaline solution (photolysis method) (Sunada: Atomic Energy Industry 16 (11), 68 (1970) Shinozaki
Others: JP-A-49-109351 (Japanese Patent Publication No. 52-47457). (5) Method of decomposing by activated sludge and bacteria such as Escherichia coli (microorganism decomposition method) (Kitamura et al .: Journal of Japanese hygiene 28
(1), 85 (1973)).
【０００７】[0007]
【発明が解決しようとする課題】これらの従来の処理方
法はいずれも以下に述べるような課題がある。
１．封じ込め処理法の課題
安定な媒体内に封じ込めて外部へ漏れ出さないようにす
る処理方法の場合、これらの有害有機塩素系化合物をと
りあえず一時的に環境から隔離することはできるが、化
合物自体はその毒性と共に永久的にそのまま残っている
わけであるから、有効な解決策とは言えない。All of these conventional processing methods have the following problems. 1. Challenges of containment treatment method In the case of a treatment method that keeps the substance in a stable medium so that it does not leak to the outside, these harmful organochlorine compounds can be temporarily isolated from the environment for the time being, but the compound itself It remains a permanent solution with toxicity, so it is not an effective solution.
【０００８】２．分解処理法の課題
（１）高温熱分解・焼却法
分解処理法の中で最も広く行われ、ほぼ 100％までの分
解処理が可能であることが知られている。しかしこれは
開放系での処理方法のため、排ガスや廃水中に、未分解
残存有害有機塩素系化合物が排出されたり、さらには高
温下で空気中の酸素と化合してダイオキシン類等の元の
有害塩素系化合物よりもさらに強い毒性を有する化合物
が副生したりするという課題がある。したがって、以前
は実際の処理に用いられたこともあるが、現在では認め
られていない。2. Issues of decomposition treatment method (1) High-temperature thermal decomposition / incineration method It is known that it is the most widely used decomposition treatment method and can decompose up to almost 100%. However, since this is an open system treatment method, undecomposed residual harmful organochlorine compounds are discharged into exhaust gas and wastewater, and further, they combine with oxygen in the air at high temperatures to recover the original dioxins. There is a problem that a compound having a higher toxicity than a harmful chlorine compound is by-produced. Therefore, it has been used for actual treatment before, but it is not accepted now.
【０００９】（２）フェニレンスルフィド樹脂化法
得られた樹脂が無害であるか否かが確認されていず、ま
たＰＣＢの一部は樹脂化せずに残存する、さらには
（１）と同様にダイオキシン類等が副生したりするとい
う問題点がある。(2) Phenylene sulfide resinification method It has not been confirmed whether the obtained resin is harmless or not, and a part of the PCB remains without being resinized. Furthermore, as in (1). There is a problem that dioxins and the like are by-produced.
【００１０】（３）水熱分解法
分解反応は完全に進行するが分解生成のフェノール系化
合物やエーテル系化合物の無害性についてはなお疑問の
余地が残されている。これが確認されない限りは実際の
適用は困難である。(3) Hydrothermal Decomposition Method Although the decomposition reaction proceeds completely, there is still room for doubt about the harmlessness of the decomposition-produced phenolic compounds and ether compounds. Unless this is confirmed, practical application is difficult.
【００１１】（４）光分解法
数多くの分解研究がなされ様々な分解条件が提案されて
いるが、いずれの場合でも完全な分解（脱塩素化）は事
実上不可能で必ず未分解物が残存する。しかしこの未分
解物をどう処理するかについては検討がなされておら
ず、未分解物を含むままでは環境中へ排出できない以
上、実際の適用は不可能である。(4) Photolysis method Although many decomposition studies have been carried out and various decomposition conditions have been proposed, in any case, complete decomposition (dechlorination) is practically impossible and undecomposed matter always remains. To do. However, no consideration has been given to how to treat this undegraded material, and since it cannot be discharged into the environment if it contains undegraded material, practical application is not possible.
【００１２】（５）微生物分解法
幾つかの異なる微生物を用いる方法についての発表が行
われているが、分解率はいずれも50〜60％程度しか得ら
れない。特に塩素数の多い化合物の場合程分解が困難な
ことが明らかになっている。したがって実際に適用でき
るプロセスとは言えない。(5) Microbial decomposition method Although a method using several different microorganisms has been announced, the decomposition rate is only about 50 to 60%. In particular, it has been revealed that decomposition is more difficult in the case of a compound having a large number of chlorine. Therefore, it cannot be said that the process is actually applicable.
【００１３】本発明は上記課題を解決するためになされ
たもので、有害化合物を一切環境中に排出することなし
に閉鎖系の内で無害化合物化することができる有害有機
塩素系化合物の分解処理方法、特に分解処理後も未分解
化合物が残存する場合に適用する有害有機塩素系化合物
の分解処理方法を提供することを目的とする。The present invention has been made in order to solve the above problems, and is a decomposition treatment of harmful organochlorine compounds which can be converted into harmless compounds in a closed system without discharging any harmful compounds into the environment. It is an object of the present invention to provide a method, especially a method for decomposing harmful organic chlorine compounds, which is applied when undecomposed compounds remain after the decomposition treatment.
【００１４】[0014]
【課題を解決するための手段】本発明は有害有機塩素系
化合物をアルカリ性アルコール溶液中での光照射または
放射線照射によって分解・脱塩素化処理する工程と、こ
の分解・脱塩素化処理工程後も未分解で残存している有
害有機塩素系化合物を分解生成非塩素系化合物から分離
する工程と、この分離した未分解残存有害有機塩素系化
合物を再び前記分解・脱塩素化処理工程に戻して分解さ
せる工程と、前記未分解で残存している有害有機塩素系
化合物を分解生成非塩素系化合物から分離する工程に先
立って、分解液中に含まれるアルコールを分離除去する
アルコール分離除去工程とを有することを特徴とする。The present invention relates to a harmful organic chlorine system.
Light irradiation of compounds in alkaline alcoholic solutions or
The process of decomposing / dechlorinating by irradiation with radiation,
It remains undecomposed even after the decomposition / dechlorination process of
Separation of harmful organochlorine compounds from decomposition-produced non-chlorine compounds
And the undegraded residual harmful organic chlorine system
The compound is returned to the above decomposition / dechlorination process and decomposed.
And the undegraded residual toxic organic chlorine system
Prior to the step of separating the compound from the decomposition-produced non-chlorine compounds
Stand up and separate and remove the alcohol contained in the decomposition solution.
And an alcohol separation and removal step .
【００１５】[0015]
【作用】本発明においては、有害有機塩素系化合物は、
例えばアルカリ性アルコール溶液中で紫外線ランプ光，
紫外線レーザー光，或いはγ線等の放射線の中のいずれ
か単独を、またはこれらの中の幾種類かを合わせて照射
することによって、容易にその大半が分解・脱塩素化さ
れて非塩素系化合物に変えられる。In the present invention, the harmful organochlorine compound is
For example, UV lamp light in alkaline alcohol solution,
By irradiating either ultraviolet laser light or radiation such as γ-rays alone or in combination with some of these radiations, most of them are easily decomposed and dechlorinated to produce non-chlorine compounds. Can be changed to
【００１６】この分解・脱塩素化処理を行った後で残存
している少量の未分解物は、例えば蒸留法，溶液化した
後での再晶出法，ゾーンメルティング法等の溶融精製
法，等の各技術を単独で、或いはその中の任意の複数の
技術を組合わせて用いることによって、分解生成非塩素
系化合物から分解することができる。A small amount of undecomposed matter remaining after the decomposition / dechlorination treatment is carried out by a melt refining method such as a distillation method, a recrystallization method after solubilization or a zone melting method. , Etc. can be decomposed from the decomposition-produced non-chlorine-based compound by using each of the technologies alone or in combination of arbitrary plural technologies therein.
【００１７】なお、未分解で残存している有害有機塩素
系化合物を分解生成非塩素系化合物から分離する工程の
前に、必要に応じて、溶媒として用いたアルコールを分
離除去するための工程や、有害有機塩素系化合物から脱
離した塩素原子とアルカリとの反応により生成した塩化
ナトリウム等の無機塩化物や、或いは分解反応の際に余
剰に用いて消費されずに残ったアルカリを除去するため
の工程を設けることもできる。Before the step of separating the undegraded residual toxic organic chlorine compound from the decomposition-produced non-chlorine compound, if necessary, a step for separating and removing the alcohol used as a solvent, In order to remove inorganic chlorides such as sodium chloride produced by the reaction of chlorine atoms desorbed from harmful organic chlorine compounds with alkalis, or alkalis that are left over without being consumed during the decomposition reaction. The step of can also be provided.
【００１８】このアルコールを分離除去するための工程
では、例えば蒸留法や浸透気化法（パーベーパレション
法）等の膜分離法等の技術を用いることができる。また
塩化ナトリウム等の無機塩化物や余剰のアルカリは、元
の有害有機塩素系化合物やその分解生成化合物から水や
アルコール等の有機溶媒に対する溶解性の違いに基づい
て容易に分離することもできるであろう。分離除去した
溶媒アルコールは焼却などの廃棄処分をすることも可能
であるが、回収して精製し再使用する。In the step for separating and removing the alcohol, a technique such as a membrane separation method such as a distillation method or a pervaporation method (pervaporation method) can be used. Inorganic chlorides such as sodium chloride and excess alkali can also be easily separated from the original harmful organochlorine compounds and their decomposition products based on the difference in solubility in organic solvents such as water and alcohol. Ah The separated and removed solvent alcohol can be discarded by incineration or the like, but it is collected, purified and reused.
【００１９】上述のようにして分解生成非塩素系化合物
から分離・回収された未分解残存有害有機塩素系化合物
を、再び最初の分解・脱塩素化工程へ戻してやれば、有
害有機塩素系化合物は閉鎖系ループ内を何度も繰り返し
て循環するだけであって、系害には排出されずに最終的
に完全に分解させることが可能になる。If the undecomposed residual harmful organochlorine compound separated and recovered from the decomposition-produced non-chlorine compound as described above is returned to the first decomposition / dechlorination step again, the harmful organochlorine compound is produced. It simply circulates in the closed system loop over and over again, and finally it can be completely decomposed without being discharged to the system.
【００２０】なお、この最初の分解・脱塩素化工程へ戻
す未分解残存有害有機塩素系化合物は純粋である必要は
なく、分解工程で支障がない濃度範囲までの分解生成非
塩素系化合物を含んでいても構わない。また、分解方法
についても、必ずしも最初の分解処理方法と同じである
必要はなく、例えば最初に光分解法を用い、次には放射
線分解法を用いることも可能である。The undecomposed residual harmful organochlorine compound to be returned to the first decomposition / dechlorination step does not need to be pure, and contains decomposition-produced non-chlorine compounds up to a concentration range that does not hinder the decomposition step. It doesn't matter if it is out. Also, the decomposing method does not necessarily have to be the same as the first decomposing method, and for example, it is possible to use the photodecomposing method first and then the radiation decomposing method.
【００２１】一方、未分解残存有害有機塩素系化合物を
分離・回収した後の有害物を含まない分解生成塩素系化
合物は、一般の産業廃棄物と同様に焼却や埋立て等の処
分を行うことが可能である。On the other hand, the decomposition-produced chlorine-based compound containing no harmful substances after separating and recovering the undecomposed residual harmful organic chlorine-based compound should be disposed of by incineration or landfill in the same manner as general industrial waste. Is possible.
【００２２】[0022]
【実施例】本発明に係る有害有機塩素系化合物の分解処
理方法の実施例を図１および図２により説明する。な
お、以下の実施例では有害有機塩素系化合物としてＰＣ
Ｂを用いた場合の例について述べるが、本発明は必ずし
もＰＣＢの場合のみに限定されるものではなく、例え
ば、ダイオキシン，ＢＨＣ，ＤＤＴ等の有機塩素系化合
物にも適用できる。EXAMPLES Examples of the method for decomposing harmful organic chlorine compounds according to the present invention will be described with reference to FIGS. 1 and 2. In the following examples, PC was selected as the harmful organochlorine compound.
An example of using B will be described, but the present invention is not necessarily limited to the case of PCB, and can be applied to, for example, organic chlorine compounds such as dioxin, BHC, and DDT.
【００２３】図１はＰＣＢの分解処理プロセスフロー図
で、図２はＰＣＢ分解後処理プロセスでのマテリアルバ
ランスを示している。図１中のＩＰＡとは2-プロパノー
ルで、保管ＰＣＢとは分解処理するＰＣＢのことであ
る。FIG. 1 is a flow chart of the PCB disassembly process, and FIG. 2 shows the material balance in the PCB disassembly post-process. IPA in FIG. 1 is 2-propanol, and stored PCB is PCB to be decomposed.
【００２４】（実施例１）図１および図２に示すよう
に、ポリ塩化ビフェニル（ＰＣＢ） 12.3 kgと水酸化ナ
トリウム（ＮａＯＨ）8.42kgとを2-プロパノール（ＩＰ
Ａ）13.3ｍ3 に溶かして溶液とする。この溶液に波長 2
48nmのＫｒＦエキシマレーザー光を約 100Ｊ相当のエネ
ルギーになるまでの時間だけ照射して分解反応を行った
（ＰＣＢ光分解）。(Example 1) As shown in FIGS. 1 and 2, 12.3 kg of polychlorinated biphenyl (PCB) and 8.42 kg of sodium hydroxide (NaOH) were mixed with 2-propanol (IP).
A) Dissolve in 13.3 m 3 to make a solution. Wavelength 2 in this solution
The decomposition reaction was carried out by irradiating the KrF excimer laser light of 48 nm for the time until the energy became equivalent to about 100 J (PCB photolysis).
【００２５】照射後の分解液中には分解成分ビフェニル
が5.83kg，未分解残留ＰＣＢが1.23kg（当初投入量の10
％相当量、分解率にすると90％），水酸化ナトリウムが
中和されて生成した塩化ナトリウムが 8.9kg，消費され
ずに残った余剰水酸化ナトリウムが 2.3kgそれぞれ含ま
れている。この分解液から先ず溶媒の2-プロパノール1
3.3ｍ3 を加熱蒸発させることによって除去し、蒸発し
た2-プロパノールは凝縮させて回収した。In the decomposed solution after irradiation, the decomposition component biphenyl was 5.83 kg, and undecomposed residual PCB was 1.23 kg (10% of the initial amount charged).
%, 90% in terms of decomposition rate), 8.9 kg of sodium chloride produced by neutralizing sodium hydroxide, and 2.3 kg of excess sodium hydroxide remaining without being consumed. From this decomposition solution, the solvent 2-propanol 1
3.3 m 3 was removed by heat evaporation and the evaporated 2-propanol was condensed and collected.
【００２６】次にこの2-プロパノールを除去した後に残
った混合物に水と塩酸とを加え、余剰の水酸化ナトリウ
ムを中和して塩化ナトリウム（Ｎａｃｌ）化するととも
に、これを水溶液化し、遠心分離を行うと水に不溶な有
機成分と分離し、ＰＣＢとビフェニルの混合物だけにし
た。この混合物（合計7.06kg，ＰＣＢ：90％＋ビフェニ
ル：10％）を理論段数25段の蒸留塔を用い、還流比５の
条件の下で行った。Next, water and hydrochloric acid are added to the mixture remaining after removing the 2-propanol to neutralize excess sodium hydroxide to form sodium chloride (Nacl), and this is made into an aqueous solution and centrifuged. Then, the organic component insoluble in water was separated, and only a mixture of PCB and biphenyl was obtained. This mixture (total 7.06 kg, PCB: 90% + biphenyl: 10%) was subjected to a reflux ratio of 5 using a distillation column having 25 theoretical plates.
【００２７】その結果、塔頂からはＰＣＢ 0.1％相当を
含むビフェニル主体の混合物6.26kg（ＰＣＢ6.26ｇ＋ビ
フェニル6.25kg）が、または塔底からはＰＣＢ 720ｇ＋
ビフェニル80ｇの混合物が各々留出・回収された。As a result, a mixture of 6.26 kg (PCB 6.26 g + biphenyl 6.25 kg) containing mainly 0.1% of PCB from the top of the tower or 720 g of PCB from the bottom of the tower was added.
A mixture of 80 g of biphenyl was distilled and collected respectively.
【００２８】ここで、蒸留分離したＰＣＢ主体の塔底留
出混合物を、先に蒸留分離して回収した2-プロパノール
13.3ｍ3 に再び溶かし、ここに新たにＰＣＢ11.5kgと水
酸化ナトリウム8.42kgとを加えて溶かした後、光反応工
程に戻して先と同じ条件の下でレーザー光を照射し、Ｐ
ＣＢの分解を行った。Here, the 2-distilled bottoms mixture mainly composed of PCB, which has been distilled off, was previously distilled off and recovered.
Dissolve in 13.3 m 3 again, add 11.5 kg of PCB and 8.42 kg of sodium hydroxide to the solution and dissolve again. Then, return to the photoreaction step and irradiate with laser light under the same conditions as above, and
CB was decomposed.
【００２９】一方、その中にＰＣＢ 0.1％相当量を含む
ビフェニル主体の塔頂留出混合物6.26kgは、ここからさ
らにＰＣＢを分離してビフェニルを精製するために、全
部で10回分の光分解反応液から上述のようにして分離し
たビフェニル99.9％の混合物を合わせて62.6kg分を冷却
して棒状に結晶化させた後ゾーンメルティング法による
精製を行った。On the other hand, 6.26 kg of an overhead distillate mixture mainly composed of biphenyl containing 0.1% of PCB contained therein was used for further 10 times of photolysis reaction in order to further separate PCB to purify biphenyl. The mixture of 99.9% biphenyl separated from the liquid as described above was combined and cooled for 62.6 kg to crystallize into a rod, followed by purification by the zone melting method.
【００３０】棒状結晶体の上端部から下端部へと結晶体
の全長の1/10の幅をもった加熱体をゆっくりと動かして
いった。本操作を20回繰り返した後で、全体の長さの下
端から1/10に相当する長さの部分（6.26kg）を分離する
と、ここに含まれているＰＣＢは31.3mgであり、ビフェ
ニル中での濃度として５ppm にまで低下している。A heating body having a width of 1/10 of the entire length of the crystal was slowly moved from the upper end to the lower end of the rod-shaped crystal. After repeating this operation 20 times, when the part of the length corresponding to 1/10 (6.26 kg) was separated from the lower end of the whole length, the PCB contained here was 31.3 mg, The concentration has dropped to 5 ppm.
【００３１】逆に、棒状結晶体の上端部にはＰＣＢが濃
縮されていて、全体長さの約 1/260に相当する部分の 2
43ｇを分離すると、そのＰＣＢ含有量は2.43ｇ（濃度で
は１１％に相当）になっている。これを、レーザー分解
後の反応液から溶媒および無機塩を分離・除去した後の
ＰＣＢ／ビフェニルの混合物と一緒にして、再度蒸留分
離を行った。On the contrary, PCB is concentrated on the upper end of the rod-shaped crystal, which is about 1/260 of the total length.
When 43 g was separated, the PCB content was 2.43 g (corresponding to 11% in concentration). This was combined with the mixture of PCB / biphenyl after separating and removing the solvent and the inorganic salt from the reaction solution after laser decomposition, and again subjected to distillation separation.
【００３２】（実施例２）実施例１と同じ組成の溶液
に、今度は波長 248nm付近を中心とする範囲の波長を有
するＫｒＦエキシマランプ光を照射して分解反応を行っ
た。照射後の溶液中には分解生成ビフェニルが5.83kg，
未分解残留ＰＣＢが1.23kg（当初投入量の10％相当量、
分解率にすると90％）、水酸化ナトリウムが中和されて
生成した塩化ナトリウムが 8.9kg，消費されずに残った
余剰水酸化ナトリウムが 2.3kgそれぞれ含まれている。
この分解液から先ず溶媒の2-プロパノール13.3ｍ3 を浸
透膜を介して蒸発させて除去し、蒸発した2-プロパノー
ルは凝縮させて回収した。Example 2 A solution having the same composition as in Example 1 was irradiated with KrF excimer lamp light having a wavelength centered around a wavelength of 248 nm to perform a decomposition reaction. 5.83 kg of decomposition product biphenyl in the solution after irradiation,
Undecomposed residual PCB 1.23kg (10% of the initial input,
When the decomposition rate is 90%), the sodium chloride produced by neutralizing sodium hydroxide is 8.9 kg, and the excess sodium hydroxide remaining without being consumed is 2.3 kg.
From this decomposition liquid, first, 13.3 m 3 of 2-propanol as a solvent was evaporated and removed through a permeation membrane, and the evaporated 2-propanol was condensed and recovered.
【００３３】次にこの2-プロパノールを除去した後に残
った混合物に水と塩酸とを加え、余剰の水酸化ナトリウ
ムを中和して塩化ナトリウム化するとともに、これを水
溶液化し、遠心分離を行うと水に不溶な有機成分と分離
し、ＰＣＢとビフェニルの混合物だけにした。この混合
物（合計7.06kg，ＰＣＢ：90％＋ビフェニル：10％）を
理論段数63段の蒸留塔を用い、還流比４の条件の下で蒸
留を行った。Next, water and hydrochloric acid are added to the mixture remaining after removing the 2-propanol to neutralize the excess sodium hydroxide to form sodium chloride, and this is made into an aqueous solution and centrifuged. It was separated from the water-insoluble organic component, leaving only a mixture of PCB and biphenyl. This mixture (total 7.06 kg, PCB: 90% + biphenyl: 10%) was distilled under the condition of a reflux ratio of 4 using a distillation column having 63 theoretical plates.
【００３４】その結果、塔頂からはＰＣＢを 10ppm相当
量だけ（6.26mg）しか含まないビフェニル主体の混合物
6.26kgが、一方塔底からは逆にビフェニルを 10ppm相当
量（８mg）だけしか含まないＰＣＢ主体の混合物800gが
各々留出・回収された。As a result, a mixture containing mainly biphenyl containing only 10 ppm of PCB (6.26 mg) from the top of the column.
On the other hand, from the bottom of the column, on the contrary, 800 g of a mixture mainly composed of PCB containing only 10 ppm of biphenyl (8 mg) was distilled and recovered.
【００３５】ここで、蒸留分離したＰＣＢ主体の塔底留
出混合物を、先に蒸留分離して回収した2-プロパノール
13.3ｍ3 に再び溶かし、ここに新たにＰＣＢ11.5kgと水
酸化ナトリウム8.42kgとを加えて溶かした後、光反応工
程に戻して先と同じ条件の下でランプ光を照射し、ＰＣ
Ｂの分解を行った。Here, the 2-distilled bottoms mixture mainly composed of PCB, which has been separated by distillation, is first collected by separation by distillation.
Dissolve again in 13.3 m 3 , add 11.5 kg of PCB and 84.2 kg of sodium hydroxide to the solution and dissolve again, then return to the photoreaction step and irradiate with lamp light under the same conditions as above,
B was decomposed.
【００３６】[0036]
【発明の効果】本発明によれば、ＰＣＢ等の有害有機塩
素系化合物を環境中に排出することなく、閉鎖系内で処
理して系外に排出することなく、無害の非塩素系化合物
にまで、完全に分解・無害化させることが可能である。EFFECTS OF THE INVENTION According to the present invention, a harmless non-chlorine compound is treated without discharging harmful organochlorine compounds such as PCB into the environment and treating them in a closed system and discharging them out of the system. It is possible to completely decompose and render harmless.
【図１】本発明方法に係る実施例を説明するためのＰＣ
Ｂ分解処理プロセスフロー図。FIG. 1 is a PC for explaining an embodiment according to the method of the present invention.
B decomposition processing process flow diagram.
【図２】本発明方法に係る実施例において、ＰＣＢの分
解後処理プロセスのマテリアルバランスを示すブロック
図。FIG. 2 is a block diagram showing a material balance of a post-decomposition treatment process of PCB in an embodiment according to the method of the present invention.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 島田 秀樹 神奈川県横浜市磯子区新杉田町８番地 株式会社東芝 横浜事業所内 (72)発明者 田嶋 直樹 神奈川県横浜市磯子区新杉田町８番地 株式会社東芝 横浜事業所内 (56)参考文献 特開 平５−277205（ＪＰ，Ａ) 特開 平５−192421（ＪＰ，Ａ) 特開 昭49−109351（ＪＰ，Ａ) 特開 昭63−46178（ＪＰ，Ａ) 特開 平４−112842（ＪＰ，Ａ) 特開 平７−213643（ＪＰ，Ａ) 特開 平４−293517（ＪＰ，Ａ) 国際公開94／014731（ＷＯ，Ａ１) (58)調査した分野(Int.Cl.7，ＤＢ名) A62D 3/00 B01J 19/12 C07B 35/06 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Hideki Shimada, 8 Shinsita-cho, Isogo-ku, Yokohama-shi, Kanagawa, Yokohama Office of Toshiba Corporation (72) Naoki Tajima, 8 Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Toshiba Corporation Yokohama Works (56) References JP-A-5-277205 (JP, A) JP-A-5-192421 (JP, A) JP-A-49-109351 (JP, A) JP-A-63-46178 (JP, A) JP-A-4-112842 (JP, A) JP-A-7-213643 (JP, A) JP-A-4-293517 (JP, A) International Publication 94/014731 (WO, A1) (58) Field (Int.Cl. 7 , DB name) A62D 3/00 B01J 19/12 C07B 35/06
Claims (12)
コール溶液中での光照射または放射線照射によって分解
・脱塩素化処理する工程と、この分解・脱塩素化処理工
程後も未分解で残存している有害有機塩素系化合物を分
解生成非塩素系化合物から分離する工程と、この分離し
た未分解残存有害有機塩素系化合物を再び前記分解・脱
塩素化処理工程に戻して分解させる工程と、前記未分解
で残存している有害有機塩素系化合物を分解生成非塩素
系化合物から分離する工程に先立って、分解液中に含ま
れるアルコールを分離除去するアルコール分離除去工程
とを有することを特徴とする有害有機塩素系化合物の分
解処理方法。1. A harmful organic chlorine-based compound is treated with an alkaline alcohol.
Decomposition by light irradiation or irradiation in Cole solution
・ Dechlorination process and the decomposition / dechlorination process
The harmful organic chlorine compounds remaining undecomposed even after
The step of separating from the degenerated non-chlorine compounds and the separation
Undegraded residual harmful organochlorine compounds
The process of decomposing by returning to the chlorination process,
Decomposes and produces toxic organic chlorine compounds remaining in
Contained in the decomposition solution prior to the step of separating from the system compounds
Alcohol separation and removal process to separate and remove the alcohol
A method for decomposing a harmful organic chlorine compound, comprising:
線レーザー光によって行うことを特徴とする請求項１に
記載の有害有機塩素系化合物の分解処理方法。2. The light irradiation is ultraviolet lamp light or ultraviolet light.
The method for decomposing a harmful organochlorine compound according to claim 1, wherein the method is performed by using a linear laser beam .
リ性アルコール溶液中でγ線を照射することによって行
うことを特徴とする請求項１に記載の有害有機塩素系化
合物の分解処理方法。3. The decomposition / dechlorination treatment step comprises
The method for decomposing a harmful organochlorine compound according to claim 1, which is carried out by irradiating with γ-rays in a phosphoric alcohol solution .
で残存している有害有機塩素系化合物を分解生成化合物
から分離する工程で、一旦全て溶液化した後で蒸発濃
縮、冷却または別溶媒を加えることによる選択的再晶出
法を用いることを特徴とする請求項１に記載の有害有機
塩素系化合物の分解処理方法。 4. No decomposition after the decomposition / dechlorination treatment step.
Compounds that decompose and decompose harmful organic chlorine compounds remaining in
In the process of separating from
Selective recrystallization by shrinking, cooling or adding another solvent
The method for decomposing a harmful organochlorine compound according to claim 1, wherein the method is used.
で残存している有害有機塩素系化合物を分解生成化合物
から分離する工程で、ゾーンメルティング法等の溶融精
製法を用いることを特徴とする請求項１に記載の有害有
機塩素系化合物の分解処理方法。5. No decomposition after the decomposition / dechlorination treatment step
Compounds that decompose and decompose harmful organic chlorine compounds remaining in
In the process of separating from
The method for decomposing harmful organic chlorine compounds according to claim 1, characterized in that a manufacturing method is used .
で残存している有害有機塩素系化合物を分解生成化合物
から分離する工程で、最初に蒸留法を用い、つぎにゾー
ンメルティング法等の溶融精製法を用いることを特徴と
する請求項１に記載の有害有機塩素系化合物の分解処理
方法。6. A step of separating undecomposed and remaining noxious organochlorine compounds from the decomposition products after the decomposition / dechlorination treatment step , using a distillation method first, and then a zo
2. The method for decomposing a harmful organic chlorine compound according to claim 1, wherein a melt refining method such as a melting method is used.
アルコール溶液中での光照射または放射線照射によって
分解・脱塩素化処理した後の分解液中に含ま れているア
ルコールを蒸留法により分離除去することを特徴とする
請求項１記載の有害有機塩素系化合物の分解処理方法。7. The toxic organic chlorine compound is alkaline
By light irradiation or irradiation in alcohol solution
A contained in the decomposition liquid after treatment decomposed and dechlorinated
The method for decomposing harmful organic chlorine compounds according to claim 1, wherein rucor is separated and removed by a distillation method.
アルコール溶液中での光照射または放射線照射によって
前記分解・脱塩素化処理工程後の分解液中に含まれてい
るアルコールを膜分離法により分離除去することを特徴
とする請求項１記載の有害有機塩素系化合物の分解処理
方法。 8. The toxic organic chlorine compound is alkaline
By light irradiation or irradiation in alcohol solution
Included in the decomposition liquid after the decomposition / dechlorination process
The method for decomposing a harmful organochlorine compound according to claim 1, wherein the alcohol is removed by a membrane separation method.
ールをさらに精製処理を行った後に再度その中で有害有
機塩素系化合物を光照射または放射線照射によって分解
・脱塩素化処理を行うことを特徴とする請求項１記載の
有害有機塩素系化合物の分解処理方法。9. The alcohol after the alcohol separation and removal step.
After further purification treatment,
Decomposes organic chlorine compounds by light irradiation or radiation irradiation
The method for decomposing harmful organic chlorine compounds according to claim 1 , wherein dechlorination treatment is performed .
に、前記未分解で残存している有害有機塩素系化合物を
分解生成化非有機塩素系化合物から分離する工程に先立
って、前記分解液中に含まれている無機塩化物を分離除
去する工程を有することを特徴とする請求項１記載の有
害有機塩素系化合物の分解処理方法。10. An alternative to the alcohol separation and removal step
In addition, the undegraded residual toxic organic chlorine compounds
Prior to the step of separating from decomposition-generated non-organic chlorine compounds
The inorganic chloride contained in the decomposition solution is separated and removed.
The method for decomposing a harmful organochlorine compound according to claim 1, further comprising a step of removing the compound.
ルコール溶液中での光照射または放射線照射によって分
解・脱塩素化処理した後、未分解で残存している有害有
機塩素系化合物を分解生成化合物から分離する工程に先
立って、前記分解液中に残っている余剰のアルカリを塩
酸で中和して無機塩化物に変える工程と、この中和生成
無機塩化物を有害有機塩素系化合物の分解・脱塩素化処
理工程によって生成した無機塩化物と一緒にして分離除
去する工程を有することを特徴とする請求項10記載の有
害有機塩素系化合物の分解処理方法。11. After decomposing / dechlorinating a harmful organochlorine compound by light irradiation or radiation irradiation in an alkaline alcohol solution, it remains undecomposed.
Prior to the process of separating organic chlorine compounds from decomposition products
Stand up and salt off the excess alkali remaining in the decomposition solution.
The process of neutralizing with acid to convert it to inorganic chloride
Decomposition / dechlorination of harmful organic chlorine compounds from inorganic chloride
Separation and removal together with the inorganic chloride produced by the physical process
11. The method for decomposing a harmful organochlorine compound according to claim 10, characterized in that it comprises a step of removing.
アルコールを分離除去した後の混合物から無機塩化物を
分離除去する工程を有することを特徴とする請求項１記
載の有害有機塩素系化合物の分解処理方法。 12. After the alcohol separation and removal step,
Inorganic chloride is removed from the mixture after the alcohol is separated and removed.
The method according to claim 1, further comprising a step of separating and removing.
Method for decomposing harmful organic chlorine compounds listed .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10968994A JP3405591B2 (en) | 1994-05-24 | 1994-05-24 | Decomposition treatment method for harmful organic chlorine compounds |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10968994A JP3405591B2 (en) | 1994-05-24 | 1994-05-24 | Decomposition treatment method for harmful organic chlorine compounds |
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| Publication Number | Publication Date |
|---|---|
| JPH07313619A JPH07313619A (en) | 1995-12-05 |
| JP3405591B2 true JP3405591B2 (en) | 2003-05-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP10968994A Expired - Fee Related JP3405591B2 (en) | 1994-05-24 | 1994-05-24 | Decomposition treatment method for harmful organic chlorine compounds |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6083431A (en) | 1995-05-26 | 2000-07-04 | Ikari-Laboratory For Environmental Science Co., Ltd. | Method for solidifying and sealing in a toxic substance with sulfur |
| FR2788763B1 (en) * | 1999-01-25 | 2001-04-13 | Rhodia Chimie Sa | PROCESS AND PLANT FOR SEPARATING AND PURIFYING DIPHENOLS IN THE PHENOL AND DERIVATIVE INDUSTRY |
| JP2002360728A (en) * | 2001-06-11 | 2002-12-17 | Toshiba Corp | Pcb detoxication treatment apparatus |
| JP2006296694A (en) * | 2005-04-20 | 2006-11-02 | Japan Atomic Energy Agency | Decomposition method of halogenated organic compound |
| CN109430268A (en) * | 2018-12-06 | 2019-03-08 | 江苏新河农用化工有限公司 | A kind of preparation method of low hexachlorobenzene content chlorothalonil suspending agent |
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1994
- 1994-05-24 JP JP10968994A patent/JP3405591B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07313619A (en) | 1995-12-05 |
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